KR20100112521A - Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, and substrate - Google Patents

Abstract

PURPOSE: A light irradiating apparatus for an exposure apparatus, lighting control method thereof, exposure apparatus, and a substrate are provided to easily control a lamp regardless of the size and number of a lamp by controlling cassettes respectively. CONSTITUTION: A plurality of light source unit comprises a reflection optical group having the directivity of light. A plurality of cassettes(81) respectively mount the light source unit. A frame(82) mounts the plural cassette. A controller controls the on/off the plural light source units. The controller controls the light source units in the cassettes to be turned on in point symmetry.

Description

LIGHT IRRADIATING APPARATUS FOR EXPOSURE APPARATUS, LIGHTING CONTROL METHOD THEREOF, EXPOSURE APPARATUS, AND SUBSTRATE}

BACKGROUND OF THE INVENTION Field of the Invention The present invention relates to a light irradiation apparatus for an exposure apparatus, a lighting control method thereof, and an exposure apparatus and a substrate, and more particularly, a mask pattern of a mask on a substrate of a large flat panel display such as a liquid crystal display or plasma plasma. A light irradiation apparatus for exposure apparatus, a lighting control method thereof, and an exposure apparatus and a substrate which can be applied to an exposure apparatus that performs exposure transfer.

Conventionally, various exposure apparatuses, such as a proximity exposure apparatus, a scanning exposure apparatus, a projection exposure apparatus, a mirror projection, a close-type exposure apparatus, are devised as apparatus which manufactures panels, such as a color filter of a flat panel display apparatus. For example, in the split-sequential proximity exposure apparatus, a mask smaller than the substrate is held at the mask stage, the substrate is held at the workpiece stage, the two are proximately arranged to face each other, and then the workpiece stage is moved stepwise with respect to the mask to make each step. By irradiating the pattern exposure light from the mask side to the substrate every time, a plurality of patterns drawn on the mask are exposed and transferred onto the substrate, thereby producing a plurality of panels on one substrate. Moreover, in a scanning exposure apparatus, exposure light is irradiated to the board | substrate conveyed at a fixed speed | rate through a mask, and the pattern of a mask is exposed and transferred on a board | substrate.

In recent years, display apparatuses are gradually being enlarged, for example, in the case of dividing sequential exposure, when an eighth generation (2200 mm × 2500 mm) panel is manufactured with four exposure shots, one exposure area is 1300 mm × 1120. It becomes mm and when it manufactures with six exposure shots, one exposure area becomes 1100 mm x 750 mm. Therefore, the exposure apparatus is also required to be enlarged in the exposure apparatus, and the output of the light source to be used also needs to be increased. For this reason, what was made to raise the output of the whole light source using several light sources as an illumination optical system is known (for example, refer patent documents 1-3). For example, in the light irradiation apparatus of patent document 2, while lighting a part of several lamps, the actual illuminance measured with the illuminance meter compares with the preset appropriate illuminance, and interrupts or presupposes the electricity supply of a lamp in accordance with the real lack of illuminance. The lamp is energized. In the light irradiation apparatus of patent document 3, during lighting of a lamp, a light source unit is removed from a back surface side, a new light source unit is attached, lamp replacement is performed without stopping a manufacturing line, and a light source unit is also attached to a support body. In this case, it is described that the positioning portion of the light source unit is pressed to the positioning edge portion of the support to perform positioning in the optical axis direction.

Patent Document 1: Japanese Patent Publication No. 4391136 Patent Document 2: Japanese Unexamined Patent Publication No. 2008-241877 Patent Document 3: Japanese Unexamined Patent Publication No. 2006-278907

By the way, in an exposure apparatus, by changing the illumination intensity of a light irradiation apparatus, it can respond to the sensitivity characteristic of various resists. Since the exposure amount is calculated by the product of illuminance and time, an appropriate exposure amount can be obtained by changing the illuminance or time, but the time is already set short for shortening the tact time, and it is difficult to further change by time. For this reason, in order to obtain a suitable exposure amount by changing illuminance, low illuminance is conventionally implemented using the photosensitive (ND) filter etc. In this case, wasted power consumption is generated, and optical components such as ND filters are required. In Patent Literature 2, it is described that a part of a lamp is turned on and exposed, but it is intended to operate a constant illuminance, not to suppress power consumption, and how to turn on or turn off a plurality of lamps. It is not described.

Moreover, in patent documents 1 and 2, when replacing a lamp, it is necessary to replace each lamp one by one, and the time (down time) for stopping a device becomes long because lamp replacement takes time. As a technique aimed at eliminating down time, a configuration is disclosed in which a lamp can be replaced during exposure operation such as Patent Document 3, but the operator's replacement time itself is long since it is an individual exchange.

This invention is made | formed in view of the above-mentioned subject, The objective is the light irradiation apparatus for exposure apparatuses and lighting control which can control a light source part easily, while being able to suppress power consumption according to required illuminance. A method, and an exposure apparatus and a board | substrate are provided.

The above object of the present invention is achieved by the following configuration.

(1) a plurality of light source portions each including a light emitting portion and a reflection optical system which emits light by directing the light generated from the light emitting portion;

A plurality of cassettes each capable of mounting a predetermined number of said light source portions;

The frame which can attach the plurality of cassettes,

A control unit for controlling lighting or turning off of the light source units,

And the control unit controls the predetermined number of light source units to light up in point symmetry in each of the cassettes.

(2) The said control part controls all the light source parts to light up point symmetrically by the point lighting which the said predetermined number of light source parts of the said some cassettes simultaneously light up by the same lighting pattern, The exposure apparatus for (1) characterized by the above-mentioned. Light irradiation device.

(3) The control unit includes a plurality of lighting pattern groups in which the number of the light source units to light up among the predetermined number of light source units in the cassette is different, and each of the lighting pattern groups includes a plurality of light source units that are lighted point-symmetrically. The light irradiation apparatus for exposure apparatus as described in (1) or (2) characterized by having a lighting pattern, respectively.

(4) further comprising a timer for counting the lighting time of each light source unit,

The control unit selects one of the plurality of lighting pattern groups according to desired illuminance, and selects the lighting pattern based on the lighting time of the light source unit among the selected lighting pattern groups (3). The light irradiation apparatus for exposure apparatus of description).

(5) further provided with a timer for counting the lighting time of each light source unit,

The control unit calculates a remaining life of the plurality of light source units based on the lighting time of each light source unit and the voltage or power supplied at the time of lighting,

The control unit selects one of the plurality of lighting pattern groups according to a desired illuminance, and selects the lighting pattern based on the remaining life of the light source unit among the selected lighting pattern groups (3). The light irradiation apparatus for exposure apparatus of description).

(6) When the desired illuminance is different from the illuminance obtained by the plurality of lighting pattern groups, a lighting pattern group at which illuminance close to the desired illuminance is obtained is selected, and a voltage or electric power to be supplied to the light source to be turned on is selected. The irradiation apparatus for exposure apparatus as described in (4) or (5) characterized by adjusting.

(7) The cassette has a light source support part for supporting the predetermined number of light source parts,

The light source support portion is formed such that the distance of each optical axis from each irradiation surface irradiated with the light of the predetermined number of light source portions to the incident surface of the integrator lens to which the predetermined number of light source portions are incident is substantially constant. The light irradiation apparatus for exposure apparatus in any one of (1)-(6) characterized by the above-mentioned.

(8) The frame has a plurality of cassette mounting portions to which the plurality of cassettes are respectively mounted,

The plurality of cassette mounting portions are formed such that the distance of each optical axis from each irradiation surface to which the light from all the light source portions is irradiated is substantially constant from the incident surface of the integrator lens to which the light from all the light source portions is incident. The light irradiation apparatus for exposure apparatus as described in (7).

(9) The plurality of cassette mounting portions each include an opening facing the light source support portion of the cassette and a plane that abuts with a flat portion formed around the light source support portion,

Each plane of the said cassette mounting part arrange | positioned in a predetermined direction intersects at a predetermined angle, The light irradiation apparatus for exposure apparatus as described in (8) characterized by the above-mentioned.

(10) a substrate holding portion for holding a substrate as an exposed material;

A mask holding part for holding a mask so as to face the substrate;

Illumination optical system which has the said light irradiation apparatus as described in any one of (1)-(9), and the integrator lens which the light radiate | emitted from the several light source part of this light irradiation apparatus injects,

And irradiating light from the illumination optical system to the substrate through the mask.

