KR20100052193A - Apparatus for conveying a glass and apparatus for processing a class including the same - Google Patents

Apparatus for conveying a glass and apparatus for processing a class including the same Download PDF

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Publication number
KR20100052193A
KR20100052193A KR1020080111111A KR20080111111A KR20100052193A KR 20100052193 A KR20100052193 A KR 20100052193A KR 1020080111111 A KR1020080111111 A KR 1020080111111A KR 20080111111 A KR20080111111 A KR 20080111111A KR 20100052193 A KR20100052193 A KR 20100052193A
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KR
South Korea
Prior art keywords
substrate
conveying
shafts
shaft
rotational force
Prior art date
Application number
KR1020080111111A
Other languages
Korean (ko)
Inventor
손석호
Original Assignee
세메스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세메스 주식회사 filed Critical 세메스 주식회사
Priority to KR1020080111111A priority Critical patent/KR20100052193A/en
Publication of KR20100052193A publication Critical patent/KR20100052193A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE: An apparatus for conveying a substrate and an apparatus for processing the substrate including the same are provided to stably perform a conveyor process by arranging second conveyor shafts between first conveyor shafts. CONSTITUTION: A substrate processing unit is installed in a process chamber(100). The substrate processing unit sprays chemical onto a substrate. Support plates(310, 370) are arranged on the bottom of the process chamber to be spaced apart from each other. First conveyor shafts(320) are supported by the support plates. The first conveyor shafts convey the substrate by a torque from an external driving unit. Second conveyor shafts(330) support the first conveyor shafts and maintain the interval of the support plates.

Description

Substrate conveying apparatus and substrate processing apparatus including the same {APPARATUS FOR CONVEYING A GLASS AND APPARATUS FOR PROCESSING A CLASS INCLUDING THE SAME}

The present invention relates to a substrate transfer apparatus and a substrate processing apparatus including the same, and more particularly, to an apparatus for conveying a substrate for manufacturing a display element and an apparatus for processing the substrate including the same.

In general, display elements are used in flat panel displays for displaying an image. For example, a liquid crystal display (LCD) using liquid crystal, a plasma display (PDP) using plasma, and an organic light emitting display using an organic light emitting diode ( OLED) and the like.

The display device is manufactured through a transparent glass substrate. Specifically, the display device is manufactured through a deposition process, an etching process, a photolithography process, a cleaning process, and the like based on the substrate. In this case, the substrate is conveyed to the process chambers in which the processes are performed through a separate substrate transport apparatus to perform the above processes.

The substrate transport apparatus includes a plurality of transport shafts installed in the process chamber to transport the substrate and support plates installed at a bottom of the process chamber to support both sides of the transport shafts.

At this time, at least one of both sides of the conveying shaft has a configuration passing through the support plate in order to receive a rotational force from an external drive device.

Accordingly, any one of the support plates may flow along the conveying shafts, which may result in the spacing between the support plates not being kept constant.

That is, the conveying shafts are twisted with each other due to the non-uniform spacing between the support plates, thereby failing to convey the substrate stably.

Accordingly, the present invention has been made in view of such problems, and an object of the present invention is to provide a substrate transfer device capable of stably transporting a substrate.

Moreover, another object of this invention is to provide the substrate processing apparatus containing the said substrate conveyance apparatus.

In order to achieve the above object of the present invention, a substrate conveying apparatus according to one aspect includes supporting plates, a first conveying shaft and a second conveying shaft.

The support plates are spaced apart from each other. Both parts of the first conveyance shaft are supported by the support plates, and the substrate placed on the upper portion conveys a rotational force from an external driving device. The second conveying shaft is fixed at both sides of the support plates in parallel with the first conveying shaft, and maintains a constant gap between the supporting plates while supporting the conveyance of the substrate through a plurality of idle rollers.

Thus, the second conveying shaft includes a shaft fixed to the support plates and bearings installed between the idle rollers and the shaft so that the idle rollers rotate freely.

The substrate transport apparatus may further include a first magnetic disk and a second magnetic disk.

The first magnetic disk is connected with the first conveying shaft on the outer side of any one of the support plates and has first magnetic bodies along the circumferential direction. The second magnetic disk is spaced apart to face the first magnetic disk, and the rotational force is transmitted from the driving device, and includes the second magnetic body magnetically coupled with the first magnetic body along the circumferential direction to the rotational force Deliver to the first magnetic disk.

