KR20060135375A - Organic electroluminescent display device and manufacturing method thereof - Google Patents

Abstract

The present invention relates to an organic electroluminescent display device capable of reducing damage to the organic light emitting layer and a method of manufacturing the same.

The organic electroluminescent display device of the present invention comprises: a data line and a scan line crossing each other with an organic light emitting layer therebetween; An insulating film having an opening for each region in which the organic light emitting layer is to be formed on the data line; A partition wall is formed on the insulating layer to intersect the data line, and the insulating layer is formed to a thickness of 100 to 250% of the thickness of the data line.

Description

Organic electroluminescent display device and its manufacturing method {ELECTRO LUMINESCENCE DISPLAY DEVICE AND FABRICATING METHOD THEREOF}

1 is a perspective view schematically illustrating a general organic electroluminescent display device.

FIG. 2 is a cross-sectional view taken along the line II ′ of FIG. 1. FIG.

3A to 3D are cross-sectional views illustrating a method of manufacturing a conventional organic electroluminescent display device in stages.

4 is a perspective view illustrating an organic electroluminescent display device according to an exemplary embodiment of the present invention.

5 is a cross-sectional view taken along the line II-II 'shown in FIG.

6A through 6D are cross-sectional views illustrating a method of manufacturing an organic light emitting display device according to an exemplary embodiment of the present invention.

<Brief description of symbols for the main parts of the drawings>

2, 52: substrate 4, 54: data line

6, 56: insulating film 8, 58: partition wall

10, 60: organic light emitting layer 12, 62: scan line

The present invention relates to an organic electroluminescent display device, and more particularly, to an organic electroluminescent display device capable of reducing damage to the organic light emitting layer and a method of manufacturing the same.

Recently, various flat panel displays have been developed to reduce weight and volume, which are disadvantages of cathode ray tubes. As flat panel displays, liquid crystal displays (hereinafter referred to as "LCDs"), field emission displays (FEDs), plasma display panels (hereinafter referred to as PDPs), and electroluminescence (Electro-luminescence: hereinafter referred to as "EL") There is a display element.

PDP is most advantageous for large screens because of its relatively simple structure and manufacturing process, but it has the disadvantages of low luminous efficiency, low luminance and high power consumption. LCD is mainly used as a display element of notebook computers, but the demand is increasing. However, the large screen is difficult and power consumption is large due to the backlight unit. In addition, LCD has a disadvantage of high light loss and a narrow viewing angle due to optical elements such as a polarizing filter, a prism sheet, and a diffusion plate. On the other hand, EL devices are classified into inorganic EL devices and organic EL devices according to the material of the light emitting layer. The EL devices are self-luminous devices that emit light by themselves and have advantages of fast response speed and high luminous efficiency, luminance, and viewing angle. Inorganic EL devices have higher power consumption and higher luminance than organic EL devices, and cannot emit various colors of R, G, and B. On the other hand, the organic EL element is driven at a low DC voltage of several tens of volts, has a fast response speed, high brightness, and emits various colors of R, G, and B, which is suitable for next-generation flat panel display elements.

FIG. 1 is a perspective view schematically showing a general organic EL display element, and FIG. 2 is a cross-sectional view taken along the line II ′ of FIG. 1.

1 and 2, a general organic EL display device includes a plurality of data lines 4 spaced apart from each other on a substrate 2 and an area in which an organic light emitting layer 10 is to be formed on the data lines 4. An insulating film 6 having openings each, a partition 8 crossing the data line 4, and an R (red), G (green), and B (blue) organic light emitting layer formed in each opening on the data line 4 ( 10 and a scan line 12 intersecting with the data line 4.

The partition wall 8 is formed on the insulating film 6 in an inverted taper structure in which the upper end portion has a wider width than the lower end portion for separation of the scan line 12.

R, G, and B organic light emitting layers 10 are formed for each opening on the data line 4 through deposition of R, G, and B organic light emitting materials, and the scan lines 12 are formed on the front surface of the electrode material on the substrate 2. It is formed in the direction crossing the data line 4 through deposition.

