KR20070109896A - Photosensitive thermal transfer material, image forming method, member for display device, color filter, and display device - Google Patents

Abstract

A photosensitive heat transfer material is provided to allow highly efficient transfer the heat from a heating roller thereto, thereby showing a rapid increase in the temperature sufficient to perform a high-speed laminating process, and to form a high-quality image without generating wrinkles. A photosensitive heat transfer material comprises a provisional support, and at least one photosensitive heat transfer layer formed on one surface of the provisional support, wherein the back surface of the provisional support, opposite to the surface having the photosensitive heat transfer layer, has a surface roughness of 0.008-0.05 micrometers. The photosensitive heat transfer material is useful for forming a color filter for a display device. An imaging process is performed by contacting and laminating the preheated photosensitive heat transfer material with a substrate.

Description

Photosensitive thermal transfer material, image forming method, display member, color filter, and display device {PHOTOSENSITIVE THERMAL TRANSFER MATERIAL, IMAGE FORMING METHOD, MEMBER FOR DISPLAY DEVICE, COLOR FILTER, AND DISPLAY DEVICE}

The present invention relates to a photosensitive thermal transfer material that can be suitably used for the manufacture of color filters, an image forming method suitable for pattern formation of color filters, a member for display devices, color filters and display devices obtained by using the image forming method. .

As a method of manufacturing a color filter using a photosensitive thermal transfer material, an image is formed by laminating a photosensitive thermal transfer material on a substrate such as glass, and then performing exposure and development to form an image (for example, Japanese Patent Application Laid-Open No. 5-173320 and See Japanese Patent Application Laid-Open No. 11-149008). In manufacturing such a color filter, it has recently been required to form an image with good efficiency for cost reduction. For this purpose, a means for laminating photosensitive thermal transfer materials at high speed is required.

In general, the laminate is carried out while the photosensitive thermal transfer material of the photosensitive thermal transfer material is brought into contact with the substrate and pressurized while the rear surface of the photosensitive thermal transfer material is brought into contact with a heating roller to raise the temperature. Therefore, in order to laminate at high speed, it is necessary to apply heat of a heating roller to the photosensitive thermal transfer material efficiently, and to raise the temperature of the photosensitive thermal transfer material in a short time.

On the other hand, depending on the shape of the back surface, wrinkles may occur in a portion in contact with the heating roller of the photosensitive thermal transfer material. This is caused by insufficient slip between the heating roller and the rear surface of the photosensitive thermal transfer material. When wrinkles occur, the quality of the obtained image is significantly reduced. There is a method of adding a lubricant to the rear surface to prevent the occurrence of wrinkles, but this method has a problem that adversely affect the image quality obtained by the lubricant is attached to the heating roller.

Due to the above circumstances, in the manufacturing method of the color filter using the photosensitive thermal transfer material, the technique which can suppress the generation | occurrence | production of wrinkles and can laminate at high speed is desired.

The present invention has been made in view of the above conventional problems. That is, the present invention is a photosensitive thermal transfer material capable of suppressing wrinkles and forming a good image even when laminated at a high speed, and an image forming method using the photosensitive thermal transfer material, a display device member, a color filter, and a display device. To provide.

MEANS TO SOLVE THE PROBLEM As a result of earnest examination, the present inventors discovered that it is important to suppress the surface roughness of the back surface of the photosensitive thermal transfer material, and completed this invention. That is, when the photosensitive thermal transfer material of the present invention is used, the heat of the heating roller is efficiently transferred to the photosensitive thermal transfer material, and the temperature of the photosensitive thermal transfer material rises in a short time. As a result, it becomes possible to convey at high speed and it is possible to perform lamination at high speed. At the same time, a good image can be obtained without causing wrinkles in the photosensitive thermal transfer material in the heating roller section.

That is, the present invention

[1] A photosensitive thermal transfer material comprising a branch support and at least one photosensitive thermal transfer layer formed on one surface of the branch support.

It provides a photosensitive thermal transfer material, characterized in that the surface roughness of the opposite surface (hereinafter referred to as the "rear") of the surface having the photosensitive thermal transfer layer of the branch support in the range of 0.008 ~ 0.05㎛.

[2] In the photosensitive thermal transfer material according to the above [1], the surface roughness of the rear surface is preferably in the range of 0.01 to 0.045 µm.

[3] The photosensitive thermal transfer material according to the above [1], wherein the surface roughness of the rear surface is more preferably in the range of 0.025 to 0.040 µm.

[4] The photosensitive thermal transfer material according to any one of [1] to [3] is preferably used for forming a color filter for a display device.

[5] The present invention further includes a step of laminating by contacting the photosensitive thermal transfer material according to any one of the above [1] to [4] with a substrate in a preheated state. To provide.

