KR20090033316A - 그레이톤 마스크의 제조 방법 및 그레이톤 마스크와 패턴 전사 방법 - Google Patents

그레이톤 마스크의 제조 방법 및 그레이톤 마스크와 패턴 전사 방법 Download PDF

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Publication number
KR20090033316A
KR20090033316A KR1020080094418A KR20080094418A KR20090033316A KR 20090033316 A KR20090033316 A KR 20090033316A KR 1020080094418 A KR1020080094418 A KR 1020080094418A KR 20080094418 A KR20080094418 A KR 20080094418A KR 20090033316 A KR20090033316 A KR 20090033316A
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KR
South Korea
Prior art keywords
film
light
gray tone
tone mask
patterning
Prior art date
Application number
KR1020080094418A
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English (en)
Korean (ko)
Inventor
미찌아끼 사노
가즈히사 이무라
마사루 미쯔이
Original Assignee
호야 가부시키가이샤
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Publication date
Application filed by 호야 가부시키가이샤 filed Critical 호야 가부시키가이샤
Publication of KR20090033316A publication Critical patent/KR20090033316A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020080094418A 2007-09-29 2008-09-26 그레이톤 마스크의 제조 방법 및 그레이톤 마스크와 패턴 전사 방법 KR20090033316A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2007-00256927 2007-09-29
JP2007256927A JP4934237B2 (ja) 2007-09-29 2007-09-29 グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法

Publications (1)

Publication Number Publication Date
KR20090033316A true KR20090033316A (ko) 2009-04-02

Family

ID=40571785

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080094418A KR20090033316A (ko) 2007-09-29 2008-09-26 그레이톤 마스크의 제조 방법 및 그레이톤 마스크와 패턴 전사 방법

Country Status (4)

Country Link
JP (1) JP4934237B2 (zh)
KR (1) KR20090033316A (zh)
CN (1) CN101408725A (zh)
TW (1) TWI402611B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012005524A2 (en) * 2010-07-08 2012-01-12 Lg Innotek Co., Ltd. The printed circuit board and the method for manufacturing the same

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010044149A (ja) * 2008-08-11 2010-02-25 Hoya Corp 多階調フォトマスク、パターン転写方法及び多階調フォトマスクを用いた表示装置の製造方法
KR101095539B1 (ko) * 2009-05-26 2011-12-19 엘지이노텍 주식회사 하프톤 마스크 및 이의 제조 방법
KR101168406B1 (ko) * 2009-05-26 2012-07-25 엘지이노텍 주식회사 하프톤 마스크 및 이의 제조 방법
JP2011081326A (ja) * 2009-10-10 2011-04-21 Hoya Corp 多階調フォトマスクの製造方法及び多階調フォトマスク用ブランク、並びに電子デバイスの製造方法
JP2011102913A (ja) 2009-11-11 2011-05-26 Hoya Corp 多階調フォトマスクの製造方法、及び多階調フォトマスク
JP5917020B2 (ja) * 2010-06-29 2016-05-11 Hoya株式会社 マスクブランクおよび多階調マスクの製造方法
JP6093117B2 (ja) * 2012-06-01 2017-03-08 Hoya株式会社 フォトマスク、フォトマスクの製造方法及びパターンの転写方法
JP2023050611A (ja) * 2021-09-30 2023-04-11 株式会社エスケーエレクトロニクス フォトマスク及びフォトマスクの製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0644146B2 (ja) * 1987-03-03 1994-06-08 三菱電機株式会社 フオトマスク
US7166392B2 (en) * 2002-03-01 2007-01-23 Hoya Corporation Halftone type phase shift mask blank and halftone type phase shift mask
JP3645882B2 (ja) * 2002-03-01 2005-05-11 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクブランクの製造方法
JP4393290B2 (ja) * 2003-06-30 2010-01-06 Ｈｏｙａ株式会社 グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法
JP4608882B2 (ja) * 2003-12-22 2011-01-12 セイコーエプソン株式会社 露光用マスク及びその製造方法、並びに液晶装置の製造方法
JP2006030320A (ja) * 2004-07-12 2006-02-02 Hoya Corp グレートーンマスク及びグレートーンマスクの製造方法
JP5196098B2 (ja) * 2005-09-21 2013-05-15 大日本印刷株式会社 階調をもつフォトマスクおよびその製造方法
TW200717176A (en) * 2005-09-21 2007-05-01 Dainippon Printing Co Ltd Photo mask having gradation sequence and method for manufacturing the same
JP4834203B2 (ja) * 2005-09-30 2011-12-14 Ｈｏｙａ株式会社 フォトマスクブランクの製造方法及びフォトマスクの製造方法
KR101056592B1 (ko) * 2005-11-16 2011-08-11 호야 가부시키가이샤 마스크 블랭크 및 포토마스크
JP4726010B2 (ja) * 2005-11-16 2011-07-20 Ｈｏｙａ株式会社 マスクブランク及びフォトマスク
JP4516560B2 (ja) * 2005-12-26 2010-08-04 Ｈｏｙａ株式会社 マスクブランク及びフォトマスク
KR101082715B1 (ko) * 2005-12-26 2011-11-15 호야 가부시키가이샤 마스크 블랭크 및 포토마스크
JP2007219038A (ja) * 2006-02-15 2007-08-30 Hoya Corp マスクブランク及びフォトマスク
JP4968709B2 (ja) * 2006-03-17 2012-07-04 Ｈｏｙａ株式会社 グレートーンマスクの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012005524A2 (en) * 2010-07-08 2012-01-12 Lg Innotek Co., Ltd. The printed circuit board and the method for manufacturing the same
WO2012005524A3 (en) * 2010-07-08 2012-04-26 Lg Innotek Co., Ltd. The printed circuit board and the method for manufacturing the same
US9491866B2 (en) 2010-07-08 2016-11-08 Lg Innotek Co., Ltd. Method for manufacturing a printed circuit board

Also Published As

Publication number Publication date
CN101408725A (zh) 2009-04-15
JP2009086381A (ja) 2009-04-23
TWI402611B (zh) 2013-07-21
TW200921266A (en) 2009-05-16
JP4934237B2 (ja) 2012-05-16

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