KR20050028523A - Glass etching methode - Google Patents

Glass etching methode Download PDF

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KR20050028523A
KR20050028523A KR1020030064806A KR20030064806A KR20050028523A KR 20050028523 A KR20050028523 A KR 20050028523A KR 1020030064806 A KR1020030064806 A KR 1020030064806A KR 20030064806 A KR20030064806 A KR 20030064806A KR 20050028523 A KR20050028523 A KR 20050028523A
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glass
etching
weight
glass surface
surfactant
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KR1020030064806A
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Korean (ko)
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이혜숙
이행진
이행수
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이혜숙
이행진
이행수
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

A surface treatment of glass is provided to express various patterns on the glass surface by low reflective treating and patterning through two etching times. The surface treatment of glass by etching is processed by the following steps of: dipping a plain glass into an etchant solution(20-30deg.) for 2-3min for low reflective treatment of glass through the first etching (S2), wherein the etchant is obtained by mixing 30-60wt.% of NH4HF2, 1-5wt.% of BaSO4, 30-40wt.% of sugar, 1-5wt.% of surfactant and 10-30wt.% of ionized water, heating mixtures in boiling water(50-90deg.C) and aging the mixed solution for more than 12hrs; washing the glass and drying (S3); screen printing some patterns on the low reflective surface of the glass and drying (S4); dipping the screen-printed glass into an etchant solution(35-40deg.C) for 4-5min for patterning through the second etching (S4), wherein the etchant is obtained by mixing 30-40wt.% of HF, 20-30wt.% of diluted H2SO4, 1-7wt.% of H3PO4, 1-5wt.% of surfactant and 30-50wt.% of ionized water, and aging the mixed solution for more than 12hrs; washing glass and drying (S5).

Description

유리표면 처리방법{glass etching methode}Glass surface treatment method {glass etching methode}

본 발명은 유리 표면을 1차 부식시켜 저반사 처리한 후 그 표면을 소정 형상으로 2차 식각하여 소정의 패턴 형상을 유리 표면에 형성하는 방법에 관련된 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of forming a predetermined pattern shape on a glass surface by first etching the glass surface and subjecting it to a low reflection treatment, and then etching the surface into a predetermined shape.

유리 표면을 저반사 처리하는 방법으로는 일본 특허공보 소47-6310호에 플루오르화 수소를 주성분으로 하는 용액에 (NH4)2SO4, (NH4)3 PO4, NH4CL, NH4F 등의 암모늄염을 첨가한 산용액을 이용하여 유리 표면에 요철을 형성시키는 방법이 개시되어 있다.As a method of low-reflection treatment on the glass surface, Japanese Patent Publication No. 47-6310 discloses (NH 4 ) 2 SO 4 , (NH 4 ) 3 PO 4 , NH 4 CL, NH 4 in a solution mainly composed of hydrogen fluoride. A method of forming irregularities on the glass surface using an acid solution containing an ammonium salt such as F is disclosed.

또, 한국 특허등록번호 1990-11799호에는 1단계로 미세한 연마제를 물과 혼합하여 슬러리 상태로 만든 후 이것을 유리 표면에 습식 상태로 직접 분사시켜 유리 표면에 충격을 줌으로서 미세한 균열이 유리 표면에 생기도록 하고, 2단계로 플루오르화 수소를 주성분으로 한 산용액을 직접유리 표면에 분사시켜 1단계에서 유리 표면에 형성된 미세한 균열부를 다시 미세하게 식각하여 유리 표면의 요철을 균일하게 형성하는 기술이 개시되어 있다.In addition, Korean Patent Registration No. 1990-11799 discloses that a fine abrasive is mixed with water in a first step to form a slurry, which is then directly sprayed onto the glass surface in a wet state to give an impact on the glass surface. In the second step, a technique of spraying an acid solution containing hydrogen fluoride as a main component directly onto the glass surface to finely etch fine cracks formed on the glass surface in the first step to uniformly form irregularities on the glass surface is disclosed. have.

상기와 같은 유리 표면에 미세한 요철을 형성시키는 기술은 유리 표면의 저반사 목적은 달성할 수 있으나 유리 표면에 소정의 형상을 입체적으로 디자인할 수 있도록 식각 하거나 요철을 형성시키는 데는 한계가 있다.The technique of forming the fine irregularities on the glass surface as described above can achieve the low-reflection purpose of the glass surface, but there is a limit to the etching or forming the irregularities to be able to design a predetermined shape on the glass surface in three dimensions.

