KR20060045846A - Glass composition for silver paste, photosensitive silver paste comprising the same, electrode pattern, and plasma display panel - Google Patents

Abstract

The present invention has developed a glass composition for a conductive paste that can suppress the induction of electrode migration even when used in a high-precision conductor pattern, and by using a photosensitive silver paste using the glass composition, high precision excellent in long-term reliability due to low migration properties Conductor patterns can be provided.

According to the present invention, the boron and silica as essential components, and further a boron glass composition is a paste which comprises not more than 10 mass% in the glass composition with B ₂ O ₃ in terms of mathematics to in terms of oxides on its composition Formula 1 or 2 is established, The glass composition for silver paste and the photosensitive silver paste containing this glass composition can be provided.

<Equation 1>

B ₂ O ₃ mass% ≤ SiO ₂ mass%

<Equation 2>

B ₂ O ₃ mass% + ZnO mass% ≤ SiO ₂ mass%

High precision conductor pattern, glass composition for conductive paste, photosensitive silver paste, glass composition for silver paste, photosensitive organic component, silver powder, plasma display panel

Description

Glass composition for silver paste, photosensitive silver paste, electrode pattern and plasma display panel using the same {Glass Composition for Silver Paste, Photosensitive Silver Paste Comprising the Same, Electrode Pattern, and Plasma Display Panel}

[Document 1] Japanese Unexamined Patent Publication No. 10-269848

[Document 2] Japanese Unexamined Patent Publication No. 11-224531

The present invention relates to a glass composition for silver paste and a photosensitive silver paste using the glass composition, and specifically, silver which can be suitably used as an electrode material obtained by firing a pattern coating film formed by screen printing or photolithography. It relates to the glass composition for pastes, and the photosensitive silver paste formed using this glass composition.

Conventionally, in components such as plasma display panels, CCD sensors, image sensors, and the like, electrodes on alkali-free glass or other various glass substrates have been formed by vapor deposition. However, this vapor deposition method is a method of depositing a metal film by storing an electrode forming member in a vacuum container, and has a drawback in that the apparatus is not only large-scale and expensive, but also has poor workability such as cumbersome member removal and time-consuming degassing. . In addition, in the vapor deposition method, thickening of the electrode was difficult and unsuitable for reducing the resistance of the line.

On the other hand, as another method of forming an electrode pattern layer on a substrate, a paste material obtained by mixing a conductive powder with a non-photosensitive organic binder, for example, a dry or thermosetting conductive paste, may be used for printing techniques such as screen printing. A method of patterning a substrate on a substrate using a photosensitive conductive paste or a method of forming a conductor pattern using a photolithography technique using a photosensitive conductive paste has been proposed (for example, Japanese Patent Application Laid-Open No. Hei 10-269848, Japanese Patent). (Publication) Hei 11-224531). Although this technique is excellent in that the conductor pattern can be formed without undergoing a complicated process, there is a problem that long-term reliability is not obtained by inducing migration when the space between electrode lines is used for forming a high precision pattern.

The present invention has been developed in view of the problems of the prior art, and its main object is to develop a glass composition for conductive paste that can suppress the induction of electrode migration even when used in a high precision conductor pattern, and the glass By using the photosensitive silver paste using a composition, it is providing the high precision conductor pattern excellent in the long-term reliability by low migration property.

As a result of earnestly researching in order to realize the above object, the present inventors have found that there is an important relationship in the composition of the low melting glass frit contained in the conductive paste in inducing migration in the high-precision pattern formed by using the conductive paste. Further, by limiting its composition ratio to a specific range, it has been found that a conductor pattern excellent in conductivity and low-precision pattern formability due to low migration properties can be easily obtained without going through a complicated process, and the present invention has been completed.

That is, to by the present invention, the boron and silica as essential components, and a boron glass composition is a paste which comprises not more than 10 mass% in the glass composition with B ₂ O ₃ in terms of the oxide in terms of his composition There is provided a glass composition for silver paste, wherein Equation 1 or 2 is established.

B ₂ O ₃ mass% ≤ SiO ₂ mass%

B ₂ O ₃ mass% + ZnO mass% ≤ SiO ₂ mass%

In 1 aspect of this invention, it is preferable that the ZnO content rate in the glass composition for silver pastes is 12 mass% or less.

In one aspect of the present invention, it is preferably in the SiO ₂ content in the glass composition paste is from 8 to 30% by weight.

