KR101693789B1 - Substrate Processing Apparatus and Method of Assembling the same - Google Patents

Abstract

The present invention comprises: a chamber unit having an inner treatment space where a substrate is treated and having a plurality of insertion holes formed in a lower portion thereof; a vacuum unit installed in the chamber unit to form a vacuum in the treatment space of the chamber unit; a treatment unit installed in the chamber unit to treat the substrate in the treatment space of the chamber unit; and a plurality of support units of which the heights can be controlled, inserted into each of the insertion holes of the chamber unit to support the chamber unit to penetrate the lower portion of the chamber unit and sealing the insertion hole of the chamber unit. The support unit can be easily installed in the chamber even in a narrow space.

Description

[0001] DESCRIPTION [0002] Substrate Processing Apparatus and Method for Assembling the Same [

The present invention relates to a substrate processing apparatus and a method of assembling the substrate processing apparatus, and more particularly, to a substrate processing apparatus and a method of assembling the same that can easily mount a supporting unit in a chamber even in a narrow space.

Recently, as the size of the substrate gradually increases, the size of the process equipment for processing the substrate is also increasing. Since the load of the chambers provided in such process equipments generally exceeds 40 tons, it is difficult to install them in a building in which a load that can withstand per unit area is determined.

Conventionally, a plurality of foot members are provided at the lower part of the chamber to disperse the load of the chamber. Therefore, the load of the chamber can be dispersed by the plurality of foot members in consideration of the load that the floor of the building can withstand, and the chamber of high load can be easily installed in the building.

However, as the number of installed chambers increases, the chambers become dense and the space in which the operator can move between the chambers may be narrowed. Therefore, there is a problem that it is difficult for the operator to install the foot member in the lower portion of the chamber in a narrow space between the chambers. Further, if the foot members of the densely chambers are damaged, the space that the operator can enter is narrow, so that it becomes difficult to replace or repair the damaged foot members.

KR 2013-0078751 A

The present invention provides a substrate processing apparatus and a method of assembling the same that can easily mount a support unit in a chamber even in a narrow space.

The present invention provides a substrate processing apparatus and a method of assembling the same that can facilitate maintenance of equipment.

The present invention relates to a plasma processing apparatus comprising a chamber unit forming a processing space in which a substrate is processed and having a plurality of insertion ports formed at a lower portion thereof; A vacuum unit installed in the chamber unit to form a vacuum in the processing space of the chamber unit; A processing unit installed in the chamber unit to process the substrate in the processing space of the chamber unit; And a plurality of support units inserted into the insertion port of the chamber unit to support the chamber unit, penetrating a lower portion of the chamber unit, sealing the insertion port of the chamber unit, and adjusting the height; .

Wherein the supporting unit comprises: a housing mounted on a lower portion of the chamber unit, a part of which passes through the insertion port and has an inner space; A support member passing through the housing and being adjustable in height; And a cover portion installed in the housing, the cover portion covering a portion of the housing through which the support portion penetrates; .

The support unit further includes a load distribution plate installed at a lower portion of the support unit to distribute the load of the chamber unit transferred to the support unit.

The supporting unit may include: a first sealing part provided between the chamber unit and the housing; And a second sealing portion provided between the housing and the cover portion; .

A shaft having an upper portion formed inside the cover portion and a lower portion protruding outside the cover portion and having a thread formed on an outer peripheral surface thereof; An adjusting member formed with threads on an inner peripheral surface thereof and coupled to the shaft to adjust a height of the chamber; And a support member connected to a lower portion of the shaft and increasing in outer diameter from the upper side to the lower side; .

A plurality of the chamber units are provided, and the support units are provided in regions where the chamber units are adjacent to each other.

Wherein the chamber unit comprises a top plate, a bottom plate spaced apart from the bottom of the top plate, and a side plate surrounding the top plate and the bottom plate, the inlet being formed in the bottom plate, A reinforcing member having a thickness larger than the thickness of the lower plate is provided.

And a reinforcing rib is provided in the form of a lattice on the lower surface of the lower plate to increase the strength of the lower plate.

The present invention provides a method of manufacturing a semiconductor device, comprising: preparing a chamber unit for forming a processing space in which a substrate is processed; And a processing unit for processing the substrate inside the chamber unit is installed in the chamber unit and a plurality of support units for supporting the chamber unit are installed inside the chamber unit process; And a process of leveling the chamber unit; .