3A to 3D are cross-sectional views showing a conventional method for manufacturing an organic EL display element.

Referring to FIG. 3A, the data line 4 is patterned after transparent conductive materials such as indium tin oxide (ITO), indium zinc oxide (IZO), and indium tin zinc oxide (ITZO) are deposited on the substrate 2. It is formed by.

As shown in FIG. 3B, the insulating material is entirely coated on the substrate 2 on which the data line 4 is formed, and then patterned, so that the insulating layer 6 has an opening for each region where the organic light emitting layer 10 is to be formed on the data line 4. ) Is formed.

Subsequently, as shown in FIG. 3C, the partition wall 8 for separating the organic light emitting layer 10 and the scan line 12 is formed on the substrate 2 on which the insulating film 6 is formed. The partition 8 has a predetermined height and is formed in a direction crossing the data line 4 in an inverse taper structure having an upper end portion wider than a lower end portion in order to separate the scan line 12.

Then, as shown in FIG. 3d, the organic light emitting layer 10 is formed at each opening of the data line 4 through the deposition of the organic light emitting material through the grill mask, on the substrate 2 having the partition 8 formed thereon. The scan line 12 is formed through full deposition of the electrode material using a common mask.

On the other hand, the organic light emitting layer 10 of the organic EL display device is formed of an organic light emitting material having a property that is easily deteriorated by moisture, oxygen, etc., the insulating film 6 of the organic EL display device includes a solvent component for generating moisture It is formed of a material such as polyimide.

The organic EL display device uses the insulating film 6 to insulate the data line 4 of the organic EL display device even though the organic light emitting layer 10 may be damaged by the characteristics of the organic light emitting layer 10 and the solvent component. Must be formed.

In particular, the insulating layer 6 includes a large amount of solvent components that damage the organic light emitting layer 10 as the insulating layer 6 is formed to have a height including all the heights of the data line 4, the organic light emitting layer 10, and the scan line 12. Therefore, the organic light emitting layer 10 of the organic EL display device may be damaged to reduce durability of the organic EL display device.

Accordingly, an object of the present invention is to provide an organic electroluminescent display device and a method of manufacturing the same that can reduce damage to the organic light emitting layer.

In order to achieve the above object, an organic electroluminescent display device according to an embodiment of the present invention includes a data line and a scan line crossing each other with an organic light emitting layer therebetween; An insulating film having an opening for each region in which the organic light emitting layer is to be formed on the data line; A partition wall is formed on the insulating layer to intersect the data line, and the insulating layer is formed to a thickness of 100 to 250% of the thickness of the data line.

The data line is formed to a thickness of about 1000 ~ 2000 kHz.

The insulating film includes polyimide.

A method of manufacturing an organic electroluminescent display device according to an exemplary embodiment of the present invention includes forming a data line; Forming an insulating layer having an opening on each region where the organic light emitting layer is to be formed on the data line; Forming barrier ribs intersecting the data lines on the insulating layer; Forming the organic light emitting layer; And forming a scan line crossing the data line, wherein the insulating layer is formed to a thickness of 100 to 250% of the thickness of the data line.

Other objects and advantages of the present invention in addition to the above object will be apparent from the description of the preferred embodiments of the present invention with reference to the accompanying drawings.

Hereinafter, exemplary embodiments of the present invention will be described with reference to FIGS. 4 to 6D.

4 is a perspective view illustrating an organic EL display device according to an exemplary embodiment of the present invention, and FIG. 5 is a cross-sectional view taken along the line II-II 'of FIG. 4.

4 and 5, an organic EL display device according to an exemplary embodiment of the present invention may include a plurality of data lines 54 spaced apart from each other on a substrate 52 and an organic light emitting layer on the data line 54. An insulating film 56 having an opening for each region where 60 is to be formed, a partition 58 crossing the data line 54, and R (red), G (green), and B formed for each opening on the data line 54. A (blue) organic light emitting layer 60 and a scan line 62 intersecting with the data line 54 are provided.

