KR20100040114A - Plasma display panel filter - Google Patents

Abstract

PURPOSE: A plasma display panel filter is provided to improve optical transmittance since there is no need an additional oxide layer. CONSTITUTION: A plasma display panel filter comprises a transparent substrate(200), at least repetition films(202), and a second high refractive transparent thin film layer(204). The repetition film is arranged on the transparent substrate. The repetition film comprises a first high refractive transparent thin film layer, a first oxide layer, and a metal thin film layer. The second high refractive transparent thin film layer is arranged on the repetition film. The first high refractive transparent thin film layer is formed with the titanium dioxide(TiO2).

Description

Plasma Display Panel Filter {PLASMA DISPLAY PANEL FILTER}

The present invention relates to a PDP filter, and more particularly, to a PDP filter in which no additional oxide layer is formed to improve light transmittance.

Plasma Display Panels (PDPs) are widely used display devices, and because of their technical characteristics, they emit electromagnetic waves and near infrared rays, and thus, PDP filters are provided on the PDP panels to block them. Such a PDP filter generally has a structure as shown in FIG. 1 below.

1 is a cross-sectional view showing a general PDP filter.

Referring to FIG. 1, a PDP filter may include a transparent substrate 100, a first repeating film 102-1, a second repeating film 102-2, and a second high refractive index thin film layer Nb ₂ O ₅ , 104 sequentially formed. )

The first repeating film 102-1 is formed on the transparent substrate 100, and the first-refractive refractive thin film layers Nb ₂ O ₅ and 110-1 and the first-first oxide layer ITO 112-1 are formed on the transparent substrate 100. , 1-1 metal thin film layers (Ag, 114-1) and 2-1 oxide layers (ITO, 116-1).

The second repeating film 102-2 is formed on the 2-1 oxide layer 116-1, the 1-2 high refractive index thin film layers Nb ₂ O ₅ , 110-2, and the 1-2 oxide layer ( ITO, 112-2), 1-2 metal thin film layers (Ag, 114-2) and 2-2 oxide layers (ITO, 116-2).

Looking at the process of manufacturing a PDP filter having such a structure, the high refractive index transparent film layer (110-2 or 104) is formed by using a reactive film forming method in an oxygen atmosphere. However, a large amount of oxygen gas is used in this process. In this case, when the high refractive transparent thin film layer 110-2 or 104 is directly coated on the metal thin film layer 114-1 or 114-2, the electrical conductivity of the metal thin film layer 114-1 or 114-2 is the oxygen. Could be degraded by gas. Therefore, in the conventional PDP filter, the second oxide layer 116-1 or 116-2 is formed between the transparent thin film layer 110-2 or 104 and the metal thin film layer 114-1 or 114-2, and the oxygen The metal thin film layer 114-1 or 114-2 was protected from the gas. However, the thickness of the PDP filter is increased due to the second oxide layer 116-1 or 116-2. As a result, not only the light transmittance of the PDP filter is lowered, but also the manufacturing cost is increased and the manufacturing process time is increased. There was a downside.

Referring to the high refractive transparent thin film layers 110-1, 110-2, and 104, the high refractive transparent thin film layers 110-1, 110-2, and 104 are formed to have the same thickness. When experimentally measuring the reflection characteristics and the reflection color characteristics of the PDP filter having such a structure, the wavelength range of the low reflection region (reflectance of about 8% or less) was formed to be quite narrow, and the reflection color changed much according to the inclination of the PDP panel. . That is, the low reflection characteristics and the reflection color characteristics of the PDP filter are inferior.

One object of the present invention is to provide a PDP filter having a structure that does not form an additional oxide layer in order to improve light transmittance.

Another object of the present invention is to set the thickness of the middle high refractive index thin film layer among the high refractive index transparent thin film layer to be greater than the sum of the thickness of the lowermost high refractive index transparent thin film layer and the thickness of the uppermost high refractive index transparent thin film layer in order to improve the low reflection characteristics and the reflective color characteristics. It is to provide a PDP filter.

In order to achieve the above object, a PDP filter according to an embodiment of the present invention is a transparent substrate; At least one repeating layer arranged on the transparent substrate and having a first high refractive index transparent thin film layer, a first oxide layer and a metal thin film layer; And a second high refractive index transparent thin film layer arranged on the repeating film. Here, the first high refractive index transparent thin film layer is made of titanium dioxide (TiO ₂ ), the titanium dioxide (TiO ₂ ) is formed in an oxygen atmosphere using a TiO _X (x = 1.5 ~ 1.99) target.

In the PDP filter according to the embodiment of the present invention, since the high refractive index transparent thin film layer is formed in a small amount of oxygen using TiO _X (x = 1.5 to 1.99) target, a separate oxide layer is formed between the high refractive index transparent thin film layer and the metal layer. It does not have to be formed. Therefore, the thickness of the PDP filter can be thin, so that the light transmittance is improved, and the manufacturing cost and time of the PDP filter can be reduced.