The step of installing the support unit inside the chamber unit may include the steps of mounting the support unit on an insertion port formed in a lower portion of the chamber unit; And tightening the chamber unit and the supporting unit; .

The step of attaching the support unit to the insertion port includes inserting the support unit from the upper side to the lower side into the insertion port.

Wherein the step of providing the chamber unit includes a step of providing a plurality of chamber units, and the step of installing the support unit includes the step of, in a region where the plurality of chamber units are adjacent to each other, As shown in FIG.

The process of leveling the chamber unit includes adjusting the height of the support units to adjust the level of the chamber unit.

According to embodiments of the present invention, a support unit for supporting the chamber can be provided inside the chamber. Therefore, even if a plurality of chambers are provided closely, the support unit can be easily installed in the chamber. Thus, the substrate processing apparatus can be easily assembled and the assembling time can be shortened.

Further, even if the support units of the portions where the plurality of chambers are densified are damaged, the operator can go into the inner space of the chamber in which the operator can easily enter, and the support units can be replaced or repaired. Therefore, the maintenance of the facility can be facilitated.

1 is a plan view showing a substrate processing apparatus according to an embodiment of the present invention;
2 is a perspective view showing an internal structure of a chamber unit according to an embodiment of the present invention;
3 is a cross-sectional view showing a structure of a support unit according to an embodiment of the present invention;
4 is a cross-sectional view showing the structure of a support unit according to another embodiment of the present invention;
5 is a view showing a process of installing a support unit according to an embodiment of the present invention;
6 is a flowchart showing a method of assembling a substrate processing apparatus according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. It will be apparent to those skilled in the art that the present invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, It is provided to let you know. To illustrate the invention in detail, the drawings may be exaggerated and the same reference numbers refer to the same elements in the figures.

2 is a perspective view illustrating an internal structure of a chamber unit according to an embodiment of the present invention, and FIG. 3 is a cross-sectional view of a substrate processing apparatus according to an embodiment of the present invention. 4 is a cross-sectional view showing a structure of a support unit according to another embodiment of the present invention, FIG. 5 is a view showing a process of installing a support unit according to an embodiment of the present invention, and FIG. 6 Is a flowchart showing a method of assembling a substrate processing apparatus according to an embodiment of the present invention.

1 and 2, a substrate processing apparatus 100 according to an embodiment of the present invention includes a chamber unit 110 in which a process space in which a substrate is processed is formed, and a plurality of insertion ports are formed in a lower portion, A vacuum unit (not shown) installed in the chamber unit 110 so as to form a vacuum in the processing space of the chamber unit 110, a process installed in the chamber unit 110 to process the substrate in the processing space of the chamber unit 110 And a chamber unit 110. The chamber unit 110 is attached to the insertion port of the chamber unit 110 so as to support the chamber unit 110 and the chamber unit 110 to penetrate the lower part of the chamber unit 110 and seal the insertion port of the chamber unit 110, And a plurality of support units 120 capable of being operated.

The chamber unit 110 forms a processing space in which the substrate is processed. The chamber unit 110 may be formed in the shape of a rectangular barrel, and may have a top plate 111, a top plate 111, and a bottom plate 111 formed in a rectangular plate shape. And a side plate 112 that covers the upper plate 111 and the lower plate 113 and forms side walls.

The side plate 112 of the chamber unit 110 may be provided with one or a plurality of outlets 112a through which a substrate or a person can enter and a chamber 112a through which the inside of the chamber unit 110 can be sealed A door (not shown) may be provided. Therefore, after the substrate is drawn into the processing space of the chamber unit 110, the processing space can be sealed to process the substrate.

The lower plate 113 of the chamber unit 110 may have a plurality of insertion holes formed in a circular hole shape. For example, the insertion ports may be located at four corners of the lower plate 113, respectively, and may communicate the inside and the outside of the chamber unit 110.

3 (b), the lower plate 113 of the chamber unit 110 may include a reinforcing member 113b. The reinforcing member 113b is formed in the shape of a ring and the upper portion protrudes outward and is seated on the upper surface of the lower plate 113 and the lower portion can be fitted into the insertion opening 113a. When the support unit 120 is seated on the reinforcement member 113b of the lower plate 113, a part of the support unit 120 can penetrate the reinforcement member. At this time, the reinforcing member may have a thickness greater than that of the lower plate 113. Therefore, it is possible to prevent the portion where the insertion port of the lower plate 113 is formed from being deformed by the reinforcing member even under a large load. That is, if the entire thickness of the lower plate 113 is increased, the weight of the chamber unit 110 is increased and the production cost is increased. Therefore, only the portion where the support unit 120 of the lower plate 113 is mounted, Can be installed.

