KR20110093335A - Substrait inspection apparatus improved opticalefficiency - Google Patents

Substrait inspection apparatus improved opticalefficiency Download PDF

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KR20110093335A
KR20110093335A KR1020100013312A KR20100013312A KR20110093335A KR 20110093335 A KR20110093335 A KR 20110093335A KR 1020100013312 A KR1020100013312 A KR 1020100013312A KR 20100013312 A KR20100013312 A KR 20100013312A KR 20110093335 A KR20110093335 A KR 20110093335A
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light
substrate
inspection apparatus
optical system
light source
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KR1020100013312A
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Korean (ko)
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KR101197706B1 (en
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민상식
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엘아이지에이디피 주식회사
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's

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  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE: A substrate inspection apparatus is provided to secure the uniformity of light transmitted from a light source and improve the optical efficiency. CONSTITUTION: A substrate inspection apparatus(100) comprises an optical system(150) which includes a light source, a light mixing part, an illuminating part, and a camera. The light mixing part makes the light transmitted from the light source uniform. The illuminating part receives the uniform light from the light mixing part. The camera obtains an image of a substrate.

Description

광균일도가 향상된 기판검사장치{SUBSTRAIT INSPECTION APPARATUS IMPROVED OPTICALEFFICIENCY}Substrate inspection device with improved optical uniformity {SUBSTRAIT INSPECTION APPARATUS IMPROVED OPTICALEFFICIENCY}

본 발명은 광 균일도가 향상된 기판검사장치에 관한 것으로서, 보다 상세하게는 광 균일도가 향상되고, 광 효율이 개선된 기판검사장치에 관한 것이다. The present invention relates to a substrate inspection apparatus having improved light uniformity, and more particularly, to a substrate inspection apparatus having improved light uniformity and improved light efficiency.

기판을 검사하는 장치의 일예로서, 컬러 필터 패턴 자동광학검사(Automated Optical Inspection:이하 AOI) 시스템은 컬러 필터 기판(Color Filter substrate)의 미세한 패턴 결함을 정밀한 카메라에 의해 고속으로 검출하고, 검출된 결함을 실시간으로 재생, 저장 가능한 제품으로, 다양한 모델의 기판(Multi Model Substrate)에 대응이 가능하며, 사용자 운영하기 쉬운 소프트웨어와 인라인(Inline) 및 독립적으로 운영(Stand alone)이 가능한 검사 장비이다.As an example of an apparatus for inspecting a substrate, the color filter pattern Automated Optical Inspection (AOI) system detects minute pattern defects of a color filter substrate at high speed by a precise camera and detects the detected defects. It is a product that can reproduce and save in real time, and it can cope with various model substrates, and it is a test equipment that can be easily operated by the user, inline and stand alone.

도 1을 참조하여 종래의 일반적인 기판검사장치(100)를 설명한다. A conventional general substrate inspection apparatus 100 will be described with reference to FIG. 1.

도시된 바와 같이, 기판검사장치(100)는 기판이 안착되는 스테이지와, 상기 기판을 검사한 광학계(150), 상기 기판의 상부에서 상기 카메라를 이동시키는 갠트리(140)를 포함한다. 또한 상기 스테이지는 설치장치의 바닥면 상에 구비되는 베이스플레이트(110)와, 상기 베이스플레이트상에 올려지는 석정반(120)과, 상기 석정반상에 올려져서 기판(S)을 부상시키는 부상유닛(130)을 포함한다. 또한 상기 광학계(150)는 기판의 이미지를 획득하는 카메라와 조명수단을 포함한다. As shown, the substrate inspection apparatus 100 includes a stage on which the substrate is seated, an optical system 150 inspecting the substrate, and a gantry 140 for moving the camera on the upper portion of the substrate. In addition, the stage includes a base plate 110 provided on the bottom surface of the installation apparatus, a stone plate 120 mounted on the base plate, and a floating unit mounted on the stone plate to float the substrate S ( 130). The optical system 150 also includes a camera and lighting means for acquiring an image of the substrate.

또한 상기 부상유닛(130)은 상기 카메라(150)의 검사영역에서 난반사 및 이로 인한 이미지 저하를 방지하기 위하여 슬릿(131)이 형성된다. In addition, the floating unit 130 is formed with a slit 131 to prevent diffuse reflection and deterioration of the image in the inspection area of the camera 150.

도 2를 참조하여 종래의 광학계(150)를 설명한다. A conventional optical system 150 will be described with reference to FIG. 2.

도시된 바와 같이, 종래의 광학계(150)는 광원(151)과, 광 전달부(152)와, 선형의 광 안내부(153)와, 하프미러(154)를 포함한다. As shown, the conventional optical system 150 includes a light source 151, a light transmitting unit 152, a linear light guide unit 153, and a half mirror 154.

상기 광 전달부(152)는 상기 선형의 광 안내부(153)로 광을 전달하는 구성요소이며, 상기 광 안내부(153)는 광원(151)으로부터 전달된 광을 출사하는 구성요소이다. 이와 같이 광 안내부(153)로부터 출사된 광은 상기 하프미러(154)를 통해 기판을 향해 조사된다. The light transmitting unit 152 is a component that transmits light to the linear light guide unit 153, and the light guide unit 153 is a component that emits light transmitted from the light source 151. In this way, the light emitted from the light guide unit 153 is irradiated toward the substrate through the half mirror 154.

그러나 이와 같이 구성된 종래의 광학계는 광 균일도가 떨어져서 카메라가 고퀄리티의 기판 이미지를 획득하는 것을 어렵게 한다. 또한 광 손실율이 크다는 문제점도 있다. However, the conventional optical system configured as described above has a poor light uniformity, making it difficult for the camera to obtain a high quality substrate image. There is also a problem that the light loss rate is large.

본 발명은 상술한 문제점을 해결하기 위하여 안출된 것으로서, 본 발명의 목적은 광 균일도가 향상되고, 광 효율이 개선된 기판검사장치를 제공함에 있다. SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a substrate inspection apparatus with improved light uniformity and improved light efficiency.

위와 같은 기술적 과제를 해결하기 위하여 본 발명에 의한 기판검사장치는 광학계로부터 기판의 이미지를 획득하여 기판을 검사하는 장치에 있어서, 상기 광학계는, 광원과, 상기 광원으로부터 전달된 광을 균일하게 하는 광 혼합부와, 상기 광 혼합부로부터 균일한 광을 전달받는 광조사부와, 상기 기판의 이미지를 획득하는 카메라를 포함하는 것을 특징으로 한다. In order to solve the above technical problem, the substrate inspection apparatus according to the present invention obtains an image of a substrate from an optical system and inspects the substrate. The optical system includes a light source and a light uniforming light transmitted from the light source. And a mixing unit, a light irradiation unit receiving uniform light from the light mixing unit, and a camera acquiring an image of the substrate.

또한 상기 광조사부는 소정길이를 갖고 석영재질로 형성되는 것이 바람직하다. In addition, the light irradiation part is preferably formed of a quartz material having a predetermined length.

또한 상기 광 혼합부는 한 쌍이 구비되며, 각각의 상기 광 혼합부가 상기 로드부 양측 단부에 혼합된 광을 전달하는 것이 바람직하다. In addition, the light mixing unit is provided with a pair, it is preferable that each of the light mixing unit to transmit the light mixed at both ends of the rod.

또한 상기 광원은 LED(Light Emitting Diod)인 것이 바람직하다.In addition, the light source is preferably an LED (Light Emitting Diod).

또한 상기 광조사부의 전방에는 집광렌즈가 더 구비되는 것이 바람직하다. In addition, it is preferable that a condenser lens is further provided in front of the light irradiation part.

본 발명에 따르면, 광 균일도를 확보할 수 있고, 광효율성을 향상시킬 수 있다. According to the present invention, light uniformity can be ensured and light efficiency can be improved.

도 1은 종래 기판검사장치를 나타낸 것이다.
도 2는 도 1에 도시된 기판검사장치의 광학계를 나타낸 것이다.
도 3은 본 발명에 의한 기판검사장치의 광학계를 나타낸 것이다.
도 4 및 도 5는 도 3에 도시된 광학계의 요부를 나타낸 것이다. 1 shows a conventional substrate inspection apparatus.
FIG. 2 shows an optical system of the substrate inspection apparatus shown in FIG. 1.
Figure 3 shows the optical system of the substrate inspection apparatus according to the present invention.
4 and 5 show main parts of the optical system shown in FIG. 3.

이하, 첨부된 도면을 참조하여 본 발명에 의한 기판검사장치의 구성 및 작용을 설명한다. Hereinafter, with reference to the accompanying drawings will be described the configuration and operation of the substrate inspection apparatus according to the present invention.

도 3을 참조하면, 본 발명에 의한 기판검사장치의 광학계(50)는 카메라(미도시)와, 광원(51)과, 광 혼합부(53)와, 광조사부(55)와, 집광렌즈(56)를 포함한다. 3, the optical system 50 of the substrate inspection apparatus according to the present invention includes a camera (not shown), a light source 51, a light mixing unit 53, a light irradiation unit 55, and a condenser lens ( 56).