It exposes using the exposure apparatus of (11) (10), The board | substrate characterized by the above-mentioned.

(12) a plurality of light source parts each including a light emitting part and a reflecting optical system that emits light emitted from the light emitting part by directivity, and a plurality of cassettes each capable of mounting a predetermined number of the light source parts; As a light irradiation method of the light irradiation apparatus for exposure apparatuses provided with the frame which can mount a cassette, and the control part which controls lighting or turning off the said some light source part,

And the control unit controls the predetermined number of light sources in each of the cassettes to light up in point symmetry.

In addition, "illuminance" means the energy [mW / cm <2>] which the area of 1 cm <2> receives for 1 second.

According to the light irradiation apparatus for exposure apparatus of this invention and its lighting control method, since a control part made it control to light up the predetermined number of light source parts in each cassette, it suppresses power consumption according to required illumination, and can expose. Since the cassette is controlled for each cassette, it is possible to easily control the lighting of the lamp irrespective of the change in the substrate size (generation) or the number of lamps.

Further, by controlling each lamp 71 of the predetermined number of light source sections 73 of the plurality of cassettes 81 to light up in point symmetry with the same lighting pattern, all the light source sections 73 in the frame 82 light up in point symmetry. Thereby, illumination intensity can be changed, without changing the illumination intensity distribution of an exposure surface.

BRIEF DESCRIPTION OF THE DRAWINGS It is a partially exploded perspective view for demonstrating the split sequential proximity exposure apparatus concerning 1st Embodiment of this invention.
FIG. 2 is a front view of the divided sequential proximity exposure apparatus shown in FIG. 1. FIG.
3 is a cross-sectional view of the mask stage.
(A) is a front view which shows the light irradiation apparatus of an illumination optical system, (b) is sectional drawing along the IV-IV line of (a), (c) is IV'-IV of (a) 'Is a cross section along the line.
(A) is a front view which shows a cassette, (b) is sectional drawing seen from the V direction of (a), (c) is an integrate sectional drawing of the cassette seen from the V 'direction of (a). It is a figure shown with a radar lens.
6 is an enlarged cross-sectional view of the vicinity of the light source unit attached to the cassette.
7 is a sectional view of a cassette showing a modification of the lamp pressing mechanism.
8 is an enlarged view illustrating main parts showing a state in which a cassette is mounted on a frame.
9 is a schematic diagram showing the distance from the exit surface of each light source unit to the incident surface of the integrator lens.
10 is a diagram for illustrating a control configuration of each light source unit.
11 is a diagram for explaining the life time detection means.
It is a figure which shows an example of the structure which cools each light source part with air.
(A)-(c) is a figure which shows the example of the exhaust hole formed in the cassette press cover.
14 (a) and 14 (b) are diagrams showing design examples of cooling paths in which each light source unit is cooled by a refrigerant.
15 is a diagram illustrating an example in which a cassette and a lid member are disposed in a cassette mounting portion.
16 (a) and 16 (b) are diagrams showing the arrangement of the light source unit attached to the cassette.
FIG. 17 is a diagram illustrating a frame on which the cassette of FIG. 16A is mounted.
FIG.18 (a)-(d) is a figure which shows the lighting control method of a light irradiation apparatus.
19 (a) to 19 (c) are diagrams showing a lighting pattern of each light source unit in the cassette.
20 is an overall perspective view of a proximity scan exposure apparatus according to a second embodiment of the present invention.
21 is a top view illustrating the proximity scan exposure apparatus in a state where an upper configuration such as an irradiation unit is removed.
It is a side view which shows the exposure state in the mask arrangement | positioning area of a proximity scan exposure apparatus.
(A) is a principal part top view for demonstrating the positional relationship of a mask and an air pad, (b) is sectional drawing.
It is a figure for demonstrating the irradiation part of the proximity scan exposure apparatus.
(A) is a front view which shows the light irradiation apparatus of FIG. 24, (b) is sectional drawing along the XXV-XXV line of (a).

EMBODIMENT OF THE INVENTION Hereinafter, each embodiment which concerns on the light irradiation apparatus, exposure apparatus, and exposure method of this invention is described in detail based on drawing.

(1st embodiment)

As shown to FIG. 1 and FIG. 2, the divided sequential proximity exposure apparatus PE of 1st Embodiment hold | maintains the mask stage 10 which hold | maintains the mask M, and the glass substrate (exposed material) W. FIG. The substrate stage 20 and the illumination optical system 70 which irradiate the pattern exposure light are provided.

In addition, the glass substrate W (henceforth simply called "substrate W") is arrange | positioned facing the mask M, and in order to expose and transfer the pattern drawn on this mask M, the surface (mask M The photosensitive agent is apply | coated to the opposing surface side) of ().

The mask stage 10 can move to the mask stage base 11 in which the rectangular opening 11a is formed in the center part, and the opening 11a of the mask stage base 11 in X, Y, and θ directions. The mask holding frame 12, which is a mask holding part which is mounted securely, is formed on the upper surface of the mask stage base 11, and the mask holding frame 12 is moved in the X-axis, Y-axis, and θ directions to position the mask M. FIG. And a mask drive mechanism 16 for adjusting the pressure.

The mask stage base 11 is supported to be movable in the Z-axis direction by the support 51 which stands on the apparatus base 50, and the Z-axis moving apparatus 52 formed in the upper end of the support 51. 2 (see FIG. 2), and is disposed above the substrate stage 20.

As shown in FIG. 3, the planar bearing 13 is arrange | positioned in multiple numbers at the upper peripheral part upper surface of the opening 11a of the mask stage base 11, and the mask holding frame 12 is formed in the upper outer peripheral part. The flange 12a is mounted on the planar bearing 13. As a result, the mask holding frame 12 is inserted into the opening 11a of the mask stage base 11 via a predetermined gap, so that the mask holding frame 12 can move in the X, Y, and θ directions by the gap.

Moreover, the chuck | zipper part 14 which hold | maintains the mask M is being fixed to the lower surface of the mask holding frame 12 via the interseat seat 15. In this chuck | zipper part 14, the some suction nozzle 14a for adsorb | sucking the peripheral part which the mask pattern of the mask M is not drawn is opened, and the mask M has a suction nozzle 14a. It is maintained so that it can be attached or detached to the chuck | zipper part 14 by the vacuum suction device which is not shown through the figure. Moreover, the chuck | zipper part 14 can move with respect to the mask stage base 11 with the mask holding frame 12 in the X-axis, Y-axis, (theta) direction.

The mask drive mechanism 16 includes two Y-axis drive devices 16y attached to one side along the X-axis direction of the mask holding frame 12, and one along the Y-axis direction of the mask holding frame 12. One X-axis direction drive apparatus 16x attached to the side is provided.

The Y-axis direction drive device 16y is provided on the mask stage base 11, and has a rod actuator 16a (for example, an electric actuator, etc.) 16a having a rod 16b that expands and contracts in the Y-axis direction, and a rod A guide mounted on the side of the slider 16d connected to the front end of the 16b via the pin support mechanism 16c and the mask holding frame 12 along the X-axis direction, and movably mounting the slider 16d. The rail 16e is provided. In addition, the X-axis direction drive apparatus 16x also has the same structure as the Y-axis direction drive apparatus 16y.

In the mask drive mechanism 16, the mask holding frame 12 is moved in the X-axis direction by driving one X-axis direction drive device 16x, so that the two Y-axis drive devices 16y are equal. By driving, the mask holding frame 12 is moved in the Y axis direction. Moreover, the mask holding frame 12 is moved (the Z-axis periphery rotation) in the (theta) direction by driving any one of two Y-axis direction drive devices 16y.

Moreover, on the upper surface of the mask stage base 11, as shown in FIG. 1, it hold | maintains in the space | interval sensor 17 and the chuck | zipper part 14 which measure the space | interval between the opposing surface of the mask M and the board | substrate W. As shown in FIG. An alignment camera 18 for confirming the mounting position of the mask M to be used is formed. These gap sensors 17 and alignment cameras 18 are held to be movable in the X-axis and Y-axis directions via the moving mechanism 19, and are arranged in the mask holding frame 12.

In addition, on the mask holding frame 12, as shown in FIG. 1, both ends of the mask M are needed in the X-axis direction both ends of the opening 11a of the mask stage base 11 as needed. Aperture blades 38 for shielding are thus formed. The aperture blade 38 is movable in the X-axis direction by the aperture blade drive mechanism 39 composed of a motor, a ball screw, a linear guide, and the like, thereby reducing the shielding area at both ends of the mask M. FIG. Adjust In addition, the aperture blade 38 is similarly formed not only at both ends of the X-axis direction of the opening 11a but also at both ends of the Y-axis direction of the opening 11a.

As shown in FIG. 1 and FIG. 2, the substrate stage 20 includes a substrate holding part 21 holding the substrate W and a substrate holding part 21 with respect to the apparatus base 50. The board | substrate drive mechanism 22 which moves to an axis and a Z axis direction is provided. The board | substrate holding part 21 hold | maintains so that the board | substrate W can be attached or detached freely by the vacuum suction mechanism not shown. The board | substrate drive mechanism 22 is the Y-axis table 23, the Y-axis feed mechanism 24, the X-axis table 25, the X-axis feed mechanism 26, and Z under the board | substrate holding part 21. -Tilt adjustment mechanism 27 is provided.

As shown in FIG. 2, the Y-axis feed mechanism 24 includes a linear guide 28 and a feed drive mechanism 29, and the slider 30 mounted on the rear surface of the Y-axis table 23 is provided. The Y-axis table 23 is provided by the motor 32 and the ball screw device 33 while being installed across two guide rails 31 extending on the device base 50 via a rolling element (not shown). Is driven along the guide rail 31.

Moreover, the X-axis feed mechanism 26 also has the same structure as the Y-axis feed mechanism 24, and drives the X-axis table 25 with respect to the Y-axis table 23 in the X direction. In addition, the Z-tilt adjustment mechanism 27 has one movable wedge mechanism formed by combining the wedge-shaped moving bodies 34 and 35 and the feed drive mechanism 36 on one end in the X direction and two on the other end. It is comprised by arrangement. Moreover, the structure which combined the motor and the ball screw apparatus may be sufficient as the feed drive mechanisms 29 and 36, and the linear motor which has a stator and a mover may be sufficient as it. In addition, the number of installation of the Z-tilt adjustment mechanism 27 is arbitrary.

Thereby, the board | substrate drive mechanism 22 transfer-drives the board | substrate holding part 21 to a X direction and a Y direction, and fine-adjusts the space | interval between the opposing surface of the mask M and the board | substrate W. The holding portion 21 is finely moved in the Z axis direction and tilted.

The bar mirrors 61 and 62 are attached to the X direction side part and the Y direction side part of the board | substrate holding part 21, respectively, and 3 laser interferometers (total of Y direction end part and X direction end part of the apparatus base 50) 63, 64, 65 are formed. Thereby, the laser beam is irradiated to the bar mirrors 61 and 62 from the laser interferometers 63, 64 and 65, the laser beam reflected by the bar mirrors 61 and 62 is received, and the laser beam and the bar mirror 61 are received. , The interference of the laser light reflected by the 62 is measured to detect the position of the substrate stage 20.

As shown in FIG.2 and FIG.4, the illumination optical system 70 is the integrator which the light irradiation apparatus 80 provided with the some light source part 73, and the light beam inject | emitted from the some light source part 73 inject. Of the optical path emitted from the exit surface of the lens 74, the voltage controllable optical control unit 76 including switching of turning on and off the lamps 71 of the respective light source units 73, and the integrator lens 74. It is provided with the concave mirror 77 which changes a direction, and the exposure control shutter 78 arrange | positioned between the some light source part 73 and the integrator lens 74, and controls opening and closing so that the irradiated light may be transmitted and interrupted. In addition, a DUV cut filter, a polarization filter, and a band pass filter may be disposed between the integrator lens 74 and the exposure surface, and the curvature of the mirror can be manually or automatically changed in the concave mirror 77. Declination angle correction means may be provided.

4 to 6, the light irradiation apparatus 80 includes an ultra-high pressure mercury lamp 71 serving as a light emitting portion and a reflecting mirror serving as a reflecting optical system which emits light by directing the light generated from the lamp 71. A plurality of light sources 73 each including a plurality of light sources 73, a plurality of cassettes 81 each capable of mounting a predetermined number of light sources 73 among the plurality of light sources 73, and a plurality of cassettes 81. The frame 82 which can be attached is provided. As a light emitting part, LED may be applied instead of the ultrahigh pressure mercury lamp 71.

방향으로 3 단, β 방향으로 2 열의 합계 6 개의 광원부 (73) 가 장착된 카세트 (81) 를 3 단 × 3 열의 합계 9 개 배치한, 54 개의 광원부 (73) 를 갖는 것으로서 설명한다. 또한, 카세트 (81) 나 프레임 (82) 은, 광원부 (73) 의 배치를

, β 방향으로 동일한 수로 한 정사각형 형상도 생각할 수 있지만, , β 방향으로 상이한 수로 한 직사각형 형상이 적용된다. 또한, 본 실시형태의 광원부 (73) 에서는, 반사경 (72) 의 개구부 (72b) 가 대략 정사각형 형상으로 형성되어 있고, 4 변이

, β 방향을 따르도록 배치되어 있다.In addition, in the illumination optical system 70, when the 160 W ultra-high pressure mercury lamp 71 is used, in the exposure apparatus which manufactures the 6th generation flat panel, the exposure apparatus which manufactures 374 light source parts and the 7th generation flat panel is used. In the exposure apparatus for manufacturing 572 light source parts and the eighth generation flat panel, 774 light source parts are required. However, in this embodiment, in order to simplify description, as shown in FIG. 4,

The description will be given as having 54 light source sections 73 in which nine cassettes 81 in which six light source sections 73 in total are arranged in three steps in the β direction and in total in two rows are arranged. In addition, the cassette 81 and the frame 82 may arrange the light source unit 73.

You can think of square shapes with the same number in the β direction, , rectangular shapes with different numbers in the β direction are applied. Moreover, in the light source part 73 of this embodiment, the opening part 72b of the reflecting mirror 72 is formed in substantially square shape, and four sides are changed.

, is arranged along the β direction.

Each cassette 81 presses the light source support part 83 which supports the predetermined number of light source parts 73, and the light source part 73 supported by the light source support part 83, and is concave shape attached to the light source support part 83. It is formed in the substantially rectangular parallelepiped shape provided with the lamp press cover (cover member) 84, and has the same structure, respectively.

The light source support part 83 is formed corresponding to the number of light source parts 73, is formed in the cover part of the window part 83a which emits the light from the light source part 73, and the window part 83a, and the reflecting mirror A lamp recess 83b is formed that surrounds the opening 72a of the 72 (or the opening of the reflector mounting portion on which the reflector 72 is mounted). Moreover, the some cover glass 85 is each attached to the cover opposite side of the window part 83a. In addition, attachment of the cover glass 85 is arbitrary, and does not need to be formed.

, β 방향에 있어서 단일 곡면, 예를 들어 구면 (r) 상에 위치하도록, 평면 또는 곡면 (본 실시형태에서는 평면) 으로 형성된다.The bottom face of each lamp recess 83b is the intersection of the irradiation surface (here, the opening face 72b of the reflecting mirror 72) to irradiate light from the light source unit 73 with the optical axis L of the light source unit 73. (p) teeth

, it is formed in a plane or curved surface (in this embodiment, flat) so as to be located on a single curved surface, for example, spherical surface r in the β direction.

The bottom face of the lamp press cover 84 is provided with the contact part 86 which abuts on the rear part of the light source part 73, and each contact part 86 has an actuator like a motor and a cylinder, a spring press, and screwing The lamp pressing mechanism 87 constituted by the like and the like is formed. Thereby, each light source part 73 fits the opening part 72a of the reflecting mirror 72 to the recessed part 83b for lamps of the light source support part 83, and attaches the lamp press cover 84 to the light source support part 83. As shown in FIG. Then, by pressing the rear portion of the light source portion 73 by the lamp pressing mechanism 87, the cassette 81 is positioned. Therefore, as shown in FIG. 5 (c), an integue into which the light of the predetermined number of light source portions 73 is incident from each of the irradiation surfaces to which the light of the predetermined number of light source portions 73 positioned on the cassette 81 irradiates. The distance of each optical axis L to the incident surface of the laser lens 74 becomes substantially constant. Moreover, in the storage space between the light source support part 83 and the lamp press cover 84, the back surface 72c of the reflecting mirror 72 of the adjacent light source part 73 opposes directly, and the light source part 73 and a lamp press are directly opposed. Except for the mechanism 87 and the like, there is no blocking of the flow of air in the storage space, so that good air flowability is provided.

