KR20090035859A - Apparatus of exhausting fume - Google Patents

Abstract

An apparatus of exhausting a fume is provided to prevent a malfunction due to a gas by discharging a gas generated from liquid medicines to the outside through a second discharging unit. A gas discharging apparatus(100) comprises a processing chamber(200), a liquid medicine supply unit(300), and a first exhausting unit(400) and a second exhausting unit(500). A processing chamber provides a space for manufacturing substrate. The liquid medicine supply unit is arranged at the lower part of the processing chamber, and the liquid medicine supply unit supplies the liquid medicine to the processing chamber. A first exhausting unit is arranged at the lower part of the processing chamber. The first exhausting unit provides a path for exhausting the gas generated in the processing chamber to downward. A first exhausting unit comprises a buffer unit(410) which controls the amount of the transferred gas.

Description

Gas exhaust device {APPARATUS OF EXHAUSTING FUME}

The present invention relates to a gas exhaust device, and more particularly to a gas exhaust device for exhausting the gas generated by the reaction between the chemical liquids used in the process.

In general, a manufacturing process of an integrated circuit device such as a semiconductor device, a flat panel display device, and the like includes various processes. The processes include an etching process of etching the semiconductor device, etc. using a chemical liquid, and a cleaning process of cleaning the semiconductor device, etc., using a cleaning solution. On the other hand, when the processes are performed using various kinds of chemical liquids, cleaning liquids, the chemical liquids react with each other to generate gases such as a fume. As a result, the generated gas lowers the efficiency of the process.

Therefore, the apparatus for manufacturing a semiconductor element includes a gas exhaust device for exhausting the generated gas to the outside. The gas exhaust device is located below the process chamber where the process for the substrate is performed or adjacent to the process chamber to exhaust the gas to the outside.

The gas exhaust device has a dependent exhaust structure corresponding to the plurality of process chambers. That is, gas is first exhausted from each process chamber, and the exhaust gas is collected and secondaryly exhausted. Therefore, a pressure loss occurs due to the plurality of exhaust structures, and a problem arises in that efficient exhaust cannot be achieved.

In addition, the gas exhaust device includes a flexible hose such as a rubber hose to exhaust the gas to the outside of the process chamber. At this time, when the hose for exhausting the gas is bent, since the gas remains in the bent portion, there is a problem that does not sufficiently exhaust the gas.

An object of the present invention is to provide a gas exhaust device for efficiently exhausting the gas generated in the process.

Gas exhaust device according to embodiments of the present invention for achieving the above object includes a process chamber, a chemical liquid supply, a first exhaust and a second exhaust. The process chamber accommodates a substrate therein and provides a space for performing a process on the substrate using at least one chemical liquid. The chemical liquid supply unit is disposed under the process chamber, and supplies the chemical liquid to the process chamber. The first exhaust part is connected to one side of the lower surface of the process chamber to extend vertically downward, and when the process is performed on the substrate, the gas generated by the reaction of the chemical liquid is lowered from the process chamber. To provide a path for evacuation. The second exhaust portion is connected to the first exhaust portion, provides an exhaust space for collecting gas from the first exhaust portion, and forcibly exhausts the gas collected in the exhaust space to the outside of the process chamber. .

In embodiments of the present invention, the first exhaust part may be disposed in one region of the path through which the gas is exhausted, and may further include a buffer for adjusting the amount of the exhausted gas.

In some embodiments of the present invention, the second exhaust part includes an upper frame connected to the first exhaust part and a lower frame coupled with the upper frame to provide an exhaust space in which the received gas is collected. .

For example, the second exhaust part is formed through the central portion of the lower frame to be connected to the second exhaust hole and the second exhaust hole having a through-type structure, and the collected gas is lowered from the exhaust space. It may further include an exhaust pipe for exhausting vertically in the direction. The second exhaust part may be formed to extend at a predetermined height upward from an edge of the second exhaust hole, and may further include a blocking wall for blocking the liquid formed inside the second exhaust part from flowing into the exhaust pipe. The apparatus may further include a blocking wall formed to extend a predetermined height from an edge of the second exhaust hole to an upper portion, and to block the liquid formed inside the second exhaust part from flowing into the exhaust pipe.

For example, the lower frame further includes a plurality of coupling protrusions disposed along a circumference of the second exhaust hole and protruding from an upper surface of the lower frame, wherein the upper frame has a lower surface of the coupling protrusion. It may further include a coupling groove formed to correspond to the position and shape.

For example, the second exhaust part may be formed in the remaining part of the lower frame except for a portion in which the second exhaust hole is formed, and further include a liquid discharge part for discharging the liquid formed in the second exhaust part to the outside. can do.

