JPH10177110A - Color filer and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color filter provided with columnar projecting parts having heights sufficient for setting the thickness of a liquid crystal layer, and a process for producing the color filter. SOLUTION: The plural columnar projecting parts 6 formed on the black matrices 3 of the color filter 1 are formed to have a structure obtd. by laminating a plurality of laminated composed of oxygen barrier layers 8a to 8c and colored layers 5 or laminates composed of resist layers and the colored layers 5. The oxygen barrier layers 8a to 8c or the resist layers are formed by curing the photosensitive oxygen barrier layers 8a to 8c or photosensitive resist layers remaining on the black matrices in a stage for forming the colored layers 5.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a color filter and a method of manufacturing the same, and more particularly to a color filter capable of manufacturing a color liquid crystal display device having excellent display quality and a method of manufacturing the same.

[0002]

2. Description of the Related Art In recent years, color liquid crystal display devices have attracted attention as flat displays. In general, a color liquid crystal display device includes a color filter including a black matrix and a coloring layer including a plurality of colors (usually, three primary colors of red (R), green (G), and blue (B)); ), And are bonded together with a predetermined gap, and a liquid crystal material is injected into the gap. Therefore, the gap is the thickness of the liquid crystal layer itself. If the thickness of the liquid crystal layer is uneven, unevenness in brightness and color occurs in the color liquid crystal display device, and display quality is significantly impaired. Is desirably as uniform as possible.

Conventionally, as a method of determining the thickness of a liquid crystal layer in a color liquid crystal display device, a color filter and a TFT are used.
Glass beads and plastic beads are used as spacers when bonding to the array substrate. That is, before bonding the color filter and the TFT array substrate, glass beads or plastic beads having a predetermined diameter and uniform particle size are scattered as a spacer on one of the color filter and the TFT array, and thereafter,
The two substrates are bonded together, and the size of the gap between the two substrates, that is, the thickness of the liquid crystal layer is determined by the diameter of the glass beads or plastic beads.

[0004]

However, the above-described method of forming the gap between the color filter and the TFT array substrate has the following problems in the operation of the color liquid crystal display device.

First, in the case where glass beads or plastic beads are used as spacers, if the density dispersed on the substrate surface is appropriate and the particles are not evenly dispersed on the substrate surface, the entire color liquid crystal display device is covered. A gap having a uniform size is not formed. In general, when the scattered amount (density) of the spacer is increased, the variation in the thickness of the gap portion is reduced, but when the scattered amount (density) is increased, the number of spacers present on the display pixel portion is also increased.
The area of the display area is reduced. That is, the portion where the spacer is present becomes invalid as a display area, and there is a disadvantage that the aperture ratio is reduced.

In addition, glass beads and plastic beads are apt to agglomerate, have a poor degree of dispersion when dispersed, and are unevenly distributed. There is also a problem that unevenly distributed portions located in the pixel region hinder the alignment of liquid crystal molecules. Further, since glass beads or plastic beads existing in the pixel region transmit light when black display is performed, there is a problem that these spacers serve as luminescent spots to significantly lower the contrast ratio.

In order to solve such a problem, there has been proposed a method of forming a convex portion for determining a gap (the thickness of a liquid crystal layer) in a color filter in advance. In this method, at the same time as the formation of the colored layer, a colored layer is formed at a plurality of predetermined locations on the black matrix to form a convex portion in which three colored layers of R, G, and B are laminated. The two substrates are bonded together using the convex portions as spacers.

[0008] However, the height of the projections of the three colors R, G, and B is insufficient as a spacer due to the thickness limitation due to the light transmittance of the colored layer. When a metal thin film such as chromium is used as the matrix, there is a problem that a required thickness of the liquid crystal layer cannot be obtained.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and a color filter having a columnar convex portion having a sufficient height for setting the thickness of a liquid crystal layer, and a method of manufacturing this color filter. The aim is to provide a method.

[0010]

In order to achieve the above object, a first invention of a color filter comprises a substrate, a black matrix formed in a predetermined pattern on the substrate, and a color filter comprising a plurality of colors. And a plurality of columnar protrusions on the black matrix, and the columnar protrusions were configured such that a plurality of stacked bodies of an oxygen barrier layer and a colored layer were stacked.

The first method of manufacturing a color filter is described below.
In the invention, a photosensitive resin layer containing a coloring material of a predetermined color is formed on a substrate provided with a black matrix of a predetermined pattern, and further, a negative photosensitive oxygen blocking layer is formed on the photosensitive resin layer. Then, by exposing and developing the oxygen blocking layer and the photosensitive resin layer in a predetermined pattern,
A colored layer forming region of a predetermined color in a black matrix non-forming region on a substrate, and an operation of forming a layered structure of a colored layer and an oxygen blocking layer in a columnar convex portion forming region on the black matrix and then curing the colored layer, The configuration was such that a process was repeated for the number of colors of the layers.

