KR20080076569A - Process chamber structure for device manufacturing fpd - Google Patents

Process chamber structure for device manufacturing fpd Download PDF

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Publication number
KR20080076569A
KR20080076569A KR1020070016682A KR20070016682A KR20080076569A KR 20080076569 A KR20080076569 A KR 20080076569A KR 1020070016682 A KR1020070016682 A KR 1020070016682A KR 20070016682 A KR20070016682 A KR 20070016682A KR 20080076569 A KR20080076569 A KR 20080076569A
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KR
South Korea
Prior art keywords
chamber
process chamber
tray
flat panel
panel display
Prior art date
Application number
KR1020070016682A
Other languages
Korean (ko)
Inventor
손형규
Original Assignee
주식회사 에이디피엔지니어링
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 에이디피엔지니어링 filed Critical 주식회사 에이디피엔지니어링
Priority to KR1020070016682A priority Critical patent/KR20080076569A/en
Publication of KR20080076569A publication Critical patent/KR20080076569A/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames

Abstract

A process chamber structure of a device for manufacturing FPD devices is provided to enhance productivity by processing lots of substrates using a multi layered process chamber. A process chamber structure of a device for manufacturing FPD(Flat Panel Display) devices includes a chamber frame(70), plural process chambers(60), and a chamber carrying unit(80). The chamber frame is formed by a multi layered structure. The process chambers positioned at respective layers of the chamber frame are to perform a surface treatment on substrates. The chamber carrying unit formed to slide through opened portions of the chamber frame moves the process chambers from the chamber frame as drawers.

Description

Process chamber structure for flat panel display device manufacturing apparatus

1 is a schematic perspective view showing a typical flat panel display device manufacturing apparatus;

2 is a plan view showing a conventional flat panel display device manufacturing apparatus;

3 is a block diagram of a conventional flat panel display device manufacturing apparatus seen from the line A-A of FIG.

4 is a cross-sectional configuration of the B-B line direction of FIG.

5 is a plan view showing a flat panel display device manufacturing apparatus equipped with a process chamber according to the present invention;

6 is a configuration diagram in the C-C line direction of FIG.

7 is a configuration diagram showing a separation state of the process chamber shown in FIG.

8 is a schematic cross-sectional view taken along the line D-D of FIG. 7;

9 is a cross-sectional configuration of the E-E line direction of FIG.

FIG. 10 is a cross-sectional view illustrating a separation state of the process chamber illustrated in FIG. 9.

<Explanation of symbols for the main parts of the drawings>

50: load lock chamber 55: conveying chamber

60, 60A, 60B: process chamber 61: lift pin module

62: vacuum pumping line 63: gate slit

64: gate device 65: gate passage

66: flange portion 67: fastening member

68: gate valve 70: chamber frame

71: vertical support 73: export support

75: horizontal support 80: chamber ejection mechanism

81: chamber tray 83: roller

85: tray support 86: roller

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat panel display device manufacturing apparatus, and more particularly, to a process chamber structure of a flat panel display device manufacturing apparatus in which the process chamber is configured in a multilayer structure and the process chamber for repair and the like is easily made.

In general, a device for manufacturing a semiconductor or a flat panel display is provided with a chamber for performing surface treatment of a substrate (semiconductor wafer, glass, etc.), and the substrate is brought in or taken out of the chamber. In order to provide a transport robot for transporting the substrate, the chamber is provided with a gate slit (Gate Slit), which is an entrance / exit for entrance / export of the substrate, to be opened and closed by a gate valve.

The chamber, the transfer robot, and the gate valve are applied in a similar manner to the semiconductor or flat panel display device manufacturing apparatus. Hereinafter, the chamber, the transfer robot, the gate valve, and the related matters are related to the flat panel display device manufacturing apparatus. Let's take a look at what is applied to.

The flat panel display devices include liquid crystal displays, plasma display panels, and organic light emitting diodes.

The flat panel display device manufacturing apparatus for manufacturing such a flat panel display device is mainly a vacuum processing method, the flat panel display device manufacturing apparatus is an in-line type (In-Line type) in order to reduce the tact time for productivity improvement ) Is changing from cluster type to cluster type.

The cluster type is a flat panel display device manufacturing apparatus configured to process two or more process chambers by connecting two or more process chambers to one load lock chamber to be described below.

 1 to 3, a brief description will be made of a cluster type flat panel display device manufacturing apparatus.

The flat panel display device manufacturing apparatus includes a load lock chamber 10 which receives an unprocessed substrate from the outside and stores the processed substrate S to the outside, and a substrate loaded from the load lock chamber 10. A process chamber 20 for processing a substrate such as surface treatment using a plasma or the like in a vacuum atmosphere, and a substrate S disposed between the process chamber 20 and the load lock chamber 10. ) Is transferred to the process chamber 20 or vice versa, the transfer chamber (Transfer Chamber) (30) that serves as a stopover.

Here, a transport robot for transporting the substrate to the load lock chamber 10 and the process chamber 20 is installed in the transport chamber 30.

In particular, a gate device 40 is connected between the process chamber 20 and the transfer chamber 30 for carrying in / out of the substrate.

FIG. 4 is a plan sectional view showing the internal structure of the gate device 40. The gate device 40 is formed in a substantially rectangular cylindrical structure so that the gate slit 22 and the transfer chamber 30 of the process chamber 20 are formed. And a gate cylinder 41 for connecting the outside of the transfer passage, and a gate valve 45 provided in the gate cylinder 41 to open and close both the gate slits 22 and the transfer passage, respectively.

Therefore, when carrying in the substrate S to be processed into the process chamber 20, the gate valve 45 is opened to open the gate slit 22. At this time, the transfer robot provided in the transfer chamber 30 transfers the substrate from the load lock chamber 10, inserts the substrate into the process chamber 20 through the gate slit 22, and then returns to the transfer chamber 30 again. do.

After processing the substrate loaded into the process chamber 20, the gate slit 22 is closed as the gate valve 45 is closed to form a vacuum atmosphere in the process chamber 20.

However, the flat panel display device manufacturing apparatus provided with the conventional process chamber as described above is composed of the process chamber 20 is installed in one frame or support structure 25 one by one in a limited space more than a predetermined time A problem arises in that it is difficult to process a large amount of substrates, and in particular, there is a limit in shortening a tact time, that is, a substrate processing process time, and thus a difficulty in increasing productivity.

In addition, in the conventional process chamber, as shown in FIG. 4, since the gate bracket 43 supporting the gate cylinder 41 is assembled and fixed with the bolt 44 inside the process chamber 20, the process chamber 20 In the case of separation for repair, etc., there is also a troublesome problem of dismantling and separating the bolt 44 after separating the upper plate of the process chamber 20.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a process chamber structure of a flat panel display device manufacturing apparatus capable of processing a larger amount of substrate in a limited space by forming a process chamber in a multilayer structure. have.

In another aspect, the present invention is to provide a process chamber structure of a flat panel display device manufacturing apparatus that can be easily assembled and disassembled for repair, etc. by configuring the process chamber in a drawer type and can be easily separated from the gate device There is a purpose.

The process chamber structure of the flat panel display device manufacturing apparatus according to the present invention for realizing the above object is a chamber frame having a multi-layer structure; A plurality of process chambers located within each layer of the chamber frame to process the surface of the substrate therein; It is characterized in that it comprises a chamber carrying mechanism which is slidably installed in the inward and outward direction through the open portion of the chamber frame to move the process chamber from the chamber frame in a drawer type.

Here, the chamber frame is connected to a plurality of vertical supports vertically erected to the edge portion of the process chamber, and horizontally between the plurality of vertical supports to divide each layer and support the chamber ejection mechanism to be slidable. It is preferable to include a horizontal support.

Each of the process chambers is connected through a gate device between a transfer chamber for transferring the substrate from or to the load lock chamber for loading and unloading the substrate.

In this case, the gate device is provided with a gate passage between each of the process chamber and the transfer chamber, the process chamber and the gate passage is configured to be assembled and disassembled by mutually coupling the fastening member on the outside of the process chamber. Do.

More preferably, the gate passage is formed with a flange portion extending outwardly in a portion fixed to the process chamber, and the fastening member is coupled inwardly of the process chamber at an outer side of the flange portion so that the gate passage and the process chamber are formed. Can be configured to assemble with each other.

