KR20100122894A - 평면 안테나 부재, 및 이것을 구비한 플라즈마 처리 장치 - Google Patents

평면 안테나 부재, 및 이것을 구비한 플라즈마 처리 장치 Download PDF

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Publication number
KR20100122894A
KR20100122894A KR1020107007491A KR20107007491A KR20100122894A KR 20100122894 A KR20100122894 A KR 20100122894A KR 1020107007491 A KR1020107007491 A KR 1020107007491A KR 20107007491 A KR20107007491 A KR 20107007491A KR 20100122894 A KR20100122894 A KR 20100122894A
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KR
South Korea
Prior art keywords
center
planar antenna
hole
antenna member
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020107007491A
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English (en)
Korean (ko)
Inventor
아츠시 우에다
히카루 아다치
카이종 티안
요시노리 후쿠다
도시아키 혼고
마사오 요시오카
Original Assignee
도쿄엘렉트론가부시키가이샤
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Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20100122894A publication Critical patent/KR20100122894A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020107007491A 2008-03-14 2009-03-13 평면 안테나 부재, 및 이것을 구비한 플라즈마 처리 장치 Ceased KR20100122894A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008065635A JP2009224455A (ja) 2008-03-14 2008-03-14 平面アンテナ部材およびこれを備えたプラズマ処理装置
JPJP-P-2008-065635 2008-03-14

Publications (1)

Publication Number Publication Date
KR20100122894A true KR20100122894A (ko) 2010-11-23

Family

ID=41065337

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107007491A Ceased KR20100122894A (ko) 2008-03-14 2009-03-13 평면 안테나 부재, 및 이것을 구비한 플라즈마 처리 장치

Country Status (5)

Country Link
US (1) US20110114021A1 (https=)
JP (1) JP2009224455A (https=)
KR (1) KR20100122894A (https=)
CN (1) CN101849444B (https=)
WO (1) WO2009113680A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10755899B2 (en) 2014-06-30 2020-08-25 Semes Co., Ltd. Substrate treating apparatus

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8884526B2 (en) 2012-01-20 2014-11-11 Taiwan Semiconductor Manufacturing Co., Ltd. Coherent multiple side electromagnets
CN103647128B (zh) * 2013-12-23 2016-05-11 西南交通大学 一种高功率径向线密封窗
SG11201608640QA (en) 2014-05-16 2016-11-29 Applied Materials Inc Showerhead design

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03191073A (ja) * 1989-12-21 1991-08-21 Canon Inc マイクロ波プラズマ処理装置
JP3136054B2 (ja) * 1994-08-16 2001-02-19 東京エレクトロン株式会社 プラズマ処理装置
JPH11251299A (ja) * 1998-03-03 1999-09-17 Hitachi Ltd プラズマ処理方法および装置
JPH11260594A (ja) * 1998-03-12 1999-09-24 Hitachi Ltd プラズマ処理装置
JP3430053B2 (ja) * 1999-02-01 2003-07-28 東京エレクトロン株式会社 プラズマ処理装置
JP4478352B2 (ja) * 2000-03-29 2010-06-09 キヤノン株式会社 プラズマ処理装置及びプラズマ処理方法並びに構造体の製造方法
JP4504511B2 (ja) * 2000-05-26 2010-07-14 忠弘 大見 プラズマ処理装置
JP4598247B2 (ja) * 2000-08-04 2010-12-15 東京エレクトロン株式会社 ラジアルアンテナ及びそれを用いたプラズマ装置
JP4183934B2 (ja) * 2001-10-19 2008-11-19 尚久 後藤 マイクロ波プラズマ処理装置、マイクロ波プラズマ処理方法及びマイクロ波給電装置
JP3914071B2 (ja) * 2002-03-12 2007-05-16 東京エレクトロン株式会社 プラズマ処理装置
JP2004235434A (ja) * 2003-01-30 2004-08-19 Rohm Co Ltd プラズマ処理装置
US6998565B2 (en) * 2003-01-30 2006-02-14 Rohm Co., Ltd. Plasma processing apparatus
JP4149427B2 (ja) * 2004-10-07 2008-09-10 東京エレクトロン株式会社 マイクロ波プラズマ処理装置
JP2006244891A (ja) * 2005-03-04 2006-09-14 Tokyo Electron Ltd マイクロ波プラズマ処理装置
US20080190560A1 (en) * 2005-03-04 2008-08-14 Caizhong Tian Microwave Plasma Processing Apparatus
JP4997826B2 (ja) * 2006-05-22 2012-08-08 東京エレクトロン株式会社 平面アンテナ部材及びこれを用いたプラズマ処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10755899B2 (en) 2014-06-30 2020-08-25 Semes Co., Ltd. Substrate treating apparatus

Also Published As

Publication number Publication date
CN101849444A (zh) 2010-09-29
JP2009224455A (ja) 2009-10-01
US20110114021A1 (en) 2011-05-19
CN101849444B (zh) 2012-08-29
WO2009113680A1 (ja) 2009-09-17

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