According to a second aspect of the present invention, there is provided a method of manufacturing a color filter, comprising forming a photosensitive resin layer in a photosensitive wavelength region A containing a coloring material of a predetermined color on a substrate provided with a black matrix having a predetermined pattern; Forming a photosensitive oxygen blocking layer having a photosensitive wavelength range B different from the photosensitive wavelength range A on the photosensitive resin layer, and thereafter forming the photosensitive oxygen blocking layer and the photosensitive resin layer into a colored layer forming mask. Exposure with light in the wavelength range A using, and then developing and exposing the photosensitive oxygen blocking layer and the photosensitive resin layer with light in the wavelength range B using a mask for forming columnar convex portions, An operation of forming a colored layer in a colored layer forming region of a predetermined color in a black matrix non-forming region on a substrate, forming a colored layer and an oxygen blocking layer in a columnar convex portion forming region on the black matrix, and then curing the laminate. The number of colors of the colored layer Ri return was configured as a step.

According to a second aspect of the present invention, there is provided a color filter comprising: a substrate;
A black matrix formed in a predetermined pattern on the substrate and a colored layer having a plurality of colors are provided, and a plurality of columnar protrusions are provided on the black matrix, and the columnar protrusions include a resist layer and a coloring layer. Of a plurality of laminates were laminated.

The third method of manufacturing a color filter is described below.
The invention is to form a colored resin layer containing a coloring material of a predetermined color on a substrate provided with a black matrix of a predetermined pattern, further form a positive photosensitive resist layer on the coloring resin layer, The photosensitive resist layer is exposed and developed in a predetermined pattern, and the exposed colored resin layer is removed by etching, whereby a colored layer forming region of a predetermined color in a black matrix non-forming region on the substrate, Form a laminate of a colored layer and a photosensitive resist layer in the columnar convex portion formation region on the matrix, and then remove the photosensitive resist layer of the laminate formed in the colored layer formation region to expose the colored layer, The operation of curing the photosensitive resist layer of the laminated body formed in the columnar convex portion forming region to form a resist layer,
The configuration was such that it had a step of repeating for the number of colors of the coloring layer.

According to a fourth aspect of the present invention, there is provided a method of manufacturing a color filter, comprising: forming a colored resin layer containing a coloring material of a predetermined color on a substrate having a black matrix of a predetermined pattern; A negative type photosensitive resist layer is formed on the substrate, and thereafter, the photosensitive resist layer is exposed and developed in a predetermined pattern, and the exposed colored resin layer is removed by etching, thereby forming a black matrix non-formed area on the substrate. Forming a layered structure of a colored layer and a photosensitive resist layer in a colored layer forming region of a predetermined color and a columnar convex portion forming region on the black matrix, and curing the photosensitive resist layer to form a resist layer Is repeated for the number of colors of the colored layer.

According to the present invention, the plurality of columnar projections formed on the black matrix are formed by laminating the same number of oxygen blocking layers or resist layers as the colored layers in addition to the colored layers of a plurality of colors. Therefore, the columnar protrusion has a sufficient height for setting the thickness of the liquid crystal layer, and when the color filter is bonded to the TFT array substrate, the columnar protrusion is located between the color filter and the TFT array substrate. A gap for a liquid crystal layer is formed with high precision.

[0017]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The preferred embodiments of the present invention will be described below with reference to the drawings. Color filter First Embodiment FIG. 1 of the first invention is a partial plan view showing an embodiment of the first aspect of the color filter, in FIG. 2 A-A line of a color filter shown in FIG. 1 It is a longitudinal cross-sectional view. 1 and 2, a color filter 1 according to the first invention includes a substrate 2,
A black matrix 3 formed on the substrate 2 in a predetermined pattern (a pattern indicated by oblique lines in FIG. 1)
A colored layer 5 is provided, and a plurality of (five in FIG. 1) columnar convex portions 6 are provided at predetermined locations on the black matrix 3.

The colored layer 5 is formed by arranging a red pattern 5R, a green pattern 5G and a blue pattern 5B in a desired pattern shape. The black matrix 3 is formed between the display pixel portions composed of the colored patterns and the formation of the colored layer 5. It is provided outside the area. Each colored pattern 5R, 5
G and 5B, the transparent oxygen blocking layers 8a and 8
b, 8c are stacked.

The color filter 1 according to the first aspect of the present invention includes a columnar convex portion 6 on which laminates 6R, 6G, and 6B are laminated. Each of the laminates 6R, 6G, and 6B has a color layer 7R, 7G, and 7B and an oxygen. It is characterized in that the blocking layers 8a, 8b, 8c are laminated. The columnar protrusions 6 protrude from the black matrix 3 and the colored layer 5 in a range of about 2 to 10 μm, and the amount of protrusion can be appropriately set from the thickness required for the liquid crystal layer of the color liquid crystal display device. . The formation density of the columnar protrusions 6 can be appropriately set in consideration of the thickness unevenness of the liquid crystal layer, the aperture ratio, and the like.
Red pattern 5R and green pattern 5 constituting the colored layer 5
A necessary and sufficient spacer function is expressed in one set of the G and blue patterns 5B. Such columnar projections 6
Is a columnar shape in the illustrated example, but is not limited thereto, and may be a prismatic shape, a truncated pyramid shape, or the like.

When the color filter 1 of the present invention having the columnar projections 6 is bonded to a TFT array substrate, the columnar projections 6 form a gap between the color filter 1 and the TFT array substrate. For this reason, the gap accuracy between the two substrates is extremely high as compared with the case where glass beads or plastic beads are used as conventional spacers. Further, since the columnar convex portions 6 do not exist in the pixel portion, the aperture ratio does not decrease due to the decrease in the area of the display region, and since the columnar convex portions 6 have a light shielding property, the contrast ratio does not decrease. .