In addition, although the lamp pressing mechanism 87 may be formed for every contact part 86, as shown in FIG. 7, it may be formed in the side wall of the lamp pressing cover 84. As shown in FIG. Also in this case, although the contact part 86 may be individually formed in each light source part 73, you may make it contact a back part of two or more light source parts 73. As shown in FIG.

In addition, the frame 82 is mounted to the frame main body 91 having the plurality of cassette mounting portions 90 for mounting the plurality of cassettes 81 and the frame main body 91, and the rear portion of each cassette 81. It has a frame cover 92 to cover it.

As shown in FIG. 8, each cassette mounting part 90 is provided with the opening part 90a which the light source support part 83 faces, and the rectangular plane around the light source support part 83 opposes the opening part 90a. The cassette recessed part 90c which made the flat surface 90b the bottom face is formed. Moreover, the cassette fixing means 93 for fixing the cassette 81 is formed in the circumference | surroundings of the cassette recessed part 90c of the frame main body 91, and in this embodiment, the recess formed in the cassette 81 is formed. It is engaged with the part 81a, and the cassette 81 is fixed.

방향 혹은 β 방향으로 나열되는 카세트용 오목부 (90c) 의 각 평면 (90b) 은, 각 카세트 (81) 의 모든 광원부 (73) 의 광을 조사하는 조사면과, 광원부 (73) 의 광축 (L) 의 교점 (p) 이, 각

, β 방향에 있어서 단일 곡면, 예를 들어 구면 (r) 상에 위치하도록 (도 9 참조), 소정의 각도 (γ) 로 교차하도록 형성된다.

Each plane 90b of the cassette recessed portion 90c arranged in the direction or β direction has an irradiation surface for irradiating light from all the light source portions 73 of each cassette 81 and the optical axis L of the light source portion 73. ) The intersection of (p)

, so as to intersect at a predetermined angle γ so as to be located on a single curved surface, for example, spherical surface r in the β direction (see FIG. 9).

Therefore, each cassette 81 has the cassette fixing means 93 of the cassette 81 in a state where these light source support portions 83 are fitted to the cassette recessed portions 90c of the cassette mounting portions 90 and positioned. It is fixed to the frame 82 by engaging with the recessed part 81a, respectively. In the state where each of these cassettes 81 is attached to the frame main body 91, the frame cover 92 is attached to the frame main body 91. Therefore, as shown in FIG. 9, each irradiation surface which the light of all the light source parts 73 positioned in each cassette 81 irradiates, and the integrator lens 74 which the light of the predetermined number of light source parts 73 injects into. The distance of each optical axis L to the incidence plane of N is also substantially constant.

10, the lighting source 95 and the control circuit 96 which supply electric power to the lamp 71 are individually connected to the light source part 73 of each cassette 81, and each light source part Each wiring 97 extending rearward from the 73 is connected to at least one connector 98 formed in each cassette 81 and collected. And the connector 98 of each cassette 81 and the optical control part 76 formed in the outer side of the frame 82 are connected by the other wiring 99, respectively. Thereby, the optical control part 76 transmits a control signal to the control circuit 96 of each lamp 71, and turns on or off each lamp 71, and the voltage supplied to the lamp 71 at the time of its lighting. Perform voltage control to control.

In addition, the lighting power supply 95 and the control circuit 96 of each light source part 73 may be integrated in the cassette 81, and may be formed in the exterior of a cassette. In addition, the abutting portion 86 of the lamp press cover 84 is formed so as not to interfere with each of the wirings 97 from the respective light source portions 73.

In addition, as shown in FIG. 11, the life time detection means 94 including the fuse 94a is formed for every lamp 71, the lighting time is counted by the timer 96a, and the rated life time is turned on. A current flows through the fuse 94a to cut the fuse 94a. Therefore, by confirming the disconnection of the fuse 94a, it is possible to detect whether or not the lamp 71 has been used for its rated life time. In addition, the life time detection means 94 is not limited to including the fuse 94a, What is necessary is just to know the life time of the rating of the lamp 71 at the time of maintenance of lamp replacement. For example, an IC tag is arranged for each lamp 71, and the IC tag can confirm whether or not the lamp 71 has been used for its rated life time, or can confirm the usage time of the lamp 71. You may do so.

In addition, a cooling structure for cooling each lamp 71 is formed in each light source unit 73, each cassette 81, and the frame 82 of the light irradiation apparatus 80. Specifically, as shown in FIG. 6, a cooling path 75a is formed in the base portion 75 on which the lamp 71 and the reflecting mirror 72 of each light source portion 73 are mounted, and each of the cassettes 81 is formed. The cover glass 85 is provided with one or a plurality of through holes 85a. Further, a plurality of exhaust holes (communication holes) 84a are formed in the bottom surface of the lamp press cover 84 of the cassette 81 (see FIG. 5 (c)), and the frame cover 92 of the frame 82 is provided. Also, a plurality of exhaust holes 92a are formed (see FIG. 4 (c)). In addition, a blower unit (forced exhaust means) 79 formed outside the frame 82 is connected to each exhaust hole 92a via an exhaust pipe 79a. Therefore, by blowing the air in the frame 82 by the blower unit 79 and evacuating it, the outside air sucked from the through-hole 85a of the cover glass 85 receives the lamp 71 and the reflecting mirror in the direction indicated by the arrow. It passes through the clearance gap s between 72, is guided to the cooling path 75a formed in the base part 75 of the light source part 73, and each light source part 73 is cooled by air.

In addition, the forced exhaust means is not limited to the blower unit 79, but may be any air drawn in the frame 82 such as a fan, an inverter, a vacuum pump, or the like. In addition, the exhaust of the air by the blower unit 79 is not limited to the rear, You may exhaust from any side of upper, lower, left, and right sides. For example, as shown in FIG. 12, you may make it connect the some exhaust pipe 79a connected to the side of a frame to the blower unit 79 via the dumper 79b, respectively.

In addition, as shown in FIG.5 (c), two or more exhaust holes 84a formed in the lamp press cover 84 may be formed in the bottom face, and may be formed in the center of the bottom face as shown in FIG.13 (a). As shown to FIG.13 (b), (c), you may be formed in the side surface of a long direction and a short direction. In addition to the exhaust hole 84a, a communication groove cut out from the opening edge of the lamp press cover 84 may be formed so as to communicate the outside with the storage space between the light source support 83 and the lamp press cover 84.

The lamp press cover 84 may have a frame structure composed of a plurality of frames, and the communication plate or the communication groove may be configured by separately attaching a cover plate in which the communication hole and the communication groove are formed in the frame.

Further, a water cooling tube (cooling pipe) 91a is formed at the peripheral edge of the frame main body 91, and each light source unit 73 is also circulated by circulating the cooling water in the water cooling tube 91a by the water pump 69. Is cooling. In addition, as shown in FIG. 4, the water cooling tube 91a may be formed in the frame main body 91, and may be attached to the surface of the frame main body 91. FIG. In addition, only one of the exhaust type cooling structure and the water type cooling structure may be formed. In addition, the water cooling tube 91a is not limited to the arrangement | positioning shown in FIG. 4, As shown to FIG. 14 (a) and FIG. 14 (b), so that the water cooling tube 91a may pass through all the cassettes 81 circumference | surroundings. The cooling water may be circulated by arranging or zigzag so as to pass a portion around all the cassettes 81.

In the exposure apparatus PE comprised in this way, in the illumination optical system 70, when the exposure control shutter 78 is opened-controlled at the time of exposure, the light irradiated from the ultrahigh pressure mercury lamp 71 will be an integrator lens 74. Is incident on the incident surface of. Then, the light emitted from the exit surface of the integrator lens 74 is converted into parallel light with its traveling direction being changed by the concave mirror 77. The parallel light is irradiated as light for pattern exposure substantially perpendicularly to the surface of the mask M held by the mask stage 10 and furthermore, the surface of the substrate W held by the substrate stage 20. The pattern P of M) is exposed-transferred on the board | substrate W. FIG.