Therefore, the first fastening member 121c, which will be described later, can pass through the seating portion 123a and be stably fastened to the reinforcing member 113b. That is, since the reinforcing member 113b has a thickness larger than that of the lower plate 113, it is possible to provide a sufficient depth to which the first fastening member 121c can be fastened. The reinforcing member 113b may be integrally formed with the lower plate 113 by welding or the like.

In addition, the reinforcing member 113b may be provided with a jaw (not shown) on the upper surface thereof to prevent the support unit 120 from swaying in the lateral direction. The jaws may be formed along the perimeter of the support unit 120 corresponding to the planar shape of the support unit 120. However, the structure and shape of the reinforcing member 113b are not limited to the above and may vary.

The lower plate 113 of the chamber unit 110 may be provided with a reinforcing rib 113a. That is, since the load of the entire chamber unit 110 is concentrated at the portion where the insertion port of the lower plate 113 is formed, the portion where the insertion port of the lower plate 113 is formed can be easily lowered downward relative to the other portion, have. Therefore, the reinforcing rib 113a may be provided on the lower plate 113 to increase the strength of the lower plate 113.

For example, the reinforcing ribs 113a may include a plurality of plates extending in the front-rear direction and a plurality of plates extending in the left-right direction. Therefore, the plates may be arranged in a lattice form on the lower surface of the lower plate 113, crossing the plates having different extending directions. Therefore, it is possible to suppress or prevent the portion where the insertion port of the lower plate 113 of the reinforcing rib 113a is formed from being eroded or cracked due to the load of the entire chamber unit 110. However, the structure of the reinforcing rib 113a is not limited to this and may vary. Also, the structure and the shape of the chamber unit 110 are not limited to this, and the shape and the number of the insertion ports may be variously changed.

A vacuum unit (not shown) serves to evacuate air in the processing space of the chamber unit 110 and to convert the processing space of the chamber unit 110 into a vacuum state. The vacuum unit may include an exhaust pipe connected to the side plate 112 of the chamber unit 110 and communicating with the processing space of the chamber unit 110 and an inhaler connected to the exhaust pipe to provide a suction force for exhausting air . Accordingly, when the operation of the suction unit is controlled after the substrate is drawn into the chamber unit 110, the air inside the chamber unit 110 is exhausted to the suction unit through the exhaust pipe, and the inside of the chamber unit 110 can be evacuated have. However, the structure of the vacuum unit and the portion connected to the chamber unit 110 of the vacuum unit are not limited thereto and may vary.

The processing unit (not shown) includes a transfer section for transferring the substrate, a heating section for heating the substrate, a process gas jetting section for jetting the process gas onto the substrate, a liquid crystal bottom for dropping liquid crystal on the upper surface of the substrate, And a defect inspection part for inspecting a defect by photographing a surface of the substrate. This processing unit can be installed on the top or side of the chamber unit 110 to process the substrate.

At this time, a plurality of chamber units 110 may be provided, and at least some processing units may be installed for each chamber unit 110. Thus, when one substrate is passed through the plurality of chamber units 110, different processing processes can be performed on one substrate in each chamber unit 110. Thus, since the substrate on which one process has been completed can be moved to a different place, the substrate can be moved along one line without performing another process, The efficiency of the treatment process can be improved.

In addition, when a plurality of substrates are sequentially passed through the plurality of chamber units 110, various processing operations for a plurality of substrates can be simultaneously performed. Thus, the productivity of the substrate processing process is improved, and the substrates can be processed quickly.

However, when the number of the chamber units 110 to be installed increases, the space in which the operator can move between the chamber units 110 can be narrowed as the chamber units 110 are densely packed. Thus, in a narrow space between the chamber units 110 adjacent to each other, that is, the chamber units 110, it is possible for the operator to have difficulty in installing the supporting unit 120 in the lower portion of the chamber unit 110 . Thus, the support unit 120 can be easily installed in the chamber unit 110 even in a narrow space by providing the support unit 120 according to the embodiment of the present invention.

3, the supporting unit 120 includes a housing 121 which is seated on the lower portion of the chamber unit 110 and is partially inserted into the insertion port and has an inner space, And a cover portion 123 provided in the inner space of the housing 121 and covering a portion through which the support portion 122 of the housing 121 penetrates. The supporting unit 120 includes a first sealing part 126 provided between the chamber unit 110 and the housing 121, a second sealing part 126 provided between the housing 121 and the cover part 123 A load distribution plate 125 installed at a lower portion of the support portion 122 to disperse the load of the chamber unit 110 transferred to the support portion 122 and a load distribution plate 125 disposed between the housing 121 and the support portion 122 And a fixing part 124 for detachably fixing the supporting part 122. [

The housing 121 is provided in the lower plate 113 as many as the number of insertion openings, and covers the insertion opening. The housing 121 includes a seating member 121a that is seated on the upper surface of the lower plate 113, an insertion member 121b that is connected to the seating member 121a and is inserted into the insertion port, a seating member 121a, And a second fastening member (not shown) for connecting the housing 121 and the cover part 123 to each other.

The seating member 121a may be formed in the shape of a hollow plate. For example, the seating member 121a may be formed in a disc shape corresponding to the shape of the insertion port, and a circular hole may be formed in the center portion. The seating member 121a may have an outer diameter larger than the inner diameter of the insertion port, and an inner diameter smaller than the insertion port. Therefore, the seating member 121a is not inserted into the insertion port but can be seated on the lower plate 113 to support the insertion member 121b.

The insertion member 121b may be formed in the shape of a container having an internal space. For example, the insertion member 121b may be formed in a cylindrical shape corresponding to the shape of the insertion port, and the upper portion may be opened. The outer diameter of the insertion member 121b may be smaller than the inner diameter of the insertion port 121b and the upper portion of the insertion member 121b may be connected to the lower portion of the seating member 121a. Therefore, when the housing 121 is inserted into the insertion port formed in the lower plate 113, the insertion member 121b of the housing 121 passes through the insertion port, and the seating member 121a can be caught by the lower plate 113. [ Accordingly, the housing 121 covers the insertion port, thereby blocking external air from entering the interior of the chamber unit 110. On the other hand, a hole through which the support portion 122 can pass may be formed in the lower portion of the insertion port.

The seating member 121a and the insertion member 121b may be integrally formed or separately formed and connected by welding or the like. However, the structure and shape of the seating member 121a and the insertion member 121b are not limited to this, and may vary.

The first fastening member 121c may be formed in a bolt shape and may be fastened to the upper surface of the lower plate 113 through the seating member 121a of the housing 121. [ The plurality of first fastening members 121c may be provided and may be spaced apart from each other along the peripheral shape of the seating member 121a. Therefore, the first fastening member 121c can be tightened or loosened to connect or disconnect the housing 121 to or from the lower plate 113. However, the structure of the first fastening member 121c and the method of connecting the housing 121 to the lower plate 113 are not limited to this and may be various.

The first sealing portion 126 serves to cut off a gap between the housing 121 and the lower plate 113. For example, the first sealing portion 126 may be formed in an O-ring shape, and may be disposed between the upper surface of the lower plate 113 and the lower surface of the seating member 121a. Accordingly, the first sealing portion 126 can block the inflow of air into the gap between the lower plate 113 and the seating member 121a. At this time, the first sealing portion 126 may be disposed closer to the insertion port than the first fastening member 121c, thereby blocking the gap. However, the shape and the position of the first sealing portion 126 are not limited to these, and may be various.

The support portion 122 supports the load of the chamber unit 110 and adjusts the height of the chamber unit 110. [ The support portion 122 is formed with a shaft 122a that extends in the vertical direction, an upper portion is located inside the cover portion, a lower portion is protruded to the outside of the cover portion and a thread is formed on the outer circumferential surface, a thread is formed on the inner circumferential surface, And a support member 122c connected to a lower portion of the shaft 122a and increasing in outer diameter from the upper side to the lower side.

The shaft 122a may be formed in a circular bar shape extending in the vertical direction, and a thread may be formed on the outer circumferential surface. The shaft 122a can be vertically movably installed in a hole formed in the insertion member 121b of the housing 121. [ Therefore, when the degree of insertion of the shaft 122a toward the inside of the chamber unit 110 increases, the height of the chamber unit 110 can be lowered. Conversely, if the degree of insertion of the shaft 122a toward the inside of the chamber unit 110 is reduced, the height of the chamber unit 110 can be increased.