Moreover, according to this invention, it is the photosensitive silver paste containing silver powder, the photosensitive organic component, and the said glass composition, and the photosensitive silver paste whose content rate of the said glass composition is the range of 2-15 mass parts with respect to 100 mass parts of silver powder Is provided.

Moreover, according to this invention, the electrode pattern formed by baking the said photosensitive silver paste is provided.

According to the present invention, there is provided a plasma display panel in which electrodes are formed using the photosensitive silver paste.

According to the present invention, even when used for a high-precision electrode pattern, it is possible to provide a photosensitive silver paste having excellent migration characteristics (migration suppression effect). As a result, the silver paste of the present invention is effective as a plasma display application.

Best Mode for Carrying Out the Invention

As the conductive paste for electrodes formed on the glass substrate, preferably in order to obtain excellent conductivity by firing at a temperature of 620 ° C. or lower in an air atmosphere, the selection of the conductive powder is important, and among them, the precious metal is not affected by oxidation. Among them, it is common to use relatively inexpensive silver powder. By using the screen printing method or the photolithography method, high-precision patterning of, for example, line / space = 40/40 (µm) is possible, but migration problems occur in the silver paste conventionally used in such a high-precision pattern. It is as mentioned above that there was a limit to high precision.

The low melting glass frit used for silver paste is known to have a significant effect on the softening point (hereinafter referred to as "SP value") or the addition amount of the paste and the adhesion and resistance of the conductive paste such as silver paste. As a result of focusing on the low-melting-point glass frit from the point of view, it was found that the influence of the three components described below is large for suppression of migration. In other words, increasing the component ratio (mass part) of SiO ₂ is effective in suppressing migration, while B ₂ O ₃ and ZnO significantly worsen migration when the component ratio is increased. In addition, the present inventors have found that the migration characteristics are the best at the composition ratio satisfying the following equations (1) or (2) as a result of verifying the composition ratio of these components, and have completed the present invention.

<Equation 1>

B ₂ O ₃ mass% ≤ SiO ₂ mass%

<Equation 2>

B ₂ O ₃ mass% + ZnO mass% ≤ SiO ₂ mass%

However, B ₂ O ₃ is 10% or less.

Hereinafter, the glass composition for silver paste of this invention and the photosensitive silver paste and electrode pattern using this glass composition are demonstrated in detail.

The glass composition for silver paste of the present invention is characterized in that boron and silica are essential components, and the following formula 1 or 2 is established in terms of oxide with respect to the composition ratio thereof.

<Equation 1>

B ₂ O ₃ mass% ≤ SiO ₂ mass%

<Equation 2>

B ₂ O ₃ mass% + ZnO mass% ≤ SiO ₂ mass%

The SiO ₂ component has an inhibitory effect on migration in the silver paste, and the content thereof is not particularly limited as long as it satisfies Equation 1 or 2, but is preferably blended in the range of 8 to 30 mass%. If it is less than 8 mass%, a migration characteristic will fall, while if it exceeds 30 mass%, a softening point will become high, for example, there exists a possibility that baking on the glass substrate at the temperature of 620 degreeC or less may become difficult.

B ₂ O ₃ and ZnO are components that adversely affect migration characteristics when the content thereof is increased, and it is necessary to satisfy Equation 1 or 2 with respect to the content thereof.

B ₂ O ₃ is used as an essential component in the present invention to lower the softening point of the glass composition. The preferred softening point as the glass composition of the present invention is 400 to 590 ℃, it is preferred that the softening point is to adjust the addition amount of B ₂ O ₃ to be within such a range. However, if B ₂ O ₃ content exceeds 10 mass%, because larger the deterioration degree of migration properties, and the content does not exceed 10% by weight. A preferred content of B ₂ O ₃ is from 1 to 8 wt%, more preferably less than 2% to 6% by weight.

ZnO is not an essential component but is a component of Equation 2 as described above, and when contained, it is required to satisfy the above equation. Moreover, it is preferable that the content rate is 12 mass% or less. The reason is that when the content is more than 12% by mass, the glass may become unstable due to crystallization, further deteriorate migration characteristics and cause yellowing when fired at high temperature.