Here, when the light source unit 73 is replaced, it is exchanged for each cassette 81. In each cassette 81, a predetermined number of light source portions 73 are positioned in advance, and a wiring 97 from each light source portion 73 is connected to the connector 98. For this reason, the cassette 81 which needs to be replaced is removed in a direction opposite to the direction in which the light of the frame 82 is emitted, and the new cassette 81 is fitted to the cassette recess 90b of the frame 82. By attaching to the frame 82, the alignment of the light source part 73 in the cassette 81 is completed. In addition, since the wiring work is completed by connecting the other wiring 99 to the connector 98, the replacement work of the light source unit 73 can be easily performed. In addition, it is necessary to stop the apparatus at the time of cassette replacement. This is because a plurality of lamps (9 or more) are arranged in the cassette 81, and each cassette contributes greatly to the illuminance distribution on the exposure surface. However, even when the plurality of cassettes 81 are replaced as described above, the operation is easy and the replacement time itself can be shortened, which is a useful method.

In addition, the light source support part 83 of the cassette 81 has each irradiation surface which the light of the predetermined number of light source parts 73 irradiates, and the incident surface of the integrator lens 74 which the light of a predetermined number of light source parts injects. It is formed so that the distance of each optical axis L may become substantially constant, and the some cassette mounting part 90 of the frame 82 is each irradiation surface which the light of all the light source parts 73 irradiates, and all the light source parts 73 Is formed so that the distance of each optical axis L to the incident surface of the integrator lens 74 into which the light of the light is incident is substantially constant. For this reason, by using the cassette 81, the irradiation surface of all the light source parts 73 can be arrange | positioned on a single curved surface, without giving big curved surface processing to the frame 82. FIG.

Specifically, the plurality of cassette mounting portions 90 of the frame 82 are abutting the opening 90a to which the light source support portion 83 of the cassette 81 faces, and the plane contacting the plane portion formed around the light source support portion 83 ( Each plane 90b of the plurality of cassette mounting portions 90 each provided with 90b and arranged in a predetermined direction intersects at a predetermined angle, so that the cassette mounting portion 90 is a simple process for a predetermined number of light source portions. The distance between each irradiation surface irradiated by the light of 73 and each optical axis L to the incident surface of the integrator lens 74 can be formed to be substantially constant.

In addition, the cassette mounting part 90 of the frame 82 is formed in the recessed part 90c which made the plane 90b the bottom face, and the cassette 81 is fitted in the recessed part 90c of the cassette mounting part 90. Since it is fitted, the cassette 81 can be secured to the frame 82 without rattling.

In addition, the cassette 81 has a lamp press cover 84 attached to the light source support part 83 in a state of enclosing a predetermined number of light source parts 73 supported by the light source support part 83, and the light source support part 83. Since the back surface 72c of the reflecting mirror 72 of the adjacent light source part 73 directly faces in the storage space between the lamp press covers 84, favorable fluidity of air is provided in each storage space, and each light source part is provided. When cooling 73, air in a storage space can be exhausted efficiently.

Moreover, since the communication hole 84a which communicates the storage space and the exterior of the lamp press cover 84 is formed in the lamp press cover 84, air can be exhausted to the exterior of the cassette 81 with a simple structure. .

Moreover, in order to cool each light source part 73 in the frame 82, since the water cooling pipe 91a through which cooling water circulates is formed, each light source part 73 can be efficiently cooled by cooling water.

Moreover, since it has the blower unit 79 which forcibly exhausts the air in the frame 82 with respect to each irradiation surface which the light of each light source part 73 irradiates, at least one of the back and the side, the air in the frame 82 It can circulate, and each light source part 73 can be cooled efficiently.

Moreover, since the required exposure amount differs depending on the kind of exposure (coloring layer, BM, photo spacer, photo-alignment film, TFT layer, etc.), or the kind of resist in the said variety, as shown in FIG. 15, the frame 82 In some cases, it is not necessary to mount all of the cassettes 81 in the plurality of cassette mounting portions 90 of the plurality of cassettes. In this case, the cover member 89 is attached to the cassette mounting part 90 in which the cassette 81 is not arrange | positioned, and the cover member 89 is the same diameter as the through-hole 85a of the cover glass 85, The same number of through holes 89a are formed. As a result, outside air is also sucked from the through hole 89a of the lid member 89 in addition to the through hole 85a of the cover glass 85. Therefore, even when the cassette 81 is not mounted to all the cassette mounting portions 90, by arranging the lid member 89, the fluidity of the same air as in the case where the cassette 81 is disposed on all the cassette mounting portions 90 is imparted. Then, the light source unit 73 is cooled.

In addition, in order to reliably cool each light source part 73, even if the cassette 81 or the cover member 89 is not attached to all the cassette mounting parts 90, even if it locks so that the light irradiation apparatus 80 cannot be operated. do.

방향으로 3 단, β 방향으로 2 열의 합계 6 개의 광원부 (73) 가 장착된 카세트 (81) 를 예로 들었지만, 실제로는 카세트 (81) 에 배치되는 광원부 (73) 는 8 개 이상이며, 도 16(a) 및 (b) 에 도시된 배치로 점대칭 또는 선대칭으로 카세트 (81) 에 장착된다. 즉, 광원부 (73) 를

방향, β 방향에서 상이한 수로서 배치하고 있고, 카세트 (81) 의 광원 지지부 (83) 에 장착된 가장 외주에 위치하는 광원부 (73) 의 중심을 4 변에서 연결한 선이 직사각형 형상을 이룬다. 또한, 각 카세트 (81) 가 장착되는 프레임 (82) 의 카세트 장착부 (90) 는, 도 17 에 나타내는 바와 같이, 서로 직교하는

, β 방향으로 배치되는 각 개수 n (n : 2 이상의 정 (正) 의 정수) 을 일치시켜 직사각형 형상으로 형성되어 있다. 여기서, 이 직사각형 형상은 후술하는 인테그레이터 엘리먼트의 각 렌즈 엘리먼트의 종횡마다의 입사 개구각비 (開口角比) 에 대응시키고, 카세트의 행수, 열수를 동일한 수로 한 경우가 가장 효율이 좋지만 상이한 수여도 된다.In addition, in the said embodiment, in order to simplify description,

In the example, the cassette 81 provided with six light source portions 73 in three stages and two rows in the β direction is exemplified, but in reality, there are eight or more light source portions 73 disposed on the cassette 81, and FIG. It is mounted to the cassette 81 in point symmetry or line symmetry in the arrangements shown in a) and (b). That is, the light source unit 73

The line which arrange | positioned as a different number in the direction and (beta) direction, and which connected the center of the light source part 73 located in the outermost periphery attached to the light source support part 83 of the cassette 81 from four sides forms a rectangular shape. In addition, as shown in FIG. 17, the cassette mounting portion 90 of the frame 82 on which the cassette 81 is mounted is perpendicular to each other.

and the number n (n: positive integer of 2 or more) arranged in the (beta) direction is made into the rectangle shape. In this case, the rectangular shape corresponds to the incident aperture angle ratio of each lens element of the integrator element, which will be described later. do.

Here, the aspect ratio (vertical / width ratio) of each lens element of the integrator lens 74 is determined corresponding to the aspect ratio of the area of an exposure area. In addition, each lens element of the integrator lens has a structure in which light incident from an angle greater than the incident aperture angle cannot be introduced. In short, the lens element has a small incident aperture angle on the short side with respect to the long side. For this reason, the aspect ratio (vertical / horizontal ratio) of the whole light source part 73 arrange | positioned at the frame 82 is made into the rectangular-shaped arrangement corresponding to the aspect ratio of the incident surface of the integrator lens 74. The use efficiency of light becomes favorable.

In the divided sequential proximity exposure apparatus PE configured as described above, the illuminance is controlled by turning on, off, or voltage-controlling the lamp 71 of each light source unit 73 for each cassette 81 by the optical control unit 76 according to the required illuminance. To change. That is, the optical control part 76 controls so that the lamp 71 of the predetermined number of light source parts 73 in each cassette 81 may light on point symmetry, and the predetermined number of light source parts of the some cassette 81 may be controlled. By controlling the lamp 71 of the 73 to be point-symmetrically lit in the same lighting pattern, all the light source portions 73 in the frame 82 light up in point-symmetry. For example, FIG. 18A shows a case where 100% of lamps 71 (24 in the present embodiment) of each cassette 81 are lit, and FIG. 18B shows each cassette 81. FIG. 18 (c) shows 50% of all lamps 71 in each cassette 81 (in this embodiment). FIG. FIG. 18 (d) shows a case where 25% (6 in this embodiment) of all the lamps 71 of each cassette 81 are lit. As a result, the illuminance can be changed without changing the illuminance distribution of the exposure surface, and since the cassettes are simultaneously controlled for each cassette, the lighting of the lamp 71 can be easily controlled regardless of the change in the substrate size (generation) or the number of lamps. can do.

In addition, the optical control part 76 separates the case of the lamp 71 of each light source part 73 in the cassette 81 from which the number of the lamp 71 to light up according to desired illuminance differs separately in the case of full lighting. There are a plurality of lighting pattern groups (three in this embodiment) each having a plurality of lighting patterns (four in this embodiment) for controlling lighting or extinction in point symmetry. Specifically, as shown in FIG. 19A, the first pattern group for lighting the lamp 71 of 75% in the cassette 81 has four patterns A1 to D1. Moreover, as shown to FIG. 19 (b), the 2nd pattern group which lights 50% of lamps 71 in cassette 81 has four patterns of A2-D2. Moreover, as shown to FIG. 19 (c), the 3rd pattern group which lights 75% of lamps 71 in cassette 81 has four lighting patterns of A3-D3. Each of these lighting patterns A1 to D1, A2 to D2, and A3 to D3 is set so that the lamp 71 in the cassette 81 lights up in point symmetry. In addition, in FIG. 18 and FIG. 19, the diagonal line to the light source part 73 has shown the lamp 71 which turned off.

And the optical control part 76 selects any lighting pattern group among the 1st-3rd lighting pattern group according to desired illuminance, and selects any lighting pattern of the selected lighting pattern group. The selection of the lighting pattern may be such that the plurality of lighting patterns of the selected lighting pattern group are sequentially switched simultaneously with the plurality of cassettes 81 at a predetermined timing. Or the selection may be based on the lighting time of the lamp 71 of each light source part 73, specifically, the lighting pattern with the smallest lighting time may be selected. By switching or selecting such a lighting pattern, the lighting time of a lamp can be made uniform.

In addition, the lighting pattern with the smallest lighting time may be a lighting pattern including the lamp 71 of the light source unit 73 having the smallest lighting time, and the sum of the lighting time of the lamp 71 of the light source unit 73 to be lit. The lighting pattern with the least may be sufficient. In addition, the optical control part 76 calculates the remaining life of the lamp 71 of each light source part 73 based on the lighting time of the lamp 71 of each light source part 73, and the voltage supplied at the time of lighting, The lighting pattern may be selected based on the remaining life. In addition, the lighting pattern may be switched so as to avoid the lighting pattern including the lamp 71 having a short remaining life.

Moreover, when desired illuminance differs from the illuminance obtained by the 1st-3rd lighting pattern group, it selects the lighting pattern group from which illuminance close to a desired illuminance is obtained, and to the lamp 71 of the light source part 73 to light. Adjust supply voltage to above or below rating. For example, when the desired illuminance is 60% illuminance at the time of 100% lighting, any lighting pattern is selected from the lighting pattern group of 50% lighting, and the voltage of the lamp 71 of the light source part 73 to light up is selected. Is given by raising.

When the voltages of the lamps 71 to be lit of all the cassettes 81 are equally adjusted, the voltages of the lamps 71 of the cassettes 81 at the positions arranged in point symmetry are the same when they are shifted from the desired illuminance. You may make it apply different voltage according to the position of the cassette 81, adjusting so that it may lose weight. Specifically, in FIG. 18, the voltage of the lamp 71 of the cassette 81 located at the center is adjusted while the voltage of the lamp 71 of each cassette 81 located at the periphery is equally adjusted. The adjustment is made so that it is different from the voltage of the lamp 71 of the cassette 81. Thereby, fine adjustment can be carried out to desired illuminance, without changing the illuminance distribution of an exposure surface.

In addition, when only a part of the cassettes 81 are replaced with a cassette 81 provided with a new lamp 71, the lamps of the cassettes 81 replaced with the lighting of the lamps 71 of the remaining cassettes 81 ( 71) illuminates in point symmetry. At that time, the illuminance emitted from the lamp 71 of the new cassette 81 tends to be stronger than the illuminance emitted from the lamp 71 of the remaining cassette 81. For this reason, it adjusts so that the voltage of each lamp 71 of the new cassette 81 may be lowered so that the illumination intensity radiated | emitted from the lamp 71 of each cassette 81 of the position arrange | positioned by point symmetry may become uniform.

Therefore, according to the present embodiment, power consumption can be suppressed by lighting only the desired lamp 71 in accordance with the required illuminance, and optical components such as an ND filter can be eliminated, and the cost can be reduced. By turning on or turning off the lamp 71, the fall of the illuminance distribution of an exposure surface can be prevented. Further, since the lamp 71 is turned on or off by point symmetry for each cassette, it is possible to easily control the lighting of the lamp 71 regardless of the change in the substrate size (generation) or the number of lamps.

Moreover, the control part 76 is equipped with the some lighting pattern group from which the number of the lamp 71 of the light source part 73 to light turns among the predetermined number of light source parts 73 in a cassette, and each lighting pattern group is a light source part, Since the lamp 71 of the 73 has a plurality of lighting patterns A1 to D1, A2 to D2, and A3 to D3 which are lit by point symmetry, the respective lamps 71 in the cassette 81 are switched by using the lighting patterns. ) Lighting time can be made uniform. As a result, there is no variation in the frequency of use of the lamps 71 of the respective light source sections 73, and the interval until the replacement of the cassette 81 becomes long, so that the down time of the device due to the replacement of the light source sections 73 can be shortened. .

In addition, a timer 96a for counting the lighting time of the lamp 71 of each light source unit is further provided, and the optical control unit 76 selects any one of a plurality of lighting pattern groups according to desired illuminance, Since the lighting pattern is selected based on the lighting time of the light source unit 73 among the selected lighting pattern groups, the lighting time of each lamp 81 in the cassette 81 can be made uniform.

Further, when the desired illuminance is different from the illuminance obtained by the plurality of lighting pattern groups, the illumination pattern group obtained by selecting the illuminance close to the desired illuminance is selected and the voltage supplied to the light source to be turned on is adjusted. Irradiance can be set arbitrarily regardless of lighting pattern.

In addition, as a control for turning on or turning off the lamp 71, the actual illuminance measured by an illuminometer (not shown) is compared with a predetermined appropriate illuminance to determine whether the actual illuminance is excessive or insufficient, and to eliminate the excessive or insufficient illuminance. You may control the control circuit 96 or the optical control part 76 so that the voltage of 71 may be raised.

In addition, in this embodiment, when using optical components, such as a filter, what is necessary is just to raise the voltage or electric power of the lamp 71 so that the illumination intensity distribution deteriorated by a filter may be improved.

In addition, in this embodiment, although the optical control part 76 made it control the voltage supplied to the lamp 71, you may control electric power.

(2nd embodiment)

Next, the proximity scan exposure apparatus which concerns on 2nd Embodiment of this invention is demonstrated with reference to FIGS. 20-25.

As shown in FIG. 23, the proximity scan exposure apparatus 101 includes a plurality of masks in which a pattern P is formed on a substantially rectangular substrate W conveyed in a predetermined direction while approaching the mask M ( The light L for exposure is irradiated through M), and the pattern P is exposed and transferred to the board | substrate W. FIG. That is, the exposure apparatus 101 employs a scan exposure method in which exposure transfer is performed while the substrate W is relatively moved with respect to the plurality of masks M. As shown in FIG. In addition, the size of the mask used by this embodiment is set to 350 mm x 250 mm, and the X direction length of the pattern P corresponds to the X direction length of an effective exposure area | region.

As shown in FIGS. 20 and 21, the proximity scan exposure apparatus 101 floats and supports the substrate W and transports the substrate W in a predetermined direction (X direction in the drawing). A mask having a mechanism 120 and a plurality of mask holding portions 171 arranged in two rows in a zigzag shape along a direction (Y direction in the drawing) that holds a plurality of masks M and intersects with a predetermined direction. A plurality of irradiation units 180 as illumination optical systems that are respectively disposed on the holding mechanism 170 and the plurality of mask holding units 171 and irradiate the light L for exposure, a plurality of irradiation units 180, and a plurality of It is provided between the mask holding | maintenance parts 171, and is provided with the some light shielding device 190 which shields the exposure light L radiate | emitted from the irradiation part 180. As shown in FIG.