[6] In the image forming method described in the above [5], the conveyance speed of the substrate and the photosensitive thermal transfer material in the step of performing the lamination is preferably 1 to 5 m / min.

[7] The present invention also provides a display device member, which is formed by the image forming method described in the above [5] or [6].

[8] The present invention also provides a color filter for a display device, which is formed by the image forming method described in the above [5] or [6].

[9] The present invention further provides a display device comprising the color filter described in the above [8].

Hereinafter, the present invention will be described in detail.

The photosensitive thermal transfer material of the present invention is a photosensitive thermal transfer material comprising at least one layer of photosensitive thermal transfer material on one surface of a branch support, the opposite side of the surface having the photosensitive thermal transfer layer of the branch (hereinafter referred to as "rear surface" The surface roughness of "") is characterized in that the range of 0.008㎛ ~ 0.05㎛.

In the present invention, the surface roughness of the back surface of the branch is set to 0.008 µm to 0.05 µm. If the surface roughness is in the above range, it is possible to perform high-speed lamination, and the occurrence of wrinkles in the portion in contact with the heating roller portion of the photosensitive thermal transfer material can be suppressed to obtain a good image. The surface roughness of the rear surface is preferably in the range of 0.01 μm to 0.045 μm, more preferably in the range of 0.025 μm to 0.040 μm.

In the present invention, preferred means for controlling the surface roughness of the back surface of the branch is a means for forming a thick layer containing fine particles such as silica, tin oxide, zirconium oxide, titanium oxide and the like on the back of the branch.

As the silica, any one of natural silica and synthetic silica (dry silica and wet silica) can be used. In view of the uniformity of the particle diameter, it is preferable to use synthetic silica. In addition, so-called colloidal silica can also be suitably used.

As a preferable example of the silica which can be used for this invention, Shihostar KE-E20, KE-E30, KE-P30 (above Nippon Shokubai Co., Ltd.), Snowtex XL, YL, ZL (above Nissan Chemical Co., Ltd.) Products).

As the tin oxide, tin oxide (IV) having a composition of SnO ₂ is preferable. In addition, the tin oxide doped with antimony or the like is preferable because it has conductivity, and thus, the surface resistivity of the laminated film can be lowered to prevent adhesion of dirt. Examples of such tin oxide fine particles include commercially available fine particles such as FS-10D, SN-38F, SN-88F, SN-100F, TDL-S, and TDL-1 (antimony-doped tin oxide fine particles from Ishihara Sangyo Co., Ltd.). It includes.

The zirconium oxide has a composition of ZrO ₂ . Examples of the zirconium oxide include NZS-20A, NZS-30A (manufactured by Nissan Chemical Co., Ltd.), and the like.

Examples of the titanium oxide is TiO ₂ composition of titanium (Ⅳ) oxide having preferred. Titanium oxide may be either rutile type or anatase type. Surface treatment is also good. Examples of titanium oxide include outgoing titania IT-S, IT-O, IT-W (manufactured by Idemitsukosan Co., Ltd.).

The surface roughness can be controlled by the shape of the fine particles such as silica, tin oxide, zirconium oxide, titanium oxide, or the thickness of the coating layer to which the fine particles are added.

The surface roughness can be measured with a known surface roughness meter, and can be measured using, for example, a three-dimensional surface roughness meter SURFCOM 575A (manufactured by Tokyo Seimitsu Co., Ltd.). On the other hand, the surface roughness of the rear surface is preferably included in the above-mentioned preferred range of the present invention when measured under the conditions of the measurement magnification 20,000 times, cutoff wavelength 0.08 mm using the measuring device.

In addition, in this invention, the surface roughness of the back surface is a "Ra" value measured using the said 3D surface roughness meter SURFCOM 575A.

In addition, the protective layer, the conductive layer, the undercoat layer, etc. described in paragraphs [0017] to [0022] of JP 2006-48024 A may be formed on the rear surface in addition to the layer having a great influence on the surface roughness.

Photosensitivity Thermal transfer material

The photosensitive thermal transfer material (hereinafter, simply referred to as "transfer material") of the present invention is formed with a thermal transfer layer (photosensitive thermal transfer layer) having at least a photosensitive property on a side opposite to the rear surface of the base member, and a thermoplastic resin layer and an intermediate layer, if necessary. , And a protective layer may be formed.

Delay

As a branch support, the base material which consists of well-known materials, such as polyester and polystyrene, can be used. Especially, the polyethylene terephthalate biaxially stretched is preferable as a support material of this invention from a viewpoint of cost, heat resistance, and dimensional stability. It is preferable that the thickness of a branch body is about 15-200 micrometers, and it is more preferable that it is about 30-150 micrometers. If the thickness of the branch support is within the above range, it is possible to effectively suppress the occurrence of wrinkles on the tin plate due to heat in the lamination step, which is advantageous in terms of cost.

