KR20100043309A - Clamp stage - Google Patents

Clamp stage Download PDF

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Publication number
KR20100043309A
KR20100043309A KR1020080102295A KR20080102295A KR20100043309A KR 20100043309 A KR20100043309 A KR 20100043309A KR 1020080102295 A KR1020080102295 A KR 1020080102295A KR 20080102295 A KR20080102295 A KR 20080102295A KR 20100043309 A KR20100043309 A KR 20100043309A
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South Korea
Prior art keywords
support
mask
clamp stage
mask frame
clamp
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KR1020080102295A
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Korean (ko)
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KR101000750B1 (en
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김주환
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주식회사 힘스
김주환
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Priority to KR1020080102295A priority Critical patent/KR101000750B1/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: A clamp stage is provided to prevent an error in a mask test process by controlling the height of a support by including a lift control device. CONSTITUTION: A clamp stage includes a plurality of support devices(32) which support a mask frame(20) on the upper side. The support device includes a support(32a) which supports the lower side of the mask frame. The support device includes a lift control device which lifts the support.

Description

클램프스테이지{clamp stage}Clamp stage

본 발명은 마스크프레임과의 부조화에 따른 마스크프레임 및 마스크프레임에 고정된 마스크의 변형을 방지할 수 있도록 된 새로운 구조의 클램프스테이지에 관한 것이다.The present invention relates to a clamp frame having a new structure that can prevent deformation of the mask frame and the mask fixed to the mask frame due to mismatch with the mask frame.

일반적으로, LCD 등과 같은 디스플레이패널의 제조에 사용되는 마스크는 두께 50~150μm 내외의 두께를 갖는 박판에 다수개의 슬릿을 형성한 것으로, 두께가 매우 얇아서, 도 1에 도시한 바와 같이, 중앙부에 상하방향의 관통공(21)이 형성된 사각 테두리형상으로 구성된 마스크프레임(20)에 고정된 상태로 취급된다.In general, a mask used for manufacturing a display panel such as an LCD is formed of a plurality of slits in a thin plate having a thickness of about 50 ~ 150μm, the thickness is very thin, as shown in Figure 1, the top and bottom The through-hole 21 in the direction is handled in a fixed state to the mask frame 20 consisting of a rectangular border shape.

한편, 이와같이 구성된 마스크(10)를 검사하는 마스크검사장치는 도 2에 도시한 바와 같이, 일측에 투입구(IN)가 형성된 박스형상으로 구성되며, 내부에는 도 3에 도시한 바와 같이, 상면에 마스크프레임(20)을 올려놓아 고정할 수 있도록 된 클램프스테이지(30)와, 상기 클램프스테이지(30)를 전후진시키는 이송기구(40), 상기 클램프스테이지(30)의 상부에 설치되어 마스크프레임(20)에 고정된 마스크(10) 를 촬영하는 카메라(50)가 구비되어, 상기 클램프스테이지(30)를 전후진시키면서 카메라(50)를 이용하여 마스크(10)를 촬영한 후 영상을 판독하여, 마스크(10)를 검사할 수 있다. 이때, 이러한 마스크(10)는 팽팽하게 당겨진 상태로 상기 마스크프레임(20)에 고정된다.On the other hand, the mask inspection apparatus for inspecting the mask 10 configured as described above, as shown in Figure 2, is composed of a box shape having an inlet (IN) formed on one side, as shown in Figure 3, the mask on the upper surface The clamp stage 30 which can be fixed by placing the frame 20, the transfer mechanism 40 which advances the clamp stage 30 back and forth, and is installed in the upper part of the clamp stage 30, the mask frame 20 The camera 50 for capturing the mask (10) fixed to the) is provided, while photographing the mask 10 by using the camera 50 while moving forward and backward the clamp stage 30, the image is read out, the mask (10) may be examined. At this time, the mask 10 is fixed to the mask frame 20 in a taut state.

