KR20060036849A - Teflon ring of furnace apparatus - Google Patents

Teflon ring of furnace apparatus Download PDF

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Publication number
KR20060036849A
KR20060036849A KR1020040085964A KR20040085964A KR20060036849A KR 20060036849 A KR20060036849 A KR 20060036849A KR 1020040085964 A KR1020040085964 A KR 1020040085964A KR 20040085964 A KR20040085964 A KR 20040085964A KR 20060036849 A KR20060036849 A KR 20060036849A
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ring
outer tube
flange
teflon
diffusion furnace
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KR1020040085964A
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Korean (ko)
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김정남
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삼성전자주식회사
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Publication of KR20060036849A publication Critical patent/KR20060036849A/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Gasket Seals (AREA)

Abstract

본 발명은 외측튜브와 상기 외측튜브가 장착되는 플랜지 사이에 설치되어, 상기 외측튜브와 상기 플랜지를 밀폐시키는 오링을 고정시키는 확산로설비의 테프론링에 있어서,The present invention is provided between the outer tube and the flange on which the outer tube is mounted, in the Teflon ring of the diffusion furnace equipment for fixing the O-ring sealing the outer tube and the flange,

상기 테프론링은 상기 오링이 안착되는 삽입홈과 상기 오일이 이탈되지 않도록 오링이탈방지턱을 포함하는 확산로설비의 테프론링에 관한 것이다.The teflon ring relates to a teflon ring of the diffusion furnace installation including an o-ring release prevention jaw so that the insertion groove and the oil is not separated from the O-ring is seated.

Description

확산로설비의 테프론링{teflon ring of furnace Apparatus}Teflon ring of furnace Apparatus

도 1은 종래 확산로설비의 플랜지구조를 개략적으로 도시한 단면도.1 is a cross-sectional view schematically showing a flange structure of a conventional diffusion furnace equipment.

도 2는 본 발명에 따른 확산로설비를 도시한 단면도.2 is a cross-sectional view showing a diffusion furnace facility according to the present invention.

도 3은 도 2의 플랜지구조를 개략적으로 도시한 단면도.
3 is a cross-sectional view schematically showing the flange structure of FIG.

<주요 부분에 대한 부호의 설명><Description of the code for the main part>

110 : 내측튜브110: inner tube

120 : 외측튜브120: outer tube

130 : 히터130: heater

140 : 플랜지140: flange

150 : 보트150: boat

160 : 지지판160: support plate

165 : 볼트165: Bolt

170 : 테프론링170: Teflon ring

173 : 삽입홈173: Insertion groove

175 : 오링이탈방지턱175: O-ring release prevention jaw

180 : 오링
180: O-ring

본 발명은 테프론링에 관한 것으로, 보다 상세하게는 외측튜브와 플랜지 사이에 설치되어 외측튜브와 플랜지를 실링시키는 오링이 안착되는 삽입홈과 상기 오일이 이탈되지 않도록 오링이탈방지턱을 포함하는 확산로설비의 테프론링에 관한 것이다.The present invention relates to a teflon ring, and more particularly, an installation groove installed between the outer tube and the flange, and an O-ring for seating the O-ring for sealing the outer tube and the flange, and a diffusion furnace facility including an O-ring release prevention jaw so that the oil does not escape. Relates to tefloning.

일반적으로, 반도체 소자 제조에는 다양한 제조공정을 거치게 되며, 그 중에서 폴리실리콘, 질화막 등을 웨이퍼 상에 증착시키는 데는 주로 화학기상증착(CVD ;Chemical Vapor Deposition)법이 이용된다. 상기 화학기상증착공정은 화학소스를 가스상태로 장치 내에 공급하여 웨이퍼 표면상에서 확산을 일으킴으로써 유전체막, 도전막 및 반도전막 등을 웨이퍼 표면에 증착시키는 기술이다.In general, semiconductor devices are manufactured through various manufacturing processes, and among them, chemical vapor deposition (CVD) is mainly used to deposit polysilicon, nitride, and the like on a wafer. The chemical vapor deposition process is a technique of depositing a dielectric film, a conductive film, a semiconducting film, etc. on the wafer surface by supplying a chemical source into the device in a gas state to cause diffusion on the wafer surface.

이러한 CVD 공정은 통상 확산로설비에서 공정을 진행하는데, 확산로설비는 내측튜브, 외측튜브, 히터 및 플랜지 등을 구비하고 있다.The CVD process is usually performed in a diffusion furnace facility, which is equipped with an inner tube, an outer tube, a heater and a flange.