Photosensitivity Thermal transfer layer

In the case where the photosensitive thermal transfer layer according to the present invention is used to form a light shielding part such as a black matrix, the photosensitive thermal transfer layer may be a photosensitive black resin layer described in Japanese Patent Laid-Open No. 2005-3861 or Japanese Patent Laid-Open No. 2004-240039. It can form similarly to the layer which consists of the coloring composition of description. In order to form colored pixels such as RGB, when using the photosensitive thermal transfer layer according to the present invention, the photosensitive thermal transfer layer can be formed in the same manner as the layer made of the colored photosensitive resin composition described in Japanese Patent Laid-Open No. 2006-23696. . When using the photosensitive thermal transfer layer which concerns on this invention for forming a spacer etc., the said photosensitive thermal transfer layer can be formed similarly to the photosensitive resin layer of Unexamined-Japanese-Patent No. 2006-64921. When using the photosensitive thermal transfer layer which concerns on this invention in order to form the processus | protrusion for liquid crystal orientation control etc., the said photosensitive thermal transfer layer can be formed similarly to the photosensitive resin layer of Unexamined-Japanese-Patent No. 2006-64765.

In addition, an example of a method of forming the photosensitive thermal transfer layer is applied by applying a coating device such as a slit coater, a spinner, a wheeler, a roller coater, a curtain coater, a knife coater, a wire bar coater, an extruder, and the like on a support body to dry it. It includes the method of forming by making it. Especially, the coating method using a slit coater is preferable, As the method, the method of using the slit-shaped nozzle of Unexamined-Japanese-Patent No. 2006-23696 can be referred.

Other layers

As a layer other than the said photosensitive thermal transfer layer which comprises the photosensitive thermal transfer material of this invention, the thermoplastic resin layer, intermediate | middle layer, and protective film of Paragraph No. 2005-3861 of Unexamined-Japanese-Patent No. 2005-3861 are listed as preferable. can do.

Image Formation Method

The image forming method of the present invention is characterized by including the step of carrying out lamination by contacting the photosensitive thermal transfer material of the present invention to a substrate in a pre-heated state (hereinafter referred to as "transfer"). In addition to the laminating step, steps such as "exposure", "development", "baking", and "post exposure" may be performed.

Warrior

A method of transferring the photosensitive thermal transfer layer of the photosensitive thermal transfer material of the present invention to a substrate will be described. It is preferable to perform transfer by the method of laminating and contacting a photosensitive thermal transfer layer and a board | substrate. The transfer process conditions include using the substrate by heating the substrate within a range of 60 to 150 ° C. with a preliminary heating device. In the transfer process conditions, the rubber roller temperature is within the range of 80 to 140 ° C., the laminating pressure (linear pressure) is within the range of 50 to 200 N / cm, and / or the conveying speed (the laminating speed) is within the range of 0.5 to 5 m / min. It is preferable to also include. When the rubber roller temperature exceeds 150 ° C., wrinkles enter the photosensitive thermal transfer material, and when the rubber roller temperature is less than 80 ° C., the adhesion of the photosensitive resin layer is lowered. By controlling the surface roughness of the rear surface to be within the preferred surface roughness range of the present invention, good lamination can be achieved even at a high conveying speed. Moreover, it is preferable that a conveyance speed is quick from a viewpoint of productivity improvement. Specifically, the conveyance speed is preferably 1 to 5 m / minute, and particularly preferably 2 to 5 m / minute.

In the use of the transfer material of the present invention, it is preferable to peel off the supporting member after the transfer step by lamination.

Exposure

When the photosensitive thermal transfer material of the present invention has a photosensitive transfer layer, pixel formation in the photosensitive thermal transfer layer is by exposure. Here, the light source used for exposure is selected according to the photosensitivity of the light shielding transfer layer. For example, well-known light sources, such as an ultra-high pressure mercury lamp, a xenon lamp, a carbon arc lamp, an argon laser, a metal halide lamp, can be used. As described in JP-A-6-59119, an optical film or the like having a light transmittance of 400 nm or more and a wavelength of 2% or less may be used in combination.

The exposure method may be a batch exposure for exposing the entire surface of the substrate at one time, or may be a divided exposure for dividing the substrate and dividing the substrate several times. The scanning exposure may be performed while scanning the surface of the substrate using a laser.

phenomenon

As a developing solution used for removing the unexposed part of the transfer layer which the exposed exposure part hardened | cured, the dilute aqueous solution of an alkaline substance is used. In addition, a small amount of an organic solvent miscible with water may be added to the lean aqueous solution.

