KR20070079612A - Liquid crystal display panel and memufacturing method thereof - Google Patents

Abstract

An LCD(Liquid Crystal Display) panel and a manufacturing method thereof are provided to form a trap electrode between a display area and a sealant in order to collect ion impurities due to the non-curing of the sealant. A TFT(Thin Film Transistor) is formed at the display area of a lower substrate(10). An upper substrate is located oppositely to the lower substrate and has a black matrix for preventing the light leakage from being generated at a non-display area. A sealant(300) bonds the upper and lower substrates. A trap electrode is formed at the non-display area in a side of any one of the upper and lower substrates and collects ion impurities due to the non-curing of the sealant. The trap electrode includes the first trap electrode formed at the upper substrate. The first trap electrode is any one of a floating electrode formed by floating with the common electrode and the black matrix. A voltage supply line(400) supplies the voltage to the first trap electrode. The second trap electrode is formed on the lower substrate and overlapped with the first black matrix.

Description

Liquid crystal panel and its manufacturing method {LIQUID CRYSTAL DISPLAY PANEL AND MEMUFACTURING METHOD THEREOF}

1 is a cross-sectional view illustrating a cross section of a liquid crystal panel according to a first embodiment of the present invention.

2 is a cross-sectional view of a liquid crystal panel according to a second exemplary embodiment of the present invention.

3 is a cross-sectional view illustrating a cross section of a liquid crystal panel according to a third exemplary embodiment of the present invention.

4 is a cross-sectional view illustrating the formation of the trap electrode illustrated in FIG. 3 in a double line;

5 and 6 are cross-sectional views illustrating a cross section of a liquid crystal panel according to a fourth exemplary embodiment of the present invention.

<Brief Description of Drawings>

1: color filter substrate 2: thin film transistor substrate

10: lower substrate 20: gate electrode

21: gate insulating film 22: active layer

23: ohmic contact layer 30: drain electrode

31: source electrode 40: contact hole

50: protective film 60: pixel electrode

100: upper substrate 110: the second black matrix

120: first black matrix 130: color filter

140: overcoat 150: common electrode

160: floating electrode 200: liquid crystal

250: second trap electrode 300: sealant

400: voltage supply line

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal panel, and more particularly, to a liquid crystal panel and a method of manufacturing the same, which prevents an afterimage due to uncured sealant.

In general, a liquid crystal display device is an apparatus for displaying an image by adjusting the light transmittance of the liquid crystal using an electric field. The liquid crystal display includes a color filter substrate and a thin film transistor substrate which are bonded to each other with the liquid crystal interposed therebetween.

The color filter substrate includes a black matrix for preventing light leakage on the upper substrate, a color filter array for color implementation, and a common electrode for applying a common voltage to the liquid crystal.

The thin film transistor substrate includes a gate line and a data line formed to cross each other on a lower substrate, a thin film transistor formed at an intersection thereof, and a pixel electrode connected to the thin film transistor.

The liquid crystal is driven by the voltage difference between the pixel electrode supplied with the data signal and the common electrode supplied with the common voltage which is a reference voltage. As a result, the liquid crystal having the dielectric anisotropy rotates according to the voltage difference to vary the transmittance of the light incident from the light source.

Each of the substrates on which the thin film transistor array and the color filter array are formed are bonded to each other with a sealant, and a liquid crystal is injected to manufacture a liquid crystal panel. At this time, an impurity penetrates into the liquid crystal in the process of injecting the liquid crystal, or a sealant for bonding the color filter substrate and the thin film transistor substrate penetrates into the liquid crystal panel to contaminate the liquid crystal.

In particular, during manufacture of the liquid crystal panel, uncured sealant components are diffused toward the display region into which the liquid crystal is injected, so that an afterimage occurs from the periphery of the liquid crystal panel, and the afterimage diffuses into the center portion of the liquid crystal panel as time passes.

