TW200745631A - Photosensitive thermal transferable material, image forming method, display device, color filter, and display apparatus - Google Patents

Photosensitive thermal transferable material, image forming method, display device, color filter, and display apparatus

Info

Publication number
TW200745631A
TW200745631A TW096116207A TW96116207A TW200745631A TW 200745631 A TW200745631 A TW 200745631A TW 096116207 A TW096116207 A TW 096116207A TW 96116207 A TW96116207 A TW 96116207A TW 200745631 A TW200745631 A TW 200745631A
Authority
TW
Taiwan
Prior art keywords
thermal transferable
photosensitive thermal
image forming
color filter
forming method
Prior art date
Application number
TW096116207A
Other languages
Chinese (zh)
Inventor
Akira Hatakeyama
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200745631A publication Critical patent/TW200745631A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Optical Filters (AREA)

Abstract

The invention provides a photosensitive thermal transferable material having at least a temporary support and a photosensitive thermal transferable layer provided on or above one surface side of the temporary support, wherein a surface roughness of a back layer, that resides on the opposite side of the surface side of the temporary support on or above which the photosensitive thermal transferable layer is provided, is in a range of 0.008 to 0.05 μm. The surface roughness of the back layer is preferably in a range of 0.01 to 0.045 μm, and more preferably in a range of 0.025 to 0.040 μm.
TW096116207A 2006-05-09 2007-05-08 Photosensitive thermal transferable material, image forming method, display device, color filter, and display apparatus TW200745631A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006130728 2006-05-09

Publications (1)

Publication Number Publication Date
TW200745631A true TW200745631A (en) 2007-12-16

Family

ID=38991659

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096116207A TW200745631A (en) 2006-05-09 2007-05-08 Photosensitive thermal transferable material, image forming method, display device, color filter, and display apparatus

Country Status (3)

Country Link
KR (1) KR20070109896A (en)
CN (1) CN101093350A (en)
TW (1) TW200745631A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI716347B (en) * 2014-04-25 2021-01-21 日商昭和電工材料股份有限公司 Photosensitive element, laminate, permanent resist mask, method of manufacturing the same, and method of manufacturing semiconductor package

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI400549B (en) 2010-06-01 2013-07-01 Prime View Int Co Ltd Method for manufacturing color electrophoretic display device
CN102645809B (en) * 2011-02-22 2015-05-13 元太科技工业股份有限公司 Manufacturing method of color electrophoretic display device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI716347B (en) * 2014-04-25 2021-01-21 日商昭和電工材料股份有限公司 Photosensitive element, laminate, permanent resist mask, method of manufacturing the same, and method of manufacturing semiconductor package
TWI769637B (en) * 2014-04-25 2022-07-01 日商昭和電工材料股份有限公司 Photosensitive element, laminate, permanent resist mask, method for producing the same, and method for producing a semiconductor package

Also Published As

Publication number Publication date
KR20070109896A (en) 2007-11-15
CN101093350A (en) 2007-12-26

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