The glass composition of the present invention may be a lead-based or bismuth-based glass composition, and is preferably blended in the range of 40 to 90% by mass in terms of Pb ₂ O ₃ or Bi ₂ O ₃ . If it is less than 40 mass%, the adhesive strength of the conductor film with respect to the board | substrate at the time of baking a silver paste on a glass substrate will be inadequate, and if it exceeds 90 mass%, the softening point of a glass frit will become low too much and the binder removal property of a paste will worsen. Therefore, there exists a possibility that the sinterability of a conductor film may fall, and adhesive strength with a board | substrate may fall. In the glass composition of the present invention to be used as a material for silver paste, in view of the adhesion and resistance of the silver paste, the preferred softening point thereof is 400 to 590 ° C, and the preferred blending ratio in the silver paste is 100 parts by mass of the silver powder in the paste. It is 2-15 mass parts with respect to.

The glass composition of the present invention may be to add containing BaO, Al ₂ O _3, the preferred content of BaO is 0 to 20% by weight, Al ₂ O ₃ 0 to 5% by weight, more preferably from 0.5 to 2.5 It is mass%. If the BaO content is more than 20% by mass, the expansion coefficient of the glass composition may be excessively large. If the content of Al ₂ O ₃ is more than 5% by mass, the softening point of the glass composition is increased, and the silver paste is added to the glass substrate. It is not preferable when baking the phase because the adhesive strength of the conductor film to the substrate may be insufficient.

Further, verification by the inventors revealed that alkali metal oxides such as Na ₂ O, Li ₂ O, K ₂ O, etc., in addition to the above components may also be involved in inducing migration in the high-precision pattern. It is preferable that a metal oxide is not contained in the glass composition of this invention, and when it contains, the lower the content rate is preferable. Moreover, since an alkali component can react with the silver powder in silver paste, and a glass substrate may yellow, it is preferable not to contain it also from a viewpoint of suppressing yellowing.

The powder particle diameter of the glass composition of the present invention is preferably 10 µm in terms of the resolution measured using a laser diffraction scattering type particle size distribution measuring device such as a microtrack or the like or a particle size distribution measuring device using a laser Doppler method from the viewpoint of resolution. It may be hereinafter and may be crystalline or amorphous.

The glass composition of this invention is used with a silver powder and an organic component as a silver paste material, and it is possible to suppress generation | occurrence | production of a migration in the high precision electrode pattern formed using the screen printing method or the photolithographic method.

An organic binder contains an organic binder, and this organic binder functions as a binder of each component before baking, or a photocurability and developability provision material with respect to a composition. This organic binder includes resins having a carboxyl group which may be photosensitive or non-photosensitive. Specifically, both the carboxyl group-containing photosensitive resin which itself has an ethylenically unsaturated double bond, and the carboxyl group-containing resin which does not have an ethylenically unsaturated double bond can be used. Preferred resins (which may be either oligomers or polymers) that can be preferably used include the following.

(1) carboxyl group-containing resin obtained by copolymerizing the compound which has (a) unsaturated carboxylic acid and (b) unsaturated double bond;

(2) Carboxyl group containing photosensitive resin obtained by adding an ethylenically unsaturated group as a pendant to the copolymer of (a) unsaturated carboxylic acid and (b) compound which has unsaturated double bond;

(3) to a copolymer of (c) an epoxy group with a compound having an unsaturated double bond and (b) a compound having an unsaturated double bond, with (a ') a saturated or unsaturated carboxylic acid reacting the resulting secondary hydroxyl group. (d) carboxyl group-containing resin obtained by making polybasic acid anhydride react;

(4) carboxyl group-containing resin obtained by making the compound of (e) a compound which has a hydroxyl group react with the copolymer of (e) the acid anhydride which has an unsaturated double bond, and (b) the compound which has an unsaturated double bond;

(5) a carboxyl group-containing photosensitive resin obtained by reacting a copolymer of (e) an acid anhydride having an unsaturated double bond with (b) a compound having an unsaturated double bond (f ') with a hydroxyl group and a compound having an unsaturated double bond;

(6) Carboxyl group-containing photosensitive resin obtained by making (g) react an epoxy compound and (h) unsaturated monocarboxylic acid, and making (d) polybasic acid anhydride react with the produced | generated secondary hydroxyl group;

(7) (b) reacting an organic acid of a copolymer having a unsaturated double bond and a glycidyl (meth) acrylate with (i) an organic acid having one carboxyl group in one molecule and not having an ethylenically unsaturated bond Carboxyl group-containing resin obtained by reacting (d) polybasic acid anhydride with the produced | generated secondary hydroxyl group;

(8) (j) carboxyl group-containing resin obtained by making (d) polybasic acid anhydride react with a hydroxyl-containing polymer;

(9) The carboxyl group-containing photosensitive resin obtained by further reacting (c) the compound which has an epoxy group and an unsaturated double bond with the carboxyl group-containing resin obtained by making (j) hydroxyl-containing polymer react with (d) polybasic acid anhydride.