그런데, 상기 클램프스테이지(30)와 마스크프레임(20)은 각기 별도로 제작되어, 상호 접촉면에 미세한 부조화가 존재하므로, 마스크프레임(20)을 클램프스테이지(30)에 올려놓을 때 마스크프레임(20)이 클램프스테이지(30)의 상면에 추종되어 변형되며, 이에따라, 마스크(10) 역시 일측방으로 당겨지는 외력이 작용되어 변형되므로써, 마스크 검사시 오류가 발생될 수 있는 문제점이 있었다.However, since the clamp stage 30 and the mask frame 20 are manufactured separately, there is a minute mismatch in the mutual contact surface, so that the mask frame 20 is placed on the clamp stage 30 when the mask frame 20 is placed on the clamp stage 30. Followed by the upper surface of the clamp stage 30 is deformed, accordingly, the mask 10 also has a problem that an error may occur during the mask inspection by deforming by applying an external force pulled to one side.

본 발명은 상기의 문제점을 해결하기 위한 것으로서, 마스크프레임과 클램프스테이지의 부조화에 의해 마스크 검사에 오류가 발생되는 것을 방지할 수 있도록 된 새로운 구조의 클램프스테이지를 제공함에 그 목적이 있다.SUMMARY OF THE INVENTION The present invention has been made in view of the above problem, and an object of the present invention is to provide a clamp stage having a new structure that can prevent an error from occurring in inspection of a mask due to a mismatch between a mask frame and a clamp stage.

상기한 목적을 달성하기 위한 본 발명은, 마스크검사장치에 구비되며 상면에 마스크프레임(20)을 올려놓을 수 있도록 된 클램프스테이지에 있어서,The present invention for achieving the above object, in the clamp stage provided in the mask inspection apparatus to put the mask frame 20 on the upper surface,

상기 클램프스테이지(30)의 상면에는 마스크프레임(20)의 하부면을 지지하는 지지대(32a)와, 상기 지지대(32a)를 승강시키는 승강조절기구(32b)를 포함하는 지지기구(32)가 다수개 구비된 것을 특징으로 하는 클램프스테이지가 제공된다.On the upper surface of the clamp stage 30, there are a plurality of support mechanisms 32 including a support 32a for supporting the lower surface of the mask frame 20, and a lift adjustment mechanism 32b for elevating the support 32a. Clamp stage is provided, characterized in that provided with.

본 발명에 따른 클램프스테이지는 승강조절기구(32b)를 조절하여 지지대(32a)의 높이를 조절함으로써, 마스크프레임(20)의 변형을 교정할 수 있으므로, 마스크프레임(20)의 변형 및 이에따른 마스크(10)의 변형에 의해 검사오류가 발생되는 것을 방지할 수 있는 장점이 있다.Clamp stage according to the present invention can adjust the height of the support (32a) by adjusting the lifting control mechanism (32b), so that the deformation of the mask frame 20 can be corrected, the deformation of the mask frame 20 and the mask accordingly There is an advantage that can prevent the occurrence of a test error by the modification of (10).

이하, 본 발명을 첨부된 예시도면에 의거하여 상세히 설명한다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

도 4내지 도 6에 의하면, 본 발명에 따른 클램프스테이지는 마스크검사장치에 구비되며 상면에 마스크프레임(20)을 올려놓을 수 있도록 된 것은 종래와 동일하다. 이때, 상기 마스크프레임(20)은 중앙부에 상하방향의 관통공(21)이 형성된 사각 테두리형상으로 구성된다.4 to 6, the clamp stage according to the present invention is provided in the mask inspection apparatus is able to put the mask frame 20 on the upper surface is the same as in the prior art. At this time, the mask frame 20 is configured in a rectangular border shape formed with a through hole 21 in the vertical direction in the center.

그리고, 상기 클램프스테이지(30)의 상면에는 마스크프레임(20)의 하부면을 지지하는 다수개의 지지기구(32)가 구비된다.In addition, a plurality of support mechanisms 32 are provided on an upper surface of the clamp stage 30 to support a lower surface of the mask frame 20.

이를 자세히 설명하면, 상기 클램프스테이지(30)는 상기 마스크프레임(20)의 관통공(21)의 형성위치와 겹쳐지도록 중앙부에 상하방향을 관통하는 관통공(31)이 형성된다. In detail, the clamp stage 30 has a through hole 31 penetrating in a vertical direction in a central portion thereof so as to overlap with the formation position of the through hole 21 of the mask frame 20.