These board | substrate conveyance mechanism 120, the mask holding mechanism 170, the some irradiation part 180, and the light shielding device 190 are arrange | positioned on the apparatus base 102 provided in the ground via a level block (not shown). It is. Here, as shown in FIG. 21, in the area | region where the board | substrate conveyance mechanism 120 conveys the board | substrate W, the area | region where the mask holding | maintenance mechanism 170 is arrange | positioned above is used for mask arrangement | positioning area EA and mask arrangement area | region ( The region on the upstream side with respect to EA) is referred to as the substrate carry-in side region IA and the region downstream on the mask placement region EA is called the substrate carry-out side region OA.

The board | substrate conveyance mechanism 120 is arrange | positioned on the carrying-in frame 105, the precision frame 106, and the carrying out frame 107 provided on the apparatus base 102 via another level block (not shown), and board | substrate with air A floating unit 121 serving as a substrate holding unit for floating and supporting the W, and a frame provided on the apparatus base 102 via another level block 108 further on the Y-direction side of the floating unit 121 ( It is arrange | positioned on the 109, and is equipped with the board | substrate drive unit 140 which conveys the board | substrate W in the X direction, while holding the board | substrate W.

As shown in FIG. 22, the floating unit 121 includes a plurality of long-shaped shapes in which a plurality of connecting rods 122 extending upward from the upper surface of the carry-out and precision frames 105, 106, and 107 are mounted on the lower surface, respectively. From the exhaust air pad 123 (refer to FIG. 21, 124) and the plurality of long intake and exhaust air pads 125a, 125b, and the plurality of exhaust holes 126 formed in each air pad 123, 124, 125a, 125b. Air suction system 132 and air suction for sucking air from the air discharge system 130 which discharges air, the pump 131 for air discharge, and the intake hole 127 formed in the intake and exhaust air pads 125a and 125b. A pump 133 is provided.

In addition, the intake and exhaust air pads 125a and 125b have a plurality of exhaust holes 126 and a plurality of intake holes 127, and are provided between the support surface 134 and the substrate W of the air pads 125a and 125b. It is possible to balance the air pressure, and to set it with high precision at a predetermined flotation amount, so that it can be horizontally supported at a stable height.

As shown in FIG. 21, the substrate drive unit 140 includes a holding member 141 for holding the substrate W by vacuum suction and a linear guide 142 for guiding the holding member 141 along the X direction. And the drive motor 143 and the ball screw mechanism 144 for driving the gripping member 141 along the X direction, and the frame in the substrate loading side region IA so as to protrude from the upper surface of the frame 109. A plurality of workpiece anti-collision rollers 145 are mounted on the side of 109 so as to be movable in the Z direction and to rotate freely, and to support the lower surface of the substrate to be transferred to the mask holding mechanism 170. do.

In addition, the board | substrate conveyance mechanism 120 is formed in the board | substrate carrying-in side area | region IA, and the board | substrate pre-alignment mechanism 150 which pre-aligns the board | substrate W waited in this board | substrate carrying-in area IA, and And a substrate alignment mechanism 160 for aligning the substrate W. As shown in FIG.

As shown in FIG. 21 and FIG. 22, the mask holding mechanism 170 is formed for each of the mask holding portions 171 and the mask holding portions 171 described above, and the mask holding portion 171 is formed by X, And a plurality of mask driving portions 172 which are driven around the Y, Z, and θ directions, that is, the vertical direction with respect to the horizontal plane with the predetermined direction, the crossing direction, the predetermined direction and the crossing direction, and the normal of the horizontal plane.

The plurality of mask holders 171 arranged in two rows in a zigzag shape along the Y direction are arranged on the downstream side with the plurality of upstream mask holders 171a (six in this embodiment) arranged on the upstream side. Between the main part 112 (refer FIG. 20) which consists of several downstream mask holding | maintenance parts 171b (6 in this embodiment), and which was set up on both sides of the Y direction of the apparatus base 2 Are supported by the mask drive unit 172 on the main frame 113 hypothesized on the upstream side and the downstream side, respectively. Each mask holding | maintenance part 171 has the opening 177 which penetrates in a Z direction, and the mask M is vacuum-suctioned by the lower surface of the peripheral part.

The mask driver 172 is mounted on the main frame 113, is mounted on the X direction driver 173 moving along the X direction, and is mounted on the tip of the X direction driver 173, and is driven in the Z direction. 174, the Y-direction driver 175 mounted to the Z-direction driver 174 and driving in the Y-direction, and the θ-direction driver 176 mounted to the Y-direction driver 175 and driven in the θ direction. The mask holding part 171 is attached to the front-end | tip of the (theta) direction drive part 176. As shown in FIG.

As shown in FIG. 24 and FIG. 25, the some irradiation part 180 is the light irradiation apparatus 80A, the integrator lens 74, and the optical control part which are comprised in the casing 181 similarly to 1st Embodiment. 76, a concave mirror 77, and an exposure control shutter 78, between the light source unit 73A and the exposure control shutter 78, and an integrator lens 74 and a concave mirror ( 77, planar mirrors 280, 281, 282 disposed between them. In addition, the declination angle correction means which can change the curvature of a mirror manually or automatically may be provided in the concave mirror 77 or the planar mirror 282 as a return mirror.

The light irradiation apparatus 80A has three linear cassettes 81A including eight light source sections 73 in four columns and two rows each including an ultrahigh pressure mercury lamp 71 and a reflecting mirror 72. It has the frame 82A listed. Similarly to the first embodiment, in the cassette 81A, the lamp press cover 84 is attached to the light source support part 83 on which the eight light source parts 73 are supported, whereby the light of the eight light source parts 73 is irradiated. The light source unit 73 is positioned so that the distance between each irradiation surface and each optical axis L to the incident surface of the integrator lens 74 on which the light from the eight light source units 73 is incident becomes substantially constant. As shown in FIG. 25, each of the cassettes 81A is attached to the plurality of cassette mounting portions 90 of the frame 82A, so that each irradiation surface to which the light of all the light source portions 73 is irradiated and the light source portion 73 are exposed. Each cassette 81A is positioned so that the distance of each optical axis L to the incidence plane of the integrator lens 74 to which light of the light is incident becomes substantially constant. Moreover, the process of the wiring from each light source part 73, and the cooling structure in a frame are comprised similarly to 1st Embodiment, and the lighting control method of the lamp 71 is also the same as 1st Embodiment.

As shown in FIG. 22, the plurality of light blocking devices 190 has a pair of plate-shaped blind members 208 and 209 for changing the inclination angle, and the pair of blind members by the blind drive unit 192. The inclination angles of (208, 209) are changed. Thereby, in the vicinity of the mask M hold | maintained by the mask holding | maintenance part 171, while shielding the light L for exposure emitted from the irradiation part 180, and in the predetermined direction which light-shields the light L for exposure, The light shielding width, that is, the projection area seen in the Z direction can be made variable.

In the proximity scan exposure apparatus 101, a pair of mask tray portions (not shown) holding the mask M are driven in the Y direction, thereby retaining them in the upstream and downstream mask holding portions 171a and 171b. While the mask changer 220 for replacing the mask M is formed, the positioning pin (not shown) is attached to the mask M while pressing the mask M, which is floated and supported against the mask tray part, before the mask replacement. The mask prealignment mechanism 240 which performs prealignment by making abutting is formed.

As shown in FIG. 22, the proximity scan exposure apparatus 101 includes a laser displacement meter 260, a mask alignment camera (not shown), a tracking camera (not shown), a tracking light 273, and the like. Detection means are arranged.

Next, the exposure transfer of the board | substrate W is demonstrated using the proximity scan exposure apparatus 101 comprised as mentioned above. Moreover, in this embodiment, about the case where any pattern of R (red), G (green), and B (blue) is drawn with respect to the color filter board | substrate W on which the base pattern (for example, black matrix) was drawn. Explain.

The proximity scan exposure apparatus 101 floats and supports the board | substrate W conveyed to the board | substrate loading area IA with the air etc. from the exhaust air pad 123 by the loader etc. which are not shown, and the board | substrate W is supported. After performing the pre-alignment operation and the alignment operation, the substrate W chucked by the gripping member 141 of the substrate drive unit 140 is conveyed to the mask placement area EA.