In addition, a printing type resin can also be used as the organic component, and examples of this resin include cellulose resins such as nitrocellulose, ethyl cellulose, hydroxyethyl cellulose and the like; Acrylic resins such as polybutyl acrylate and polymethacrylate; Acrylic copolymers; Polyvinyl alcohol; Polyvinyl butyral etc. can be mentioned, These can be used individually or in mixture of 2 or more types.

Although the photosensitive organic component containing the carboxyl group-containing photosensitive resin as described above, and the non-photosensitive organic component containing the carboxyl group-containing resin or the resin of the printing type may be used alone or in combination, in either case, It is preferable to mix | blend an organic binder in the ratio of 5-50 mass% of the total amount of a composition in total. When the compounding quantity of these resins is smaller than the said range, since distribution of the said resin in the coating film formed becomes easy to become uneven and sufficient photocurability and photocuring depth will be hard to be obtained, patterning by selective exposure and image development will become difficult. On the other hand, when it exceeds the said range, since the distortion of a pattern at the time of baking, and line width shrinkage generate | occur | produce easily, it is unpreferable.

As the carboxyl group-containing photosensitive resin and the carboxyl group-containing resin, those having a weight average molecular weight of 1,000 to 100,000, more preferably 5,000 to 70,000, and an acid value of 30 to 250 mg KOH / g can be preferably used, and the carboxyl group-containing photosensitive In the case of resin, the double bond equivalent weight is 350-2,000, More preferably, 400-1,500 can be used preferably. When the molecular weight of the said resin is smaller than 1,000, there exists a possibility that it may adversely affect the adhesiveness of the film at the time of image development, and when it is larger than 100,000, since it is easy to generate | occur | produce development defect, it is unpreferable. In addition, when the acid value is lower than 30 mg KOH / g, the solubility in an aqueous alkali solution is insufficient, and development defects are likely to occur. On the other hand, when the acid value is higher than 250 mg KOH / g, the adhesion of the film at the time of development is deteriorated or the photocurable part ( It is not preferable because dissolution of the exposed portion) may occur. In addition, in the case of the carboxyl group-containing photosensitive resin, when the double bond equivalent of the photosensitive resin is less than 350, the residue tends to remain at the time of firing. On the other hand, when the photosensitive resin is larger than 2,000, the work margin at development is narrow and a high exposure amount at the time of photocuring It is not preferable because it may be required.

The photosensitive silver paste containing the silver powder and the photosensitive organic component together with the glass composition according to the present invention contains a photopolymerizable monomer for promoting the provision of photocurability of the composition and improving the developability. Examples of the photopolymerizable monomer include 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, and polyurethane diacrylate. , Trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylolpropane ethylene oxide modified triacrylate, trimethylolpropanepropylene oxide modified triacrylate, dipentaerythritol pentaacryl Acrylates, dipentaerythritol hexaacrylate, and methacrylates corresponding to the acrylates; Mono-, di-, tri- or more polyesters of polybasic acids such as phthalic acid, adipic acid, maleic acid, itaconic acid, succinic acid, trimellitic acid, terephthalic acid, and hydroxyalkyl (meth) acrylates Although it can be used, it is not limited to a specific thing and can also use these individually or in combination of 2 or more types. Among these photopolymerizable monomers, the polyfunctional monomer which has 2 or more acryloyl group or methacryloyl group in 1 molecule is preferable.

The compounding ratio of this photopolymerizable monomer is 20-100 mass parts with respect to 100 mass parts of said organic binders. When the compounding quantity of a photopolymerizable monomer is less than the said range, it becomes difficult to obtain sufficient photocurability of a composition, and when it exceeds the said range, a large amount exceeds the said range, and since the photocuring of the surface layer part will be quick compared with the core part of a film, hardening stain will arise easily. .