Meanwhile, the plurality of first conveying shafts and the plurality of second conveying shafts may be alternately arranged.

In order to achieve the above object of the present invention, a substrate processing apparatus according to one aspect includes a process chamber, a substrate processing unit, support plates, first conveying shafts and second conveying shafts.

The process chamber provides space for processing a substrate. The substrate processing unit is installed in the process chamber, and sprays a chemical on the substrate to process the substrate. The support plates are spaced apart from each other at the bottom of the process chamber.

Each of the first conveying shafts is supported by the supporting plates, and respective portions of the first conveying shafts are conveyed by receiving a rotational force from an external driving device.

The second conveying shafts are alternately arranged with the first conveying shafts so that respective side portions thereof are fixed to the supporting plates, and support the conveyance of the substrate placed on the first conveying shafts through a plurality of idle rollers. While keeping the spacing between the support plates constant.

Thus, the substrate processing unit may further include first magnetic disks and second magnetic disks.

The first magnetic disks are connected to each of the first conveying shafts between any one of the support plates and the outer wall of the process chamber, each having first magnetic bodies along the circumferential direction.

The second magnetic disks are disposed to face the first magnetic disks through the outer wall, and the rotational force is transmitted from the driving device, and the second magnetic bodies are magnetically coupled to the first magnetic bodies along the circumferential direction, respectively. And transmit the rotational force to the first magnetic disks.

According to such a substrate conveying apparatus and a substrate processing apparatus including the same, a rotational force for conveying a substrate is transmitted to the first conveying shafts, while maintaining a constant distance between the supporting plates between the first conveying shafts. By arranging the second conveying shafts supporting the substrate conveyed by the first conveying shafts, the conveyance of the substrate can be stably progressed.

As a result, defects of the substrate generated during transportation may be minimized to improve the production yield of the display device manufactured through the substrate.

Hereinafter, a substrate transfer apparatus and a substrate processing apparatus including the same according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. As the inventive concept allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. Like reference numerals are used for like elements in describing each drawing. In the accompanying drawings, the dimensions of the structures are shown in an enlarged scale than actual for clarity of the invention.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.

The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, the terms "comprise" or "have" are intended to indicate that there is a feature, number, step, action, component, part, or combination thereof described on the specification, and one or more other features. It is to be understood that the present invention does not exclude the possibility of the presence or the addition of numbers, steps, operations, components, parts, or combinations thereof.

On the other hand, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

1 is a configuration diagram schematically illustrating a substrate processing apparatus according to an embodiment of the present invention.

Referring to FIG. 1, a substrate processing apparatus 1000 according to an embodiment of the present invention includes a process chamber 100, a substrate processing unit 200, and a substrate transfer unit 300.

The process chamber 100 provides a space for performing a process on the substrate G. The substrate G may be a glass substrate for manufacturing a display panel, which is a display element for displaying an image of a flat panel display device.

Alternatively, the substrate G may be a semiconductor substrate for manufacturing a semiconductor device. In addition, the process may be a deposition process, an etching process, an etching process, a cleaning process, or the like targeting the substrate G.

The substrate processing unit 200 is installed above the substrate G in the process chamber 100. The substrate processing unit 200 performs the processes by processing the substrate G through the chemical C provided from the outside.

Here, the chemical (C) is a sulfuric acid (H2SO4), hydrochloric acid (HCl), hydrofluoric acid (HF), hydrogen peroxide solution (H2O2), deionized water to the etching process or cleaning process for the substrate (G) (H 2 O) and the like.

The substrate transfer part 300 is installed below the substrate G in the process chamber 100 to transfer the substrate G. That is, the substrate processing unit 200 is fixed to the process chamber 100 to inject the chemical C, and the substrate transfer unit 300 conveys the substrate G while the substrate G transfers the substrate G. Allow to be processed by chemical (C).

Hereinafter, the substrate carrier 300 will be described in more detail with reference to FIG. 2.

FIG. 2 is a diagram illustrating a substrate transfer unit of the substrate processing apparatus illustrated in FIG. 1.

2, the substrate carrier 300 includes first support plates 310, first carrier shafts 320, and second carrier shafts 330.

The first support plates 310 are spaced apart from each other on the bottom of the process chamber 100. Specifically, the first support plates 310 are disposed to face opposite inner walls of the process chamber 100.