외측튜브는 내측튜브의 외측에 설치되어 그 내부를 밀폐시키며, 히터는 외측튜브의 외측에 설치되어 내측튜브에 이송된 웨이퍼를 소정 온도로 가열하게 된다.The outer tube is installed outside the inner tube to seal the inside thereof, and the heater is installed outside the outer tube to heat the wafer transferred to the inner tube to a predetermined temperature.

그리고, 내측튜브와 외측튜브는 그 하부에 마련된 플랜지에 장착되어 있고, 이 플랜지가 외측튜브를 밀폐할 수 있도록 실링을 하게 된다.The inner tube and the outer tube are mounted on a flange provided at the lower portion thereof, and the flange is sealed to seal the outer tube.

도 1은 종래 확산로설비의 플랜지구조를 개략적으로 도시한 단면도이다. 1 is a cross-sectional view schematically showing a flange structure of a conventional diffusion furnace equipment.                         

도 1을 참조하면, 상기 외측튜브(10)는 상기 플랜지(20)의 상부에 적정한 체결수단 예컨대 지지판(30)과 볼트(35)에 의해 체결되며, 외측튜브(10)의 하단부와 플랜지(20) 상면 사이에는 공정가스의 누설을 방지하기 위한 오링(O-Ring)(40)과 상기 오링(40)의 외측에 설치되며, 상기 오링(40)을 고정시키는 역할을 하는 테프론링(Teflon Ring)(50)이 설치된다.Referring to FIG. 1, the outer tube 10 is fastened by an appropriate fastening means, for example, the support plate 30 and the bolt 35, on the upper portion of the flange 20, and the lower end of the outer tube 10 and the flange 20. ) O-ring 40 to prevent process gas leakage between the upper surface and is installed outside the O-ring 40, Teflon ring to secure the O-ring (40) 50 is installed.

그러나, 종래에는 테프론링이 'ㄴ'자 형상으로써, 오링을 단순 고정시키는 역할을 한다. 따라서, 플랜지에 외측튜브의 장착하는 과정중에는 플랜지와 외측튜브의 사이에 설치되는 오링의 유동이 발생되기 쉬우며 이로 인해 정확한 실링이 되지 않는 문제점이 있다.However, conventionally, the Teflon ring has a 'b' shape, and serves to simply fix the O-ring. Therefore, during the mounting of the outer tube to the flange, the flow of the O-ring that is installed between the flange and the outer tube easily occurs, and thus there is a problem in that the accurate sealing is not performed.

또한, 확산로설비의 운전 중에도 진동 등의 요인에 의한 오링이 제 위치를 이탈할 수 있으므로 이에 따라 공정가스의 누설이 발생되는 문제점이 있다.In addition, the O-ring due to vibration or other factors may be out of position even during operation of the diffusion furnace facility, thereby causing a problem of leakage of process gas.

따라서, 본 발명은 이와 같은 문제점을 감안한 것으로서, 본 발명의 목적은 오링이 정위치에서 이탈되지 않도록 오링이탈방지턱이 형성되는 테프론링을 구비한 확산로설비를 제공하는데 있다.Accordingly, the present invention has been made in view of the above problems, and an object of the present invention is to provide a diffusion furnace facility having a teflon ring in which the O-ring release prevention jaw is formed so that the O-ring does not leave at the correct position.

이와 같은 목적을 구현하기 위한 본 발명은 외측튜브와 상기 외측튜브가 장착되는 플랜지 사이에 설치되어, 상기 외측튜브와 상기 플랜지를 밀폐시키는 오링을 고정시키는 확산로설비의 테프론링에 있어서,The present invention for realizing such an object is provided between the outer tube and the flange on which the outer tube is mounted, in the Teflon ring of the diffusion furnace equipment for fixing the O-ring sealing the outer tube and the flange,

상기 테프론링은 상기 오링이 안착되는 삽입홈과 상기 오일이 이탈되지 않도 록 오링이탈방지턱을 포함하는 확산로설비의 테프론링에 관한 것이다.The teflon ring relates to a teflon ring of the diffusion furnace installation including an insertion groove in which the o-ring is seated and an o-ring release prevention jaw so that the oil is not separated.

바람직하게, 상기 오링이탈방지턱은 내경쪽으로 경사진 사다리꼴 형상인 것을 특징으로 한다.Preferably, the O-ring departure prevention jaw is characterized in that the trapezoidal shape inclined toward the inner diameter.

바람직하게, 상기 삽입홈은 그 단면의 형상이 라운드형인 것을 특징으로 한다.Preferably, the insertion groove is characterized in that the cross-sectional shape of the round shape.

