KR20110096152A - Integration of a processing bench in an inline coating system - Google Patents

Abstract

 An insert device for a substrate coating system, wherein the insert device includes an insert element 100 operating within the coating system, the insert element comprising a processing bench 120, wherein the processing bench 120 is a coating for applying a coating to the substrate. Adapted to receive a tool—a carrier 110 for delivering the insertion element 100, inserting the insertion element 100 into the processing chamber 150 of the coating system and / or inserting the insertion element from the processing chamber 150. First positioner 130 collaborating with carrier 110 to retract 100, and fine positioning of insertion element 100 within processing chamber 150. It includes a second positioner 140 for.

Description

INTEGRATION OF A PROCESSING BENCH IN AN INLINE COATING SYSTEM}

TECHNICAL FIELD This disclosure relates to substrate coating technical solutions involving equipment, processes, and materials used in deposition, patterning, and processing and coatings of substrates, including, but not limited to, semiconductor and Dielectric materials and devices, silicon-based wafers, flat panel displays (such as TFTs), masks and filters, energy conversion and storage (such as fuel cells, and batteries, photovoltaic cells) , In particular thin film solar cells), solid-state light emission (such as LEDs and OLEDs), magnetic and optical reservoirs, micro-electro-mechanical systems (MEMS) and micro-optical and micro-electro-mechanical systems (NEMS), micro-optical and optoelectronic devices, transparent substrates, architectural and automotive glass, metallization systems and packaging for metal and polymer foils, and mi A and nano-it includes application involving molding. More specifically, the present disclosure relates to insertion devices for a substrate coating system that includes an insertion element having a processing bench. The present disclosure also relates to methods for inserting an insertion element into a processing chamber.

Typically, in the part forming the processing chambers of coating systems, the equipment that may be needed to perform different processing steps is mounted on flanges, covers or directly mounted on walls inside the processing chamber. do. In order to perform servicing of these parts, the chamber is typically provided with a detachable cover, which is usually located on top and usually on the chamber opening. However, due to the placement and size of the components, maintenance in these types of systems is inconvenient and difficult task. As a result, long periods of downtime are unavoidable in this type of coating system when maintenance is required. In addition, other problems may arise with regard to sealing the chamber openings after maintenance has been performed.

In view of the above, insertion devices for a substrate coating system are provided. Also provided are methods for inserting an insertion element into a substrate coating system.

According to aspects of the present disclosure, an insertion apparatus includes an insertion element that operates within a coating system and includes a processing bench, the processing bench having a coating tool for applying a coating to a substrate. Adapted to receive; A carrier for carrying insertion elements; A first positioner collaborating with the carrier for inserting the insertion element into the processing chamber of the coating system and / or retracting the insertion element from the processing chamber; And a second positioner for fine positioning of the insertion element in the processing chamber.

According to another aspect of the present disclosure, an insertion apparatus for a substrate coating system is provided, wherein the insertion apparatus operates in a coating system and includes an processing element, wherein the processing bench applies a coating to the substrate. Adapted to receive a coating tool for application, a carrier for delivering the insertion element, and an electrical unit block for providing an operating voltage to the processing bench, the electrical unit block being movable with the carrier.

According to a further aspect of the present disclosure, an insertion apparatus for a substrate coating system is provided, wherein the insertion apparatus operates in a coating system and includes an processing element, the processing bench adapted to receive a coating tool. Adapted—a carrier coupled to the insertion element, a first positioner cooperating with the carrier to perform at least insertion of the insertion element into the processing chamber or withdrawal of the insertion element from the processing chamber, and a second adapted to engage the insertion element A positioner, wherein the second positioner is disposed in the processing chamber.

According to a further aspect of the present disclosure, a method is provided for inserting an insertion element in a substrate coating system, the method comprising placing an insertion element on a substrate, such that the electrical unit block is movable with the carrier. Positioning the electrical unit blocks in the coating system, and positioning the insertion element in the processing chamber of the coating system by displacing the carrier so that the electrical unit block is disposed.

According to another aspect of the present disclosure, a method for inserting an insertion element in a substrate coating system is provided, the method comprising disposing an insertion element on a carrier, grossing the insertion element in a processing chamber of the coating system. Grossly positioning, and finely positioning the insertion element in the processing chamber.

Embodiments relate to apparatuses comprising apparatus components for performing the disclosed methods and for performing each disclosed method step. These method steps may be performed by hardware components, a computer programmed by appropriate software, by any combination of the two, or by any other method. Embodiments also relate to methods in which the disclosed devices operate or in which the disclosed devices are fabricated. This includes method steps or manufacturing parts of the device for performing the functions of the device.

Further aspects, details, and advantages become apparent from the accompanying drawings and the dependent claims, the detailed description.

Some of the above disclosed and other more detailed aspects of the present disclosure are set forth in the following descriptions and particularly illustrated with reference to the drawings.
1A and 1B show embodiments of the insertion device disclosed herein in a schematic side cross-sectional view, in which the insertion element is in different positions with respect to the coating system.
2-4 show schematic side cross-sectional views of embodiments of an insertion device according to the present disclosure.
5A-5E illustrate an embodiment of an insertion device according to the present disclosure, wherein the figures show an operational sequence of the insertion device.
6 shows another embodiment of an insertion device according to the present disclosure in a schematic side cross-sectional view.
7 illustrates a processing fixture including a number of insertion devices in accordance with embodiments of the present disclosure.
8 shows in an enlarged view a typical insertion element that includes a processing bench for metal evaporation on a substrate.

