KR20090030213A - Substrate heat-treating furnace - Google Patents

Abstract

A substrate heat-treating furnace is provided to increase the efficiency of organic matter dissolution by installing a heating unit to one side. A glass substrate(W) is received inside a furnace body(10) performing a heating process. The moisture and the carbon dioxide included in hot air are absorbed(20) by circulating the hot air ejected from the furnace body. An adsorption tower(30), a circulation pan(40) and a main heater(50) are installed on the cycle path. An exhaust line(23) and an air supply line(26) are branched from the cycle path. A gas transmitted from a circulation pan of the cycle path is heated by the main heater and the gas is cleaned up by a main filter(60).

Description

Substrate Heat Treatment {SUBSTRATE HEAT-TREATING FURNACE}

The present invention relates to a substrate heat treatment furnace for heating a glass substrate for a liquid crystal display device, a glass substrate for a plasma display panel (PDP), a substrate for thin electronic components such as a semiconductor wafer (hereinafter, simply referred to as a substrate). It is about.

As one of the manufacturing processes of a color filter, there exists a process of baking the glass substrate which color-coated the ink with inkjet. This firing step proceeds by holding the glass substrate for a predetermined time in an atmosphere of atmosphere in a firing furnace heated to a predetermined firing temperature. In the case of forming metal wiring on the glass substrate, the glass substrate is fired in an inert gas atmosphere such as nitrogen gas in the same firing furnace. In either firing treatment step, many organic substances are generated and diffused into the atmosphere by volatilization, oxidation, and thermal decomposition of organic solvents contained in an object to be baked, such as a color ink on a glass substrate.

Therefore, during the firing process, the clean hot air is continuously blown to the firing furnace, and the exhaust gas is also kept from remaining in the firing furnace. Since a gas containing a large amount of organic matter exhausted from the kiln cannot be discharged to outside air as it is, the organic matter in the exhaust gas is collected by a scrubber or the like.

On the other hand, in view of energy saving, attempts have been made to heat exchange between hot air discharged from the kiln and gas newly supplied to the kiln. In other words, since the amount of heat energy disappeared when the exhaust from the kiln is treated with a scrubber becomes very large and the energy efficiency is poor, the exhaust gas and the newly supplied gas are introduced into the heat exchanger to perform heat exchange therebetween. An attempt is made to retrieve an array of.

When the gas exhausted from the kiln is introduced into the heat exchanger as it is, organic matter adheres to the structure in the heat exchanger, so that clogging of the mesh occurs, so that it is necessary to catalyze the exhaust gas to decompose the organic matter, and then guide the heat exchanger to the heat exchanger. Patent Literature 1 discloses, for example, a technique of inducing a heat exchanger after catalyzing exhaust gas discharged from a furnace.

[Patent Document 1] Japanese Patent Application Laid-Open No. 2001-201271

In the related art, however, in order to reduce the air permeation resistance in the exhaust line, the catalyst is formed of a lattice plate member, so that the contact efficiency between the exhaust gas and the catalyst is low and the decomposition efficiency is reduced. In particular, it was extremely difficult to decompose the organic substance passing in the particle state and the substance which the sublimate solidified. In addition, the decomposition efficiency also decreased due to the temperature decrease of the exhaust gas. For this reason, the decomposition efficiency of the whole organic matter was inevitably low.

Therefore, even if the gas exhausted from the firing furnace of the glass substrate is catalyzed, the organic matter cannot be sufficiently removed. As a result, the heat exchanger is blocked by the deposit in a relatively short time, and thus, the operation rate is low and economical because the continuous operation cannot be performed for a long time. Did.

In view of the above problems, an object of the present invention is to provide a substrate heat treatment furnace capable of decomposing organic matter contained in hot air discharged by heat treatment with high efficiency.

In order to solve the said subject, invention of Claim 1 is the board | substrate heat treatment furnace which heat-processes a board | substrate, The furnace main body part which accommodates a board | substrate inside, and at least one part of the hot air discharged from the said furnace main body part. And a derivation unit for deriving a lower temperature than the hot air, and a filter installed at the derivation unit to support a catalyst, wherein the organic material contained in the hot air derived from the derivation unit is transferred to the filter. It is characterized by decomposing by.

