KR20100091476A - Substrate processing apparatus and frame of same - Google Patents

Substrate processing apparatus and frame of same Download PDF

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Publication number
KR20100091476A
KR20100091476A KR1020090010676A KR20090010676A KR20100091476A KR 20100091476 A KR20100091476 A KR 20100091476A KR 1020090010676 A KR1020090010676 A KR 1020090010676A KR 20090010676 A KR20090010676 A KR 20090010676A KR 20100091476 A KR20100091476 A KR 20100091476A
Authority
KR
South Korea
Prior art keywords
frame
processing apparatus
frame portion
substrate processing
chamber
Prior art date
Application number
KR1020090010676A
Other languages
Korean (ko)
Inventor
유성진
Original Assignee
주식회사 아이피에스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 아이피에스 filed Critical 주식회사 아이피에스
Priority to KR1020090010676A priority Critical patent/KR20100091476A/en
Publication of KR20100091476A publication Critical patent/KR20100091476A/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers

Abstract

PURPOSE: A frame for a substrate processing apparatus and the substrate processing apparatus including the same are provided to improve the convenience of maintenance by dividing the frame supporting a chamber into a plurality of frame units. CONSTITUTION: A frame(20) supports a chamber(10) in which substrates are processed. Internal fixtures are installed in the chamber. External fixtures are installed in the frame. The internal fixtures are connected with the external fixtures. The frame includes a plurality of frame units including a first frame unit and a second frame unit(22). The first frame unit supports the chamber. The second frame unit is installed on the lower side of the first frame unit in order to support the first frame unit.

Description

Frame of substrate processing apparatus and substrate processing apparatus having the same {Substrate processing apparatus and Frame of same}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus, and more particularly, to a frame of a substrate processing apparatus for performing a predetermined processing process on a substrate, such as annealing, vapor deposition, and etching, and a substrate processing apparatus having the same.

The substrate treating apparatus refers to an apparatus for performing a predetermined treatment process, such as preheating, annealing, deposition, or etching, on a substrate in a chamber or in a processing space at atmospheric pressure or vacuum pressure.

Such substrate processing apparatuses have also grown in size as substrates such as glass substrates for LCD panels have grown in size.

On the other hand, the substrate processing apparatus includes a chamber having a processing space that is isolated from the outside and installed with various auxiliary devices for processing and conveying the substrate, and a frame supporting the chamber in a clean room that maintains a clean state.

However, as the substrate processing apparatus increases in size, there is a problem in that it is difficult to manufacture, maintain, repair and transport integrally due to road laws such as cost and technology, road width, and altitude due to the increase in the size and weight of the chamber as well as the frame.

In particular, the substrate processing apparatus is modularized with accessories, chambers, frames, etc., and then individually passed through various manufacturing processes to be finally set up by the equipment manufacturer, and then shipped to a manufacturer who manufactures a semiconductor device or an LCD panel to complete the final installation.

At this time, each module constituting the substrate processing apparatus is generally produced and manufactured by several companies, not one. As the substrate processing apparatus is enlarged, modules before final completion are also enlarged, so that it is easy to transport them among several companies. There is a problem that can not do or cannot be transported.

The present invention has been made in order to solve the above problems, the frame for supporting the chamber of the substrate processing apparatus is divided into a plurality of frame parts of the substrate processing apparatus that can be manufactured, transported, maintained, and repaired and having It is an object to provide a substrate processing apparatus.

In order to solve the above problems, the present invention includes a frame of a substrate processing apparatus for supporting a chamber that forms a processing space for processing a substrate and having external installations connected to internal installations installed in the chamber, wherein the frame Discloses a frame of a substrate processing apparatus characterized in that it is formed by a plurality of frame portions.

The plurality of frame parts may include a first frame part supporting the chamber and a second frame part installed under the first frame part to support the first frame part.

The first frame portion may be divided into a plurality of blocks, and the plurality of blocks forming the first frame portion may be installed such that a portion corresponding to the center of the bottom surface of the chamber is exposed downward.