 Reference is made in detail to various embodiments, one or more examples of which are illustrated in the drawings. Each example is provided by way of explanation and each example is not meant to be limiting of this disclosure. For example, features disclosed or illustrated as part of one embodiment may be used in other embodiments or in combination with them to yield another additional embodiment. This disclosure is intended to cover these modifications and variations.

In the following description of the drawings, like reference numerals are considered to be like components. In general, only differences are disclosed with respect to the individual embodiments.

Embodiments of the present disclosure provide an insertion apparatus for a system for coating a substrate, wherein the insertion apparatus includes an insertion element. A processing bench is placed on the insert element. The processing bench includes a coating tool used to apply the coating to the substrate. Typically, the coating tool may be for evaporation, in particular metal evaporation such as aluminum evaporation. The insertion device also includes a carrier for carrying the insertion element. Typically, the carrier can be used to insert insertion elements into and withdraw insertion elements from the processing chamber, or to perform both operations (ie insertion and withdrawal). Typically, the insertion element is mounted on the carrier. In some embodiments, the insertion element is movably mounted on the carrier. According to embodiments of the present disclosure, the insertion device includes first and second positioners. The first positioner may be used for gross positioning of the insertion element in the processing chamber. In particular, the first positioner cooperates with the carrier by gross positioning the carrier with respect to the chamber, such as to insert an insertion element into the chamber. In some embodiments, the second positioner is for fine positioning of the insertion element in the coating system. In addition, the insertion apparatus according to the present disclosure may include a link element for coupling the insertion element to the carrier.

Different processing tools may be arranged on the insertion element and thereby easily inserted into or withdrawn from the processing chamber. This simplifies the maintenance of the tools in the processing chamber and the operation of the coating system. In addition, coating systems using insertion elements are highly flexible, because the modularity of the system is enhanced.

Accuracy in positioning the insertion element in the processing chamber may be a problem in coating systems based on the use of the insertion elements. Accurate positioning of the insertion element in the chamber may be important to achieve uniform coating of the substrate, ie uniform thickness and quality of the layers coated on the substrate.

Accurate positioning of the insertion element can be complicated due to different problems, such as the mass of the coating tools mounted on the insertion elements. In particular, for some processing steps, such as the metal coating of the substrate, the weight of the item placed on the insertion element, such as evaporators or voltage generators, is high, making the precise placement of the insertion element in the chamber particularly difficult.

In particular, the implementation of metal evaporators such as aluminum evaporators in the insertion element can be difficult. This is typically due to the high mass of evaporation tools. In addition, integration in coating systems of high current transformers, which is typically required for metal evaporation, is difficult. Currently, aluminum coatings in insertion element based coating systems can be implemented using screen-printing techniques because the tools required for such methods are relatively light. However, when compared to aluminum evaporation, screen printing techniques yield lower yields, resulting in higher costs for the aluminum paste to be used and a large number of processing steps are required because of the large number of heating stages required.

FIG. 1A shows an embodiment of an insertion device in an open position. FIG. 1B shows an embodiment of the insertion device in the closed position. The two figures show the insertion devices in a schematic side cross-sectional view. In the open position, the insertion element is disposed outside the processing chamber. In the closed position, the insertion element is arranged such that the processing chamber is closed and the processing chamber is ready for operation.

As shown in FIG. 1A, the insertion element 100 includes a processing bench 120. Also, insertion element 100 is typically attached to carrier 110. Typically, the carrier is displaced through the first positioner 130. The second positioner 140 is disposed in the processing chamber 150. Typically, the processing chamber 150 forms part of a coating system. Typically, the insertion element 100 is introduced into the processing chamber 150 through the opening 155. Typically, the insertion element is configured such that when placed in the operating position, the opening 155 is closed by the insertion element 100 itself. In particular, the insertion element 100 can be designed such that the processing chamber 150 is sealed when the insertion device is in the closed position.

In typical embodiments of the present disclosure, the closed position of the insertion apparatus is achieved by i) gross positioning of the insertion element in the processing chamber, and ii) precise positioning of the insertion element in the processing chamber. . Typically, at the end of the precise positioning step, the processing chamber is closed. In particular, such as for vacuum operation of the coating system, the processing chamber can be closed in a sealable manner.

Typically, in order to introduce the insertion element 100 into the processing chamber 150 or to withdraw the insertion element 100 from the processing chamber 150, the carrier 110 generally has a first positioner 130. Can be displaced by sliding through). Thus, the carrier 110 along with the insertion element 100 can be grossly positioned relative to the processing chamber 150. In some embodiments, the first positioner 130 may be disposed outside the track, such as rails, railways or processing chamber 150, for positioning the insertion element 100 with respect to the processing chamber. The carrier 110 may include something similar to which it can be displaced.