Thereafter, the substrate W moves in the X direction along the rail 142 by driving the drive motor 143 of the substrate drive unit 140. Subsequently, the substrate W is moved onto the exhaust air pads 124 and the intake and exhaust air pads 125a and 125b formed in the mask arrangement area EA, and is floated and supported in a state where vibration is eliminated as much as possible. And when the exposure light L is radiate | emitted from the light source in the irradiation part 180, this exposure light L will pass through the mask M hold | maintained in the mask holding | maintenance part 171, and a pattern will be sent to the board | substrate W. FIG. Exposure transfer.

Moreover, since the said exposure apparatus 101 has a tracking camera (not shown) and the laser displacement meter 260, during the exposure operation | movement, it detects the relative position shift of the mask M and the board | substrate W, and detected it. The mask drive part 172 is driven based on the relative position shift, and the position of the mask M is followed by the board | substrate W in real time. At the same time, the gap between the mask M and the substrate W is detected, and the mask driver 172 is driven based on the detected gap to correct the gap between the mask M and the substrate W in real time.

As described above, by performing continuous exposure in the same manner, the pattern can be exposed to the entire substrate W. FIG. Since the mask M held by the mask holding | maintenance part 171 is arrange | positioned in zigzag form, even if the mask M hold | maintained by the mask holding | maintenance parts 171a and 171b of an upstream or downstream side is spaced apart and arranged. The pattern can be formed in the substrate W without a gap.

In addition, when cutting out several panel from the board | substrate W, the non-exposure area | region which does not irradiate the exposure light L is formed in the area | region corresponding between adjacent panels. For this reason, during the exposure operation, the pair of blind members 208 and 209 are opened and closed so that the blind members 208 and 209 are positioned in the non-exposed area, in accordance with the transfer speed of the substrate W. The blind members 208 and 209 are moved in the same direction as the conveying direction.

Therefore, also in the proximity scan exposure apparatus like this embodiment, when replacing the light source part 73, it replaces for every cassette 81. FIG. In each cassette 81, a predetermined number of light source portions 73 are positioned in advance, and a wiring 97 from each light source portion 73 is connected to the connector 98. For this reason, alignment of the light source part 73 in the cassette 81 is completed by fitting the cassette 81A which needs to be replaced with the recessed part 90b of the frame 82A to the frame 82. FIG. In addition, since the wiring work is completed by connecting the other wiring 99 to the connector 98, the replacement work of the light source portion 73 can be easily performed.

In addition, this invention is not limited to embodiment mentioned above, A deformation | transformation, improvement, etc. can be made suitably.

For example, although the lamp press cover 84 of this embodiment was made into the concave box shape, it is not limited to this, If the light source part can be positioned and fixed by the contact part, for example, a mesh shape It may be. In addition, when fitting each light source part 73 to the light source support part 83, and fixing it further, it can also be comprised without forming the lamp press cover 84. In addition, the shape of the frame cover 92 can also be arbitrarily designed according to the arrangement of the illumination optical system 70.

Moreover, the light source part 73 arrange | positioned at the cassette 81 shall be eight or more, and the whole light source part arrange | positioned at the frame 82 shall be eight to about 800 pieces. If it is about 800 pieces, practicality and efficiency will improve. In addition, it is preferable that the number of the cassettes 81 mounted to the frame 82 be 4% or less of the number of all the light source parts 73, and in this case, the light source part 73 arrange | positioned at one cassette 81 The number of is 4% or more.

For example, in the said embodiment, although the dividing sequential proximity exposure apparatus and the scanning proximity exposure apparatus were demonstrated as exposure apparatus, it is not limited to this, This invention is a mirror projection type exposure apparatus, a lens projection type exposure apparatus, It can also be applied to a close-up exposure apparatus. Moreover, this invention can be applied to any exposure method, such as a batch type | mold, a sequential type, a scanning type.

10: mask stage
18: alignment camera
20: substrate stage
70: illumination optical system
71: lamp
72: reflector
73: light source
74: integrator lens
76: optical control unit (control unit)
80, 80A: light irradiation device
81, 81A: Cassette
82, 82A: Frame
83 light source support
84: lamp press cover
87: lamp pressing mechanism
90: cassette mounting portion
91: frame body
92: frame cover
96a: timer
101: proximity scan exposure apparatus (exposure apparatus)
120: substrate transfer mechanism
121: floating unit
140: substrate drive unit
150: substrate pre-alignment mechanism
160: substrate alignment mechanism
170: mask holding mechanism
171: mask holding unit
172: mask driving unit
180: research unit
190: light shielding device
M: Mask
P: Pattern
PE: Sequential proximity exposure device (exposure device)
W: glass substrate (exposed material, substrate)

Claims (12)

A plurality of light source portions each including a light emitting portion and a reflection optical system which emits light by directing the light generated from the light emitting portion;
A plurality of cassettes each capable of mounting a predetermined number of said light source portions;
The frame which can attach the plurality of cassettes,
A control unit for controlling lighting or turning off of the light source units,
And the control unit controls the predetermined number of light source units to light up in point symmetry in each of the cassettes. The method of claim 1,
And the control unit controls all of the light source parts to light up in point symmetry by simultaneously controlling the predetermined number of light source parts of the plurality of cassettes to be point-symmetrical in the same lighting pattern. The method according to claim 1 or 2,
The control unit includes a plurality of lighting pattern groups in which the number of the light source units to be turned on is different from a predetermined number of light source units in the cassette, and each of the lighting pattern groups includes a plurality of lighting patterns in which the light source units light in point symmetry. Each having the light irradiation apparatus for exposure apparatus characterized by the above-mentioned. The method of claim 3, wherein
And a timer for counting the lighting time of each light source unit,
The control unit selects any one of the plurality of lighting pattern groups according to desired illuminance, and selects the lighting pattern based on the lighting time of the light source unit among the selected lighting pattern groups. Light irradiation device. The method of claim 3, wherein
And a timer for counting the lighting time of each light source unit,
The control unit calculates a remaining life of the plurality of light source units based on the lighting time of each light source unit and the voltage or power supplied at the time of lighting,
The control unit selects any one of the plurality of lighting pattern groups according to a desired illuminance, and selects the lighting pattern based on the remaining life of the light source unit among the selected lighting pattern groups. Light irradiation device. The method of claim 4, wherein
When the desired illuminance is different from the illuminance obtained by the plurality of lighting pattern groups, selecting a lighting pattern group from which illuminance close to the desired illuminance is obtained and adjusting the voltage or power supplied to the light source to be lit. Irradiation apparatus for exposure apparatus characterized by the above-mentioned. The method of claim 1,
The cassette has a light source support part for supporting the predetermined number of light source parts,
The light source support portion is formed such that the distance of each optical axis from each irradiation surface irradiated with the light of the predetermined number of light source portions to the incident surface of the integrator lens to which the predetermined number of light source portions are incident is substantially constant. The light irradiation apparatus for exposure apparatus characterized by the above-mentioned. The method of claim 7, wherein
The frame has a plurality of cassette mounting portions to which the plurality of cassettes are respectively mounted,
The plurality of cassette mounting portions are formed such that the distance of each optical axis from each irradiation surface to which the light from all the light source portions is irradiated is substantially constant from the incident surface of the integrator lens to which the light from all the light source portions is incident. Light irradiation apparatus for exposure apparatus made into. The method of claim 8,
The plurality of cassette mounting portions each include an opening facing the light source support portion of the cassette, and a plane that abuts with a flat portion formed around the light source support portion,
The planes of the plurality of cassette mounting portions arranged in a predetermined direction intersect at a predetermined angle. A substrate holding part for holding a substrate as an exposed material;
A mask holding part for holding a mask so as to face the substrate;
The illumination optical system which has the said light irradiation apparatus of Claim 1, and the integrator lens which injects the light radiate | emitted from the several light source part of this light irradiation apparatus,
And the substrate is irradiated with light from the illumination optical system through the mask. It exposes using the exposure apparatus of Claim 10, The board | substrate characterized by the above-mentioned. A plurality of light source portions each including a light emitting portion and a reflecting optical system that emits light emitted from the light emitting portion by directivity; a plurality of cassettes each capable of mounting a predetermined number of the light source portions; and a plurality of cassettes As a light irradiation method of the light irradiation apparatus for exposure apparatuses which has a frame which can be made and a control part which controls lighting or turning off the said some light source part,
And the control unit controls the predetermined number of light sources in each of the cassettes to light up in point symmetry.

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