KR20100031570A - 질화규소, 탄화규소 또는 옥시질화규소 막을 갖는 템플레이트 - Google Patents

질화규소, 탄화규소 또는 옥시질화규소 막을 갖는 템플레이트 Download PDF

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Publication number
KR20100031570A
KR20100031570A KR1020097024903A KR20097024903A KR20100031570A KR 20100031570 A KR20100031570 A KR 20100031570A KR 1020097024903 A KR1020097024903 A KR 1020097024903A KR 20097024903 A KR20097024903 A KR 20097024903A KR 20100031570 A KR20100031570 A KR 20100031570A
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KR
South Korea
Prior art keywords
thickness
template
layer
imprint lithography
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020097024903A
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English (en)
Korean (ko)
Inventor
다글라스 제이. 레스닉
마리오 조한네스 메이슬
코스타 에스. 셀리니디스
프랭크 와이. 쉬
Original Assignee
몰레큘러 임프린츠 인코퍼레이티드
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Application filed by 몰레큘러 임프린츠 인코퍼레이티드 filed Critical 몰레큘러 임프린츠 인코퍼레이티드
Publication of KR20100031570A publication Critical patent/KR20100031570A/ko
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020097024903A 2007-05-30 2008-05-30 질화규소, 탄화규소 또는 옥시질화규소 막을 갖는 템플레이트 Withdrawn KR20100031570A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US94073707P 2007-05-30 2007-05-30
US60/940,737 2007-05-30

Publications (1)

Publication Number Publication Date
KR20100031570A true KR20100031570A (ko) 2010-03-23

Family

ID=40094021

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097024903A Withdrawn KR20100031570A (ko) 2007-05-30 2008-05-30 질화규소, 탄화규소 또는 옥시질화규소 막을 갖는 템플레이트

Country Status (5)

Country Link
US (2) US20090004319A1 (https=)
JP (1) JP2010537395A (https=)
KR (1) KR20100031570A (https=)
TW (1) TW200907562A (https=)
WO (1) WO2008150499A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10456111B2 (en) * 2006-12-07 2019-10-29 Samsung Medison Co., Ltd. Ultrasound system and signal processing unit configured for time gain and lateral gain compensation
SG174889A1 (en) * 2009-03-23 2011-11-28 Intevac Inc A process for optimization of island to trench ratio in patterned media
CN101629663B (zh) * 2009-08-18 2011-01-05 河北亚大汽车塑料制品有限公司 一种直插式快插接头
WO2014145634A2 (en) * 2013-03-15 2014-09-18 Canon Nanotechnologies, Inc. Nano imprinting with reusable polymer template with metallic or oxide coating
US12405537B2 (en) * 2021-07-27 2025-09-02 Canon Kabushiki Kaisha Devices, systems, and methods for the transformation and cropping of drop patterns

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997006012A1 (en) * 1995-08-04 1997-02-20 International Business Machines Corporation Stamp for a lithographic process
US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US6274393B1 (en) * 1998-04-20 2001-08-14 International Business Machines Corporation Method for measuring submicron images
US6207570B1 (en) * 1999-08-20 2001-03-27 Lucent Technologies, Inc. Method of manufacturing integrated circuit devices
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
EP1303792B1 (en) * 2000-07-16 2012-10-03 Board Of Regents, The University Of Texas System High-resolution overlay alignement methods and systems for imprint lithography
US6284653B1 (en) * 2000-10-30 2001-09-04 Vanguard International Semiconductor Corp. Method of selectively forming a barrier layer from a directionally deposited metal layer
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
JP2003281791A (ja) * 2002-03-22 2003-10-03 Toshiba Corp 片面２層光ディスク及びその製造方法及び装置
US7083880B2 (en) * 2002-08-15 2006-08-01 Freescale Semiconductor, Inc. Lithographic template and method of formation and use
US7083860B2 (en) * 2002-08-16 2006-08-01 Emitec Gesellschaft Fuer Emissionstechnologie Mbh Metallic honeycomb body having at least partially perforated sheet-metal layers
US6936194B2 (en) * 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US6755984B2 (en) * 2002-10-24 2004-06-29 Hewlett-Packard Development Company, L.P. Micro-casted silicon carbide nano-imprinting stamp
US20050084804A1 (en) * 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US20050098534A1 (en) * 2003-11-12 2005-05-12 Molecular Imprints, Inc. Formation of conductive templates employing indium tin oxide
TWI277815B (en) * 2004-01-16 2007-04-01 Hannstar Display Corp Liquid crystal display and manufacturing method of liquid crystal display including substrate
US7140861B2 (en) * 2004-04-27 2006-11-28 Molecular Imprints, Inc. Compliant hard template for UV imprinting
US7768624B2 (en) * 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20060067650A1 (en) * 2004-09-27 2006-03-30 Clarence Chui Method of making a reflective display device using thin film transistor production techniques
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
JP2007058172A (ja) * 2005-07-28 2007-03-08 Mitsubishi Electric Corp 遮光膜付き基板、カラーフィルタ基板及びこれらの製造方法、並びに遮光膜付き基板を備えた表示装置。
US8850980B2 (en) * 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography

Also Published As

Publication number Publication date
US20090004319A1 (en) 2009-01-01
WO2008150499A1 (en) 2008-12-11
TW200907562A (en) 2009-02-16
JP2010537395A (ja) 2010-12-02
US20100040718A1 (en) 2010-02-18
US7874831B2 (en) 2011-01-25

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