If the insertion element 100 is disposed in the processing chamber 150, the insertion element 100 may be placed more accurately within the processing chamber 150 through the second positioner 140. The second positioner 140 may also include guiding elements, such as rails, railways or the like, which are typically disposed within the processing chamber 150. In this case, the insertion element 100 can be displaced thereon to be precisely positioned within the processing chamber 150.

As such, through the first positioner and the second positioner, the insertion element along with the processing bench can be placed in a position where the substrate coating system can conveniently operate.

By the combination of a gross positioner for the insertion of the insertion element and a fine positioner for the positioning of the insertion element in the coating system, the processing bench is very precise in the processing chamber (great exactitude) ) Can be positioned. Due to this, a coating with high uniformity over the entire surface of the substrate can be achieved. This combination is also effective when heavy rods are placed on the insertion element. In particular, this is the case when the processing bench is designed for metal evaporation, such as aluminum evaporation. Furthermore, even after maintenance of the elements and the insertion element thereon, or even after the replacement of the insertion element using the insertion apparatus according to the embodiments of the present disclosure, high reproducibility in the coating of the substrate can be realized.

In some embodiments, the first positioner 130 is comprised of guiding elements, such as rails, layways, conveyors or the like. Typically, these guiding elements are arranged outside the processing chamber 150. In particular, the rails or the like can be secured to the floor of the fixture on which the coating system is placed. In general, the rails are designed to support and displace heavy rods. Typical heavy rods supported by rails are at least 2 tons or 2.5 tons. Typically, the rails are a maximum load of 3.5 tons or a maximum load of 4 tons. However, the rails can be designed to support even higher rods. For processing chambers with lighter loads, such as 0.5 to 2.5 ton rod weights, which are to be displaced and supported by the first positioner, the rails may be properly designed to reduce the space and costs of the fixture. For gross positioning of the insertion element 100 in the processing chamber 150, the carrier 110 may slide on rails or the like. As such, the insertion element 100 is grossly positioned, ie coarsely positioned within the processing chamber 150. Furthermore, displacement elements, such as rollers or sliding devices, are typically disposed on the carrier 110 and coupled to the first positioner to facilitate gross positioning of the insertion element 100. Typical tolerances for gross positioning of the insertion element 100 through the first positioner 130 are at least ± 3.5 mm or ± 7.5 mm. Higher tolerance values may also be suitable for accurate functionalization of the coating system.

The mechanical force required for gross positioning of the carrier 110 may typically be generated by a drive system. The driving force can be generated by any kind of motor or the like. The drive system may be disposed outside of the carrier 110 itself or may form part of the first positioner 130. Alternatively, the drive systems can have different parts disposed on different elements of the insertion device. In some embodiments, coupling the mechanical force from the drive system to the carrier 110 may be accomplished through cable carriers, drag chains, energy chains, cable chains or the like.

In some embodiments, the second positioner 140 is comprised of rails, railways or the like. Typically, rails or the like may be secured to a component of the processing chamber 150. With respect to the positioning of the insertion element 100, the insertion element 100 can slide on rails or the like. It is also common for the insertion element 110 to include displacement elements, such as rollers or sliding devices. Typically, these elements are coupled to the second positioner 140 to facilitate precise positioning of the insertion element 100 within the processing chamber 150. Typical tolerances for precise positioning of the insertion element 100 through the second positioner 140 are at least ± 0.7 mm or ± 1.2 mm. Typical tolerances for precise positioning can be up to ± 2.7 mm or ± 3.4 mm.

Typically, the second positioner may include clamps or similar devices to secure the insertion element in the closed position. As such, the position of the insertion element and the processing bench in the processing chamber can be fixed to facilitate the operation of the system.

Typically, the second positioner 140 is disposed on the bottom surface of the processing chamber 150. Alternatively, the second positioner 140 may be disposed on a pedestal-type platform disposed in the bottom region of the processing chamber 150. In another exemplary embodiment of the system, the second positioner 140 is arranged in the lateral regions of the processing chamber 150.

For withdrawal of the insertion element 100 from the processing chamber 150, typically, by displacement of the carrier 110, i) insert with the processing bench 120 from the position where the processing chamber 150 operates. It is common to displace the element 100 and ii) withdraw the insertion element 100 together with the processing bench 120 from the processing chamber 150. The two operations can be implemented through the cooperation of the first and second positioners. Optionally, the withdrawal of the insertion element 100 can be effected in cooperation with the carrier 110 and the first positioner 130, in particular without the use of the second positioner 140.

To achieve different tasks, the insertion element can be displaced with respect to the carrier. Some of these tasks may include, for example, i) positioning the insertion element to be inserted or taken out through an opening in the processing chamber, ii) combining the second positioner with the insertion element, or iii) inserting. Displacement of the insertion element to facilitate maintenance or replacement of the element.

Typically, the insertion element is disposed on the carrier in the form of a cantilever structure. Because of this, the insertion element typically has the form of a projection beam or member supported at the end by the flange, and the flange is attached to the carrier. Typically, the flange is designed to function as a closing means of the processing chamber when the insertion element is inserted into the processing chamber in the operating position. By placing the insertion element as a cantilever structure, a free spac is maintained below the insertion element that facilitates maintenance of the components mounted thereon.