The invention of claim 2 is characterized in that, in the substrate heat treatment furnace of the invention of claim 1, the filter is a metal filter, and a heating means for heating at least one of the filter and hot air introduced into the filter is provided. .

The invention of claim 3 is characterized in that, in the substrate heat treatment furnace of the invention of claim 2, the heating means heats at least one of the filter and the hot air introduced into the filter at 200 ° C to 400 ° C.

The invention of claim 4 is characterized in that, in the substrate heat treatment furnace of the invention of claim 1, at least an enclosure surrounding the furnace body is provided, and the filter is provided outside the enclosure.

The invention of claim 5 is characterized in that the substrate heat treatment furnace of the invention of claim 1 includes at least the furnace body portion and an enclosure surrounding the filter.

In addition, the invention of claim 6 is characterized in that the catalyst comprises a photocatalyst in the substrate heat treatment furnace of the invention of claim 1.

The invention of claim 7 is characterized in that in the substrate heat treatment furnace of claim 6, the photocatalyst comprises titanium oxide.

The invention of claim 8 is further characterized in that the substrate heat treatment furnace of the invention of claim 7 further comprises light irradiation means for irradiating light to the photocatalyst.

The invention of claim 9 is characterized in that, in the substrate heat treatment furnace of the invention of claim 1, the catalyst contains platinum.

In addition, the invention of claim 10 is, in the substrate heat treatment furnace of any one of claims 1 to 9, a circulation path for circulating hot air discharged from the furnace body part and feeding it back to the furnace body part; A circulation fan installed in the path to circulate the hot air, a heating means for a furnace installed in the circulation path to heat the hot air, and a main filter part installed in the circulation path to allow the hot air to pass through, and the derivation part is provided. It is characterized by being branched from the circulation path.

In the invention of claim 11, in the substrate heat treatment furnace of the invention of claim 10, two adsorption towers installed in parallel in the middle of the circulation path and adsorbing carbon dioxide and / or water and either of the two adsorption towers are provided. And switching means for selectively switching the flow path of the hot air so that the hot air passes therethrough, and switching control means for controlling the switching means such that the hot air passes alternately through the two adsorption towers.

The invention of claim 12 is characterized in that in the substrate heat treatment furnace of the invention of claim 10, the hot air outlet of the main filter portion is connected to a hot air supply port of the furnace body portion.

The invention of claim 13 is further characterized in that the substrate heat treatment furnace of the invention of claim 10 further comprises external air supply means for supplying heated outside air to the circulation path.

In addition, the invention of claim 14, in the substrate heat treatment furnace of the invention of claim 10, 10 to 15% of the hot air from the circulation path to the derivation portion, and the rest of the hot air is directed to the main body portion. It is done.

According to a fifteenth aspect of the present invention, in the substrate heat treatment furnace of the tenth aspect, the substrate has a to-be-baked film, and the baked-to-be-baked film is baked inside the furnace body part.

According to a sixteenth aspect of the present invention, in the substrate heat treatment furnace of the fifteenth aspect, the to-be-fired film is a resist coating film, an organic material coating film, or an inkjet coating film.

According to the present invention, since the filter supporting the catalyst is provided in the derivation portion for deriving a part of the hot air, the contact efficiency between the exhausted hot air and the catalyst is increased, and the organic matter on the particles can be collected. The organic matters contained in the hot air discharged can be decomposed with high efficiency.

In particular, according to the invention of claim 2, since a heating means for heating at least one of the filter and the hot air introduced into the filter is provided, the decomposition efficiency of the organic matter by the filter can be further improved.

In particular, according to the invention of claim 4, since the filter is provided outside the housing body surrounding the furnace body part, maintenance of the filter is easy.

In particular, according to the invention of claim 5, since the furnace body portion and the housing surrounding the filter are provided, the filter can be heated by the heat from the furnace body portion, and a special filter reheating means is unnecessary.

In particular, according to the invention of claim 6, since the catalyst supported on the filter includes a photocatalyst, organic matter remaining on the filter can be completely decomposed.

In particular, according to the invention of claim 11, two adsorption towers are provided in parallel in the middle of the circulation path, and the hot air passes through them alternately, so that carbon dioxide and / or water generated by the heat treatment can be removed from the hot air. The substrate heat treatment furnace can be operated continuously for a long time.