그리고, 상기 지지기구(32)는 마스크프레임(20)의 하부면을 지지하는 지지대(32a)와, 상기 지지대(32a)를 승강시키는 승강조절기구(32b)로 구성되어, 상기 클램프스테이지(30)의 상면 둘레에 다수개 일정간격으로 구비되므로써, 클램프스테이지(30)의 상부에 마스크프레임(20)을 올려놓으면, 상기 지지대(32a)가 마스크프레임(20)의 하부면, 특히, 마스크프레임(20)의 하측 둘레면을 지지하게 된다.In addition, the support mechanism 32 is composed of a support base 32a for supporting the lower surface of the mask frame 20, and a lift adjustment mechanism 32b for raising and lowering the support base 32a. Since a plurality of predetermined intervals are provided around the upper surface of the clamp stage 30, the support frame 32a is placed on the lower surface of the mask frame 20, in particular, the mask frame 20. Support the lower circumferential surface.

이때, 상기 지지대(32a)는 상기 클램프스테이지(30)의 상면에 고정된 지지블록의 상부에 승강가능하게 설치되는 것으로, 상면은 중앙부가 상측으로 볼록한 만곡면으로 구성된다. 그리고, 상기 승강조절기구(32b)는 상기 지지블록의 내부에 구비되며 작동시 지지대(32a)를 승강시키는 도시안된 나사기구와, 상기 지지블록에 회전가능하게 설치되어 지지블록의 외부로 연장되며 상기 나사기구에 연결된 조절레버(L)로 구성되어, 도 7에 도시한 바와 같이, 작업자가 수동으로 조절레버(L)를 회전시키면, 상기 나사기구의 작용에 의해 지지대(32a)가 정밀하게 승강되도록 구성된다.At this time, the support (32a) is to be installed on the upper part of the support block fixed to the upper surface of the clamp stage 30, the upper surface is composed of a curved surface convex toward the upper side. And, the lifting control mechanism (32b) is provided in the interior of the support block and not shown screw mechanism for elevating the support (32a) during operation, rotatably installed on the support block is extended to the outside of the support block and the Consisting of the control lever (L) connected to the screw mechanism, as shown in Figure 7, when the operator manually rotates the control lever (L), by the action of the screw mechanism so that the support 32a is precisely lifted It is composed.

또한, 상기 클램프스테이지(30)의 상면 둘레부 중에서 상호 인접된 2면에는 마스크프레임(20)의 측면을 지지하는 지지로울러(33)가 구비되며, 타측 2면에는 마스크프레임(20)의 측면을 가압하는 푸셔(34)가 구비되어, 클램프스테이지(30)의 상면에 마스크프레임(20)을 올려놓으면, 상기 푸셔(34)에 의해 마스크프레임(20)이 밀려 지지로울러(33)에 밀착되므로써, 정확한 위치에 세팅될 수 있다.In addition, a support roller 33 for supporting the side of the mask frame 20 is provided on two adjacent surfaces of the upper surface of the clamp stage 30, and the side of the mask frame 20 is provided on the other two surfaces. When the pusher 34 for pressing is provided and the mask frame 20 is placed on the upper surface of the clamp stage 30, the mask frame 20 is pushed by the pusher 34 so as to be in close contact with the support roller 33. Can be set to the correct position.

이와같이 구성된 클램프스테이지(30)는, 클램프스테이지(30)의 상부에 지지프레임을 올려놓은 상태에서, 각 지지기구(32)에 구비된 승강조절기구(32b)의 조절레버(L)를 조절하므로써, 각 지지기구(32)의 지지대(32a)를 상하로 승강시켜 지지대(32a)에 의해 지지되는 마스크프레임(20)의 각부분의 변위를 조절하므로써, 마스크프레임(20)의 변형을 교정할 수 있다.The clamp stage 30 configured as described above is adjusted by adjusting the adjustment lever L of the lift adjusting mechanism 32b provided in each support mechanism 32 while the support frame is placed on the clamp stage 30. The deformation of the mask frame 20 can be corrected by adjusting the displacement of each part of the mask frame 20 supported by the support 32a by raising and lowering the support 32a of each support mechanism 32 up and down. .

