KR20060039790A - Liti apparatus, method of liti and fabricating method of using the same - Google Patents

Abstract

A laser thermal transfer apparatus, a laser thermal transfer method, and a manufacturing method of an organic light emitting display device using the same. A stage comprising a chuck on which the substrate is located; An optical system positioned on the substrate and having at least a laser; And a mask positioned between the substrate and the laser, the mask having a constant width equal to the substrate width, a laser thermal transfer method, and a method of manufacturing an organic light emitting display device using the same. to provide.

Sizing phase, mask, optical system, laser thermal transfer method, organic light emitting display device

Description

Laser thermal transfer apparatus, laser thermal transfer method, and manufacturing method of organic light emitting display device using the same {LITI apparatus, method of LITI and fabricating method of using the same}

Figure 1a is a perspective view showing a laser thermal transfer apparatus according to an embodiment of the present invention,

Figure 1b is a view showing in detail the optical system of the laser thermal transfer apparatus according to an embodiment of the present invention,

2A to 2C are diagrams showing patterns of dot and stripe type,

3, 4 and 5 are plan views showing a substrate and a mask for one color group of the shapes of the patterns shown in FIGS. 2A to 2C;

6a to 6d is a perspective view showing a laser thermal transfer method according to an embodiment of the present invention,

7 is a cross-sectional view of a unit pixel of an organic light emitting display device.

Explanation of reference numerals for the main parts of the drawing

10: first stage, 30: second stage,

35: optical system, 33: support,

50: mask, 37: inverter,

39: projection lens, 40: laser beam,

31: laser, 34: beam shaper,

20: substrate, 25: donor substrate

A method of manufacturing a laser thermal transfer apparatus and an organic light emitting display device using the same.

Among the flat panel display devices, the organic light emitting display device has a high response time with a response speed of 1 ms or less, low power consumption, and no self-emission, so there is no problem in viewing angle. . In addition, low-temperature manufacturing is possible, and the manufacturing process is simple based on the existing semiconductor process technology has attracted attention as a next-generation flat panel display device in the future.

The organic light emitting display device may be broadly classified into a polymer type device using a wet process and a low molecular type device using a deposition process according to materials and processes used as an organic light emitting display device.

In the inkjet printing method of the patterning method of the polymer or the low molecular light emitting layer, the material of the organic layers other than the light emitting layer is limited, and there is a need to form a structure for inkjet printing on the substrate.

In addition, when the light emitting layer is patterned by the deposition process, it is difficult to manufacture a large device due to the use of a metal mask.

Recently, the laser induced thermal imaging (LITI) has been developed as a technique to replace the above patterning method.

The laser thermal transfer method converts a laser beam from a light source into thermal energy and transfers a pattern forming material to a target substrate using the thermal energy to form a pattern. For this method, a donor substrate, a light source, and a subject having a transfer layer are formed. Phosphorus substrate is required.

The thermal transfer method has a form in which a donor substrate covers the entire substrate, which is a receptor, and the donor substrate and the substrate are fixed on a stage. Then, laser transfer is performed on the donor substrate to complete patterning.

In the patterning process, a dot pattern such as a mosaic or delta pattern is more difficult than a stripe pattern. That is, in the case of the dot pattern, the transfer speed may be slowed due to the on-off time interval of the laser depending on the pattern, and the afterimage may remain at the edge of the pattern due to the laser on-off timing. This requires a separate device for adjusting the on and off of the laser, and the transfer speed of the laser beam is slow, thereby causing a problem that the time and cost are further consumed.

Therefore, there is a need for improvement of a method of manufacturing an organic light emitting display device and a laser thermal transfer apparatus regardless of the shape of a pattern.

It is an object of the present invention to provide a laser thermal transfer apparatus capable of thermal transfer at the same speed irrespective of the form of a pattern.

In addition, another object of the present invention is to provide a laser thermal transfer apparatus capable of thermal transfer at the same speed irrespective of the size of the substrate.

Another object of the present invention is to provide a method of manufacturing an organic light emitting display device that can be manufactured at a constant speed regardless of the shape of a pattern and the size of a substrate.