Accordingly, an object of the present invention is to provide a liquid crystal panel and a method of manufacturing the same, by forming a trap electrode between the display area and the sealant to prevent an afterimage caused by impurities.

In order to achieve the above object, the present invention provides a lower substrate on which a thin film transistor is formed in a display area, an upper substrate corresponding to the lower substrate, and a black matrix formed therein to prevent light leakage to the non-display area, and the lower substrate. And a sealant for adhering the upper substrate and a trap electrode formed in a non-display area of at least one of the upper and lower substrates to collect ionic impurities due to uncuring of the sealant. to provide.

The trap electrode may include a first trap electrode formed on the upper substrate, and the first trap electrode may be at least one of the floating electrode and the black matrix formed by floating the common electrode.

And a voltage supply line for supplying a voltage to the first trap electrode.

The first trap electrode is formed as a double line is characterized in that the voltage of different polarity is supplied.

A second trap electrode is formed on the lower substrate by overlapping with the first black matrix.

The second trap electrode may be at least one of a gate metal, a data metal, and a transparent metal.

The second trap electrode is formed of a double line is characterized in that the voltage of different polarity is supplied.

Meanwhile, a first trap electrode formed on the upper substrate and a second trap electrode formed on the lower substrate may be provided, and voltages having different polarities may be supplied to the first and second trap electrodes, respectively.

In order to achieve the above object, a method of manufacturing a liquid crystal panel according to the present invention includes the steps of: providing a thin film transistor substrate having a thin film transistor array and having a voltage supply line at an outer side of a sealant applied along an outer side of a display area; And forming a color filter substrate having a black matrix formed of an opaque metal on an upper substrate, and bonding the thin film transistor substrate and the color filter substrate to connect the voltage supply line with the black matrix to form a first trap electrode. It includes.

The forming of the color filter substrate may include forming a floating electrode overlapping the black matrix and floating with the common electrode and connecting the voltage supply line formed on the lower substrate with the floating electrode to form a first trap electrode. It further comprises a step.

The method may further include forming a second trap electrode on the lower substrate, the second trap electrode overlapping the black matrix and adjacent to the sealant to collect impurities.

At least one of the first and second trap electrodes may further include forming a double line.

The first trap electrode may further include forming at least one of a gate metal, a data metal, and a transparent metal.

On the other hand, the step of providing a thin film transistor substrate having a thin film transistor array formed with a sealant applied along the outside of the display area, the step of providing a color filter substrate having a black matrix formed on the upper substrate, and overlaps with the bla matrix And forming a trap electrode formed adjacent to the sealant of the lower substrate.

The trap electrode may further include forming a double line to which positive and negative voltages are supplied.

The trap electrode may further include forming at least one of a gate metal, a data metal, and a transparent metal.

Other objects and advantages of the present invention in addition to the above object will be apparent from the description of the preferred embodiment of the present invention with reference to the accompanying drawings. Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a cross-sectional view of a liquid crystal panel according to a first embodiment of the present invention.

Referring to FIG. 1, the liquid crystal panel according to the first embodiment of the present invention corresponds to the lower substrate 10 having the thin film transistor formed in the display area and the lower substrate 10, and prevents light leakage to the non-display area. At least one of an upper substrate 100 having the black matrix 110 and 120 formed therein, a sealant 300 for bonding the lower substrate 10 and the upper substrate 100 to each other, and at least one of the upper substrate 100 and the lower substrate 10. And a trap electrode formed in a non-display area on either side to trap ion impurities due to diffusion of the sealant 300.

Specifically, the liquid crystal panel includes a thin film transistor substrate 2 and a color filter substrate 1 bonded to each other with the liquid crystal 200 interposed therebetween.

The color filter substrate 1 includes black matrices 110 and 120, a color filter 130, an overcoat 140, and a common electrode 150 sequentially formed on the upper substrate 100.