Alternatively, the insertion device may include more than one insertion element. In this case, it is common for the inserts to be horizontally aligned with each other. However, other configurations are also possible, such as a vertical arrangement of insertion elements, for example in which one insertion element is disposed over another insertion element. These insertion elements can be supported by the flange, which is attached to the carrier. Multiple insertion elements can be arranged on the flange forming the array-like structure. Different insertion elements may include processing benches designed to perform different processes on a substrate in the same processing chamber.

In addition, in some embodiments of the present disclosure, the insertion element is coupled to the carrier in a detachable manner. Due to this, the insertion element can be easily replaced and thus reduces downtime of the system during maintenance of the components disposed on the insertion element.

In some embodiments, the insertion element is movably coupled to the carrier via a link element. Typically, the link element comprises a hoist device with actuators and actuator devices for displacing the insertion element in relation to the carrier in any spatial direction.

The embodiment shown in FIG. 2 is similar to the embodiment shown in FIGS. 1A and 1B. The embodiment shown in FIG. 2 illustratively further includes a link element 160 for movably coupling the insertion element 100 to the carrier 110. Typically, the link element 160 is adapted to allow displacement of the insertion element 100 with respect to the carrier 110 in any spatial direction.

Hoist device 165 may be disposed within link element 160, within carrier 110, or within an insertion element. Typically, the hoist device 165 consists of couplings and a drive system for the operation of the insertion element 100. Typically, the drive system in hoist device 165 is based on an air cylinder system. In addition, other similar devices may be used in the drive system. In some specific implementations of the insertion apparatus, the hoist device 165 is designed for the displacement of the insertion element in only one spatial direction, in particular in the vertical or horizontal direction.

[0039] Through the link element, such as, for example, i) positioning of the insertion element such that it can be inserted or taken out through the opening of the processing chamber; The insertion element can be conveniently positioned to achieve different tasks, such as ii) engagement of the second positioner with the insertion element, and iii) displacement of the insertion element to facilitate maintenance or replacement of the insertion element.

Thus, via the link element, the insertion element can be positioned independently from the carrier, thereby increasing the flexibility of the system and the precision of the positioning of the insertion element within the coating system.

FIG. 3 shows the insertion element 100 separated from the carrier by a detaching device 170. Typically, the detaching device 170 consists of a crane arm or the like that can be coupled to the insertion element 100. 3 shows an exemplary configuration in which the insertion element 100 is separated from the link element 160. Through the detaching device 170, the insertion element 100 can be easily detached from the system for cases in which different process maintenance, replacement, or implementation is required in the processing chamber. Typically, the detaching device 170 is designed to accurately place the insertion element 100 in the link element 160. Typical load weights delivered by the separating device 170 are at least 0.5 ton or 1 ton. Typical rod weights may be approximately 1.5 tons.

Other configurations are possible, such as the insertion element can be linked directly to and separated from the carrier. Another possible configuration is that the insertion element is coupled to the carrier via a link element and the connection between the link element and the carrier can be separated. In this latter configuration, the insertion element together with the link element is separated from the carrier.

Typically, guides and locking mechanisms may be provided on the link element for removable engagement of the insertion element. In other typical configurations, such devices for removable coupling may have multiple elements provided on a carrier, insertion elements, or on different parts of the system.

By detachably coupling the insertion element to the carrier, the insertion element no longer in operation can be replaced by a ready-to-work insertion element. The insertion element replaced in this way can be serviced while each chamber is arranged to be operated again. In addition, if the operation of the coating system is to be changed, i.e. if a different process is to be carried out in the individual processing chambers or components of the system, the specific processing step can simply be changed by replacing the insertion element via the separating device.

In some embodiments, the insertion apparatus further includes an electrical unit block for providing an operating voltage and current to the processing bench, the electrical unit block can move with the carrier. In certain cases where the processing bench includes tools for evaporation of metals, the electrical unit is typically configured with a transformer to provide high current to the processing bench. The electrical unit can be arranged on the carrier. By way of example, a typical transformer weight for metal evaporation is at least 80 kg or at least 130 kg. As a specific example, a transformer with a maximum power flow of approximately 14 kVA is about 110 kg. Also, other transformers with different maximum powers are typically used depending on the process to be executed in the processing chamber.

4 shows a typical configuration of the insertion device, wherein the electrical unit 250 is disposed on the carrier 110. As a result, the electrical unit 250 is displaced together with the carrier 110. Typically, electrical unit 250 is electrically connected to processing bench 120 via electrical connection 260. Electrical connections 260 may provide a supply voltage or current for operation of processing bench 120. In addition, electrical connections 260 can be used to provide any other supply voltage or current required for operation of the coating system.

Typically, the electrical contact 260 may be attached to different elements of the insertion apparatus, in particular to the carrier 110, the insertion element 100, or both. In addition, the electrical connection 260 is typically comprised of flexible cables, in particular flexible copper bands. Due to this, the elements of the insertion device, in particular attached to the electrical connection 260, such as the carrier 110, the insertion element 100 and the processing bench 120, are mechanically separated from each other. This prevents the transmission of vibrations to the insertion element 100 via the electrical connection 260.