The partition wall 58 is formed on the insulating layer 56 in an inverted taper structure in which the upper end portion has a wider width than the lower end portion for separation of the scan line 62.

R, G, and B organic light emitting layers 60 are formed for each opening on the data line 54 through deposition of R, G, and B organic light emitting materials, and the scan line 62 is formed on the front surface of the electrode material on the substrate 52. It is formed in the direction crossing the data line 54 through deposition.

The data line 54 is formed to have a thickness of about 1000 GPa to 2000 GPa, and the insulating film 56 formed to have an opening on the data line 54 is made of a material such as polyimide, and is about 100 of the thickness of the data line 54. It is formed to have a thickness of ~ 250%.

Here, the insulating film 56 is more preferably formed to have a thickness of about 100 to 150% of the thickness of the data line 54.

Accordingly, the organic EL display device according to the exemplary embodiment of the present invention forms an insulating layer 56 formed of a material such as polyimide containing a solvent component to a thickness lower than that of the conventional organic light emitting layer 60 by using a conventional solvent component. ) Can reduce the problem of damage.

6A through 6D are cross-sectional views illustrating a method of manufacturing an organic EL display device according to an exemplary embodiment of the present invention.

Referring to FIG. 6A, the data line 54 is formed to have a thickness of about 1000 μs to 2000 μs by patterning a transparent conductive material such as ITO, IZO, ITZO, and the like onto the substrate 52.

As shown in FIG. 6B, an insulating material such as polyimide is coated on the entire surface of the substrate 52 on which the data line 54 is formed, and then patterned so that an opening is formed for each region where the organic light emitting layer 60 is to be formed on the data line 54. The insulating film 56 having the branch is formed.

Here, the insulating film 56 according to the embodiment of the present invention is formed to have a thickness of about 100 to 250% of the thickness of the data line 54, more preferably about 100 to 150% of the thickness of the data line 54. It is formed to have a thickness of.

Subsequently, as shown in FIG. 6C, the partition wall 58 for separating the organic light emitting layer 60 and the scan line 62 is formed on the substrate 52 on which the insulating film 56 is formed. The partition wall 58 has a predetermined height and is formed in a direction crossing the data line 54 in an inverse taper structure having an upper end portion wider than a lower end portion in order to separate the scan line 62.

Then, as illustrated in FIG. 6D, the organic light emitting layer 60 is formed at each opening of the data line 54 through the deposition of the organic light emitting material through the grill mask, on the substrate 52 on which the partition wall 58 is formed. The scan line 62 is formed through full deposition of electrode material using a common mask.

As described above, the organic electroluminescent display device according to an exemplary embodiment of the present invention forms an insulating film formed of a material such as polyimide containing a solvent component to a thickness lower than that of the prior art, and thus is organically induced by moisture by a conventional solvent component. The problem that the light emitting layer is damaged can be reduced.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the technical spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (6)

A data line and a scan line crossing each other with the organic light emitting layer interposed therebetween; An insulating film having an opening for each region in which the organic light emitting layer is to be formed on the data line; Barrier ribs intersecting the data lines on the insulating layer; And the insulating layer is formed to a thickness of 100 to 250% of the thickness of the data line. The method of claim 1, And the data line is formed to a thickness of about 1000 to 2000 micrometers. The method of claim 1, The insulating film includes an organic electroluminescent display device, characterized in that the polyimide. Forming a data line; Forming an insulating layer having an opening on each region where the organic light emitting layer is to be formed on the data line; Forming barrier ribs intersecting the data lines on the insulating layer; Forming the organic light emitting layer; Forming a scan line that intersects the data line; And the insulating film is formed to have a thickness of 100 to 250% of the thickness of the data line. The method of claim 4, wherein And the data line is formed to a thickness of about 1000 to 2000 micrometers. The method of claim 4, wherein The insulating film is a method of manufacturing an organic electroluminescent display device, characterized in that formed of a material containing a polyimide.

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