본 발명은 상기와 같은 문제점을 해결하기 위하여 안출된 것으로서 유리 표면이 저반사 처리되고, 그 저반사 처리된 표면에 다양한 입체 형상을 갖도록 유리 표면을 식각하는 기술을 제공하는 것을 목적으로 한다.SUMMARY OF THE INVENTION An object of the present invention is to provide a technique for etching a glass surface such that the glass surface is low-reflected and has various three-dimensional shapes on the low-reflected surface.

본 발명의 또 다른 목적은 저반사 처리된 유리 표면에 입체적으로 형성되는 모양을 식각 방법으로 형성함으로서 유리를 실내 장식 및 칸막이, 가구 등에 효율적으로 이용할 수 있도록 하는데 있다.Still another object of the present invention is to form a three-dimensional shape on the surface of the low reflection glass by an etching method so that the glass can be efficiently used for interior decoration, partitioning, furniture, and the like.

상기 목적 달성을 위하여 본 발명은 1단계로 유리 표면에 미세한 요철이 형성되도록 부식시켜 빛을 산란시키는 저반사 처리한 다음 2단계로 저반사 처리된 유리를 패터닝 하여 식각한다.In order to achieve the above object, the present invention is subjected to a low reflection treatment to scatter light by forming a fine unevenness on the surface of the glass in one step, and then etching the low reflection glass by patterning it in two steps.

1단계의 저반사 처리는 불화암모늄(NH4HF2), 황산바륨(BaSO4), 설탕 계면활성제 화합물의 조성물 수용액에 디핑시켜 이루어지고, 2단계 에칭은 불산(HF2), 묽은 황산(H2SO4), 인산(H3PO4), 계면활성제 화합물의 조성물 수용액에 디핑시켜 이루어진다.Low-reflection treatment of the first step is ammonium fluoride (NH 4 HF 2), barium sulfate (BaSO 4), is made by dipping in the composition an aqueous solution of a sugar surfactant compound, 2-step etching is hydrofluoric acid (HF 2), diluted sulfuric acid (H 2 SO 4 ), phosphoric acid (H 3 PO 4 ), and a dipping in an aqueous solution of the composition of the surfactant compound.

본 발명의 유리 표면처리 방법은 불화암모늄(NH4HF2) 30-60중량%, 황산바륨(BaSO4) 1-5중량%, 설탕 30-40중량%, 계면활성제 1-5중량%, 이온수 10-30중량%의 비율로 혼합한 후 50-90℃로 중탕하여 적어도 12시간 이상 숙성시킨 용액을 이용하여 유리 표면 전체를 1차 식각하는 단계,Glass surface treatment method of the present invention is 30-60% by weight of ammonium fluoride (NH 4 HF 2 ), 1-5% by weight of barium sulfate (BaSO 4 ), sugar 30-40% by weight, surfactant 1-5% by weight, ionized water Mixing the mixture at a ratio of 10-30% by weight and then primary etching the entire glass surface using a solution aged at 50-90 ° C. for at least 12 hours,

불산(HF2) 30-40중량%, 묽은 황산(H2SO4) 20-30중량%, 인산(H3PO 4) 1-7중량%, 계면활성제 1-5중량%, 이온수 30-50중량%를 혼합하여 적어도 12시간 이상 숙성시킨 용액을 이용하여 상기 1차 식각된 유리 표면을 선택적으로 2차 식각하는 단계를 포함하는 것을 특징으로 한다.30-40 wt% hydrofluoric acid (HF 2 ), 20-30 wt% dilute sulfuric acid (H 2 SO 4 ), 1-7 wt% phosphoric acid (H 3 PO 4 ), 1-5 wt% surfactant, 30-50 ionized water And selectively etching the first etched glass surface by using a solution mixed by weight% and aged for at least 12 hours.

상기 2차 식각은 스크린 인쇄에 의하여 형성되는 식각 보호막의 패터닝 형태에 따라 이루어지고 상기 식각 보호막은 수세에 의하여 제거되는 것을 특징으로 한다.The secondary etching may be performed according to the patterning form of the etching protection film formed by screen printing, and the etching protection film may be removed by washing with water.