In particular, according to the invention of claim 14, since 10 to 15% of the hot air is guided to the deriving part in the circulation path, a running cost associated with the introduction of new external air while fully managing the atmosphere of the circulating hot air. The rise of can be suppressed.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described in detail, referring drawings.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the principal part structure of the board | substrate heat treatment furnace of this invention. This substrate heat treatment is a hot blast furnace that heat-treats a rectangular glass substrate W on which a to-be-fired film such as an inkjet coating film is formed to perform baking treatment of the coating film. The substrate heat treatment furnace includes a furnace main body portion 10 for receiving a glass substrate W therein and performing a heat treatment, a circulation path 20 for circulating hot air, and an adsorption tower 30 for absorbing moisture and carbon dioxide contained in the hot air. And a circulation fan 40, a main heater 50, a main filter 60, a catalyst unit 70 installed in the exhaust line 23, and a heat exchanger 80. Moreover, the control part 90 is provided in the board | substrate heat treatment furnace of this embodiment. In addition, in the structure shown in FIG. 1, the furnace main body part 10, the circulation path 20, the adsorption tower 30, the butterfly damper 31a, 31b, 32a, 32b, and a circulation fan 40, the main heater 50 and the main filter 60 are surrounded by the housing A, and the catalyst unit 70 is provided outside the housing A. As shown in FIG.

The main body part 10 is an optical body which can accommodate the glass substrate W in multiple stages (40 stages in this embodiment). The inside of the furnace main body portion 10 is a heat treatment space having a substantially rectangular pillar shape. A plurality of forks (not shown) are installed on the inner wall surface of the main body part 10. Each fork is struck along the horizontal direction from the inner wall surface of the main body part 10 toward the heat treatment space. have. The shelf of one stage is comprised by the several forks lined along a horizontal direction, and such a shelf is formed of 40 stages. One glass substrate W can be mounted on the shelf of each stage in a horizontal position.

A louver-type shutter 11 is provided on the front side (left side of the page of FIG. 1) of the body main body 10. The shutter 11 is configured by stacking a plurality of louvers in multiple stages. Each louver is provided with an elevating drive mechanism (not shown), and is capable of raising and lowering on the louver. When the transport robot outside the drawing carries out the glass substrate W to and from the body main body 10, the access robot is placed at almost the same height as that of the shelf so that only the portion facing the shelf in front of the carrying out is used as an access opening. Louver rises. In this way, the opening at the time of carrying in / out of the glass substrate W is minimal, and the leakage of the thermal energy by carrying in / out can be minimized. In addition, when driving the louver at the lower portion of the shutter 11, the louver at the upper end of the shutter 11 is driven in conjunction with the louver. Therefore, it is necessary to provide a drive mechanism capable of obtaining an output as large as the lower louver.

The supply port 12 for supplying hot air to the heat processing space inside and the exhaust port 14 for exhausting hot air are provided in the side surface of the furnace main body part 10 facing each other. That is, hot air supplied from one side of the main body part 10 flows into the heat treatment space in the horizontal direction along the surface of the glass substrate W and flows to the opposite side. The supply port 12 and the exhaust port 14 are provided in the height position corresponding to the whole multistage shelf which accommodates the glass substrate W at least in the inner wall surface of the furnace main body part 10. As shown in FIG. For this reason, a homogeneous baking process can be performed by supplying hot air uniformly to the some glass substrate W accommodated in the furnace main body part 10. FIG.

The circulation path 20 communicates the exhaust port 14 and the supply port 12 of the body main body 10, circulates the hot air discharged from the body main body 10, and supplies it back to the body main body 10. It is a passage that can pass through the gas. A suction tower 30, a circulation fan 40, and a main heater 50 are provided in the circulation path 20. In this embodiment, the adsorption tower 30, the circulation fan 40, and the main heater 50 are provided in order from the upstream side of the circulation path 20. As shown in FIG. The upstream side of the circulation path 20 is the side closer to the exhaust port 14 of the body main body 10, and the downstream side is the side closer to the supply port 12.