The black matrices 110 and 120 are divided into a first black matrix 120 formed to prevent light leakage to the outside of the liquid crystal panel and a plurality of cell regions in which the color filter 130 is to be formed in the display area. A second black matrix to prevent optical interference and external light reflection of the device. To this end, the first black matrix 120 is formed along the periphery of the upper substrate 100 along the display area of the upper substrate 100, and the second black matrix 120 is formed on the lower substrate 10. The upper substrate 100 is formed to overlap the line, the gate line, and the thin film transistor.

The color filter 130 is formed to be divided into red (R), green (G), and blue (B) in the cell region divided by the second black matrix 110 to transmit red, green, and blue light, respectively. The color filter 130 is formed to overlap the second black matrix 110 to increase the aperture ratio.

The overcoat 140 overlaps the black matrix and the color filter to planarize an irregular surface.

The common electrode 150 supplies a common voltage Vcom which is a reference when driving the liquid crystal to the transparent conductive layer.

The thin film transistor substrate 2 includes a gate line and a data line intersecting each other on the lower substrate 10, a thin film transistor adjacent to the intersection portion, and a pixel electrode 60 formed in a pixel region provided in the cross structure. .

The thin film transistor keeps the pixel signal supplied to the data line charged in the pixel electrode 60 in response to the scan signal supplied to the gate line. To this end, the thin film transistor is positioned to face the gate electrode 20 connected to the gate line, the source electrode 31 connected to the data line, and the source electrode 31, and the drain electrode connected to the pixel electrode 60 ( 30, an active layer 22 forming a channel between the source electrode 31 and the drain electrode 30, and an ohmic contact layer 23 for ohmic contact with the source electrode 31 and the drain electrode 30. do.

The pixel electrode 60 charges a pixel signal supplied from the thin film transistor to generate a potential difference with the common electrode 150 formed on the color filter substrate 1. Due to this potential difference, the liquid crystal 200 positioned on the thin film transistor substrate 2 and the color filter substrate 1 is rotated by dielectric anisotropy, and the amount of light incident from the backlight unit via the pixel electrode 60 is adjusted to adjust the color. It is made to permeate toward the filter substrate 1.

The thin film transistor substrate 2 and the color filter substrate 1 are bonded by the sealant 300. The sealant 300 is applied to the outside along the display area of the thin film transistor substrate 2 and bonded to the color filter substrate 1 and then cured. Here, the sealant 300 formed on the outer side of the lower substrate 10 along the display area of the lower substrate 10 overlaps with the first black matrix 120 of the upper substrate 100 to be bonded. The sealant 300 is formed to overlap with a predetermined region of the first black matrix. That is, the sealant 300 is formed to be narrower than the width of the first black matrix 120.

At least one voltage supply line 400 is formed outside the lower substrate 10 to avoid overlapping with the sealant 300. The voltage supply line 400 supplies a voltage to the first black matrix 120 of the upper substrate 100. At this time, the voltage supply line 400 is formed of a metal material such as aluminum. The voltage supplied to the first black matrix 120 through the voltage supply line 400 collects ion impurities generated by uncuring the sealant 300. Here, when the polarity of the ion impurity is predictable, the voltage supplied through the voltage supply line 400 has a polarity opposite to that of the ion impurity.

On the other hand, when the polarity of the ion impurity is not known in advance, the first black matrix 120 is divided and supplied with the positive voltage and the negative voltage, respectively. That is, the first black matrix 120 is formed in a double line to supply the positive and negative voltages to the divided first black matrices 120, respectively. As a result, when the polarity of the ionic impurities is positive, the ionic impurities are collected through any one of the black matrices that are negatively supplied to the first black matrix 120, and conversely, when the ionic impurities are negative, the first black matrix is negative. Ion impurity is trapped through any one of the black matrices supplied with positive polarity.

Here, since the collected ion impurities are collected into the non-display area inside the first black matrix 120, display defects due to the collection of ion impurities do not occur.

In addition, the ion impurity may be collected using the floating electrode 160 overlapping the first black matrix 120.

2 is a cross-sectional view of a liquid crystal panel according to a second exemplary embodiment of the present invention.