이하, 본 발명의 유리 표면 처리방법의 기술적 구성 및 작용은 실시예를 통하여 구체적으로 설명한다.Hereinafter, the technical configuration and operation of the glass surface treatment method of the present invention will be described in detail by way of examples.

실시예Example

본 발명의 유리 표면처리 방법은 먼저 유리를 세척 건조한 다음, 소정의 장치에 그 유리를 장착한다(S1).In the glass surface treatment method of the present invention, the glass is first washed and dried, and then the glass is mounted on a predetermined device (S1).

상기 세정 건조된 유리는 2장씩 겹치게 장착하여 유리의 한 면만 저반사 처리되도록 1차 식각하여도 된다.The washed and dried glass may be firstly etched so that only one surface of the glass is low-reflected by mounting two sheets of glass.

상기 유리는 불화암모늄(NH4HF2) 50중량%, 황산바륨(BaSO4) 1중량%, 설탕 35중량%, 글리세린으로 된 계면활성제 2중량%, 이온수 12중량%의 비율로 혼합한 후 80℃로 중탕하여 20시간 숙성시킨 25℃의 용액에 약 2분 정도 디핑하여 그 용액에 노출된 유리 표면을 1차 식각되도록 하였다(S2). 상기 1차 식각에 의하여 유리 표면이 부식되어 표면이 거칠어짐으로 빛이 반사되지 않는 저반사면으로 바뀐다. 상기 1차 식각 용액은 불화암모늄(NH4HF2) 30-60중량%, 황산바륨(BaSO4) 1-5중량%, 설탕 30-40중량%, 계면활성제 1-5중량%, 이온수 10-30중량%의 범위 내에서 혼합한 후 50-90℃로 중탕하여 12시간 내지 48시간 숙성시킨 것을 이용하여도 충분한 저반사 효과가 얻어지는 것을 확인하였다.The glass was mixed at a ratio of 50% by weight of ammonium fluoride (NH 4 HF 2 ), 1% by weight of barium sulfate (BaSO 4 ), 35% by weight of sugar, 2% by weight of a surfactant made of glycerin, and 12% by weight of ionized water. The glass surface exposed to the solution was first etched by dipping for about 2 minutes in a solution at 25 ° C. which was aged at 20 ° C. and aged for 20 hours (S2). Due to the primary etching, the glass surface is corroded and the surface is roughened, thereby changing to a low reflection surface where light is not reflected. The primary etching solution is 30-60% by weight of ammonium fluoride (NH 4 HF 2 ), 1-5% by weight of barium sulfate (BaSO 4 ), 30-40% by weight sugar, 1-5% by weight surfactant, 10- After mixing within the range of 30% by weight, it was confirmed that a sufficient low reflection effect was obtained even by using a bath at 50-90 ° C. and aging for 12 to 48 hours.

상기 1차 식각 용액은 온도를 20-30℃로 하였을 때 유리의 디핑시간은 약 2-3분 정도가 이상적이었다.When the temperature of the primary etching solution was 20-30 ° C, the dipping time of the glass was ideally about 2-3 minutes.

상기 1차 식각이 종료되면 유리를 세척조로 이동시켜 슬러지를 제거한 후 수세하여 건조시킨다(S3). When the primary etching is completed, the glass is moved to a washing tank to remove sludge and washed with water to dry (S3).

이어서, 1차 식각이 종료되어 표면이 저반사 처리된 유리 표면에 소정의 패턴 형상을 스크린 인쇄하여 건조시킨다(S4). 상기 스크린 인쇄부는 2차 식각을 위한 마스크 패턴으로 작용하고, 스크린 인쇄부를 제외한 부분이 2차 식각되어 유리 표면에 입체적으로 소정의 패턴 모양이 형성된다.Subsequently, the primary etching is completed, and a predetermined pattern shape is screen printed on the glass surface on which the surface is low reflection treated and dried (S4). The screen printing part serves as a mask pattern for secondary etching, and portions except for the screen printing part are secondly etched to form a predetermined pattern shape three-dimensionally on the glass surface.

이어서, 상기 스크린 인쇄된 유리는 2차 식각 용액이 들어있는 침전조에 넣어 식각한다(S5).Subsequently, the screen printed glass is etched into a settling tank containing a secondary etching solution (S5).