The chamber discharging mechanism includes a chamber tray on which each process chamber is mounted, and a tray support for supporting the chamber tray vertically connected to the floor from the chamber tray, as well as being slidably coupled to the chamber frame. It is desirable to be.

At this time, the chamber discharge mechanism, it is preferable that the tray tray positioned in the vertical direction and the chamber tray located in the horizontal direction, is configured to have a 'b' shaped side structure.

Preferably, a roller is provided between the chamber tray and the chamber frame to move in a rolling motion when the chamber tray is moved.

In addition, it is preferable that a roller is installed at the lower end of the tray support.

Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

5 is a plan view showing a flat panel display device manufacturing apparatus equipped with a process chamber according to the present invention. 6 and 7 are schematic views of the C-C line direction of FIG. 5, FIG. 6 is a view illustrating a process chamber coupling state, and FIG. 7 is a view illustrating a separation state of the process chamber.

FIG. 8 is a schematic cross-sectional view of the DD line direction of FIG. 7, and FIGS. 9 and 10 are cross-sectional configuration views of the EE line direction of FIG. 6, FIG. 9 is a view showing a process chamber coupling state, and FIG. 10 is a process Figure showing the separation state of the chamber.

As shown therein, the apparatus for manufacturing a flat panel display device having a process chamber structure according to the present invention includes a load lock chamber 50 which receives an untreated substrate from the outside and stores the processed substrate or leaves the processed substrate to the outside. A process chamber 60 for processing the substrate by subjecting the substrate loaded from the load lock chamber 50 to a plasma or the like under a vacuum atmosphere, the process chamber 60 and It is composed of a transfer chamber (55) which is installed between the load lock chamber (50) and serves as a waypoint in bringing the substrate into the process chamber (60) or vice versa using a transfer robot.

In the drawing of the embodiment of the present invention, a cluster type flat panel display device manufacturing apparatus in which one load lock chamber 50 and three process chambers 60 are formed in a cross structure around the transfer chamber 55. Is shown. However, the process chamber structure of the present invention is not necessarily limited to the cluster type, and is applicable to a flat panel display device manufacturing apparatus having another arrangement structure such as an in-line type.

Hereinafter, the process chamber structure, which is a main feature of the present invention, will be described in detail.

The process chamber 60 is arranged in a multi-layer structure through a chamber frame (Chamber frame) 70. That is, a plurality of chamber frames 70 are positioned around the transfer chamber 55, and a plurality of process chambers 60 are supported and disposed on each chamber frame 70.

In the drawing, three chamber frames 70 are disposed at a 90 degree angle with respect to the conveying chamber 55, and two process chambers 60 are disposed in each chamber frame 70. Of course, such an arrangement structure of the chamber frames 70 and the number of process chambers 60 arranged in each of the chamber frames 70 in a multi-layer structure are examples of the configuration of the preferred embodiment of the present invention. The number and arrangement of the chamber frame 70 may be different, or the number of process chambers 60 included in each chamber frame 70 may be configured to three or more.

The main components constituting the process chamber structure according to the present invention as described above will be described in detail.

First, at least one side of the chamber frame (Chamber frame) 70 is configured to have a multi-layer structure, the chamber frame 70 is a plurality of vertically supported on the edge portion of the process chamber 60 is supported on the floor It is composed of a vertical support 71 and a horizontal support 75 connected in the horizontal direction between the plurality of vertical supports 71 to divide each layer and to support the process chamber 60.

In the present embodiment, four vertical supports 71 are installed at each corner of the process chamber 60, one at a time, and the horizontal supports 75 are formed at the bottom of each layer on both left and right sides of the chamber frame 70. It is connected and configured. Of course, the horizontal support 75 is preferably configured to be connected to the front and rear of the chamber frame 70 as well as both the left and right sides.

The height of each layer in the chamber frame 70 is a lift pin module 61 and a vacuum pumping line facility 62 capable of elevating the substrate to the lower space of the process chamber 60. ) Is preferably configured to have a space such that it can be installed. That is, the height of the process chamber 60, in addition to the lift pin module 61 and the vacuum pumping line 62 and other equipment is preferably made to have a space to be connected.