The photosensitive silver paste of this invention contains a photoinitiator as a component which initiates a photoreaction. Specific examples of the photopolymerization initiator mainly absorbing ultraviolet rays to generate radicals include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and the like; Acetophenones such as acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloroacetophenone and the like: 2-methyl-1- [4 Aminoacetophenones such as-(methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 and the like; Anthraquinones such as 2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, 1-chloroanthraquinone and the like; Thioxanthones, such as 2, 4- dimethyl thioxanthone, 2, 4- diethyl thioxanthone, 2-chloro thioxanthone, 2, 4- diisopropyl thioxanthone, etc .; Ketals such as acetophenone dimethyl ketal, benzyl dimethyl ketal and the like; Benzophenones such as benzophenone; Or xanthones; (2,6-dimethoxybenzoyl) -2,4,4-pentylphosphineoxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine jade Phosphine oxides such as seeds, ethyl-2,4,6-trimethylbenzoylphenylphosphinate, and the like: various peroxides, and the like, but are not limited to specific ones, and these may be used alone or in combination of two or more thereof. Can be.

The compounding ratio of this photoinitiator in paste is suitably 1-30 mass parts per 100 mass parts of said organic binders, Preferably it is 5-20 mass parts. When less than the said range, it becomes difficult to obtain sufficient photocurability of a paste, and when it becomes large beyond the said range, transmission of light will be inhibited and it will become difficult to obtain the photocurability of the core part.

In addition, when a deeper photocuring depth is required, a titanocene-based photopolymerization initiator such as Irgacure 784, manufactured by Ciba Specialty Chemicals Co., Ltd., which initiates radical polymerization in the visible region, if necessary, and leuco dyes are cured. It can be used in combination as an adjuvant.

The silver powder contained in the photosensitive silver paste of the present invention is an electrically conductive powder selected from the present invention as it is capable of imparting excellent conductivity to the paste by firing at 450 to 620 ° C without being affected by oxidation. Various shapes such as spherical shape, flaky shape, and dentite shape can be used as the shape of the particles. Particularly, spherical ones are preferable in consideration of optical properties and dispersibility. As an average particle diameter of silver powder, 0.5-5.0 micrometers powder can be used by the measurement by the laser diffraction scattering type particle size distribution measuring apparatus, such as a micro track, or the particle size distribution measuring apparatus using the laser Doppler method. When the average particle diameter is 0.1 µm or less, light transmittance is poor and high-precision patterns are less likely to appear, which is not preferable. On the other hand, when the average particle diameter is larger than 5 µm, it is not preferable because the linearity of the line edge is hard to be obtained. As specific surface area, the thing of 0.1-2.0 m <2> / g can be used preferably. If the specific surface area is less than 0.1 m 2 / g, it is not preferable because there is a problem such as causing sedimentation at the time of storage. On the other hand, if the specific surface area exceeds 2.0 m 2 / g, it is not preferable because the oil absorption amount becomes large and the fluidity of the paste is impaired.

As for the compounding ratio of this silver powder, 45-90 mass parts is suitable with respect to 100 mass parts of photosensitive silver pastes. When the compounding ratio of the conductive powder is less than the above range, sufficient conductivity is not obtained in the conductor pattern formed by using such a paste. On the other hand, when the amount exceeds the above range, the adhesion with the substrate becomes poor. Not.

In addition, black pigments and cobalt trioxide containing a metal oxide or a composite metal oxide containing as one or two or more of Fe, Co, Cu, Cr, Mn, Al, Ru, and Ni as main components for the purpose of adjusting the color tone. ₃ O _4), a ruthenium oxide, may be added to the black material, such as lanthanum composite oxide.

In addition, the photosensitive silver paste of the present invention includes, if necessary, acidic compounds such as phosphoric acid, phosphate ester, and carboxylic acid-containing compounds for securing storage stability, antifoaming and leveling agents such as silicone and acrylic, and fluidity for adjusting fluidity. You may mix | blend other additives, such as a modifier and a silane coupling agent for improving the adhesiveness of a film. Further, if necessary, a known conventional antioxidant for preventing the oxidation of the conductive metal powder, a thermal polymerization inhibitor for improving thermal stability during storage, and a metal oxide as a bonding component with the substrate during firing. Fine particles such as silicon oxide, boron oxide, low melting glass, or the like may be added. Further, inorganic powders such as silica, bismuth oxide, aluminum oxide, titanium oxide and the like, organometallic compounds, metal organic acid salts, metal alkoxides and the like may be added for the purpose of adjusting the plastic shrinkage.