Suitable alkaline materials include alkali metal hydroxides (e.g. sodium hydroxide, potassium hydroxide), alkali metal carbonates (e.g. sodium carbonate, potassium carbonate), alkali metal bicarbonates (e.g. sodium bicarbonate, potassium hydrogen carbonate), alkali metal silicates (Eg, sodium silicate, potassium silicate), alkali metal methane silicates (eg sodium methane silicate, potassium methane silicate), triethanolamine, diethanolamine, monoethanolamine, morpholine, tetraalkylammonium hydroxy (example , Tetramethylammonium hydroxide) or trisodium phosphate.

It is preferable that the density | concentration of alkaline substance in a developing solution exists in the range of 0.01-30 mass%. It is preferable that the pH of a developing solution exists in the range of 8-14. In addition, if necessary, according to the properties such as oxidation of the transfer layer, for example, by changing the pH of the developing solution and the like, the developing condition of the developing solution can be adjusted. It is possible.

Suitable organic solvents that are miscible with water are methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-butyl ether, benzyl alcohol , Acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoamide, ethyl lactate, methyl lactate, ε-caprolactam, N -Methylpyrrolidone can be enumerated. It is common that the density | concentration of the organic solvent miscible with water in a developing solution is 0.1-30 mass% range.

Moreover, a well-known surfactant can be added to a developing solution. It is preferable that the density | concentration of the water surfactant in a developing solution is 0.01-10 mass% range.

The developing solution can be used either in the needle solution or in the spray solution. Preferred examples of the method of removing the uncured portion of the photosensitive thermal transfer layer in a solid form (preferably in the form of a film) include rubbing in a developing solution with a rotary brush or a lubricating sponge, or using a spray pressure when spraying the developing solution. .

It is preferable that the temperature of a developing solution is about 40 degreeC normally from room temperature vicinity. It is also possible to introduce a water washing step after the development treatment.

Bake

After the developing step, a heat treatment called a bake may be performed as necessary. By this process, the photosensitive thermal transfer layer hardened | cured by exposure is heated, hardening is accelerated | stimulated, and the solvent resistance and alkali resistance of the photosensitive thermal transfer layer can be improved. As a heating method, the method of heating a board | substrate after image development with an electric furnace, a dryer, etc., and the method of heating with an infrared lamp are mentioned.

In baking, the heating temperature or heating time depends on the composition and thickness of the photosensitive thermal transfer layer. In general, the heating temperature is preferably in the range of 120 to 250 ° C., and the heating time is in the range of 10 to 300 minutes, and more preferably in the heating temperature of 180 to 240 ° C. and in the range of the heating time of 30 to 200 minutes. Do.

Post exposure

In addition, you may perform exposure called a postexposure in order to accelerate hardening of the photosensitive thermal transfer layer before performing the said heat processing (baking) after a image development process. This post-exposure can also be performed by the same method as the above-mentioned first exposure, that is, exposure for image formation.

The photosensitive thermal transfer material of the present invention can be used for various applications as the photosensitive thermal transfer layer is transferred onto a desired support as described above. In particular, the photosensitive thermal transfer material of the present invention having the surface roughness of the thick layer of 0.008 to 0.05 µm has excellent conveyability and no conveyance defects when conveyed to a desired substrate. It is an excellent transfer material in which generation of load is effectively suppressed, and its application field is wide. Moreover, since the favorable conveyability is maintained even in high temperature atmosphere, when the photosensitive thermal transfer material of this invention is used for high temperature conveyance use, the effect is remarkable.

Display device

The display device member of the present invention is manufactured by the image forming method of the present invention. There is no restriction | limiting in particular in the kind of said display device member, According to the objective, it can select suitably, Any one or more of a spacer (pillar), a rib, an overlapping column, and a color filter is suitable. Especially, the color filter is preferable as the member for display devices of this invention in that the effect of this invention appears more remarkably.

The color filter may be formed by arranging RGB pixels composed of at least three primary colors in a mosaic or stripe shape.

There is no restriction | limiting in particular in the dimension of each pixel, According to the objective, it can select suitably. Preferred examples of the dimensions can be said to be in the range of 40 ~ 200㎛. In the case where the pixels are arranged in a stripe shape, those having a width of 40 to 200 mu m are usually used.

An example of the color filter manufacturing method may include forming a black matrix subjected to exposure and development using a black photosensitive layer on a transparent substrate, and then using the photosensitive layer colored with any one of RGB three primary colors. The method includes forming a color filter in which RGB three primary colors are arranged in a mosaic or stripe pattern on the transparent substrate by performing a predetermined arrangement with respect to each color and sequentially exposing and developing each color.

Display

Examples of the display device in the present invention include a liquid crystal display device, a plasma display display device, an EL display device, a CRT display device and the like.

The definition of the display device and the explanation of each display device are described in, for example, "Electronic display device (Aki Sasaki, published by Sumiko High Society) 1990," Display device (by Yoshiyuki Ibuki, Industrial Books) Issuance).

