KR20070108908A - 스퍼터링 타겟 제조방법 - Google Patents

스퍼터링 타겟 제조방법 Download PDF

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Publication number
KR20070108908A
KR20070108908A KR1020077020759A KR20077020759A KR20070108908A KR 20070108908 A KR20070108908 A KR 20070108908A KR 1020077020759 A KR1020077020759 A KR 1020077020759A KR 20077020759 A KR20077020759 A KR 20077020759A KR 20070108908 A KR20070108908 A KR 20070108908A
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KR
South Korea
Prior art keywords
metal
target
component
molybdenum
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020077020759A
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English (en)
Korean (ko)
Inventor
다이애나 엘. 모랄레스
수잔 디. 스트로더스
Original Assignee
허니웰 인터내셔널 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 허니웰 인터내셔널 인코포레이티드 filed Critical 허니웰 인터내셔널 인코포레이티드
Publication of KR20070108908A publication Critical patent/KR20070108908A/ko
Withdrawn legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B22F3/15—Hot isostatic pressing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/22—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using physical deposition, e.g. vacuum deposition or sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
KR1020077020759A 2005-03-11 2005-11-29 스퍼터링 타겟 제조방법 Withdrawn KR20070108908A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US66129205P 2005-03-11 2005-03-11
US60/661,292 2005-03-11

Publications (1)

Publication Number Publication Date
KR20070108908A true KR20070108908A (ko) 2007-11-13

Family

ID=36177362

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077020759A Withdrawn KR20070108908A (ko) 2005-03-11 2005-11-29 스퍼터링 타겟 제조방법

Country Status (7)

Country Link
US (1) US20060201589A1 (https=)
EP (1) EP1866456A2 (https=)
JP (1) JP2008533299A (https=)
KR (1) KR20070108908A (https=)
CN (1) CN101155945A (https=)
TW (1) TW200641166A (https=)
WO (1) WO2006098781A2 (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8250895B2 (en) * 2007-08-06 2012-08-28 H.C. Starck Inc. Methods and apparatus for controlling texture of plates and sheets by tilt rolling
EP2185300B1 (en) * 2007-08-06 2018-10-24 H. C. Starck, Inc. Refractory metal plates with improved uniformity of texture
JP4879842B2 (ja) * 2007-08-20 2012-02-22 Ｊｘ日鉱日石金属株式会社 ジルコニウム坩堝
JP5135002B2 (ja) * 2008-02-28 2013-01-30 ルネサスエレクトロニクス株式会社 半導体装置
EP2270252B1 (en) * 2008-03-17 2016-06-22 JX Nippon Mining & Metals Corporation Sintered target and method for production of sintered material
JP5301530B2 (ja) * 2008-03-28 2013-09-25 Ｊｘ日鉱日石金属株式会社 磁性材ターゲット用白金粉末、同粉末の製造方法、白金焼結体からなる磁性材ターゲットの製造方法及び同焼結磁性材ターゲット
WO2013003458A1 (en) 2011-06-27 2013-01-03 Soleras Ltd. Sputtering target
CN102366856A (zh) * 2011-10-20 2012-03-07 宁波江丰电子材料有限公司 钴靶材组件的焊接方法
WO2014069328A1 (ja) * 2012-11-02 2014-05-08 Jx日鉱日石金属株式会社 タングステン焼結体スパッタリングターゲット及び該ターゲットを用いて成膜したタングステン膜
CN104513953B (zh) * 2013-09-30 2018-02-09 宁波江丰电子材料股份有限公司 钼硅靶材的制作方法
CN104694895B (zh) * 2013-12-05 2017-05-10 有研亿金新材料股份有限公司 一种W‑Ti合金靶材及其制造方法
JP6677875B2 (ja) * 2015-03-23 2020-04-08 三菱マテリアル株式会社 多結晶タングステン及びタングステン合金焼結体並びにその製造方法
JP7174476B2 (ja) 2017-03-31 2022-11-17 Ｊｘ金属株式会社 タングステンターゲット
SG11202008465YA (en) * 2018-03-05 2020-09-29 Global Advanced Metals Usa Inc Powder metallurgy sputtering targets and methods of producing same
CN111020330B (zh) * 2019-12-13 2021-06-01 安泰天龙钨钼科技有限公司 一种钼铼合金型材的制备方法
CN111270210B (zh) * 2020-03-17 2021-11-12 贵研铂业股份有限公司 一种晶粒高定向取向的钌溅射靶材及其制备方法
CN114574821B (zh) * 2022-01-31 2023-05-23 安泰科技股份有限公司 一种大尺寸钼靶材的制备方法
CN115233175A (zh) * 2022-08-08 2022-10-25 新加坡先进薄膜材料私人有限公司 一种钌旋转溅射靶材的制备方法
US20260092357A1 (en) * 2024-10-02 2026-04-02 Applied Materials, Inc. Monolithic physical vapor deposition target design