The second frame portion may be formed of one block or may be formed of a plurality of blocks.

The second frame portion may be installed at a bottom thereof by a plurality of support members at intervals from an installation surface on which the substrate processing apparatus on which the substrate processing apparatus is installed is installed.

A plurality of height adjusting units for adjusting the height may be provided between the first frame portion and the second frame portion, or between the second frame portion and an installation surface on which the substrate processing apparatus on which the substrate processing apparatus is installed is installed. Can be.

The height of the first frame portion may be greater than the height of the second frame portion.

At least some of the external installations may be installed in the first frame unit.

The present invention also discloses a substrate processing apparatus comprising a frame of such a substrate processing apparatus.

According to the present invention, the frame constituting the substrate processing apparatus is divided into a plurality of blocks, thereby eliminating manufacturing and transportation constraints due to enlargement, thereby facilitating manufacture, transportation, maintenance, and repair.

In particular, the present invention is not subject to the limitation of the size (height and width) of the road-the height limit or the lane width limit-during transportation between the various companies for welding, surface treatment, painting, etc. of the frame before the device is completed by the frame is divided. Its advantage is that it is easy to manufacture.

The present invention can be transported without affecting the assembly state by dividing the frame constituting the substrate processing apparatus up and down and modularizing the external installations connected to the internal installations installed in the chamber together with the chamber in the frame located at the upper side. There is an advantage.

In another aspect, the present invention is configured by dividing the frame with the chamber and the second frame portion installed to support the first frame portion and the first frame portion to which the external installation is installed, and transporting the second frame portion separately during transportation. There is an advantage to minimize the height.

The present invention is also composed of the first frame portion and the second frame portion is divided into a vertical frame and the horizontal adjustment portion for adjusting the height and horizontally installed therebetween can more smoothly adjust the height and horizontality of the chamber There is an advantage to that.

Hereinafter, a frame of a substrate processing apparatus according to the present invention and a substrate processing apparatus having the same will be described in detail with reference to the accompanying drawings.

The substrate treating apparatus according to the present invention refers to an apparatus for performing a predetermined treatment on a substrate, and includes all of a load lock apparatus, a vacuum processing apparatus, a conveying apparatus, or the like, or any one of a load lock apparatus, a vacuum processing apparatus, and a conveying apparatus. can do.

1 is a configuration diagram of a substrate processing apparatus according to a first embodiment of the present invention, FIG. 2 is a perspective view of the vacuum processing apparatus of FIG. 1, and FIGS. 3A and 3B are cross-sectional views illustrating an example of the height adjusting unit of FIG. 1.

The present invention is described with reference to, for example, a vacuum processing apparatus 2 for performing a vacuum treatment on the substrate 1 in a vacuum state, but it can be applied to a load lock apparatus or a conveying apparatus.

As shown in FIG. 1, the vacuum processing apparatus 2 is a device for performing a predetermined treatment on the surface of the substrate 1, and includes a wafer for manufacturing a semiconductor device, a glass substrate for an LCD panel, and a substrate for a solar cell. The surface of the substrate 1 such as the vacuum is vacuumed.

The vacuum processing apparatus 2 includes a chamber 10 that forms a processing space S for vacuum processing of the substrate 1, and a frame 20 that is coupled to the lower side of the chamber 10 to support the chamber 10. It may be configured to include).

The chamber 10 may be installed in a coupled state with the conveying apparatus 4, and a substrate support 13 for supporting the substrate 1 may be installed therein.

The chamber 10 may be configured in various ways, and may include a chamber body 12 and a top lid 11 that are detachably coupled to each other.

The chamber body 12 is configured to be coupled to the top lid 11 on the upper side to form a processing space S, and at least one gate 14 for entering and exiting the substrate 1 is formed at a side surface thereof. The gate 14 may be opened and closed by a gate valve (not shown), and may be formed on only one side or a pair in a position opposite to each other according to a method of entering and exiting the substrate 1.