Typically, the electrical unit consists of a transformer for supplying voltage and current to operate any other component included in the processing bench or insertion element. Typically, the voltage and current generated by the electrical unit are related to the power requirements of the components of the insertion element from which electrical energy is provided. In addition, the electrical unit can be designed so that variable voltage and current can be supplied. Due to this, the electric unit can be compatible with different electric-supply requirements. More specifically, this makes the electrical unit compatible with different insertion elements designed to achieve different processing steps.

Placing the electrical unit to be able to move with the carrier is particularly desirable when the operating input to the processing bench is high current, since fairly large transformers are required. Such huge transformers are typically difficult to place inside the processing chamber. Thus, in conventional systems, these huge transformers are typically fixed outside the chamber. This can cause problems associated with cabling, such as the use of long cables, especially when elements connected to the electrical unit are taken out of the processing chamber via the insertion device. This is particularly relevant when the electrical unit generates a high current, such as for metal evaporation. In this case, high currents can cause space problems because bulky cabling is typically used for this case. In addition, cables for high currents disposed within the processing chamber can cause interference to other system components disposed within the processing chamber.

Moving the electrical unit with the carrier is desirable for the operation of the insertion device disclosed in this disclosure. First, the operation of the coating system is simplified because the wiring is reduced, which eliminates the need to separate the components in the insertion element from the electrical unit when maintenance is required. In addition, such cables can be advantageously implemented since they can be disposed almost entirely outside the processing chamber. In particular, the use of long cables for the electrical connection is avoided because the spacing between the electrical unit and the processor bench remains essentially unchanged. This makes the operation of the insertion device more stable, since these cables typically carry high currents. In addition, accurate positioning of the insertion element is facilitated, since the high weight of the electrical unit is typically displaced by a first positioner adapted to hold high weights and does not interfere with the precise positioning of the insertion element.

In addition, in the insertion apparatus, it may be particularly desirable to combine a) an electrical unit arranged to move with the carrier, and b) the first and second positioners. Due to this, the electric unit can be displaced with the carrier via the first positioner. This also allows the insertion element to precisely position the electrical unit independently. In this way, even in very large cases the electrical unit does not interfere with the correct placement of the insertion element in the processing chamber. Also, due to this, the electrical connection between the electrical unit and the insertion element can preferably be implemented so that the cabling does not interfere upon the precise positioning of the insertion element in the processing chamber.

For some applications, especially for applications where the processing bench is for metal evaporation such as aluminum evaporation, the electrical connections may be designed to conduct high-current. Typical currents conducted through electrical connections are up to 800 A, more typically up to 1000 A or even 1170 A. The typical electromotive force generated by the electrical unit to generate a current is about 12V. However, other voltages may be applied to generate current.

For some specific applications, the electrical connection may be connected to the processing bench via a multi-contact connector but not directly attached to the elements of the insertion apparatus. In this case, the electrical connection between the components of the insertion element and the electrical unit can be realized by the vertical displacement of the insertion element.

If the processing bench comprises coating tools for evaporation of metals, in particular aluminum, evaporation, the current for metal evaporation is typically high, in particular at least 600 A or 650 A. Typical currents for metal evaporation can be up to 950 A or 1000 A. Due to these high-current values, the electric unit for this kind of applications can be particularly large. The minimum weight of the electric unit for the particular case of aluminum evaporation is typically 0.8 tonnes, such as 1.1 tonnes.

Typically, the insertion element and coating system are designed such that the planar substrate is delivered in an essentially horizontal form through the processing chambers. Nevertheless, this disclosure is intended to take into account the vertical guidance of the substrate.

By the insertion apparatus disclosed in the embodiments of the present disclosure, the relative position between the substrate and the coating tools can be reproduced with considerable precision when the insertion element is placed in an operating position for processing of the substrate. The high positioning accuracy of the insertion element is particularly important for systems in which the coating is implemented pseudo-statically. By pseudo-static coating, the substrate to be coated is transferred to a coating position that remains stationary during the coating process. In addition, the high positioning accuracy of the insertion element ensures high reproducibility in the processing of multiple substrates even after the removal of the insertion element and the maintenance of tools placed on the insertion element.

Typically the insertion element comprises substrate transfer devices for transferring the transfer of the substrate. Substrate transport devices can be rollers or any other kind of conveyor device that allows the substrate to be moved. Such substrate transfer devices can form part of an insertion element. Alternatively, the substrate transfer device may be attached to the insertion element before the insertion element is inserted into the processing chamber or once the insertion element is in the processing chamber. Typical substrates include bands, slices or wafers of materials such as metals, insulators, or semiconductors.

The insertion element may include a drive system that generates a torsional moment for operation of the substrate transfer device. Typically, the torsional moment is transmitted through belts or similar devices for the transfer of the substrate. Typically, the substrate transfer device comprises transfer rollers to which the transferred twist moment is coupled. Typically, the twist moment generated by the drive system is connected to the substrate transfer device through magnetic coupling. Magnetic bonding allows for a letting free room between the substrate and the material to be coated. This makes it easy for the components of the coating system to not be coated during processing of the substrate (see FIG. 5E below). In addition, contact-free couplings, such as magnetic coupling, prevent wear of the actuating elements to be joined.