Referring to FIG. 2, a floating electrode 160 is formed to overlap the first black matrix 120. Here, the floating electrode 160 is floated to be insulated from the common electrode 150 to overlap the first black matrix 120, and receives a voltage through the voltage supply line 400 formed at the outer side of the sealant 300. .

A first trap electrode may be formed through the floating electrode 160 to collect ion impurities.

In addition, the floating electrode 160 may be formed as a double line. Here, each of the floating electrodes 160 formed as a double may collect ionic impurities even when positive and negative voltages are applied to predict the polarity of the ionic impurities.

A method of manufacturing a liquid crystal panel according to the first and second embodiments of the present invention will be described with reference to FIGS. 1 and 2.

First, a gate metal layer including a gate line such as Cr or Cr alloy, Al or Al alloy, Mo or Mo alloy, Ag or Ag alloy, or gate electrode 20 by sputtering or the like on the lower substrate 10 such as glass or plastic. After depositing a single layer or multiple layers, the gate metal layer is patterned through a photolithography process using a gate mast to form a gate pattern.

After the gate pattern is formed, a gate insulating film 21 such as SiNx or SiOx and an active layer 22 such as a-Si and an ohmic such as n-doped a-Si are formed using a method such as plasma enhanced chemical vapor deposition (PECVD). The contact layer 23 is continuously deposited. Then, the active layer 22 and the ohmic contact layer 23 are formed through a photolithography process using an active mask.

After the gate insulating film 21 and the active layer and the ohmic contact layer 23 are formed, Cr or Cr alloys, Al or Al alloys are formed on the gate insulating film 21 and the ohmic contact layer 23 using a method such as sputtering. A data metal layer such as Mo or Mo alloy, Ag or Ag alloy, Ti or Ti alloy is deposited in a single layer or multiple layers. Subsequently, the data metal layer is patterned through a photolithography process using a data mask to form a single or multiple data pattern. Then, the ohmic contact layer 23 exposed between the source electrode 31 and the drain electrode 30 is dry etched to expose the active layer 22.

After forming the data pattern, a protective film 50 such as SiNx or SiOx is deposited using a method such as PECVD. Subsequently, the contact hole 40 is formed through a photolithography process using a protective film mask to expose the drain electrode 30.

After the protective film 50 is formed, a transparent conductive metal layer such as indium tin oxide (ITO) or indium zinc oxide (IZO) is formed by a method such as sputtering, and the transparent conductive metal layer is formed through a photolithography process using a pixel electrode mask. The pixel electrode 60 is formed by patterning.

Next, the manufacturing method of a color filter substrate is demonstrated.

On the upper substrate 100 such as glass or plastic, a black layer such as Cr or Cr alloy is deposited in a single layer or multiple layers using a method such as sputtering. Thereafter, a first black matrix 120 formed along the periphery of the upper substrate 100 and a second black matrix 110 for dividing the cell region are formed through the photolithography process using the black matrix mask.

After the first and second black matrices 120 and 110 are formed, the red color filter R, the green color filter G, and the blue color filter B are sequentially formed through a photographic process using a filter mask.

After forming the color filter 130, the organic material is applied to the entire surface to form the overcoat 140.

Subsequently, a common electrode 150 is formed by depositing a metal such as indium tin oxide (ITO) or indium zinc oxide (IZO) using a method such as sputtering.

As described above, when the thin film transistor substrate 2 and the color filter substrate 1 are manufactured, the sealant 300 is coated on the lower substrate 10 along the outside of the display area. The voltage supply line 400 made of a material such as Al in electrical contact with the first black matrix 120 of the upper substrate 100 is applied to the edges of the sealant 300 and the lower substrate 10.

Next, the two substrates 1 and 2 are bonded to each other and the liquid crystal 200 is injected to manufacture a liquid crystal panel. At this time, the voltage supply line 400 and the first black matrix 120 are electrically connected to each other to use the first black matrix 120 as the first trap electrode.

