CN101670215A - A segregator that separates liquid vapor mixture and a cardinal plate processing equipment containing the segregator - Google Patents
A segregator that separates liquid vapor mixture and a cardinal plate processing equipment containing the segregator Download PDFInfo
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- CN101670215A CN101670215A CN200910170848A CN200910170848A CN101670215A CN 101670215 A CN101670215 A CN 101670215A CN 200910170848 A CN200910170848 A CN 200910170848A CN 200910170848 A CN200910170848 A CN 200910170848A CN 101670215 A CN101670215 A CN 101670215A
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- separator box
- separator
- porous plate
- liquid
- discharge opeing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0042—Degasification of liquids modifying the liquid flow
- B01D19/0052—Degasification of liquids modifying the liquid flow in rotating vessels, vessels containing movable parts or in which centrifugal movement is caused
- B01D19/0057—Degasification of liquids modifying the liquid flow in rotating vessels, vessels containing movable parts or in which centrifugal movement is caused the centrifugal movement being caused by a vortex, e.g. using a cyclone, or by a tangential inlet
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
Abstract
The invention relates to a segregator that separates liquid vapor mixture and a cardinal plate processing equipment containing the segregator. A segregator that separates liquid from the liquid vapormixture comprises the following components: a separator box with an inlet on the top; a filter unit under the inlet of the separator box; an exhaust component on bottom of the separator box; and a liquor drainage component on bottom of the separator box, wherein the liquid vapor mixture is provided to the separator box through the inlet; the filter unit filters liquid from the liquid vapor mixture; the exhaust component forms such a structure that an closed end faces the filter unit, and at least one air outlet opening is set on lateral wall of the exhaust component; the vapor component in theliquid vapor mixture is discharged outside of the separator box through the air outlet opening; the liquid component of the liquid vapor mixture is discharged to outside of the separator box throughthe liquor drainage component; the liquid components is effectively separated from the liquid vapor mixture without adding device space.
Description
Technical field
Embodiment relates to and a kind of liquids and gases is divided into the separator of composition separately, and the substrate processing apparatus that comprises this separator.Especially, when embodiment relates to a kind of mixture of discharging Treatment Solution and gas jet after processing substrate, with liquid-gas mixture be divided into separately liquid component and the separator of gas componant, and the substrate processing apparatus that comprises this separator.
Background technology
Flat display devices comprises LCD (LCD) device, plasma display (PDP) device and organic light emitting diode display (OLED) device.
Above-mentioned flat-panel monitor (FPD) device comprises the display pannel of display image, and this panel mainly is that make on the basis with the glass substrate.
For example, this display pannel is handled and is made such as deposition processes, etch processes, photoetching treatment, cleaning treatment and inspection usually by various cell processing.
In above-mentioned cell processing, etch processes and cleaning treatment are to carry out in the process chamber of placing substrate.In this process chamber, the Treatment Solution of etch processes or cleaning treatment is sprayed onto on the substrate by the spray solution device.
In existing etch processes and cleaning treatment equipment, gas ejector is positioned over the top of spray solution device, and the driving gas that this Treatment Solution is driven on the substrate sprays towards substrate.Therefore, the spraying mixture of Treatment Solution and driving gas flows in process chamber.
The spraying mixture of Treatment Solution and driving gas can pollute the substrate in the process chamber, thereby spraying mixture need be discharged from process chamber.Vavuum pump is connected to process chamber by delivery pipe, and spraying mixture is discharged from process chamber by delivery pipe.
Yet when spraying mixture flow in the vavuum pump, vavuum pump can cause because of the Treatment Solution in the spraying mixture damaging.Therefore, need before spraying mixture flows to vavuum pump, the Treatment Solution in the spraying mixture be separated.
Summary of the invention
The embodiment of the present invention design provide the mixture with Treatment Solution and driving gas be separated into separately the Treatment Solution composition and the separator of driving gas composition.
The embodiment of the present invention's design provides the substrate processing apparatus that comprises above-mentioned separator.
Some embodiment of design according to the present invention, provide a kind of separator to comprise: separator box, has the import that is arranged on its top, in described separator box, be positioned at the filter element under the described import, be in the exhaust component of described separator box bottom, and the discharge opeing parts that are positioned at described separator box bottom.Described liquid vapour mixture is provided in the described separator box by described import, and described filter element filters described liquid component from described liquid vapour mixture.Described exhaust component forms such structure, and promptly its closed end is towards described filter element, and at least one exhaust outlet is arranged on the sidewall of described exhaust component.The gas componant of described liquid vapour mixture is discharged to outside the described separator box by described exhaust outlet.The liquid component of described liquid vapour mixture is discharged to outside the described separator box by described discharge opeing parts.
In one embodiment, described exhaust outlet position is higher than the surface of described separator box bottom.
In one embodiment, described filter element comprises first porous plate and second porous plate, pass described first porous plate and be provided with a plurality of first holes with first diameter, a plurality of second holes with second diameter littler than described first diameter are set on described second porous plate, described second porous plate is positioned under described first porous plate, form such structure, promptly the inner space of described separator box is divided into little subspace.
In one embodiment, the gross area in described first hole is about 1.1 to about 1.5 with the scope of the ratio of the sectional area of described import; And the gross area in described second hole is about 1.0 to about 1.2 with the scope of the ratio of the sectional area of described import.
In one embodiment, first diameter in described first hole is about 0.1 to about 0.3 times of diameter of described import; And second diameter in described second hole is about 0.7 to about 0.9 times of first diameter in described first hole.
In one embodiment, described filter element comprises that at least one is positioned over the filter between described first porous plate and second porous plate, and described filter has the fine fibre silk.
In one embodiment, described separator box also is included in the opening of its sidewall, seal the lid of described opening, and in order to sealing the seal member in gap between described parameatal, described lid and the described separator box, described first porous plate and second porous plate and be placed on filter between described first porous plate and second porous plate and be installed in the described separator box or from described separator box by described opening and take out.
In one embodiment, described separator box also comprises first guide channel and second guide channel that the madial wall from opening along described separator box extends, and described first porous plate and second porous plate are inserted in described first guide channel and second guide channel respectively and are guided in the described separator box.For example, the width of described first guide channel greater than the about 1mm of the thickness of described first porous plate to about 3mm; And the width of described second guide channel greater than the about 1mm of the thickness of described second porous plate to about 3mm.
In one embodiment, described separator box also is included in the concave part of its bottom, and described discharge opeing parts are connected in the concave part of described separator box.
In one embodiment, described separator box bottom tilts to periphery from its central portion, and described discharge opeing parts are connected in the described periphery of described separator box bottom.
In one embodiment, described exhaust component is cylindrical, and described a plurality of exhaust outlet is arranged on the periphery of the described cylindrical air exhaust parts around the described closed end and separates the identical distance distance, and described spacing distance is about 0.07 to about 0.1 times of circumferential length of described cylindrical air exhaust parts.
Some embodiment of design provides a kind of substrate processing apparatus according to the present invention.This equipment comprises: process chamber, and described substrate is processed therein; In described process chamber, be positioned at the liquid sprinkler on the described substrate; In described process chamber, be positioned at the gas sprinkler on the described liquid sprinkler; And the separator that is connected to described process chamber by supply pipe.Described liquid sprinkler is sprayed onto Treatment Solution on the described substrate, and described gas sprinkler will be handled in the entire inner space that gas is sprayed onto described process chamber.Described separator is separated Treatment Solution and processing gas the solution-admixture of gas that is fed to described separator by described supply pipe from described process chamber.For example, described separator comprises: separator box comprises the import that is arranged on its top and is connected with described supply pipe; Be positioned at the filter element under the described import in described separator box, described filter element filters described Treatment Solution composition from described solution-admixture of gas; Be positioned at the exhaust component of described separator box bottom, it forms such structure, the sealing first end that is described exhaust component is towards described filter element, and at least one exhaust outlet is arranged on the sidewall of described exhaust component, and the first discharge opeing parts that are positioned at described separator box bottom.The processing gas componant of described solution-admixture of gas is discharged to outside the described separator box by described exhaust outlet, and the solution composition of described solution-admixture of gas is discharged to outside the described separator box by described discharge opeing parts.
In one embodiment, described equipment also comprises vavuum pump, be connected in described vavuum pump with the first end the second end relative, that be in described separator box outside of described exhaust component, thereby produce vacuum pressure by described vavuum pump, and this vacuum pressure is applied to described supply pipe via described separator box.
In one embodiment, described equipment also comprises the second discharge opeing parts that are connected in described chamber bottom.The residual process solution of staying on the described chamber bottom is discharged to outside the described process chamber by the described second discharge opeing parts.
In one embodiment, the described first discharge opeing parts are connected with the described second discharge opeing parts, be filtered the solution composition that the unit filters out be discharged to outside the described equipment by the described second discharge opeing parts from described solution-admixture of gas thereby make.
Some embodiment of design according to the present invention, when the LG mixture was discharged from process chamber, the separated device of liquid component L in the LG mixture effectively filtered, thereby can prevent fully that vavuum pump is damaged because of the liquid component L of LG mixture.
In addition, second porous plate, a plurality of filter and first porous plate overlay in the separator box successively, thereby filter element is installed in the separator box.Then, mixture flows downward by filter element in the separator box, thereby the liquid component L of LG mixture is filtered by first porous plate, filter and second porous plate successively.Then, the gas componant G of LG mixture discharges separator box by the exhaust outlet of exhaust component.The liquid component L of LG mixture is dropped in the bottom of separator box, discharges separator box by exhaust component then.Therefore, can be under the situation that does not increase the separator box size, the LG mixture is separated into separately liquid component L and gas componant G.That is, can make the device space of separator box minimize, and be convenient to other device with separator be installed in separator box around.
And the filter element that comprises filter is easy to be installed in the separator box or from separator box and takes out, and will take out from filter element with the filter of crossing then.Then, new filter is attached in the filter element, and will comprise that the filter element of new filter is installed in the separator box once more.That is, be easy to separator box is implemented the replacing of filter, thereby be convenient to the maintenance of separator box.
Description of drawings
In conjunction with the accompanying drawings, can more clearly understand embodiments of the invention from the following detailed description.Fig. 1 to 10 has shown non-limiting example described herein.
Fig. 1 is an exploded perspective view, shown according to the embodiment of the invention, liquid vapour mixture is separated into the separator of composition separately;
Fig. 2 is for showing the cutaway view of Fig. 1 separator;
Fig. 3 is for showing the stereogram of a filter element part shown in Figure 2;
Fig. 4 just is being installed to the cutaway view in the separator box for showing filter element 120;
Fig. 5 is installed to the cutaway view in the separator box fully for showing filter element 120;
Fig. 6 is the cutaway view of the exhaust component of demonstration separator shown in Figure 2;
Fig. 7 shows the cutaway view of the discharge opeing parts of separator as shown in Figure 2;
Fig. 8 shows the cutaway view of the discharge opeing parts of separator as shown in Figure 2;
Fig. 9 is the structural representation that comprises the substrate processing apparatus of separator shown in Figure 1.
The specific embodiment
With reference to the accompanying drawing that embodiment is shown, embodiment will be described in more detail.Yet the present invention can realize with many different forms, and should not be construed as the restriction of the embodiment that is subjected in this proposition.On the contrary, it is abundant and complete open in order to reach proposing these embodiment, and makes those skilled in the art understand scope of the present invention fully.In these accompanying drawings, for clarity sake, may amplify the size and the relative size in layer and zone.
Should understand, when element or layer are called at another element or layer " on ", in another element or layer " connection " or " combination ", it can be directly on another element or layer, directly is connected or combination with other element or layer, perhaps existence occupy therebetween element or layer.In contrast, when element is called " directly on another element or layer ", in another element or layer " directly being connected " or " direct combination ", do not exist the element that occupy therebetween or layer.Middle in the whole text same numeral is meant components identical.As used herein, term " and/or " comprise any or all combination of the Listed Items that one or more is relevant.
Although should be understood that and use first, second, third, etc. to describe a plurality of elements, assembly, zone, layer and/or part herein, these elements, assembly, zone, layer and/or part are not the restriction that is subjected to these terms.These terms only are used to make an element, assembly, zone, layer or part and another zone, layer or part difference to come.Thus, hereinafter be referred to as first element, assembly, zone, layer or part and can be described as second element, assembly, zone, layer and/or part, and do not break away from instruction of the present invention.
With the statement of space correlation, as " below " " following " D score, " top " " on " etc., use in this article is for the element as shown in the figure of statement easily or the relation of parts and another element or parts.The statement that should be understood that these and space correlation except that orientation shown in the figure, also be intended to contain this equipment use or work in different azimuth.For example, if this equipment upset among the figure is described as then can being positioned to " above other element or parts " at the element of " under other element or the parts " or " below other element or parts ".This exemplary statement thus, " ... the below " can contain simultaneously " ... the top " with " ... the below " both.This equipment can be other towards (revolve turn 90 degrees or other towards), and corresponding explanation is also done in the statement of these and space correlation used herein.
Term used herein only is used to describe certain embodiments, and and is not intended to limit the present invention.As described herein, the article of singulative is intended to comprise plural form, unless its context is expressed.Will also be understood that, in this specification, use in the statement " comprising ", offered some clarification on and had described parts, integral body, step, operation, element and/or assembly, one or more other parts, integral body, step, operation, element, assembly and/or their combination have not been arranged but do not get rid of to exist or add.
Embodiments of the invention are to describe with reference to the schematic sectional view of idealized embodiment of the present invention (and intermediate structure) herein.Like this, expection for example can produce because of making processing and/or tolerance and cause in shape variation.Thus, embodiments of the invention should not be construed as it is constrained to specific region shown in this article shape, also for example should comprise the form variations that causes because of manufacturing.For example, be shown as the implantation region of rectangle, have circle or curved feature usually and/or form the gradient of implanting density, but not change to the regional binary of non-implantation from implanting the zone at its edge.Similarly, by implant to form imbed the district can cause this imbed the district and the surface that takes place to implant between the zone in some implantation are arranged.The essence in shown zone is schematically, and its shape and be not intended to illustrate the accurate shape of component area, also is not intended to limit scope of the present invention.
Unless otherwise defined, the meaning of employed all terms of this paper (comprising scientific and technical terminology) and those skilled in the art institute common sense is consistent.Should also be understood that such as defined term in the general dictionary should be interpreted as with correlative technology field in aggregatio mentium, and should not be construed as Utopian or excessive mechanical implication, unless clearly definition is arranged in the text in addition.
Hereinafter, will describe embodiment with reference to the accompanying drawings in detail.
Fig. 1 is an exploded perspective view, shown according to the embodiment of the invention, liquid vapour mixture is separated into the separator of composition separately.Fig. 2 is for showing the cutaway view of Fig. 1 separator.
With reference to figure 1 and Fig. 2, comprise separator box 110, filter element 120, exhaust component 130 and discharge opeing parts 140 according to the separator 100 of the embodiment of the invention.
In one embodiment, separator box 110 can comprise import 111, and the liquid vapour mixture (hereinafter being called the LG mixture) that has liquid component L and gas componant G can be by these import 111 supplies.Supply pipe 150 can be connected to import 111, and the LG mixture can be fed in the separator box 110 by supply pipe 150.Produce vacuum pressure via this separator box 110 in this supply pipe 150.
In one embodiment, filter element 120 can be arranged in the bottom of separator box 110 near import 111.The LG mixture can flow into this filter element 120 from import 111, and can filter out or isolate liquid component L from the LG mixture.
Particularly, when the LG mixture passes through filter element 120, therefore the gas componant G of LG mixture can pass through filter element 120, and can be in filter element 120 current downflow, and the liquid component L of LG mixture is filtered on the bottom 115 that unit 120 filtered out and be dropped in separator box 110 simultaneously.The density of liquid component L is greater than the density of gas componant G, so the liquid component L of LG mixture can gather on the bottom 115 of separator box 110.
In one embodiment, filter element 120 comprises first porous plate 122 and second porous plate 124.First porous plate 122 is positioned at the madial wall place of separator box 110, and second porous plate 124 is positioned at the separator box 110 madial wall places under first porous plate 122.Therefore, the inner space of separator box 110 can be divided into little subspace by first and second porous plates 122 and 124.Therefore, the LG mixture that is fed in the separator box 110 by import 111 must pass through first and second porous plates 122 and 124.
First porous plate 122 is provided with a plurality of first holes 123 and second porous plate 125 is provided with a plurality of second holes, and the LG mixture passes through first hole 123 and second hole 125 in the filtration treatment of being undertaken by filter element 120.When carrying out filtration treatment by filter element 120, except first and second holes 123 and 125, the surface of LG mixture and first and second porous plates 122 and 124 bump, and the liquid component L that has higher density in the LG mixture is filtered and accumulates on each first and second porous plate 122 and 124.Then, LG mixture liquid being filtered composition L drops onto on the bottom 115 of separator box 110 through first and second holes 123 and 125.
Below, by describing filter element 120 in detail with reference to figure 3.
Fig. 3 is for showing the stereogram of a filter element part shown in Figure 2.
Can to about 1.5 scope, change about 1.1 with respect to the ratio of the sectional area of import 111 (be called first area than) with reference to the gross area in figure 3, the first holes 123.When the area of all first holes 123 and import 111 than less than about 1.1 the time, the vacuum pressure of supply pipe 150 can significantly descend, this LG mixture that can cause arriving separator box 110 is under-supply; And when this area than greater than about 1.5 the time, the liquid component L of LG mixture is difficult to gather on first porous plate 122.
Therefore, all first holes 123 are about 1.1 to about 1.5 with respect to the area of import 111 than scope.In the present embodiment, this area is about 1.1 to about 1.3 than scope.
In addition, when the first diameter D1 in first hole 123 with respect to import 111 diameter ratios (be called first diameter than) less than about 0.1 the time, the LG mixture is difficult to flow through separator box 110, this can reduce the vacuum pressure of supply pipe 150 greatly, and when first diameter than greater than about 0.3 the time, the liquid component L of LG mixture is difficult to accumulate on first porous plate 122.
Therefore, first diameter is about 0.1 to about 0.3 than scope.For example, when the diameter of import 111 was about 200mm, the first diameter D1 in first hole 123 was about 30mm.
Different with it, the second diameter D2 in second hole 125 is less than the first diameter D1 in first hole 123.Therefore, the LG mixture by first hole 123 can't directly pass through second hole 125, thereby strikes on second porous plate 125.Therefore, the liquid component L of LG mixture can gather on second porous plate 125 after by first empty 123.
Particularly, the second diameter D2 in second hole 125 is about 0.7 to about 0.9 with respect to the scope of the ratio (being called second diameter ratio) of the first diameter D1 in first hole 123.For example, the first diameter D1 in first hole 123 is about 30mm, and the second diameter D2 in second hole 125 is about 25mm.
Revise among the embodiment one, first hole 123 on first porous plate 122 is crisscross arranged with respect to second hole 125 on second porous plate 124, thereby strikes on second porous plate 124 by the LG mixture in first hole 123, and irrelevant with second hole 125.Therefore, the liquid component L of LG mixture accumulates on second porous plate 124, and irrelevant with second hole 125.
Because second porous plate 124 is arranged in the separator box 110 under first porous plate 122, and having a size identical with first porous plate 122, the scope of the ratio of the gross area in second hole 125 and the sectional area of import 111 (be called second area than) is about 1.0 to about 1.2.Therefore, the second area ratio is less than first area ratio.In the present embodiment, the gross area in second hole can equate substantially with the sectional area of import 111.
In one embodiment, filter element 120 also comprises at least one filter that comprises the fine fibre silk 126, and this filter is placed between first and second porous plates 122 and 124.For example, filter 126 comprises nonwoven, thereby and has a plurality of micropores that produce because of filametntary tiny intersection.In the present embodiment, this filter 126 comprises the polyacrylic fibres that crosses one another.
In one embodiment, between first and second porous plates 122 and 124, be placed with a plurality of filters 126.For example, between first and second porous plates 122 and 124, stack eight to 12 filters 126.Filter 126 has elasticity according to its material behavior.In the present embodiment, many filters 126 are pressed between first and second porous plates 122 and 124.
Therefore, the micropore that the liquid component L of LG mixture is filtered sheet 126 further filters, and accumulates on the filter 126.Then, the liquid component L of LG mixture still is filtered sheet 126 and catches, or drops onto on the bottom 115 of separator box 110.That is, the liquid component L of the LG mixture filter 126 that is filtered unit 120 further filters.
Surpass intrinsic service life when filter 126 uses in filter element 120, the micropore of filter 126 is soaked into by the liquid component L of LG mixture, thereby filter 126 can't be at the liquid component L in filtering the LG mixture.The filter 126 that therefore, after service life, will more renew.
Below, will further describe the replacing of filter 126 with reference to figure 4 and Fig. 5.
Fig. 4 just is being installed to the cutaway view in the separator box for showing filter element 120, and Fig. 5 is installed to the cutaway view in the separator box fully for showing filter element 120.
With reference to Figure 4 and 5, first and second guide channels 113 and 114 extend from opening 112 along madial wall, thereby first and second porous plates 122 and 124 can be inserted into respectively in first and second grooves 113 and 114.That is, first and second porous plates 122 and 124 are directed in the separator box 110 along first and second grooves 113 and 114.
Therefore, the filter 126 that can more renew according to following steps.At first, filter 126 is positioned over also compacted first and second porous plates 122 and 124 between the two, is drawn out of separator box 110 along guide channel 113 and 114.Therefore, filter 126 can be drawn out of separator box 110 with first and second porous plates 122 and 124.
Then, replace the filter 126 that is soaked into, then pure filter is pressed between first and second porous plates 122 and 124 with the pure filter of not catching LG mixture liquid composition L.Afterwards, first and second porous plates 122 and 124 are inserted in the separator box 110 along guide channel 113 and 114 together with pure filter 126.
In one embodiment, each guide channel 113 and 114 width W be respectively greater than the thickness of first and second porous plates 122 and 124, for example, stand out seldom greater than the about 1mm of this thickness to about 3mm.
Therefore, first and second porous plates 122 and 124 can swing up and down in guide channel 113 and 114 slightly, thereby filter 126 is pressed in first and second porous plates 122 and 124 more.Therefore, when first and second porous plates 122 and 124 were drawn out of separator box 110, filter 126 can not break away from first and second porous plates 122 and 124.
Therefore, only need just can finish the replacing of filter 126 easily, thereby make the replacing of filter 126 very convenient by making first and second porous plates 122 and 124 leave or insert separator box 110 along guide channel 113 and 114.
In one embodiment, lid 160 be shaped as the identical plate of size and opening 112, and the bolting by penetrating seal member 170 media is to separator box 110.
For example, seal member 170 comprises comparatively cheap and sealing property rubber ring preferably.Seal member 170 also comprises the silicon circle or has the fluorine rubber ring of fine non-oxidizability (viton ring) that its liquid component L that can be used for the LG mixture comprises in the situation of strong acid material.
In one embodiment, blast pipe 130 comprises first end 132, this first end is arranged under second porous plate 124 of separator box 110 filter elements 120 and can stretches out by the bottom 115 of separator box 110, thereby comprises the second end 133 that is positioned at outside the separator box 110.This first end 132 seals in separator box 110, and the second end 133 is open outside separator box 110.In the present embodiment, first end 132 can be by 134 sealings of additional protection plate.Perhaps, as is known to the person skilled in the art, when making exhaust component 130, first end 132 is made for sealing.
In one embodiment, have at least an exhaust outlet 136 to be arranged on separator box 110 first ends 132 exhaust component 130 outer surfaces on every side.The gas componant G of the LG mixture that flows by filter element 120 and under filter element 120 flows into exhaust outlet 136, thereby discharges separator boxs 110 by exhaust component 130.
In one embodiment, exhaust outlet 136 positions are higher than the bottom 115 of separator box 110, thereby drop onto the liquid component L of the LG mixture on separator box 110 bottoms 115 by filter element 120, can't flow in the exhaust outlet 136.
Further describe exhaust component 130 with reference to figure 6.
Fig. 6 is the cutaway view of the exhaust component of demonstration separator shown in Figure 2.
With reference to figure 6, on the side face of cylindrical air exhaust parts 130, be provided with a plurality of exhaust outlets 136, and separate identical distance apart from g between each exhaust outlet.
Spacing distance g between exhaust outlet 136 is less than 0.07 times of the circumferential length of cylindrical air exhaust parts 130, residue periphery between the exhaust outlet 136 is too little, make that exhaust component 130 can damage when discharging the gas componant G of LG mixtures by exhaust component 130.On the contrary, the spacing distance g between exhaust outlet 136 is greater than 0.1 times of the circumferential length of cylindrical air exhaust parts 130, and the gas componant G of LG mixture is difficult to discharge by exhaust outlet 136.
Therefore, the scope of spacing distance g is 0.07 times to 0.1 times of circumferential length of cylindrical air exhaust parts 130 between the exhaust outlet 136.
For example, exhaust outlet 136 is arranged on the periphery of cylindrical air exhaust parts 130, and the angular distance of available center line with respect to cylindrical air exhaust parts 130 is measured the spacing distance of exhaust outlet.In the present embodiment, the spacing distance g with respect to the center line of cylindrical air exhaust parts 130 between the exhaust outlet 136 is about 30 °, thereby the central angle that is shaped as of the periphery remainder between the exhaust outlet 136 is about 30 ° fan-shaped.
In one embodiment, discharge opeing parts 140 are positioned at the bottom 115 near the separator box 110 of exhaust component 130.The liquid component L that accumulates in the LG mixture on separator box 110 bottoms 115 discharges separator box 110 by discharge opeing parts 140.
Because the liquid component L density of LG mixture is greater than the gas componant G of LG mixture, the displaced volume of liquid component L is significantly smaller than the displaced volume of gas componant G, and the diameter of these discharge opeing parts 140 can be significantly smaller than the diameter of exhaust component 130.
Further describe discharge opeing parts 140 with reference to figure 7 and Fig. 8.
Fig. 7 is a cutaway view, has shown according to the discharge opeing parts that are incorporated into separator box first embodiment of the invention, as shown in Figure 2; And Fig. 8 is a cutaway view, has shown according to the discharge opeing parts that are incorporated into separator box second embodiment of the invention, as shown in Figure 2.
With reference to figure 7, concave part 116 is positioned on the bottom 115 of separator box 110, thereby the bottom surface of concave part 116 is lower than the surface of separator box 110 bottoms 115.Therefore, the liquid component L of LG mixture gathers in the concave part 116 of separator box 110.
With reference to figure 8, the bottom 115 of separator box 110 is predetermined inclination alpha of 118 inclinations from central portion towards periphery, and discharge opeing parts 140 penetrate the bottom of not being with concave part.Therefore, the liquid partial L of LG mixture is because this inclination alpha flows to bottom 115 periphery 118 downwards, thereby by discharge opeing parts 140 discharge separator boxs 140.
In the present embodiment, the periphery 118 of bottom 115 separates with opening 112.Yet just as is known to the person skilled in the art, this periphery 115 also can be near opening 112.
For example, this inclination alpha determine depend on that to the overall dimensions of separator box 110 and the correction of shape be minimized.In the present embodiment, this inclination alpha scope can be about 3 ° to about 5 °.
Therefore, second porous plate 124, a plurality of filter 116 and first porous plate 122 overlay in the separator box 110 successively, thereby filter element 120 is installed in the separator box 110.Then, the LG mixture flows downward by filter element 120 in the separator box 110, thereby the liquid component L of LG mixture is filtered by first porous plate 122, filter 126 and second porous plate 124 successively.Then, the gas componant G of LG mixture discharges separator box 110 by the exhaust outlet 136 of exhaust component 130.The liquid component L of LG mixture is dropped in the bottom of separator box 110, discharges separator box 110 by exhaust component 140 then.Therefore, can be under the situation that does not increase separator box 110 sizes, the LG mixture is separated into separately liquid component L and gas componant G.
That is, can make the device space of separator box 110 minimize, and be convenient to other device with separator 100 be installed in separator box 110 around.
Fig. 9 is the structural representation that comprises the substrate processing apparatus of separator shown in Figure 1.
With reference to figure 9, in accordance with the principles of the present invention the substrate processing apparatus 1000 of embodiment comprise process chamber 200, transmit the delivery unit 300 of substrate, Treatment Solution is fed to the liquid sprinkler 400 on the substrate and will handle gas be fed on the substrate gas sprinkler 500 and with liquid vapour mixture be separated into separately liquid component and the separator 1000 of gas componant.
In one embodiment, process chamber 200 provides the inner space, and substrate S can be loaded in this inner space and therein substrate S be implemented various processing.For example, substrate S can comprise thin film transistor (TFT) (TFT) glass substrate and colored filter (CF) glass substrate that is used for LCD (LCD) device, and semiconductor substrate, for example wafer of IC apparatus.
In one embodiment, delivery unit 300 can be positioned at the bottom of process chamber 200, and substrate S is positioned on the delivery unit 300 when being loaded into process chamber 200 and unload from process chamber 200.That is, substrate S is sent to process chamber 300 by delivery unit 300 and sends out from process chamber 200.For example, delivery unit 300 can comprise horizontal-extending in process chamber 200, and perpendicular to the axle 310 of substrate S direction of transfer, and is incorporated into axle a plurality of rollers 320 of 310 by fixed intervals.
In one embodiment, liquid sprinkler 400 can be positioned on the top of process chamber 200 substrate S above.Treatment Solution L is fed to liquid sprinkler 400 from the outside of process chamber 200, and can be sprayed onto on the substrate S in the process chamber 200.
For example, if carry out etch processes or cleaning treatment in process chamber 200, Treatment Solution L can comprise deionized water, aqueous sulfuric acid, aqueous hydrochloric acid solution and hydrogenperoxide steam generator.
In one embodiment, this delivery unit 300 can make the substrate S predetermined process angle that tilts, thus make the Treatment Solution that is sprayed onto on the substrate S because this process angle and on substrate S toward current downflow, thereby increased the efficient that substrate S is handled.For example, substrate S can be 3 ° to 6 ° with respect to the process angle scope of process chamber 200 horizontal bottom.
In one embodiment, gas sprinkler 500 can be arranged in the top of process chamber 200 liquid sprinklers 400.Handling gas G is sprayed onto in the entire inner space of process chamber 200 by gas sprinkler 500.In the present embodiment, gas sprinkler 500 can be installed on the top board of process chamber 200.
Therefore, handle gas G and can on liquid sprinkler 400, be sprayed onto the bottom of process chamber 200 downwards from top, thereby make the Treatment Solution L that sprays from liquid sprinkler 400 to drive towards substrate S by processed gas G.
Therefore, Treatment Solution L and processing gas G mix in process chamber 200 mutually, thereby are formed on the liquid vapour mixture that flows in the process chamber 200.After finishing particular procedure, when another substrate was loaded onto in the process chamber 200, this new substrate can be polluted by the LG mixture that flows in process chamber 200.
In one embodiment, separator 100 is arranged near the process chamber 200, and is connected to process chamber 200 by supply pipe 150.Therefore, the LG mixture in the process chamber 200 can be fed in the separator 100 by supply pipe 150, and is separated into separately liquid component L and gas componant G in separator 100.
For example, because the LG mixture flows in process chamber 200, supply pipe 150 is connected to the top of process chamber 200.Supply pipe 150 can be installed on the top board 210 or the close sidewall 230 of top board 210 of process chamber 200.In the present embodiment, supply pipe 150 is installed near on the sidewall 230 of process chamber 200 top boards 210, thereby is convenient to the assembling of equipment 1000.
In the present embodiment, exhaust component 130 is shaped as cylindrical, and comprises the additional protection plate 134 with this cylinder first end sealing under the filter element 120, and a plurality of exhaust outlets 126 that are positioned at close protective plate 134 on the cylinder side face.Thereby the gas componant G of LG mixture flows into exhaust outlet and discharges separator box 110.
Vavuum pump 600 is installed on exhaust component 130 the second ends that are positioned at separator box 110 outsides, thereby makes the supply quickening that arrives the LG mixture in the separator box 110 via supply pipe 150.
Particularly, vavuum pump 600 produces vacuum pressure, and is applied to supply pipe 150 and separator box 110 by exhaust component 130.Vacuum pressure can not be subjected to filter element 120 influence in the separator box 110 and descend, because filter element 120 is configured to referring to figs. 1 to 8 described, as to make vacuum reduced minimum structure.
As mentioned above, the separator 100 that the LG mixture is separated into liquid component L and gas componant G thereby can prevent that vavuum pump 600 from being damaged by the liquid component L of LG between process chamber 200 and vavuum pump 600.
In addition, equipment 1000 can comprise the second discharge opeing parts 700 that are connected in process chamber 200 bottoms.Treatment Solution is fed to substrate S from liquid sprinkler 400 and comes treatment substrate S, and residual process solution is stayed the bottom of process chamber 200.Residual process solution is discharged in the process chamber 200 by the second discharge opeing parts 700.
In one embodiment, collect the other gatherer (not shown) from the residual process solution that the second discharge opeing parts 700 are discharged, and can be fed to once more in the liquid sprinkler 400, thereby make the regeneration of residual process solution.
Therefore, liquid component L can be separated from the LG mixture effectively, and separated liquid component L can regenerate in equipment 1000 by separator 100.
Some embodiment of design according to the present invention, when the LG mixture is discharged process chamber, the liquid component L of LG mixture can filter by separated device effectively, thereby has prevented that fully vavuum pump from damaging because of the liquid component L of LG mixture.
Above-mentioned is the illustrative description of embodiment, and does not constitute limitation ot it.Although understand some embodiment, but those skilled in the art readily appreciate that and can substantially not break away under the situation of novel teachings of the present invention and advantage, and embodiment is carried out many modifications.Therefore, all this type of revise and all will be included in the invention scope that claim limits.In the claims, the statement of means-plus-function is intended to contain the structure of carrying out mentioned function, comprises that not only equivalent structures also comprises equivalent structure.Therefore, should understand above-mentioned illustrative for various embodiment and describe, and not constitute restriction, and, be included within the scope of appended claim the modification of disclosed embodiment and other embodiment to disclosed specific embodiment.
Claims (16)
1. the separator of a separating liquid composition from liquid vapour mixture comprises:
Separator box comprises the import that is arranged on its top, and described liquid vapour mixture is provided in the described separator box by described import;
Be positioned at the filter element under the described import in described separator box, described filter element filters described liquid component from described liquid vapour mixture;
Be in the exhaust component of described separator box bottom, it forms such structure, the closed end that is described exhaust component is towards described filter element, and at least one exhaust outlet is arranged on the sidewall of described exhaust component, and the gas componant of described liquid vapour mixture is discharged to outside the described separator box by described exhaust outlet; And
Be positioned at the discharge opeing parts of described separator box bottom, the liquid component of described liquid vapour mixture is discharged to outside the described separator box by described discharge opeing parts.
2. separator as claimed in claim 1, wherein said exhaust outlet position are higher than the surface of described separator box bottom.
3. separator as claimed in claim 1, wherein said filter element comprises first porous plate and second porous plate, pass described first porous plate and be provided with a plurality of first holes with first diameter, a plurality of second holes with second diameter littler than described first diameter are set on described second porous plate, described second porous plate is positioned under described first porous plate, form such structure, promptly the inner space of described separator box is divided into little subspace.
4. separator as claimed in claim 3, the gross area in wherein said first hole is about 1.1 to about 1.5 with the scope of the ratio of the sectional area of described import; And the gross area in described second hole is about 1.0 to about 1.2 with the scope of the ratio of the sectional area of described import.
5. separator as claimed in claim 3, first diameter in wherein said first hole are about 0.1 to about 0.3 times of diameter of described import; And second diameter in described second hole is about 0.7 to about 0.9 times of first diameter in described first hole.
6. separator as claimed in claim 3, wherein said filter element comprise that at least one is positioned over the filter between described first porous plate and second porous plate, and described filter has the fine fibre silk.
7. separator as claimed in claim 6, wherein said separator box also is included in the opening of its sidewall, seal the lid of described opening, and in order to sealing the seal member in gap between described parameatal, described lid and the described separator box, described first porous plate and second porous plate and be placed on filter between described first porous plate and second porous plate and be installed in the described separator box or from described separator box by described opening and take out.
8. separator as claimed in claim 7, wherein said separator box also comprises first guide channel and second guide channel that the madial wall from opening along described separator box extends, and described first porous plate and second porous plate are inserted in described first guide channel and second guide channel respectively and are guided in the described separator box.
9. separator as claimed in claim 8, the width of wherein said first guide channel greater than the about 1mm of the thickness of described first porous plate to about 3mm; And the width of described second guide channel greater than the about 1mm of the thickness of described second porous plate to about 3mm.
10. separator as claimed in claim 1, wherein said separator box also are included in the concave part of its bottom, and described discharge opeing parts are connected in the concave part of described separator box.
11. separator as claimed in claim 1, wherein said separator box bottom tilts to periphery from its central portion, and described discharge opeing parts are connected in the described periphery of described separator box bottom.
12. separator as claimed in claim 1, wherein said exhaust component is cylindrical, and a plurality of described exhaust outlets are arranged on the periphery of the described cylindrical air exhaust parts around the described closed end and separate the identical distance distance, and described spacing distance is about 0.07 to about 0.1 times of circumferential length of described cylindrical air exhaust parts.
13. a substrate processing apparatus comprises:
Process chamber, described substrate is processed therein;
Be positioned at the liquid sprinkler on the described substrate in described process chamber, described liquid sprinkler is sprayed onto Treatment Solution on the described substrate;
Be positioned at the gas sprinkler on the described liquid sprinkler in described process chamber, described gas sprinkler will be handled in the entire inner space that gas is sprayed onto described process chamber;
Be connected to the separator of described process chamber by supply pipe, described separator is separated described Treatment Solution and described processing gas the solution-admixture of gas that is fed to described separator by described supply pipe from described process chamber, and described separator comprises:
Separator box comprises the import that is arranged on its top and is connected with described supply pipe;
Be positioned at the filter element under the described import in described separator box, described filter element filters described Treatment Solution composition from described solution-admixture of gas;
Be positioned at the exhaust component of described separator box bottom, it forms such structure, the sealing first end that is described exhaust component is towards described filter element, and at least one exhaust outlet is arranged on the sidewall of described exhaust component, and the processing gas componant of described solution-admixture of gas is discharged to outside the described separator box by described exhaust outlet; And
Be positioned at the first discharge opeing parts of described separator box bottom, the Treatment Solution composition of described solution-admixture of gas is discharged to outside the described separator box by the described first discharge opeing parts.