상기 2차 식각 용액은 불산(HF2) 40중량%, 묽은 황산(H2SO4) 20중량%, 인산(H3PO4) 1중량%, 글리세린으로 된 계면활성제 2중량%, 이온수 27중량%를 혼합하여 24시간 숙성시킨 것을 이용하였다. 상기 2차 식각 용액을 약 35℃로 하여 5분간 유리를 디핑처리한 후, 세척조로 이동시켜 슬러지와 스크린 인쇄부를 제거하고 건조시켰다(S6).The secondary etching solution is 40% by weight of hydrofluoric acid (HF 2 ), 20% by weight of dilute sulfuric acid (H 2 SO 4 ), 1% by weight of phosphoric acid (H 3 PO 4 ), 2% by weight of surfactants of glycerin, 27% by weight of ionized water A mixture of% and aged for 24 hours was used. After distilling the glass for 5 minutes at about 35 ° C., the secondary etching solution was moved to a washing tank to remove sludge and screen printing, and dried (S6).

상기 2차 식각 용액은 불산(HF2) 30-40중량%, 묽은 황산(H2SO4) 20-30중량%, 인산(H3PO4) 1-7중량%, 계면활성제 1-5중량%, 이온수 30-50중량%를 혼합하여 12시간 내지 48시간 숙성시킨 것을 이용하여도 충분한 에칭 효과가 얻어지는 것을 확인하였다.The secondary etching solution is 30-40% by weight of hydrofluoric acid (HF 2 ), 20-30% by weight dilute sulfuric acid (H 2 SO 4 ), 1-7% by weight phosphoric acid (H 3 PO 4 ), 1-5% surfactant It was confirmed that sufficient etching effects were obtained even by mixing% and 30-50% by weight of ionized water and aging for 12 to 48 hours.

상기 2차 식각 용액은 온도를 35-40℃로 하였을 때 유리의 디핑 시간은 약 4-5분 정도가 이상적이었다.When the temperature of the secondary etching solution was 35-40 ° C., the dipping time of the glass was ideally about 4-5 minutes.

상기와 같이 유리 표면에 저반사 처리면을 형성한 후, 그 저반사 처리 면을 소정의 패턴 형태에 따라 2차 식각하여 소정 형상의 디자인 모양을 형성함으로써 은은하고 질감 및 입체감이 뛰어난 유리를 얻을 수 있다.After forming the low reflection treatment surface on the glass surface as described above, the low reflection treatment surface is second-etched according to a predetermined pattern to form a design shape of a predetermined shape, thereby obtaining glass having excellent softness and texture and three-dimensional effect. .

본 발명은 불화암모늄(NH4HF2), 황산바륨(BaSO4), 설탕, 계면활성제, 이온수가 혼합된 수용액을 이용하여 유리 표면이 균일하게 부식되도록 하는 1차 식각하고, 불산(HF2), 묽은 황산(H2SO4), 인산(H3PO4), 계면활성제, 이온수가 혼합된 수용액을 이용하여 1차 식각된 유리 표면을 선택적으로 2차 식각하는 과정을 거침으로써, 저반사 처리된 유리 표면에 다양한 입체 형상을 용이하게 형성하는 효과를 얻을 수 있다.The present invention is primary etching to uniformly corrode the glass surface using an aqueous solution of ammonium fluoride (NH 4 HF 2 ), barium sulfate (BaSO 4 ), sugar, surfactant, ionic water, and hydrofluoric acid (HF 2 ) The low reflection treatment is performed by selectively etching the first etched glass surface using an aqueous solution of dilute sulfuric acid (H 2 SO 4 ), phosphoric acid (H 3 PO 4 ), a surfactant, and ionic water. The effect of easily forming various three-dimensional shapes on the finished glass surface can be obtained.

또, 유리의 표면 디자인을 다양화하여 실내 장식 및 칸막이, 가구 등에 효율적으로 이용하는 효과를 얻을 수 있다.Moreover, the surface design of glass can be diversified, and the effect used efficiently for interior decoration, a partition, furniture, etc. can be acquired.

도 1은 본 발명의 유리 표면처리 방법을 설명하기 위한 공정도이다. 1 is a process chart for explaining the glass surface treatment method of the present invention.

