KR20110078255A - Wet station for reusing and deviding liquid with estimating liquid appartus - Google Patents
Wet station for reusing and deviding liquid with estimating liquid appartus Download PDFInfo
- Publication number
- KR20110078255A KR20110078255A KR1020090135015A KR20090135015A KR20110078255A KR 20110078255 A KR20110078255 A KR 20110078255A KR 1020090135015 A KR1020090135015 A KR 1020090135015A KR 20090135015 A KR20090135015 A KR 20090135015A KR 20110078255 A KR20110078255 A KR 20110078255A
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- South Korea
- Prior art keywords
- line
- solution
- recovery
- way valve
- reuse
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
Abstract
The present invention provides a solution tank, a drain line connected to the solution tank to become a movement path of the chemical liquid or deionized water, and a first branch of the chemical liquid or deionized water connected to one side of the drain line to the wastewater line or the recovery / reuse line. A three-way valve, a second three-way valve connected to one side of the recovery / reuse line for branching the moved chemical or deionized water to a recovery line or reuse line, the chemical liquid connected to one side of the waste water line to the first wastewater line or A third three-way valve branching to the second wastewater line, a first densitometer installed on the drain line, a second densitometer installed on the recovery / reuse line, and a third installed on the wastewater line to measure the concentration of the chemical liquid or deionized water It is determined whether or not drainage, recovery and recycling of the chemical liquid or deionized water according to the concentration meter and the concentration measured by the concentration meter. The third three-way with a solution of an evaluation device that comprises a solution of an evaluation device for controlling the valve, characterized in providing a station that can wet chemical separation and re-use.
Wet Station, Three Way Valve, Densitometer
Description
The present invention relates to a wet station capable of separating and reusing a chemical solution using a solution evaluation device and a method of controlling the same, and more particularly, after determining a concentration of the chemical liquid discharged from a chemical bath and determining the drainage, The present invention relates to a wet station capable of separating and reusing a chemical liquid using a solution evaluation device having a piping structure according to recovery and recycling, and a control method thereof.
In general, semiconductor devices are manufactured by performing various unit processes on a wafer, and various semiconductor manufacturing facilities are used when performing such unit processes. In the semiconductor manufacturing process, the wet process is mainly a process of cleaning or etching a semiconductor wafer using deionized water and various liquid chemicals.
As the semiconductor device becomes high density and high density and the diameter of the wafer increases, impurities, contaminants, etc. generated on the semiconductor wafer during the etching, ion implantation, diffusion, and metallization process have a great influence on the yield of the product. do. For this reason, in the semiconductor manufacturing process, a cleaning process for removing various contaminants present on the wafer is essentially performed.
The wet station is an apparatus for performing an etching process and a cleaning process required for a wafer manufacturing process, and puts a wafer carrier on which a plurality of wafers are loaded, and performs a plurality of etching processes to perform an etching process and a cleaning process. It has a solution tank of. The solution bath may be classified into a chemical bath, a rinse bath, and a final rinse bath according to the nature of the work.
1 is a view schematically showing a plurality of solution tanks.
Referring to FIG. 1, a conventional wet station is provided with a
For example, when the
For example, the
On the other hand, in the conventional wet station, all the chemical liquids discharged are treated with wastewater, and 6000 tons are discarded for a year, which has a problem that greatly affects the cost increase.
The present invention has been made to solve the above problems, by using a solution evaluation device having a piping structure according to the drainage, recovery and recycling by measuring the concentration of the chemical liquid discharged from the chemical bath (chemical bath) It is an object of the present invention to provide a wet station and a control method thereof capable of separating and reusing a chemical solution.
The wet station capable of separating and reusing the chemical solution using the solution evaluation device of the present invention for achieving the above object is a solution tank, a drain line connected to the solution bath and a path for moving the chemical or deionized water, and the drain line. A first three-way valve connected to one side of the branched chemical liquid or deionized water to a wastewater line or a recovery / reuse line, and the chemical liquid or deionized water connected to one side of the recovery / reuse line to a recovery line or a reuse line The second three-way valve for branching, the third three-way valve connected to one side of the waste water line, the third three-way valve for branching to the first waste water line or the second waste water line, the drain line for measuring the concentration of the chemical liquid or deionized water A first densitometer installed at the second, a second densitometer installed at the recovery / reuse line, and a third concentrate installed at the wastewater line System, and is characterized in that formed in accordance with the measured concentration by the density meter determines whether drainage, collection and recycling of the chemical or the deionized water containing a solution of an evaluation device for controlling the first, second and third three-way valve.