이하, 도면을 참조하여 본 발명 확산로설비의 바람직한 일실시예를 구체적으로 설명하면 다음과 같다.Hereinafter, with reference to the drawings will be described in detail a preferred embodiment of the present invention the diffusion furnace equipment.

도 2는 확산로설비의 구조를 도시한 단면도이고, 도 3은 도 2의 외측튜브와 플랜지의 단면을 도시한 단면도이다.2 is a cross-sectional view showing the structure of the diffusion furnace equipment, Figure 3 is a cross-sectional view showing a cross section of the outer tube and the flange of FIG.

또한, 이해의 편의를 위하여 비록 다른 도면에 속하더라도 동일한 구성요소에는 동일한 부호를 부여하였음을 주의하여야 한다.In addition, it should be noted that the same reference numerals are given to the same elements, although belonging to different drawings for convenience of understanding.

도 2를 참조하면, 확산로는 수직으로 관통된 중공형상으로 내측튜브(110)를 구비하고, 이 내측튜브(110)의 외측에는 하향 개방되는 캡형상으로 내측튜브(110)의 상부와 외측을 감싸는 구성으로 외측튜브(120)가 구비되며, 외측튜브(120)의 외측에는 히터(130)가 구비된다.Referring to FIG. 2, the diffusion path includes an inner tube 110 in a hollow shape vertically penetrated, and an upper and an outer side of the inner tube 110 in a cap shape that is opened downward on the outer side of the inner tube 110. The outer tube 120 is provided in a wrapping configuration, and the heater 130 is provided on the outer side of the outer tube 120.

또한, 내측튜브(110)와 외측튜브(120)의 하부에는 플랜지(140)를 구비하여 이들 내측튜브(110)와 외측튜브(120)가 안착 고정되도록 지지하며, 플랜지(140)의 하측에는 다수의 웨이퍼(W)가 일정간격으로 적층되는 보트(150)가 구비되며, 이 보트(150)는 승강이 가능하게 구비되면서 내측튜브(110)의 안쪽으로 인출입이 가능하도록 구성된다. In addition, the lower side of the inner tube 110 and the outer tube 120 is provided with a flange 140 to support the inner tube 110 and the outer tube 120 to be seated and fixed, a number of the lower side of the flange 140 The boat 150 is provided with a boat 150 in which the wafers W are stacked at a predetermined interval, and the boat 150 is provided to be capable of lifting up and down to the inside of the inner tube 110.                     

이때, 외측튜브(120)의 하단부와 플랜지(140)의 상단부는 긴밀하게 밀착되면서 외부와의 기밀성을 유지하여 공정가스의 누설을 방지한다.At this time, the lower end of the outer tube 120 and the upper end of the flange 140 is in close contact with each other to maintain the airtightness with the outside to prevent the leakage of the process gas.

한편, 본 발명의 기술적 사상인 확산로설비의 플랜지구조를 도 3을 참조하여 살펴보면, 외측튜브(120)는 플랜지(140)에 장착되어 기밀성을 유지하는데, 이를 위해 상기 외측튜브(120)와 플랜지(140)의 상면에 지지판(160)을 위치시켜 볼트(165)와 같은 체결수단에 의해 외측튜브(120)를 플랜지(140)에 장착시킨다.Meanwhile, referring to FIG. 3, the flange structure of the diffusion furnace facility, which is the technical idea of the present invention, the outer tube 120 is mounted on the flange 140 to maintain airtightness. For this purpose, the outer tube 120 and the flange Positioning the support plate 160 on the upper surface of 140 to mount the outer tube 120 to the flange 140 by fastening means such as bolts (165).

이때, 지지판(160)에 의해 플랜지(140)와 외측튜브(120)가 그 강도를 견디어 낼 수 있는 한도 내에서 죄인다.At this time, the flange 140 and the outer tube 120 by the support plate 160 is clamped to the extent that can withstand the strength.

한편, 외측튜브(120)와 플랜지(140)의 사이에는 오링(180)이 설치되어 내측, 외측튜브(110,120)내 공정가스의 외부 누설을 방지하며, 상기 오링(180)의 유동 및 이탈되는 것을 방지하기 위해 오링(180)의 외측에 테프론링(170)을 설치하여 오링(180)을 고정시킨다.On the other hand, the O-ring 180 is installed between the outer tube 120 and the flange 140 to prevent the external leakage of the process gas in the inner, outer tube (110, 120), the flow of the O-ring 180 and the departure In order to prevent the O-ring 180 is installed on the outside of the Teflon ring 170 to fix the O-ring 180.

