KR20110021236A - Treating fluid supplying module and treating fluid discharging apparatus with the same - Google Patents

Abstract

PURPOSE: A treatment liquid supply module and a treatment liquid discharging apparatus including the same are provided to easily remove a particle and a bubble and minimize the blocking of a treatment liquid discharging head. CONSTITUTION: A bubble removing member removes a bubble within treatment liquid supplied from a treatment liquid discharging head(270). A treatment liquid tank stores the treatment liquid. A main body is opened in one side of the treatment liquid. A first sidewall is supplied to an incoming port of the treatment liquid. A pressure control port is connected to a pressure control member.

Description

Processing liquid supply module and processing liquid discharge device having same {TREATING FLUID SUPPLYING MODULE AND TREATING FLUID DISCHARGING APPARATUS WITH THE SAME}

The present invention relates to a processing liquid supply module and a processing liquid discharge device having the same, and more particularly, to a processing liquid supply module for supplying a processing liquid to an inkjet processing liquid discharge head and a processing liquid discharge device including the same. will be.

In general, liquid crystal displays display full color by passing light modulated by the liquid crystal layer through a color filter. The color filter is formed by arranging filter elements of each color on the R (red), G (green), and B (blue) dots on the surface of the glass substrate in a stripe arrangement, a delta arrangement, or a mosaic arrangement.

In the manufacturing process of a liquid crystal display device, in order to manufacture a color filter, an orientation film, etc., a processing liquid is supplied and apply | coated to the surface of a glass substrate. As a treatment liquid applying apparatus for applying such treatment liquid, an inkjet coating apparatus for discharging and applying droplets of the treatment liquid to the surface of a substrate is used.

The present invention is to provide a processing liquid supply module that can easily remove particles and bubbles in the processing liquid supplied to the processing liquid discharge head of the inkjet method, and a processing liquid discharge device having the same.

The objects of the present invention are not limited thereto, and other objects not mentioned can be clearly understood by those skilled in the art from the following description.

In order to achieve the above object, the processing liquid supply module according to the present invention includes a processing liquid supply module for supplying a processing liquid to a processing liquid discharge head of an inkjet method, the processing liquid tank storing the processing liquid; And a bubble removing member installed in the processing liquid tank to remove bubbles of the processing liquid in the processing liquid tank.

In the treatment liquid supply module according to the present invention having the configuration as described above, the treatment liquid tank has a body facing each other in one direction open; A first sidewall coupled to an open side of the body and provided with an inlet port of the treatment liquid; And a second sidewall coupled to the other open surface of the body.

The treatment liquid tank may further include a pressure control port provided at an upper wall of the body and to which a pressure regulating member for providing a negative pressure or a positive pressure to the treatment liquid tank is connected.

The first side wall may have a hollow portion formed therein so that a stage is formed at a peripheral edge region thereof, and the inflow port may be provided on an upper wall of the hollow portion.

It may further include a particle filtration member provided between the body and the first side wall, for filtering particles of the treatment liquid flowing into the body through the inlet port.

The bubble removing member is provided in the body having a hollow cylindrical shape blocked at one end, the bubble removing filter for transmitting only the bubbles excluding the liquid component of the treatment liquid; And an adapter connected to the other open end of the bubble removing filter and installed on a side wall of the body, and connected to a pump providing a negative pressure.

The pores of the bubble removing filter may be smaller toward the inside along the radial direction of the bubble removing filter.

In order to achieve the above object, the treatment liquid discharge device according to the present invention includes a substrate support unit on which a substrate is placed and which is linearly movable in a first direction; And a processing liquid discharge head unit provided on a path along which the substrate support unit is moved, and discharging the processing liquid onto the substrate, wherein the processing liquid discharge head unit is a process of discharging the processing liquid by an inkjet method; Liquid discharge heads; And a processing liquid supply module supplying the processing liquid to the processing liquid discharge head, wherein the processing liquid supply module is coupled to one side of the processing liquid discharge head and is in fluid communication with nozzles of the processing liquid discharge head, And a treatment liquid tank in which the treatment liquid is stored. And a bubble removing member installed in the processing liquid tank to remove bubbles of the processing liquid in the processing liquid tank.

In the treatment liquid discharge device according to the present invention having the configuration as described above, the treatment liquid tank has a body that is open to face each other in one direction; A first sidewall coupled to an open side of the body and provided with an inlet port of the treatment liquid; And a second sidewall coupled to the other open surface of the body.

The treatment liquid tank may further include a pressure control port provided at an upper wall of the body and to which a pressure regulating member for providing a negative pressure or a positive pressure to the treatment liquid tank is connected.

The first side wall may have a hollow portion formed therein so that a stage is formed at a peripheral edge region thereof, and the inflow port may be provided on an upper wall of the hollow portion.

It may further include a particle filtration member provided between the body and the first side wall, for filtering particles of the treatment liquid flowing into the body through the inlet port.

The bubble removing member is provided in the body having a hollow cylindrical shape blocked at one end, the bubble removing filter for transmitting only the bubbles excluding the liquid component of the treatment liquid; And an adapter connected to the other open end of the bubble removing filter and installed on a side wall of the body, and connected to a pump providing a negative pressure.

The pores of the bubble removing filter may be smaller toward the inside along the radial direction of the bubble removing filter.

According to the present invention, particles and bubbles in the processing liquid supplied to the inkjet processing liquid discharge head can be easily removed.

According to the present invention, clogging of the processing liquid discharge head due to particles or bubbles can be minimized.

Hereinafter, a processing liquid supply module and a processing liquid discharge device including the same according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. First, in adding reference numerals to the components of each drawing, it should be noted that the same reference numerals are assigned to the same components as much as possible, even if shown on different drawings. In the following description of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

(Example 1)

1 is a plan view of an inkjet treatment liquid application equipment 1. 1 is a facility for applying a treatment liquid to an object by an inkjet method. For example, the object may be a color filter substrate of a liquid crystal display panel, and the treatment liquid may be ink such as red (R), green (G), and blue (B) in which pigment particles are mixed in a solvent.