On the other hand, the chamber frame 70 is supported so that the process chamber 60 can be moved back and forth while sliding in a drawer manner, a detailed description thereof will be described when describing the chamber carrying mechanism 80 to be described below.

Next, as described above, the process chamber 60 is a chamber which is located in each layer of the chamber frame 70 and processes the surface of the substrate supplied from the load lock chamber 50 or the like therein.

Since the internal structure of such a process chamber 60 is already well known, a description thereof will be given on the construction of a gate device 64 that facilitates the separation and coupling of the process chamber 60, while omitting the life thereof. do.

Each process chamber 60 is connected via a gate device 64 between the transfer chamber 55, which transfers the substrate from or to the load lock chamber 50 for loading and unloading of the substrate. The gate device 64 is provided in the gate passage 65 between the process chamber 60 and the transfer chamber 55 and the gate slit of the transfer chamber 55 and the process chamber 60. A gate valve 68 that opens and closes 63 is provided.

In particular, the process chamber 60 and the gate passage 65 are assembled to each other by coupling fastening members 67 such as bolts to the outside of the process chamber 60 so that they can be easily disassembled and assembled from the outside of the process chamber 60. And disassembled.

That is, referring to FIGS. 9 and 10, the gate passage 65 includes a flange portion 66 extending outwardly at a portion fixed to the process chamber 60, and the fastening member ( 67 is fastened in the inward direction of the process chamber 60 from the outside of the flange portion 66 is configured to assemble the gate passage 65 and the transfer chamber 55 to each other.

At this time, the flange portion 66 is directly formed in the cylinder constituting the gate passage 65, and can be assembled to the process chamber 60 through fastening members 67 such as bolts directly. In the state in which a gate bracket (not shown) is inserted between the process chamber 60 and the process chamber 60, a configuration in which the fastening member 67 is assembled may be possible.

Next, the process chamber 60 needs to be repaired separately from the transfer chamber 55, that is, the gate passage 65, for repair, and the like, and the process chamber 60 is moved to the chamber frame 70 by a drawer method. It is provided with a chamber carrying mechanism 80 to be put into or taken out.

That is, the chamber discharging mechanism 80 is slidably installed in and outward through the open portion of the chamber frame 70 so as to move the process chamber 60 from the chamber frame 70 in a drawer type. The configuration is a chamber tray 81 which is positioned in the horizontal direction and slidably coupled to the chamber frame 70 and on which the process chamber 60 is mounted, It is preferably configured to include a tray (Tray) support (85) which is connected vertically from the chamber tray 81 to the bottom to support the chamber tray (81).

Here, the chamber tray 81 may be slidably installed on the carrying support 73 installed in the front and rear direction in the chamber frame 70 as shown in FIG. 8.

In particular, the tray support (Chamber Tray) 85 is preferably connected in a vertical direction from the front of the chamber tray 81 to the bottom so that the chamber ejection mechanism 80 has an overall 'b' shaped side structure. Such a configuration allows the process chamber 60 to have a significant load when the chamber ejection mechanism 80 is pulled forward from the chamber frame 70 to separate the process chamber 60 as indicated by the hidden line in FIG. 7. It is intended to be configured to be sufficiently supported.

On the other hand, between the chamber tray 81 and the chamber frame 70, as shown in Figure 8 is preferably provided with a roller 83 for rolling movement when the chamber tray 81 is moved, and also in Figure 7 and Likewise, the roller 86 is preferably installed at the lower end of the tray support 85.

The chamber discharging mechanism 80 is not limited to the above-described configuration as long as the chamber discharging mechanism 80 can pull the process chamber 60 forward by a drawer or the like while supporting the process chamber 60. In particular, the sliding structure with the chamber frame 70 of the configuration of the chamber tray 81 may be configured by adopting a variety of known sliding structure in addition to the roller structure.

In addition, although only the carrying out structure of the upper process chamber 60A is illustrated in FIG. 7, the lower process chamber 60B also forms the chamber discharging mechanism 80 with the same structure as described above, so that the process chamber 60 may be pulled out. It can be configured as a structure that separates or combines.

In the process chamber structure of the flat panel display device manufacturing apparatus according to the present invention configured as described above, two process chambers (60A, 60B) are provided in one chamber frame 70, that is, two substrates, At the same time, since the surface treatment of the substrate can be performed in the state put into each process chamber 60, the number of substrate treatments per unit area can be increased, thereby reducing the tact time and contributing to productivity improvement.

In addition, in order to repair each process chamber 60, as shown in FIG. 9, the process chamber 60 is assembled by the fastening member 67 to the gate passage 65, as shown in FIG. After removing the fastening member 67 as described above, when the drawer is moved using the chamber ejection mechanism 80, the process chamber 60 can be easily repaired and separated.

That is, in the state in which a plurality of process chambers 60 are arranged up and down in one chamber frame 70, it may be difficult to repair and check each process chamber 60, but as in the present invention, the process chamber 60 After the fastening member 67 is easily detached from the outside of the panel, the process chamber 60 can be easily moved from the inner space of the chamber frame 70 to the outer space by using the chamber ejection mechanism 80 having a drawer structure. Repairs and checks can be carried out.

After the process chamber 60 has been repaired and inspected, the process chamber 60 is placed on the chamber ejection mechanism 80, and then pushed back into the chamber frame 70, and then, outside the process chamber 60. Since the fastening member 67 may be inserted into the gate passage 65, the reassembly of the process chamber may be easily performed.

The process chamber structure of the flat panel display device manufacturing apparatus according to the present invention constructed and operated as described above can process a larger amount of substrates in a limited working space because the process chamber is composed of a multilayer structure. There is an advantage to improve productivity.

In addition, the present invention is configured to be separated from the process chamber in the drawer method, and in addition to being configured to be easily separated from the gate device (Gate device) when disassembly and assembly of the process chamber, it is more convenient There is also an advantage that can be easily made.

Claims (9)

A chamber frame having a multilayer structure; A plurality of process chambers located within each layer of the chamber frame to process the surface of the substrate therein; Process chamber structure of the flat panel display device manufacturing apparatus characterized in that it comprises a chamber carrying mechanism which is slidably installed in the inward and outward direction through the open portion of the chamber frame to move the process chamber from the chamber frame to the drawer type . The method according to claim 1, The chamber frame includes a plurality of vertical supports which are erected vertically on the edge portion of the process chamber and horizontally connected between the plurality of vertical supports to divide each layer and to support the chamber discharging mechanism to be slidable. Process chamber structure of a flat panel display device manufacturing apparatus comprising a support. The method according to claim 1, Wherein each of the process chambers is connected through a gate device between a transfer chamber for transferring the substrate from the load lock chamber to the load lock chamber for loading and unloading of the substrate. The method according to claim 3, The gate device is provided with a gate passage between each process chamber and the transfer chamber, The process chamber structure of the flat panel display device manufacturing apparatus, characterized in that the process chamber and the gate passage is configured to be assembled and disassembled by coupling the fastening member on the outside of the process chamber. The method according to claim 4, The gate passage is formed with a flange portion extending outward in a portion fixed to the process chamber, And the fastening member is coupled to an inner direction of the process chamber at an outer side of the flange portion to assemble the gate passage and the process chamber to each other. The method according to any one of claims 1 to 5, The chamber carrying mechanism is slidably coupled to the chamber frame and includes a chamber tray on which each process chamber is mounted, and a tray support supporting the chamber tray vertically connected to the bottom from the chamber tray. Process chamber structure of a flat panel display device manufacturing apparatus. The method according to claim 6, The chamber discharging mechanism is a process chamber structure of a flat panel display device manufacturing apparatus, characterized in that the chamber tray located in the horizontal direction and the tray support in the vertical direction is configured to have a 'b' side structure. The method according to claim 6, The process chamber structure of the flat panel display device manufacturing apparatus, characterized in that between the chamber tray and the chamber frame is provided with a roller for rolling movement when the chamber tray is moved. The method according to claim 6, Process chamber structure of a flat panel display device manufacturing apparatus characterized in that the roller is installed on the lower end of the tray support.
KR1020070016682A 2007-02-16 2007-02-16 Process chamber structure for device manufacturing fpd KR20080076569A (en)

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KR1020070016682A KR20080076569A (en) 2007-02-16 2007-02-16 Process chamber structure for device manufacturing fpd

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