The display device of the present invention is a display device having the aforementioned display device member, and particularly preferably a liquid crystal display device.

The liquid crystal display device has liquid crystals encapsulated between a pair of substrates arranged opposite to each other, and has the color filter of the present invention, and other members as necessary.

The color filter is intended to be formed on an opposing substrate (a substrate on the side without an active element such as TFT) of the liquid crystal display device, and a COA method formed on the TFT substrate side and only black on the TFT substrate side. The BOA method or the HA method having the HA (High Aperture) structure on the TFT substrate can also be targeted.

In addition, it is possible to form an overcoat film or a transparent conductive film on the color filter as necessary. Thereafter, the liquid crystal is sealed between the color filter and the counter substrate, and a liquid crystal display device is manufactured. There is no restriction | limiting in particular in a liquid crystal display system, It selects suitably according to the objective. For example, Electrically Controlled Birefringence (ECB), Twisted Nematic (TN), Optically Compensatory Bend (OCB), Vertically Aligned (VA), Hybrid Aligned Nematic (HAN), Super Twisted Nematic (STN), In-Plane Switching ), GH (Guest Host), FLC (ferroelectric liquid crystal), AFLC (antiferroelectric liquid crystal), PDLC (polymer dispersed liquid crystal) and the like.

The liquid crystal display device of the present invention can display vivid colors by using the display device member of the present invention, and can be suitably used for devices such as portable terminals and portable game machines.

As a basic configuration of the liquid crystal display device, (1) driving elements such as thin film transistors (hereinafter referred to as "TFTs"), driving side substrates on which pixel electrodes (conductive layers) are arranged, color filters, and counter electrodes (conductive layers) (2) A color filter integrated driving substrate and a counter electrode, in which a color filter is directly formed on the driving side substrate, wherein the color filter side substrate including the substrate is disposed to face each other with a spacer interposed therebetween. And a counter substrate having a layer) are arranged to face each other via a spacer, and a liquid crystal material is enclosed in the gap portion thereof.

EXAMPLE

Hereinafter, although an Example is given and this invention is demonstrated concretely, this invention is not restrict | limited by these.

Example 1

After biaxial stretching and heat setting at 240 ° C. for 10 minutes, a polyethylene terephthalate film having a thickness of 75 μm subjected to corona discharge treatment was used as a carrier, and the following thick layer coating solution 1 was applied to one surface thereof and dried at 130 ° C. for 2 minutes. To form a thick layer having a thickness of 0.08 μm.

[Layer Coating Liquid 1]

Acrylic resin aqueous dispersion 30.9 parts by mass

(Durimer ET-410, number average molecular weight 9,700, weight average molecular weight 17,000, solid content concentration 30%, product of Nihon Junyaku Corporation)

6.4 parts by mass of aqueous solution of carbodiimido crosslinking agent

(Carbodilite V-02-L2, solid content concentration 40%; Nisshinbo product)

Additives 1 (shown in the column of "Additives" in Table 2) 32.7 parts by mass

0.73 parts by mass of surfactant

(NAROACTY HN-100, Sanyo Chemical Industries, Ltd.)

1.44 parts by mass of surfactant

(SANDET BL, solid content 43%, Sanyo Chemical Industries)

Add so that the total mass of distilled water is 1,000 parts by mass

Next, the following coating liquid 1 for forming a rear protective layer was applied onto the thick layer, dried at 130 ° C. for 2 minutes, and a thick protective layer having a thickness of 0.05 μm was formed.

[Coating Liquid 1 for Forming Post-Protective Layer]

17.8 parts by mass of polyethylene latex

(CHEMIPEARL S120, 27% solids content, product of Mitsui Chemicals)

11.8 parts by mass of colloidal silica

(Snotex C, 20% solid content, Nissan Chemical Co., Ltd.)

1.7 parts by mass of epoxy curing agent

(Denacol EX-614B, manufactured by Nagase Chemical Co., Ltd.)

0.52 parts by mass of surfactant

(NAROACTY HN-100, Sanyo Chemical Industries, Ltd.)

0.59 parts by mass of surfactant

(SANDET BL, solid content 43%, Sanyo Chemical Industries)

Next, the photosensitive thermal transfer material formed by apply | coating each coating liquid of the following thermoplastic resin layer, an intermediate | middle layer, and a color material layer (transfer layer) in the order which is close to a branch support on the opposite side to the thick layer formation surface of a branch support was produced.