Claims (2)

불화암모늄(NH4HF2) 30-60중량%, 황산바륨(BaSO4) 1-5중량%, 설탕 30-40중량%, 계면활성제 1-5중량%, 이온수 10-30중량%의 비율로 혼합한 후 50-90℃로 중탕하여 적어도 12시간 이상 숙성시킨 용액을 이용하여 유리 표면 전체를 1차 식각하는 단계,30-60% by weight of ammonium fluoride (NH 4 HF 2 ), 1-5% by weight of barium sulfate (BaSO 4 ), 30-40% by weight of sugar, 1-5% by weight of surfactant, 10-30% by weight of ionized water Firstly etching the entire glass surface by using a solution aged at least 12 hours by mixing with 50 to 90 ° C. after mixing, 불산(HF2) 30-40중량%, 묽은 황산(H2SO4) 20-30중량%, 인산(H3PO 4) 1-7중량%, 계면활성제 1-5중량%, 이온수 30-50중량%를 혼합하여 적어도 12시간 이상 숙성시킨 용액을 이용하여 상기 1차 식각된 유리 표면을 선택적으로 2차 식각하는 단계를 포함하는 것을 특징으로 하는 유리 표면처리 방법.30-40 wt% hydrofluoric acid (HF 2 ), 20-30 wt% dilute sulfuric acid (H 2 SO 4 ), 1-7 wt% phosphoric acid (H 3 PO 4 ), 1-5 wt% surfactant, 30-50 ionized water And selectively etching the first etched glass surface by using a solution mixed by weight% and aged for at least 12 hours. 제1항에 있어서,The method of claim 1, 상기 2차 식각은 스크린 인쇄에 의하여 형성되는 식각 보호막의 패터닝 형태에 따라 이루어지고 상기 식각 보호막은 수세에 의하여 제거되는 것을 특징으로 하는 유리 표면처리 방법.Wherein the secondary etching is performed according to the patterning pattern of the etch protective film formed by screen printing and the etch protective film is removed by washing with water.
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100803080B1 (en) * 2006-08-25 2008-02-18 (주)금영 A window panel manufacturing method and that window panel of tempered glass
KR100931884B1 (en) * 2008-03-27 2009-12-15 주식회사 이 월드 Surface treatment method and apparatus of small glass plate for display using folic acid
KR101387058B1 (en) * 2012-10-11 2014-04-21 주식회사 유플러스비젼 Method for preparing low-reflection glass plate with nano structure and etching reagent for preparing the same
CN107857481A (en) * 2017-10-18 2018-03-30 广东欧珀移动通信有限公司 Bend glass sheet material and preparation method thereof, mobile terminal
WO2019076291A1 (en) * 2017-10-18 2019-04-25 Oppo广东移动通信有限公司 Curved glass sheet and method for manufacturing same, and electronic device
CN115490433A (en) * 2022-09-30 2022-12-20 海南海控特玻科技有限公司 Anti-reflection high-aluminosilicate glass and preparation method thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100803080B1 (en) * 2006-08-25 2008-02-18 (주)금영 A window panel manufacturing method and that window panel of tempered glass
KR100931884B1 (en) * 2008-03-27 2009-12-15 주식회사 이 월드 Surface treatment method and apparatus of small glass plate for display using folic acid
KR101387058B1 (en) * 2012-10-11 2014-04-21 주식회사 유플러스비젼 Method for preparing low-reflection glass plate with nano structure and etching reagent for preparing the same
CN107857481A (en) * 2017-10-18 2018-03-30 广东欧珀移动通信有限公司 Bend glass sheet material and preparation method thereof, mobile terminal
WO2019076284A1 (en) * 2017-10-18 2019-04-25 Oppo广东移动通信有限公司 Curved glass sheet and method for manufacturing same, and electronic device
WO2019076291A1 (en) * 2017-10-18 2019-04-25 Oppo广东移动通信有限公司 Curved glass sheet and method for manufacturing same, and electronic device
CN115490433A (en) * 2022-09-30 2022-12-20 海南海控特玻科技有限公司 Anti-reflection high-aluminosilicate glass and preparation method thereof
CN115490433B (en) * 2022-09-30 2024-03-22 海南海控特玻科技有限公司 Reflection-reducing reflection-increasing high-alumina silicate glass and preparation method thereof

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