또한, 이 테프론링(170)은 오링(180)이 안착되는 삽입홈(173)과 오링(180)의 이탈 및 유동을 방지하기 위한 오링이탈방지턱(175)을 구비한다. In addition, the Teflon ring 170 has an insertion groove 173 on which the O-ring 180 is seated and an O-ring release preventing jaw 175 for preventing the separation and flow of the O-ring 180.

여기에서, 상기 오링이탈방지턱은 상기 오링을 상기 테프론링에 끼우기 쉽도록 내경쪽으로 경사진 사다리꼴 형상으로 형성되는 것이 바람직하다.Here, the O-ring release prevention jaw is preferably formed in a trapezoidal shape inclined toward the inner diameter so as to easily fit the O-ring to the Teflon ring.

또한, 상기 삽입홈은 상기 오링이 테프론링에 안착되기 쉽도록 라운드형인 것이 바람직하다.In addition, the insertion groove is preferably rounded so that the O-ring is easily seated on the Teflon ring.

이에 테프론링의 삽입홈(173)에 안착된 오링(180)은 오링이탈방지턱(175)으로 인해 오링(180)의 플랜지(140) 장착 시나 확산로설비 작동 시 진동 등의 외부요 인으로 하여금 이탈 및 유동되는 것을 방지하는 역할을 하게 된다.Therefore, the O-ring 180 seated in the insertion groove 173 of the Teflon ring is separated by external factors such as vibration when the flange 140 of the O-ring 180 is installed or the diffusion furnace equipment is operated due to the O-ring release prevention jaw 175. And to prevent flow.

이상에서 설명한 바와 같이, 본 발명 확산로설비는 오링을 고정하는 역할을 하는 테프론링에 오링이탈방지턱을 형성하여 오링이 이탈 및 유동되지 않도록 함으로써, 공정튜브내 공정가스의 외부 누설을 방지하는 효과가 있다.As described above, the present invention has an effect of preventing the external leakage of the process gas in the process tube by forming the O-ring release prevention jaw in the Teflon ring which serves to fix the O-ring to prevent the O-ring from being separated and flowed. have.

본 발명은 도시한 실시예를 참고로 설명하였으나, 이는 예시적인 것에 불과하며, 본 기술 분야의 통상적 지식을 가진 자라면 이로부터 다양한 변형 및 균등한 타 실시예가 가능하다는 점을 이해할 것이다. 그러므로 본 발명의 범위는 첨부된 특허청구의 범위와 이와 균등한 것들에 의해 정해져야 한다.Although the present invention has been described with reference to the illustrated embodiments, it is merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. Therefore, the scope of the present invention should be defined by the appended claims and their equivalents.

Claims (3)

외측튜브와 상기 외측튜브가 장착되는 플랜지 사이에 설치되어, 상기 외측튜브와 상기 플랜지를 밀폐시키는 오링을 고정시키는 확산로설비의 테프론링에 있어서,In the teflon ring of the diffusion furnace equipment is installed between the outer tube and the flange on which the outer tube is mounted, fixing the O-ring sealing the outer tube and the flange, 상기 테프론링은 상기 오링이 안착되는 삽입홈과 상기 오일이 이탈되지 않도록 오링이탈방지턱을 포함하는 확산로설비의 테프론링.The teflon ring is a teflon ring of the diffusion furnace installation comprising an o-ring release prevention jaw so that the oil is not inserted into the insertion groove is seated the O-ring. 제 1항에 있어서,The method of claim 1, 상기 오링이탈방지턱은 내경쪽으로 경사진 사다리꼴 형상인 것을 특징으로 하는 확산로설비의 테프론링.The O-ring deviation prevention teflon ring of the diffusion furnace equipment, characterized in that the trapezoidal shape inclined toward the inner diameter. 제 1항에 있어서,The method of claim 1, 상기 삽입홈은 그 단면의 형상이 라운드형인 것을 특징으로 하는 확산로설비의 테프론링.The insertion groove is a teflon ring of the diffusion furnace equipment, characterized in that the cross-section of the round shape.
KR1020040085964A 2004-10-26 2004-10-26 Teflon ring of furnace apparatus KR20060036849A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018214306A1 (en) * 2017-05-26 2018-11-29 深圳市捷佳伟创新能源装备股份有限公司 Furnace mouth heat insulation structure for low-pressure diffusion furnace

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018214306A1 (en) * 2017-05-26 2018-11-29 深圳市捷佳伟创新能源装备股份有限公司 Furnace mouth heat insulation structure for low-pressure diffusion furnace

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