The adjusting member 122b may be formed in the shape of a nut such that a thread corresponding to the thread formed on the shaft 122a may be formed on the inner circumferential surface. In addition, the upper surface of the adjustment member 122b may be in contact with the lower surface of the housing 121 or the lower surface of the fixing portion 124. Therefore, when the adjusting member 122b is tightened toward the upper side of the shaft 122a, the adjusting member 122b can move upward along the extending direction of the shaft 122a and lift the housing 121 upward. Accordingly, the chamber unit 110 connected to the housing 121 also moves upward, and the height of the chamber unit 110 can be further increased.

On the contrary, when the adjusting member 122b is loosened to the lower side of the shaft 122a, the adjusting member 122b moves downward along the extending direction of the shaft 122a, and the housing 121 is also moved downward along the adjusting member 122b . ≪ / RTI > Accordingly, the chamber unit 110 connected to the housing 121 also moves downward, and the height of the chamber unit 110 can be lowered. Therefore, when the chamber unit 110 is installed on a floor where the height is not flat, the height of the plurality of support units 120 can be adjusted to adjust the level of the chamber unit 110.

The support member 122c may be formed to have a wider diameter from the upper portion to the lower portion. For example, the support member 122c may be formed in the shape of a truncated cone. The upper portion of the support member 122c is connected to the lower portion of the shaft 122a and the lower portion is connected to the load distribution plate 125. [ At this time, the upper portion of the support member 122c may be larger than the diameter of the shaft 122a. Therefore, the contact area between the support member 122c and the shaft 122a increases, and the shorting of the support member 122c and the shaft 122a can be suppressed or prevented.

Also, the support member 122c may be integrally formed with the shaft 122a or may be separately manufactured and connected by a method such as welding. However, the structure and shape of the shaft 122a, the regulating member 122b, and the supporting member 122c are not limited to this and may vary. Also, the method of adjusting the height of the chamber unit 110 is not limited to this, and may vary.

The cover portion 123 is provided in an inner space formed by the insertion member 121b of the housing 121 and serves to cover a hole formed in the insertion member 121b. Therefore, it is possible to prevent the air outside the chamber unit 110 from flowing into the chamber unit 110. Therefore, when the inside of the chamber unit 110 is formed in a vacuum, the inside of the housing 121 can be in a vacuum state, and the inside of the cover part 123 can be in an atmospheric pressure state. That is, the cover part 123 can prevent the outside air from flowing into the inside of the housing 121 or the inside of the chamber unit 110.

The cover portion 123 includes a contact member 123a that is in contact with the bottom surface of the insertion member 121b and a hole formed in the insertion member 121b provided on the contact member 123a, And a cover member 123b that forms a movable space.

The contact member 123a may be formed in the shape of a hollow plate. For example, the contact member 123a may be formed in a disc shape corresponding to the shape of the hole formed in the insertion member 121b, and a circular hole may be formed in the center portion. The hole of the contact member 123a may be formed to have an inner diameter equal to or larger than the inner diameter of the hole formed in the insertion member 121b. Therefore, the contact member 123a can be seated on the bottom surface of the insertion member 121b and can be arranged to surround the hole formed in the insertion member 121b.

The cover member 123b may be formed in the form of a container having an internal space and extending in the vertical direction. For example, the cover member 123b may be formed into a cylindrical shape corresponding to the shape of the hole formed in the insertion member 121b, and the lower portion may be opened. The outer diameter of the cover member 123b may be smaller than the outer diameter of the contact member 123a and the inner diameter of the cover member 123b may be larger than the inner diameter of the contact member 123a. May be connected to the upper portion of the seating member 121a.

Therefore, when the contact member 123a is seated on the bottom of the insertion member 121b, the cover member 123b covers the hole formed in the insertion member 121b, and the shaft 122a is vertically . ≪ / RTI > Thus, the cover part 123 can prevent the air from entering into the chamber unit 110 by blocking the hole formed in the housing 121. [ The contact member 123a and the cover member 123b may be formed integrally or separately and may be connected by welding or the like. However, the structure and shape of the contact member 123a and the cover member 123b are not limited to these, and may vary.

4, the cover part 123 'may be formed in the form of a plate having an area. For example, the cover portion 123 'may be formed in a circular shape corresponding to the shape of the open portion above the housing 121, and may be formed larger in diameter than the open top portion of the upper portion of the housing 123' . Accordingly, the cover portion 123 'may be seated on the upper portion of the housing 121 to cover the open portion of the housing 123'. Therefore, the cover portion 123 'can cover the portion through which the support portion 122 of the housing 121 penetrates. At this time, a second sealing part 127 'is provided between the cover part 123' and the housing 121 to seal the inside of the chamber unit 110. The cover part 123 'may be fastened to the housing 121 by bolts or fixed by welding or the like. However, the structure and shape of the cover portion are not limited to this and may vary.

The second fastening member may be formed in the form of a bolt and may be fastened to the bottom surface of the insertion member 121b of the housing 121 through the contact member 123a of the cover portion 123. [ A plurality of second fastening members may be provided and may be fastened to each other along the peripheral shape of the contact member 123a. Accordingly, the second fastening member can be tightened or loosened so that the cover portion 123 can be connected to or separated from the housing 121. However, the structure of the second fastening member and the method of connecting the housing 121 and the cover portion 123 are not limited to this and may vary.

The second sealing portion 127 serves to cut off a gap between the housing 121 and the cover portion 123. For example, the second sealing portion 127 may be formed in an O-ring shape, and may be disposed between the contact member 123a of the cover portion 123 and the insertion member 121b of the housing 121 . Therefore, the second sealing portion 127 can block the inflow of air into the gap between the contact member 123a and the insertion member 121b. At this time, the second sealing portion 127 can be disposed closer to the hole formed in the insertion member 121b than the second fastening member, thereby blocking the gap. However, the shape and position of the second sealing portion 127 are not limited to this, and may be various.

The fixing portion 124 may pass through holes formed in the housing 121 and the cover portion 123 to form a path through which the shaft 122a moves and may serve to fix the shaft 122a. The fixing portion 124 includes a fixing member 124a that is in contact with the shaft 122a, a connecting member 124b that connects the fixing member 124a and the housing 121, and a connecting member 124b that connects the housing 121 and the fixing member 124a. And a sealing member (not shown) for sealing the space between them.

The fixing member 124a may be formed in the shape of a pipe extending in the vertical direction and may be inserted into a hole formed in the housing 121. [ The fixing member 124a can adjust the size of the inner diameter. Therefore, the height of the chamber unit 110 can be adjusted since the shaft 122a can be moved up and down within the fixing member 124a by releasing the fixing member 124a. Conversely, if the fixing member 124a is tightened, the fixing member 124a can hold the shaft 122a and prevent the shaft 122a from moving. Thus, the shaft 122a may be fixed and the height of the chamber unit 110 may not be adjusted.

The connecting member 124b may be formed in the form of a bolt and may be fastened to the lower portion of the insertion member 121b of the housing 121 through the fixing member 124a. A plurality of connecting members 124b may be provided and may be spaced apart from each other along the circumferential shape of the fixing member 124a. Therefore, the fixing member 124a can be connected to or disconnected from the housing 121 by tightening or loosening the connecting member 124b. However, the structure of the connection member 124b and the method of connecting the connection member 124b and the housing 121 are not limited to this and may be various.

A sealing member (not shown) is disposed in the hole formed in the housing 121 or the cover portion 123 to block a gap between the housing 121 and the fixing member 124a or between the cover portion 123 and the fixing member 124a . For example, the sealing member may be formed in an O-ring shape. Accordingly, the outside air can be prevented from flowing into the chamber unit 110 through the holes formed in the housing 121 and the cover part 123. [

Accordingly, the first sealing portion 126, the second sealing portion 127, and the sealing member can block the inflow of air into the chamber unit 110. Even if the sealing member is damaged, the second sealing part 127 closes the inside of the chamber unit 110, so that the inside of the chamber unit 110 is sealed with the second sealing part 127 while replacing or repairing the sealing member. A process for processing the substrate can be performed. However, the shape and position of the sealing member are not limited to this and may vary.

Since the components of the support unit 120 are detachably connected to each other, if any one of the support units 120 is damaged, only the damaged part can be detached and replaced or repaired. Therefore, maintenance of the support unit 120 can be facilitated.

In addition, the plurality of support units 120 can support the chamber unit 110 by injecting a load of the chamber unit 110, as well as close the insertion port formed in the chamber unit 110. Therefore, even if the inside of the chamber unit 110 is evacuated, external air can be prevented from being introduced into the chamber unit 110 through the insertion port. Accordingly, the substrate processing process can be performed stably while the vacuum is maintained in the chamber unit 110.