Meanwhile, in the forming of the common electrode 150, the floating electrode 160 is formed by patterning the common electrode 150 of the upper substrate 100. The floating electrode 160 overlaps with the first black matrix 120. In addition, a first trap electrode is formed by connecting the floating electrode 160 and the voltage supply line 400 formed on the lower substrate 10.

Meanwhile, in the forming of the black layer, the first black matrix 120 may be formed by patterning a double line. Each of the first black matrices 120 may be connected through the voltage supply line 400 to be used as the first trap electrode.

In addition, in the forming of the common electrode 150, the floating electrode 160 is formed by patterning a double line, and each floating electrode 160 is connected through the voltage supply line 400.

In the liquid crystal panel according to the present invention, a second trap electrode having the above-described functions and effects may be formed on the lower substrate 10.

3 is a cross-sectional view illustrating a cross section of a liquid crystal panel according to a third exemplary embodiment of the present invention, and FIG. 4 is a cross-sectional view illustrating a trap line illustrated in FIG.

In the liquid crystal panel according to the third exemplary embodiment of the present invention, the second trap electrode 250 is formed on the lower substrate 10 in the region adjacent to the sealant 300 as compared to the liquid crystal panel shown in FIG. 1. Has the same configuration. Therefore, duplicate descriptions of the same components will be omitted.

Referring to FIG. 3, a second trap electrode 250 is formed of a conductive metal or the like in a region adjacent to the sealant 300 on the lower substrate 10. The second trap electrode 250 is formed to overlap the first black matrix 120 of the upper substrate 100 and is supplied with a positive or negative voltage. At this time, the trap electrode is not formed on the upper substrate 100.

In this case, when the polarity of the ion impurity cannot be predicted, as shown in FIG. 4, the second trap electrodes 250 are formed in double lines, respectively, so that the positive and negative polarities of the trap electrodes 251 and 252 are different. A voltage is supplied to each other to collect ion impurities through the second trap electrode 250.

The second trap electrode 250 is formed of at least one of the same gate metal layer as the gate line, the same data metal layer as the data line, or the same transparent electrode layer as the pixel electrode. In this case, the second trap electrode 250 may be formed of the same transparent electrode as the pixel electrode 60 formed on the insulating layers in order to avoid connection with a signal line supplying a signal to the display area.

A method of manufacturing a liquid crystal panel according to third and fourth embodiments of the present invention will be described with reference to FIGS. 3 and 4. 3 and 4 are the same manufacturing method except for the second trap electrode 250 formed in the non-display area in comparison with the drawings illustrated in FIGS. 1 and 2, and thus, detailed description thereof will be omitted.

First, the manufacturing method of a thin film transistor substrate is demonstrated. Here, the steps of forming the gate pattern, the gate insulating film, the active layer, the ohmic contact layer, and the data pattern layer are the same as the method of manufacturing the thin film transistor substrate according to the first and second embodiments of the present invention, and thus the detailed description thereof will be omitted. do.

After the protective film 50 is formed, a transparent conductive metal layer such as ITO or IZO is formed using a method such as sputtering, and the transparent conductive metal layer is patterned through a photolithography process using a pixel electrode mask to form the pixel electrode 60. . In this case, the transparent conductive metal layer is patterned so that the second trap electrode 250 is formed to correspond to the first black matrix 120 in the region where the sealant 300 is applied.

As illustrated in FIG. 4, the second trap electrode 250 is patterned in a double line so that a positive voltage and a negative voltage can be supplied to each.

The voltage supply line 400 connected to the first black matrix or the floating electrode 160 of the upper substrate 100 is not formed.

Hereinafter, the color filter manufacturing method is the same as the above-described manufacturing method, and thus will be omitted.

5 and 6 are cross-sectional views illustrating a cross section of a liquid crystal panel according to a fourth embodiment of the present invention.

5 and 6 have the same components as in FIGS. 1 through 4, and first and second trap electrodes 250 are formed on the upper substrate 100 and the lower substrate 10, respectively. Therefore, duplicate descriptions of the same components will be omitted.