Hereinafter, a description will be given with an example of applying the ink to the color filter substrate, but the technical idea of the present invention should not be construed as being limited thereto.

Referring to FIG. 1, the treatment liquid applying apparatus 1 may include a treatment liquid discharge part 10, a substrate transfer part 20, a baking part 30, a loading part 40, an unloading part 50, and a treatment liquid supply part. 60, and the main controller 70. The processing liquid discharge part 10 and the substrate transfer part 20 are arranged in a line in the first direction I and are positioned adjacent to each other. The processing liquid supply unit 60 and the main control unit 70 are disposed at positions facing the substrate transfer unit 20 with respect to the processing liquid discharge unit 10. It is arrange | positioned in 2 directions (II). The loading part 40 and the unloading part 50 are disposed at a position facing the processing liquid discharge part 10 with respect to the substrate transfer part 20, and the loading part 40 and the unloading part 50 are formed of a substrate. It is arrange | positioned in 2 directions (II). The bake unit 30 is disposed adjacent to one side of the substrate transfer unit 20.

Here, the first direction (I) is an arrangement direction of the processing liquid discharge unit 10 and the substrate transfer unit 20, the second direction (II) is a direction perpendicular to the first direction (I) on a horizontal plane, and the third direction The direction III is a direction perpendicular to the first direction I and the second direction II.

The substrate to which the treatment liquid (ink) is to be applied is loaded into the loading part 40. The substrate transfer unit 20 transfers the substrate loaded into the loading unit 40 to the processing liquid discharge unit 10. The processing liquid discharge unit 10 receives the processing liquid from the processing liquid supply unit 60 and discharges the processing liquid onto the substrate by an inkjet method. The substrate transfer unit 20 transfers the substrate from the processing liquid discharge unit 10 to the bake unit 30. The baking unit 30 heats the substrate to evaporate the remaining liquid substance (solvent) except for the solid component of the processing liquid (ink) discharged on the substrate. The substrate transfer unit 20 transfers the substrate from the bake unit 30 to the unloading unit 50. The substrate to which the treatment liquid is applied is carried out from the unloading part 50. In addition, the main controller 70 may include the overall processing liquid discharge part 10, the substrate transfer part 20, the baking part 30, the loading part 40, the unloading part 50, and the processing liquid supply part 60. Control the operation.

FIG. 2 is a perspective view of the processing liquid discharge part 10 of FIG. 1. Referring to FIG. 2, the processing liquid discharge part 10 includes a substrate support unit 100, a processing liquid discharge head unit 200, and a moving unit 300.

The substrate support unit 100 has a support plate 110 on which the substrate S is placed. The support plate 110 is a rectangular plate. The lower surface of the support plate 110 is connected to the rotation axis of the rotation drive motor 120. The rotation drive motor 120 rotates the support plate 110 so that the substrate placed on the support plate 110 is aligned at a predetermined position. The rotation drive motor 120 is provided on the upper surface of the slider 130. The guide member 140 extends in the first direction (I) in the center of the upper surface of the base (B). A linear motor (not shown) is built in the slider 130, and the slider 130 linearly moves in the first direction I along the guide member 140.

The processing liquid discharge head unit 200 is provided on a path through which the substrate supporting unit 100 moves, and discharges the processing liquid (ink) onto the substrate. The processing liquid discharge head unit 200 has a frame 210. The frame 210 is provided such that the longitudinal direction faces the second direction II perpendicular to the first direction I. The processing liquid supply module 220, the processing liquid discharge heads 270, and the head control unit 280 are installed in the frame 210. The processing liquid discharge heads 270 may be provided at the lower end of the frame 210 and discharge the processing liquid onto the substrate. The treatment liquid supply module 220 may be provided at an upper end of the frame 210, and supplies the treatment liquid to the treatment liquid discharge heads 270. The head controller 280 controls the discharge operation of the processing liquid discharge heads 270.

The processing liquid discharge head unit 200 may be fixed so as not to move on the base B, and the processing liquid discharge head unit 200 may be linearly moved in the first direction I by the moving unit 300. Can be.

The moving unit 300 linearly moves the processing liquid discharge head unit 200 in the first direction I in the upper portion of the path along which the support plate 110 is moved. The first moving unit 300 includes a guide rail 310 and a slider 320. The guide rails 310 may be installed at both sides of the upper surface of the base B so that the longitudinal direction thereof faces the first direction I and faces each other with respect to the guide member 140 of the substrate support unit 100. The slider 320 is installed on the guide rail 310 and may include a linear motor (not shown). The slider 320 may linearly move in the first direction I along the guide rail 310 by driving of a linear motor (not shown).

The processing liquid discharge head unit 200 may be linearly moved in the first direction (I) by the first moving unit 300, and the support plate 110 on which the substrate is placed is moved by the slider 130 and the guide member 140. It can move linearly in a 1st direction (I). When discharging the treatment liquid onto the substrate, the treatment liquid discharge process may be performed while linearly moving one of the support plate 110 and the treatment liquid discharge head unit 200 in the first direction (I). For example, the treatment liquid discharge head unit 200 is fixed at a predetermined position, and the support plate 110 on which the substrate is placed may move in the first direction I, and the support plate 110 discharges the treatment liquid to the substrate. The linear reciprocation can be performed at least twice so that the process can be repeated repeatedly. Alternatively, the support plate 110 on which the substrate is placed may be fixed at a predetermined position, and the processing liquid discharge head unit 200 may move in the first direction (I), and the processing liquid discharge head unit 200 may be attached to the substrate. It can be linearly reciprocated at least twice so that the treatment liquid discharge process can be repeatedly performed. The reason why the treatment liquid discharge step is repeatedly performed two or more times is to make the coating thickness of the treatment liquid applied to the substrate uniform.

3 is a perspective view of the processing liquid discharge head unit of FIG. 2, FIG. 4 is a side view of the processing liquid discharge head unit of FIG. 2, and FIG. 5 is a plan view of the processing liquid discharge head unit of FIG. 2.

3 to 5, the processing liquid discharge head unit 200 includes a frame 210, a processing liquid supply module 220, processing liquid discharge heads 270, and a head controller 280.

The frame 210 includes a main frame 212 and a head support 214. The main frame 212 may be provided as a horizontal member having a beam shape, and the main frame 212 is provided such that the longitudinal direction thereof faces the second direction II perpendicular to the first direction I.

A head support 214 supporting the processing liquid discharge heads 270 is provided below the main frame 212. The head support 214 has head support plates 215a and 215b provided under the main frame 212. The head support plates 215a and 215b may be plates having a longitudinal direction in the second direction (II), and the head support plates 215a and 215b may be spaced apart from each other horizontally below the main frame 212. . The head support plates 215a and 215b may be coupled to the main frame 212 by connecting rods 217. The connecting rods 217 may be provided vertically so as to face the third direction III, one end of the connecting rods 217 is coupled to the corner portions of the head supporting plates 215a and 215b, and the connecting rods The other end of 217 may be coupled to the bottom surface of the main frame 212.

One processing liquid supply module 220 may be installed in the frame 210. For example, the processing liquid supply module 220 may be installed at a central portion of the upper surface of the main frame 212. The treatment liquid discharge heads 270 may be provided to be in fluid communication with one treatment liquid supply module 220 in a centralized manner. That is, the processing liquid discharge heads 270 may be provided to receive the processing liquid from one processing liquid supply module 200 and to adjust the pressure through one processing liquid supply module 200. A detailed description thereof will be given later.

The processing liquid discharge heads 270 discharge the processing liquid on the substrate by an inkjet method. The processing liquid discharge heads 270 are formed on the first head support plate 215a along the longitudinal direction thereof, and the second head support plate 215b along the longitudinal direction thereof. It has two discharge heads 274, the first and second discharge heads (272, 274) can be arranged to face each other.

The first discharge heads 272 may be arranged in two rows to form a zigzag shape on the first head support plate 215a, and may be disposed such that the ends overlap each other. A plurality of nozzles (not shown) for discharging the processing liquid are formed on the lower surfaces of the first discharge heads 272, and the processing liquid inlets 272-2 and the processing are disposed on the upper surfaces of the first discharge heads 272. Liquid outlets 272-1 are formed. The processing liquid inlets 272-2 may be connected to the lower distributor outlet port 266a-2 of the first distribution member 260a, which will be described later, and the processing liquid outlets 272-1 are the first distribution member, which will be described later. And may be connected to the upper distributor outlet port 266a-1 of 260a. A flexible circuit board 273 may be provided at one side of the first discharge heads 272 to be electrically connected to the first head controller 280a.

The second discharge heads 274 may be arranged in two rows to form a zigzag shape on the second head support plate 215b, and may be disposed such that ends thereof overlap each other. A plurality of nozzles (not shown) for discharging the treatment liquid are formed on the lower surfaces of the second discharge heads 274, and the treatment liquid inlets 274-2 and the treatment are disposed on the upper surfaces of the second discharge heads 274. Liquid outlets 274-1 are formed. The processing liquid inlets 274-2 may be connected to the lower distributor outlet port 266b-2 of the second distribution member 260b, which will be described later, and the processing liquid outlets 274-1 are the second distribution member, which will be described later. And may be connected to the upper distributor outlet port 266b-1 of 260b. In addition, a flexible circuit board (not shown) electrically connected to the second head controller 280b may be provided at one side of the second discharge heads 274.

As such, when the discharge heads 272 and 274 are disposed symmetrically about the frame 210 at the lower end of the frame 210, the moment forces applied to the frame 210 by the weight of the discharge heads 272 and 274 may be reduced. Since they cancel each other out, it is possible to facilitate the adjustment of the gap between the discharge heads 272, 274 and the substrate.

The head controller 280 includes a first head controller 280a and a second head controller 280b. The first head controller 280a may be installed on one sidewall of the main frame 212 along the sidewall of the first head support plate 215a. First discharge heads 272 provided on the first head support plate 215a are electrically connected to the first head control unit 280a through the flexible circuit board 273, and the first head control unit 280a is connected to the first head control unit 280a. Control the operation of the discharge heads 272.

The second head control unit 280b may be installed on the other side wall along the longitudinal direction of the main frame 212, that is, the side wall on the side of the second head support plate 215b. Second discharge heads 274 installed on the second head support plate 215b are electrically connected to the second head controller 280b through a flexible circuit board (not shown). 2 controls the operation of the discharge heads 274.

As such, when the first and second head controllers 280a and 280b are disposed close to the first and second discharge heads 272 and 274 to be controlled and the length of the electrical connection therebetween becomes short, In the control signal transmission between the controllers 280a and 280b and the discharge heads 272 and 274, noise may be minimized.

6 is a perspective view of the processing liquid supply module of FIG. 3, and FIG. 7 is an exploded perspective view of the processing liquid supply module of FIG. 6. 8 is an enlarged view of the body of FIG. 7, and FIG. 9 is a cross-sectional view of the bubble removing filter of FIG. 7.

6 to 9, the treatment liquid supply module 220 includes a treatment liquid tank 230, a particle filtration member 240, a bubble removing member 250, and first and second distribution members 260a and 260b. ).

The treatment liquid tank 230 receives a treatment liquid to be discharged to the substrate. The particle filtration member 240 filters particles in the treatment liquid supplied to the treatment liquid tank 230. The bubble removing member 250 removes bubbles in the processing liquid supplied to the processing liquid tank 230. The first and second dispensing members 260a and 260b distribute the processing liquid supplied to the processing liquid tank 230 to the first and second discharge heads (reference numerals 273 and 274 in FIG. 5).

The treatment liquid tank 230 has a body 232 having a shape in which the surfaces facing each other in one direction are open, that is, a 'ㅁ' shape. Specifically, the body 232 has an upper wall 232a, a lower wall 232b, and sidewalls 232c and 232d connecting the upper wall 232a and the lower wall 232b. The upper wall 232a is provided with a pressure regulating port 233-1 and a level sensing port 233-2. A pressure regulating member (not shown) for providing a negative pressure or a positive pressure to the treatment liquid tank 230 may be connected to the pressure regulating port 233-1. The level sensing port 233-2 may be provided with a level sensor (not shown) for detecting the level of the processing liquid in the processing liquid tank 230.

A hole 232d-1 may be formed in one of the sidewalls 232d of the sidewalls 232c and 232d of the treatment liquid tank 230, and the bubble removing member 250 may be installed in the hole 232d-1. have. The bubble removing member 250 removes bubbles of the processing liquid in the processing liquid tank 230.

The bubble removing member 250 includes a bubble removing filter 252 and an adapter 254. The bubble removing filter 252 may have a hollow cylindrical shape with one end blocked, and may be provided in the body 232 of the treatment liquid tank 230. Inside the cross section of the bubble removing filter 252, as shown in FIG. 9, a plurality of pores 253 may be formed. The pores 253 may be formed to become smaller toward the inside along the radial direction of the bubble removing filter 252. Through the pores 253, only the bubble component except for the liquid component of the treatment liquid may be permeated. An adapter 254 is connected to the other open end of the bubble removing filter 252. The adapter 254 is inserted into and installed in the hole 232d-1 formed in the side wall 232d of the body 232 of the treatment liquid tank 230, and the adapter 254 may be connected with a pump (not shown) to provide a negative pressure. have. When a pump (not shown) exerts a negative pressure on the hollow inside the bubble removing filter 252, bubbles in the processing liquid are transmitted through the pores 253 of the bubble removing filter 252 to be discharged.

The first sidewall 234 is coupled to one open side of the body 232 of the treatment liquid tank 230, and the second sidewall 238 is coupled to the other open side of the body 232. A hollow portion 234-1 may be formed on an inner surface of the first sidewall 234 so that a stage is formed in a peripheral edge region thereof. An inlet port 235 is provided on the upper wall of the hollow portion 234-1, and the treatment liquid is supplied to the treatment liquid tank 230 through the inlet port 235. In addition, a particle filtration member 240 may be provided between the first sidewall 234 and the body 232, and the particle filtration member 240 flows into the treatment liquid tank 230 through the inflow port 235. Particles of the processing liquid to be filtered.

The first sidewall 234 may have a first outlet port 236 for outflowing the processing liquid. The first outlet port 236 includes upper outlet ports 236a and lower outlet ports 236b. The lower outlet ports 236b may be formed in a line at the lower end of the first sidewall 234 along the length direction of the first sidewall 234. The upper outlet ports 236a may be formed in a line at a spaced position above the lower outlet ports 236b. The upper outlet ports 236a and the lower outlet ports 236b provided at upper and lower spaced positions may be provided in pairs, respectively. A first dispensing member 260a is coupled to the first sidewall 234 so as to be in fluid communication with the first outlet port 236, the first dispensing member 260a having first discharge heads (refer to reference numeral 272 in FIG. 5). Distribute the treatment liquid into

A second outlet port 239 may be formed on the second sidewall 238 to allow the treatment liquid to flow out. The second outlet port 239 includes upper outlet ports 239a and lower outlet ports 239b. The lower outlet ports 239b may be formed in a line at the lower end of the second sidewall 238 along the length direction of the second sidewall 238. The upper outlet ports 239a may be formed in a line at a spaced position above the lower outlet ports 239b. The upper outlet ports 239a and the lower outlet ports 239b provided at upper and lower positions may be provided in pairs, respectively. A second dispensing member 260b is coupled to the second sidewall 238 so as to be in fluid communication with the second outlet port 239, and the second dispensing member 260b is connected to the second discharge heads (see FIG. 5 in reference numerals). 274).

10A and 10B are perspective views of the distribution member of FIG. 6, and FIG. 11 is a cross-sectional view of the distribution member of FIGS. 10A and 10B. Since the 1st and 2nd distribution members 260a and 260b have the same structure, it demonstrates below using the 1st distribution member 260a as an example.

7, and 10A-11, the first dispensing member 260a includes a distributor body 262a, upper and lower distributor inlet ports 264a-1, 264a-2, and upper and lower distributor outlets. Ports 266a-1 and 266a-2. The distributor body 262a may be provided in a hollow cylindrical shape having a hollow portion 263 formed therein, and may have a length corresponding to the length of the first sidewall 234.

Upper and lower distributor inlet ports 264a-1 and 264a-2 may be provided on one side of the distributor body 262a to communicate with the hollow portion 263. Lower distributor inlet ports 264a-2 are provided in a row at the lower end along the longitudinal direction of the distributor body 262a and lower outlet ports 236b provided on the first sidewall 234 of the treatment liquid tank 230. Corresponds to. The upper distributor inlet ports 264a-1 are provided in line at spaced positions above the lower distributor inlet ports 264a-2, and the upper outlet port provided on the first sidewall 234 of the treatment liquid tank 230. Corresponds to field 236a.

The upper and lower distributor outlet ports 266a-1 and 266a-2 communicate with the hollow portion 263 and the distributor body 262a to face the upper and lower distributor inlet ports 264a-1, 264a-2. May be provided on the other side. Upper distributor outlet ports 266a-1 are connected to the processing liquid outlets of the first discharge heads (FIG. 5, reference number 272-1), and the lower distributor outlet ports. 266a-2 is connected to the processing liquid inlets of the first discharge heads 272 (reference numeral 272-2 in FIG. 5).

