KR20100030288A - Apparatus for separating a gas-liquid and apparatus for processing a substrate including the same - Google Patents

Abstract

PURPOSE: An apparatus for separating a gas-liquid and an apparatus for processing a substrate including the same are provided to protect a vacuum pump from damaging due to a process solution by arranging the apparatus for separating gas-liquid between a process chamber and the vacuum pump. CONSTITUTION: An inlet(111) through which a gas-liquid(GL) is injected is formed on the upper side of a separation box(110). A filter unit(120) is arranged in the lower part of the inlet and filters liquid(L) from the GL. An exhaust pipe(130) is formed on the lateral side of the outlet(136) to exhaust gas(G) from the GL. A drain pipe(140) is connected to the lower side of the separation box and drains the liquid which is filtered by the filter unit.

Description

Gas-liquid separation apparatus and substrate processing apparatus including the same {APPARATUS FOR SEPARATING A GAS-LIQUID AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME}

The present invention relates to a gas-liquid separation apparatus and a substrate processing apparatus including the same, and more particularly, to separate the processing liquid and the gas from the gas liquid when the gas liquid mixed with the processing liquid and gas for processing the substrate is discharged. And a processing apparatus for processing the substrate including the separation apparatus.

In general, the flat panel display includes a liquid crystal display (LCD) using liquid crystal, a plasma display (PDP) using plasma, an organic light emitting display (OLED) using an organic light emitting element, and the like.

Such a flat panel display includes a display panel for substantially displaying an image. The display panel is manufactured based on a glass substrate.

In detail, the display panel is manufactured by performing a deposition process, an etching process, a photolithography process, a cleaning process, an inspection process, and the like on the substrate.

Among the above processes, the etching process and the cleaning process are performed by disposing the substrate in the process chamber, and then spraying the processing liquid for the etching process or the cleaning process onto the substrate through the processing liquid spraying unit in the process chamber. .

In this case, a gas injector for injecting gas into the substrate is disposed above the treatment liquid injector to guide the treatment liquid to the substrate. In this case, a gaseous liquid in the form of a spray in which the treatment liquid and the gas are mixed is present in the process chamber.

Accordingly, the gas liquid in the form of spray can float in the process chamber and contaminate the other substrate, so that an inlet pipe through which a vacuum pressure is transmitted from an external vacuum pump is connected to the process chamber so that the gas liquid is transferred through the vacuum pressure. Inhale outside.

However, when the gas liquid is introduced into the vacuum pump as it is, the vacuum pump may be damaged due to the treatment liquid in the gas liquid.

Accordingly, the present invention has been made in view of the above reasons, and in view of such problems, an object of the present invention is to provide a gas-liquid separation device which can easily separate the processing liquid and gas from the gas-liquid.

In order to achieve the above object of the present invention, a gas-liquid separation device according to one feature includes a separation box, a filter portion, an exhaust pipe and a drain pipe. The separation box has an inlet through which gas and liquid are introduced. The filter unit is disposed below the inlet in the separation box, and filters the liquid component from the introduced gas liquid. The exhaust pipe is connected to the lower part of the separation box while the closed upper part faces the filter part, and at least one exhaust port is formed on the side to exhaust the gas component of the gas liquid passing through the filter part. The drain pipe is connected to a lower portion of the separation box adjacent to the exhaust pipe and drains the liquid component of the gas liquid filtered by the filter part.

Here, the exhaust port may be located higher than the bottom surface of the separation box.

The filter unit may be disposed in a partition structure inside the separation box and have a first porous plate having first holes formed therein and a partition structure below the first porous plate in the separation box and have a smaller diameter than the first holes. And a second porous plate having second holes formed therein.

Thus, the first holes and the second holes may be formed such that the total area has a ratio of 1: 1.1 to 1.5 and 1: 1 to 1.2 with respect to the area of the inlet.

In addition, the first holes may have a diameter of 1: 0.1 to 0.3 with respect to the diameter of the inlet, and the second holes may have a diameter of 1: 0.7 to 0.9 with respect to the diameter of the first holes.

In addition, the filter unit may further include at least one filter sheet made of fiber yarn between the first and second porous plates.

Meanwhile, the separation box may have an opening formed at a first side thereof to allow insertion and separation of the first and second porous plates and the filter sheet.

Thus, the gas-liquid separating apparatus may further include a cover portion covering the opening and a sealing portion sealing between the cover portion and the separation box.

In addition, the separation box is formed in the opening direction of each of the first and second perforated plates in the opening direction of the first and second guide grooves for guiding the insertion of each of the first and second perforated plates. You can have

Here, the widths of each of the first and second guide grooves may be 1 to 3 mm wider than the thicknesses of each of the first and second porous plates to which the insertion is made.

On the other hand, the separation box has a stepped portion formed on the bottom surface of the lower than the surrounding, the drain pipe may be connected to the stepped portion.

On the contrary, the separation box may have a bottom surface inclined toward the second side and the drain pipe may be connected to a portion where the bottom surface meets the second side portion of the bottom surface.

In addition, the exhaust pipe may include exhaust ports in the circumferential direction, and a plurality of intervals between the exhaust ports may be formed to be 1: 0.07 to 0.1 relative to the circumference of the exhaust pipe.

In order to achieve the above object of the present invention, a substrate processing apparatus according to one feature includes a process chamber, a processing liquid spraying unit, a gas spraying unit, and a gas-liquid separating unit. The process chamber provides space for processing a substrate. The processing liquid spraying unit is disposed above the substrate in the process chamber, and sprays the processing liquid supplied from the outside onto the substrate. The gas injector is disposed above the treatment liquid injector, and injects gas into the process chamber as a whole. The gas-liquid separator is disposed adjacent to the process chamber, and is connected through an inlet pipe and an upper portion of the process chamber, and the gas-liquid mixed with the processing liquid and the gas is introduced from the inside of the process chamber. The processing liquid and the gas are separated.

In this case, the gas-liquid separator is connected to the inlet pipe to the upper portion of the separation box into which the gas liquid is introduced, the filter unit disposed in the lower portion of the inlet pipe in the separation box and filtering the processing liquid from the introduced gas liquid, A closed upper part is connected to the lower part of the separation box facing the filter part, and an exhaust pipe is formed on the side and at least one exhaust port for exhausting the gas passing through the filter part of the gas liquid and a lower part of the separation box adjacent to the exhaust pipe. And a first drain pipe connected to the drain to drain the treatment liquid filtered by the filter unit.

On the other hand, the substrate processing apparatus may further include a vacuum pump connected to the opposite side of the separation box of the exhaust pipe to provide a vacuum pressure to the inlet pipe through the separation box.

In addition, the substrate processing apparatus further includes a second drain pipe connected to the lower portion of the process chamber to process the substrate to drain the processing liquid guided to the lower portion of the process chamber. In this case, the first drain pipe may be connected to the second drain pipe to drain the filtered treatment liquid to the second drain pipe.

According to such a gas-liquid separation apparatus and a substrate processing apparatus including the same, the gas-liquid separation apparatus capable of separating the processing liquid which is a liquid component from the gas-liquid is disposed between the process chamber and the vacuum pump, thereby causing the The vacuum pump can be prevented from being damaged.

Further, the processing liquid is separated from the gas liquid while maintaining the flow of the gas liquid downward through the first and second porous plates of the filter part of the gas-liquid separator and the filter sheet, and then the side surface of the exhaust pipe. It is possible to prevent the size of the separation box from increasing by exhausting the gas which is a gas component of the gas-liquid through the exhaust port provided in the. That is, by minimizing the installation space of the gas-liquid separation device, it is possible to facilitate the installation of other devices around.

In addition, the filter sheet can be simplified by simply inserting and separating the filter sheet of the filter unit, which is required to be replaced when used for a long time in the gas-liquid separator, through the opening of the separation box. That is, maintenance work of the said filter sheet can be made easy.

Hereinafter, a gas-liquid separation apparatus and a substrate processing apparatus including the same according to embodiments of the present invention will be described in detail with reference to the accompanying drawings. As the inventive concept allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. In describing the drawings, similar reference numerals are used for similar elements. In the accompanying drawings, the dimensions of the structures are shown in an enlarged scale than actual for clarity of the invention.

The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, the terms "comprise" or "have" are intended to indicate that there is a feature, number, step, action, component, part, or combination thereof described on the specification, and one or more other features. It is to be understood that the present invention does not exclude the possibility of the presence or the addition of numbers, steps, operations, components, parts, or combinations thereof.