[Thermoplastic resin layer coating liquid]

Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization ratio (molar ratio) = 55 / 11.7 / 4.5 / 28.8, weight average molecular weight = 90,000)

15 parts by mass

6.5 parts by mass of polypropylene glycol diacrylate (average molecular weight = 822)

Tetraethylene glycol dimethacrylate 1.5 parts by mass

0.5 parts by mass of p-toluenesulfonamido

1.0 parts by mass of benzophenone

Methyl ethyl ketone 30 parts by mass

[Intermediate layer coating liquid]

130 parts by mass of polyvinyl alcohol (PVA205, Kuraray Co., Ltd., reduction rate = 80%)

60 parts by mass of polyvinylpyrrolidone (PSP, K-90 manufactured by ISP Japan)

3,350 parts by mass of distilled water

[Formation of transfer layer]

The coating liquids K1, R1, G1, and B1 for forming black, red, green, and blue pixels of the color filter shown in Table 1 are prepared, and the coating liquid is spin-coated on a support to form the thermoplastic resin layer and the intermediate layer, respectively. After applying at 180rpm using the oven was put in an oven and dried for 2 minutes at 100 ℃ to prepare a photosensitive thermal transfer materials K1, R1, G1, B1 for color filters of black matrix, red, green, blue. That is, the numbers in the following Table 1 represent "mass part."

In addition, the composition of K pigment dispersion 1 in the composition of Table 1 is as follows.

Carbon black (brand name: Nipex 35, manufactured by Degusa Japan Co., Ltd.) 13.1

0.65 parts of a dispersant (compound 1 below)

6.72 parts of polymer (benzyl methacrylate / methacrylic acid = random copolymer of 72/28 molar ratio, molecular weight 3.7 million)

Propylene glycol monomethyl ether acetate 79.53 parts

The composition of the binder 2 is as follows.

27 parts of polymer (benzyl methacrylate / methacrylic acid = 78/22 molar ratio random copolymer, molecular weight 3.8 million)

Propylene glycol monomethyl ether acetate 73 parts

The composition of the DPHA liquid is as follows.

76 parts of dipentaerythritol hexaacrylate (polymerization inhibitor MEHQ 500ppm, Nippon Kayaku Co., Ltd., product name: KAYARAD DPHA)

Propylene glycol monomethyl ether acetate 24 parts

The composition of Surfactant 1 is as follows.

30 structures of the following structures

70 parts ethyl methyl ketone

The composition of the R pigment dispersion 1 is as follows.

C. I. P. R. 254 (trade name: Irgaphor Red B-CF, Chiba Specialty Chemicals, Inc.)

0.8 parts of a dispersant (compound 1)

8 parts of polymer (benzyl methacrylate / methacrylic acid = 72/28 molar ratio random copolymer, molecular weight 30,000)

Propylene glycol monomethyl ether acetate 83 parts

The composition of the R pigment dispersion 2 is as follows.

C. I. P. R. 177 (trade name: Cromophtal Red A2B, Chiba Specialty Chemicals) 18 copies

12 parts of polymer (benzyl methacrylate / methacrylic acid = 72/28 molar ratio random copolymer, molecular weight 30,000)

70 parts of propylene glycol monomethyl ether acetate

The composition of the binder 1 is as follows.

27 parts of polymer (benzyl methacrylate / methacrylic acid / methyl methacrylate = 38/25/37 molar ratio random copolymer, molecular weight 40,000)

Propylene glycol monomethyl ether acetate 73 parts

As the additive 1, a phosphate ester-based special activator (manufactured by Kusumoto Chemical Co., Ltd., product name: HIPLAAD ED 152) was used.

G pigment dispersion 1 was used in the product name "GT-2" manufactured by FUJIFILM Electronics.

Y pigment dispersion 1 was used by Mikuni Color Co., Ltd. "trade name: CF Yellow EX3393".

Pigment Dispersion 1 was used by Mikuni Color Co., Ltd. "Product Name: CF Blue EX3357".

B pigment dispersion 2 was used by Mikuni dye Co., Ltd. "trade name: CF blue EX3383".

The composition of the binder 3 is as follows.

27 parts of a polymer (benzyl methacrylate / methacrylic acid / methyl methacrylate = 36/22/42 molar ratio random copolymer, molecular weight 3.8 million)

Propylene glycol monomethyl ether acetate 73 parts

Next, the glass-cleaning liquid adjusted to 25 degreeC of an alkali free glass substrate was wash | cleaned with the nylon hair rotating brush, spraying for 20 second with a shower, and after a pure shower washing | cleaning, a silane coupling liquid (N-((amino ethyl) (gamma) -amino) 0.3 mass% aqueous solution of a propyl trimethoxysilane, brand name: KBM603, the product made by Shin-Etsu Chemical Co., Ltd. was sprayed with a shower for 20 second, and the pure water shower wash | cleaned. The substrate was heated to 100 ° C. for 2 minutes in a substrate preheater.