따라서, 마스크프레임(20)의 변형 및 이에따른 마스크(10)의 변형에 의해, 마스크 검사의 오류가 발생되는 것을 방지할 수 있는 장점이 있다.Therefore, the deformation of the mask frame 20 and the subsequent deformation of the mask 10 may prevent an error in mask inspection from occurring.

또한, 상기 지지대(32a)의 상면은 중앙부가 상측으로 볼록한 만곡면으로 이 루어지므로, 지지대(32a)의 상면이 상기 마스크프레임(20)의 하부면에 직선형태로 접촉된다. 따라서, 지지대(32a)의 승강에 의해 마스크프레임(20)이 교정될 때, 도 7에 도시한 바와 같이, 마스크프레임(20)이 지지대(32a)의 다른 부분과 간섭되지 않고, 유연하게 변형될 수 있는 장점이 있다. In addition, since the upper surface of the support 32a is formed as a curved surface of which the central portion is convex upward, the upper surface of the support 32a is in direct contact with the lower surface of the mask frame 20. Therefore, when the mask frame 20 is corrected by the lifting and lowering of the support 32a, as shown in FIG. 7, the mask frame 20 does not interfere with other portions of the support 32a, and is flexibly deformed. There are advantages to it.

도 1은 일반적인 마스크 및 마스크프레임을 도시한 참고도,1 is a reference diagram showing a general mask and a mask frame,

도 2는 일반적인 마스크검사장치를 도시한 참고도,2 is a reference diagram showing a general mask inspection apparatus,

도 3은 종래의 클램프스테이지와 이송기구 및 카메라를 도시한 참고도,3 is a reference diagram showing a conventional clamp stage and the transfer mechanism and the camera,

도 4는 본 발명에 클램프스테이지를 도시한 사시도,Figure 4 is a perspective view of the clamp stage in the present invention,

도 5는 본 발명에 따른 클램프스테이지를 도시한 평면도,5 is a plan view showing a clamp stage according to the present invention,

도 6은 본 발명에 따른 클램프스테이지를 도시한 측면도, 6 is a side view showing a clamp stage according to the present invention;

도 7은 본 발명에 따른 클램프스테이지의 지지기구의 작용을 설명하기 위한 참고도이다.7 is a reference diagram for explaining the operation of the support mechanism of the clamp stage according to the present invention.

Claims (2)

마스크검사장치에 구비되며 상면에 마스크프레임(20)을 올려놓을 수 있도록 된 클램프스테이지에 있어서,In the clamp stage that is provided in the mask inspection apparatus and to put the mask frame 20 on the upper surface, 상기 클램프스테이지(30)의 상면에는 마스크프레임(20)의 하부면을 지지하는 지지대(32a)와, 상기 지지대(32a)를 승강시키는 승강조절기구(32b)를 포함하는 지지기구(32)가 다수개 구비된 것을 특징으로 하는 클램프스테이지.On the upper surface of the clamp stage 30, there are a plurality of support mechanisms 32 including a support 32a for supporting the lower surface of the mask frame 20, and a lift adjustment mechanism 32b for elevating the support 32a. Clamp stage, characterized in that provided with. 제 1항에 있어서, 상기 지지대(32a)의 상면은 중앙부가 상측으로 볼록한 만곡면으로 이루어진 것을 특징으로 하는 클램프스테이지.The clamp stage according to claim 1, wherein an upper surface of the support (32a) is formed of a curved surface of which a central portion is convex upward.
KR1020080102295A 2008-10-20 2008-10-20 clamp stage KR101000750B1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104368914A (en) * 2013-08-15 2015-02-25 昆山思拓机器有限公司 Clamping and position adjusting mechanism
KR20210094364A (en) 2020-01-21 2021-07-29 주식회사 힘스 Loading apparatus of open mask for oled

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100597035B1 (en) * 2001-03-01 2006-07-04 에이에스엠엘 네델란즈 비.브이. Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104368914A (en) * 2013-08-15 2015-02-25 昆山思拓机器有限公司 Clamping and position adjusting mechanism
KR20210094364A (en) 2020-01-21 2021-07-29 주식회사 힘스 Loading apparatus of open mask for oled

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