In the PDP filter according to another embodiment of the present invention, since the thickness of the high refractive transparent thin film layer positioned in the middle of the high refractive transparent thin film layers is formed to be greater than the sum of the thickness of the lowermost high refractive transparent thin film layer and the uppermost high refractive transparent thin film layer, The low reflection and reflective color characteristics of the filter can be improved.

As the invention allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the written description. However, this is not intended to limit the present invention to specific embodiments, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. Like reference numerals are used for like elements in describing each drawing.

When a component is referred to as being "connected" or "connected" to another component, it may be directly connected to or connected to that other component, but it may be understood that other components may be present in between. Should be. On the other hand, when a component is said to be "directly connected" or "directly connected" to another component, it should be understood that there is no other component in between.

The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, the terms "comprise" or "have" are intended to indicate that there is a feature, number, step, operation, component, part, or combination thereof described in the specification, and one or more other features. It is to be understood that the present invention does not exclude the possibility of the presence or the addition of numbers, steps, operations, components, components, or a combination thereof.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2 is a cross-sectional view showing a PDP filter according to an embodiment of the present invention.

Referring to FIG. 2, the PDP filter according to the present embodiment is an element that blocks electromagnetic waves and near infrared rays generated from a PDP panel, and includes a transparent substrate 200, at least one repeating film 202, and a second high refractive index transparent array. The thin film layer 204 is included.

The transparent substrate 200 is made of a material having excellent transmittance to visible light, for example, a plastic film layer such as polyethylene terephthalate (PET), a plastic sheet made of acrylic resin, or the like used for display Semi-tempered glass; The transparent substrate 200 has a visible light transmittance of 80% or more, and preferably has heat resistance.

The repeating film 202 is a film that substantially blocks electromagnetic waves, near infrared rays, and the like, and is arranged on the transparent substrate 200. However, a plurality of repeating layers 202, for example four repeating layers 202, may be sequentially arranged on the transparent substrate 200.

According to one embodiment of the present invention, one repeating film 202 includes a first high refractive index transparent thin film layer 210, an oxide layer 212 and a metal thin film layer 214.

The first high refractive index transparent thin film layer 210 is arranged on the transparent substrate 200 and is made of an oxide having high refractive index and excellent transmittance to visible light. Preferably, the first high refractive index transparent thin film layer 210 is made of titanium dioxide (TiO ₂ ), which exists a lot on the earth and is inexpensive and has excellent optical properties. Here, the first high refractive index transparent thin film layer 210 may have a thickness of about 10nm to about 35nm. Of course, the first high refractive transparent thin film layer 210 is not limited to a specific material as long as it has high refractive characteristics and high transparency, and may be made of SnO ₂ or the like material.

According to an embodiment of the present invention, the first high refractive index transparent thin film layer 210 made of TiO ₂ may be formed by coating in an oxygen atmosphere using an oxide target, that is, a TiO _X (x = 1.5 to 1.99) target. Can be. Detailed description thereof will be described later.

The oxide layer 212 serves to prevent visible light reflection of the metal thin film layer 214 by the difference in refractive index with the metal thin film layer 214, and has a high transparency to visible light. The oxide layer 212 may be made of a metal oxide such as indium, titanium, zirconium, aluminum, tin, zinc, or a mixture of these metal oxides.

According to an embodiment of the present invention, the oxide layer 212 may be made of AZO or ITO having a high film forming speed and excellent adhesion to the metal thin film layer 214. However, since the raw material of ITO has a high production cost of indium (In) and deteriorates when it is exposed to plasma, its properties change, so that AZO is used as the material of the oxide layer 212 with low cost and excellent durability against plasma. It is preferable.

Further, oxide layer 212 has a thickness of about 0.3 nm to about 0.7 nm.

The metal thin film layer 214 is connected to a cover (not shown) which serves as a ground and blocks electromagnetic waves generated from the PDP panel, and thus is made of silver or an alloy containing silver having excellent conductivity. The metal thin film layer 214 may have a thickness of about 1 nm to about 1.3 nm.

The second high refractive index transparent thin film layer 204 is formed on the metal thin film layer 214 and may be made of TiO ₂ . Here, the second high refractive index transparent thin film layer 204 made of TiO ₂ may be formed by coating in an oxygen atmosphere using an oxide target, that is, a TiO _X (x = 1.5 to 1.99) target. Here, the second high refractive transparent thin film layer 204 has a thickness of about 10 nm to about 35 nm.