Typically, the substrate is loaded onto a conveyor that cooperates with the substrate transfer device. Typically, the conveyor can be placed on stub transfer rollers. Typically, only the outer boundaries of the conveyor are in contact with the stub feed rollers. This leaves free space below the substrate that can be used to coat the material on the substrate by evaporation, sputtering or other coating methods known in the art. Inside the processing chamber, in particular one or more couplings for coupling the substrate with the transfer devices, which can be attached to the insertion element, can be arranged. Components of the drive system and substrate transfer device may be protected by shields to prevent pick-up of the coating material for convenience.

The use of insertion elements reduces the number of devices that must be placed in a fixed form inside the processing chamber. Typically, all the elements that are essentially maintained inside the chamber are process-monitoring sensors and transfer-roller couplings. Thus, in principle, only those components that are not required to be regularly accessed in the processing chamber are mounted. Typically, the processing chamber and insertion element are designed such that processing of the substrate can be performed under vacuum conditions.

In typical embodiments, the coating tools are intended for evaporation of the coating material, especially for metals such as aluminum. However, embodiments according to the present disclosure are intended to include tools in connection with other coating techniques, such as, for example, sputtering of a coating, or the use of an ion source for primary or sequential processing of a substrate. In general, the coating tools can be used for maintenance purposes as soon as the insertion element is taken out of the processing chamber.

Typically, additional coating-system components are integrated within the insertion element, more specifically within the processing bench. Such coating-system components may generally undergo process-induced wear, dirt pick-up or are exposed to the coating material. In embodiments in accordance with the present disclosure, all such components are easily accessible.

Typically, the insertion element comprises a device, such as a cooling plate or the like, for cooling the components for shields, screens and / or coatings. The insertion element may also be supplied with a cooling medium which is guided through the lines to the corresponding components to be cooled.

In addition, the insert element forming part of the typical embodiments optionally provides cooling water for connections for media supply, for supply or discharge connections for gas supply, shields or cathodes. Supply or discharge connections, or supply or discharge connections for voltage. Such connections and lines may be provided in the insertion element portion, which may be located outside the processing chamber of the coating system.

[0065] An insert element forming part of an insertion apparatus, as disclosed by typical embodiments, typically includes shields, screens, or a combination of both. The insertion element may be structured in such a way that the screens are attached to appropriate points to prevent the interior of the processing chamber or other components from being affected by debris pick-up. In this way, the coating material cannot reach the space outside the insertion element.

Typically, the processing bench into which the coating tools are integrated is configured to form an evaporator drawer mounted on the insertion element. Typically, the evaporator drawer includes a wire feeder for feeding the coating material to be evaporated within the coating system. In general, the coating material is heated in an evaporator boat arranged in a drawer to allow efficient evaporation of the material. Typically, heating is accomplished by coupling a current to an electrically conductive material that forms part of the evaporator boat. Also, shutters are typically arranged on the processing bench to control the exposure of the substrate to the coating material to be evaporated. The evaporator drawer may also include a device for cooling the shields, screens and / or other components for the coating. The evaporator drawer may be supplied with a cooling medium that is guided through the lines to the corresponding components that will typically be cooled.

FIG. 8 shows in an enlarged view an exemplary implementation of an insertion element 500 that is compatible with the embodiments disclosed herein. According to still other embodiments, not all of the elements shown in FIG. 8 are required, but are illustratively illustrated in the drawing of FIG. 8. In particular, the insertion element 500 shown in FIG. 8 is a typical design for evaporation of materials. In particular, insertion element 500 is a typical design in which coating tools are mounted to form an evaporator drawer. Insertion element 500 includes a flange 530 to which elements of the processing bench are attached. Processing bench 500 generally includes a frame. Typically, the frame is for supporting the evaporation boat 550 where evaporation takes place. Typically, the material to be evaporated is provided to the evaporation boat via feeder 540. Typically, the material is provided in the form of a wire. In addition, a drive system 560 is disposed on the frame to drive the substrate to be coated. Typically, insertion element 500 further includes a protective shield 520 to prevent coating of elements in drive system 560. In addition, the insertion element 500 may include a cooling plate 510 to prevent excessive heating of other components in the processing chamber. Also, a shutter 570 is typically arranged to control the exposure of the substrate to the evaporated coating material.

5A-5E show exemplary implementations of an insertion device in accordance with the present disclosure in different operating configurations. The figures show that the insertion device may comprise a sensor system including at least one sensor for sensing the conditions of the coating system or the position of the elements of the insertion device. Such a set of sensors typically includes, for example, a first hoist positioning sensor 190 that detects an upper position of the insertion element 100; A second hoist positioning sensor 230 which typically detects a lower position of the insertion element 100; A carrier positioning sensor 200 that typically detects relative positions of the carrier 110 in relation to the processing chamber 150; And typically a closed detection sensor 270 that detects when the processing chamber 150 is closed. In addition, these sensors can be used independently or combined in other forms. The sensor system may also include detectors and / or additional sensors for detecting different configurations of the coating system. Such sensors may consist of any kind of position sensors based on optical, electrical, electro-chemical, or electro-magnetic means. In particular, these lines can consist of switches that mechanically detect the position of different elements of the insertion device.