The cover film was removed from the photosensitive transfer material K1 produced by the above-described method on the obtained silane coupling glass substrate, and the surface of the photosensitive thermal transfer layer exposed after removal and the surface of the silane coupling glass substrate were contacted with a laminator. ) Was laminated on the substrate heated at 100 占 폚 for 2 minutes at a rubber roller temperature of 130 占 폚, a linear pressure of 100 N / cm, and a conveying speed of 2.0 m / min.

The photosensitive thermal transfer material is conveyed when the rear surface (the surface on which the rear layer is formed) is in contact with the laminate roll.

Next, the polyethylene terephthalate base member is peeled off, and a substrate and a mask (a quartz exposure mask having an image pattern) are vertically placed with a proximity type exposure machine (manufactured by Hitachi Hi-Tech Electronics Engineering Co., Ltd.) having an ultra-high pressure mercury lamp. The distance between the exposure mask surface and the photosensitive resin layer was set to 200 µm, and exposure was performed at the transfer material side at 70 mJ / cm 2, and then development was carried out by the following steps (developing 1 → washing → developing 2 → washing). It was.

Phenomenon 1:

Developing solution TPD (Fuji Shashin Film Co., Ltd., alkali developer) 33 ° C. * 20 seconds

SuSE:

(33 ℃ * 20 seconds)

Phenomenon 2:

Developing solution TCD (Fuji Shashin Film Co., Ltd., alkali developer) 33 ° C * 20 seconds

SuSE:

(33 ℃ * 20 seconds)

The obtained sample was heat-treated at 220 degreeC for 40 minutes, and the black matrix which has an opening of 100 micrometer x 300 micrometers of width 10micrometer was obtained.

Next, using the photosensitive thermal transfer materials R1, G1, and B1, an RGB colored pixel was formed in the portion surrounded by the black matrix in the same manner as the method of forming the black matrix, to obtain a color filter.

evaluation

In the production of the color filter, a red beta sample was produced in the same manner except that the red transfer material R1 was used and no mask exposure was performed, and the following method was evaluated.

(1) Evaluation of Laminated State

For the beta image obtained above, the lamination state was observed with an optical microscope after the release of the support, and the presence or absence of bubbles remaining in the lamination process was observed.

Evaluation standard

A: No bubbles

B: Bubbles were generated other than the pattern forming portion.

C: Bubbles were generated in a part of the pattern formation part.

D: Bubbles occurred in several places of the pattern formation part.

(2) evaluation of wrinkles

About the beta image before exposure obtained above, the lamination state was observed with the optical microscope after the support body peeling, and the presence or absence of wrinkles was observed. Evaluation criteria of wrinkles are as follows.

Evaluation standard

A: No wrinkles.

B: Wrinkles occur in a part of the patterned area.

C: Wrinkles occur in several places where the pattern is formed.

D: wrinkles on the front.

(3) Evaluation of the pollution level of the heating roller

After completion of the 10-sheet processing, the contamination of the roller surface on the side in contact with the transfer material was visually evaluated according to the following evaluation criteria.

Evaluation standard

(Circle): There is no pollution at all.

X: It became contamination.

(4) Evaluation of surface roughness on the back

The surface roughness of the back surface was measured using the three-dimensional surface roughness meter SURFCOM 575A (Tokyo Seimitsu Co., Ltd. product). In addition, the measurement was made on the conditions of 20,000 times the measurement magnification, and 0.08 mm of cutoff wavelengths.

EXAMPLES 2-6, COMPARATIVE EXAMPLES 1-3

In Example 1, the color filter was produced like Example 1 except having changed the kind and addition amount of the additive 1 into what is shown in Table 2 below.

[Comparative Example 4]

In Example 1, except that the thick layer coating liquid 1 was changed to the thick layer coating liquid prescription without the addition of additive 1, and the coating liquid 1 for forming the rear protective layer was changed to the coating liquid 2 for forming the rear protective layer shown below. A color filter was manufactured in the same manner as in Example 1.

[Coating Liquid 2 for Forming Protective Layer 2]

17.8 parts by mass of polyethylene latex

(CHEMIPEARL S120, 27% solids content, product of Mitsui Chemicals)

11.8 parts by mass of colloidal silica

(Snotex C, 20% solid content, Nissan Chemical Co., Ltd.)

1.7 parts by mass of epoxy curing agent

(Denacol EX-614B, manufactured by Nagase Chemical Co., Ltd.)

0.52 parts by mass of surfactant

(NAROACTY HN-100, Sanyo Chemical Industries, Ltd.)

0.59 parts by mass of surfactant

(SANDET BL, solid content 43%, Sanyo Chemical Industries)

2.8 parts by mass of lubricant (C ₁₆ H ₃₃ OSO ₃ Na)

In addition, the detail about the additive used for each said Example and the comparative example is as follows.

SN38F: SnO ₂ fine particles (17% solids) from Ishihara Sangyo Co., Ltd.

R533D: SamO ₂ Material SnO ₂ Fine Particles (Solid 17%)

KE-E20: Nihon Shokubai Co., Ltd. Silica Fine Particles (trade name: Seastar KE-E20, 20% solids)

KE-E40: Nihon Shokubai Co., Ltd. Silica Fine Particles (trade name: Seastar KE-E40, 20% solids)

As can be seen from Table 2, in the embodiment using the photosensitive thermal transfer material having a surface roughness of 0.008㎛ ~ 0.05㎛ of the back surface, both the laminate state, the presence of wrinkles, and the contamination of the heating roller showed good results.

On the other hand, in Comparative Examples 1 and 2 using the photosensitive thermal transfer material having a surface roughness of less than 0.008 µm, the slipperiness of the rear surface was poor and wrinkles appeared in the transfer layer during transfer. Wrinkles could be confirmed even when the conveyance speed was slowed. In Comparative Example 4 using a transfer material containing a large amount of lubricant to improve slipperiness, wrinkles were improved, but contamination of the heating roller part occurred.

In addition, in Comparative Example 3 using a transfer material having a surface roughness of more than 0.05 µm, wrinkles were not observed, but the laminate state was bad due to the deterioration of heat transferability.

Example 7

The liquid crystal display device was manufactured by the following method using the color filter produced by the said Example and the comparative example.

In addition, transparent electrodes of indium tin oxide (ITO) were formed on the R pixels, the G pixels, the B pixels, and the black matrix of the color filter substrate obtained as described above by spattering.

Next, according to Example 1 of Japanese Patent Laid-Open No. 2006-64921, spacers were formed in portions corresponding to the upper portions of the black matrix on the ITO film formed above.

A glass substrate was separately prepared as a counter substrate, and patterning was formed on the transparent electrode and the counter substrate of the color filter substrate for the PVA mode, respectively, and an alignment film made of polyimide was formed thereon.

After that, by applying a dispenser method, a UV-curable resin sealant is applied to a position corresponding to the black matrix outline formed around the color filter by the dispenser method, and the liquid crystal for PVA mode is dropped and bonded to the counter substrate. The bonded substrate was cured by UV irradiation and heat treatment. The polarizing plate HLC2-2518 which is a Sanlitz Corporation product was stuck on both surfaces of the liquid crystal cell obtained in this way. Next, as a red (R) LED, FR1112H (chip type LED of Stanley Electric Co., Ltd.), DG1112H (chip type LED of Stanley Electric Co., Ltd. product) as green (G) LED, and DB1112H (stanley electric) as blue (B) LED A side light type backlight was formed by using a chip type LED of the Co., Ltd., and disposed on the side of the liquid crystal cell on which the polarizing plate was formed to form a liquid crystal display device.

The liquid crystal display device using the color filter of the Example was good compared with the liquid crystal display device using the color filter of the comparative example.

[Examples 8-13]

In Examples 1 to 6, color filters were produced and evaluated in the same manner as in Examples 1 to 6, except that the lamination speed (transfer speed) was changed to the speed shown in Table 3 at 0.6 m / min. On the other hand, a conveyance speed is preferable from a viewpoint of a quick degree and productivity.

Example 11 and Example 12 whose surface roughness is 0.025-0.04 micrometer showed the favorable result similarly to Example 1 even if the conveyance speed (lamination speed) was made high.

The present invention provides a photosensitive thermal transfer material capable of forming a good image by suppressing wrinkles even when laminated at high speed, and an image forming method using the photosensitive thermal transfer material, a member for a display device, a color filter, and a display device. Can be.

Claims (9)

A photosensitive thermal transfer material comprising a branch support and at least one photosensitive thermal transfer layer formed on one surface of the branch support, A photosensitive thermal transfer material, characterized in that the surface roughness of the rear surface, which is the opposite side of the surface having the photosensitive thermal transfer layer of the branch support in the range of 0.008 ~ 0.05㎛. The photosensitive thermal transfer material according to claim 1, wherein the surface roughness of the rear surface is in a range of 0.01 to 0.045 µm. The photosensitive thermal transfer material according to claim 1, wherein the surface roughness of the rear surface is in the range of 0.025 to 0.040 µm. The photosensitive thermal transfer material according to any one of claims 1 to 3, which is used for forming a color filter for a display device. An image forming method comprising the step of performing a laminate by contacting a photosensitive thermal transfer material according to any one of claims 1 to 4 with a substrate in a preheated state. The image forming method according to claim 5, wherein a conveying speed of the substrate and the photosensitive thermal transfer material in the laminating step is in a range of 1 to 5 m / min. A member for a display device, which is formed by the image forming method according to claim 5 or 6. The color filter for display apparatuses formed by the image forming method of Claim 5 or 6. A display device comprising the color filter according to claim 8.