KR20060077971A - 내화학약품성이 우수한 감광성수지 조성물 - Google Patents
내화학약품성이 우수한 감광성수지 조성물 Download PDFInfo
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- KR20060077971A KR20060077971A KR1020040116628A KR20040116628A KR20060077971A KR 20060077971 A KR20060077971 A KR 20060077971A KR 1020040116628 A KR1020040116628 A KR 1020040116628A KR 20040116628 A KR20040116628 A KR 20040116628A KR 20060077971 A KR20060077971 A KR 20060077971A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optical Filters (AREA)
Abstract
Description
성분 | 구체예 | 사용량(g) |
(1) 카르복실기 함유 아크릴계 바인더수지 | 메타크릴산/벤질메타크릴레이트 = 30/70(w/w), 분자량 = 35,000 | 7.1 |
(2) 이중결합을 포함하는 아크릴 카르복실레이트 | 분자량 = 15,000, 산가 = 50㎎KOH/g | 2.8 |
(3) 아크릴계 광중합단량체 | 디펜타에리트리톨헥사아크릴레이트 | 4.5 |
(4) 광중합개시제 | TPP(Panchim사 제품) | 0.1 |
이가큐어 907(시바-가이기사 제품) | 0.7 | |
4,4′-비스(디에틸아미노)벤조페논 (호도가야사 제품) | 0.2 | |
(5) 안료 | 프탈로시아닌 구리 | 7.5 |
(6) 용제 | 프로필렌글리콜모노메틸에테르아세테이트 | 65 |
시클로헥사논 | 12 | |
(7) 계면활성제 | 실란계 계면활성제(SH8400, Toray사 제품) | 0.1 |
구분 | 색변화 | ITO 도막 및 컬러 감광성수지 도막 변화 |
실시예 1 | 우수 | 우수 |
비교실시예 1 | 양호 | 미흡 |
비교실시예 2 | 불량 | 불량 |
비교실시예 3 | 양호 | 미흡 |
Claims (6)
- (1) 카르복실기를 포함하는 아크릴계 바인더수지 0.5 내지 10중량%, (2) 이중결합을 포함하는 아크릴 카르복실레이트수지 0.5 내지 10중량%, (3) 광중합성 단량체 0.5 내지 10중량%, (4) 광중합개시제 0.01 내지 5중량%, (5) 안료 0.5 내지 15중량%, (6) 계면활성제 0.01 내지 5중량% 및 (7) 용제를 잔량으로 포함하여 이루어짐을 특징으로 하는 내화학약품성이 우수한 감광성수지 조성물.
- 제 1 항에 있어서,상기 (2)의 이중결합을 포함하는 아크릴 카르복실레이트수지가 분자량이 3,000 내지 30,000이고, 산가가 20 내지 70㎎KOH/g인 것을 특징으로 하는 내화학약품성이 우수한 감광성수지 조성물.
- 제 1 항에 있어서,상기 조성물이 0.1 내지 10중량%의 에폭시수지를 추가로 포함함을 특징으로 하는 내화학약품성이 우수한 감광성수지 조성물.
- 제 1 항 내지 제 5 항들 중 어느 한 항에 따른 감광성수지 조성물로 패턴을 형성하여 제조된 것을 특징으로 하는 컬러필터.
Priority Applications (1)
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KR1020040116628A KR100614400B1 (ko) | 2004-12-30 | 2004-12-30 | 내화학약품성이 우수한 감광성수지 조성물 |
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KR1020040116628A KR100614400B1 (ko) | 2004-12-30 | 2004-12-30 | 내화학약품성이 우수한 감광성수지 조성물 |
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Publication Number | Publication Date |
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KR20060077971A true KR20060077971A (ko) | 2006-07-05 |
KR100614400B1 KR100614400B1 (ko) | 2006-08-21 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100655049B1 (ko) * | 2005-12-30 | 2006-12-06 | 제일모직주식회사 | 현상성이 우수한 고 색재현성 감광성 수지 조성물 및 이를이용한 컬러필터 |
KR100796517B1 (ko) * | 2006-07-18 | 2008-01-21 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터 |
KR100881860B1 (ko) * | 2007-01-17 | 2009-02-06 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터 |
US8486591B2 (en) | 2008-10-24 | 2013-07-16 | Cheil Industries Inc. | Photosensitive resin composition for color filter and color filter prepared using the same |
US9069132B2 (en) | 2012-12-26 | 2015-06-30 | Cheil Industries Inc. | Photosensitive resin composition for light blocking layer and light blocking layer using the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100924010B1 (ko) | 2007-12-18 | 2009-10-28 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3644162A1 (de) | 1986-12-23 | 1988-07-07 | Hoechst Ag | Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
JPH06258829A (ja) * | 1993-03-09 | 1994-09-16 | Dainippon Ink & Chem Inc | 感光性粘着レジスト組成物及びそれを用いたパターン形成方法 |
KR970005054B1 (ko) * | 1993-10-20 | 1997-04-11 | 주식회사 코오롱 | 감광성 수지 조성물 |
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2004
- 2004-12-30 KR KR1020040116628A patent/KR100614400B1/ko active IP Right Grant
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100655049B1 (ko) * | 2005-12-30 | 2006-12-06 | 제일모직주식회사 | 현상성이 우수한 고 색재현성 감광성 수지 조성물 및 이를이용한 컬러필터 |
KR100796517B1 (ko) * | 2006-07-18 | 2008-01-21 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터 |
KR100881860B1 (ko) * | 2007-01-17 | 2009-02-06 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터 |
US8735025B2 (en) | 2007-01-17 | 2014-05-27 | Cheil Industries Inc. | Photosensitive resin composition for producing color filter and color filter for image sensor produced using the composition |
US8486591B2 (en) | 2008-10-24 | 2013-07-16 | Cheil Industries Inc. | Photosensitive resin composition for color filter and color filter prepared using the same |
US9069132B2 (en) | 2012-12-26 | 2015-06-30 | Cheil Industries Inc. | Photosensitive resin composition for light blocking layer and light blocking layer using the same |
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KR100614400B1 (ko) | 2006-08-21 |
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