Substrate 2 constituting color filter 1
For example, a rigid material having no flexibility such as quartz glass, Pyrex glass, or a synthetic quartz plate, or a flexible material having flexibility such as a transparent resin film or an optical resin plate can be used. Among them, especially Corning 7
059 glass is a material having a low coefficient of thermal expansion, excellent in dimensional stability and workability in high-temperature heat treatment, and is a non-alkali glass containing no alkali component in the glass. Suitable for display devices.

The black matrix 3 constituting the color filter 1 is formed by forming a metal thin film of chromium or the like having a thickness of about 1000 to 2000 ° by sputtering, vacuum evaporation, or the like, and patterning this thin film. Forming a resin layer such as acrylic resin or epoxy resin containing light-shielding particles such as fine particles, and patterning this resin layer, forming a photosensitive resin layer containing light-shielding particles such as carbon fine particles. The photosensitive resin layer may be formed by patterning the photosensitive resin layer.

A laminate 6 of a colored layer 5 and a columnar convex portion 6
The colored layers 7R, 7G, 7B constituting R, 6G, 6B are:
It can be formed by a pigment dispersion method using an oxidation polymerization type photosensitive resin containing a desired coloring material. The thickness of each of the coloring layers 7R, 7G, and 7B is determined by the red pattern 5R, the green pattern 5G, and the blue pattern 5B of the coloring layer 5.
May be equal to, for example, about 1 to 3 μm.

The laminated bodies 6R, 6G, 6
The oxygen blocking layers 8a, 8b, 8c constituting B
Of the oxygen blocking layers 8a, 8b and 8c are formed by using a negative photosensitive resin having an oxygen barrier property among the photosensitive resins used in the formation of the colored layer 5. The thickness is such that the oxygen blocking effect can be exerted so that oxygen does not adversely affect the oxidative polymerization type photosensitive resin, and the height required for the columnar projections 6 and the color layer 7
The thickness can be set in consideration of the thickness of each layer of R, 7G, and 7B, and can be, for example, about 0.5 to 2 μm. The first invention of the method for producing a color filter Next, embodiments of the first aspect of the manufacturing method of the color filter, with reference to FIG. 3 as an example a color filter 1 shown in FIGS. 1 and 2 described I do.

In the first invention of the color filter manufacturing method, first, a red coloring material is coated on a substrate 2 having a black matrix 3 formed in a predetermined pattern (a pattern shown by oblique lines in FIG. 1). A red photosensitive resin layer 5′R is formed, and a negative photosensitive oxygen blocking layer 8′a is formed on the red photosensitive resin layer 5′R.
(A)). In the illustrated example, the negative type red photosensitive resin layer 5 '
The case where R is used will be described.

Next, the red photosensitive resin layer 5'R and the photosensitive oxygen blocking layer 8'a are interposed via a predetermined photomask M.
Is exposed (FIG. 3B). The photomask M used for this exposure includes a light transmitting portion m for exposing a region where the red pattern 5R is formed in a region where the black matrix 3 is not formed, and a light transmitting portion m for exposing a region where the columnar convex portion 6 is formed. M ′. Next, by performing development, a laminate of the red pattern 5R and the oxygen blocking layer 8'a is formed in the red pattern formation region on the substrate 2, and the red projection is formed in the columnar projection formation region on the black matrix 3. A laminate 6R including the coloring layer 7R and the oxygen blocking layer 8'a is formed. Then, by curing each layer, the red pattern 5R on which the transparent oxygen blocking layer 8a is laminated, and the laminate 6R of the red coloring layer 7R and the oxygen blocking layer 8a are
It is formed on (FIG. 3C).

Hereinafter, the same operation is repeated to form a green pattern 5G in which the transparent oxygen blocking layer 8b is laminated on the green pattern forming region on the substrate 2, and to form a green pattern 5G on the laminate 6R for the columnar convex portion 6. Green colored layer 7G and oxygen blocking layer 8b
And a blue pattern 5B on which a transparent oxygen blocking layer 8c is laminated in a blue pattern forming region on the substrate 2 and a blue color on the laminate 6G for the columnar protrusions 6. A laminate 6B including the coloring layer 8B and the oxygen blocking layer 8c is laminated. Thereby, the red pattern 5
R, a green layer 5G and a blue layer 5B are formed, and at the same time, the black matrix 3 is formed.
The columnar protrusions 6 in which the laminates 6R, 6G, and 6B are stacked are formed in the upper columnar protrusion formation region, and the color filter 1 of the present invention is obtained (FIG. 3D). Next, a color filter according to a second embodiment of the first invention will be described. FIG. 4 is a partial plan view showing the color filter of the present invention, and FIG. 5 is a longitudinal sectional view of the color filter shown in FIG. 4 and 6
In the first aspect, the color filter 11 of the first invention
2 and a black matrix 13 and a colored layer 15 formed in a predetermined pattern (a pattern shown by oblique lines in FIG. 4) on the substrate 12. In FIG. 4, five columnar projections 16 are provided.

The colored layer 15 has a red pattern 15R, a green pattern 15G and a blue pattern 15B arranged in a desired pattern shape.
Are provided between the display pixel portions composed of the respective colored patterns and outside the region where the colored layer 15 is formed.

The color filter 11 of the first invention includes a columnar convex portion 16 on which laminated bodies 16R, 16G, and 16B are laminated. Each laminated body 16R, 16G, and 16B has a colored layer 17A.
R, 17G, 17B and oxygen barrier layers 18a, 18b, 18
c is laminated. The columnar protrusions 16 protrude from the black matrix 13 and the colored layer 15 in a range of about 2 to 10 μm, and the amount of protrusion can be appropriately set from the thickness required for the liquid crystal layer of the color liquid crystal display device. . In addition, the columnar projections 16
Can be appropriately set in consideration of the thickness unevenness, the aperture ratio, and the like of the liquid crystal layer. For example, one density is set for one set of the red pattern 15R, the green pattern 15G, and the blue pattern 15B constituting the colored layer 15. A necessary and sufficient spacer function is expressed at the ratio of the number. The shape of the columnar convex portion 16 is a columnar shape in the illustrated example, but is not limited thereto, and may be a prismatic shape, a truncated pyramid shape, or the like.

When the color filter 11 of the present invention having the columnar projections 16 is bonded to a TFT array substrate, the columnar projections 16 form a gap between the color filter 1 and the TFT array substrate. For this reason, the gap accuracy between the two substrates is extremely high as compared with the case where glass beads or plastic beads are used as conventional spacers. Further, since the columnar convex portions 16 do not exist in the pixel portion, the aperture ratio does not decrease due to the decrease in the area of the display region, and since the columnar convex portions 16 have a light shielding property, the contrast ratio does not decrease. .

As the substrate 12 forming the color filter 11, the same material as the substrate 2 forming the color filter 1 can be used.

The black matrix 13 forming the color filter 11 is similar to the black matrix 3 forming the color filter 1 described above.

The colored layer 15 and the colored layers 17R, 1R constituting the laminated bodies 16R, 16G, 16B of the columnar convex portions 16 are formed.
7G and 17B are photosensitive wavelength regions A containing a desired coloring material.
Can be formed by a pigment dispersion method using the above photosensitive resin. Examples of the colored photosensitive resin material to be used include, for example, an initiator (Irgacure 184, 6 manufactured by Ciba Geigy).
Mixture of acrylate-based polymer containing 50, 500, etc.) and monomer (photosensitive wavelength range A is 300 nm or less)
And the like. Colored layers 17R, 17G, 17
The thickness of each layer of B is the red pattern 15R of the colored layer 15,
The thickness may be equal to the thickness of the green pattern 15G and the blue pattern 15B, for example, about 1 to 3 μm.

Also, the laminates 16R and 16R of the columnar convex portions 16 are formed.
G, 16B, oxygen barrier layers 18a, 18b, 18
c is obtained by curing a photosensitive oxygen blocking layer having a photosensitive wavelength range B different from the photosensitive wavelength range A, and the thickness of each of the oxygen blocking layers 18a, 18b, and 18c is set in the formation of the colored layer 15. It is a thickness capable of exhibiting an oxygen blocking effect so that oxygen does not adversely affect the oxidative polymerization type photosensitive resin.
The thickness can be set in consideration of the thickness of each layer of R, 17G, and 17B, and can be, for example, about 0.5 to 2 μm. The above photosensitive oxygen blocking layer uses, for example, a photosensitive oxygen blocking material having a photosensitive wavelength range B of 330 nm or more, such as a resin in which a styrylpyridinium group, stilbazole salt, or the like is pendant to polyvinyl alcohol, an acrylate copolymer, or the like. Can be formed. Second Embodiment of Color Filter Manufacturing Method Next, a second embodiment of the color filter manufacturing method will be described with reference to FIG. 6 taking the color filter 11 shown in FIGS. 4 and 5 as an example. I do.

In the second invention of the color filter manufacturing method, first, a red coloring material is coated on a substrate 12 provided with a black matrix 13 formed in a predetermined pattern (a pattern shown by oblique lines in FIG. 4). Included photosensitive wavelength range A
(For example, 300 nm or less) red photosensitive resin layer 15 ′
R is formed, and a photosensitive oxygen blocking layer 18'a of a photosensitive wavelength range B (different from the photosensitive wavelength range A) is formed on the red photosensitive resin layer 15'R (FIG. 6A). In the illustrated example, a case where a negative red photosensitive resin layer 15'R and a photosensitive oxygen blocking layer 18'a are used will be described.

Next, the red photosensitive resin layer 15'R and the photosensitive oxygen blocking layer 18'a are exposed through a predetermined photomask M for forming a colored layer (FIG. 6B). This exposure is performed by light in the photosensitive wavelength range A of the red photosensitive resin layer 15′R,
For example, the irradiation is performed using light of a wavelength of 300 nm or less using a low-pressure mercury lamp as a light source. Also, the photomask M used for the exposure
Is a light transmitting portion m for exposing the formation region of the red pattern 15R in the non-formation region of the black matrix 13 and a light for exposing the formation region of the columnar protrusion 16 in the non-formation region of the black matrix 13. And a transmission part m ′.

Next, the red photosensitive resin layer 15'R and the photosensitive oxygen blocking layer 18'a are exposed through a predetermined photomask N for forming columnar convex portions (FIG. 6C). . This exposure is performed using light in the photosensitive wavelength range B of the photosensitive oxygen blocking layer 18'a, for example, light using a high-pressure mercury lamp as a light source.
The photomask N used for the exposure has a light transmitting portion n ′ for exposing a region where the columnar convex portion 16 on the black matrix 13 is formed.

Next, by performing development, a red pattern 15R is formed in the red pattern forming region on the substrate 12, and the red coloring layer 17R and the oxygen blocking layer 18 are formed in the columnar convex forming region on the black matrix 13. A laminate 16R made of 'a is formed (FIG. 6D). After that, the red pattern 15R and the red coloring layer 17R are cured, and the oxygen blocking layer 18'a is cured to form the oxygen blocking layer 18a.

Hereinafter, by repeating the same operation,
The green pattern 15 is formed in the green pattern forming area on the substrate 12.
G, and a laminate 16R for the columnar protrusion 16
A laminate 16G including a green coloring layer 17G and an oxygen blocking layer 18b is laminated thereon, and further, a blue pattern 15B is formed in a blue pattern formation region on the substrate 12, and a laminate 16G for the columnar convex portion 16 is formed on the laminate 16G. A laminate 16B including the blue coloring layer 18B and the oxygen blocking layer 18c is laminated. Thereby, the colored layer 15 including the red pattern 15R, the green pattern 15G, and the blue pattern 15B is formed,
At the same time, the columnar convex portions 16 in which the laminates 16R, 16G, and 16B are laminated are formed in the columnar convex portion forming regions on the black matrix 13, and the color filter 11 of the present invention is obtained (FIG. 6E). The color filter of the second aspect of the present invention (First Embodiment) Next, an embodiment of the second invention of a color filter. FIG. 7 is a partial plan view showing an embodiment of the color filter of the present invention, and FIG. 8 is a longitudinal sectional view taken along line CC of the color filter shown in FIG. 7 and 8, a color filter 21 according to the second invention includes a substrate 22, a black matrix 23 formed on the substrate 22 in a predetermined pattern (a pattern shown by oblique lines in FIG. 7), A plurality of layers (five in FIG. 7) at predetermined positions on the black matrix 23.
Is provided.

The colored layer 25 has a red pattern 25R, a green pattern 25G, and a blue pattern 25B arranged in a desired pattern shape.
Are provided between the display pixel portions made of the respective colored patterns and outside the region where the colored layer 25 is formed.

The color filter 21 according to the second aspect of the present invention includes a columnar convex portion 26 on which laminated bodies 26R, 26G, and 26B are laminated. Each of the laminated bodies 26R, 26G, and 26B has a colored layer 27.
R, 27G, 27B and resist layers 28a, 28b, 28
and c is a laminate. This columnar projection 2
6 protrudes from the black matrix 23 and the colored layer 25 in a range of about 2 to 10 μm, and the amount of protrusion can be appropriately set based on the thickness required for the liquid crystal layer of the color liquid crystal display device. The formation density of the columnar protrusions 26 can be appropriately set in consideration of the thickness unevenness of the liquid crystal layer, the aperture ratio, and the like. For example, the red pattern 25R, the green pattern 25G, and the blue pattern One set of 25B expresses a necessary and sufficient spacer function. The shape of the columnar convex portion 26 is a columnar shape in the illustrated example, but is not limited thereto, and may be a prismatic shape, a truncated pyramid shape, or the like.

When the color filter 21 having the columnar projections 26 is bonded to a TFT array substrate, the columnar projections 26 form a gap between the color filter 21 and the TFT array substrate. For this reason, the gap accuracy between the two substrates is extremely high as compared with the case where glass beads or plastic beads are used as conventional spacers. Further, since the columnar convex portions 26 do not exist in the pixel portion, the aperture ratio does not decrease due to the decrease in the area of the display region, and since the columnar convex portions 26 have a light shielding property, the contrast ratio does not decrease. .

As the substrate 22 forming the color filter 21, the same material as the substrate 2 forming the color filter 1 can be used.

The black matrix 23 forming the color filter 21 is the same as the black matrix 3 forming the color filter 1 described above.

The colored layer 25 and the colored layers 27R, 2R constituting the laminates 26R, 26G, 26B of the columnar convex portions 26 are formed.
7G and 27B can be formed by a pigment dispersion method using a coloring resin in which a desired coloring material is contained in a resin such as a polyimide resin, an acrylic resin, or an epoxy resin.
The thickness of each of the coloring layers 27R, 27G, and 27B may be equal to the thickness of the red pattern 25R, the green pattern 25G, and the blue pattern 25B of the coloring layer 25, and may be, for example, about 1 to 3 μm.

The laminates 26R, 26G, 2
6B, the resist layers 28a, 28b, 28c
It is formed using a positive photosensitive resin among the photosensitive resins used in the formation of the above-described colored layer 5,
The thickness can be set in consideration of the height required for the columnar convex portions 26, the thicknesses of the red pattern 25R, the green pattern 25G, and the blue pattern 25B of the colored layer 25.
It can be about 5 to 2 μm. Third Embodiment of Color Filter Manufacturing Method Next, a third embodiment of a color filter manufacturing method according to the present invention will be described with reference to FIG. 7 and FIG.
1 will be described as an example with reference to FIG.

In the third invention of the color filter manufacturing method, first, a red coloring material is coated on a substrate 22 having a black matrix 23 formed in a predetermined pattern (a pattern shown by oblique lines in FIG. 7). Red resin layer 2 contained
5'R is formed, and a positive photosensitive resist 28'a is formed on the red resin layer 25'R (FIG. 9A).

Next, the photosensitive resist layer 28'a is exposed through a predetermined photomask M (FIG. 9).
(B)). The photomask M used for this exposure is a red pattern 2 in a region where the black matrix 23 is not formed.
A light shielding portion m for preventing exposure of the formation region of 5R and a light shielding portion m for preventing exposure of the formation region of the columnar convex portion 26.
'. Next, by performing development, a pattern of a resist layer is formed in the red pattern forming region and the columnar convex portion forming region on the red resin layer 25′R, and the red resin layer 25′R is etched using the resist layer as a mask. . As a result, a laminate of the red pattern 25R and the resist layer 28'a is formed in the red pattern formation region on the substrate 22, and the red coloring layer 27R and the resist layer are formed in the columnar projection formation region on the black matrix 23. 2
9A is formed.
(C)). Thereafter, the red pattern 25R is formed using a photomask capable of exposing only the formation region of the red pattern 25R.
The red pattern 25R is exposed by exposing and developing the upper resist layer 28'a to remove it. Next, the red pattern 25R and the red coloring layer 27R are cured, and
The resist layer 28'a of the laminate 26R is cured to form a resist layer 28a (FIG. 9D).

Hereinafter, by repeating the same operation,
The green pattern 25 is formed in the green pattern forming area on the substrate 22.
G, and a laminate 26R for the columnar projection 26
A laminate 26G including a green coloring layer 27G and a resist layer 28b is laminated thereon, and further, a blue pattern 25B is formed in a blue pattern formation region on the substrate 22, and a blue color is formed on the laminate 26G for the columnar convex portions 26. A laminate 26B including the coloring layer 28B and the resist layer 28c is laminated. Thereby, the colored layer 25 including the red pattern 25R, the green pattern 25G, and the blue pattern 25B is formed,
At the same time, the columnar convex portions 26 in which the laminates 26R, 26G, and 26B are laminated are formed in the columnar convex portion forming regions on the black matrix 23, and the color filter 21 of the present invention is obtained (FIG. 9E). Color Filter of Second Invention (Second Embodiment) Next, another embodiment of the color filter of the second invention will be described. FIG. 10 is a partial plan view showing an embodiment of the color filter of the present invention, and FIG. 11 is a longitudinal sectional view taken along line DD of the color filter shown in FIG.
10 and 11, a color filter 31 according to the second invention includes a substrate 32, a black matrix 33 formed on the substrate 32 in a predetermined pattern (a pattern indicated by oblique lines in FIG. 10), A layer 35 is provided, and a plurality of (five in FIG. 10) columnar protrusions 36 are provided at predetermined positions on the black matrix 33.

The colored layer 35 has a red pattern 35R, a green pattern 35G and a blue pattern 35B arranged in a desired pattern shape.
Are provided between the display pixel portions composed of the respective colored patterns and outside the region where the colored layer 35 is formed. Transparent resist layers 38a, 38b, 38c are laminated on the respective colored patterns 35R, 35G, 35B.

The color filter 31 according to the second aspect of the present invention includes a columnar convex portion 36 on which laminated bodies 36R, 36G, and 36B are laminated. Each of the laminated bodies 36R, 36G, and 36B includes a colored layer 37.
R, 37G, 37B and resist layers 38a, 38b, 38
and c is a laminate. This columnar projection 3
6 protrudes from the black matrix 33 and the colored layer 35 in a range of about 2 to 10 μm, and the amount of protrusion can be appropriately set based on the thickness required for the liquid crystal layer of the color liquid crystal display device. Further, the formation density of the columnar protrusions 36 can be appropriately set in consideration of the thickness unevenness of the liquid crystal layer, the aperture ratio, and the like. For example, the red pattern 35R, the green pattern 35G, and the blue pattern One set of 35B expresses a necessary and sufficient spacer function at a ratio of one. The shape of the columnar convex portion 36 is a cylindrical shape in the illustrated example, but is not limited thereto, and may be a prismatic shape, a truncated pyramid shape, or the like.

When the color filter 31 having the columnar projections 36 is bonded to a TFT array substrate, the columnar projections 36 form a gap between the color filter 31 and the TFT array substrate. For this reason, the gap accuracy between the two substrates is extremely high as compared with the case where glass beads or plastic beads are used as conventional spacers. Further, since the columnar convex portions 36 do not exist in the pixel portion, the aperture ratio does not decrease due to the decrease in the area of the display region, and since the columnar convex portions 36 have a light shielding property, the contrast ratio does not decrease. .

As the substrate 32 forming the color filter 31, the same material as the substrate 2 forming the color filter 1 can be used.

The black matrix 33 forming the color filter 31 is the same as the black matrix 3 forming the color filter 1 described above.

The colored layer 35 and the colored layers 37R, 3R constituting the laminates 36R, 36G, 36B of the columnar convex portions 36 are formed.
7G and 37B can be formed by a pigment dispersion method using a coloring resin in which a desired coloring material is contained in a resin such as a polyimide resin, an acrylic resin, or an epoxy resin.
The thickness of each of the coloring layers 37R, 37G, and 37B may be equal to the thickness of the red pattern 35R, the green pattern 35G, and the blue pattern 35B of the coloring layer 35, and may be, for example, about 1 to 3 μm.

The laminated bodies 36R, 36G, 3
6B, the resist layers 38a, 38b, 38c
It is formed by using a negative photosensitive resin among the photosensitive resins used in the formation of the above-described colored layer 5,
The thickness can be set in consideration of the height required for the columnar protrusions 36, the thicknesses of the red pattern 35R, the green pattern 35G, and the blue pattern 35B of the colored layer 35.
It can be about 5 to 2 μm. Fourth Invention of Color Filter Manufacturing Method Next, a fourth embodiment of the color filter manufacturing method will be described with reference to FIG. 12 using the color filter 31 shown in FIGS. 10 and 11 as an example. .

In the fourth invention of the color filter manufacturing method, first, a red coloring material is formed on a substrate 32 provided with a black matrix 33 formed in a predetermined pattern (a pattern shown by oblique lines in FIG. 10). The contained red resin layer 35'R is formed, and a negative photosensitive resist 38'a is formed on the red resin layer 35'R (FIG. 12).
(A)).

Next, the photosensitive resist layer 38'a is exposed through a predetermined photomask M (FIG. 12).
(B)). The photomask M used for this exposure is a red pattern 3 in a region where the black matrix 33 is not formed.
A light transmitting portion m for exposing the formation region of 5R and a light transmitting portion m 'for exposing the formation region of the columnar convex portion 36 are provided. Next, the red resin layer 35 is developed by performing development.
A pattern of a resist layer is formed in the red pattern formation region and the columnar convex portion formation region on 'R, and the red resin layer 35'R is etched using the resist layer as a mask. As a result, a laminate of the red pattern 35R and the resist layer 38'a is formed in the red pattern formation region on the substrate 32, and the red coloring layer 37R and the resist layer are formed in the columnar projection formation region on the black matrix 33. A laminate 36R made of 38'a is formed. Then, by curing each layer, a red pattern 35R in which the transparent resist layer 38a is laminated, and a laminate 36R of the red coloring layer 37R and the resist layer 38a are formed on the substrate 32 (FIG. 12C )).

Hereinafter, by repeating the same operation,
A green pattern 35G in which a transparent resist layer 38b is laminated is formed in a green pattern forming region on the substrate 32, and the green coloring layer 3R is formed on the laminate 36R for the columnar convex portions 36.
A laminate 36G composed of 7G and a resist layer 38b is laminated, and a blue pattern 35B in which a transparent resist layer 38c is laminated in a blue pattern formation region on the substrate 32 is formed. Stack 3 composed of blue colored layer 38B and resist layer 38c on 36G
6B is laminated. Thus, a colored layer 35 composed of the red pattern 35R, the green pattern 35G, and the blue pattern 35B is formed, and at the same time, the black matrix 3
The stacked bodies 36R, 36G, 36
The columnar convex portion 36 on which B is laminated is formed, and the color filter 31 of the present invention is obtained (FIG. 12E).

In the color filter of the present invention, a resist layer may be interposed between the above-mentioned black matrixes 3, 13, 23, 33 and the columnar projections 6, 16, 26, 36. FIG. 13 shows the color filter 1 described above.
3 is a longitudinal sectional view corresponding to FIG. 2 showing an aspect in which the above-described resist layer exists. In FIG. 13, a color filter 1 has a resist layer 9 formed on a black matrix 3 and a columnar projection 6 on the resist layer 9.
Is provided. FIG. 14 is a longitudinal sectional view corresponding to FIG. 8 showing an aspect in which the above-described resist layer is present in the above-described color filter 21. In FIG. 14, a color filter 21 is a black matrix 23.
A resist layer 29 is formed thereon, and the columnar convex portions 26 are provided on the resist layer 29. in this way,
By interposing a resist layer between the black matrix and the columnar projections, the designable width of the liquid crystal layer can be further increased.

When a black matrix is formed by patterning a metal thin film such as chromium, for example, such a resist layer can be formed by leaving the resist layer as a mask in the etching step without removing it. Further, the resist layer may not be formed on the entire surface on the black matrix, but may be formed only on the columnar convex portion forming region.

[0062]

As described above in detail, according to the present invention, in the color filter, the plurality of columnar projections formed on the black matrix are formed by a laminate of an oxygen barrier layer and a coloring layer or a resist layer. Since the color filter has a sufficient height that can be designed for setting the thickness of the liquid crystal layer, the color filter is
When bonded to the T-array substrate, the columnar projections form a gap for the liquid crystal layer between the color filter and the TFT array substrate with high accuracy, thereby providing a liquid crystal layer having a uniform thickness and providing uneven brightness. An excellent color liquid crystal display device having a high display ratio and a high contrast ratio without color unevenness is possible, and the oxygen blocking layer or the resist layer constituting the columnar convex portion is formed on the colored layer in the colored layer forming step. The process is simplified because the remaining photosensitive oxygen-blocking layer or photosensitive resist layer is formed by curing, and the colored layer constituting the columnar protrusion is formed simultaneously with the formation of the colored layer in the display pixel portion. As a result, the manufacturing cost can be reduced.

[Brief description of the drawings]

FIG. 1 is a partial plan view showing an embodiment of a first invention of a color filter.

FIG. 2 is a diagram illustrating a color filter according to the present invention shown in FIG.
It is a longitudinal cross-sectional view in the A line.