In the process of manufacturing a conventional PDP filter, since a large amount of oxygen gas is used in the process of coating the high refractive transparent thin film layer (Nb ₂ O ₅ ), the electrical conductivity of the metal thin film layer (Ag) may be degraded due to the oxygen gas Before forming the high refractive transparent thin film layer (Nb ₂ O ₅ ), an oxide layer (ITO) was further formed on the metal thin film layer (Ag). That is, the oxide layer ITO serves to prevent degradation of the electrical conductivity of the metal thin film layer Ag.

However, in the process of manufacturing the PDP filter of the present invention, since a target that maintains an oxidation state but has a conductivity level, that is, electricity, that is, a TiO _X (x = 1.5 to 1.99) target, oxygen is added in a large amount. It is possible to form the second high refractive transparent thin film layer 204 without having to. Specifically, when the high refractive index transparent thin film layer of the conventional argon and oxygen gas was used about 200sccm, respectively, when forming the second high refractive index transparent thin film layer 204 of the present invention, the oxygen gas is about 200sccm 5 sccm (about 2.5% of argon) may be used. That is, only a small amount of oxygen gas is used to form the second high refractive transparent thin film layer 204. As a result, the electrical conductivity of the metal thin film layer Ag is hardly deteriorated in the process of forming the second high refractive transparent thin film layer 204, and thus, unlike the prior art, the metal thin film layer 214 and the second high refractive transparent thin film layer 204 There is no need for a separate oxide layer in between.

In short, the PDP filter of the present invention forms a high refractive index transparent thin film layer 204 using a TiO _X (x = 1.5 to 1.99) target. As a result, a separate oxide layer does not need to be formed between the metal thin film layer 214 and the second high refractive index transparent thin film layer 204. Therefore, the thickness of the PDP filter of the present invention can be formed thinner than the conventional PDP filter, and as a result, the light transmittance of the PDP filter can be improved. In addition, since no additional oxide layer is required, not only the target cost, that is, the manufacturing cost, but also the deposition process can be simplified.

In FIG. 2, only one repeating film 202 is illustrated, but a plurality of repeating films 202 may be sequentially arranged on the transparent substrate 200. Even in this case, since the TiO _X (x = 1.5 to 1.99) target is used to form the high refractive transparent thin film layer, a separate oxide layer is not formed between the high refractive transparent thin film layer and the lower metal thin film layer in the repeating film 202. Can be. In addition, some of the high refractive index transparent thin film layers of the repeating layers 202 may have a thickness different from that of the other high refractive index transparent thin film layer or the second high refractive index transparent thin film layer 204. Detailed description thereof will be described later with reference to the accompanying drawings.

3 is a cross-sectional view illustrating a PDP filter including four metal thin film layers according to an embodiment of the present invention, and FIG. 4 is a diagram illustrating a light transmittance graph of the PDP filter of FIG. 3.

Referring to FIG. 3, the PDP filter of the present embodiment may include a transparent substrate 300, a first repeating film 302-1, a second repeating film 302-2, and a third repeating film 302-3 sequentially stacked. ), A fourth repeating film 302-4, and a second high refractive index transparent thin film layer 304.

The first repeating film 302-1 is a 1-1 high refractive index transparent film layer 310-1, a 1-1 oxide layer 312-1, and a 1-1 metal sequentially stacked on the transparent substrate 300. The thin film layer 314-1 is formed.

The second repeating film 302-2 is the first 1-2 high refractive transparent film layer 310-2 and the 1-2 oxide layer 312-2 sequentially stacked on the 1-1 metal thin film layer 314-1. And the first 1-2 metal thin film layer 314-2.

The third repeating film 302-3 is a first high refractive index thin film layer 310-3 and a third oxide layer 312-3 that are sequentially stacked on the first metal thin film layer 314-2. And the first metal thin film layer 314-3.

The fourth repeating film 302-4 is the first to fourth high refractive index transparent film layers 310-4 and the first-4 oxide layer 312-4 stacked on the first to third metal thin film layers 314-3. And a first-4 metal thin film layer 314-4.

In the PDP filter having such a structure, the 1-1 high refractive index transparent thin film layer 310-1 has a thickness of 25 nm, the 1-1 oxide layer 312-1 has a thickness of 0.5 nm, and the 1-1 The metal thin film layer 314-1 is set to have a thickness of 1 nm. In addition, the 1-2 high refractive index thin film layer 310-2 has a thickness of 55nm, the 1-2 oxide layer 312-2 has a thickness of 0.5nm, the 1-2 metal thin film layer 314- 2) is set to have a thickness of 1 nm. Furthermore, the 1-3 high refractive index thin film layer 310-3 has a thickness of 55 nm, the 1-3 oxide layer 312-3 has a thickness of 0.5 nm, and the 1-3 metal thin film layer ( 314-3) is set to have a thickness of 1 nm. Furthermore, the 1-4th high refractive index transparent thin film layer 310-4 has a thickness of 55 nm, the 1-4 oxide layer 312-4 has a thickness of 0.5 nm, and the 1-4 metal thin film layer ( 314-4) has a thickness of 1 nm, and the second high refractive index transparent thin film layer 304 is set to have a thickness of 25 nm.