The top lead 11 may be connected to a gas supply pipe (not shown) to perform a vacuum treatment, and a shower head for supplying a processing gas may be installed at a lower side thereof.

On the other hand, the interior of the chamber 10 may be provided with internal installation such as an electrode member for applying power, an electrostatic chuck for fixing the substrate 1 by an electrostatic force, a lift pin for raising and lowering the substrate 1.

In addition, under the chamber 10, external installations connected to internal installations installed in the chamber 10 may be installed. The external installations may include a connection pipe connected to a gas supply device for supplying gas, an exhaust pipe connected to a vacuum pump for exhaust and pressure control, a temperature control part for temperature control, an electrostatic chuck and an electrode member, etc. It may include at least a portion of the power applying unit, a driving unit for driving the lift pins.

The frame 20 supports the chamber 10 to a predetermined height for installation of external installations under the chamber 10 and coupling with neighboring devices. In particular, when the neighboring device is the conveying apparatus 4 and the substrate 1 to be processed is large, the conveying robot 4B installed in the conveying apparatus 4 is installed in a relatively high state and is coupled with the conveying apparatus 4. Since the height of the chamber 10 needs to be increased, the height of the frame 20 supporting the chamber 10 needs to be increased.

Meanwhile, the frame 20 needs to be stably supported corresponding to the size of the supporting chamber 10. Instead, the frame 20 is formed of a large frame 20 integrated with the corresponding large chamber 10. , Painting, welding and the like manufacturing process, in particular for the convenience of transportation, it is characterized by consisting of a plurality of frame parts, that is, a plurality of frame parts (21, 22).

The frame 20 is composed of 1) a plurality of frame portions divided in a vertical direction with respect to the installation surface on the basis of the installation surface of the device 2, or 2) at least some of the plurality of frame portions divided in the vertical direction, Preferably, the frame portion adjacent to the chamber 10 may be further divided into a horizontal direction with the installation surface, or 3) may be composed of a plurality of frame portions divided into the horizontal with the installation surface.

In this case, when the frame 20 is composed of a plurality of frame parts, the frame 20 may be disposed in the frame units according to the external facilities, or in particular, the external facilities may be installed only in the frame units adjacent to the chamber 10.

On the other hand, the plurality of frame parts constituting the frame 20 may be any configuration as long as the structure capable of supporting the chamber 10, generally a plurality of frame members (21a, 22a) integrally coupled by welding, bolting, etc. It may have a truss structure formed of).

As an example of the frame 20, as shown in Figs. 1 and 2, to the first frame portion 21 and the second frame portion 22 divided up and down with respect to the installation surface of the device (2) Can be configured.

The first frame portion 21 is formed of a plurality of frame members 21a and is installed above the second frame portion 22 to support the chamber 10.

The first frame portion 21 may be configured in one block form, or may be divided in a horizontal direction with an installation surface based on a plurality of blocks, that is, installation surfaces, as shown in FIGS. 1 to 3B.

That is, as shown in FIG. 3A, the first frame part 21 is dividedly formed at symmetrical intervals with respect to the center portion of the chamber 10, or as shown in FIG. 3B. It may comprise a central frame portion 211 and the one or more outer frame portion 212 installed to surround the central frame portion 211 corresponding to the central portion of 10).

At this time, the center frame portion 211 and the outer frame portion 212 may form a rectangular structure or a circular structure when viewed in the vertical direction with the installation surface.

On the other hand, it is preferable that the external installations are installed in the space occupied by the first frame part 21 and are installed with a height sufficient to install the external installations. However, the first frame part 21 may be transported to a manufacturer manufacturing a semiconductor device or an LCD panel in a state in which it is coupled with the chamber 10, and thus it is necessary to minimize the height thereof and thus external installations may be installed. It is more preferable to have only a height.

The second frame portion 22 is installed on the installation surface to support the first frame portion 21 and may have a structure similar to the first frame portion 21.

However, the second frame part 22 supports the first frame part 21 and increases the height of the chamber 10 by the height of the neighboring device. It is desirable to have a height to compensate for the lack of height. At this time, the height of the first frame portion 21 is preferably larger than the height of the second frame portion 22, but is not limited thereto.

On the other hand, the second frame portion 22 is supported by a plurality of support members 31 for smooth exhaust in a clean room where the apparatus 2 is installed, and is spaced apart from the installation surface on which the apparatus 2 is installed. Can be.

The support members 31 may be integrally formed with the second frame portion 22 or may be coupled to the second frame portion 22 as a separate member.

4A and 4B are cross-sectional views illustrating examples of the height adjusting unit of FIG. 1.

Meanwhile, the frame 20 may serve to adjust the height and horizontality of the chamber 10, and adjust the position of the chamber 10 for coupling with a neighboring device such as the transport apparatus 4.

For example, as shown in FIGS. 1, 2, 4a, and 4b, the height and horizontality of the chamber 10 are adjusted between the first frame portion 21 and the second frame portion 22. A plurality of horizontal adjustment unit 32 may be installed to.

The horizontal adjusters 32 are respectively installed at a specific point between the first frame portion 21 and the second frame portion 22 to adjust the height to adjust the height and horizontality of the chamber 10.

In particular, since the horizontal adjusting portions 32 are installed between the first frame portion 21 and the second frame portion 22, the horizontal adjusting portions 32 need to bear the load of the second frame portion 22. Disappear. In addition, since the horizontal adjusting portions 32 are installed between the first frame portion 21 and the second frame portion 22, the horizontal adjusting portion 32 can be installed as close as possible to the chamber 10, so that horizontal adjustment is possible. It can be made easier and more precise.

The horizontal adjustment unit 32 may be configured in a variety of configurations, such as hydraulic or pneumatic jacks, pneumatic springs for horizontal and height adjustment, as shown in Figure 4a, for example, to support the first frame portion 21 and The first guide member 321 inclined by the side surface 322 and the second guide member in which the upper side 324 is inclined to be symmetrical with the first guide member 321 are installed and supported by the second frame part 22. 323, a slide member 325 sliding between the first guide member 321 and the second guide member 323, and a restraining member 326 that restrains sliding of the slide member 325. Can be.

In the horizontal adjusting unit 32 having the above configuration, the lower side 322 of the first guide member 321 and the upper side 324 of the second guide member 323 are formed to be inclined, respectively, and thus the slide member 325. As the first guide member 321 and the second guide member 323 are spaced apart or close to each other as shown by the arrow as the horizontal movement, the height of the first frame portion 21 is adjusted.

The height and horizontality of the first frame portion 21 are adjusted according to the height adjustment of each horizontal adjusting portion 32, and as a result, the height and horizontality of the chamber 10 supported by the first frame portion 21 are adjusted. Can be adjusted.

On the other hand, after the horizontal adjustment portion 32 is horizontally adjusted, the nut of the restraining member 326 is fastened to the screw portion of the slide member 325, the sliding of the slide member 325 is constrained, the adjusted height can be maintained. .

The horizontal adjustment unit 32 can be variously modified. As shown in FIG. 4B, the horizontal adjustment unit 32 is supported by the second frame unit 22 and rotatably coupled to the first frame unit 21 to allow the first frame unit to be rotated. In addition to supporting (21), it may be configured to include a rotating member 425 for adjusting the height of the support of the first frame portion 21 to support by rotation.

The rotating member 425 can be configured in various ways according to the coupling method with the first frame portion 21, as shown, the first frame portion 21 is an insertion hole so that the rotating member 425 can be coupled 422 may be formed.

In addition, the rotation member 425 may be further provided with an auxiliary member 421 to complement the support of the first frame portion 21.

On the other hand, the frame 20 may be additionally installed for the chamber 10, the position correction for coupling with the neighboring device, such as the conveying device (4).