As shown in FIG. 11, the upper distributor inlet ports 264a-1 are provided in a vertical position higher than the upper distributor outlet ports 266a-1, and the lower distributor inlet ports 264a-2 are provided. It may be provided at a position higher in the vertical direction than the lower distributor outlet ports.

Since the configuration of the second distribution member 260b is the same as that of the first distribution member 260a, a detailed description thereof will be omitted. However, in connection with the second distribution member 260b, the unexplained reference numerals 266b-1 of FIGS. 4 and 5 are upper distributor outlet ports and 266b-2 are lower distributor outlet ports. Upper distributor outlet ports 266b-1 are connected to the processing liquid outlets (see reference numeral 274-1 of FIG. 5) of the second discharge heads (reference numeral 274 of FIG. 5), and the lower distributor outlet ports 266b-2 is connected to the processing liquid inlets (the reference numeral 274-2 in FIG. 5) of the second discharge heads 274.

Hereinafter, a process of supplying the processing liquid from the processing liquid supply part (reference numeral 60 in FIG. 1) to the processing liquid discharge heads (reference numeral 270 in FIG. 2) which is the final stage will be described.

First, the process of supplying the processing liquid from the processing liquid supply unit 60 to the processing liquid supply module 220 will be described below. 12 is a view illustrating a treatment liquid piping system for supplying treatment liquid to a treatment liquid supply module.

Referring to FIG. 12, the processing liquid supply unit 60 includes a processing liquid supply source 410 and a processing liquid recovery member 420, and the processing liquid supply source 410 and the processing liquid recovery member 420 may be provided in a main supply line ( 430). A plurality of branch lines 440a, 440b,..., 440e branch off from the main supply line 430. The treatment liquid supply module 220 may be connected to the branch lines 440a, 440b,..., 440e, and a valve 442 is installed on the branch lines 440a, 440b,..., 440e. do. A valve 432 is provided at the rear end of the branch line 440e of the main supply line 430, and the presence or absence of the processing liquid in the main supply line 430 is detected between the valve 432 and the processing liquid recovery member 420. The sensing member 434 is provided.

With the valve 442 on the branch lines 440a, 440b,..., 440e closed and the valve 432 on the main supply line 430 open, the main supply line ( Through 430, the treatment liquid supply is started. The treatment liquid flows along the main supply line 430 to the place where the sensing member 434 is located. The sensing member 434 detects the flow of the processing liquid, and transmits the detection result to the controller (not shown). The controller (not shown) closes the valve 432 on the main supply line 430 and opens a valve on the branch line 440a to supply the processing liquid so that the processing liquid is supplied to the processing liquid supply module 220. At this time, the treatment liquid passing through the sensing member 434 is recovered to the treatment liquid recovery member 420.

As such, when the main liquid supply line 430 is filled with the treating liquid during the initial supply of the treating liquid, and then the treating liquid is supplied through the branch line 440a, the treating liquid supply module is caused by the air in the main supply line 430. The possibility of bubbles occurring in the treatment liquid supplied to 220 may be minimized.

In addition, a pneumatic line 520 may be connected to the treatment liquid supply module 220, and a pressure regulating member 510 may be connected to the pneumatic line 520 to provide a negative pressure or a positive pressure to the treatment liquid supply module 220. have. The pressure adjusting member 510 may provide a negative pressure to prevent the processing liquid from flowing down from the discharge heads of the processing liquid supply module 220, and discharge the processing liquid in the processing liquid supply module 220 to the outside. To provide a positive pressure.

Next, the flow of the processing liquid in the processing liquid supply module 220 will be described. 13 is a view showing the flow of the processing liquid supplied to the processing liquid supply module.

12 and 13, the processing liquid supplied through the branch line 440a is introduced into the hollow part 234-1 in the processing liquid tank 230 through the inflow port 235. The treatment liquid introduced into the hollow part 234-1 is introduced into the body 232 of the treatment liquid tank 230 through the particle filtration member 240. At this time, the particle filtration member 240 filters the particles in the treatment liquid.

Next, a process of flowing the processing liquid from the processing liquid tank 230 to the final discharge head and the process of removing bubbles in the processing liquid in this process will be described. 14A to 14C are views illustrating a process of removing bubbles in a treatment liquid by using a distribution member.

Referring to FIGS. 14A-14C, the treatment liquid is supplied to the treatment liquid tank 230 until the water level reaches Level 1. Level 1 is a level above the lower outflow port 236b of the treatment liquid tank 230. When the treatment liquid reaches the level of Level 1, the treatment liquid is passed through the first outlet member 260a through the bottom outlet port 236b and the bottom distributor inlet port 264a-2 of the first distributor member 260a in communication therewith. Flows into the hollow portion 263. The processing liquid introduced into the hollow part 263 flows into the processing liquid inlet 272-2 of the first discharge heads 272 through the lower distributor outlet ports 266a-2. At this time, the air in the first discharge heads 272 is pushed by the processing liquid and moved to the processing liquid outlet 272-1 (FIG. 14A).

When the processing liquid is continuously supplied to the processing liquid tank 230 so that the level of the processing liquid reaches the level of Level 2, the processing liquid in the first discharge heads 272 is discharged by the hydraulic pressure. It flows into the hollow part 263 via the process liquid outlet port 272-1 of 272, and the upper distributor outlet port 266a-1 of the 1st distribution member 260a. At this time, the air inside the first discharge heads 272 is pushed by the processing liquid and moved to the hollow portion 263 of the first distribution member 260a. On the other hand, the level 2 is the water level reaching the height of the upper outlet port 236a of the treatment liquid tank 230, so that the treatment liquid in the treatment liquid tank 230 is the upper outlet port 236a and the first distribution member 260a. ) May be introduced into the first distribution member 260a through the upper distributor inlet port 264a-1 (FIG. 14B).

When the treatment liquid is continuously supplied to the treatment liquid tank 230 and the water level of the treatment liquid reaches the level 3 (Level 3) above the upper outlet port 236a, the upper layer treatment in the first distribution member 260a. The liquid flows back into the treatment liquid tank 230 by hydraulic pressure. At this time, the bubble also flows into the treatment liquid tank 230 together with the treatment liquid. Through this process, when air on the first distribution member 260a, the first discharge heads 272, and the pipe connecting the same flows into the treatment liquid tank 230, bubbles are provided to the bubble removing member 250. The negative pressure is discharged to the outside through the bubble removing member 250 (FIG. 14C).

As described above, bubbles of the treatment liquid may be removed through the process described with reference to FIGS. 12 to 14C, and thus, the phenomenon in which nozzles of the discharge heads are blocked by bubbles may be prevented.

On the other hand, by supplying the processing liquid to the plurality of discharge heads using one processing liquid supply module, and adjusting the pressure provided to the processing liquid supply module, it is possible to reduce the installation cost due to the increase in the number of heads, and to maintain Ease of maintenance can be increased.

In the above, the processing liquid discharge part provided with the plurality of processing liquid discharge heads to be in fluid communication in a centralized manner with one processing liquid supply module has been described as an example. However, the treatment liquid discharge part may be provided such that one treatment liquid discharge head is in fluid communication with one treatment liquid supply module in a one-to-one manner. The following embodiment describes a processing liquid discharge part having such a configuration.

(Example 2)

15 is a perspective view showing another example of the processing liquid discharge portion 10 '.

Referring to FIG. 15, the processing liquid discharge part 10 ′ may include a substrate support unit 100 ′, a processing liquid discharge head unit 200 ′, moving units 300 ′, 400 ′, and a first head cleaning unit 500. '), And second head cleaning unit 600'.

The substrate support unit 100 ′ has a support plate 110 ′ on which the substrate S is placed. The support plate 110 'is a rectangular plate. The rotating shaft of the rotation drive motor 120 'is connected to the lower surface of the support plate 110'. The rotation drive motor 120 ′ rotates the support plate 110 ′ so that the substrate placed on the support plate 110 ′ is aligned at a predetermined position. The rotation drive motor 120 'is provided on the upper surface of the slider 130'. The guide member 140 ′ extends long in the first direction I on the upper surface of the base B. FIG. A linear motor (not shown) is built in the slider 130 ', and the slider 130' linearly moves in the first direction I along the guide member 140 '.

The processing liquid discharge head unit 200 'discharges the processing liquid (ink) to the substrate. The treatment liquid discharge head unit 200 ′ includes treatment liquid discharge members 201 ′ a and 201 ′ b and a bracket 202 ′. The treatment liquid discharge member 201'a of the treatment liquid discharge members 201'a and 201'b is provided on one side of the bracket 202 'facing the first direction I and the other The processing liquid discharge member 201'b may be installed on the other side of the bracket 202 'facing the first direction (I).

Each of the processing liquid discharge members 201'a and 201'b includes a red (R) discharge member 210'a, a green (G) discharge member 210'b, and a blue (B) discharge member 210. has' c) The red (R) discharge member 210'a, the green (G) discharge member 210'b, and the blue (B) discharge member 210'c are arranged in a row in the second direction (II), and The processing liquid is discharged to the substrate S placed on the support plate 110 ′ by an inkjet method of discharging.

The moving units 300 ′ and 400 ′ may move the processing liquid discharge head unit 200 ′ at an upper portion of a path along which the support plate 110 ′ is moved. The first moving unit 300 ′ linearly moves the processing liquid discharge head unit 200 ′ in the first direction I and the second moving unit 400 moves the processing liquid discharge head unit 200 ′ to the second direction. The linear movement can be made in the direction II and the third direction III.

The second moving unit 400 'includes a horizontal support 410' and a slider 420 '. The horizontal support 410 'is positioned above the base B' such that the longitudinal direction thereof faces the second direction II. The horizontal support 410 'is provided with a guide rail 412' along the longitudinal direction. A linear motor (not shown) may be built in the slider 420 ', and the slider 420' linearly moves in the second direction II along the guide rail 412 '. The bracket 202 'of the treatment liquid discharge head unit 200' is connected to the slider 420 ', and the treatment liquid discharge members 201' are installed in the bracket 202 'by the linear movement of the slider 420'. a and 201'b move linearly in the second direction (II). On the other hand, the slider 420 'may be provided with a driving member (not shown) for linearly moving the bracket 202' of the processing liquid discharge head unit 200 'in the third direction (III).

The first moving unit 300 'includes a guide rail 310' and a slider 320 '. The guide rail 310 ′ is provided in both longitudinal edges of the upper surface of the base B ′ about the guide member 140 ′ of the substrate support unit 100 ′ with the longitudinal direction thereof facing the first direction (I). . The slider 320 'includes a linear motor (not shown) and linearly moves in the first direction I along the guide rail 310'. Both ends of the horizontal support 410 'of the second moving unit 400' are connected to the slider 320 ', respectively. By the linear movement of the slider 320 ', the second moving unit 400' including the horizontal support 410 'is moved in the first direction I, and by the movement of the second moving unit 400'. The processing liquid discharge head unit 200 'connected to the second moving unit 400' is linearly moved in the first direction (I).

The processing liquid discharge head unit 200 ′ is driven by the first moving unit 300 ′ and the second moving unit 400 ′ in the first direction (I), the second direction (II), and the third direction (III). The substrate 110 may move linearly, and the support plate 110 ′ on which the substrate is placed may linearly move in the first direction I by the slider 130 ′ and the guide member 140 ′. When discharging the treatment liquid onto the substrate, the treatment liquid discharge head unit 200 ′ is fixed at a predetermined position, and the supporting plate 110 ′ on which the substrate is placed may be moved in the first direction (I). Alternatively, the support plate 110 ′ on which the substrate is placed may be fixed at a predetermined position, and the processing liquid discharge head unit 200 ′ may move in the first direction (I).

The first and second head cleaning units 500 'and 600' periodically check the processing liquid discharge surfaces of the processing liquid discharge members 201'a and 201'b, that is, the surfaces on which the nozzles for discharging the processing liquid are formed. Clean. Typically, after the process liquid discharge process is performed on one substrate, the process liquid discharge surfaces of the process liquid discharge members 201'a and 201'b may be cleaned.

The first head cleaning unit 500 'and the second head cleaning unit 600' may be provided on one side of the substrate supporting unit 100 'on the upper surface of the base B', and are arranged in the first direction I in a row. It can be arranged as. The processing liquid discharge members 201'a and 201'b are formed by the first moving unit 300 'and the second moving unit 400' of the first and second head cleaning units 500 'and 600'. It may be moved upward, and may be moved in the first direction I at the top of the first and second head cleaning units 500 'and 600' during the cleaning process.

The first head cleaning unit 500 'performs a purging process and a blading process, and the second head cleaning unit 600' performs a blotting process. The purging process, the blading process, and the blotting process are performed sequentially. The purging process is a process of spraying a portion of the processing liquid contained in the inkjet heads 210a and 210b at a high pressure. The blading process is a process of removing the treatment liquid remaining on the treatment liquid discharge surfaces of the treatment liquid discharge members 201'a and 201'b after the purging process in a non-contact manner. The blotting process is a process of removing the treatment liquid remaining on the treatment liquid discharge surfaces of the treatment liquid discharge members 201'a and 201'b after the blading process by a contact method.

16 is a perspective view illustrating an example of the head of FIG. 15, FIG. 17 is an exploded perspective view of the processing liquid supply module 220 ′ of FIG. 16, and FIG. 18 is a cross-sectional view of the head of FIG. 16.

Since the red (R) discharge member 210'a, the green (G) discharge member 210'b, and the blue (B) discharge member 210'c each have the same configuration, hereinafter, red (R) ) The discharge member 210'a will be described as an example, and description of the green (G) discharge member 210'b and the blue (B) discharge member 210'c will be omitted.

16 to 18, the red (R) discharge member 210 ′ a includes a processing liquid supply module 220 ′ and a processing liquid discharge head 260 ′. The processing liquid supply module 220 'supplies the processing liquid to the processing liquid discharge head 260', and the processing liquid discharge head 260 'discharges the processing liquid onto the substrate.

The treatment liquid supply module 220 ′ includes a treatment liquid tank 230 ′, a particle filtration member 240 ′, and a bubble removing member 250 ′. The treatment liquid tank 230 ′ receives and stores the treatment liquid to be discharged to the substrate. The particle filtration member 240 ′ filters particles in the treatment liquid supplied to the treatment liquid tank 230 ′. The bubble removing member 250 ′ removes bubbles in the processing liquid supplied to the processing liquid tank 230 ′.

The treatment liquid tank 230 ′ has a body 232 ′ having a shape in which faces facing each other in one direction are open, that is, a ㅁ 'shape. The upper wall of the body 232 'is provided with a pressure regulation port 233'-1 and a level sensing port 233'-2. A pressure regulating member (not shown) for providing a negative pressure or a positive pressure to the treatment liquid tank 230 ′ may be connected to the pressure regulating port 233 ′ -1. The level sensing port 233'-2 may be provided with a level sensor (not shown) for detecting the level of the processing liquid in the processing liquid tank 230 '.

A bubble removing member 250 ′ may be installed in a hole formed in one of the side walls of the treatment liquid tank 230 ′. The bubble removing member 250 'removes bubbles of the processing liquid in the processing liquid tank 230'. Since the bubble removing member 250 ′ has the same configuration as the bubble removing member 250 illustrated in FIGS. 7 and 9, a detailed description thereof will be omitted. Here, the unexplained reference numeral 252 'of FIG. 17 is a bubble removing filter, and 254' is an adapter.

The first sidewall 234 'is coupled to an open side of the body 232' of the treatment liquid tank 230 ', and the second sidewall 238' is coupled to the other open side of the body 232 '. . On the inner surface of the first sidewall 234 ', a hollow portion 234'-1 may be formed therein so that a stage is formed at a peripheral edge region thereof. An inlet port 235 'is provided on the upper wall of the hollow portion 234'-1, and the treatment liquid is supplied to the treatment liquid tank 230' through the inlet port 235 '. A particle filtration member 240 ′ may be provided between the first sidewall 234 ′ and the body 232 ′. The particle filtration member 240 ′ filters particles of the treatment liquid introduced into the treatment liquid tank 230 ′ through the inlet port 235 ′.

The process of supplying and storing the processing liquid to the processing liquid supply module 220 'having the above configuration will be described below. The treatment liquid flows into the hollow portion 234'-1 in the treatment liquid tank 230 'through the inflow port 235'. The hollow portion 234'-1 is a space between the first sidewall 234 'and the particle filtration member 240'. The treatment liquid introduced into the hollow part 234'-1 is introduced into the body 232 'of the treatment liquid tank 230' through the particle filtration member 240 ', wherein the particle filtration member 240' Particles in the treatment liquid flowing into the body 232 'are filtered. Through this process, the treatment liquid is supplied to the body 232 ', and the treatment liquid is continuously supplied until a predetermined level is reached. Bubbles in the processing liquid stored in the body 232 ′ of the processing liquid tank 230 ′ are discharged to the outside through the bubble removing member 250 ′ by a negative pressure provided to the bubble removing member 250 ′.

The processing liquid discharge head 260 ′ is coupled to the lower end of the processing liquid supply module 220 ′, receives the processing liquid from the processing liquid supply module 220 ′, and discharges the processing liquid to the substrate surface. The processing liquid discharge head 260 'has a nozzle surface 264' facing the substrate, and the nozzle surface 264 'is provided with a plurality of nozzles (not shown) for discharging the processing liquid to the substrate. The nozzles (not shown) may be individually controlled to discharge the processing liquid onto the substrate, and a plurality of nozzles may be grouped and the grouped nozzles may be controlled to simultaneously discharge the processing liquid onto the substrate.