As a result of measuring the light transmittance after setting to such a thickness, as shown in FIG. Compared with the prior art, about 80% light transmittance is obtained at 550 nm wavelength in the conventional PDP filter, while about 85% light transmittance is obtained at the 550 nm wavelength in the PDP filter of this embodiment. That is, the light transmittance of the PDP filter of the present embodiment can be higher than the light transmittance of the conventional PDP filter.

Looking back at the PDP filter structure, the thickness of the 1-2 high refractive index transparent thin film layer 310-2, 1-3 high refractive index transparent thin film layer 310-3 or 1-4 high refractive index transparent thin film layer 310-4 ( 55 nm) is confirmed to be larger than the thickness (25 nm) of the 1-1 high refractive index transparent thin film layer 301-1 and the thickness (nm) of the 2nd high refractive index transparent thin film layer 304. FIG. When the thickness is set in this way, the wavelength range of the low reflection region (reflectance of about 8% or less) is wider, and the change in the reflection color hardly occurs regardless of the inclination of the PDP panel. That is, the low reflection characteristic and the reflection color characteristic of the PDP filter can be improved.

Although not shown in FIGS. 2 and 3 above, a color correction film, a near-infrared shielding film, and an anti-reflection film may be further formed under the transparent substrate 200 or 300.

5 is a cross-sectional view illustrating a PDP filter according to another embodiment of the present invention.

Referring to FIG. 5, the PDP filter of the present embodiment may include a transparent substrate 500, a first repeating film 502-1, a second repeating film 502-2, and a second high refractive index transparent film layer 504 sequentially stacked. It includes.

The first repeating film 502-1 includes the first-1 high refractive index transparent film layer 510-1, the first-1 oxide layer 512-1, the first-1 metal thin film layer 514-1, and the second-second film. 1 oxide layer 516-1.

The second repeating film 502-2 includes the 1-2 high refractive index thin film layer 510-2, the 1-2 oxide layer 512-2, the 1-2 metal thin film layer 514-2, and the 2-second film. 2 oxide layer 516-2.

That is, the second oxide layer 516-1 or 516-2 may be formed between the metal thin film layer 514-1 or 514-2 and the high refractive index transparent thin film layer 510-2 or 504. Here, since the TiO _X (x = 1.5 to 1.99) target is used to form the high refractive index thin film layer 510-1, 510-2, or 504, the second oxide layer 516-1 or 516-2 is formed as much as possible. It can be formed thin.

The embodiments of the present invention described above are disclosed for purposes of illustration, and those skilled in the art having ordinary knowledge of the present invention may make various modifications, changes, and additions within the spirit and scope of the present invention. Should be considered to be within the scope of the following claims.

1 is a cross-sectional view showing a general PDP filter.

2 is a cross-sectional view showing a PDP filter according to an embodiment of the present invention.

3 is a cross-sectional view illustrating a PDP filter including four metal thin layers according to an embodiment of the present invention.

4 is a diagram illustrating a light transmittance graph for the PDP filter of FIG. 3.

5 is a cross-sectional view illustrating a PDP filter according to another embodiment of the present invention.

Claims (5)

Transparent substrates; At least one repeating layer arranged on the transparent substrate and having a first high refractive index transparent thin film layer, a first oxide layer and a metal thin film layer; And Including a second high refractive index transparent thin film layer arranged on the repeating film, The first high refractive index thin film layer is made of titanium dioxide (TiO ₂ ), the titanium dioxide (TiO ₂ ) is formed in an oxygen atmosphere using a TiO _X (x = 1.5 ~ 1.99) target plasma display panel (PDP) filter. The PDP filter according to claim 1, wherein the first oxide layer is made of zinc oxide (AZO). The method of claim 1, wherein the repeating film, A 1-1 high refractive index transparent thin film layer, a 1-1 oxide layer and a 1-1 metal thin film layer sequentially arranged on the transparent substrate; And Including the 1-2 high refractive index thin film layer, the 1-2 oxide layer and the 1-2 metal thin film layer sequentially arranged on the 1-1 metal thin film layer, The thickness of the 1-2 high refractive index transparent thin film layer is a PDP filter, characterized in that greater than the sum of the thickness of the 1-1 high refractive index transparent thin film layer and the thickness of the second high refractive index transparent thin film layer. The PDP filter according to claim 1, wherein the second high refractive transparent thin film layer is made of a different material from the first high refractive transparent thin film layer. The PDP filter according to claim 1, wherein the repeating film further comprises a second oxide layer arranged on the metal thin film layer in addition to the first high refractive index transparent thin film layer, the first oxide layer, and the metal thin film layer.

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