The insertion apparatus shown in FIGS. 5A-5E further includes a gross positioning driver 210 for driving the sliding device 220. Because of this, the carrier 110, together with the insertion element 100, is typically arranged in cooperation with the first positioner 130 in the horizontal direction for insertion or withdrawal of the insertion element 100 in relation to the processing chamber 150. do. Typically, positioning driver 210 and sliding device 220 include frequency converters and brakes to control the positioning of carrier 110. Typically, the sliding device 220 consists of wheels. In addition, the embodiments shown in FIGS. 5A-5E include a magnetic coupler 180 for coupling the driving force to the insertion element. Typically, this driving force is applied to deliver the substrate.

Embodiments of the insertion device shown in FIGS. 5A-5E operate as follows:

In the initial state, the carrier 110 along with the insertion element 100 and the processing bench 120 are in a maintenance position as shown in FIG. 5A. In this step, the processing chamber 150 is opened.

The carrier 110 is maintained in the maintenance position while the insertion element 100 is displaced vertically by the hoist device 165. As such, the insertion element 100 is vertically displaced by the hoist device 165 so that it can be inserted into the processing chamber 150 through the opening 155 as shown in FIG. 5B (see arrows in FIG. 5A). Typically, hoist device 165 consists of compressed air cylinders or the like. Typically, the insertion element 100 is displaced vertically until the first hoist positioning sensor 190 detects the position where the insertion element 100 is vertically aligned along the upper land rand of the opening 155. do. In this step, the insertion element 100 is typically displaced in the vertical direction at intervals of 10 mm to 50 mm, such as 20 mm to 40 mm.

In a further step, the carrier 110 is grossly positioned in the chamber as shown in FIG. 5C. As a result, the carrier 110 is horizontally displaced such that the insertion element 100 is introduced into the processing chamber 150. Typically, the carrier positioning sensor 200 detects when the carrier 110 is grossly positioned such that the horizontal distance between the flange and the opening 155 is between 70 mm and 130 mm, such as between 85 mm and 115 mm. .

In another further step, the insertion element 100 is lowered by the hoist device 165 such that the insertion element 100 is placed in contact with the second positioner 140 as shown in FIG. 5D. Typically, this position of insertion element 100 is detected by second hoist positioning sensor 230. Typically, by this step, the insertion element 100 is lowered from 10 mm to 50 mm, such as 20 mm to 40 mm.

In the final step, the gross positioning actuator (S) is slid to cooperate with the second positioner 140 until the insertion element 100 reaches the end position, ie the closed position of the insertion device, as shown in FIG. 5E. The carrier 110 is displaced via 210. Typically, when the end position is reached, coupler 180, such as a magnetic coupler, engages with insertion element 100. This allows the driving force to be transmitted to the drive system of the insertion element. Such drive systems are typically for delivering substrates during the coating process. When this position is reached, the processing chamber 150 is closed and sealed to allow vacuum conditions to be created inside the chamber if necessary. Typically, when the end position is reached, the substrate carrier 240 is introduced into the processing chamber 150 through the transfer system. In particular, at this point, the coating system can operate for coating of the substrate.

Preferably, the insertion device operates automatically through the control system. In particular, the insertion and extraction of the insertion element can be performed automatically via a control system such as a computer in communication with the different components of the insertion device and programmed by appropriate software. However, the insertion device can also be operated manually.

In some embodiments, the insertion apparatus further includes a clamping system for clamping the insertion element in the processing chamber. Due to this, precise positioning of the insertion element in the processing chamber is complemented by the clamping system. Typically the clamping is performed by a clamping device which fixes the position of the insertion element in the processing chamber. In particular, the clamping device may consist of a magnetic clamping device, a mechanical clamper or the like.

The clamping system may form part of the second positioner. In this particular case, the clamping system cooperates with other devices, such as sliding elements or the like, which can cooperate with track elements in the processing chamber, or as a standalone device, for precise positioning of the insertion element. Can be done. In particular, the combination of the elements of the second positioner and the clamping system can enhance the precise positioning capability of the insertion device.

FIG. 6 shows embodiments of an insertion apparatus and the second positioner 140 includes a clamping device 330. The clamping device 330 is for securing the insertion element 100 in the end position. This facilitates precise positioning of the insertion element 100 in the chamber. The insertion element can include a securing element 340 that can be coupled to the clamping device 330.

Typically, the coating system may include several processing chambers. For this case, the use of several insertion elements in a single fixture in accordance with the present disclosure creates a modular system that can be easily replaced by a unit in which complete processing stations are fully mounted. Thus, the great exactness with which the insertion elements can be placed in the processing chamber allows the coating tools to be replaced very quickly without degrading the performance of the system. This has been found to be particularly desirable since the intervals during which target replacement to be performed are performed may vary for different insertion elements designed for different tasks.

In a coating system comprising a plurality of processing chambers, the configuration of the insertion elements on one side of the aligned processing chambers is in principle feasible. Indeed, sufficient working space is provided each time the insert is pulled out, making it possible to work on the withdrawn inserts simultaneously. However, whenever the insert is moved further away from the system to the workstation, work can be performed simultaneously on all insert elements. In principle, the configuration of insertion elements on both sides of the processing chamber is also possible.

