KR20090008454A - 상대반사율 측정을 사용한 반사율계의 정확한 보정 방법 및기구 - Google Patents
상대반사율 측정을 사용한 반사율계의 정확한 보정 방법 및기구 Download PDFInfo
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- KR20090008454A KR20090008454A KR1020087029592A KR20087029592A KR20090008454A KR 20090008454 A KR20090008454 A KR 20090008454A KR 1020087029592 A KR1020087029592 A KR 1020087029592A KR 20087029592 A KR20087029592 A KR 20087029592A KR 20090008454 A KR20090008454 A KR 20090008454A
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Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
- G01N21/274—Calibration, base line adjustment, drift correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Biochemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/418,827 | 2006-05-05 | ||
| US11/418,846 | 2006-05-05 | ||
| US11/418,846 US7511265B2 (en) | 2004-08-11 | 2006-05-05 | Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement |
| US11/418,827 US7282703B2 (en) | 2004-08-11 | 2006-05-05 | Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20090008454A true KR20090008454A (ko) | 2009-01-21 |
Family
ID=38668211
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020087029592A Withdrawn KR20090008454A (ko) | 2006-05-05 | 2007-04-25 | 상대반사율 측정을 사용한 반사율계의 정확한 보정 방법 및기구 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2009536354A (enExample) |
| KR (1) | KR20090008454A (enExample) |
| WO (1) | WO2007130295A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170102264A (ko) * | 2014-12-22 | 2017-09-08 | 엔디씨 테크놀로지스 리미티드 | 다공성 필름의 측정 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8564780B2 (en) | 2003-01-16 | 2013-10-22 | Jordan Valley Semiconductors Ltd. | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces |
| US7126131B2 (en) | 2003-01-16 | 2006-10-24 | Metrosol, Inc. | Broad band referencing reflectometer |
| US7511265B2 (en) * | 2004-08-11 | 2009-03-31 | Metrosol, Inc. | Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement |
| US7804059B2 (en) | 2004-08-11 | 2010-09-28 | Jordan Valley Semiconductors Ltd. | Method and apparatus for accurate calibration of VUV reflectometer |
| US7663097B2 (en) * | 2004-08-11 | 2010-02-16 | Metrosol, Inc. | Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement |
| US20080129986A1 (en) | 2006-11-30 | 2008-06-05 | Phillip Walsh | Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations |
| US8867041B2 (en) | 2011-01-18 | 2014-10-21 | Jordan Valley Semiconductor Ltd | Optical vacuum ultra-violet wavelength nanoimprint metrology |
| US8565379B2 (en) | 2011-03-14 | 2013-10-22 | Jordan Valley Semiconductors Ltd. | Combining X-ray and VUV analysis of thin film layers |
| JP2022147223A (ja) * | 2021-03-23 | 2022-10-06 | 大塚電子株式会社 | 光学測定システム、光学測定方法および測定プログラム |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3751643A (en) * | 1972-05-23 | 1973-08-07 | Ibm | System for performing spectral analyses under computer control |
| US4029419A (en) * | 1975-10-10 | 1977-06-14 | International Business Machines Corporation | Textile color analyzer calibration |
| JPH0521566A (ja) * | 1991-07-12 | 1993-01-29 | Dainippon Screen Mfg Co Ltd | 半導体結晶におけるイオン注入量測定方法 |
| US5408322A (en) * | 1993-04-26 | 1995-04-18 | Materials Research Corporation | Self aligning in-situ ellipsometer and method of using for process monitoring |
| JP2001165628A (ja) * | 1999-12-13 | 2001-06-22 | Sharp Corp | 膜厚測定装置 |
| US6525829B1 (en) * | 2001-05-25 | 2003-02-25 | Novellus Systems, Inc. | Method and apparatus for in-situ measurement of thickness of copper oxide film using optical reflectivity |
| US7126131B2 (en) * | 2003-01-16 | 2006-10-24 | Metrosol, Inc. | Broad band referencing reflectometer |
-
2007
- 2007-04-25 KR KR1020087029592A patent/KR20090008454A/ko not_active Withdrawn
- 2007-04-25 WO PCT/US2007/010003 patent/WO2007130295A2/en not_active Ceased
- 2007-04-25 JP JP2009509605A patent/JP2009536354A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170102264A (ko) * | 2014-12-22 | 2017-09-08 | 엔디씨 테크놀로지스 리미티드 | 다공성 필름의 측정 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007130295A2 (en) | 2007-11-15 |
| WO2007130295A3 (en) | 2009-02-26 |
| JP2009536354A (ja) | 2009-10-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20081203 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| N231 | Notification of change of applicant | ||
| PN2301 | Change of applicant |
Patent event date: 20100504 Comment text: Notification of Change of Applicant Patent event code: PN23011R01D |
|
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |