KR20050015134A - Liquid crystal display and method for manufacturing the same - Google Patents

Abstract

PURPOSE: An LCD(Liquid Crystal Display) and a method for manufacturing the LCD are provided to form spacers using a plurality of color filters to omit a process of forming an overcoat film, to thereby simplify an LCD manufacturing process, reduce manufacturing cost and improve transmissivity of the LCD. CONSTITUTION: An LCD includes the first substrate(100), a plurality of color filters(130) formed on the first substrate, spacers(140) formed of the plurality of color filters, the second substrate(200) opposite to the first substrate, and a liquid crystal layer(300) formed between the first substrate and the second substrate.

Description

Liquid crystal display device and its manufacturing method {LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING THE SAME}

The present invention relates to a liquid crystal display device and a method for manufacturing the same, and more particularly, to a liquid crystal display device and a method for manufacturing the liquid crystal display with a simplified manufacturing process and improved transmittance.

The liquid crystal display applies an electric field to the liquid crystal material injected between the liquid crystal display devices in which the switching element is formed, and adjusts the intensity of the electric field to adjust the amount of light transmitted to the substrate. It is a display device which obtains a desired image signal. Liquid crystal display devices are thinner and lighter than other display devices, and are widely used in various electronic devices because they have low power consumption and low driving voltage and can display images close to cathode ray tubes.

Recently, efforts for thinning a thinner liquid crystal display have been continued. Since the thinning of the liquid crystal display is closely related to the light efficiency, it has a direct influence on the weight reduction and the energy consumption of the liquid crystal display. Among the characteristics of the liquid crystal, the response speed, contrast ratio, viewing angle, luminance uniformity, etc. are closely related to the thickness of the liquid crystal layer, so that the thickness of the liquid crystal layer (hereinafter, referred to as a 'cell gap') is constant. It is important to keep. However, when the distance between the substrates is reduced by thinning the liquid crystal display device, it is difficult to keep the thickness of the liquid crystal interposed between the substrates constant. Spacers may be disposed between the substrates to keep the cell gap constant.

Spacers for maintaining cell gaps include ball spacers and column spacers, and the column spacers may be disposed at predetermined positions, and have an advantage of maintaining a constant cell gap. . The column spacer is formed through a pattern formation and an etching process after applying the organic film on the substrate.

In the formation of the column spacer, the edges of the color filters are overlapped and coated so that a step is formed between the first coated color filter and the later coated color filter. Such a step makes the cell gap of the liquid crystal display non-uniform, resulting in non-uniform brightness or color at the site where the non-uniform cell gap is formed. Therefore, an overcoating layer is formed before forming the color filter on the color filter in order to remove the step between the color filters.

The conventional liquid crystal display device has a disadvantage in that transmittance of the liquid crystal display device is lowered due to the overcoating layer. Therefore, there is a need for a liquid crystal display device having a column spacer capable of maintaining a constant cell gap without having an overcoating layer for removing a step between color filters, and a method of manufacturing the same.

Accordingly, it is a first object of the present invention to provide a liquid crystal display device which can be manufactured by a simplified process and has improved transmittance.

Moreover, the 2nd objective of this invention is providing the manufacturing method of the liquid crystal display device suitable for manufacturing the said liquid crystal display device.

In order to achieve the first object of the present invention described above, the present invention is directed to a first substrate, a plurality of color filters formed on the first substrate, a spacer formed by stacking the plurality of color filters, facing the first substrate A liquid crystal display comprising a second substrate and a liquid crystal layer formed between the first substrate and the second substrate.

In addition, in order to achieve the above-described second object of the present invention, the present invention comprises the steps of forming a spacer by stacking a plurality of color filters on the first substrate, forming a second substrate facing the first substrate And forming a liquid crystal layer between the first substrate and the second substrate.

According to such a liquid crystal display and a manufacturing method thereof, the overcoating layer is not separately formed by forming a spacer using a plurality of color filters. Therefore, the manufacturing process of the liquid crystal display device is simple, the manufacturing cost is reduced, and the transmittance of the liquid crystal display device is improved.

Hereinafter, a liquid crystal display and a method of manufacturing the same according to embodiments of the present invention will be described in detail with reference to the accompanying drawings.

Example 1

1 is a cross-sectional view illustrating a liquid crystal display device according to a first embodiment of the present invention.

Referring to FIG. 1, the liquid crystal display according to the first exemplary embodiment of the present invention includes a liquid crystal layer formed between the first substrate 100, the second substrate 200, and the first substrate 100 and the second substrate 200. 300. 1 illustrates a liquid crystal display having an in-plane switching (IPS) structure, which is a transverse electric field system, but the present invention is not limited thereto.

The first substrate 100 is formed by stacking a plurality of color filters 130 and a plurality of color filters 130 for expressing a predetermined color using light provided from the first transparent substrate 110. Spacer 140.

More specifically, the first transparent substrate 110 is made of a material such as glass, quartz or sapphire that can transmit light.

The black matrix 120, which is a light blocking layer, is formed on an upper surface of the first transparent substrate 110. The black matrix 120 is formed to correspond to the edge regions of the red, green, and blue color filters in the display area of the liquid crystal display, respectively, and is leaked from the plurality of color filters 130. To block. The black matrix 120 is formed in a lattice shape corresponding to the gate line and the data line of the second substrate 200 described later.

One of the first color filter 132a, the second color filter 134a, and the third color filter 136a is positioned in one pixel unit. The spacer 140 is provided on the first transparent substrate 110. The spacer 140 is formed in an area where the edges of two or more color filters overlap among the color filters 130, and are present on the black matrix 120 in this embodiment. The spacer 140 spaces the first substrate 100 and the second substrate 200 at predetermined intervals.

The spacer 140 is formed by stacking a plurality of color filters 130. The spacer located in the center of the spacers shown in the drawings will be described as an example. The first color filter 132b is formed on the black matrix 120, and the second color filter 134a is formed on the first color filter 132b. The second color filter 134a is continuously formed on the first color filter 132b on the black matrix 120 and on the pixel region adjacent thereto. A third color filter 136a is formed on the first color filter 132b formed on the black matrix 120 and on the second color filter 134a formed on the first color filter 132b. The third color filter 136a is continuously formed on the second color filter 134a on the first color filter 132b and on the pixel region adjacent thereto. Therefore, the spacer 140 has a structure in which the first color filter 132b, the second color filter 134a, and the third color filter 136a are stacked in this order.

Since the color filters of the region where the spacer 140 is to be formed are sufficient to have a height that can serve as a spacer, they do not necessarily have to be the same as the step of the color filter of the peripheral pixel region. The height of any one of the color filters constituting the spacer may be lower than the height of the color filter in the pixel region. Accordingly, the height of the first color filter 132b, which is one of the color filters constituting the spacer 140, may be lower than the height of the color filters adjacent to each other. The first color filter 132b may be formed using a mask having a slit on the spacer area at the time of exposure.

In the above description, 132b refers to the first color filter, 134a refers to the second color filter, and 136a refers to the third color filter. As can be seen from the drawings, 134b refers to the first color filter and 136a refers to the second color filter. It will be readily understood by those skilled in the art that 132a may be referred to as a third color filter, 136b may be referred to as a first color filter, 132a may be referred to as a second color filter, and 134a may be referred to as a third color filter.

In general, when spacers are formed separately after the color filters are formed, an overcoating layer must be formed on the color filters because the level difference of each color filter is not constant. However, in the case of forming the spacer 140 by stacking the color filters 130 and forming the color filters 130 as in the present invention, the cell gap can be kept constant without forming the overcoating layer. Therefore, the process of forming the overcoating layer and the subsequent spacer forming process can be omitted, thereby reducing the manufacturing cost.

The spacer 140 may be formed at a position on the first substrate 100 corresponding to a position where the gate line and the data line of the second substrate 200 intersect. In the present exemplary embodiment, since the black matrix 120 is formed on the first substrate 100 in correspondence to the gate line and the data line of the second substrate 200, the spacer 140 is provided on the black matrix 120.

Meanwhile, the second substrate 200 may include a plurality of data lines (not shown) extending in a row direction on the second transparent substrate 210 and a plurality of gate lines extending in a column direction. Not).

In addition, a thin film transistor (TFT) 220 which is a switching element for applying and blocking a voltage to the liquid crystal layer 300 on the second transparent substrate 210 and a common electrode for applying a common voltage to the second substrate 210. 230 and the pixel electrode 240 insulated from the common electrode 230 are formed.

The TFT 220 includes a gate electrode 221 receiving a gate signal, a gate insulating film 222 for protecting the gate electrode 221, an active layer 223 formed on the gate insulating film 222, and an active layer ( 223 includes an ohmic contact layer 224 formed on the top, a source electrode 225 and a drain electrode 226 formed on the ohmic contact layer 224. At this time, a passivation layer 227 is formed on the source electrode 225 and the drain electrode 226 of the TFT 220. A portion of the passivation layer 227 is etched to form a contact hole (not shown) for exposing a portion of the drain electrode 226. The organic insulating layer 250 is formed on the passivation layer 227.

In more detail, the gate electrode 221 is formed to protrude from a gate line to a predetermined area and is made of a conductive metal. As the conductive metal, aluminum (Al), chromium (Cr), molybdenum (Mo), and the like are used, and among these, aluminum (Al) is mainly used.

A gate insulating layer 222 for protecting the gate electrode 221 is provided on the second transparent substrate 210 on which the gate electrode 221 is formed. The gate insulating layer 222 is made of an inorganic insulating material such as silicon oxide or silicon nitride, which has good adhesion with a metal material and suppresses formation of an air layer at an interface.

An active layer 223 made of amorphous silicon and an ohmic contact layer 224 made of n + amorphous silicon are sequentially stacked on the gate insulating layer 222 at a position corresponding to the gate electrode 221. In this case, the ohmic contact layer 224 has a central portion etched to form a channel region. A portion of the active layer 223 is exposed through the channel region.

The source electrode 225 and the drain electrode 226 are disposed on the ohmic contact layer 224 separated into two around the channel region. One end of the source electrode 225 and the drain electrode 226 is in contact with the top surface of the ohmic contact layer 224, and the other end is in contact with the top surface of the gate insulating layer 222.

The source electrode 225 is formed to protrude a predetermined area from a data line formed in a second direction perpendicular to the first direction. The drain electrode 226 is formed spaced apart from the source electrode 225 by a predetermined interval, and a channel region is positioned between the source electrode 225 and the drain electrode 226.

The passivation layer 227 is deposited on the source electrode 225 and the drain electrode 226. The protective film 227 is preferably made of an inorganic insulator such as silicon oxide or silicon nitride, which has good adhesion with a metal material and suppresses formation of an air layer at an interface.

The common electrode 230 is formed on the second transparent substrate 210 with the formation of the gate electrode 221. The pixel electrode 240 is formed on the gate insulating layer 222 and contacts the drain electrode 226 through the contact hole. Accordingly, the pixel electrode 240 is electrically connected to the TFT 220 to apply a signal voltage to the liquid crystal layer 300. The pixel electrode 240 is made of indium tin oxide (ITO) or indium zinc oxide (IZO) made of a transparent conductive material.

Meanwhile, the liquid crystal layer 300 interposed between the first substrate 100 and the first substrate 200 controls the transmittance of the light by using the alignment direction of the liquid crystal molecules.

Hereinafter, a method of manufacturing a liquid crystal display according to a first embodiment of the present invention will be described with reference to the drawings.

2A to 2D are diagrams illustrating a part of a manufacturing method of a liquid crystal display according to a first exemplary embodiment of the present invention in a process order.

Referring to FIG. 2A, a chromium (Cr) film is formed on one surface of the first transparent substrate 110 and a positive photoresist is coated on the chromium (Cr) film. Further, the photoresist is selectively exposed using a predetermined mask and then developed to leave a chromium (Cr) film in a desired area. The chromium (Cr) film thus formed becomes the black matrix 120. The black matrix 120 is formed in a lattice shape on the first transparent substrate 110 to correspond to the gate line and the data line of the array substrate, not shown.

2B to 2D, the plurality of color filters are stacked on the first transparent substrate 110 on which the black matrix 120 is formed, and the plurality of color filters are stacked to form a spacer 140. ).

Referring to FIG. 2B, the first color filter 132a is formed on the pixel region that implements red color, and at the same time, the first color filter 132b is disposed on the black matrix 120, which is a region where spacers spaced apart from the first color filter 132a are to be formed. To form.

More specifically, a photosensitive red photoresist (not shown) is applied onto the first transparent substrate 110 on which the black matrix 120 is formed. The applied red photoresist is then exposed using a mask. The exposed red photoresist is developed to form a first color filter 132.

During exposure, the red photoresist is exposed to remain in the pixel region where the red is to be implemented and the region where the spacer on the first transparent substrate 110 is to be formed. In this case, the shape of the mask of the color filter of the region implementing the pixel and the mask of the region where the spacer is to be formed may be different. Since the color filter of the region where the spacer is to be formed has a height sufficient to serve as a spacer, it is not necessarily the same as the step of the color filter of the peripheral pixel region. The height of any one of the color filters constituting the spacer may be lower than the height of the color filter in the pixel region. Therefore, a mask 20 having a slit on the upper portion of the region where the spacer is to be formed may be used. Since light is transmitted through the slit during exposure, a larger amount of the photoresist in the portion where the slit is present is exposed to the portion where the slit is not present. Then, when the exposed portion is dissolved during development, the height of the photoresist under the slit is lower than that of the unexposed photoresist. The step difference of the first color filter may be adjusted by adjusting the slit gap of the slit mask, thereby adjusting the overall height of the spacer to be formed later.

Referring to FIG. 2C, a second color filter 134a is formed on the pixel region that implements green, and at the same time, a second color filter 134b is formed on the first color filter 132b adjacent thereto.

More specifically, a photosensitive green photoresist (not shown) is applied onto the first transparent substrate 110 on which the first color filter 132 is formed. In the region where the spacer is to be formed, the first color filter 132b having the step difference lowered by the slit mask is present. Therefore, in the region where the spacer is to be formed, the height of the green photoresist is increased by the height of the first color filter 132b compared to the peripheral region. The coated green photoresist is then exposed using a mask. The exposed green photoresist is developed to form a second color filter 134a.

Even when the green photoresist is exposed, the green photoresist is exposed to remain in the pixel region where green is to be realized and the region where spacers on the first transparent substrate are to be formed. Unlike the exposure of the red photoresist, the green photoresist has adjacent pixel regions and regions where spacers are to be formed. When the exposure is performed using a mask in which no slit exists, the height of the color filters existing in the region where the spacer is to be formed is maintained.

Referring to FIG. 2D, a third color filter 136a is formed on the pixel region that implements blue, and at the same time, a third color filter on the first color filter 132b and the second color filter 134b adjacent thereto. 136b is formed.

More specifically, a photosensitive blue photoresist (not shown) is applied onto the first transparent substrate 110 on which the first color filter 132 and the second color filter 134 are formed. As described with reference to FIG. 2C, in the region where the spacer is to be formed, there is a first color filter 132b having a step difference lowered by a slit mask and a second color filter 134c applied on the first color filter 132b. do. Therefore, in the region where the spacer is to be formed, the height of the blue photoresist is increased by the height of the first color filter 132b compared to the peripheral region. The coated blue photoresist is then exposed using a mask. The exposed blue photoresist is developed to form a third color filter 134.

The spacer 140 may be formed by forming the first color filter 132b, the second color filter 134b, and the third color filter 136b on the first transparent substrate 110.

2A to 2D, the shape of the spacer is not illustrated in other spacer regions in order to explain a process of forming the spacer in one region. However, if the above process is applied to other spacer regions, it can be seen that spacers having a shape similar to the spacer 140 of FIG. 2D are formed in all the spacer regions.

In the process of forming the color filter on the first transparent substrate 110, the first color filter 132 is limited to the red filter, the second color filter 134 to the green filter, and the third color filter 134 to the blue filter. It is obvious that the objects of the present invention can be faithfully performed even if the colors of red, green, and blue are mutually changed.

In addition, although the spacer described in detail in FIG. 1 is described as an example, it is obvious that other spacers may be manufactured by the same method.

As shown in FIGS. 2A to 2D, the black matrix 120 is formed on the first transparent substrate 110, and then a plurality of color filters 132, 134, and 136 are formed and the spacers 140 are formed. One substrate 100 can be completed.

Subsequently, a liquid crystal layer is formed between the second substrate and the second substrate, which is not shown, to form a liquid crystal layer between the first substrate and the second substrate.

Example 2

3 is a cross-sectional view of a liquid crystal display according to a second exemplary embodiment of the present invention.

In the first embodiment, the case where the switching element is formed on the substrate facing the substrate on which the color filter is formed has been described. In the second embodiment, the case where the switching element and the color filter are formed on the same substrate will be described as an example. In FIG. 1, the substrate on which the color filter is formed is referred to as the first substrate 100 and the substrate opposite thereto is referred to as the second substrate 200. Accordingly, the substrate on which the color filter is formed is also referred to as a third substrate in FIG. 3. The substrate 400 is referred to as an opposing substrate, and the substrate 400 is referred to as a fourth substrate 500.

In Embodiment 2, members having the same structure as in Embodiment 1 are given the same reference numerals, and detailed description thereof will be omitted.

Referring to FIG. 3, the liquid crystal display according to the second exemplary embodiment of the present invention includes a liquid crystal layer formed between the third substrate 400, the fourth substrate 500, and the third substrate 400 and the fourth substrate 500. And 600. Although FIG. 3 illustrates a liquid crystal display device having a color filter on array (COA) structure proposed to reduce assembly errors between the TFT and the color filter, the present invention is not limited thereto.

The third substrate 400 includes a data line (not shown) and a gate line (not shown) on the first transparent substrate 110. In addition, a thin film transistor (TFT) 220, which is a switching element for applying and blocking a voltage to the liquid crystal layer 600, is formed on the first transparent substrate 110. The TFT 220, the gate electrode 221, the gate insulating film 222, the active layer 223, the ohmic contact layer 224, the source electrode 225, the drain electrode 226 and the protective film 227 are the first embodiment. Since the same as in the description thereof will be omitted.

The spacer 440 is formed on the TFT 220. The spacer 440 is formed in a region where edges of two or more color filters overlap among the plurality of color filters 430. In the present embodiment, the spacer 440 is positioned at the intersection of the data line and the gate line. The spacer 440 separates the first substrate 100 and the second substrate 200 at predetermined intervals.

The spacer 440 is formed by stacking a plurality of color filters 430. The spacer located in the center of the spacers shown in the drawings will be described as an example. The first color filter 432a is successively formed on the TFT 220 and on the pixel region adjacent thereto. The second color filter 434a is continuously formed on the first color filter 432a and on another pixel area adjacent thereto. The third color filter 436b is formed on the second color filter 434a on the first color filter 432a. Accordingly, the spacer 440 has a structure in which the first color filter 432b, the second color filter 434a, and the third color filter 436a are sequentially stacked.

The height of the third color filter 436b, which is one of the color filters constituting the spacer 440, may be lower than the height of adjacent color filters. The third color filter 436b may be formed by using a mask having a slit on the spacer area at the time of exposure.

In the above description, 432a refers to the first color filter, 434a refers to the second color filter, and 436b refers to the third color filter. As can be seen from the drawings, 434a refers to the first color filter and 436a refers to the second color filter. It will be readily understood by those skilled in the art that 432b may be referred to as a third color filter, or 436a may be referred to as a first color filter, 432a may be referred to as a second color filter, and 434b may be referred to as a third color filter.

As in Example 1, the cell gap can be kept constant without forming the overcoating layer. Therefore, the process of forming the overcoating layer and the subsequent spacer forming process can be omitted, thereby reducing the manufacturing cost.

The pixel electrode 240 is disposed on the color filter 430. The pixel electrode 240 contacts the drain electrode 226 through a contact hole. The pixel electrode 240 is not formed in the upper region of the spacer 440.

The fourth substrate 500 is provided on the third substrate 400. The fourth substrate 500 includes a second transparent substrate 210, a black matrix 120 that is a light blocking layer formed on the second transparent substrate 210, and a common electrode 230.

The black matrix 120 is formed on an upper surface of the second transparent substrate 210, and the common electrode 230 is provided on the second transparent substrate 210 on which the black matrix 120 is formed. Since the black matrix 120 is the same as described in Embodiment 1, description thereof will be omitted.

Meanwhile, the liquid crystal layer 600 interposed between the third substrate 400 and the fourth substrate 500 has a continuous arrangement direction of liquid crystal molecules with respect to the third substrate 400 and the fourth substrate 500. It is preferably formed of a twisted nematic liquid crystal 90 °. The liquid crystal layer 600 adjusts the transmittance of the light by using the alignment direction of the liquid crystal molecules.

When the third substrate 400 and the fourth substrate 500 are combined, the color filter 430 and the common electrode 230 are coupled to face each other.

Since a process of forming a spacer separately after forming the color filter is not required, an overcoating film for removing a step between the color filters is not necessary. Therefore, the manufacturing process of the liquid crystal display device is simplified, and the decrease in transmittance due to the overcoating film can be eliminated. On the other hand, since the spacer is formed in the middle of forming the color filter without separately preparing a mask for forming the spacer, the manufacturing cost can be reduced.

Hereinafter, a method of manufacturing a liquid crystal display according to a second exemplary embodiment of the present invention will be described with reference to the drawings.

4A to 4D are diagrams illustrating a part of a manufacturing method of a liquid crystal display according to a second exemplary embodiment of the present invention in the order of process.

Referring to FIG. 4A, a gate electrode 221, a gate insulating layer 222, an active layer 223, an ohmic contact layer 224, a source electrode 225, and a drain electrode 226 are formed on the first transparent substrate 110. After forming the TFT 220, which is a switching element including the (), a passivation layer 227 is formed on the source electrode 225 and the drain electrode 226.

4B to 4D, the plurality of color filters are stacked while the plurality of color filters 432, 434, and 436 are formed on the first transparent substrate 110 on which the TFT 220 and the protective film 227 are formed. To form a spacer 440.

Referring to FIG. 4B, a first color filter 432a is formed on the TFT 220, which is a region adjacent to the pixel region and the spacer for implementing red.

More specifically, a photosensitive red photoresist (not shown) is applied onto the first transparent substrate 110 on which the TFT 220 and the protective film 227 are formed. The applied red photoresist is then exposed using a mask. In exposure, the red photoresist is exposed to remain in the pixel region where red is to be implemented and the region adjacent to where the spacer is to be formed. As shown in FIG. 4B, the two regions are continuous. The exposed red photoresist is developed to form a first color filter 432a.

Referring to FIG. 4C, a second color filter 434a is formed on the TFT 220, which is a region adjacent to where the pixel region and the spacer to implement green are formed.

More specifically, a photosensitive green photoresist (not shown) is applied onto the first transparent substrate 110 on which the first color filter 432a is formed. The coated green photoresist is then exposed using a mask. In exposure, the green photoresist is exposed to remain in the pixel region where green is to be realized and the region adjacent to where the spacer is to be formed. As shown in FIG. 4C, the two regions are continuous. Since the first color filter 432a exists in the region where the spacer is to be formed, the overall height of the stacked photoresists is increased by the height of the first color filter 432a compared to the peripheral region.

The exposed green photoresist is developed to form a second color filter 434.

Referring to FIG. 4D, a third color filter 436a is formed on a pixel area that implements blue, and at the same time, on the first color filter 432 and the second color filter 434, which are areas in which a spacer is to be formed. The third color filter 436b is formed.

More specifically, a photosensitive blue photoresist (not shown) is applied onto the first transparent substrate 110 on which the first color filter 432 and the second color filter 434 are formed. The first color filter 432a and the second color filter 434a exist in the region where the spacer is to be formed. Therefore, in the region where the spacer is to be formed, the overall height of the stacked photoresists is as high as the height of the first color filter 432a compared to the peripheral region.

The coated blue photoresist is then exposed using a mask. During exposure, the blue photoresist is exposed to remain in the pixel area where blue is to be implemented and the area where spacers on the first transparent substrate are to be formed. In this case, the shape of the mask of the color filter of the region implementing the pixel and the mask of the region where the spacer is to be formed may be different. Since the color filter of the region where the spacer is to be formed has a height sufficient to serve as a spacer, it is not necessarily the same as the step of the color filter of the peripheral pixel region. The height of any one of the color filters constituting the spacer may be lower than the height of the color filter in the pixel region. Therefore, a mask 40 having a slit on the upper portion of the region where the spacer is to be formed may be used. Since light is transmitted through the slit during exposure, a larger amount of the photoresist in the portion where the slit is present is exposed to the portion where the slit is not present. Then, when the exposed portion is dissolved during development, the height of the photoresist under the slit is lower than that of the unexposed photoresist. The step difference of the first color filter may be adjusted by adjusting the slit gap of the slit mask, thereby adjusting the overall height of the spacer to be formed later.

The exposed blue photoresist is developed to form a third color filter 436b.

As described above, the spacer 440 may be formed by stacking a plurality of color filters on the first transparent substrate.

4A to 4D, the shape of the spacer is not illustrated in other spacer regions to explain a process of forming the spacer in one region. However, if the above process is applied to other spacer regions, it can be seen that spacers having a shape similar to the spacer 440 of FIG. 4D are formed in all spacer regions.

In the process of forming the color filter on the first transparent substrate 110, the red 432, the green 434, and the blue 436 need not be formed in the above order, which is formed first and the other is formed later. Even if it is obvious that the object of the present invention can be fulfilled.

In addition, although the spacer described in detail in FIG. 3 is described as an example, it is obvious that other spacers may be manufactured by the same method.

Although not shown, after forming the spacer 440, the pixel electrode is formed on the first transparent substrate 110 except for the upper portion of the spacer 440. The pixel electrode is formed to be as close to the spacer as possible to reduce the aperture ratio.

As described above, after the TFT 220 is formed on the first transparent substrate 110, the spacer 440 is formed simultaneously with the plurality of color filters 430, and the pixel electrode is formed to form the third substrate ( 400) can be completed.

Subsequently, a liquid crystal layer is formed between the fourth substrate and the fourth substrate, which is not shown, to form a liquid crystal layer between the third substrate and the fourth substrate.

As described above, according to the present invention, since a process of forming a spacer separately after forming the color filter is not required, an overcoating film for removing a step between the color filters is not necessary. Therefore, the manufacturing process of the liquid crystal display device is simplified, and the decrease in transmittance due to the overcoating film can be eliminated. On the other hand, since the spacer is formed in the middle of forming the color filter without separately preparing a mask for forming the spacer, the manufacturing cost can be reduced.

Although described with reference to the embodiments above, those skilled in the art will understand that the present invention can be variously modified and changed without departing from the spirit and scope of the invention as set forth in the claims below. Could be.

1 is a cross-sectional view illustrating a liquid crystal display device according to a first embodiment of the present invention.

2A to 2D are diagrams illustrating a part of a manufacturing method of a liquid crystal display according to a first exemplary embodiment of the present invention in a process order.

3 is a cross-sectional view of a liquid crystal display according to a second exemplary embodiment of the present invention.

4A to 4D are diagrams illustrating a part of a manufacturing method of a liquid crystal display according to a second exemplary embodiment of the present invention in the order of process.

<Description of the symbols for the main parts of the drawings>

100, 200, 400, 500: substrate

110: first transparent substrate 120: black matrix

130, 430: color filter 140, 440: spacer

210: second transparent substrate 220: switching element

221: gate electrode 222: gate insulating film

223: active layer 224: ohmic contact layer

225: source electrode 226: drain electrode

227: protective film 230: common electrode

240: pixel electrode 250: organic insulating film

300, 600: liquid crystal

Claims (13)

A first substrate; A plurality of color filters formed on the first substrate; A spacer formed by stacking the plurality of color filters; A second substrate facing the first substrate; And And a liquid crystal layer formed between the first substrate and the second substrate. The liquid crystal display device according to claim 1, wherein the spacers include the same color filters as the color filters on adjacent pixel areas. The liquid crystal display device according to claim 1, wherein the spacers include the same color filters as the color filters on other pixel areas spaced apart from each other with adjacent pixel areas therebetween. The liquid crystal display of claim 3, wherein the same color filter as the color filter on the other pixel area spaced apart from each other with the adjacent pixel area interposed therebetween is lower than the color filters on the adjacent pixel area. The liquid crystal display device according to claim 4, wherein a color filter having a height lower than that of color filters on adjacent pixel areas is formed by a mask having a slit. The liquid crystal display device of claim 1, wherein a light blocking layer is formed between the spacer and the first substrate, and a common electrode and a pixel electrode are formed on the second substrate. The liquid crystal display device according to claim 1, wherein a switching element is formed on the first substrate, and a light shielding layer is formed on the second substrate. Stacking a plurality of color filters on the first substrate to form a spacer; Forming a second substrate opposite the first substrate; And Forming a liquid crystal layer between the first substrate and the second substrate. The method of claim 8, wherein forming the spacers Applying a photoresist for color filters to a region where a spacer on the first substrate is to be formed; Exposing the applied photoresist using a mask; And And developing the exposed photoresist. 10. The liquid crystal display of claim 8, wherein the forming of the spacers includes forming a same color filter on the region where the spacers on the first substrate are to be formed, the same color filter on the adjacent pixel region. Method of manufacturing the device. The method of claim 8, wherein the forming of the spacer comprises: forming the same color filter in the region where the spacer on the first substrate is to be formed, the same as the color filter on the other pixel region spaced apart by the adjacent pixel region. The manufacturing method of the liquid crystal display device characterized by including. 12. The method of claim 11, wherein when forming the same color filter as the color filter on another pixel region spaced apart by the adjacent pixel region, the height of the color filter on the region where the spacer is to be formed It forms lower than height, The manufacturing method of the liquid crystal display device characterized by the above-mentioned. The method of manufacturing a liquid crystal display device according to claim 12, wherein the formation of the color filter lower than the height of the color filters on the adjacent pixel area is performed by using a mask having a slit in the spacer upper area.