본 실시예는 광강도(Light intensity)를 안정화하기 위하여 광원(51)으로 복수의 LED를 구비한다. This embodiment includes a plurality of LEDs as the light source 51 to stabilize the light intensity.

또한 상기 광혼합부(53)는 상기 복수의 광원(51)으로부터 전달된 광을 균일하게 혼합하는 구성요소로서, 도 4를 참조하면, 상기 광혼합부(53)의 일측에는 상기 광원(도 3의 51참조)으로부터 광을 전달받는 한 쌍의 제1광섬유(52a)가 연결되고, 타측에는 상기 한 쌍의 제1광섬유(52a)가 혼합되어 상기 광조사부(55)로 전달하는 하나의 제2광섬유(54)가 연결된다. In addition, the light mixing unit 53 is a component that uniformly mixes the light transmitted from the plurality of light sources 51. Referring to FIG. 4, one side of the light mixing unit 53 is the light source (FIG. 3). A pair of first optical fibers 52a receiving light from the second optical fiber 52a are coupled to each other, and the second pair of first optical fibers 52a is mixed and transmitted to the light irradiation part 55. The optical fiber 54 is connected.

도 5를 참조하면, 상기 광조사부(55)는 석영재질로서 소정길이를 갖는 원통형상으로 형성되며, 출사되는 광을 안내하기 위한 광가이드부(57)가 감싸고 있다. Referring to FIG. 5, the light irradiation part 55 is formed in a cylindrical shape having a predetermined length as a quartz material, and is surrounded by an optical guide part 57 for guiding the emitted light.

상기 집광렌즈(56)는 상기 광조사부(55)로부터 출사되는 광을 집광하는 기능을 한다. 이를 통해 기판에 조사되는 광의 너비(width)를 조절할 수 있다. The condenser lens 56 functions to condense the light emitted from the light irradiator 55. Through this, the width of the light irradiated onto the substrate can be adjusted.

이와 같이 구성된 본 실시예는 복수의 광원(51)으로부터 전달된 광이 광혼합부(53)에서 균일하게 혼합되어 광 균일도(Light Uniformity)가 90%이상 확보된다. In this embodiment configured as described above, the light transmitted from the plurality of light sources 51 is uniformly mixed in the light mixing unit 53 to ensure light uniformity of 90% or more.

이와 같이 균일하게 혼합된 광은 광조사부(55)에 전달되어 기판을 향해 조사되고, 이를 통해 카메라가 기판의 이미지를 획득하여 기판을 검사하는 것이다.
The uniformly mixed light is transmitted to the light irradiation unit 55 and irradiated toward the substrate, through which the camera acquires an image of the substrate and inspects the substrate.

Claims (5)

광학계로부터 기판의 이미지를 획득하여 기판을 검사하는 장치에 있어서,
상기 광학계는,
광원과,
상기 광원으로부터 전달된 광을 균일하게 하는 광 혼합부와,
상기 혼합부로부터 균일한 광을 전달받는 광조사부와,
상기 기판의 이미지를 획득하는 카메라를 포함하는 것을 특징으로 하는 기판검사장치.
An apparatus for inspecting a substrate by obtaining an image of the substrate from an optical system,
The optical system,
Light source,
A light mixing unit for uniforming the light transmitted from the light source,
A light irradiation unit receiving uniform light from the mixing unit;
And a camera for acquiring an image of the substrate.
제1항에 있어서,
상기 광조사부는 소정길이를 갖고 석영재질로 형성되는 것을 특징으로 하는 기판검사장치.
The method of claim 1,
And the light irradiation part has a predetermined length and is formed of a quartz material.
제2항에 있어서,
상기 광 혼합부는 한 쌍이 구비되며, 각각의 상기 광 혼합부가 상기 광조사부의 양측 단부에 혼합된 광을 전달하는 것을 특징으로 하는 기판검사장치.
The method of claim 2,
The light mixing unit is provided with a pair, each of the light mixing unit substrate inspection apparatus, characterized in that for transmitting the mixed light to both ends of the light irradiation unit.
제1항에 있어서,
상기 광원은 복수개의 LED(Light Emitting Diod)인 것을 특징으로 하는 기판검사장치.
The method of claim 1,
The light source is a substrate inspection apparatus, characterized in that a plurality of LED (Light Emitting Diod).
제1항에 있어서,
상기 광조사부의 전방에는 집광렌즈가 더 구비되는 것을 특징으로 하는 기판검사장치. The method of claim 1,
And a condenser lens further provided in front of the light irradiation part.
KR1020100013312A 2010-02-12 2010-02-12 Substrait inspection apparatus improved opticalefficiency KR101197706B1 (en)

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