The first conveying shafts 320 are disposed such that respective side portions thereof are supported by the first supporting plates 310. In detail, each of the first transport shafts 320 may be coupled to the first shaft 322 supported by the first support plates 310 and the first shafts 322. Drive rollers 324 that directly convey G).

Here, the driving rollers 324 rotate together with the first shaft 322 and are coupled to the first shaft 322 at approximately regular intervals.

The first conveying shafts 320 receive a rotational force from an external drive device 10 to convey the substrate G. To this end, at least one of both sides of the first shaft 322 has a configuration passing through the first support plate 310 to receive the rotational force.

Thus, the substrate carrier 300 further includes first magnetic disks 340 and second magnetic disks 350. Each of the first magnetic disks 340 is connected to a portion passing through the first support plate 310 of each of the first shafts 322. That is, the first magnetic disks 340 are disposed between the outer wall of the process chamber 100 and the first support plate 310 in the process chamber 100.

Each of the first magnetic disks 340 has first magnetic bodies 342 formed along the circumferential direction. The first magnetic bodies 342 may be made of a permanent magnet having magnetic force by itself.

Each of the second magnetic disks 350 is disposed to face the first magnetic disks 340 with the outer wall of the process chamber 100 interposed therebetween. Each of the second magnetic disks 350 has second magnetic bodies 352 magnetically coupled to the first magnetic bodies 342 along the circumferential direction. Like the first magnetic bodies 342, the second magnetic bodies 352 may be made of a permanent magnet.

Each of the second magnetic disks 350 is coupled to the second shafts 360 to receive the rotational force. Accordingly, the second shafts 360 are supported by having a second support plate 370 disposed therebetween.

The driving device 10 is directly or indirectly connected to the second shafts 360 to transmit rotational force to the second magnetic disk 350 through the second shafts 360. Here, the drive device 10 includes a motor.

In detail, the driving device 10 is connected to only one of the second shafts 360, and the other is connected to any one connected to the driving device 10 through the pulley 25 and the belt 20. To transmit the rotational force. In this case, an idle roller (not shown) may be coupled to the belt 20 to maintain a tension necessary for transmitting the rotational force.

In addition, when directly connected to the second shaft 360 by using a general motor as the drive device 10, a reduction gear may be coupled to reduce the rotational speed. It may also be connected to the second shaft 360 at a reduced rotational speed using a servo motor.

As such, the rotational force of the driving device 10 is transmitted to the first shafts 322 through the second shafts 360, the second magnetic disks 350, and the first magnetic disks 340. By transferring, the substrate G may be conveyed by the driving rollers 324 rotating together with the first shafts 322.

The second conveying shafts 330 are alternately disposed with the first conveying shafts 320 between the first conveying shafts 320. Hereinafter, the second conveying shafts 330 will be described in more detail with reference to FIG. 3.

3 is a cross-sectional view taken along the line II ′ of FIG. 2.

Referring further to FIG. 3, each of the second conveying shafts 330 includes a third shaft 332, idle rollers 334 and bearings 336.

Both parts of the third shaft 332 are fixed to the first support plates 310. For example, as shown in FIG. 3, the third shaft 332 may be fixed to both of the first support plates 310 through bolts 30.

In this case, the first support plates 310 may prevent the head of the bolt 30 from protruding by countersinking a portion into which the bolt 30 is inserted.

As such, the third shaft 332 may be fixed to both side portions of the first support plates 310, thereby maintaining a constant gap between the first support plates 310.

The idle rollers 334 are coupled to the first shaft 322 at approximately regular intervals. The idle rollers 334 support the substrate G, which is conveyed by the first conveying shafts 320.

The bearings 336 are installed between the idle rollers 334 and the third shaft 332. The bearings 336 have a member inserted therein to minimize friction, such as a ball 337, to freely rotate the idle rollers 334. As a result, the idle rollers 334 may rotate while supporting the substrate G when the substrate G is conveyed.

Therefore, the rotational force for conveying the substrate G is transmitted to the first conveying shafts 320, and the interval between the first supporting plates 310 is fixed between the first conveying shafts 320. By disposing the second conveyance shafts 330 supporting the substrate G conveyed by the first conveyance shafts 320 while maintaining it, the conveyance of the substrate G may be stably progressed. .

As a result, the defect of the substrate G generated during transportation may be minimized to improve the production yield of the display device manufactured through the substrate G.