The present invention to achieve the technical problem is a stage comprising a chuck substrate is located; An optical system positioned on the substrate and having at least a laser; And a mask located between the substrate and the laser, the mask having a constant width equal to a substrate width.

In addition, in order to achieve the above technical problem, the present invention comprises the steps of placing a substrate on a chuck located in the stage; Positioning an optical system having at least a laser on said substrate; Positioning a mask having a constant width equal to the substrate width between the substrate and the laser and aligning the mask with the substrate; It provides a laser thermal transfer method comprising operating the laser to emit a laser beam and scanning the emitted laser beam once in the width direction of the substrate to form all the patterns in the width direction of the substrate.

In addition, to achieve the above technical problem, the present invention comprises the steps of placing the substrate on the chuck positioned on the stage, the pixel electrode of the substrate and the transfer layer of the donor substrate facing; Positioning an optical system having at least a laser on said substrate; Positioning a mask having a constant width equal to the substrate width between the substrate and the laser and aligning the mask with the substrate; By operating the laser to emit a laser beam and scanning the emitted laser beam once in the width direction of the substrate to transfer the transfer layer of the donor substrate on the pixel electrode of the substrate to form a transfer layer pattern, Provided is a method of manufacturing an organic light emitting display device, including forming all patterns in the width direction of a substrate.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. The following embodiments are provided as examples to sufficiently convey the spirit of the present invention to those skilled in the art. Accordingly, the invention is not limited to the embodiments described below and may be embodied in other forms. In the drawings, lengths, thicknesses, and the like of layers and regions may be exaggerated for convenience. Like numbers refer to like elements throughout.

1A is a schematic diagram of a laser thermal transfer apparatus according to an exemplary embodiment of the present invention.

Referring to the drawings, the laser thermal transfer apparatus according to the present invention includes a stage 30.

The stage 30 is composed of a base and a transfer plate, the chuck 15 may be located on the transfer plate. In addition, the substrate 20 on which the donor substrate 25 is laminated may be positioned on the chuck 15. The chuck 15 is movable in the x-axis direction, that is, the direction of the substrate length (b), thereby allowing the substrate to be positioned more efficiently during laser thermal transfer.

An optical system 35 having at least a laser is located on the substrate. The optical system 35 has an upper portion and a lower portion positioned above the mask to be described later.

 The optical system 35 is supported by the support 33. In addition, the optical system 35 may move along the support 33 in the y-axis direction, that is, the direction (a) of the substrate width.

The laser is primarily irradiated onto the mask 50, and the laser beam passing through the mask 50 reaches the substrate 20 positioned on the stage 30.

Figure 1b is a view showing in detail the optical system of the laser thermal transfer apparatus according to an embodiment of the present invention.

Referring to the drawings, the optical system 35 includes a laser 31, a beam shaper 34, an image inverter 37, and a projection lens 39.

The laser 31 emits a laser beam. That is, the laser 31 is positioned above the mask 50 to irradiate a beam perpendicularly to the mask 50. The laser 31 may be provided as an optical fiber of an embedded laser diode or an external laser diode.

The laser beam 40 emitted from the laser 31 may be changed into a shape necessary for laser thermal transfer by passing through the beam shaper 34. That is, by passing through the beam shaper 34, the laser beam may be a homogenized line beam.

The homogenized line beam may irradiate a laser beam of uniform intensity in the width direction of the mask. Therefore, the modified laser beam 40 passes through the mask 50 while passing through the beam shaper 34. As a result, the laser beam 40 may be patterned.

The optical system positioned below the mask 50 may include an image inverter 37. In addition, the optical system may include a projection lens 39, and the projection lens 39 may be located at any position above or below the image inverter 37.

The projection lens 39 serves to focus the image of the laser beam 40 patterned through the mask 50 to make the image more clear, and to pass the projection lens 39 to pass the laser beam ( The image in 40 is reversed.

The image inverter 37 inverts the image of the laser beam 40 inverted through the projection lens 39 back to a sequential phase or before the laser beam 40 enters the projection lens 39. After inverting the image, the image is passed through the projection lens 39 so as to be upright again.