In addition, an exhaust line 23 and an air supply line 26 branched from the circulation path 20 are formed. The exhaust line 23 is a gas piping path for discharging part of the hot air from the circulation path 20, and the air supply line 26 sucks fresh air (air) in an amount corresponding to the discharged hot air. 20) It is a gas pipe path to supply. The exhaust line 23 and the air supply line 26 branch from the downstream portion of the main heater 50 and the upstream portion of the circulation fan 40 in the circulation path 20, respectively.

In addition, in this embodiment, two adsorption towers 30 and 30 are provided in parallel in the middle of the circulation path 20. That is, a part of the circulation path 20 branches into two flow paths, and an adsorption tower 30 is provided in each of the branched two flow paths. Each adsorption tower 30 is filled with an adsorbent (activated carbon in the present embodiment) that adsorbs carbon dioxide (CO 2) and water (H 2 O). As the hot air flowing through the circulation path 20 passes through the adsorption tower 30, carbon dioxide and moisture are removed from the hot air.

Two adsorption towers 30 and 30 are alternatively used. That is, only one of the two branched flow paths is selectively opened, and the hot air flowing through the circulation path 20 passes only one of the two adsorption towers 30. This flow path switching is performed by four butterfly dampers 31a, 31b, 32a, and 32b. When the butterfly dampers 31a and 31b are opened and the butterfly dampers 32a and 32b are closed, only the adsorption tower 30 on the upper side of FIG. 1 is selectively used. Conversely, when the butterfly dampers 32a and 32b are opened and the butterfly dampers 31a and 31b are closed, only the adsorption tower 30 below the ground of Fig. 1 is selectively used.

The circulation fan 40 is provided with a motor (not shown) and turning vanes, and the motor rotates the turning vanes so that the circulation air flows from the upstream side to the downstream side in the circulation path 20 (in other words, from the exhaust port 14). Air flow directed to the supply port 12).

The main heater 50 heats hot air flowing through the circulation path 20 by generating heat by energization. The main filter 60 is provided immediately near the end point of the circulation path 20, that is, the upstream side of the supply port 12 of the furnace body part 10. Therefore, the hot air outlet of the main filter 60 is connected to the supply port 12 of the furnace body part 10. The main filter 60 is constituted by, for example, a heat-resistant HEPA filter, and passes hot air blown through the circulation path 20 to remove particles contained in the hot air to produce clean hot air.

In the present embodiment, the gas sent out by the circulation fan 40 of the circulation path 20 is heated by the main heater 50 and then purified by the main filter 60 and the furnace body from the supply port 12. The main body 10 is supplied to the heat treatment space inside. Thus, the hot air discharged from the exhaust port 14 of the furnace body part 10 is discharged to the downstream side of the circulation path 20 by the circulation fan 40 after carbon dioxide and water are removed by the adsorption tower 30. do.

By the way, when the glass substrate W is heated, many organic substances generate | occur | produce by volatilizing or oxidizing and thermally decomposing the organic solvent contained in the to-be-baked film (inkjet coating film etc.) on the glass substrate W. Since the airflow of hot air is constantly formed in the inner space of the body part 10, the organic substance which was liberated from the glass substrate W flows from the exhaust port 14 to the circulation path 20 together with the airflow. When the hot air circulation system of the substrate heat treatment furnace is completely closed, the plasticity of the new organic matter is suppressed by a large amount of organic matter, or the main filter 60 is rapidly blocked and deteriorated. Therefore, in the present embodiment, new gas is supplied from the air supply line 26 to the circulation path 20 and exhausted from the circulation path 20 through the exhaust line 23. In addition, during hot air, carbon dioxide and moisture are generated in addition to organic matter.

The exhaust line (drawing section) 23 is connected to the downstream side of the main heater 50 of the circulation path 20. In addition, the other end of the exhaust line 23 is connected in communication with the heat exchanger 80. The flow rate adjusting valve 24 and the catalyst unit 70 are fitted in the path of the exhaust line 23. The flow rate adjusting valve 24 adjusts the exhaust flow rate flowing through the exhaust line 23.

On the other hand, the air supply line 26 is connected to the upstream side (between the adsorption tower 30 and the circulation fan 40) rather than the circulation fan 40 of the circulation path 20. As shown in FIG. The other end of the air supply line 26 is also connected to the heat exchanger 80. The flow rate adjusting valve 27 is fitted in the path of the air supply line 26. The flow rate adjusting valve 27 adjusts the exhaust flow rate flowing through the air supply line 26.

