KR20100138148A - Aqueous detergent composition - Google Patents

Abstract

PURPOSE: An aqueous detergent composition is provided to ensure excellent cleaning effect to contaminant existing on an alignment layer substrate due to excellent moisture penetration effect. CONSTITUTION: An aqueous detergent composition does not contain an alkali compound and contains C1~C5 lower alcohol, a water soluble glycol ether compound, organophosphate and water. Based on the total weight of the composition, 0.1 weight% ~15 weight% of C1~C5 lower alcohol, 0.1 weight% ~15 weight% of water soluble glycol ether compound, 0.01 weight% ~10 weight% of organophosphate, and the balance of water.

Description

Aqueous detergent composition

The present invention relates to an aqueous cleaning liquid composition used for semiconductors, display devices and the like. More specifically, the present invention relates to an aqueous cleaning liquid composition of a substrate used before and after rubbing of a liquid crystal alignment layer during a liquid crystal cell manufacturing process of a liquid crystal display.

In general, in the liquid crystal cell fabrication process, an alignment film is formed by applying a polyimide and rubbing it on a predetermined direction in order to provide the function of the alignment film and the insulating film on the two pattern substrates on which the electrode patterns are formed. Thereafter, a container of the liquid crystal cell is formed, a spacer is disposed and the two substrates are bonded to control the thickness of the seal adhesive and the liquid crystal cell. In this case, when the remaining contaminants are present on the alignment layer substrate into which the liquid crystal is injected, it is difficult to obtain a clear display screen and causes defects during packaging. Therefore, it is necessary to clean and remove the contaminants remaining on the substrate.

Contamination paths of substrates in the manufacture of liquid crystal cells of liquid crystal displays may include foreign substances or polyimide particles released from the rubbing cloth in the rubbing process before joining two PI substrates, which may adhere to the substrate and cause defects. Can be.

In order to remove such contaminants generated during the process, conventionally, a solvent or pure water such as isopropanol and isopropanol aqueous solution was used. However, cleaning with solvents causes solvents to remain on the substrate, leading to defects, and problems with chemical stability such as safety and flammability to the environment. It is causing an increase. In addition, pure water does not exhibit sufficient cleaning power for contaminants, which is accompanied by a decrease in production yield.

In addition, the cleaning agent containing an alkali compound causes a problem of damaging the PI alignment layer.

Japanese Patent Laid-Open No. 3-62018 proposes a method of stably forming a high pretilt angle by ultrasonic cleaning of a rubbing substrate with pure water. However, it is not easy to introduce ultrasonic waves into the display manufacturing process, and the method of cleaning with pure water does not satisfy the physical properties of the recently required cleaning agent.

Japanese Patent Laid-Open No. 3-81730 proposes a method of cleaning the surface of a rubbing substrate using a brush, but a cleaning effect cannot be expected due to secondary contaminations generated from the brush and reattachment to the substrate.

The above-described techniques are characterized by using a device that provides physical cleaning power to the cleaning process. This method not only increases the cost of the cleaning process, but also uses isopropanol and pure water to reduce solvent residue, rinse defects, It cannot be free from problems such as particle reattachment.

Accordingly, in order to solve the problems as described above, various water-based cleaning systems have been studied that are excellent in safety and work safety for humans and have excellent cleaning power and rinsability by adding various surfactants.

The present invention is to solve the above problems of the prior art, it is excellent in the wetting and penetrating effect, excellent cleaning effect for the contaminants present on the alignment film substrate, and does not cause damage to the alignment film, flammability It is an object of the present invention to provide a safe, environmentally friendly, low-aqueous aqueous cleaning composition.

The present invention provides an aqueous cleaning liquid composition which does not contain an alkali compound, and comprises a lower alcohol, a water-soluble glycol ether compound, an organic phosphate, and water of C1 to C5.

In addition, the present invention provides a liquid crystal cell including an alignment film washed with the aqueous cleaning liquid composition and a liquid crystal display device including the liquid crystal cell.

The water-based cleaning liquid composition of the present invention is excellent in the wetting and penetrating effect, excellent cleaning effect for the contaminants present on the alignment film substrate, does not cause damage to the alignment film, is not flammable, safe and environmentally friendly, Since it does not cause the problem by this, it has the outstanding effect in the cleaning of the board | substrate performed before and after rubbing of a liquid crystal aligning film during the manufacturing process of the liquid crystal cell of a liquid crystal display.

Hereinafter, the present invention will be described in detail.

The cleaning liquid composition according to the present invention is an aqueous cleaning liquid composition which does not contain an alkali compound, and has a characteristic of containing a C1-C5 lower alcohol, a water-soluble glycol ether compound, an organophosphate, and water.

In general, the alkali compound is used as a cleaning agent to remove pollutants or organics in the air, but when used during the liquid crystal cell manufacturing process of the display, it may cause damage to the PI (polyimide) alignment layer. Therefore, since the washing | cleaning liquid composition of this invention does not contain such an alkali compound, damage to a PI (polyimide) aligning film can be prevented.

In addition, the aqueous cleaning liquid composition of the present invention is a substrate cleaning before and after the rubbing process of the liquid crystal alignment film during the liquid crystal cell manufacturing process of the display by the combination of C1 ~ C5 lower alcohol, water-soluble glycol ether compound and organophosphate In this case, while exhibiting an excellent pollutant cleaning effect, it does not damage the alignment film, there is no flammability, there is an advantage that exhibits a low foaming. In particular, it exhibits the outstanding pollutant washing | cleaning effect in the washing | cleaning of a polyimide aligning film.

The content of C1 to C5 lower alcohol, water soluble glycol ether compound, organophosphate, and water in the aqueous wash composition is preferably 0.1 to 15% by weight C1 to C5 lower alcohol, water soluble glycol ether compound based on the total weight of the composition. 0.1 wt% to 15 wt%, organophosphate 0.01 wt% to 10 wt%, and the content may include a balance of water.

The lower alcohol of C1 ~ C5 increases the wettability and penetration of the cleaning liquid to the substrate, and improves the ability to prevent reattachment of the contaminants, thereby easily removing contaminants from the substrate.

Although the kind of the lower alcohols of C1 to C5 is not particularly limited, in view of physical properties such as water solubility, lower alcohols of C1 to C4 are preferable, and examples thereof include methanol, ethanol, n-propanol, isopropanol, ethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, glycerol, 1,2,4-butanetriol and the like can be used, these It can be used individually by 1 type or in combination of 2 or more types.

The content of the lower alcohol in the composition is preferably 0.1% to 15% by weight, more preferably 0.5% to 10% by weight relative to the total weight of the cleaning liquid. If the content of the lower alcohol is less than 0.1% by weight it is difficult to expect the wet penetration because it does not drop the surface tension, if the content of more than 15% by weight may cause a defect due to the residual of the lower alcohol on the substrate.

In the aqueous washing liquid composition, the water-soluble glycol ether compound serves to remove the oil component on the surface of the rubbing substrate, which is difficult to remove only by the lower alcohol aqueous solution, and improves the dissolving ability to water. Among the water-soluble glycol ether compounds, C1 to C10 water-soluble glycol ethers may be preferably used, and C1 to C10 water-soluble glycol ethers may be, for example, ethylene glycol monomethyl ether (MG) or diethylene glycol monomethyl ether (MDG). , Triethylene glycol monomethyl ether (MTG), polyethylene glycol monomethyl ether (MPG), ethylene glycol monoethyl ether (EG), diethylene glycol monoethyl ether (EDG), ethylene glycol monobutyl ether (BG), diethylene Glycol monobutyl ether (BDG), triethylene glycol monobutyl ether (BTG), propylene glycol monomethyl ether (MFG), dipropylene glycol monomethyl ether (MFDG), and the like, and these may be used alone or in combination of two or more. Can be used together.

The content of the water-soluble glycol ether compound is preferably 0.1% by weight to 15% by weight, more preferably 0.5% by weight to 10% by weight. When the content is less than 0.1% by weight, it is difficult to remove the oil component on the surface of the rubbing substrate, and when the content exceeds 15% by weight, the viscosity of the cleaning liquid is increased, which adversely affects the wet penetration into the substrate during cleaning.

In the aqueous cleaning liquid composition, the organophosphate not only disperses contaminants so as not to aggregate with each other, and serves to improve cleaning effect by improving wet penetration of the substrate during cleaning.

The kind of organophosphate is not particularly limited, and examples thereof include aminotri (methylenephosphonic acid), ethylidenediphosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid and 1-hydroxypropylidene. -1,1-diphosphonic acid, 1-hydroxybutylidene-1,1-diphosphonic acid, ethylaminobis (methylenephosphonic acid), 1,2-propylenediaminetetra (methylenephosphonic acid), dodecylamino Bis (methylenephosphonic acid), nitrotris (methylenephosphonic acid), ethylenediaminebis (methylenephosphonic acid), ethylenediaminetetra (methylenephosphonic acid), hexenediaminetetra (methylenephosphonic acid), diethylenetriaminepenta (methylenephosphate) Phenolic acid), cyclohexanediaminetetra (methylenephosphonic acid), hydroxyphosphonoacetic acid, 2-phosphinic acid butane-1,2,4-tricarboxylic acid and the like, among which (1-hydroxyethyl Den) -1,1-diphosphonic acid, hydroxyphosphonoacetic acid, aminotri Ethylene phosphonic acid or phosphinic acid 2-butane-1,2,4-tricarboxylic acid being most preferred.

The content of the organophosphate in the composition is preferably 0.01% by weight to 10% by weight, more preferably 0.1% by weight to 5% by weight. If the organophosphate is less than 0.01% by weight, the wet penetration of the surface of the rubbed substrate may not be improved. If the organophosphate is more than 10% by weight, the organic phosphate may remain on the substrate and cause a defect.

Although the water contained in the said aqueous cleaning liquid composition is not specifically limited, It is preferable to use deionized water whose specific resistance value is 18 MPa / cm or more as water for a semiconductor process. The content of water can be adjusted according to the content of other components.

The aqueous washing liquid composition of the present invention may further include conventional additives known in the art, for example, anticorrosive, wet penetrant, dispersant, surface modifier, and the like, to improve cleaning performance.

The components included in the aqueous washing liquid composition of the present invention can be prepared according to a conventionally known method, and it is particularly preferable to have a purity for semiconductor processing.

The present invention also relates to a liquid crystal cell comprising an alignment film washed with the aqueous cleaning composition and a liquid crystal display device including the liquid crystal cell. Using the water-based cleaner composition of the present invention, since the residual contaminants present on the alignment film substrate are completely removed, the liquid crystal cell including the alignment film has excellent quality. In addition, the liquid crystal display device including the liquid crystal cell can provide a clear display screen.

The cleaning method using the aqueous cleaning liquid composition of the present invention is not particularly limited, and an immersion cleaning method, oscillation cleaning method, ultrasonic cleaning method, shower spray cleaning method, puddle cleaning method, brush cleaning method and the like can be applied.

The cleaning liquid of the present invention is a cleaning agent for the substrate before and after rubbing of the liquid crystal alignment layer during the liquid crystal cell manufacturing process of the liquid crystal display, and not only has excellent stability over time for cleaning performance but also particles present on the alignment layer substrate. Can remove enough pollutants. In addition, since no residue of the cleaning solution is generated, contaminants such as particles and the like are not re-adhered onto the substrate, and a problem of damage to the surface of the alignment film does not occur, it is possible to provide a safe cleaning system.

In addition, since the aqueous washing liquid composition of the present invention has a low foaming property, problems such as deterioration of workability due to bubbles that may occur in a process such as spraying can be prevented.

Hereinafter, the present invention will be described in detail through examples. However, the following examples and the like are provided to explain the present invention in more detail, and the scope of the present invention is not limited thereto.

Examples 1-13 and Comparative Examples 1-4: Preparation of Cleaning Liquid Composition

The components shown in Table 1 were added to a mixing tank equipped with a stirrer according to a predetermined content, and stirred at a speed of 500 rpm for 1 hour at room temperature to prepare a cleaning liquid composition.

Test Example: Evaluation of Detergency and Damage of Alignment Film

1. Evaluation of cleaning power

100 ml of the cleaning solution composition prepared in Examples 1 to 13 and Comparative Examples 1 to 4 were placed in a 250 ml beaker, and ultrasonic waves were applied for 1 minute immediately after supporting the substrate (5 x 5 x 0.7 cm) on which the polyimide alignment layer was rubbed. (40 kHz, 20 ° C) washing was performed. After washing for a while, the substrate was taken out and washed with ultrapure water for 30 seconds to rinse. The liquid on the surface of the substrate was removed with nitrogen gas, and then dried at 170 ° C. for 5 minutes in an oven. The board | substrate was inspected with the scanning electron microscope (SEM: Hitachi company, model name S-4700), and the washing | cleaning power was evaluated by the particle number of the foreign material which remained on the surface of a board | substrate. The results are shown in Table 1 below and FIGS. 1 and 2.

2. Evaluation of Damage to Polyimide Alignment Film

100 ml of the cleaning liquid compositions prepared in Examples 1 to 13 and Comparative Examples 1 to 4 were placed in a beaker having a capacity of 250 ml, respectively, and the substrate having the polyimide alignment layer formed on glass was immersed for 30 minutes to be cleaned. The substrate was taken out, washed with water, dried with nitrogen gas, and dried, and the degree of damage of the polyimide alignment layer was visually observed and examined by scanning electron microscope (SEM: Hitachi, model name S-4700). The test results are shown in Table 1 below.

[Washing performance] ◎: Very good, ○: Good, △: Normal, ㅧ: Poor

A-1: Ethanol

A-2: isopropanol

A-3: Glycerol

B-1: diethylene glycol monomethyl ether (MDG)

B-2: diethylene glycol monoethyl ether (EDG)

B-3: diethylene glycol monobutyl ether (BDG)

C-1: 1-hydroxyethylidene-1,1-diphosphonic acid (HEDP)

C-2: 2-phosphinic acid butane-1,2,4-tricarboxylic acid (PBTC)

C-3: hydroxy phosphono acetic acid (HPA)

TMAH: Tetra methyl ammonium hydroxide.

From the results shown in Table 1 above, it was confirmed that all of the cleaning liquid compositions of Examples 1 to 13 of the present invention showed excellent cleaning power, and did not cause damage to the polyimide alignment layer.

On the other hand, the cleaning liquid composition of Comparative Example 1 containing a small amount of the alkali compound was completely impossible to use the PI alignment layer removed. In addition, although the cleaning liquid composition of Comparative Example 2 had a cleaning effect on foreign matters, organic substances remained on the substrate to form stains, resulting in a defect. In addition, the cleaning liquid composition of Comparative Example 3 showed no damage to the alignment film but low cleaning power to foreign substances, and the cleaning liquid composition of Comparative Example 4 made of pure water did not damage the polyimide alignment film, but the cleaning power was low and the defect was poor. It can be seen that.

1 is a photograph taken with a scanning electron microscope (SEM) of a polyimide alignment layer substrate treated by the method of Test Example 1 using the cleaning solution of Example 1 of the present invention.

2 is a photograph taken with a scanning electron microscope (SEM) of a polyimide alignment layer substrate treated by the method of Test Example 1 using the cleaning solution of Comparative Example 4 of the present invention.

Claims (9)

An aqueous washing liquid composition which does not contain an alkali compound, wherein the aqueous washing liquid composition comprises a C1 to C5 lower alcohol, a water-soluble glycol ether compound, an organic phosphate, and water. The method according to claim 1, wherein the aqueous cleaning liquid composition is 0.1% to 15% by weight of lower alcohol of C1 ~ C5, 0.1% to 15% by weight of water-soluble glycol ether compound, 0.01% to 10% by weight of organic phosphate And a residual amount of water. The water cleaning composition according to claim 1, wherein the water cleaning composition is used to clean the substrate before and after the rubbing process of the alignment layer during the liquid crystal display process. The lower alcohol of claim 1, wherein the lower alcohol of C 1 to C 5 is methanol, ethanol, n-propanol, isopropanol, ethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,2-butanediol, 1,3- Butanediol, 1,4-butanediol, glycerol and 1,2,4-butane triol Aqueous cleaning liquid composition characterized by consisting of one or more selected from the group consisting of. The aqueous washing liquid composition according to claim 1, wherein the water-soluble glycol ether compound is a C1-C10 water-soluble glycol ether. The method of claim 1, wherein the water-soluble glycol ether compound is ethylene glycol monomethyl ether (MG), diethylene glycol monomethyl ether (MDG), triethylene glycol monomethyl ether (MTG), polyethylene glycol monomethyl ether (MPG), ethylene Glycol monoethyl ether (EG), diethylene glycol monoethyl ether (EDG), ethylene glycol monobutyl ether (BG), diethylene glycol monobutyl ether (BDG), triethylene glycol monobutyl ether (BTG), propylene glycol mono Aqueous cleaning liquid composition, characterized in that it is composed of one or more selected from the group consisting of methyl ether (MFG), and dipropylene glycol monomethyl ether (MFDG). The method of claim 1, wherein the organophosphate is aminotri (methylenephosphonic acid), ethylidenediphosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, 1-hydroxypropylidene-1,1- Diphosphonic acid, 1-hydroxybutylidene-1,1-diphosphonic acid, ethylaminobis (methylenephosphonic acid), 1,2-propylenediaminetetra (methylenephosphonic acid), dodecylaminobis (methylenephosphonic acid ), Nitrotris (methylenephosphonic acid), ethylenediaminebis (methylenephosphonic acid), ethylenediaminetetra (methylenephosphonic acid), hexenediaminetetra (methylenephosphonic acid), diethylenetriaminepenta (methylenephosphonic acid), cyclohexane Aqueous cleaner composition comprising at least one selected from the group consisting of diaminetetra (methylenephosphonic acid), hydroxyphosphonoacetic acid, and 2-phosphinic acid butane-1,2,4-tricarboxylic acid . The liquid crystal cell containing the alignment film wash | cleaned with the aqueous washing | cleaning liquid composition of any one of Claims 1-7. Liquid crystal display device comprising the liquid crystal cell of claim 8.

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