For example, the upper frame may be formed to be opened and closed at a portion connected to the chemical liquid supply part, and may further include a shutter for exhausting the gas generated in the chemical liquid supply part to the second exhaust part.

According to the present invention described above, the gas generated by the reaction of the chemical liquid used in the process can be efficiently exhausted to the outside through the second exhaust portion. Therefore, it is possible to prevent defects and failures caused by the generated gas and improve the efficiency of the overall process.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. As the inventive concept allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. In describing the drawings, similar reference numerals are used for similar components. In the accompanying drawings, the dimensions of the structures are shown in an enlarged scale than actual for clarity of the invention.

Terms such as first and second may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, the terms "comprise" or "having" are intended to indicate that there is a feature, number, step, action, component, part, or combination thereof described in the specification, and that one or more other features It should be understood that it does not exclude in advance the possibility of the presence or addition of numbers, steps, actions, components, parts or combinations thereof.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

1 is a configuration diagram briefly shown for explaining a gas exhaust device according to embodiments of the present invention.

Referring to FIG. 1, a gas exhaust device 100 according to embodiments of the present invention includes a process chamber 200, a chemical liquid supply part 300, a first exhaust part 400, and a second exhaust part 500. do.

The process chamber 200 accommodates a substrate therein and provides a space for processing the substrate. For example, an etching process using a chemical liquid, a cleaning process using a cleaning liquid, and the like may be performed in the process chamber 200. In embodiments of the present invention, when a process using a chemical liquid or the like is performed in the process chamber 200, chemical liquids having two or more kinds may be used.

The chemical liquid supply unit 300 may be disposed below the process chamber 200. In embodiments of the present invention, the chemical liquid supply unit 300 is disposed while interviewing the lower surface of the process chamber 200.

The chemical liquid supply unit 300 supplies the chemical liquid used in the process to the process chamber 200. The chemical liquid supply unit 300 may include a plurality of chemical liquid supply pipes (not shown) and a chemical liquid storage unit (not shown) for supplying various types of chemical liquids.

In this case, when two or more different chemical liquids are supplied from the chemical liquid supply unit 300 at the same time or sequentially, the chemical liquids may react with each other to generate gas. Therefore, in order to discharge the generated gas to the outside, the first exhaust unit 400 and the second exhaust unit 500 is provided.

The first exhaust part 400 is disposed below the process chamber 200. In addition, the first exhaust part 400 may be disposed adjacent to the chemical liquid supply part 300 in the lower region of the process chamber 200. For example, the first exhaust part 400 is connected to one side of the lower surface of the process chamber 200 and is formed to vertically extend in the downward direction. Accordingly, the first exhaust part 400 provides a path for exhausting the gas generated in the process chamber 200 downward. That is, the first exhaust part 400 has a direct structure to exhaust the generated gas vertically downward. As such, the first exhaust unit 400 may transfer the gas to the second exhaust unit 500.

In embodiments of the present invention, the first exhaust unit 400 may be provided separately for each of the process chambers 200. Therefore, since the first exhaust part 400 has a direct structure and is individually disposed for each process chamber 200, the gas generated in the process chamber 200 may be efficiently exhausted.

The first exhaust part 400 may further include a buffer part 410. The buffer unit 410 is disposed in one region of the first exhaust unit 400. For example, the buffer unit 410 may be disposed in one region of the path through which the gas is delivered. The buffer unit 510 adjusts the amount of gas delivered. For example, the buffer unit 510 may be a control valve that can directly control the amount of gas. Alternatively, the buffer unit 510 may be a buffer space that can indirectly adjust the amount and speed of the gas delivered, and may also be a damper. Accordingly, when the gas is delivered through the first exhaust part 400, the buffer part 510 appropriately adjusts the amount, speed, and the like of the gas, thereby efficiently delivering the gas.

The second exhaust part 500 is connected to the first exhaust part 400. Accordingly, the gas is received from the first exhaust unit 400 and the received gas is exhausted to the outside. Meanwhile, the second exhaust unit 500 may exhaust the collected gas to the outside after collecting the delivered gas in a predetermined space. Accordingly, the second exhaust part 500 has a box type structure that provides a space for collecting gas. That is, the second exhaust part 500 may have an assembly space or an exhaust space of which the interior thereof is empty.

For example, the second exhaust unit 500 may forcibly exhaust the collected gas to the outside. That is, by using an external suction member (not shown), it is also possible to forcibly suck the gas collected in the assembly space to the outside to force the exhaust.

Accordingly, the second exhaust part 500 may include a frame configured up and down to provide the exhaust space. For example, a space in which the gas is collected by a frame coupled up and down is provided. The second exhaust part 500 may collect the delivered gas through an exhaust space defined by a frame configured up and down, and discharge the gas to the outside through an exhaust pipe to be described later.