FIG. 3 is a process drawing for explaining the embodiment of the first invention of the method for manufacturing a color filter.

FIG. 4 is a partial plan view showing another embodiment of the first invention of the color filter.

FIG. 5 is a diagram illustrating a color filter according to the present invention shown in FIG.
It is a longitudinal cross-sectional view in the B line.

FIG. 6 is a process chart for explaining a second embodiment of the invention of the method for manufacturing a color filter.

FIG. 7 is a partial plan view showing a second embodiment of a color filter.

FIG. 8 is a graph showing C- of the color filter of the present invention shown in FIG. 7;
It is a longitudinal cross-sectional view in C line.

FIG. 9 is a process chart for explaining a third embodiment of the method for manufacturing a color filter.

FIG. 10 is a partial plan view showing another embodiment of the second invention of the color filter.

11 is a longitudinal sectional view of the color filter of the present invention shown in FIG. 10 taken along the line DD.

FIG. 12 is a process chart for explaining a fourth embodiment of the method for manufacturing a color filter.

FIG. 13 is a longitudinal sectional view corresponding to FIG. 2, showing another embodiment of the color filter of the present invention.

FIG. 14 is a longitudinal sectional view corresponding to FIG. 8, showing another embodiment of the color filter of the present invention.

[Explanation of symbols]

1,11,21,31 ... color filter 2,12,22,32 ... substrate 3,13,23,33 ... black matrix 5,15,25,35 ... colored layer 6,16,26,36 ... columnar projection 6R, 6G, 6B, 16R, 16G, 16B, 26R,
26G, 26B, 36R, 36G, 36B ... Stacks 7R, 7G, 7B, 17R, 17G, 17B, 27R constituting the columnar convex portions
27G, 27B, 37R, 37G, 37B... Colored layers constituting columnar projections 8a, 8b, 8c, 18a, 18b, 18c. ... Resist layer constituting columnar projections 9, 29 ... Resist layer

Claims (6)

[Claims] 1. A substrate comprising: a substrate; a black matrix formed in a predetermined pattern on the substrate; and a coloring layer having a plurality of colors, and a plurality of columnar projections on the black matrix. The color filter is characterized in that a part is formed by laminating a plurality of laminates of an oxygen barrier layer and a colored layer. 2. A photosensitive resin layer containing a coloring material of a predetermined color is formed on a substrate provided with a black matrix having a predetermined pattern, and a negative photosensitive oxygen blocking layer is further formed on the photosensitive resin layer. After that, by exposing and developing the oxygen blocking layer and the photosensitive resin layer in a predetermined pattern, a colored layer forming region of a predetermined color in a black matrix non-forming region on the substrate, Forming a laminate of the coloring layer and the oxygen blocking layer in the columnar convex portion forming region and then curing the laminate by the number of colors of the coloring layer. 3. A photosensitive wavelength region A containing a colorant of a predetermined color on a substrate provided with a black matrix of a predetermined pattern.
A photosensitive oxygen blocking layer of a photosensitive wavelength range B different from the photosensitive wavelength range A is formed on the photosensitive resin layer, and thereafter, the photosensitive oxygen blocking layer and the photosensitive oxygen blocking layer are formed. The photosensitive resin layer is exposed to light in a wavelength range A using a mask for forming a colored layer, and then the photosensitive oxygen blocking layer and the photosensitive resin layer are exposed to light in a wavelength range B using a mask for forming a columnar convex portion. By exposing and developing with light, a colored layer is formed in a colored layer forming region of a predetermined color in a black matrix non-forming region on the substrate, and a colored layer and an oxygen blocking layer are formed in the columnar convex portion forming region on the black matrix. A step of repeating the operation of forming the laminate after curing for the number of colors of the colored layers. 4. A substrate comprising: a substrate; a black matrix formed in a predetermined pattern on the substrate; and a coloring layer having a plurality of colors, and a plurality of columnar projections on the black matrix. The color filter is characterized in that a part is formed by laminating a plurality of laminates of a resist layer and a colored layer. 5. A color resin layer containing a colorant of a predetermined color is formed on a substrate provided with a black matrix having a predetermined pattern, and further, a positive photosensitive resist layer is formed on the color resin layer. By exposing and developing the photosensitive resist layer in a predetermined pattern, by etching and removing the exposed colored resin layer, a colored layer forming region of a predetermined color in a black matrix non-forming region on the substrate, Form a laminate of a colored layer and a photosensitive resist layer in the columnar convex portion forming region on the black matrix, and then remove the photosensitive resist layer of the laminate formed in the colored layer forming region to expose the colored layer A step of repeating the operation of curing the photosensitive resist layer of the layered body formed in the columnar projection forming region to form a resist layer by the number of colors of the coloring layer, Manufacturing method. 6. A colored resin layer containing a coloring material of a predetermined color is formed on a substrate provided with a black matrix having a predetermined pattern, and a negative photosensitive resist layer is formed on the coloring resin layer. By exposing and developing the photosensitive resist layer in a predetermined pattern, by etching and removing the exposed colored resin layer, a colored layer forming region of a predetermined color in a black matrix non-forming region on the substrate, Forming a laminate of a colored layer and a photosensitive resist layer in the columnar convex portion forming area on the black matrix, and curing the photosensitive resist layer to form a resist layer, including a step of repeating the number of colors of the colored layer A method for manufacturing a color filter, comprising: