KR101898065B1 - Substrate transfer module - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing system, and more particularly, to a substrate transfer module for use in a substrate processing system that performs substrate processing while keeping the mask in close contact with the substrate.
The present invention relates to a substrate transfer module for use in a substrate processing system for carrying out a substrate processing in a state in which a mask is in close contact with a substrate, wherein a first gate and one or more second gates are formed facing each other and form an inner space isolated from the outside A vacuum chamber; A pair of conveyance body support portions installed in the vacuum chamber and directly or indirectly supporting the mask when introducing or discharging the mask into the vacuum chamber through the second gate; A substrate support assembly installed in the vacuum chamber to support a substrate introduced through the first gate; A mask supporting part installed in the vacuum chamber and supporting the mask to move up and down; And an aligner portion for aligning the substrate and the mask by a relative movement between the mask supported by the mask support portion and the substrate supported by the substrate support assembly, wherein the substrate support assembly is movable upward and downward And a linear driving unit for linearly driving the plurality of lift pins in an up-and-down direction.

Description

[0001] Substrate transfer module [0002]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing system, and more particularly, to a substrate transfer module installed in a substrate processing system that performs substrate processing while a mask is in close contact with a substrate.

A flat panel display is typically a liquid crystal display, a plasma display panel, or an organic light emitting diode.

Of these, organic light emitting devices have advantages such as fast response speed, lower power consumption than conventional liquid crystal display devices, high brightness and light weight, and the advantage of being able to be made ultra thin by not requiring a separate back light device And has been attracting attention as a next-generation display device.

As a general method of forming a thin film on a substrate of a flat panel display device, there are evaporation, physical vapor deposition (PVD) such as ion plating and sputtering, And chemical vapor deposition (CVD). Among them, a vapor deposition method can be used for forming a thin film such as an organic material layer, an inorganic material layer, etc. of an organic light emitting device.

In the above-described substrate processing methods, a substrate having one or more openings formed therein may be brought into close contact with the substrate to perform the substrate processing.

Here, the mask has various configurations as a structure for performing substrate processing in a predetermined pattern on the substrate or for preventing sagging of the substrate.

On the other hand, the substrate processing system for performing the substrate processing in a state in which the mask is in close contact with the substrate includes a process of introducing the substrate between the mask and the mask holder, a process of aligning the mask and the substrate, a process of aligning the mask, Subsequently, substrate processing is performed.

Here, in the case of using the evaporation deposition method, an evaporation source in which the evaporation material is evaporated is installed on the lower side of the vacuum chamber, and the substrate processing surface of the substrate is disposed toward the evaporation source, that is, the lower side.

Therefore, the alignment process of the mask and the substrate must be performed by relative movement between the substrate and the mask. Therefore, the gap between the substrate and the mask must be maintained for the alignment, and the substrate needs to be supported by the lift pins have.

It is an object of the present invention to provide a substrate processing system which recognizes the above necessity and in which a substrate processing is performed in a state in which a mask is in close contact with a substrate, a lift pin penetrates the mask to align the mask and the substrate, To a substrate transfer module capable of aligning the mask and the substrate more efficiently.

In order to achieve the above object, the present invention provides a substrate transfer module for use in a substrate processing system for performing a substrate processing in a state in which a mask is in close contact with a substrate, A vacuum chamber formed above the second gates to face each other and forming an inner space isolated from the outside; A pair of conveyance body support portions installed in the vacuum chamber and directly or indirectly supporting the mask when introducing or discharging the mask into the vacuum chamber through the second gate; A substrate support assembly installed in the vacuum chamber to support a substrate introduced through the first gate; A mask supporting part installed in the vacuum chamber and supporting the mask to move up and down; And an aligner portion for aligning the substrate and the mask by a relative movement between the mask supported by the mask support portion and the substrate supported by the substrate support assembly, wherein the substrate support assembly is movable upward and downward And a linear driving unit for linearly driving the plurality of lift pins in an up-and-down direction.

The lift pin is preferably smaller in diameter than a connecting portion connected to the linear driving portion, the outer diameter of the moving portion moving up and down through the mask from the end portion supporting the substrate.

Wherein the second gate comprises an introduction gate into which the mask is introduced, and a mask which is aligned with the substrate by the aligner, is moved upward by the mask support, and then the substrate and the mask holder are sequentially brought into close contact with each other, As shown in FIG.

The mask is introduced through the second gate in engagement with the mask holder and the substrate transfer module includes a mask holder separator for separating the mask holder from the mask so that a substrate is introduced between the mask holder and the mask .

The pair of conveyed body support portions may be installed to move up and down in the vacuum chamber.

Wherein the pair of conveyed body support portions are provided as an upper conveyed body support portion and a lower conveyed body support portion in correspondence with the introduction gate and the discharge gate respectively and the upper conveyed body support portion supports the mask And may be installed to be movable in the width direction in order to prevent interference when being moved to be transferred to the lower conveyed body part.

The mask may be formed with a through hole through which the lift pin penetrates in a portion where the mask is not opened.

The mask may have a portion of the surface of the substrate that is not open at a position corresponding to the portion to be cut after the substrate is processed.

The through hole may be formed such that the inner circumferential surface of the through hole is spaced from the outer circumferential surface of the lift pin so that the lift pin can horizontally move in the plane direction of the substrate.

And the distance between the outer circumferential surface of the lift pin and the inner circumferential surface of the through hole is 2 mm to 5 mm when the center of the lift pin is located at the center of the through hole.

The linear driving unit may include a lift plate to which the lift pins are fixedly coupled, and a vertical driving unit that moves the lift plate up and down to vertically drive the lift pins.

The mask may include a pattern forming portion having at least one opening formed therein and an outer frame coupled with the pattern forming portion.

The through hole may be formed in a portion of the pattern forming portion that is not open.

The substrate transfer module according to the present invention is provided in front of a substrate processing module (not shown) for substrate processing to perform a contact process in which a substrate to be subjected to a substrate process is closely contacted between a mask and a mask holder, The substrate is processed in the substrate processing module, the substrate is transferred to the other module, and the mask with the remaining mask holder is transferred again, and then repeatedly performed from the adhesion process, thereby performing precise alignment of the substrate and the mask There is an advantage that the reliability of the substrate processing can be improved.

Further, the substrate transfer module according to the present invention is configured as a module which repeatedly performs a process of introducing a mask from the process of introducing a mask into the process of introducing a mask, thereby fasterly aligning the mask and the substrate, There is an advantage that it can be improved.

Further, the substrate transfer module according to the present invention is a substrate processing system in which a substrate processing is performed while a mask is in close contact with a substrate, the substrate processing system comprising: The provision of the substrate support assembly has the advantage of being able to more efficiently and stably align the mask and the substrate, or to separate the substrate from the mask.

Further, the substrate transfer module according to the present invention can be installed in the inner wall of the vacuum chamber, where the gate is formed, so that the substrate support assembly supporting the edge of the substrate can be driven in a narrow space, There is an advantage that it can be stably supported.

The substrate transferring module according to the present invention is a substrate processing system in which a substrate processing is performed in a state in which a mask is in close contact with a substrate. The substrate processing system includes a substrate supporting a central portion of the substrate, The provision of the support assembly has the advantage that alignment of the mask and substrate can be performed more efficiently.

In particular, as the size of the substrate to be processed is increased, that is, the size of the substrate is increased, the amount of deflection at the central portion of the substrate is increased due to the self weight of the substrate and the increase in substrate deflection causes the alignment error of the substrate and the mask The substrate transfer module according to the present invention has a substrate supporting assembly for supporting a central portion of the substrate, thereby advantageously aligning the mask and the substrate can be performed more efficiently.

Further, the substrate transfer module according to the present invention may be configured such that the lift pin for supporting the substrate moves vertically through a through hole formed in a portion not opened in the mask, thereby stably supporting the substrate without affecting the area of the effective region of the substrate. There is an advantage to be able to do.

Further, the substrate transferring module according to the present invention is a substrate processing system in which a substrate processing is performed in a state in which a mask is in close contact with a substrate, the substrate processing system comprising: a mask holder detachably holding a mask holder, It is possible to smoothly and quickly perform the substrate introduction process of introducing the substrate between the mask and the mask holder.

The substrate transfer module according to the present invention further includes a mask holder separator for automatically separating the mask holder from the mask when the mask and the mask holder are engaged and releasing the mask holder after the substrate and the mask holder are coupled, The substrate can be introduced smoothly and quickly between the mask and the mask holder.

Further, the substrate transfer module according to the present invention is a substrate processing system in which a substrate processing is performed in a state in which a mask is in close contact with a substrate, wherein a lift pin passes through the mask to align the mask and the substrate, There is an advantage that alignment of the mask and the substrate can be performed more efficiently.

Further, since the substrate transfer module according to the present invention is provided so that the lift pin for supporting the substrate moves vertically through the through hole formed in the unmasked portion of the mask, the substrate can be moved up and down without affecting the area of the effective area of the substrate. There is an advantage that it can be stably supported.

That is, the substrate transfer module according to the present invention forms a through hole in the mask corresponding to a portion of the substrate processing surface which is in contact with the mask, which is one of the ineffective areas to be discarded after the substrate processing, The lift pins pass through the through holes to support the substrate, so that the area of the effective area of the substrate due to the support of the lift pins is not reduced, and the productivity of the substrate processing can be remarkably increased.

Further, the substrate transfer module according to the present invention can reduce the outer diameter of the moving part moving up and down through the through hole formed in the un-opened portion of the mask, thereby ensuring sufficient rigidity for supporting the substrate, And the inner diameter of the through hole for the mask alignment can be minimized, thereby making it possible to stably support the substrate without reducing the area of the effective area of the substrate.

More specifically, when a through-hole is formed through the lift pin in the mask, the portion of the mask that supports the substrate must be formed to have a width larger than the inner diameter of the through-hole. This reduces the outer diameter of the lift pin It is possible to reduce the inner diameter of the through hole and consequently to reduce the width of the portion supporting the substrate. As a result, by reducing the area of the ineffective area adhered to the substrate by the mask, There is an advantage in that the substrate can be stably supported without reducing it.

1 is a longitudinal sectional view showing a substrate transfer module according to the present invention, and is a sectional view taken in a direction perpendicular to a transfer direction in which a substrate is transferred.
Fig. 2 is a longitudinal sectional view of the substrate transfer module of Fig. 1, which is a cross-sectional view taken in the transport direction in which the substrate is transferred.
3A and 3B are plan views showing a part of the configurations of the substrate transferring module of FIG. 1, respectively. FIG. 3A is a plan view showing a conveyed body portion and a mask support of the substrate processing apparatus of FIG. FIG. 2 is a plan view showing a substrate support assembly of a substrate processing apparatus of FIG.
4 is a plan view showing an example of a mask used in the substrate transfer module of FIG.
5A and 5B are views showing a process of operating the mask holder in the substrate transfer module of FIG. 1, wherein FIG. 5A shows a state in which the mask holder is hooked on the locking member, FIG. 5B shows a state in which the mask holder is unfastened FIG. 5C is a partial plan view showing a process of operating the mask holder in the substrate transfer module of FIG. 1; FIG.
FIGS. 6A and 6B are partial cross-sectional views, respectively, showing a state in which the lift pins support the substrate through the mask in the substrate transfer module of FIG. 1; FIG. 6A shows a state in which the substrate is simply supported, These are some sections showing the alignment.
FIGS. 7A and 7B are partial cross-sectional views illustrating a state in which the substrate is supported by the first through second substrate support assemblies of FIG. 1. FIG.
FIGS. 8 and 9 are top and side cross-sectional views illustrating the operation of the first substrate support assembly of FIG.
10 is a flowchart showing a substrate transfer method according to the present invention.
11 is a conceptual diagram showing the alignment method of FIG.

Hereinafter, a substrate transfer module according to the present invention will be described in detail with reference to the accompanying drawings.

The substrate transfer module according to the present invention is a substrate transfer module for use in a substrate processing system that performs substrate processing while a mask is in close contact with a substrate. The substrate transfer module includes a first gate and at least one second gate formed opposite to each other, And a vacuum chamber for forming an isolated inner space, wherein after the mask is introduced through the second gate, the substrate introduced through the first gate is brought into close contact between the mask and the mask holder and then discharged through the second gate .

Particularly, the substrate transfer module according to the present invention is combined with a substrate processing module (not shown) for substrate processing to perform a contact process in which a substrate to be subjected to substrate processing is closely contacted between a mask and a mask holder, An introduction process for transferring the mask back to the other module after the substrate is processed in the substrate processing module, and a configuration and an alignment method for implementing the operation to repeat the process from the adhesion process again.

For example, a substrate transfer module according to the present invention may include a substrate transfer module (not shown) for use in a substrate processing system that performs substrate processing with the mask 20 in close contact with the substrate 10, A vacuum chamber 100 formed with a first gate 111 and at least one second gate 112, 113 facing each other and forming an internal space S isolated from the outside; One or more conveyed body parts which are provided in the vacuum chamber 100 and which directly or indirectly support the mask 20 when introducing or discharging the mask 20 into the vacuum chamber 100 through the second gates 112, (210); A mask support 320 installed in the vacuum chamber 100 to support the mask 20 and move it up and down; The mask 20 and the mask holder 30 introduced into the vacuum chamber 100 with the mask holder 30 engaged in order to introduce the substrate 10 between the mask 20 and the mask holder 30 A mask holder separator 360 for separating the mask holder 360; A substrate support assembly (410, 420, 430) installed in the vacuum chamber (100) to support the substrate (10) introduced through the first gate (111); The substrate 10 and the mask 20 are aligned by relative movement between the mask 20 supported on the mask support 320 and the substrate 10 supported on the substrate support assemblies 410, (330).

The substrate 10 may be a substrate for an LCD panel, a silicon substrate for a solar cell, an OLED panel substrate, and the like.

In addition, when the substrate 10 is introduced through the first gate 111, the substrate 10 may be directly transferred by a robot, a guide rail, or the like, or may be transferred to a substrate tray (not shown) and transported in various forms.

The mask 20 is brought into close contact with the substrate 10 by a mask holder 30 to be described later so as to process the substrate 10 in a predetermined pattern or to prevent the substrate 10 from sagging. And so on.

4, the mask 20 includes a pattern forming portion 21 having at least one opening 24 formed therein and an outer frame 22 coupled to the pattern forming portion 21, Various configurations are possible. Here, the mask 20 may include only the outer frame 22 and may not include the pattern forming unit 21. [

The pattern forming portion 21 is a constitution in which at least one patterned opening 24 is formed on the surface of the substrate so as to enable processing of the patterned substrate, Or the like, and may be variously configured as a sheet member, a strip member, or the like.

The opening 24 formed in the pattern forming portion 21 may be formed in a pattern corresponding to a predetermined pattern of substrate processing on the surface of the substrate or may be formed in a pattern corresponding to the shape of a grid to form a rectangular pattern And the like.

Particularly, the pattern forming portion 21 preferably has a portion that is not open at a position corresponding to a portion of the surface of the substrate that is cut after the substrate is processed.

The outer frame 22 is preferably a member for supporting a pattern forming portion 21 of a thin member such as a sheet and has a sufficient structure. Here, the outer frame 22 may be formed integrally with the pattern forming portion 21.

The mask holder 30 is provided with a magnet or the like for supporting the substrate 10 by closely contacting the mask 20 to the substrate 10 and includes a mask 20 made of a material such as iron, To the substrate 10 with a magnetic force.

Meanwhile, the mask holder 30 may have a plurality of tabs 31 formed to protrude outward from the edge.

The tab 31 supports the tab 31 by a mask holder separator 360 to be described below so that the substrate 10 can be positioned between the mask 20 and the mask holder 30, And to separate the mask holder 30 and the mask 20 from each other.

Meanwhile, the mask 20, the mask holder 30, and the like may have a rectangular shape in plan view when viewed from above.

The mask holder 30 is mounted on the substrate 10 and the mask 20 for alignment inspection of the substrate 10 and the mask 20 and alignment inspection of the substrate 10 and the mask 20 after adhering, A plurality of openings (not shown) are preferably formed so as to obtain an image of a plurality of openings (not shown).

The vacuum chamber 100 may have a substantially rectangular parallelepiped shape and may include a first gate 111 and at least one second gate 112 formed opposite to each other and may form an internal space S isolated from the outside For example, the chamber body 110 may be opened upward and the upper lid 120 may be detachably coupled to the chamber body 110.

The chamber body 110 may be formed in various ways such that the first gate 111 and the at least one second gate 112 are formed to face each other according to the introduction and discharge of the substrate 10.

The first gate 111 may have any structure as long as the substrate 10 can be introduced through the robot (40 in FIGS. 7A and 7B) Do.

The second gate 112 may be formed of one or two gates, which are introduced or discharged in a state in which the mask 20 and the mask holder 30 are coupled.

First, when the second gate 112 is formed as a single mask, the introduction of the mask 20 coupled with the mask holder 30, the mask 20, the substrate 10, and the mask 20, Can be achieved.

On the other hand, the second gate 112 may be formed in two, and the introduction gate 112 and the discharge gate 113 may be formed vertically.

In other words, the introduction gate 112 is provided with the introduction of the mask 20, in particular, the introduction of the mask 20 to which the mask holder 30 is coupled and the discharge gate 113 to the substrate 10 and the mask holder 30 The discharge of the mask 20 can be made. Here, the mask 20 and the mask holder 30 may be separately introduced into the vacuum chamber 100.

The introduction gate 112 may be formed on the upper side of the discharge gate 113 or on the lower side, as in the embodiment of the present invention.

The chamber body 110 may be supported by a frame member 160 or the like so as to be spaced apart from the ground for installation of the up-and-down driving unit 220 and the like.

The upper lead 120 may have a variety of configurations including an inner space S isolated from the outside by covering an opening formed on the upper side of the chamber body 110.

Meanwhile, the vacuum chamber 100 may be connected to a vacuum pump for pressure control and evacuation of a predetermined vacuum pressure in the inner space S.

The conveyed body support unit 210 may be provided in the vacuum chamber 100 to support the mask 20 when introducing and discharging the mask 20, and various configurations are possible.

The conveyed body support unit 210 can be configured in various manners such as directly or indirectly supporting both ends of the mask 20 and being installed in a pair of the vacuum chamber 100 so as to guide linear movement in the horizontal direction. Here, the mask 20 may be directly supported on the conveyed body support part 210 or may be indirectly supported on the conveyed body support part 210 while being loaded on a separate conveyance tray (not shown).

2 and 3A, the conveyed body support unit 210 includes a plurality of guide rollers 212 for supporting the bottom surface of the mask 20, and guide rollers 212 for supporting the bottom surface of the mask 20, And a frame member 211 which is installed to the frame member 211.

The guide roller 212 supports the bottom surface of the conveyed object and conveys the conveyed object by rotation. The guide roller 212 is connected to a rotary motor and a bevel gear installed inside or outside the vacuum chamber 100, .

The guide rollers 212 may be provided in a plurality of ways along the conveying direction of the conveyed object, and some may be configured as idle rollers.

The frame member 211 can be variously configured as a structure for driving the support and horizontal movement of the conveyed object by the guide roller 212 being installed.

On the other hand, the conveyed body support unit 210 is located on the upper side when the mask 20 is introduced through the introduction gate 112 positioned on the upper side, And can be moved up and down by the ascending /

For example, as shown in FIGS. 1 to 3A, the conveyed body support portion 210 is formed with a guide hole 213a through which a guide member 230, which will be described later, And can be vertically moved up and down in the vacuum chamber 100 by the up and down driving of the lifting and lowering driving unit 220 and the guide of the guide member 230. [

The frame member 211 may be connected to the frame member 211 of the opposite conveyed body support unit 210 by one or more connections And the lifting and lowering driving unit 220 drives the pair of conveyed body support units 210 to move up and down by moving the connecting member 213 up and down.

The connecting member 213 connects and restrains a pair of conveyed body support portions 210 opposed to each other so that the pair of conveyed body support portions 210 are moved upward and downward by the up and down driving unit 220, It becomes possible to move up and down synchronously.

In particular, the connecting member 213 may be configured to couple the ends of the frame members 211 to each other so as to constrain the pair of conveyed body support portions 210 from each other.

The guide member 230 is formed with a guide hole 213a through which the guide member 230 is vertically inserted and inserted into the guide member 230, The frame member 211, and furthermore, the conveyed body supported by the conveyed body support portion 210 can be precisely moved up and down.

The lifting and lowering driving unit 220 is installed in the vacuum chamber 100 and drives the pair of conveyed body support units 210 in the vertical direction. Various arrangements can be made according to the driving method such as a screw jack and a hydraulic cylinder Do.

The lifting and lowering driving unit 220 is installed below the vacuum chamber 100 and the lifting member 221 is connected to the frame member 211 and particularly to the connecting member 213 so that the lifting member 221 The pair of conveyed body support portions 210 are vertically moved up and down.

Although the upward / downward movement driving unit 220 is described as being installed in a plurality of units, the upward and downward driving unit 220 is composed of a single unit, and the pairs of the conveyed body support units 210 are linked with each other by a combination of a belt and a pulley, Can be driven.

The guide member 230 has a structure in which one end is coupled to the ceiling of the vacuum chamber 100 and the other end is coupled to the inner bottom of the vacuum chamber 100 to guide the vertical movement of the conveyed body support portions 210 It is possible.

The guide members 230 may be installed in the vacuum chamber 100 in a plurality of ways to be coupled with the conveyed body support portions 210 to guide the conveyed body support 210 in up and down directions.

For example, the guide member 230 may have a bar shape. At this time, the bar-shaped guide member 230 may be inserted into the conveyed body support portions 210, Can be guided in the up and down direction.

Meanwhile, the conveyed body support unit 210 may be provided such that the width of the conveyed body support unit 210 can be varied to cope with a change in the width of the mask 20 to be supported when the pair of the conveyed body support units are configured to support both ends of the mask 20.

That is, the conveyed body support portion 210 may be provided so as to have a variable width with respect to the opposite conveyed body support portion 210, and specifically, a frame member (not shown) provided with a guide roller 212 for supporting the mask 20 211 can be moved linearly in the width direction, so that the width of the mask 20 can be changed.

In addition to the embodiment shown in FIGS. 1 to 3A, the conveyed body support unit 210 may be installed in the vacuum chamber 100 in a manner free from vertical movement.

That is, only one second gate 112 is formed in the vacuum chamber 100, and the conveyed body support unit 210 may be installed in a position corresponding to the second gate 112 without any vertical movement .

The vacuum chamber 100 has a second gate formed with an introduction gate 112 and an ejection gate 113 and a conveyed body support portion 210 corresponding to an introduction gate 112 and an ejection gate 113 Can be installed.

At this time, the pair of conveyed body support portions 210 are installed such that the width of the conveyed body support portions 210 is larger or smaller than the width of the mask 20 to be supported so that the mask 20 can be moved up and down.

The mask support portion 320 may have any structure as long as it supports the mask 20 from the bottom side for vertical movement and alignment of the mask 20.

2 and 3A, the mask support portion 320 includes a support member 321 for supporting at least a part of the bottom surface of the mask 20, and a support member 321 for supporting the support member 321 by moving the support member 321 up and down And a vertically moving part 322 for vertically moving the mask 20 to be supported.

The support member 321 may be configured to support at least a part of the mask 20 to stably support the entire mask 20.

For example, as shown in FIGS. 2 and 3A, the support member 321 may have one or more openings, grooves or the like formed vertically through the lift pins 411 so as to be movable up and down. It should be noted that the support member 321 may be formed with one or more openings, grooves or the like in order to stably support the mask 20.

On the upper surface of the support member 321, one or more alignment portions may be formed in the shape of protrusions or grooves corresponding to grooves or protrusions formed on the bottom surface of the mask 20 for precise alignment with the mask 20.

The upper and lower moving parts 322 can be any structure such as a screw jack, a hydraulic cylinder, or the like as far as the supporting member 321 can move up and down.

Meanwhile, the mask support part 320 may support the mask 20 in various forms according to the operation process together with the conveyed body support part 210 that supports the mask 20 when the mask 20 is introduced and discharged.

For example, the conveyed body support portion 210 supports the mask 20 only when the mask 20 is introduced and discharged, and in the remaining cases, the mask support portion 320 can support the mask 20.

The conveyed body support portion 210 supports the mask 20 before the introduction and alignment of the mask 20 and is supported by the mask support portion 320 and then is returned to the mask 20 ). ≪ / RTI >

The mask holder separator 360 can be configured in various ways as a configuration for separating the mask 20 and the mask holder 30 so that the substrate 10 is introduced between the mask holder 30 and the mask 20.

For example, the mask holder separator 360 may include a plurality of locking members 361 selectively engaged or disengaged with the mask holder 30, as shown in FIGS. 1 and 2, and 5A to 5C. And a plurality of operation drivers 362 corresponding to the respective locking members 361 to drive the locking and releasing of the locking members 361. [

The locking member 361 is a member which is selectively engaged or released with respect to the mask holder 30. The locking member 361 selectively engages or disengages the mask holder 30 by & And a rotary motor or the like to rotate the member 361. [

On the other hand, when the locking member 361 is selectively engaged or released with respect to the mask holder 30, the locking member 361 may be engaged or disengaged from the mask holder 30 itself, 31, respectively.

In addition, the locking member 361 may be selectively engaged or disengaged with the mask holder 30 by linear movement instead of rotation when the locking member 361 is selectively engaged or disengaged with the mask holder 30, And may be configured as a linear movement device to move the locking member 361 linearly, though not shown.

5A to 5C, a portion of the locking member 361, which supports the mask holder 30, is provided with a mask holder 361 for holding the mask holder 30 stably, One or more position fixing portions 363 may be formed in the form of protrusions or grooves corresponding to the grooves or protrusions formed on the bottom surface of the substrate 30.

The actuating drive unit 362 is configured to selectively engage or disengage the mask holder 30 by rotating or linearly moving the locking member 361 and may have various configurations such as a rotary motor and a linear motor.

The mask holder separator 360 may be formed in a variety of ways depending on the manner in which the mask 20 and the mask holder 30 are separated from each other. Unlike the previously described embodiment, (100).

That is, when the mask 20 is introduced through the second gate 112 and the substrate 10 and the mask holder 30 are sequentially discharged through the second gate 112, The separation unit 360 may include a plurality of locking members 361 fixed in the vacuum chamber 100.

The mask holder separating unit 360 separates the tabs 31 provided on the mask holder 30 when the mask 20 supported by the conveyed body support unit 210 or the mask support unit 320 is lowered, The mask 30 and the mask 20 can be separated from each other.

In this case, the mask 20 separated from the mask holder 30 descends again after the introduction and alignment of the substrate 10, and is then coupled with the mask holder 30 and then discharged through the second gate 112.

The locking member 361 has a structure in which the mask holder 30 is detached by lowering the mask 20 by supporting a part of the bottom surface of the mask holder 30 or the tab 31, There is no substantial difference except that it is fixedly installed.

Meanwhile, the mask holder separator 360 may be installed in the vacuum chamber 100 from a ceiling, or may be installed in various forms such as an inner surface of a side wall and an inner surface of a lower side.

The mask holder separating unit 360 can be used anywhere in the apparatus for separating the mask holder 30 from the mask 20 as a mask holder separating apparatus.

The substrate support assemblies 410, 420, and 430 are configured to support the substrate 10 introduced through the first gate 111, and various configurations are possible.

As an example, the substrate support assembly 410, 420, 430 may include a substrate center support assembly 410 installed in the vacuum chamber 100 to support a central portion of the substrate 10; A pair of first substrate enclosure support assemblies 420 installed in the vacuum chamber 100 to support the front and rear edges, respectively, with respect to the moving direction of the substrate 10; And a pair of second substrate support assemblies 430 installed on the vacuum chamber 100 to support both side edges of the substrate 10. [

The substrate center support assembly 410 is installed in the vacuum chamber 100 to support a central portion of the substrate 10 introduced through the first gate 111 to prevent sagging of the substrate 10, Configuration is possible.

As an example, the substrate center support assembly 410 may be mounted vertically through the mask 20 as shown in Figs. 1 to 3B, 6A and 6B, and Figs. 7A and 7B, And a linear driving unit 412 that linearly drives the plurality of lift pins 411 up and down. The ends of the lift pins 411 are connected to the mask 20 so as not to interfere with the movement of the mask 20 when the mask 20 with the substrate 10 and the mask holder 30 adhered thereto is discharged to the outside of the vacuum chamber 100 As shown in FIG.

The plurality of lift pins 411 are configured to support the substrate 10 at the ends thereof, and may have a rod shape.

The number and arrangement of the plurality of lift pins 411 may be appropriately selected and designed so as to stably support the substrate 10.

A portion of the substrate processing surface of the substrate 10 supported by the lift pins 411 may not be used as an effective region of the substrate 10. In order to maximize the effective area of the substrate 10 after the substrate processing, It is necessary that the portion to be supported by the first lens 411 is set efficiently.

Therefore, the portion where the lift pin 411 is supported is a portion that is not the effective region of the substrate 10, a portion of the substrate surface that is supported by the mask 20, A portion to be cut later, and the like are preferably utilized.

That is, at least one through hole 23 is formed so that the lift pin 411 penetrates through the portion of the mask 20 that is not opened in the pattern forming portion 21 and can be moved up and down, and the lift pins 411 It is preferable that each of them is installed so as to move up and down through the through holes 23.

6A and 6B, Figs. 7A and 7B, when the mask 20 performs alignment by relative movement with respect to the substrate 10 by the aligner portion 330, The inner diameter of the through hole 23 into which the lift pin 411 is inserted should be formed to be sufficiently larger than the outer diameter of the lift pin 411. [

That is, the inner circumferential surface of the through hole 23 should be formed so as to have a horizontal moving distance with the outer circumferential surface of the lift pin 411 so that the lift pin 411 can horizontally move in the plane direction of the substrate 10.

6A, when the center of the lift pin 411 is located at the center of the through hole 23, the horizontal movement interval is set so that the outer peripheral surface of the lift pin 411 and the inner peripheral surface of the through hole 23 Is preferably 2 mm to 5 mm.

However, considering the productivity of the substrate processing, in order to secure a sufficient inner diameter of the through hole 23, if the size of the uncovered portion of the mask 20 is increased, the area of the effective region of the substrate 10 is reduced, The productivity of the treatment can be lowered.

Therefore, the pattern forming portion 21 of the mask 20 may be formed by expanding only the portion where the through hole 23 is formed.

6 (a) and 6 (b), the lift pins 411 extend from the end portion of the substrate 10, which supports the substrate 10, to the mask 20, that is, The outer diameter of the moving part 411b moving up and down through the through hole 411a may be smaller than the connecting part 411a connected to the linear driving part.

The reason why only the outer diameter of the moving part 411b of the lift pins 411 is reduced is because it is difficult to ensure sufficient rigidity due to the reduction of the outer diameter of the lift pins 411 and thus there is a limit in stably supporting the substrate 10.

Accordingly, the lift pins 411 reduce the outer diameter of the moving portion 411b that moves up and down through the non-opened portion of the mask 20, thereby ensuring sufficient rigidity for supporting the substrate 10, It is possible to stably support the substrate 10 without affecting the area of the effective region of the substrate 10 by minimizing the inner diameter of the through hole 23 for the mask 20 alignment.

The linear driving unit 412 may be configured to drive the lift pins 411 up and down in various manners.

The linear driving unit 412 includes a lift plate 413 to which the lift pins 411 are fixedly coupled and a vertical driving unit 414 that vertically moves the lift plates 413 to move the lift pins 411 up and down. . ≪ / RTI >

The lift plate 413 has various structures such as being installed inside or outside the vacuum chamber 100 for driving the vertical movement of the lift plate 411 in cooperation with the lower ends of the lift pins 411.

The up and down driving unit 414 is configured to move the lift pins 411 up and down by driving the lift plate 413 up and down, and various configurations such as a screw jack, a hydraulic cylinder, and the like are possible.

1 to 3B and 6A to 7B, the first substrate outer supporting assembly 420 may be configured to move the substrate among the edges of the rectangular substrate 10 by at least one of linear movement and rotational movement, Various configurations are possible as a configuration for supporting the front and rear edges based on the reference.

For example, the first substrate support assembly 420 may include a support bracket 423 mounted on a side wall of the vacuum chamber 100; At least one support member (421) provided linearly movably in the support bracket (423) so as to support the front or rear edge of the substrate (10) by linear movement; And a linear driving unit for driving linear movement for advancing or retracting the support member 421 to the edge of the substrate 10.

The supporting bracket 423 may be configured to support all or a part of a linear driving unit described later, and may have various configurations according to the structure of the linear driving unit.

The supporting member 421 has a configuration for supporting the edge of the substrate 10 by linear movement, and it is preferable that the supporting member 421 has an L shape in consideration of supporting the substrate 10 at the edge Do.

The linear driving unit is configured to drive the linear movement of the supporting member 421, and various configurations are possible according to the driving method.

For example, the linear driving unit includes a driving member 422 coupled to a plurality of supporting members 421 and linearly movably mounted on the supporting bracket 423; A driving source 424 coupled to an outer surface of a side wall corresponding to a side of the substrate 10 to generate a driving force; And a linear switching unit installed in the support bracket 423 and adapted to receive the driving force from the driving source 424 and to switch the linear movement of the driving member 422.

The driving member 422 has a structure for linearly driving a plurality of support members 421 for supporting the edge of the substrate 10 at a time, Is possible.

The driving member 422 is coupled to the support bracket 423 so as to linearly move along a guide rail provided on the support bracket 423.

The driving source 424 is coupled to the outer surface of the side wall of the vacuum chamber 100 corresponding to the side of the substrate 10 to generate a driving force for linear movement of the driving member 422, A rotary motor, and a hydraulic cylinder for generating a linear driving force. Here, the driving source 424 may be coupled to the ceiling of the vacuum chamber 100 in addition to the side wall of the vacuum chamber 100.

The linear switching unit is configured to switch the driving force of the driving source 424 to the linear movement of the driving member 422. The linear switching unit may have various configurations according to the driving force generated by the driving source 424.

For example, when the driving force generated by the driving source 424 is rotational force, the linear switching unit may be configured to switch the rotational force to linear movement.

Specifically, as shown in FIGS. 8A and 9B, the linear-type switching unit is rotated by a driving source 424 generating a rotational force, and is rotated by a linear moving device such as a screw jack in a direction perpendicular to the moving direction of the driving member 422 A driving block 426 which is linearly moved to a predetermined position; One end of which is hinged to the drive block 426 and the other end of which is hinged to the drive member 422 to switch the direction of movement of the drive member 422 in the linear movement direction.

As another example, the linear switching portion may be configured in various manners such as a combination of a rack and a pinion, or a combination of a cam and an elastic member.

On the other hand, when the driving source 424 is linearly driven in the linear driving direction perpendicular to the linear moving direction of the driving member 422, the linear switching unit switches the linear driving direction in the linear moving direction of the driving member 422 .

The first substrate outer supporting assembly 420 can linearly drive the supporting member 421 by the configuration of the linear switching unit as described above and can move linearly around the gate, that is, on the front and rear edges So that it is possible to support the substrate 10 more stably.

Meanwhile, the first substrate outer supporting assembly 420 having the above-described configuration may be applied to a configuration for supporting the substrate 10 introduced into the vacuum chamber 100, in addition to the configuration of the substrate transfer module according to the present invention. Of course.

The first substrate support assembly 420 is described as supporting the substrate 10 by linear movement in the present embodiment. Alternatively, the first substrate support assembly 420 may be rotated (rotated) similarly to the mask holder separator 360 shown in FIGS. 5A to 5C. Of course, be configured to support the substrate 10 by movement.

Furthermore, the first substrate support assembly 420 may be configured to support the substrate 10 by a combination of linear movement and rotational movement, such that the portion supporting the substrate 10 is movable up and down. Of course.

The second substrate outer supporting assembly 430 may be installed in the vacuum chamber 100 to support both side edges of the substrate 10 and may have various configurations. Here, the principle that the second substrate outer supporting assembly 430 supports the substrate 10 includes a first substrate outer supporting assembly 420,

In particular, the second substrate outer support assembly 430 may include at least one of linear and rotational movements when the front and rear edges of the substrate 10 are supported by a pair of first substrate outer support assemblies 420 And is configured to support both side edges of the substrate 10 by one.

For example, the second substrate support assembly 430 may include a support bracket 433 mounted on a side wall of the vacuum chamber 100, as shown in FIGS. 1 to 3B, 7A and 7B; At least one support member (431) provided linearly movably in the support bracket (433) so as to support the lateral edge of the substrate by linear movement; And a linear driving unit 434 for driving linear movement for advancing or retracting the support member 431 to the side edge of the substrate 10. [

Meanwhile, the first substrate outer supporting assembly 420 and the second substrate outer supporting assembly 430 may include at least one supporting member 421 and 431 and a linear driving unit 434 as one substrate lifting unit, .

For example, the second substrate support assembly 430 may be provided with three substrate lifting units, as shown in Figures 1, 2 and 3b.

The aligner unit 330 is configured to align the substrate 10 and the mask 20 by relatively moving the mask 20 supported on the mask support unit 320 with respect to the substrate 10 in parallel with each other, It is possible.

For example, the aligner 330 may be disposed on the mask support 320 to align the mask 20 in a plane direction (e.g., X1, X2, Y, or X, Y, The mask support portion 320 is moved relative to the substrate 10 to align the substrate 10 and the mask 20, and so on.

Wherein the vacuum chamber 100 includes a plurality of camera devices for acquiring an image of the substrate 10 and the mask 20 for alignment of the substrate 10 and the mask 20 by an aligner 330 Not shown).

A method of transferring a substrate by the substrate transfer module according to the present invention having the above-described structure will now be described in detail.

10 and 11, the substrate transfer method according to the present invention includes a mask introduction step (S10) in which a mask 20 to which a mask holder 30 is coupled is introduced into a vacuum chamber 100; A mask holder separation step (S20) of separating the mask (20) and the mask holder (30) after the mask introduction step (S10); A substrate introducing step (S30) of introducing the substrate (10) between the mask (20) and the mask holder (30) after the mask holder separation step (S20); An alignment step S40 for relatively moving and aligning the mask 20 and the substrate 10 after the substrate introduction step S30; A contact step (S50) in which the mask (20), the substrate (10), and the mask holder (30) are closely contacted after the alignment step (S40); And a mask discharging step (S60) for discharging the mask 20, in which the substrate 10 and the mask holder 30 are combined, from the vacuum chamber 100 after the close step (S50).

The mask introduction step S10 is a step in which the mask 20 is introduced into the vacuum chamber 100 so that when the mask 20 is introduced into the second gate 112 as shown in Figures 10 and 11A The conveyed body support unit 210 moves upward to support and introduce the mask 20. [ Here, the mask 20 is illustrated as being coupled with the mask holder 30, but may be introduced separately.

Meanwhile, the mask holder separation step S20 is a step of separating the mask 20 and the mask holder 30 after the mask introduction step S10.

The mask holder separating step (S20) may be performed variously according to the method of separating the mask 20 and the mask holder 30.

For example, in the mask holder separating step S20, the mask 20 to which the mask holder 30 is coupled is lowered, and the mask holder 30 is moved downward, And may be performed directly by the holder separator 360 or separated from the mask 20 by the tab 31 being supported.

Here, it is preferable that the mask 20 is further lowered until the mask 20 is separated from the mask holder 30 and has sufficient spacing.

Meanwhile, the lowering of the mask 20 may be variously performed depending on the support type of the mask 20. [

The mask 20 is supported by the mask support 320 after the mask 20 is supported by the conveyed object support 210 and the object to be conveyed 210 is conveyed to the lower side, As shown in FIG.

Here, the conveyed body support portion 210 is provided with an upper conveyed body support portion and a lower conveyed body support portion corresponding to the introduction gate 112 and the discharge gate 113, Is supported by the mask support part 320 and is movable in the width direction to prevent interference when it is transferred to the lower conveyed body part. Here, the upper portion conveyed body portion and the lower portion conveyed body portion correspond to the introduction gate 112 and the discharge gate 113, respectively, and maintain a fixed state without vertical direction.

Then, the mask support 320 descends the mask 20 supported by the lowering, and separates the mask holder 30 as described above.

Alternatively, the mask 20 may be lowered by the lowering of the conveyed body support 210 itself after the mask 20 is supported by the conveyed body support 210 and introduced.

On the other hand, the separation position of the mask holder 30 is substantially the same as the position of the second gate 112, particularly, the mask holder 30, or in order to prevent interference with the mask holder 30 upon introduction of the mask 20 Can be located slightly lower.

The mask holder separating step S20 may include a separate mask holder separating device for separating the mask holder 30 from the mask holder 30 by lifting the mask holder 30, . Here, the mask holder separating device may lower the mask holder 30 after the aligning step S40, which will be described later, and bring the mask holder 30 into close contact with the mask 20 again.

The substrate introduction step S30 is a step of introducing the substrate 10 between the mask 20 and the mask holder 30 after the mask holder separation step S20, The substrate 10 is introduced through the first gate 111 by a variety of methods depending on the substrate transfer between the robot 40 and the substrate support assembly 410, 420, .

In particular, the substrate introduction step S30 includes a substrate introduction step in which the substrate 10 is introduced through the first gate 111 by the robot 40; And a substrate support step in which the substrate 10 is supported by one or more substrate support assemblies (410, 420, 430).

The step of introducing the substrate is a step of introducing the substrate 10 through the first gate 111 by the robot 40 and the robot 40 introducing the substrate 10 into the vacuum chamber 100 by the horizontal movement And may be performed after descending after the substrate supporting step and horizontally moving out of the vacuum chamber 100.

The robot 40 may be moved by horizontally moving the substrate 10 into the vacuum chamber 100 and descending and moving horizontally out of the vacuum chamber 100 after the substrate supporting step.

At this time, the robot 40 may be moved to the outside of the vacuum chamber 100 after being raised before horizontally moving to the outside. Here, of course, after the substrate 10 is sufficiently moved upward by the one or more substrate supporting assemblies 410, 420, and 430, the robot 40 is elevated before being horizontally moved to the outside, and then horizontally moved out of the vacuum chamber 100 Of course.

Meanwhile, the substrate supporting step may include supporting the substrate 10 by one or more substrate supporting assemblies 410, 420, and 430, wherein after the substrate entering step, the substrate supporting assemblies 410, 420, ) Is supported and performed.

As a specific example of the substrate supporting step, the first and second substrate supporting assemblies 420 and 430 are assembled by the substrate center supporting assembly 410 after the robot 40 is elevated, as shown in FIGS. 11B and 11C. The robot 40 is retracted to the outside of the vacuum chamber 100 after the robot 40 is lowered after the substrate 10 is supported by the supports of both side, front and rear edge portions.

Here, the robot 40 may have a proper shape in consideration of interference with other members when the substrate is transferred to the substrate supporting assemblies 410, 420 and 430.

More specifically, the substrate transfer from the robot 40 to the substrate support assembly 410, 420, and 430 will be described in detail below.

The robot 40 moves the substrate 10 into the vacuum chamber 100 while supporting the substrate 10 on a supporting portion such as an arm.

The substrate support assemblies 410, 420, and 430 move to support the substrate 10 according to the structure and position of the substrate 40, such as rising, horizontal movement, etc., for supporting the substrate 10.

For example, the first and second substrate support assemblies 420 and 430 described above may be positioned on opposite sides, front and rear edges of the substrate 10 by movement, as shown in Figures 3b, 7a and 7b, And the substrate central support assembly 410 lifts the lift pins 411 to support the central portion of the substrate 10. [

The first and second substrate support assemblies 420 and 430 and the substrate center support assembly 410 may be simultaneously or sequentially driven.

Meanwhile, when the substrate 10 is supported by the first and second substrate support assemblies 420 and 430 and the substrate central support assembly 410, the robot 40 retreats to the outside of the vacuum chamber 100.

The aligning step S40 is a step of relatively moving and aligning the mask 20 and the substrate 10 after the substrate introducing step S30 as shown in Fig. May be performed in various manners depending on the alignment method of FIG.

That is, the alignment step S40 aligns the mask 20 and the substrate 10 by moving the aligner 330 after the robot 40 is retreated. Here, the mask 20 is in a state of being supported by the mask holder 320 for performing the alignment step S40.

The alignment step S40 may be performed by the camera device to acquire an image of the substrate 10 and the mask 20 to calculate the deviation of the mask 20 and the substrate 10, Relative to the substrate 10 in a planar direction (for example, X1, X2, Y, or X, Y, and the like) relative to the substrate 10, that is, the mask support portion 320 is moved relative to the substrate 10 Alignment of the substrate 10 and the mask 20 is performed.

The relative movement of the mask 20 relative to the substrate 10 in the horizontal direction relative to the mask 20 and substrate 10 during alignment of the mask 20 and the substrate 10 is controlled by adjusting the inner diameter of the through hole 23 through which the lift pins 411 pass, The relative movement of the mask 20 with respect to the substrate 10 in the horizontal direction is not disturbed.

The adhesion step S50 is a step of raising the mask 20 after the alignment step S40 and bringing the mask 20 in the order of the mask 20, the substrate 10 and the mask holder 30, And can be carried out by various methods depending on the method.

As shown in FIG. 11D, the adhesion step S50 is performed by aligning the mask 20 supported by the mask support part 320 with the upward movement of the mask support part 320 after the aligning step S40 And is closely contacted with the mask holder 30 and the substrate 10 interposed therebetween.

The mask discharge step S60 is a step of discharging the mask 20 with the substrate 10 and the mask holder 30 from the vacuum chamber 100 after the adhesion step S50, have.

For example, in the mask discharging step S60, after the mask 20 is brought into close contact with the substrate 10 and the mask holder 30, the mask holder 320 is lowered again, The mask 20 having the mask 10 and the mask holder 30 closely contacted is carried back to the outside of the vacuum chamber 100 after being supported by the conveyed body support 210 again.

Here, after the substrate 10 is recombined with the mask 20 to which the substrate 10 is adhered, the support of the tab 31 by the mask holder separator 360 is released so that the mask holder 30 can be lowered.

The position of the conveyed body support unit 210 is set such that the mask 20 in which the substrate 10 and the mask holder 30 are in close contact with the second gate 112 and the second gate 112, ) And the discharge gate 113. The discharge gate 113 is a discharge port for discharging the liquid to be discharged through the discharge gate 113. [

The lift pins 411 of the substrate center support assembly 410 are lowered sufficiently to prevent the substrate 10 and the mask holder 30 from interfering with the discharge of the mask 20 with which the mask holder 30 is closely contacted do.

In addition, the mask discharging step S60 may be carried out in various ways such as being further raised or raised to the outside of the mask 20, or the like.

Through the above steps, the substrate transfer module according to the present invention is transferred from the vacuum chamber 100 in a state where the substrate 10 is aligned and aligned between the mask 20 and the mask holder 30, To the substrate processing module.

In addition, an alignment inspection step may be further performed to check whether the alignment of the substrate 10 and the mask 20 is properly performed after the adhesion step (S50) and the discharging step (S60).

The alignment inspection step is performed by acquiring an image of the substrate 10 and the mask 20 through the camera device through the opening formed in the mask holder 30 and analyzing the obtained image.

If it is determined in step S60 that the alignment is normally performed, the discharging step S60 is performed. If it is determined that the alignment has been performed abnormally, the mask 20 and the substrate 10 The mask 20 and the substrate 10 may be separated, and then the alignment step S40 may be performed again.

The mask 20 and the substrate 10 may be separated in various manners such that the mask support 320 supporting the mask 20 is lowered and the substrate support assemblies 410, The substrate support assembly 410 is moved to a position capable of supporting the substrate 10 so that the substrate 10 is supported by the substrate support assembly 410 and the mask support 320 is further lowered, 10 are separated from each other.

On the other hand, if it is determined that the alignment is normally performed in the alignment check step, the discharging step is performed, and if it is determined that the abnormality has occurred, the abnormal signal can be notified to the operator through at least one of auditory and visual.

Also, if it is determined that the alignment is normally performed in the alignment inspection step, the discharging step is performed, and if it is determined that abnormality has occurred, the operation can be stopped.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention as defined in the appended claims. It is to be understood that both the technical idea and the technical spirit of the invention are included in the scope of the present invention.

100: Vacuum chamber
210: conveyed body part 220:
230: Guide member
410, 420, 430: a substrate support assembly

Claims (13)

1. A substrate transfer module for use in a substrate processing system for performing a substrate processing in a state in which a mask is in close contact with a substrate,
A vacuum chamber in which a first gate and at least one second gate are formed opposite to each other and form an inner space isolated from the outside;
A pair of conveyance body support portions installed in the vacuum chamber and directly or indirectly supporting the mask when introducing or discharging the mask into the vacuum chamber through the second gate;
A substrate support assembly installed in the vacuum chamber for supporting a substrate introduced between a mask holder and a mask for bringing the mask and the substrate into close contact through the first gate;
A mask supporting part installed in the vacuum chamber and supporting the mask to move up and down;
And an aligner portion for aligning the substrate and the mask by relative movement between a mask supported on the mask support portion and a substrate supported on the substrate support assembly,
Wherein the substrate support assembly includes a substrate center support assembly mounted in the vacuum chamber to support a central portion of the substrate,
Wherein the substrate center support assembly includes a plurality of lift pins installed vertically through the mask so as to be movable up and down to support the substrate and a linear driving unit for linearly driving the plurality of lift pins in an up and down direction Substrate transport module. The method according to claim 1,
Wherein the lift pin is smaller in diameter than a connecting portion connected to the linear driving portion, the moving portion moving up and down through the mask from an end portion supporting the substrate. The method according to claim 1,
Wherein the second gate comprises an introduction gate into which the mask is introduced, and a mask which is aligned with the substrate by the aligner, is moved upward by the mask support, and then the substrate and the mask holder are sequentially brought into close contact with each other, Wherein the substrate is a substrate. The method according to claim 1,
The mask is introduced through the second gate in engagement with the mask holder,
And a mask holder separator for separating the mask holder from the mask so that a substrate is introduced between the mask holder and the mask. The method according to claim 1,
Wherein the pair of conveyed body support portions are vertically movably installed in the vacuum chamber. 1. A substrate transfer module for use in a substrate processing system for performing a substrate processing in a state in which a mask is in close contact with a substrate,
A vacuum chamber in which a first gate and at least one second gate are formed opposite to each other and form an inner space isolated from the outside;
A pair of conveyance body support portions installed in the vacuum chamber and directly or indirectly supporting the mask when introducing or discharging the mask into the vacuum chamber through the second gate;
A substrate support assembly installed in the vacuum chamber to support a substrate introduced through the first gate;
A mask supporting part installed in the vacuum chamber and supporting the mask to move up and down;
And an aligner portion for aligning the substrate and the mask by relative movement between a mask supported on the mask support portion and a substrate supported on the substrate support assembly,
Wherein the substrate supporting assembly includes a plurality of lift pins installed vertically movably up and down the mask, and a linear driver for linearly driving the plurality of lift pins up and down,
Wherein the second gate comprises an introduction gate into which the mask is introduced, and a mask which is aligned with the substrate by the aligner, is moved upward by the mask support, and then the substrate and the mask holder are sequentially brought into close contact with each other, A discharge gate,
The pair of conveyed body parts
An upper conveyed body support portion and a lower conveyed body support portion corresponding to the introduction gate and the discharge gate, respectively,
Wherein the upper conveyed body support portion is provided to be movable in a width direction to prevent interference when the mask is moved to be supported by the mask support portion and transferred to the lower conveyed body support portion. The method according to any one of claims 1 to 6,
Wherein the mask has a through hole through which the lift pin penetrates in a portion where the mask is not opened. The method of claim 7,
Wherein the mask has an unopened portion at a position corresponding to a portion of the substrate surface that is cut after the substrate is processed. The method of claim 8,
Wherein the through hole is formed such that an inner circumferential surface of the through hole is spaced from an outer circumferential surface of the lift pin so that the lift pin can horizontally move in a plane direction of the substrate. The method of claim 9,
Wherein a distance between an outer peripheral surface of the lift pin and an inner peripheral surface of the through hole is 2 mm to 5 mm when the center of the lift pin is positioned at the center of the through hole. The method of claim 8,
Wherein the linear driving unit includes a lift plate to which the lift pins are fixedly coupled, and a vertical driving unit that moves the lift plate up and down to vertically drive the lift pins. The method of claim 7,
Wherein the mask comprises a pattern forming portion having at least one opening formed therein, and an outer frame coupled with the pattern forming portion. The method of claim 12,
Wherein the through hole is formed in a portion of the pattern forming portion that is not opened.

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