The second exhaust unit 500 will be described in more detail with reference to FIGS. 2 to 4.

As described above, the first exhaust part 400 and the second exhaust part 500 may be vertically disposed in the lower direction of the process chamber 200 to vertically exhaust the gas generated in the process chamber 200. Therefore, the efficiency of the overall process can be improved by efficiently evacuating the gas generated by the reaction of the chemical liquids.

FIG. 2 is an exploded perspective view for describing the second exhaust unit of FIG. 1 in detail. 3 is an enlarged perspective view illustrating an enlarged portion 'A' of FIG. 2, and FIG. 4 is a perspective view of the upper frame of FIG. 2 viewed from below.

2 to 4, the second exhaust part 500 according to the embodiments of the present invention may define the upper space 510 and the lower frame 520 to define an exhaust space for collecting the delivered gas. It is provided. The upper frame 510 is connected to the first exhaust part 400 of FIG. 1, and the lower frame 520 is coupled to the upper frame 510 at the bottom to provide the exhaust space.

The upper frame 510 includes a first exhaust hole 512 for receiving gas from the first exhaust part. For example, the first exhaust hole 512 is formed to correspond to the size of the first exhaust part. In embodiments of the present invention, the first exhaust hole 512 may be cut and disposed to correspond to the first exhaust part on one side of the upper frame 510.

In addition, the upper frame 510 includes a shutter 514 formed at a portion connected to the chemical liquid supply part (300 of FIG. 1). The shutter 514 is disposed in a part of an area where the chemical supply part and the upper frame 510 are interviewed, and are formed to be openable and closed. Therefore, the upper frame 510 and the chemical liquid supply part are connected to each other through opening and closing of the shutter 514. Accordingly, when gas is generated in the chemical liquid supply unit, the generated gas may be sucked or guided to the second exhaust unit 500 by opening the shutter 514. Therefore, in order to connect the second exhaust part 500 and the chemical liquid supply part, a through hole may be disposed under the shutter 514.

The lower frame 520 includes a second exhaust hole 522 for exhausting the gas collected in the exhaust space to the outside and an exhaust pipe 524 that provides an exhaust path of the gas.

For example, the second exhaust hole 522 is formed through the central portion of the lower frame 520. Alternatively, the second exhaust hole 522 may be formed in a region other than the central portion of the lower frame 520. Accordingly, the second exhaust hole 522 may have a through-type structure by the penetration.

The exhaust pipe 524 is connected to the second exhaust hole 522 to provide an exhaust path of the gas. For example, the exhaust pipe 524 may be formed vertically downward from the exhaust space of the second exhaust part 500 to exhaust the gas in a direct manner. Here, the exhaust pipe 524 may be made of a rigid material. That is, the exhaust pipe 524 may be preset in size and shape corresponding to the arrangement and structure of the external device or facility. Alternatively, the exhaust pipe 524 may be made of a material that can be bent. This is to respond flexibly according to external facilities.

In addition, the second exhaust part 500 may further include a liquid discharge part 526 for discharging the liquid formed in the exhaust space to the outside. A gas is generated by a reaction such as a chemical liquid, and the liquid discharge part 526 discharges the liquid to the outside when the generated gases react with each other or cool to change into a liquid. For example, the liquid discharge part 526 is formed in the remaining part except for a part of the lower frame 520 in which the second exhaust hole 522 is formed. In addition, the liquid discharge part 526 is formed through a portion of the lower frame 520. That is, the liquid discharge part 526 may have a structure of a through type having a size smaller than that of the second exhaust hole 522.

The second exhaust part 500 includes a blocking wall 528 for blocking the liquid from flowing into the second exhaust hole 522 and the exhaust pipe 524. In embodiments of the present invention, it is formed extending from the edge of the second exhaust hole 522 by a predetermined height. The height may be variously changed according to the internal space of the second exhaust part 500. As described above, the blocking wall 528 has a barrier shape formed at the edge of the second exhaust hole 522, and the liquid generated in the assembly space of the second exhaust part 500 flows into the second exhaust hole 522. Can be prevented.

As mentioned above, in order to provide an assembly space and an exhaust space of the second exhaust part 500, the upper frame 510 and the lower frame 520 are coupled to each other up and down. In the embodiments of the present invention, the upper frame 510 and the lower frame 520 includes a coupling groove 516 and a coupling protrusion 530 for the coupling.