5 and 6, a first trap electrode formed on the upper substrate 100 and a second trap electrode 250 formed on the lower substrate 10 are included.

As illustrated in FIG. 5, the first trap electrode may be formed of the first black matrix 120 formed on the upper substrate 100 or may be formed of the floating electrode 160 as illustrated in FIG. 6. The second trap electrode 250 is formed on the lower substrate 10 to correspond to the first black matrix 120 or the floating electrode 160. In this case, the first trap electrode and the second trap electrode 250 may be applied with voltages of different polarities. In particular, when the organic material is used as the black matrix formed on the upper substrate 100, the first trap electrode is formed as the floating electrode 160.

As described above, the liquid crystal panel and the method of manufacturing the same according to the present invention can prevent the display defect of the liquid crystal panel by trapping the ionic impurities caused by the uncured sealant through the trap electrode formed on at least one side of the upper substrate or the lower substrate. have.

The present invention described above will be capable of various substitutions, modifications and changes by those skilled in the art to which the present invention pertains. Therefore, the present invention should not be limited to the above-described embodiments and the accompanying drawings, and the rights thereof should be determined by the claims.

Claims (16)

A lower substrate on which a thin film transistor is formed in the display area; An upper substrate corresponding to the lower substrate and having a black matrix formed therein to prevent light leakage into the non-display area; A sealant for bonding the lower substrate and the upper substrate together; And And a trap electrode formed in a non-display area of at least one of the upper substrate and the lower substrate and collecting ions impurities due to uncured sealant. The method of claim 1, The trap electrode includes a first trap electrode formed on the upper substrate, wherein the first trap electrode is at least one of the floating electrode and the black matrix formed by floating the common electrode and the liquid crystal panel. The method of claim 2, And a voltage supply line for supplying a voltage to the first trap electrode. The method of claim 3, wherein The first trap electrode is formed as a double line, the liquid crystal panel, characterized in that the voltage of different polarity is supplied. The method of claim 1, And a second trap electrode overlapping the first black matrix on the lower substrate. The method of claim 5, The second trap electrode is at least one of a gate metal, a data metal and a transparent metal. The method of claim 6, The second trap electrode is formed of a double line, the liquid crystal panel, characterized in that the voltage of different polarity is supplied. The method of claim 1, A first trap electrode formed on the upper substrate; And And a second trap electrode formed on the lower substrate, and voltages having different polarities are respectively supplied to the first and second trap electrodes. Providing a thin film transistor substrate having a thin film transistor array, the thin film transistor substrate having a voltage supply line at an outer side of a sealant applied along an outer side of a display area; Providing a color filter substrate having a black matrix formed of an opaque metal on the upper substrate; And bonding the thin film transistor substrate and the color filter substrate to connect the voltage supply line with the black matrix to form a first trap electrode. The method of claim 9, Forming the color filter substrate, Forming a floating electrode overlapping the black matrix and floating with the common electrode; And And forming a first trap electrode by connecting the voltage supply line formed on the lower substrate to the floating electrode. The method of claim 10, And forming a second trap electrode on the lower substrate, the second trap electrode overlapping the black matrix and adjacent to the sealant to collect impurities. The method of claim 11, At least one of the first and second trap electrode further comprises the step of forming a double line of the liquid crystal panel. The method of claim 12, And the first trap electrode is formed of at least one of a gate metal, a data metal, and a transparent metal. Providing a thin film transistor substrate on which a thin film transistor array is formed, the thin film transistor substrate having a sealant applied along an edge of the display area; Providing a color filter substrate having a black matrix formed on the upper substrate; And forming a trap electrode overlapping the black matrix and formed adjacent to the sealant of the lower substrate. The method of claim 14, The trap electrode further comprises the step of forming a double line is supplied with a positive and negative voltage. The method of claim 15, The trap electrode may further include forming at least one of a gate metal, a data metal, and a transparent metal.

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