The heat exchanger 80 is a device that performs heat exchange between a gas and a gas, and for example, a heat storage heat exchanger that performs heat exchange by alternately passing air and exhaust air through a rotating heat storage body can be used. The heat exchanger 80 of this embodiment performs heat recovery by transferring heat to the new gas sucked by the air supply line 26 from the heat exhaust which flows through the exhaust line 23. The heat exchanger 80 may alternatively have a low pressure loss such as a multi-stage plate heat exchanger through which gas flows alternately.

The catalyst unit 70 includes a catalyst filter unit 71, a reheat heater 72, and a light source 73. The catalyst filter 71 is made of platinum (Pt) or platinum rhodium (Pt) which functions as a catalyst to a metal filter composed of a metal mesh (in this embodiment, a stainless mesh). -Rh) particles are supported. In addition, in this embodiment, titanium oxide (TiO2) which functions as a photocatalyst is mixed in a part of supported catalyst. The catalyst filter 71 has a function as a catalyst for decomposing organic matter contained in the heat exhaust and a filter for removing particles. In addition, an intermediate layer of alumina (Al 2 O 3) or chromium oxide (Cr 2 O 3) may be formed between the metal filter and the catalyst layer. By providing such a ceramic intermediate layer, the durability and heat resistance of stainless steel can be improved, and the life of a metal filter can be extended.

The reheat heater 72 is a heat source for heating the heat exhaust gas passing through the catalyst unit 70 by generating heat by energization. In the catalyst unit 70, the reheating heater 72 and the catalyst filter part 71 are continuously disposed in this order from the upstream side of the exhaust line 23. Therefore, the heat exhaust heated by the reheat heater 72 immediately flows into the catalyst filter unit 71. In addition, the light source 73 irradiates the catalyst filter 71 with light. The photocatalyst supported on the catalytic filter portion 71 receives catalysis by receiving light from the light source 73.

The configuration of the controller 90 provided in the substrate heat treatment furnace as hardware is the same as that of a general computer. That is, the control unit 90 includes a CPU that performs various calculation processes, a ROM that is a read-only memory for storing basic programs, a RAM that is a free-write memory for storing various kinds of information, a control application, data that stores data, and the like. A disk or the like is provided. The control part 90 is electrically connected with each of four butterfly dampers 31a, 31b, 32a, and 32b, and controls their operation. In addition, the control unit 90 controls each operation mechanism (circulation fan 40, main heater 50, reheating heater 72, light source 73, flow control valves 24, 27) of the entire substrate baking furnace. And the lift drive mechanism of the shutter 11) are also controlled.

Next, the operation details of the substrate heat treatment furnace having the above configuration will be described. First, during the heat treatment, the conveying robot outside the drawing sequentially brings the glass substrate W into the furnace body part 10 at regular intervals, and delivers the glass substrate W to a shelf at a predetermined stage. The glass substrate W mounted on the fork constituting the shelf is heated up to the firing temperature by the hot air from the supply port 12. Thus, the glass substrate W whose predetermined firing time has elapsed in the main body portion 10 is carried out by the transfer robot.

In this embodiment, the square glass substrate W in which the to-be-baked film, such as an inkjet coating film, was formed on the upper surface is heat-processed, and the to-be-baked film is baked. The film to be baked is not limited to an inkjet coating film but may be a resist coating film or an organic coating film. Any of the films to be burned, many organic substances are generated by volatilization or oxidation of the organic solvent contained in the films to be burned on the glass substrate W, and dissipates into the atmosphere in the furnace body portion 10. In addition, some of the moisture and carbon dioxide are generated by the firing treatment. Thus, the thermal atmosphere including the organic matter and the like is discharged from the exhaust port 14 of the furnace body portion 10 as hot air. The hot air discharged from the exhaust port 14 is circulated in the circulation path 20 by the circulation fan 40, heated by the main heater 50, and then passes through the main filter 60 again from the supply port 12. It is supplied to the inside of the furnace body part 10.