Outlets 232'-1 are formed on the bottom wall of the body 232 'of the treatment liquid tank 230' to supply the treatment liquid to the nozzles, and the outlets 232'-1 discharge the treatment liquid. In communication with the flow path 262 'provided in the head 260'. And the nozzles are supplied with the treatment liquid through the flow path (262 ').

The foregoing description is merely illustrative of the technical idea of the present invention, and various changes and modifications may be made by those skilled in the art without departing from the essential characteristics of the present invention. Therefore, the embodiments disclosed in the present invention are not intended to limit the technical idea of the present invention but to describe the present invention, and the scope of the technical idea of the present invention is not limited by these embodiments. The protection scope of the present invention should be interpreted by the following claims, and all technical ideas within the equivalent scope should be interpreted as being included in the scope of the present invention.

The drawings described below are for illustrative purposes only and are not intended to limit the scope of the invention.

1 is a plan view of an inkjet type treatment liquid application equipment.

FIG. 2 is a perspective view of the processing liquid discharge part of FIG. 1. FIG.

3 is a perspective view of the processing liquid discharge head unit of FIG. 2.

4 is a side view of the processing liquid discharge head unit of FIG. 2.

5 is a plan view of the processing liquid discharge head unit of FIG. 2.

6 is a perspective view of the treatment liquid supply module of FIG. 3.

7 is an exploded perspective view of the processing liquid supply module of FIG. 6.

8 is an enlarged view of the body of FIG.

9 is a cross-sectional view of the bubble removing filter of FIG. 7.

10A and 10B are perspective views of the dispensing member of FIG. 6.

11 is a cross-sectional view of the distribution member of FIGS. 10A and 10B.

12 is a view illustrating a treatment liquid piping system for supplying treatment liquid to a treatment liquid supply module.

13 is a view showing the flow of the processing liquid supplied to the processing liquid supply module.

14A to 14C are views illustrating a process of removing bubbles in a treatment liquid by using a distribution member.

15 is a perspective view showing another example of the processing liquid discharge portion.

16 is a perspective view illustrating an example of the head of FIG. 15.

FIG. 17 is an exploded perspective view of the treatment liquid supply module 220 ′ of FIG. 16.

18 is a cross-sectional view of the head of FIG. 16.

<Description of Symbols for Main Parts of Drawings>

100,100 ': substrate support unit 200,200': treatment liquid discharge head unit

210: frame 220, 220 ': processing liquid supply module

230,230 ': Treatment liquid tank 240,240': Particle filtration member

250, 250 ': bubble removing member 260a: first dispensing member

260b: second distribution member 260 ', 270: processing liquid discharge head

280: head control unit

Claims (14)

In the processing liquid supply module for supplying the processing liquid to the processing liquid discharge head of the inkjet method, A treatment liquid tank in which the treatment liquid is stored; And And a bubble removing member installed in the processing liquid tank to remove bubbles of the processing liquid in the processing liquid tank. The method of claim 1, The treatment liquid tank, Body that is open to face each other in one direction; A first sidewall coupled to an open side of the body and provided with an inlet port of the treatment liquid; And And a second sidewall coupled to the other open surface of the body. The method of claim 2, The treatment liquid tank, And a pressure regulating port provided at an upper wall of the body and connected to a pressure regulating member for providing a negative pressure or a positive pressure to the treatment liquid tank. The method of claim 2, The first side wall has a hollow portion formed therein so that a stage is formed in the peripheral region of the circumference, and the inflow port is provided on the upper wall of the hollow portion. The method of claim 2, And a particle filtration member provided between the body and the first side wall and filtering particles of the processing liquid flowing into the body through the inflow port. The method of claim 5, The bubble removing member, An air bubble removing filter having a hollow cylindrical shape closed at one end thereof and provided in the body and transmitting only air bubbles excluding the liquid component of the treatment liquid; And And an adapter connected to the other open end of the bubble removing filter and installed on a side wall of the body, and connected to a pump providing a negative pressure. The method of claim 6, The pores of the bubble removing filter is smaller in the inner direction along the radial direction of the bubble removing filter. A substrate support unit on which the substrate is placed and which is linearly movable in the first direction; And A processing liquid discharge head unit provided on a path through which the substrate supporting unit is moved, and discharging the processing liquid onto the substrate; The processing liquid discharge head unit, A processing liquid discharge head configured to discharge the processing liquid by an inkjet method; And A processing liquid supply module for supplying a processing liquid to the processing liquid discharge head; The treatment liquid supply module, A processing liquid tank coupled to one side of the processing liquid discharge head, in fluid communication with nozzles of the processing liquid discharge head, and storing the processing liquid; And And a bubble removing member provided in the processing liquid tank to remove bubbles of the processing liquid in the processing liquid tank. The method of claim 8, The treatment liquid tank, Body that is open to face each other in one direction; A first sidewall coupled to an open side of the body and provided with an inlet port of the treatment liquid; And And a second sidewall coupled to the other open surface of the body. The method of claim 9, The treatment liquid tank, And a pressure regulating port provided on the upper wall of the body and connected to a pressure regulating member for providing a negative pressure or a positive pressure to the treatment liquid tank. The method of claim 9, And a hollow portion is formed therein so that the first side wall is formed at a peripheral edge thereof, and the inflow port is provided on an upper wall of the hollow portion. The method of claim 9, And a particle filtration member provided between the body and the first sidewall and filtering particles of the processing liquid flowing into the body through the inflow port. 13. The method of claim 12, The bubble removing member, An air bubble removing filter having a hollow cylindrical shape closed at one end thereof and provided in the body and transmitting only air bubbles excluding the liquid component of the treatment liquid; And And an adapter connected to the other open end of the bubble removing filter and installed on a side wall of the body, and connected to a pump providing a negative pressure. The method of claim 13, The pores of the bubble removing filter is smaller toward the inner side in the radial direction of the bubble removing filter.

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