The image inverter 37 is composed of a plurality of mirrors therein, and the image of the laser beam 40 is reflected on the mirrors, thereby passing through the inverter in the image of the laser beam incident to the inverter You can invert it to a later image.

Accordingly, the projection lens 39 and the image inverter 37 realize an upright pattern having the same shape as the mask pattern, so that the pattern for patterning the light transmission pattern of the mask on the substrate is left or right without upside down or upside down. You can use For this reason, the manufacturing of the mask may also be simplified since the design of the mask does not need to be considered.

The mask 50 has a width 4a of the same length as the width 3a of the substrate 20 and has a constant length 4b. The size of the mask 50 pattern corresponds 1: 1 with the size of the pattern to be patterned on the substrate 20.

In addition, the mask 50 may have a pattern of a predetermined period. The regular pattern may be a dot or stripe.

2A to 2C illustrate a light emitting layer pattern form of an organic light emitting display device, that is, patterns of patterns to be patterned on the substrate, wherein 2a is a stripe type, 2b is a mosaic type, 2c is a delta type pattern, and the patterns have color groups of red (R), green (G), and blue (B).

3, 4 and 5 are plan views showing a substrate and a mask for one color group of the patterns shown in FIGS. 2A to 2C.

3, 4, and 5, patterns to be patterned are illustrated on the substrate 20. In detail, the patterns arranged in the width (3a) direction of the substrate 20 are called rows (1, 2, ... m), and the patterns arranged in the length (3b) direction of the substrate are arranged in columns (1, 2,. n), the pattern to be patterned on the substrate of FIGS. 2A to 2C may have m rows and n columns.

The mask also has light transmission patterns. The light transmission patterns have rows arranged in the width direction 4a of the mask 50 and columns arranged in the direction of the length 4b of the mask.

Referring to FIG. 3, a stripe-type mask according to an exemplary embodiment of the present invention will be described in detail. The mask on which light transmission patterns are formed according to the pattern of the substrate 20 and the substrate 20 on which the pattern to be patterned is listed ( 50).

The number of pattern arrays n in the major axis 4a direction of the mask is equal to the number of pattern arrays required in the width 3a direction of the substrate, and the scanning is performed while moving the mask L times in the longitudinal direction of the substrate. The number of pattern arrays in the minor axis 4b direction corresponds to the value obtained by dividing the number of pattern arrays m to be patterned in the longitudinal direction 3b of the substrate by L (m / L).

In addition, the size of the light transmission patterns may correspond 1: 1 with the size of the pattern to be patterned.

Referring to FIG. 4, the mosaic mask according to the embodiment of the present invention will be described in detail. The mask in which light transmission patterns are formed according to the pattern of the substrate 20 and the substrate 20 on which the pattern to be patterned is listed ( 50).

In the mosaic pattern of Fig. 4, the periodic repetition of the rows and columns and the arrangement of the patterns have the same characteristics as those of the stripe pattern. However, since the positions of subpixels between neighboring pixels change periodically, there is an area 11 to be patterned outside the pixel.

That is, unlike the stripe pattern, the mosaic pattern does not have a straight line because the mask pattern is not in a straight line. Therefore, in order to solve the above problem, at least one dummy pixel is formed at the edge of the substrate during fabrication, or patterned by one pixel outside the pixel of the substrate so that all the light emitting pixels are patterned. Therefore, when the mask 50 is manufactured in pixels and the mask step movement is performed in pixels, the mask 50 can be patterned in the same manner as the stripe type.

Referring to FIG. 5, a delta mask according to an exemplary embodiment of the present invention will be described in detail. Similarly to FIG. 4, positions of subpixels between neighboring pixels are periodically changed. Therefore, even in the case of a delta mask, the mask can be patterned in the same manner as the stripe type by manufacturing the mask in pixels and performing the mask step movement in pixels.

6A to 6D show a laser thermal transfer method using the laser thermal transfer apparatus shown in FIG. 1, and FIG. 7 shows a cross section of a unit pixel of an organic light emitting display device manufactured by the thermal transfer method.