14. equipment as claimed in claim 13, also comprise vavuum pump, be connected in described vavuum pump with the first end the second end relative, that be in described separator box outside of described exhaust component, thereby produce vacuum pressure by described vavuum pump, and this vacuum pressure is applied to described supply pipe via described separator box.
15. equipment as claimed in claim 13 also comprises the second discharge opeing parts that are connected in described chamber bottom, the residual process solution of staying on the described chamber bottom is discharged to outside the described process chamber by the described second discharge opeing parts.
16. equipment as claimed in claim 15, the wherein said first discharge opeing parts are connected with the described second discharge opeing parts, be filtered the solution composition that the unit filters out be discharged to outside the described equipment by the described second discharge opeing parts from described solution-admixture of gas thereby make.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020080089171A KR101000296B1 (en) | 2008-09-10 | 2008-09-10 | Apparatus for separating a gas-liquid and apparatus for processing a substrate including the same |
| KR1020080089171 | 2008-09-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101670215A true CN101670215A (en) | 2010-03-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN200910170848A Pending CN101670215A (en) | 2008-09-10 | 2009-09-09 | A segregator that separates liquid vapor mixture and a cardinal plate processing equipment containing the segregator |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4870801B2 (en) |
| KR (1) | KR101000296B1 (en) |
| CN (1) | CN101670215A (en) |
| TW (1) | TWI367776B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102720549A (en) * | 2012-06-20 | 2012-10-10 | 河北省电力勘测设计研究院 | Vacuum energy vortex steam condenser |
| CN103157583A (en) * | 2011-12-13 | 2013-06-19 | 亚智科技股份有限公司 | Trough body bubble discharging device and method |
| CN104174188A (en) * | 2014-08-08 | 2014-12-03 | 西北工业大学 | Air removal device for water tunnels |
| CN110685892A (en) * | 2019-10-31 | 2020-01-14 | 汤业禧 | Diaphragm vacuum pump |
| CN110947578A (en) * | 2018-09-27 | 2020-04-03 | 细美事有限公司 | Chemical liquid supply device |
| CN111569560A (en) * | 2020-05-26 | 2020-08-25 | 江苏双旭科技有限公司 | Expansion energy-releasing steam-water separator |
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| RU2529672C1 (en) * | 2013-07-09 | 2014-09-27 | Шлюмберже Текнолоджи Б.В. | Multi-phase separator-grinder |
| KR101817215B1 (en) * | 2016-03-16 | 2018-01-11 | 세메스 주식회사 | Pump and apparutus for supplying fluid |
| CN108786283B (en) * | 2018-08-31 | 2023-10-10 | 中冶北方（大连）工程技术有限公司 | Three-stage gas-liquid separation system for mineral separation and dehydration operation |
| KR102168831B1 (en) * | 2018-12-10 | 2020-10-22 | 주식회사 포스코 | Filtering apparatus for automatically discharging waste liguid |
| KR102375491B1 (en) * | 2020-05-22 | 2022-03-17 | 주식회사 티에스티이 | Vacuum Suction Device for Cell Smear |
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| JPS61197206A (en) * | 1985-02-27 | 1986-09-01 | Toyoda Gosei Co Ltd | Preparation device for rubber material |
| JPH02120675A (en) * | 1988-10-31 | 1990-05-08 | Nippon Telegr & Teleph Corp <Ntt> | Method for measuring electric signal |
| JP3140624B2 (en) * | 1993-12-28 | 2001-03-05 | 日本電熱計器株式会社 | Device for collecting mist flux |
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- 2009-09-08 TW TW098130290A patent/TWI367776B/en active
- 2009-09-09 CN CN200910170848A patent/CN101670215A/en active Pending
- 2009-09-10 JP JP2009208934A patent/JP4870801B2/en active Active
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103157583A (en) * | 2011-12-13 | 2013-06-19 | 亚智科技股份有限公司 | Trough body bubble discharging device and method |
| CN102720549A (en) * | 2012-06-20 | 2012-10-10 | 河北省电力勘测设计研究院 | Vacuum energy vortex steam condenser |
| CN104174188A (en) * | 2014-08-08 | 2014-12-03 | 西北工业大学 | Air removal device for water tunnels |
| CN104174188B (en) * | 2014-08-08 | 2015-09-30 | 西北工业大学 | A kind of water hole depassing unit |
| CN110947578A (en) * | 2018-09-27 | 2020-04-03 | 细美事有限公司 | Chemical liquid supply device |
| CN110685892A (en) * | 2019-10-31 | 2020-01-14 | 汤业禧 | Diaphragm vacuum pump |
| CN110685892B (en) * | 2019-10-31 | 2021-09-03 | 福雪莱冷暖设备(东莞)有限公司 | Diaphragm vacuum pump |
| CN111569560A (en) * | 2020-05-26 | 2020-08-25 | 江苏双旭科技有限公司 | Expansion energy-releasing steam-water separator |
| CN111569560B (en) * | 2020-05-26 | 2021-06-25 | 江苏双旭动力科技有限公司 | Expansion energy-releasing steam-water separator |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI367776B (en) | 2012-07-11 |
| KR20100030288A (en) | 2010-03-18 |
| JP4870801B2 (en) | 2012-02-08 |
| KR101000296B1 (en) | 2010-12-13 |
| TW201016293A (en) | 2010-05-01 |
| JP2010064068A (en) | 2010-03-25 |
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Application publication date: 20100317 |