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH028304A (ja) * 1988-06-27 1990-01-11 Central Glass Co Ltd タングステン粉末の製造法
US5590389A (en) * 1994-12-23 1996-12-31 Johnson Matthey Electronics, Inc. Sputtering target with ultra-fine, oriented grains and method of making same
US20030052000A1 (en) * 1997-07-11 2003-03-20 Vladimir Segal Fine grain size material, sputtering target, methods of forming, and micro-arc reduction method
US6569270B2 (en) * 1997-07-11 2003-05-27 Honeywell International Inc. Process for producing a metal article
JP4058777B2 (ja) * 1997-07-31 2008-03-12 日鉱金属株式会社 薄膜形成用高純度ルテニウム焼結体スパッタリングターゲット及び同ターゲットをスパッタリングすることによって形成される薄膜
JP3244167B2 (ja) * 1998-01-19 2002-01-07 日立金属株式会社 タングステンまたはモリブデンターゲット
JP3743740B2 (ja) * 1998-07-27 2006-02-08 日立金属株式会社 Ｍｏ系焼結ターゲット材
US6328927B1 (en) * 1998-12-24 2001-12-11 Praxair Technology, Inc. Method of making high-density, high-purity tungsten sputter targets
US6039674A (en) * 1999-03-26 2000-03-21 Daimlerchrysler Corporation Quick learn procedure for fill volumes of an electronically controlled automatic transmission
JP2001020065A (ja) * 1999-07-07 2001-01-23 Hitachi Metals Ltd スパッタリング用ターゲット及びその製造方法ならびに高融点金属粉末材料
US6165413A (en) * 1999-07-08 2000-12-26 Praxair S.T. Technology, Inc. Method of making high density sputtering targets
US6521173B2 (en) * 1999-08-19 2003-02-18 H.C. Starck, Inc. Low oxygen refractory metal powder for powder metallurgy
US6462339B1 (en) * 2000-09-20 2002-10-08 Cabot Corporation Method for quantifying the texture homogeneity of a polycrystalline material
TW541350B (en) * 2000-12-29 2003-07-11 Solar Applied Material Technol Method for producing metal target for sputtering
JP3748221B2 (ja) * 2001-10-23 2006-02-22 日立金属株式会社 Ｍｏ系スパッタリング用ターゲットおよびその製造方法
JP2003226964A (ja) * 2002-02-05 2003-08-15 Nippon Steel Corp スパッタリング用タングステンターゲットの製造方法
JP2003342720A (ja) * 2002-05-20 2003-12-03 Nippon Steel Corp スパッタリング用モリブデンターゲットの製造方法及びモリブデンターゲット
US7832619B2 (en) * 2004-02-27 2010-11-16 Howmet Corporation Method of making sputtering target
US20060042728A1 (en) * 2004-08-31 2006-03-02 Brad Lemon Molybdenum sputtering targets

Also Published As

Publication number Publication date
US20060201589A1 (en) 2006-09-14
TW200641166A (en) 2006-12-01
WO2006098781A2 (en) 2006-09-21
CN101155945A (zh) 2008-04-02
WO2006098781A3 (en) 2006-11-09
JP2008533299A (ja) 2008-08-21
EP1866456A2 (en) 2007-12-19

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