A plurality of coupling protrusions 530 are disposed along the circumference of the second exhaust hole 522. In addition, the coupling protrusion 530 is formed to protrude from the upper surface of the lower frame 520. That is, the coupling protrusion 530 is formed to protrude upward by a predetermined height along the circumference of the second exhaust hole 522. Referring to FIG. 3, the coupling protrusion 530 protrudes higher than the blocking wall 528 around the second exhaust hole 522. This is for fitting coupling with the coupling groove 516 formed in the upper frame 510.

Referring to FIG. 4, the coupling groove 516 is formed on the lower surface of the upper frame 510 to correspond to the position, shape, and the like of the coupling protrusion 530. For example, the coupling grooves 516 may have the same number as the coupling protrusions 530, are disposed at corresponding positions, and have a shape of a groove having a size into which the coupling protrusions 530 are inserted.

As such, the upper frame 510 and the lower frame 520 are not coupled to each other by bolts and nuts, and are coupled to each other by fitting coupling of the coupling protrusion 530 and the coupling groove 516. Therefore, a portion where gas or liquid may leak to the exhaust space of the second exhaust part 500 is removed. As a result, the second exhaust unit 500 collects and concentrates the gas through the second exhaust hole 522 and the exhaust pipe 524 to exhaust the gas from the process chamber efficiently. Furthermore, by efficiently exhausting the gas, the efficiency of the overall processing process can be improved.

According to the present invention, the gas exhaust device exhausts the gas generated by the reaction of the chemical liquid in the process chamber in the lower vertical direction. In addition, the first exhaust unit and the second exhaust unit can exhaust the gas efficiently through the exhaust hole, the exhaust pipe, the shutter, and the like. Furthermore, by fitting the upper and lower frames of the second exhaust unit for providing the aggregate space of the gas to each other, it is possible to prevent the leakage of gas to improve the efficiency of the overall exhaust process.

As described above, although described with reference to preferred embodiments of the present invention, those skilled in the art will be variously modified without departing from the spirit and scope of the invention described in the claims below. And can be changed.

1 is a configuration diagram briefly shown for explaining a gas exhaust device according to embodiments of the present invention.

FIG. 2 is an exploded perspective view for describing the second exhaust unit of FIG. 1 in detail.

3 is an enlarged perspective view illustrating an enlarged portion A of FIG. 2.

4 is a perspective view of the upper frame of FIG. 2 viewed from below;

<Description of the symbols for the main parts of the drawings>

100: gas exhaust device 200: process chamber

300: chemical liquid supply unit 400: first exhaust unit

410: shock absorbing part 500: second exhaust part

510: upper frame 512: first exhaust hole

516: coupling groove 520: lower frame

522: second exhaust hole 524: exhaust pipe

526: liquid discharge portion 528: barrier wall

530: engaging projection

Claims (8)

A process chamber for receiving a substrate therein and performing a process on the substrate using at least one chemical liquid; A chemical liquid supply unit disposed under the process chamber and configured to supply a chemical liquid to the process chamber; Is connected to one side of the lower surface of the process chamber is formed to extend vertically in the downward direction, the path for exhausting the gas generated by the reaction of the chemical liquid downward from the process chamber when performing the process for the substrate A first exhaust unit for providing; And A second exhaust portion connected to the first exhaust portion and providing an exhaust space for collecting gas from the first exhaust portion and forcibly exhausting the gas collected in the exhaust space to the outside of the process chamber; Gas exhaust system. The method of claim 1, wherein the first exhaust portion And a buffer unit disposed in one region of the gas exhaust path and configured to adjust an amount of the gas exhausted. The method of claim 1, wherein the second exhaust portion An upper frame connected to the first exhaust part; And And a lower frame coupled to the upper frame to provide an exhaust space in which the received gas is collected. The method of claim 3, wherein the second exhaust portion An exhaust hole formed through the central portion of the lower frame and having a through-type structure; And And an exhaust pipe connected to the exhaust hole and configured to exhaust the collected gas vertically downward from the exhaust space. The method of claim 4, wherein the second exhaust portion And a blocking wall formed extending from the edge of the exhaust hole to a predetermined height and blocking the inflow of the liquid formed in the second exhaust part into the exhaust hole. The method of claim 4, wherein The lower frame may further include a plurality of coupling protrusions disposed along a circumference of the exhaust hole and protruding from an upper surface of the lower frame. The upper frame further comprises a coupling groove formed in the lower surface to correspond to the position and shape of the coupling projections. The method of claim 3, wherein the second exhaust portion And a liquid discharge part formed in the remaining part of the lower frame except for a portion where the exhaust hole is formed, and for discharging the liquid formed in the second exhaust part to the outside. The method of claim 3, wherein the upper frame And a shutter configured to be opened and closed at a portion connected to the chemical liquid supply part, and configured to exhaust the gas generated by the chemical liquid supply part to the second exhaust part.

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