In addition, even when the size of the substrate G is increased, the second conveying shafts 330 are also arranged by the number of the first conveying shafts 320 conveying the substrate G. The distance between the first support plates 310 can be kept constant without difficulty.

While the present invention has been described in connection with what is presently considered to be practical and exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

The present invention described above provides a distance between the support plates for supporting both sides of the first conveying shafts for substantially conveying the substrate, through the second conveying shafts for supporting the substrate which is disposed between the conveying first conveying shafts. By keeping it constant, it can be used for the conveying apparatus which can stabilize the conveyance of the said board | substrate.

1 is a configuration diagram schematically illustrating a substrate processing apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram illustrating a substrate transfer unit of the substrate processing apparatus illustrated in FIG. 1.

3 is a cross-sectional view taken along the line II ′ of FIG. 2.

<Explanation of symbols for the main parts of the drawings>

G: substrate 10: driving device

20 belt 100 process chamber

200: substrate processing unit 300: substrate transfer unit

310: first support plate 320: first transport shaft

330: second conveying shaft 340: first magnetic disk

350: second magnetic disk 370: second support plate

1000: Substrate Processing Unit

Claims (6)

Support plates spaced apart from each other; At least one first conveyance shaft having both sides supported by the support plates and conveying a substrate placed thereon by receiving a rotational force from an external driving device; And At least one second conveying shaft in which both side portions are fixed to the supporting plates in parallel with the first conveying shaft, and maintain a constant distance between the supporting plates while supporting the conveying of the substrate through a plurality of idle rollers; Substrate conveying apparatus comprising a. The method of claim 1, wherein the second conveying shaft A shaft fixed to the support plates, to which the idle rollers are coupled; And And bearings provided between the idle rollers and the shaft such that the idle rollers rotate freely. The method of claim 1, A first magnetic disk connected to the first conveying shaft on the outside of any one of the supporting plates, the first magnetic disk having first magnetic bodies along the circumferential direction; And The rotational force is disposed to face the first magnetic disk, and the rotational force is transmitted from the driving device, and includes the second magnetic bodies magnetically coupled to the first magnetic bodies along the circumferential direction. And a second magnetic disk for transmitting. 2. The substrate transport apparatus of claim 1, wherein a plurality of first transport shafts and a plurality of second transport shafts are alternately arranged. A process chamber providing space for processing a substrate; A substrate processing unit installed in the process chamber and processing the substrate by spraying a chemical on the substrate; Support plates spaced apart from each other at a bottom of the process chamber; A plurality of first conveying shafts each of which is supported by the supporting plates, and the substrate placed thereon receives and receives a rotational force from an external driving device; And Alternately disposed with the first conveying shafts so that respective portions of both sides are fixed to the supporting plates, and between the supporting plates while supporting conveyance of the substrate placed on the first conveying shafts through a plurality of idle rollers. A substrate processing apparatus comprising a plurality of second conveying shafts for maintaining a constant gap. The method of claim 5, First magnetic disks connected to each of the first conveying shafts between any one of the supporting plates and the outer wall of the process chamber, each having first magnetic bodies along the circumferential direction; And The rotational force is disposed to face the first magnetic disks through the outer wall, and the rotational force is transmitted from the driving device, and includes the second magnetic bodies magnetically coupled to the first magnetic bodies along the circumferential direction, respectively. Substrate processing apparatus further comprises a second magnetic disk to transfer to the first magnetic disk.
KR1020080111111A 2008-11-10 2008-11-10 Apparatus for conveying a glass and apparatus for processing a class including the same KR20100052193A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020080111111A KR20100052193A (en) 2008-11-10 2008-11-10 Apparatus for conveying a glass and apparatus for processing a class including the same

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Application Number Priority Date Filing Date Title
KR1020080111111A KR20100052193A (en) 2008-11-10 2008-11-10 Apparatus for conveying a glass and apparatus for processing a class including the same

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KR20100052193A true KR20100052193A (en) 2010-05-19

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105417166A (en) * 2015-12-25 2016-03-23 苏州频发机电科技有限公司 Conveying device for removed defective products of liquid crystal glass substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105417166A (en) * 2015-12-25 2016-03-23 苏州频发机电科技有限公司 Conveying device for removed defective products of liquid crystal glass substrates
CN105417166B (en) * 2015-12-25 2017-12-15 苏州频发机电科技有限公司 A kind of liquid crystal glass base goes residual conveying device

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