Particles and the like included in the hot air circulating in the circulation path 20 are captured by the main filter 60. In addition, the two adsorption towers 30 are provided in parallel in the middle of the circulation path 20, and the hot air flow path has four butterfly dampers 31a, 31b so that only one of them passes therethrough. It is alternatively switched by 32a and 32b. In the adsorption tower 30, moisture and carbon dioxide contained in the hot air generated during firing are adsorbed and removed. Particles and the like are removed by the main filter 60, and moisture and carbon dioxide are removed by the adsorption tower 30, thereby making it possible to clean the hot air circulating in the circulation path 20, and the inside of the furnace body part 10. The atmosphere suitable for the baking process can be formed stably.

In the adsorption tower 30 on which the hot air passes, the adsorption capacity of activated carbon gradually decreases, so that moisture and carbon dioxide are not sufficiently adsorbed and removed. For this reason, the adsorption tower 30 used at an appropriate timing is switched. That is, the control unit 90 controls the opening and closing of the four butterfly dampers 31a, 31b, 32a, and 32b so that the hot air passes through the two adsorption towers 30 alternately. The timing for switching the adsorption tower 30 to be used may be switched when the operation time of the adsorption tower 30 passes a predetermined time, and at a time when the concentration of water vapor or carbon dioxide contained in the hot air exceeds a predetermined value. You may make it switch.

After switching of the adsorption tower 30 to be used is performed, the regeneration process of the adsorption tower 30 used up to then is performed. In the regeneration treatment, for example, a regeneration heater may be provided in the adsorption tower 30 so that activated carbon is heated to desorb water and carbon dioxide adsorbed to restore the adsorption capacity. The temperature control of the heater at this time may be automatically performed by the control unit 90. The regeneration treatment may be performed by simply replacing the activated carbon of the adsorption column 30 with a new one. In addition, this heater, the fan which is necessary external air distribution means, and the regeneration flow path are not shown.

That is, four butterfly dampers 31a, 31b, 32a, and 32b are switched again so that the hot air passes through the adsorption tower 30 where the regeneration process is completed and the adsorption capacity is restored. Then, the reprocessing of one of the adsorption towers 30 is similarly performed. This makes it possible to continuously operate the substrate heat treatment furnace without stopping.

In addition, a part of the hot air circulated in the circulation path 20 flows into the exhaust line 23 and is discharged to the outside. In the present embodiment, the control unit 90 adjusts the flow regulating valves 24 and 27 to induce 10 to 15% of the hot air circulating in the circulation path 20 to the exhaust line 23, The rest is led to the body main body 10. If the hot air discharged from the exhaust line 23 is less than 10%, only the main filter 60 or the adsorption tower 30 cannot manage the atmosphere of the hot air circulated in the circulation path 20 sufficiently, and further, 15% If it exceeds, the running cost according to the new outside air introduction from the air supply line 26 becomes high.

The hot air flowing into the exhaust line 23 is reheated by the reheat heater 72. In the present embodiment, the reheat heater 72 reheats the hot air drawn into the exhaust line 23 to 200 ° C to 400 ° C. Then, the reheated hot air passes through the catalytic filter part 71. Here, instead of heating the hot air, or in addition to the heating of the hot air, the catalyst filter 71 may be heated to 200 ° C to 400 ° C. In this case, the catalyst filter 71 may be heated by induction heating, lamp heating or resistance heating.

As the hot air drawn into the exhaust line 23 passes through the catalytic filter part 71, thermal decomposition and oxidative decomposition of the organic matter contained in the hot air occur simultaneously. Specifically, organic matter is oxidized and decomposed into water and carbon dioxide. In the present embodiment, since the catalyst is supported on the metal filter made of the metal mesh, the contact efficiency of the exhausted hot air and the catalyst is high, and the decomposition efficiency of the organic substance can be increased. In addition, even if the organic material passing in the state of particles in the hot air or a substance in which the sublimate is solidified, since the catalyst filter portion 71 is composed of a metal filter, such a substance is also collected by the catalyst filter portion 71. Will be.

Furthermore, since the hot air reheated at 200 ° C to 400 ° C by the reheat heater 72 flows into the catalyst filter part 71, the catalyst temperature of the catalyst filter part 71 also becomes high temperature, and the organic matter contained in the hot air is It will decompose with high efficiency. That is, by continuously arranging the reheat heater 72 and the catalyst filter part 71 from the upstream side, the temperature drop of the hot air from the reheat heater 72 to the catalyst filter part 71 is suppressed to a minimum, and the catalyst The decomposition efficiency of the filter part 71 is made as high as possible.