Referring to FIG. 6A, a substrate 20 is placed on a chuck 15 positioned at a stage (30 in FIG. 1), and a donor substrate 25 having at least a transfer layer on the substrate 20 is laminated. do. The substrate 20 may be formed with TFT electrodes and pixel electrodes of an organic light emitting display device.

A mask (50 in FIG. 4) described with reference to FIG. 4 is positioned between the laminated substrate and the optical system 35. However, the mask 50r may be the mask described with reference to FIG. 3 or 5.

The laminated substrate 20 is aligned with the mask 50r. The optical system 35 including the laser is aligned on the aligned substrate 20 and the mask 50r.

The transfer layer is patterned on the substrate 20 on the stage 30 using the optical system 35 and the mask 50r.

In detail, a laser located in the optical system 35 irradiates the laser beam 40. As described above with reference to FIG. 1B, the optical system 35 includes a beam shaper, and the laser beam 40 may be changed into a homogenized line beam by passing through the beam shaper.

The laser beam 40 whose waveform is modified is transmitted to the mask 50r.

The laser beam is patterned by the mask, and the patterned laser beam 40 passes through an image inverter 37 and a projection lens 39 positioned below the optical system 35 to be inverted in phase. And incident on the substrate 20 in the same pattern as the mask.

Subsequently, the optical system 35 moves along the support 33 at a constant speed in the y-axis direction. As a result, the laser beam is irradiated along the width direction 4a of the mask, thereby forming patterns in the direction of the substrate width 3a.

That is, the pattern can be formed by one scanning in the substrate width direction. By using the masks described with reference to FIGS. 3 to 5, a desired pattern can be formed by only scanning the laser beam at a constant speed on the mask during laser transfer. Therefore, there is no need to turn on and off the laser according to the pattern, there is an effect that can save the time required by the conventional laser on and off.

The substrate 20 and the mask 50r may be fixed while the scanning takes place.

 Referring to FIG. 6B, the chuck 15 moves one step in the longitudinal direction b of the substrate after scanning the mask 50r once. Subsequently, the optical system performs scanning again while moving in the y-axis direction.

Therefore, by repeating the scanning and step movement method, such a process may be repeated one or more times according to the size of the substrate to perform laser transfer regardless of the size of the substrate.

Referring to FIG. 6C, the substrate 20 may know that the R light emitting layer is formed by repeating four scans 22 with respect to the mask 50r. The repetition of the four scans is for illustrative purposes only and is not limited thereto.

6A and 6B, patterning for one color, for example, G, is performed on the substrate 20 which has been patterned for one color, for example, R. FIG.

The donor substrate 25 having the G emission layer formed thereon is laminated on the substrate 20 on which the R emission layer is formed, and then placed on the chuck 15.

The optical system 35 is positioned on the laminated substrate 20, and a mask 50g for patterning the G emission layer is positioned on the optical system 35 to align with the substrate 20. Thereafter, as described with reference to FIGS. 6A and 6B, the transfer layer is patterned on the substrate 20.

Referring to FIG. 6D, after laminating the donor substrate 25 having the B light emitting layer formed on the substrate 20 on which the R and G light emitting layers are formed, using the mask 50b for the B light emitting layer, the method described above is performed. A transfer layer is formed on the substrate 20.

FIG. 7 is a cross-sectional view taken along line II ′ of FIG. 6A, and is a cross-sectional view of a unit pixel of an organic light emitting display device according to an exemplary embodiment of the present invention.

Referring to the drawings, the substrate 20 includes a lower substrate 205 and a thin film transistor 210 positioned on the lower substrate 205. In addition, a pixel electrode 220 connected to the thin film transistor 210 is positioned, and the pixel electrode 220 is partially exposed by the pixel defining layer 230.

The donor substrate 25 having the transfer layer 140 formed on the substrate 20 is positioned, and the transfer layer 140 is patterned on the substrate 20 through the process described with reference to FIG. 6A.

After the organic layers including the light emitting layer are patterned on the substrate 20 in the same manner as above, the counter electrode is formed and encapsulated to complete the organic light emitting display device.