On the other hand, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

FIG. 1 is a view schematically illustrating a partially disassembled gas-liquid separation device according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view of the gas-liquid separation device shown in FIG.

1 and 2, the gas-liquid separation apparatus 100 according to an embodiment of the present invention includes a separation box 110, a filter unit 120, an exhaust pipe 130, and a drain pipe 140.

The separation box 110 has an inlet 111 through which the gas liquid GL mixed with the liquid component L and the gas component G is introduced. An inlet pipe 150 through which the gas liquid GL is substantially introduced from the outside is connected to the inlet 111. The inlet pipe 150 is provided with a vacuum pressure through the separation box 110 from the outside.

The filter unit 120 is disposed below the inlet 111 in the separation box 110. The gas liquid (GL) is introduced into the filter unit 120 as it flows in from the inlet (111) to filter the liquid component (L) of the gas liquid (GL).

Specifically, while the gas liquid (GL) passes through the filter unit 120, the gas component (G) is passed through the filter unit 120 as it is to float in the lower portion adjacent to the filter unit 120, The liquid component L is filtered off and falls to the bottom bottom 115 of the separation box 110. This is because the liquid component (L) has a relatively very high density compared to the gas component (G).

The filter unit 120 includes a first porous plate 122 and a second porous plate 124. The first porous plate 122 is disposed in a partition structure inside the separation box 110. In addition, the second porous plate 124 is disposed in a partition structure at a lower portion of the first porous plate 122 in the separation box 110. That is, the gas liquid GL introduced from the inlet 111 passes through the first and second porous plates 122 and 124 unconditionally.

First holes 123 and second holes 125 are formed in each of the first and second porous plates 122 and 124 to filter the gas-liquid GL introduced from the inlet 111. . Accordingly, the gas-liquid GL is relatively dense while hitting a portion where the first holes 123 and the second holes 125 are not formed among the first and second porous plates 122 and 124. The high liquid component L is collected in each of the first and second porous plates 122 and 124 to allow the separation box 110 to pass through the first holes 123 and the second holes 125. It will fall to the bottom bottom surface 115.

Hereinafter, the filter unit 120 will be described in more detail with reference to FIG. 3.

3 is a view showing a filter unit of the gas-liquid separation device shown in FIG.

Referring to FIG. 3 further, when the total area of the first holes 123 is less than about 1: 1.1 in comparison to the area of the inlet 111, the vacuum pressure drops sharply to the inlet pipe 150. It is not preferable because the gas-liquid GL does not flow smoothly from the liquid crystal, and when it exceeds about 1: 1.5, it is not preferable because the collection of the liquid component L from the gas-liquid GL is not performed smoothly. .

Therefore, the first holes 123 may be formed such that the total area has a ratio of about 1: 1.1 to 1.5 with respect to the area of the inlet 111. In addition, the first holes 123 may be formed such that the total area has a ratio of about 1: 1.1 to 1.3 compared to the area of the inlet 111.

In addition, when the diameter D1 is less than about 1: 0.1 relative to the diameter of the inlet 111, the first holes 123 block the flow of the gas-liquid GL to exceed the expectation to prevent the vacuum pressure. It is not preferable because it drops sharply, and when it exceeds about 1: 0.3, it is not preferable because the collection of the liquid component (L) is not smooth.

Accordingly, the diameters D1 of the first holes 123 may have a ratio of about 1: 0.1 to 0.3 relative to the diameter of the inlet 111. For example, when the diameter of the inlet 111 is about 200 mm, the diameter D2 of the first holes 123 may be about 30 mm.

In this regard, the second holes 125 have a diameter D2 that is relatively smaller than the first holes 123. This prevents the gas-liquid GL passing through the first holes 123 from passing through the second holes 125 as it is so that the liquid component L is collected in the second porous plate 124. To do that.

Specifically, the diameter D2 of the second holes 125 may have a ratio of about 1: 0.7 to 09 compared to the diameter D1 of the first holes 123. For example, the diameter D2 of the second holes 125 may be about 25 mm when the diameter D1 of the first holes 123 is about 30 mm.

On the contrary, the first holes 123 and the second holes 125 are staggered from each other so that the gas-liquid GL passing through the first holes 123 may have a diameter of the second holes 125. Regardless of D2), the liquid component L may be collected in the second porous plate 124.

In addition, since the second porous plate 124 has the same area as the first porous plate 122 and has a partition structure inside the separation box 110, the second hole 125 is formed. They are preferably formed so that the total area has a ratio of about 1: 1 to 1.2 narrower than the first holes 123 relative to the area of the inlet 111. In addition, it is more preferable that the second holes 125 have a total area substantially equal to that of the inlet 111.

Meanwhile, the filter unit 120 further includes at least one filter sheet 126 made of fiber yarn between the first and second porous plates 122 and 124. The filter sheet 126 generally has a structure similar to a nonwoven fabric, and a plurality of fine pores are formed therein due to staggering of the fiber yarns. Here, the filter sheet 126 may be made of, for example, polypropylene (PP).

Since the filter sheet 126 generally does not have the effect of one sheet, several sheets are used. For example, the filter sheet 126 may be used by stacking about 8 to 12 sheets. The filter sheets 126 have a predetermined elasticity due to the properties of the materials. That is, the filter sheets 126 are disposed in a pressed state between the first and second porous plates 122 and 124.

Accordingly, the filter sheets 126 collect the relatively dense liquid component L from the gas-liquid GL through fine pores and drop them to the bottom surface 115 of the lower portion of the separation box 110. The liquid component (L) is held as it is so as not to pass through.

The filter sheets 126 as described above need to be replaced because the liquid component L becomes saturated in fine pores when used for a long time, and thus does not function properly.

Accordingly, the separation box 110 has an opening 112 at the first side 117 to allow the filter sheet 126 to be inserted and removed like the first and second porous plates 122 and 124. Is formed.

Hereinafter, the replacement method of the filter sheets 126 will be described in more detail with reference to FIGS. 4 and 5.

4 is a view illustrating a state in which the filter unit illustrated in FIG. 3 is inserted into the separation box, and FIG. 5 is a view of the filter unit illustrated in FIG. 4 inserted into the separation box, as viewed from the opening direction.

4 and 5, the separation box 110 is formed in the insertion direction of each of the first and second porous plates 122 and 124 inside the opening 112 so as to be elongated. And first and second guide grooves 113 and 114 for guiding insertion of the second porous plates 122 and 124, respectively.

Accordingly, when the filter sheets 126 are to be replaced, the first and second porous plates 122 and 124 pressing the filter sheet 126 may be formed together with the filter sheets 126. It is separated to the outside through the opening 112 along the first and second guide grooves (113, 114).

Subsequently, the new filter sheet 126 is replaced between the first and second porous plates 122 and 124, and then again along the first and second guide grooves 113 and 114. By inserting into the interior of 110, the replacement work is completed.

In this case, the widths of each of the first and second guide grooves 113 and 114 are formed to be about 1 to 3 mm wider than the thicknesses of the first and second porous plates 122 and 124, respectively. do.

This causes the first and second porous plates 122 and 124 to flow in the vertical direction in the first and second guide grooves 113 and 114 so as to press the filter sheets 126 more strongly and replace them. In order to prevent falling out between the first and second porous plates 122 and 124 while the operation is in progress.

As such, when the filter sheets 126 are to be replaced, the first and second porous plates 122 and 124 pressing the filter sheets 126 are separated along the first and second guide grooves 113 and 114. By separating from the inside of the box 110 or inserting it into the interior, the replacement work can be simplified. That is, the maintenance work of the filter sheets 126 may be facilitated.

In this case, the gas-liquid separation device 100 passes the first and second porous plates 122 and 124 together with the filter sheets 126 to the inside of the separation box 110 through the opening 112. After inserting, the cover part 160 for covering the opening 112 and the separation box 110 and the cover part 160 are disposed to seal the inside of the separation box 110 from the outside. It may further include a sealing unit 170 for.

Here, the cover part 160 may have a plate structure having a size corresponding to the opening 112, and may be bolted to the separation box 110 with the sealing part 170 therebetween.

In addition, the sealing unit 170 may be formed of, for example, a rubber ring having an excellent sealing effect for the price. In contrast, the sealing unit 170 may be formed of a ring made of silicon or viton having excellent oxidation resistance if the liquid component L of the gas liquid GL includes a strong acid material.

The exhaust pipe 130 is connected to the lower portion of the separation box 110 while the closed upper part 132 faces the second porous plate 124 of the filter part 120. Here, the closed upper portion 132 may be blocked through a separate blocking member 134. Unlike this, when the exhaust pipe 130 is manufactured, the closed upper part 132 may be blocked.

The exhaust pipe 130 has at least one exhaust port 136 formed on a side surface of the separation box 110. The gas component G of the gas liquid GL, which flows through the filter part 120 and floats under the filter part 120, flows into the exhaust port 136 and is exhausted to the exhaust pipe 130.

In this case, the exhaust port 136 is located higher than the bottom surface 115 of the lower portion of the separation box 110. This is to prevent the liquid component L, which is filtered by the filter unit 120 and dropped to the bottom surface 115, from flowing into the exhaust port 136.

Hereinafter, the exhaust port will be described in more detail with reference to FIG. 6.

6 is a view showing in detail the exhaust pipe of the gas-liquid separation apparatus shown in FIG.

Further referring to FIG. 6, the exhaust pipe 130 includes a plurality of the exhaust ports 136 along the circumferential direction. The exhaust ports 136 are arranged at the side of the exhaust pipe 130 at regular intervals g.

At this time, when the interval g between the exhaust ports 136 is less than about 1: 0.07 compared to the circumference of the exhaust pipe 130, the exhaust pipe 130 remaining between the exhaust ports 136 is too thin. It is not preferable because the exhaust pipe 130 may be damaged when the gas component G is formed, and the exhaust pipe 130 may be damaged. .

Therefore, the interval g between the exhaust ports 136 preferably has a ratio of about 1: 0.7 to 0.1 relative to the entire circumference of the exhaust pipe 130.

For example, since the distance g between the circumference of the exhaust pipe 130 and the exhaust ports 136 may be calculated by substantially the same radius, the angle between the exhaust ports 136 is a cylindrical exhaust pipe ( 130 degrees against the 360 degrees of the 130).

The drain pipe 140 is connected to the lower portion of the separation box 110 adjacent to the exhaust pipe 130. The drain pipe 140 is filtered by the filter unit 120 to drain the liquid component L dropped on the bottom surface 115 under the separation box 110 to the outside.

In this case, the drain pipe 140 may have a relatively smaller diameter than the exhaust pipe 130 because the liquid component L is relatively low in density and separated from the gas component G.

Hereinafter, the connected structure of the drain pipe 140 will be described in more detail with reference to FIGS. 7 and 8.

7 is a view showing a structure in which the drain pipe shown in FIG. 2 is connected to a separation box according to an embodiment, and FIG. 8 is a view showing a structure in which the drain pipe shown in FIG. 2 is connected to a separation box according to another embodiment.

In the present embodiments, components having the same name will be described using the same reference numerals in order to easily understand the comparison of the respective embodiments.

Referring to FIG. 7, the separation box 110 includes a stepped portion 116 formed on the bottom surface 115 of the lower portion than the surroundings.

The drain pipe 140 is connected to the step portion 116. Accordingly, the liquid component L filtered from the filter unit 120 and dropped to the bottom surface 115 is led to the stepped portion 116 formed lower than the surroundings, and drained to the outside through the drain pipe 140. do.

In another embodiment, referring to FIG. 8, the bottom surface 115 of the bottom of the separation box 110 is inclined toward the second side 118 opposite to the first side 117 of the separation box 110. Is formed.

In this case, the second side portion 118 is preferably a portion opposite to the first side portion 117 in which the opening 112 is formed. However, in some cases, the second side portion 118 is the same as the first side portion 117 or the first side portion. It may be another side connected to the side 117.

The drain pipe 140 is connected to a portion where the second side portion 118 of the bottom surface 115 meets. Accordingly, the liquid component L filtered from the filter unit 120 and dropped to the bottom surface 115 is led to the second side portion 118 due to the inclined structure of the bottom surface 115. Drained to the outside through the drain pipe 140.

At this time, the inclined angle (a) of the bottom surface 115 is, for example, smoothly the liquid component (L) to the second side portion 118 in the range that maintains the size of the separation box 110 as it is. May have about 3 to 5 degrees.

Therefore, the flow of the gas-liquid GL is substantially maintained in the downward direction through the vertical arrangement of the first and second porous plates 122 and 124 and the filter sheet 126 of the filter unit 120. The liquid component (L) is separated from the gas liquid (GL), and then the gas component (G) of the gas liquid (GL) is exhausted through the exhaust ports (136) formed at the side of the exhaust pipe (130), thereby separating the separation. The size of the box 110 may be prevented from increasing.

That is, by minimizing the installation space of the gas-liquid separation device 100, it is possible to facilitate the installation of other devices around.

9 is a configuration diagram schematically illustrating a substrate processing apparatus according to an embodiment of the present invention.

In the present embodiment, the gas-liquid separator has the same configuration as the gas-liquid separator shown in FIGS. 1 to 8, and uses the same reference numerals, and detailed description thereof will be omitted.

Referring to FIG. 9, the substrate processing apparatus 1000 according to an exemplary embodiment of the present invention may include a process chamber 200, a substrate transfer unit 300, a treatment liquid sprayer 400, a gas sprayer 500, and gas-liquid separation. The unit 100 is included.

The process chamber 200 provides a space for processing the substrate S loaded therein. The substrate S may be, for example, a thin film transistor (TFT) substrate or a color filter made of a glass material used to manufacture a liquid crystal display (LCD) for displaying an image using liquid crystals; CF) substrate. Alternatively, the substrate S may be a semiconductor substrate used to manufacture a semiconductor device.

The substrate transfer part 300 is disposed below the substrate S, which is carried in the process chamber 200, to transfer the substrate S. The substrate transfer unit 300 is coupled to the shaft 310 and the shaft 310 arranged in a direction perpendicular to the transfer direction of the substrate S at regular intervals to support the roller S ( 320).

The processing liquid injection unit 400 is disposed above the substrate S in the process chamber 200. The processing liquid spraying unit 400 receives the processing liquid L from the outside and sprays the processing liquid L on the substrate S to process the substrate S.

Here, when the treatment liquid L is to perform the etching process or the cleaning process for the substrate S, sulfuric acid (H 2 SO 4), hydrochloric acid (HCl), hydrofluoric acid (HF), hydrogen peroxide solution (H 2 O 2) ), Deionized water (H 2 O), and the like.

Meanwhile, the substrate transfer part 300 allows the processing liquid L sprayed on the substrate S to naturally flow in either direction so that the etching process or the cleaning process may be performed more efficiently. S) can be transferred in a slightly inclined state. Here, the inclined angle of the substrate S may be, for example, about 3 to 6 degrees.

The gas injection unit 500 is disposed above the processing liquid injection unit 400. The gas injector 500 injects the gas G as a whole inside the process chamber 200. Thus, the gas injector 500 may be directly installed on the ceiling 210 of the upper portion of the process chamber 200.

The gas injector 500 injects gas from the upper portion of the treatment liquid injector 400 to the lower direction, such that the treatment liquid L injected from the treatment liquid injector 400 is the substrate S. Can be directed toward).

As a result, the gaseous liquid GL in which the processing liquid L and the gas G are mixed is present in a floating state inside the process chamber 200. The gas liquid GL may contaminate the other substrate S transferred through the substrate transfer part 300.

The gas-liquid separator 100 is connected to the process chamber 200 and the inlet pipe 150 at a position adjacent to the process chamber 200 from the gas liquid GL introduced through the inlet pipe 150. The treatment liquid (L) and the gas (G) are separated.

The inflow pipe 150 is connected to the upper portion of the process chamber 200 because the gas liquid GL is suspended in the process chamber 200. In detail, the inlet pipe 150 may be connected to an upper portion of the ceiling 210 or the sidewall 230 of the process chamber 200. Here, the inflow pipe 150 is generally connected to the upper side of the side wall 230 to facilitate the installation of the substrate processing apparatus 1000.

The gas-liquid separator 100 is connected to the inlet pipe 150 at an upper portion of the separation box 110 into which the gas-liquid GL is introduced, and adjacent to the inlet pipe 150 in the separation box 110. The filter unit 120 disposed below and filtering the processing liquid L, which is a liquid component, from the gas liquid GL, and the closed upper portion 132 of the separation box 110 may face the filter unit 120. An exhaust pipe 130 connected to a lower part and exhausting the gas G, which is a gas component passing through the filter part 120, of the gas liquid GL and a lower part of the separation box 110 adjacent to the exhaust pipe 130. It is connected to the first filter pipe 120 to drain the treatment liquid (L) filtered by the filter 120 includes a.

Here, in the exhaust pipe 130, the closed upper part 132 is blocked by a separate blocking member 134, and at least one exhaust port 136 is formed at the side to exhaust the gas G.

Thus, the substrate processing apparatus 1000 uses a vacuum pump 600 connected to the opposite side of the separation box 110 of the exhaust pipe 130 to smoothly flow the gas liquid GL from the inlet pipe 150. It includes more.

That is, the vacuum pump 600 generates a vacuum pressure and provides the vacuum pipe 600 to the inlet pipe 150 through the exhaust pipe 130 and the separation box 110. In this case, the filter unit 120 disposed inside the separation box 110 may be configured as shown in FIGS. 1 to 8 so that the vacuum pressure does not fall below the reference.

As such, by disposing the gas-liquid separator 100 capable of separating the processing liquid L, which is a liquid component, from the gas-liquid GL, between the process chamber 200 and the vacuum pump 600, It is possible to prevent the vacuum pump 600 from being damaged due to the treatment liquid L in the gas liquid GL.

Meanwhile, the substrate processing apparatus 1000 further includes a second drain pipe 700 connected to the bottom bottom 220 of the process chamber 200. The second drain pipe 700 processes the substrate S to drain the processing liquid L guided to the lower portion of the process chamber 200 to the outside.

Thus, the first drain pipe 140 may be connected to the second drain pipe 700 to drain the treatment liquid L separated from the gas-liquid separator 100 to the second drain pipe 700. Thus, in the second drain pipe 700, all of the processing liquid L injected to process the substrate S in the process chamber 200 may be drained.

The treatment liquid L drained through the second drain pipe 700 may be collected in a separate recovery device (not shown) in some cases, and then supplied to the treatment liquid injection unit 400 to be recycled. It may be.

Therefore, by separating the processing liquid L from the gas liquid GL through the gas liquid separation unit 100, the processing liquid L can be utilized more efficiently.

Although the detailed description of the present invention has been described with reference to the preferred embodiments of the present invention, those skilled in the art or those skilled in the art will have the idea of the present invention described in the claims to be described later. It will be understood that various modifications and variations can be made in the present invention without departing from the scope of the present invention.

The present invention described above can be used in an apparatus capable of preventing breakage of the vacuum pump by filtering the processing liquid which is a liquid component from the gas liquid when the gas liquid is discharged from the process chamber using the vacuum pump.

1 is a schematic view showing a partial decomposition of the gas-liquid separation device according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view of the gas-liquid separator shown in FIG. 1 combined and cut in the vertical direction.

3 is a view showing a filter unit of the gas-liquid separation device shown in FIG.

4 is a view illustrating a state in which the filter unit illustrated in FIG. 3 is inserted into a separation box.

FIG. 5 is a view of the filter unit illustrated in FIG. 4 inserted into the separation box as viewed from the opening direction. FIG.

6 is a view showing in detail the exhaust pipe of the gas-liquid separation apparatus shown in FIG.

FIG. 7 is a view illustrating a structure in which a drain pipe shown in FIG. 2 is connected to a separation box according to an embodiment.

8 is a view showing a structure in which the drain pipe shown in FIG. 2 is connected to a separation box according to another embodiment.

9 is a configuration diagram schematically illustrating a substrate processing apparatus according to an embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

G: gas component, gas L: liquid component, treatment liquid

GL: Gas-liquid S: Substrate

100, gas-liquid separator 110: separation box

111: inlet 112: opening

113: first guide groove 114: second guide groove

120 filter unit 122 first porous plate

124: second porous plate 126: filter sheet

130: exhaust pipe 132: closed top

134: blocking member 136: exhaust port

140: drain pipe 150: inlet pipe

200: process chamber 300: substrate transfer unit

400: processing liquid injection unit 500: gas injection unit

600: vacuum pump 1000: substrate processing apparatus

Claims (15)