The hot air from which the organic matter is removed through the catalyst filter unit 71 flows into the heat exchanger 80. On the other hand, in order to replenish the hot air exhausted through the exhaust line 23, new gas is supplied from the air supply line 26. This newly supplied gas also passes through the heat exchanger 80. In the heat exchanger 80, heat exchange is performed between the hot air discharged from the exhaust line 23 and the gas newly supplied through the air supply line 26. As a result, the temperature of the exhaust gas decreases, and at the same time, the air supply gas is heated to raise the temperature. At this time, since most of the organic matter contained in the hot air discharged from the exhaust line 23 is decomposed, adhesion of the organic matter to the structure in the heat exchanger 80 is very small, preventing clogging of the heat exchanger 80. The heat exchanger 80 can be stably operated for a long time.

The exhaust gas whose temperature has fallen through the heat exchanger 80 is discharged to an external arrangement duct or the like. It is a matter of course that the exhaust gas contains almost no organic matter. On the other hand, the air supply body whose temperature rises through the heat exchanger 80 flows into the circulation path 20 through the flow regulating valve 27. As shown in FIG. Since the newly supplied gas flows upstream than the main heater 50, there is no fear of lowering the temperature of the hot air supplied to the furnace body portion 10, and the supply port 12 is heated after being heated by the main heater 50. ) Is supplied into the interior of the furnace body (10). Thus, if heat exchange can be performed between the air supply body and the exhaust gas using the heat exchanger 80, the energy efficiency of the substrate heat treatment furnace can be increased.

As mentioned above, in this embodiment, since the catalyst filter part 71 which carried the catalyst in the metal filter is provided in the exhaust line 23, the contact efficiency of hot air exhausted and a catalyst becomes high compared with the past, The decomposition efficiency of organic matter can be improved. In addition, it is possible to collect the organic matter on the particle, it is possible to increase the decomposition efficiency of the organic material as a whole. Furthermore, since the hot air flowing into the catalytic filter unit 71 is reheated by the reheating heater 72 to 200 ° C to 400 ° C, the decomposition efficiency of the organic material is further increased, and the hot air discharged from the exhaust line 23 is included. It is able to decompose the organic substance which becomes sure. In addition, since the catalyst unit 70 is provided outside the housing A, maintenance of the catalyst unit 70 including the catalyst filter unit 71 is easy.

In addition, the catalyst unit 70 of the present embodiment includes a light source 73 and includes a photocatalyst in a part of the catalyst supported on the catalyst filter unit 71. When light is irradiated to the catalyst filter unit 71 from the light source 73 at an appropriate timing, the photocatalyst of the catalyst filter unit 71 receives the light and exhibits a catalytic action, and the organic substance remaining on some metal filters remains. Can be decomposed efficiently. That is, a kind of cleaning process can be performed by irradiating the catalyst filter 71 with light from the light source 73. In addition, the catalytic filter may be generated in the catalyst filter 71 using light from an indoor luminaire or the like without providing the light source 73.

As mentioned above, although embodiment of this invention was described, this invention can change variously other than the above-mentioned in the range which does not deviate from the meaning. For example, in the above embodiment, the heat exchanger 80 is provided to perform heat exchange between the heat exhauster and the fresh air to be newly supplied, but the catalyst unit 70 is provided in the exhaust line not provided with the heat exchanger 80. ) May be installed. Even in this case, the organic matter contained in the hot air exhausted by the heat treatment can be decomposed with high efficiency. In other words, when a metal filter supporting a catalyst is arranged in a lead-out portion which leads at least a part of the hot air discharged from the body main body 10 to a couple having a temperature lower than the hot air, organic matter contained in the hot air discharged can be efficiently Can be disassembled.

Further, all of the catalysts supported on the catalyst filter unit 71 may be photocatalysts. In this case, when the hot air is discharged from the exhaust line 23, light is always irradiated to the catalyst filter 71 from the light source 73.

In addition, the catalyst may be supported on the sintered ceramic filter in place of the metal filter of the catalyst filter unit 71.