The laser thermal transfer apparatus according to the present invention uses a mask capable of forming a pattern by scanning once in the substrate width direction, so that a desired pattern can be formed by only performing scanning at a constant speed on the mask during laser transfer. do. Therefore, there is no need to turn on and off the laser according to the pattern, and there is an effect that it is possible to save time required by the conventional laser on and off.

In addition, by repeating the scanning and step movement method, such a process may be repeated one or more times according to the size of the substrate to perform laser transfer regardless of the size of the substrate.

Accordingly, the laser thermal transfer apparatus according to the present invention can provide a method of manufacturing an organic light emitting display device that can be manufactured at a constant speed regardless of the shape of a pattern and the size of a substrate.

Although described above with reference to a preferred embodiment of the present invention, those skilled in the art will be variously modified and changed within the scope of the invention without departing from the spirit and scope of the invention described in the claims below I can understand that you can.

Claims (20)

A stage comprising a chuck on which the substrate is located; An optical system positioned on the substrate and having at least a laser; And And a mask positioned between the substrate and the laser, the mask having a constant width equal to the substrate width. The method of claim 1, The size of the mask pattern is a laser thermal transfer apparatus, characterized in that 1: 1 corresponds to the size of the pattern to be patterned on the substrate. The method of claim 2, Laser mask pattern, characterized in that the pattern of the mask has a certain period. The method of claim 1, And the optical system includes an upper portion positioned above the mask and having a lower portion positioned below the mask. The method of claim 4, wherein The upper portion of the optical system is a laser thermal transfer apparatus, characterized in that it comprises a beam shaper. The method of claim 5, wherein And a laser beam passing through the beam shaper is a homogenized line beam. The method of claim 4, wherein The lower portion of the optical system is a laser thermal transfer apparatus, characterized in that it comprises an image inverter. The method of claim 4, wherein The lower portion of the optical system is a laser thermal transfer apparatus, characterized in that it comprises a projection lens. The method of claim 1, The optical system is a laser thermal transfer apparatus, characterized in that for scanning in one direction of the mask. Positioning the substrate on a chuck positioned at the stage; Positioning an optical system having at least a laser on said substrate; Positioning a mask having a constant width equal to the substrate width between the substrate and the laser and aligning the mask with the substrate; Operating the laser to emit a laser beam, and scanning the emitted laser beam once in the width direction of the substrate to form all the patterns in the width direction of the substrate. The method of claim 10, The size of the mask pattern corresponds to the size of the pattern to be patterned on the substrate 1: 1 laser laser transfer method. The method of claim 10, The pattern of the mask is a laser thermal transfer method, characterized in that having a certain period. The method of claim 10, The optical system includes an upper portion positioned above the mask and having a lower portion positioned below the mask, and a lower portion positioned below the mask, and the upper portion provided with a beam shaper to homogenize the laser beam passing through the beam shaper. A laser thermal transfer method, characterized by changing to a line beam. The method of claim 10, And the optical system includes an upper portion positioned above the mask and having a lower portion positioned below the mask, wherein the lower portion includes a projection lens. The method of claim 14, And an image inverter in the lower portion, wherein the image inverter inverts the image of the laser beam passing through the projection lens to an upright image. The method of claim 10, And scanning the laser beam is performed by moving the optical system. The method of claim 10, And scanning the laser beam once and moving the stage by one step in a direction perpendicular to the scanning direction to perform scanning again. Positioning a substrate on a chuck positioned in a stage and positioning the pixel electrode of the substrate and a transfer layer of a donor substrate to face each other; Positioning an optical system having at least a laser on said substrate; Positioning a mask having a constant width equal to the substrate width between the substrate and the laser and aligning the mask with the substrate; By operating the laser to emit a laser beam and scanning the emitted laser beam once in the width direction of the substrate to transfer the transfer layer of the donor substrate on the pixel electrode of the substrate to form a transfer layer pattern, A method of manufacturing an organic light emitting display device comprising forming all patterns in the width direction of a substrate. The method of claim 18, The transfer layer is a light emitting layer of the organic light emitting display device manufacturing method. The method of claim 19, The transfer layer may further include at least one layer selected from the group consisting of a hole injection layer, a hole transport layer, a hole suppression layer, and an electron injection layer.

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