That is, the frame 20 may be installed with various devices such as a device for calibrating horizontal and vertical positions of the chamber 10 with respect to the installation surface using guide rails, and a rotating device for rotating the chamber 10. Can be.

Since the above has been described only with respect to some of the preferred embodiments that can be implemented by the present invention, the scope of the present invention, as is well known, should not be construed as limited to the above embodiments, the present invention described above It will be said that both the technical idea and the technical idea which together with the base are included in the scope of the present invention.

1 is a block diagram of a substrate processing apparatus according to a first embodiment of the present invention.

2 is a perspective view of the vacuum processing apparatus of FIG. 1.

3A is a cross-sectional view taken along the direction A-A in FIG. 2, and FIG. 3B is a cross-sectional view taken along the direction A-A showing another example of a frame of the substrate processing apparatus of FIG.

4A and 4B are cross-sectional views illustrating examples of the height adjusting unit of FIG. 1.

<Explanation of symbols on main parts of the drawings>

One; Substrate 2; Vacuum processing equipment

10; Chamber 20; frame

21; A first frame part 22; 2nd frame part

32; Horizontal adjustment part

Claims (12)

A frame of a substrate processing apparatus for supporting a chamber for forming a processing space for processing a substrate and having external installations connected to internal installations installed in the chamber, The frame is a frame of the substrate processing apparatus, characterized in that formed by a plurality of frame portions. The method according to claim 1, The plurality of frame parts And a first frame portion supporting the chamber and a second frame portion disposed below the first frame portion to support the first frame portion. The method according to claim 2, And the first frame portion is divided into a plurality of blocks. The method according to claim 3, The plurality of blocks forming the first frame portion is a frame of the substrate processing apparatus, characterized in that the portion corresponding to the center of the bottom surface of the chamber is installed to be exposed to the lower side. The method according to claim 2, The frame of the substrate processing apparatus, characterized in that the second frame portion is formed of one block or a plurality of blocks. The method according to claim 5, The second frame portion is a frame of the substrate processing apparatus, characterized in that the bottom surface is provided by a plurality of support members spaced apart from the installation surface on which the substrate processing apparatus is installed. The method according to any one of claims 2 to 6, A substrate processing apparatus, characterized in that a plurality of height adjusting portions for adjusting the height is provided between the first frame portion and the second frame portion, or between the second frame portion and the mounting surface on which the substrate processing apparatus is installed. Frame. The method according to any one of claims 2 to 6, The height of the first frame portion is greater than the height of the second frame portion frame of the substrate processing apparatus. The method of claim 8, The frame of the substrate processing apparatus, characterized in that a portion of the external installation is installed in the first frame portion. A chamber forming a processing space for processing the substrate; A substrate processing apparatus comprising a frame of the substrate processing apparatus of any one of claims 1 to 5. The method according to claim 10, A plurality of height adjusting units for adjusting the height are provided between the first frame portion and the second frame portion, or between the second frame portion and an installation surface on which the substrate processing apparatus is installed. Substrate processing apparatus, characterized in that. The method of claim 11, And the substrate processing apparatus is a vacuum processing apparatus for processing the substrate in a vacuum state.
KR1020090010676A 2009-02-10 2009-02-10 Substrate processing apparatus and frame of same KR20100091476A (en)

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KR1020090010676A KR20100091476A (en) 2009-02-10 2009-02-10 Substrate processing apparatus and frame of same

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KR1020090010676A KR20100091476A (en) 2009-02-10 2009-02-10 Substrate processing apparatus and frame of same

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KR20100091476A true KR20100091476A (en) 2010-08-19

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101693789B1 (en) * 2015-12-31 2017-01-06 주식회사 에스에프에이 Substrate Processing Apparatus and Method of Assembling the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101693789B1 (en) * 2015-12-31 2017-01-06 주식회사 에스에프에이 Substrate Processing Apparatus and Method of Assembling the same

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