In addition, the solution evaluation device is characterized in that by controlling the first, second, third three-way valve at the same time by determining the waste water, recovery or reuse according to the measured concentration of the chemical liquid or deionized water measured only by the first densitometer. do.
According to the wet station capable of separating and reusing the chemical liquid using the solution evaluation device according to the present invention, the chemical liquid or deionized water used in the solution tank can be separated separately, and the concentration of the chemical liquid or deionized water in the process of draining By measuring and setting the flow path formed according to the pollution degree, there is an advantage in that the waste water load can be finally reduced and reused through re-evaluation of the chemical liquid.
Hereinafter, the configuration and operation of the preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. Here, the same reference numerals will be used for the same components as the prior art.
Figure 2 is a block diagram showing the drainage, recovery and reuse of the chemical liquid or deionized water by controlling each three-way valve according to the concentration measured by each densitometer according to the present invention, Figure 3 is a solution evaluation apparatus according to the present invention Flow chart for controlling each three-way valve.
As shown in FIG. 2, the wet station according to the embodiment of the present invention has a
A
It also includes a second three-
In addition, the
In addition, the concentration crab is the
Wherein the three-way valve (300, 310, 320) serves to provide a path of the moving chemical or deionized water, the solution evaluation device (b of Figure 2) of the chemical or deionized water according to the measured concentration by the densitometer (200,210,220) The first, second, and third three-
That is, as shown in Figure 3, the wet station control method of the present invention first measures the concentration of the solution from the first densitometer installed on the drainage line, the second densitometer installed on the recovery / reuse line and the third densitometer installed on the wastewater line (S10).
In the solution evaluation apparatus, each of the three-way valves is independently or sequentially controlled by comparing the measured value of each line with a reference value set according to a recipe. In one embodiment, when the measured concentration of the first densitometer exceeds the reference value (S20), the first three-way valve is opened (S30) so that the solution flows into the wastewater line (S30), or when the solution does not exceed the reference value, the recovery / reuse line Open the first three-way valve (S70) to flow to.
Next, when the solution flows to the recovery / reuse line by opening the first three-way valve, when the second concentration meter exceeds the reference value (S80), the second three-way valve is opened (S90) so that the solution flows to the recovery line. If not exceeding the reference value, the second three-way valve is opened so that the solution flows to the reuse line (S100).
On the other hand, when the solution flows to the wastewater line by opening the first three-way valve, when the third concentration meter exceeds the reference value (S40), the third three-way valve is opened (S50) so that the solution flows to the first wastewater line; If the reference value is not exceeded, the third three-way valve is opened to allow the solution to flow into the second wastewater line (S60).
And, the solution discharged to the
The
Therefore, by controlling the three-way valve through the solution evaluation device for comparing the concentration value measured by the densitometer installed in each line with the chemical liquid or deionized water drained from the solution tank, the chemical liquid or deionized water to meet the draining purpose By separating so as to increase the utilization of the chemical or deionized water used.
It is apparent to those skilled in the art that the present invention is not limited to the above embodiments and can be practiced in various ways without departing from the technical spirit of the present invention. will be.
1 is a view schematically showing a plurality of solution tanks.
Figure 2 is a block diagram showing the drainage, recovery and reuse of the chemical liquid or deionized water by controlling each three-way valve in accordance with the concentration measured by each concentration meter according to the present invention.
Figure 3 is a flow chart for controlling each three-way valve by the solution evaluation device according to the present invention.
<Explanation of symbols for the main parts of the drawings>
110: solution tank 130: drainage line
140: recovery / reuse line 150: wastewater line
160: first wastewater line 170: second wastewater line
180: recovery line 190: reuse line
200, 210, 220:
400: solution evaluation device
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090135015A KR20110078255A (en) | 2009-12-31 | 2009-12-31 | Wet station for reusing and deviding liquid with estimating liquid appartus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090135015A KR20110078255A (en) | 2009-12-31 | 2009-12-31 | Wet station for reusing and deviding liquid with estimating liquid appartus |
Publications (1)
Publication Number | Publication Date |
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KR20110078255A true KR20110078255A (en) | 2011-07-07 |
Family
ID=44917736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020090135015A KR20110078255A (en) | 2009-12-31 | 2009-12-31 | Wet station for reusing and deviding liquid with estimating liquid appartus |
Country Status (1)
Country | Link |
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KR (1) | KR20110078255A (en) |
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2009
- 2009-12-31 KR KR1020090135015A patent/KR20110078255A/en not_active Application Discontinuation
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