A separation box having an inlet through which gas liquid is introduced; A filter unit disposed below the inlet in the separation box and filtering a liquid component from the introduced gas liquid; An exhaust pipe having a closed upper portion connected to a lower portion of the separation box while facing the filter portion, and having at least one exhaust port formed at a side thereof to exhaust gaseous components of the gas liquid passing through the filter portion; And And a drain pipe connected to a lower portion of the separation box adjacent to the exhaust pipe and configured to drain the liquid component of the gas liquid filtered by the filter unit. The gas-liquid separation device according to claim 1, wherein the exhaust port is located higher than a bottom surface of the lower portion of the separation box. The method of claim 1, wherein the filter unit A first porous plate disposed in a partition structure inside the separation box and having first holes formed therein; And And a second porous plate disposed in a partition structure at a lower portion of the first porous plate in the separation box, and formed with second holes having a diameter smaller than the first holes. The gas-liquid separation device of claim 3, wherein the first holes and the second holes are each formed such that the total area has a ratio of 1: 1.1 to 1.5 and 1: 1 to 1.2 with respect to the area of the inlet. . The method of claim 3, wherein the first holes have a diameter of 1: 0.1 to 0.3 with respect to the diameter of the inlet, and the second holes have a diameter of 1: 0.7 to 0.9 with respect to the diameter of the first holes. Gas-liquid separation apparatus which has it. The gas-liquid separation device according to claim 3, wherein the filter unit further comprises at least one filter sheet made of fiber yarn between the first and second porous plates. The method of claim 6, wherein the separation box has an opening formed at one side to allow insertion and separation of the first and second porous plates and the filter sheet, A cover part covering the opening; And Gas-liquid separation device further comprises a sealing unit for sealing between the cover portion and the separation box. The method of claim 7, wherein the separation box is formed in the elongated in the direction of insertion of each of the first and second porous plates inside the opening to guide the insertion of each of the first and second porous plates; A gas-liquid separation device having second guide grooves. The gas-liquid separation device according to claim 8, wherein the widths of each of the first and second guide grooves are 1 to 3 mm wider than the thicknesses of each of the first and second porous plates to which the insertion is made. The gas-liquid separator according to claim 1, wherein the separation box has a stepped portion formed on the bottom surface of the lower portion than the surroundings, and the drain pipe is connected to the stepped portion. The gas-liquid separator according to claim 1, wherein the separation box is formed to be inclined toward one side of the bottom of the separation box, and the drain pipe is connected to a portion that meets the one side of the bottom. The gas-liquid separation device according to claim 1, wherein the exhaust pipe has a plurality of exhaust ports arranged in a circumferential direction, and a space between the exhaust ports has a ratio of 1: 0.07 to 0.1 with respect to the circumference of the exhaust pipe. A process chamber providing space for processing a substrate; A processing liquid spraying unit disposed above the substrate in the processing chamber and spraying the processing liquid supplied from the outside to the substrate; A gas injector disposed above the process liquid injector and injecting gas into the process chamber as a whole; And It is disposed adjacent to the process chamber, is connected through the inlet pipe and the upper portion of the process chamber flows the gas liquid mixed with the processing liquid and the gas from the inside of the process chamber, and the processing liquid and It includes a gas-liquid separator for separating the gas, The gas-liquid separator, A separation box in which the inlet pipe is connected to an upper portion of the gas solution; A filter unit disposed below the inflow pipe in the separation box and filtering the processing liquid from the introduced gas liquid; An exhaust pipe having a closed upper portion connected to a lower portion of the separation box facing the filter portion, and having at least one exhaust port formed at a side thereof to exhaust the gas passing through the filter portion of the gas liquid; And And a drain pipe connected to a lower portion of the separation box adjacent to the exhaust pipe and configured to drain the liquid component of the gas liquid filtered by the filter part. 14. The substrate processing apparatus of claim 13, further comprising a vacuum pump connected to the separation box of the exhaust pipe to provide a vacuum pressure to the inlet pipe through the separation box. 15. The method of claim 13, further comprising a second drain pipe connected to the lower portion of the process chamber for processing the substrate to drain the processing liquid guided to the lower portion of the process chamber, And the drain pipe is connected to the second drain pipe to drain the filtered treatment liquid to the second drain pipe.

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