The photosensitive silver paste of this invention is obtained by mix | blending the above-mentioned essential component and arbitrary components in a predetermined ratio, and disperse | distributing uniformly with a kneading machine, such as a three roll and a blender. The photosensitive silver paste of this invention obtained in this way is formed as a conductor pattern on a base material through the following processes, for example. Such a conductor pattern can be suitably used as an electrode pattern in a front substrate and / or a rear substrate of a plasma display panel.

(1) First, the photosensitive silver paste of the present invention is applied to a substrate, for example, a glass substrate serving as a front substrate of a plasma display panel (PDP) by a suitable coating method such as a screen printing method, a bar coater, a blade coater, and the like. In order to obtain drying property, it is dried by a hot air circulation type drying furnace, a far-infrared drying furnace, etc., for example at about 60-120 degreeC for about 5 to 40 minutes, and the organic solvent is evaporated and a tack free coating film is obtained.

Here, the substrate is not limited to a specific one, but for example, a heat resistant substrate such as a glass substrate or a ceramic substrate can be used.

Moreover, a film | membrane can also be manufactured previously in a film form, and in this case, a film can be laminated | stacked on a base material.

(2) Next, the dry coating film formed on the base material is pattern-exposed and developed. As an exposure process, contact exposure or non-contact exposure using the negative mask which has a predetermined exposure pattern is possible. As the exposure light source, a halogen lamp, a high pressure mercury lamp, a laser light, a metal halide lamp, a black lamp, an electrodeless lamp and the like are used. As an exposure amount, about 50-1000 mJ / cm <2> is preferable.

As the developing step, a spraying method, a dipping method, or the like is used. As the developing solution, aqueous solutions of metal alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium silicate and the like, aqueous solutions of amines such as monoethanolamine, diethanolamine, triethanolamine and the like, especially dilute alkaline aqueous solutions of about 1.5% by mass or less Although preferably used, the carboxyl group of the carboxyl group-containing resin in the composition may be saponified to remove the uncured portion (unexposed portion), and is not limited to the developer as described above. In addition, it is preferable to perform washing with water or acid neutralization in order to remove unnecessary developer after development.

(3) Moreover, the predetermined conductor pattern is obtained by baking the obtained photosensitive silver paste pattern and debonding the organic component contained in the paste.

<Example>

Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to the following Example. In addition, all the "part" below is a mass part unless there is particular notice.

Synthesis Example of Organic Binder

Diethylene glycol monoethyl ether acetate as a solvent and azobisisobutyronitrile as a catalyst were added to a flask equipped with a thermometer, a stirrer, a dropping funnel, and a reflux cooler, and heated to 80 ° C. under a nitrogen atmosphere, The monomer which mixed methyl methacrylate in the molar ratio of methacrylic acid: 0.4 mol and methyl methacrylate: 0.6 mol was dripped over about 2 hours, and after stirring for further 1 hour, the temperature was raised to 115 degreeC, It was inactivated and the resin solution was obtained.

After cooling this resin solution, tetramol ammonium bromide was used as a catalyst, and 0.4 mol of butylglycidyl ethers were added-reacted and cooled under the conditions of 95-105 degreeC and 30 hours, and the obtained resin.

Furthermore, 0.26 mol of tetrahydrophthalic anhydride was addition-reacted on 95-105 degreeC and the conditions of 8 hours with respect to the OH group of obtained resin, and after cooling, it extracted and obtained the organic binder A of 55% of solid content.

(Composition Examples 1 to 5, and Comparative Composition Examples 1 to 4)

Using the organic binder A obtained as described above, using the glass powder A shown in Table 1 below as a glass composition, blended in the composition ratio shown below, stirred with a stirrer, milled with three roll mills and paste Was carried out to prepare a photosensitive silver paste (Composition Example 1). In addition, Composition Examples 2 to 5 and Comparative Composition Examples 1 to 4 were prepared using Glass Powders B to H shown in Table 1 below in the range of 22 to 55 parts instead of Glass Powder A. In addition, these glass powders A-H used the thing whose average particle diameter measured by the laser diffraction scattering type particle size distribution analyzer LMS-30 (made by Seishin Ginko Co., Ltd.) exists in the range of 1.2-3.4 micrometers.