The load distribution plate 125 can be formed in the form of a rectangular plate, and has a larger area than the support member 122c. Accordingly, the load distribution plate 125 distributes the load of the chamber unit 110, which is transmitted through the shaft 122a and the support member 122c, by the area of the chamber unit 110, so that the load of the chamber unit 110 is concentrated at one point Can be prevented. The load distribution plate 125 may be integrally formed with the support member 122c or may be separately manufactured and connected by welding or bolting. However, the shape of the load distribution plate 125 is not limited to this and may vary.

As such, a support unit 120 for supporting the chamber unit 110 can be installed inside the chamber unit 110. [ Therefore, even if the plurality of chamber units 110 are installed in a concentrated manner, the support unit 120 can be easily installed in the chamber unit 110. Thus, the substrate processing apparatus 100 can be easily assembled, and the assembling time can be shortened.

Further, even if the support unit 120 of the portion where the plurality of chamber units 110 are densified is damaged, the operator can enter the inner space of the chamber unit 110 which is easy to enter and replace or repair the support unit 120 . Therefore, maintenance of the substrate processing apparatus 100 can be facilitated.

Hereinafter, a method for assembling a substrate processing apparatus according to an embodiment of the present invention will be described.

Referring to FIGS. 5 and 6, a method of assembling a substrate processing apparatus according to an embodiment of the present invention includes the steps of providing a chamber unit for forming a processing space in which a substrate is processed (S100) (S200) of installing a plurality of support units for supporting a chamber unit in a chamber unit and a processing unit for processing a substrate in a chamber unit inside the chamber unit, And adjusting the height of the chamber unit (S300).

First, the chamber unit 110 can be provided in the workplace in which the substrate processing apparatus 100 is to be installed. At this time, the plurality of chamber units 110 in which different processes are performed on the substrate may be disposed adjacent to each other.

Then, a vacuum unit and a processing unit can be installed in the chamber unit 110, and the support unit 120 can be installed in the chamber unit 110. That is, the vacuum unit, the processing unit, and the supporting unit 120 may be installed in the chamber unit 110 at the same time or sequentially or in reverse order. At this time, the processing unit includes a transfer unit for transferring the substrate in accordance with the processing process of the substrate to be performed in the chamber unit 110, a heating unit for heating the substrate, a process gas spraying unit for spraying the process gas to the substrate, A liquid crystal lower part for dropping a liquid crystal, a laser part for irradiating the substrate with a laser beam, and a defect inspection part for inspecting a defect by photographing the surface of the substrate.

However, when the number of the chamber units 110 to be installed increases, the space in which the operator can move between the chamber units 110 can be narrowed as the chamber units 110 are concentrated. Thus, in a narrow space between the chamber units 110 adjacent to each other, that is, the chamber units 110, it is possible for the operator to have difficulty in installing the supporting unit 120 in the lower portion of the chamber unit 110 . Accordingly, the support unit 120 can be installed in a region where the chamber units 110 are narrowed by facing each other in the following manner.

First, an operator can lift the support unit 120 and enter the interior of the chamber unit 110. The operator can enter the chamber unit 110 through the entrance 112a formed in the chamber unit 110 because the chamber unit 110 is provided with the entrance 112a through which the substrate or the person can enter.

Then, the support unit 120 can be mounted on the insertion port formed in the lower portion of the chamber unit 110. [ For example, the support unit 120 can be inserted into the insertion port from the upper side to the lower side. The upper portion of the housing 121 of the supporting unit 120 may be seated on the bottom of the chamber unit 110 and the lower portion of the housing 121 may penetrate the lower portion of the chamber unit 110.

Next, the housing unit 121 and the lower portion of the chamber unit 110 may be fastened by the first fastening member 121c to fix the support unit 120 to the chamber unit 110. [ At this time, a plurality of insertion openings may be formed in the chamber unit 110, and the operator may prepare the support units 120 corresponding to the number of the insertion openings and install the support units 120 in the insertion openings. The support unit 120 can disperse the load of the chamber unit 110. [ Further, the support unit 120 can close the insertion port formed in the chamber unit 110. [ Therefore, even if the inside of the chamber unit 110 is evacuated, external air can be prevented from being introduced into the chamber unit 110 through the insertion port.

Then, the chamber unit 110 can be leveled. The plurality of support units 120 supporting one chamber unit 110 can individually be adjusted in height. For example, the height of the support portion 122 of the support unit 120 can be adjusted by adjusting the degree of insertion of the support portion 122 into the cover portion 123.

That is, when the degree of insertion of the support part 122 into the cover part 123 increases, the height of the support unit 120 may be lowered and the position of the chamber unit 110 may be lowered. The height of the support unit 120 may be increased and the position of the chamber unit 110 may be increased. Therefore, a horizontal gauge (not shown) may be provided in the chamber unit 110 to adjust the height of the support units 120 while checking the horizontal state of the chamber unit 110. Thus, the substrate can be stably processed inside the chamber unit 110 by accurately adjusting the horizontal level of the chamber unit 110.

As such, a support unit 120 for supporting the chamber unit 110 can be installed inside the chamber unit 110. [ Therefore, even if the plurality of chamber units 110 are installed in a concentrated manner, the support unit 120 can be easily installed in the chamber unit 110. Thus, the substrate processing apparatus 100 can be easily assembled, and the assembling time can be shortened.

Further, even if the support unit 120 of the portion where the plurality of chamber units 110 are densified is damaged, the operator can enter the inner space of the chamber unit 110 which is easy to enter and replace or repair the support unit 120 . Therefore, maintenance of the substrate processing apparatus 100 can be facilitated.

Although the present invention has been described in detail with reference to the specific embodiments thereof, it will be apparent to those skilled in the art that various modifications and variations can be made without departing from the scope of the present invention. Therefore, the scope of the present invention should not be limited by the described embodiments, but should be defined by the appended claims, as well as the appended claims.

100: substrate processing apparatus 110: chamber unit
120: support unit 121: housing
122: support part 123: cover part
124: fixing part 125: load distribution plate
126: first sealing portion 127: second sealing portion

Claims (13)

A chamber unit forming a processing space in which a substrate is processed and having a plurality of insertion ports formed therein;
A vacuum unit installed in the chamber unit to form a vacuum in the processing space of the chamber unit;
A processing unit installed in the chamber unit to process the substrate in the processing space of the chamber unit; And
A plurality of support units detachably installed in the chamber unit so as to penetrate through the lower portion of the chamber unit, respectively, inserted into the insertion ports of the chamber unit, to seal the insertion port of the chamber unit, and to adjust the height; And the substrate processing apparatus. The method according to claim 1,
The support unit includes:
A housing mounted on a lower portion of the chamber unit, a part of which passes through the insertion port and has an inner space;
A support member passing through the housing and being adjustable in height; And
A cover portion that is detachably installed in the housing and covers a portion of the housing through which the support portion penetrates; And the substrate processing apparatus. The method of claim 2,
Wherein the support unit further comprises a load distribution plate provided at a lower portion of the support unit to disperse a load of the chamber unit transferred to the support unit. The method of claim 2,
The support unit includes:
A first sealing part provided between the chamber unit and the housing; And
A second sealing portion provided between the housing and the cover portion; And the substrate processing apparatus further comprises: The method of claim 2,
The support portion
A shaft extending upwardly and downwardly, an upper portion located inside the cover portion, a lower portion protruding outside the cover portion, a screw thread formed on an outer peripheral surface thereof, and a vertically movable shaft installed in the housing; And
A support member connected to a lower portion of the shaft and increasing in outer diameter from an upper side to a lower side; And the substrate processing apparatus. The method according to claim 1,
Wherein the plurality of chamber units are provided, and the support unit is provided in an area where the chamber units are adjacent to each other. The method according to any one of claims 1 to 6,
Wherein the chamber unit includes a top plate, a bottom plate spaced apart from the bottom of the top plate, and a side plate surrounding the top plate and the bottom plate,
Wherein the insertion port is formed in the lower plate, and the insertion port is provided with a reinforcing member having a thickness greater than the thickness of the lower plate. The method of claim 7,
And a reinforcing rib in the form of a lattice on the lower surface of the lower plate to increase the strength of the lower plate. Providing a chamber unit for forming a processing space in which a substrate is processed;
And a processing unit for processing the substrate inside the chamber unit is installed in the chamber unit and a plurality of support units for supporting the chamber unit are installed inside the chamber unit process; And
A step of horizontally aligning the chamber unit; Including,
Wherein the step of installing the support unit inside the chamber unit comprises:
Inserting and mounting the supporting unit from the upper side to the lower side in an insertion port formed in a lower portion of the chamber unit, and
And joining the chamber unit and the support unit. delete delete The method of claim 9,
The process of providing the chamber unit may include providing a plurality of chamber units,
Wherein the step of installing the support unit comprises the step of installing the support unit inside the chamber unit in a region where the plurality of chamber units are adjacent to each other. delete

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