In addition, in the said embodiment, although activated carbon is used as an adsorbent of the adsorption tower 30, it is not limited to this, What is necessary is just a material which adsorbs carbon dioxide and / or water, For example, a silica gel or a zeolite (zeolite) may be used.

The heat exchanger 80 is not limited to a heat storage heat exchanger, and may be a plate heat exchanger or the like having a flow path through which supply / exhaust passes alternately.

The number of glass substrates W that can be accommodated in the furnace body portion 10 of the substrate firing furnace is not limited to 40, but can be any number.

In addition, as shown in FIG. 2, together with the furnace body portion 10, the adsorption tower 30, the circulation fan 40, the main heater 50, and the main filter 60, the catalyst unit 70 is provided with a common body ( It may be cheap in two. In this way, since the catalyst filter part 71 can be heated by the heat from the furnace main body part 10, the reheat heater 72 becomes unnecessary. In addition, the remaining structure in FIG. 2 is the same as that of FIG.

 In addition, the board | substrate which becomes an object of baking process by the board | substrate heat processing furnace which concerns on this invention is not limited to the glass substrate W, A semiconductor wafer may be sufficient.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the principal part structure of the board | substrate heat treatment furnace of this invention.

2 is a diagram illustrating another example of the constitution of the main part of the substrate heat treatment furnace.

<Explanation of Codes>

10 Headquarters

20 Circulation Paths

23 Exhaust Line

24, 27 Flow control valve

26 Supply Line

30 adsorption tower

31a, 31b, 32a, 32b Butterfly Damper

40 circulation fan

50 main heater

60 Main Filter

70 catalyst unit

71 catalytic filter

72 reheat heater

73 light source

80 heat exchanger

90 control unit

Claims (16)

A substrate heat treatment furnace for heating a substrate, A body unit for accommodating a substrate therein; A derivation unit for deriving at least a portion of the hot air discharged from the furnace body part into a portion having a lower temperature than the hot air; It is provided in the derivation unit, and provided with a filter for supporting the catalyst Substrate heat treatment furnace, characterized in that the organic material contained in the hot air to be led to the derivation unit is decomposed by the filter. The method of claim 1, The filter is a metal filter, And a heating means for heating at least one of the filter and the hot air introduced into the filter. The method of claim 2, And said heating means heats at least one of said filter and hot air introduced into said filter at 200 ° C to 400 ° C. The method of claim 1, A substrate heat treatment furnace, comprising: an enclosure surrounding at least the furnace body portion, wherein the filter is provided outside the enclosure. The method of claim 1, And at least the furnace body surrounding the furnace body portion and the filter. The method of claim 1, The catalyst is a substrate heat treatment furnace, characterized in that it comprises a photocatalyst. The method of claim 6, The photocatalyst is a substrate heat treatment furnace comprising titanium oxide. The method of claim 7, wherein And a photoirradiation means for irradiating light to the photocatalyst. The method of claim 1, The catalyst is a substrate heat treatment furnace, characterized in that it comprises platinum. The method according to any one of claims 1 to 9, A circulation path for circulating the hot air discharged from the furnace body part and supplying it back to the furnace body part; A circulation fan installed in the circulation path to circulate hot air; A heating means for a furnace installed in the circulation path to heat hot air; It is provided on the circulation path and provided with a main filter for passing hot air, And the lead-out part is branched from the circulation path. The method of claim 10, Two adsorption towers installed in parallel along the circulation path and adsorbing carbon dioxide and / or water; Switching means for selectively switching the flow path of the hot air so that the hot air passes through either one of the two adsorption towers; And a switching control means for controlling the switching means so that the hot air passes through the two adsorption columns alternately. The method of claim 10, And a hot air outlet of the main body portion is connected to a hot air outlet of the main body portion. The method of claim 10, Substrate heat treatment furnace further comprises an external air supply means for supplying the heated outside air to the circulation path. The method of claim 10, 10 to 15% of the hot air from the circulation path to the lead-out portion, the substrate heat treatment furnace, characterized in that to guide the remainder of the hot air to the furnace body portion. The method of claim 10 The substrate has a to-be-baked film, The substrate heat treatment furnace, wherein the fired film is baked in the furnace body portion. The method of claim 15, The fired substrate is a substrate heat treatment furnace, characterized in that the resist coating film, organic coating film or inkjet coating film.

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