(Composition Example 1)

Organic Binder A 180.0 parts

Trimethylolpropanetriacrylate 45.0 parts

2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 10.0part

Isopropyl thioxanthone 1.0 part

Dipropylene glycol monomethyl ether 90.0 parts

Silver powder A * 550.0 parts

Glass Powder A 38.5 Part

Phosphate ester 2.0 parts

Defoamer (BYK-354: BIC Chemy Japan Co., Ltd.) 1.0 part

* The average particle diameter (laser diffraction scattering particle size distribution measuring apparatus: measured by microtrack HRA) was 2.0 micrometers, and the specific surface area (measured by BET 1-point method) was used for 0.42 m <2> / g.

Thus, migration characteristics were evaluated by detecting the insulation resistance value and the presence or absence of dentite generation about each of the photosensitive electrically conductive pastes of the composition examples 1-5 and the comparative composition examples 1-4 obtained in this way. The evaluation method was as follows.

Test piece manufacture:

Each photosensitive silver paste for evaluation was apply | coated to the whole surface using the 180-mesh polyester screen on the glass substrate, and then it dried at 90 degreeC for 20 minutes in the hot-air circulation type drying furnace, and formed the coating film with favorable touch drying property. Subsequently, using a metal halide lamp as a light source, pattern exposure through a negative mask so that the amount of accumulated light on the dry coating film is 300 mJ / cm ₂ , and then developed using a 0.5 mass% Na ₂ CO ₃ aqueous solution having a liquid temperature of 30 ° C. And washed. Subsequently, the board | substrate in which the coating film pattern was formed in this way was heated up at 570 degreeC at 5 degreeC / min in air atmosphere, and baked at 570 degreeC for 30 minutes, and the test piece which formed the conductor pattern was produced.

(Insulation resistance)

It exposed and developed in the comb pattern of L / S = 120 / 80micrometer, it patterned, it baked, it carried out to baking, and applied and hardened | cured the UV curing type desiccant to the pattern, and produced the evaluation piece. Thereafter, the mixture was treated for 144 hours while applying DC 80V in a constant temperature and high humidity bath at 65 ° C and 95% RH, and the insulation resistance after the treatment was measured to evaluate the deterioration of insulation. The insulation resistance value was measured after 1 minute at an applied voltage of 500V.

(Dentlight evaluation)

The presence or absence of silver dentite between comb-shaped electrodes after evaluation of the test piece which evaluated insulation deterioration was confirmed.

These evaluation results are shown in Table 2 below.

From Table 2, it turned out that the silver paste which concerns on this invention is excellent in a migration characteristic also when used for a high precision conductor pattern.

According to the present invention, even when used for a high-precision electrode pattern, it is possible to provide a photosensitive silver paste having excellent migration characteristics (migration suppression effect). As a result, the silver paste of the present invention is effective as a plasma display application.

Claims (10)

Boron and silica as essential components, and also that the boron is a glass composition for a paste which comprises not more than 10 mass% in the glass composition with B ₂ O ₃ conversion, the equation (1) to in terms of oxides on its composition ratio is satisfied The glass composition for silver paste characterized by the above-mentioned. <Equation 1> B ₂ O ₃ mass% ≤ SiO ₂ mass% Boron and silica as essential components, and also that the boron is a glass composition for a paste which comprises not more than 10 mass% in the glass composition with B ₂ O ₃ in terms of, establishing the following equation 2 in terms of oxides on its composition The glass composition for silver paste characterized by the above-mentioned. <Equation 2> B ₂ O ₃ mass% + ZnO mass% ≤ SiO ₂ mass% The ZnO content rate is 12 mass% or less, The glass composition for silver pastes of Claim 2 characterized by the above-mentioned. Wherein the first to third according to any one of items, SiO ₂ content of 8 to 30% by weight of the paste, the glass composition. It is a photosensitive silver paste containing silver powder, the photosensitive organic component, and the glass composition of any one of Claims 1-3, The content rate of the said glass composition is the range of 2-15 mass parts with respect to 100 mass parts of silver powder. Photosensitive silver paste. The photosensitive silver paste containing silver powder, the photosensitive organic component, and the glass composition of Claim 4, and whose content rate of the said glass composition is the range of 2-15 mass parts with respect to 100 mass parts of silver powder. The baked pattern of the photosensitive silver paste of Claim 5 is included, The electrode pattern characterized by the above-mentioned. The baked pattern of the photosensitive silver paste of Claim 6 is included, The electrode pattern characterized by the above-mentioned. The electrode was formed using the photosensitive silver paste of Claim 5, The plasma display panel characterized by the above-mentioned. The electrode was formed using the photosensitive silver paste of Claim 6, The plasma display panel characterized by the above-mentioned.