FIG. 7 shows a typical configuration of a coating system 500 that includes multiple processing chambers 150. Some of the processing chambers 150 include an insertion apparatus according to the present disclosure. In particular, FIG. 7 illustrates a typical implementation of embodiments in accordance with the present disclosure, wherein the first positioner consists of guides 130, such as rails or the like, which is adjacent to the processing chambers 150. And on the floor of the fixture. 7 shows that multiple insertion devices according to the present disclosure can be combined into a single coating fixture.

In particular, the processing bench of the insertion apparatus according to the present disclosure can be adapted for the manufacture of thin film solar cells. In this case, the processing bench can be designed to perform metallization of thin film solar cells. As such, metallization of the thin film solar cell can yield a layer consisting of aluminum, silver, nickel, copper, or a layer sequence of different metals, for example. In particular, the devices and / or methods disclosed herein may be used to calculate back contact of a solar cell, such as a thin film solar cell.

While the foregoing has been directed to embodiments of the present disclosure, other and further embodiments may be devised without departing from the basic scope of the invention, the scope of the invention being determined by the claims that follow.

This written disclosure discloses the disclosure and uses examples including a best mode to enable those skilled in the art to make and use the disclosure. Although the embodiments have been disclosed in connection with various specific embodiments, those skilled in the art will recognize that the present disclosure may make changes within the scope and spirit of the claims. In particular, mutually non-limiting features of the embodiments disclosed above can be combined with each other. The patentable scope of embodiments is defined by the claims, and may include other examples that occur to those skilled in the art. These other examples are within the scope of the claims if they have structural elements that do not differ from the literal language of the claims, or if they have equivalent structural elements with insubstantial differences from the literal language of the claims. It is intended.

Claims (15)

As an insert device for a substrate coating system,
An insertion element 100 operating within a coating system, the insertion element comprising a processing bench 120, the processing bench 120 adapted to receive a coating tool for applying a coating to a substrate;
A carrier 110 for conveying the insertion element 100,
Cooperate with the carrier 110 to insert the insertion element 100 into the processing chamber 150 of the coating system and / or to retract the insertion element 100 from the processing chamber 150. (collaborating) first positioner 130, and
Second positioner 140 for fine positioning of the insertion element 100 in the processing chamber 150.
Including, the insertion apparatus for a substrate coating system. The method of claim 1,
And an electrical unit block (250) for providing an operating voltage to the processing bench (120), wherein the electrical unit block (250) is movable with the carrier (110). The method of claim 2,
And a multi-contact connection for establishing electrical contact between the processing bench (120) and the electrical unit block (250). The method of claim 3, wherein
The multi-contact connection is such that the insertion element 100 causes the insertion between the electrical unit block 250 and the components of the insertion element 100 by, for example, vertical displacement of the insertion element 100. An insertion device for a substrate coating system, adapted to establish an electrical contact when the electrical contact is displaced through a multi-contact connection to a set position. The method according to any one of claims 1 to 4,
At least one of the first and second positioners (130; 140) comprises guiding elements. As an insert device for a substrate coating system,
An insertion element 100 operating within a coating system, the insertion element comprising a processing bench 120, the processing bench 120 adapted to receive a coating tool for applying a coating to a substrate;
A carrier 110 for conveying the insertion element 100,
An electrical unit block 250 for providing an operating voltage to the processing bench 120, wherein the electrical unit block 250 is movable with the carrier 110
Including, the insertion apparatus for a substrate coating system. The method according to any one of claims 1 to 6,
The insertion element (100) is an insertion device for a substrate coating system, is movably coupled with the carrier (110). The method according to any one of claims 1 to 7,
The processing bench (120) preferably comprises a coating tool for applying the coating to the substrate by evaporation of the coating material. The method according to any one of claims 1 to 8,
The inserting element (100) is detachably coupled to the carrier (110). The method according to any one of claims 1 to 9,
And at least one of cable carriers, drag chains, energy chains, cable chains or the like for generating a mechanical force for insertion or withdrawal of the insertion element. The method according to any one of claims 1 to 10,
While inserting the insertion element 100 into the processing chamber 150 and / or withdrawing the insertion element 100 from the processing chamber 150, the position of the insertion element 100 and the carrier is adjusted. An insertion device for a substrate coating system, further comprising at least one sensor for detection. The method according to any one of claims 1 to 11,
The processing bench (120) is adapted to create a back contact in the manufacture of a solar cell. A method for inserting an insertion element 100 into a substrate coating system,
The insertion element includes a processing bench 120, the processing bench 120 including a coating tool for applying a coating to a substrate, the method comprising
Disposing the insertion element 100 on a carrier 110,
Placing the electrical unit block 250 in the substrate coating system such that the electrical unit block 250 moves with the carrier 110, and
Positioning the insertion element 100 in the processing chamber 150 of the coating system by displacing the carrier 110 such that the electrical unit block 250 is also displaced.
Comprising a insert element (100) in a substrate coating system. A method for inserting an insertion element 100 into a substrate coating system,
The insertion element includes a processing bench 120, the processing bench 120 including a coating tool for applying a coating to a substrate, the method comprising
Disposing the insertion element 100 on a carrier 110,
Grossly positioning the insertion element (100) in the processing chamber of the coating system; And
Precisely positioning the insertion element 100 in the processing chamber 150
Comprising a insert element (100) in a substrate coating system. The method according to claim 13 or 14,
Wherein the insertion is performed automatically through a control system.

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