KR20040060103A - LCD with data line open repair pattern - Google Patents

Abstract

PURPOSE: An LCD(Liquid Crystal Display) having a data line open repair pattern is provided to form both ends of a data open repair pattern sharply, thereby finding more easily a repair point, that is, a laser welding point and performing a stable welding. CONSTITUTION: Plural gate line(13) and data line(15) are crossed with each other. A unit pixel region(P) is defined by the gate line(13) and the data line(15) and arranged with a matrix type. A dummy gate pattern(20') is arranged at a lower portion of the data line(15). The dummy gate pattern(20') is formed together when forming the gate line(13) and electrically insulated to the data line(15) by a gate insulation film. The dummy gate pattern(20') and the gate line(13) are made of same material and the dummy gate pattern(20') is pointed at the end.

Description

LCD with data line open repair pattern {LCD with data line open repair pattern}

The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device having a data line open repair pattern.

The driving principle of the liquid crystal display device is to use the optical anisotropy and polarization property of the liquid crystal. The liquid crystal has a long and thin structure, and thus the liquid crystal has directivity in the arrangement of molecules, and artificially applies an electric field to the liquid crystal to control the direction of the molecular arrangement. Can be.

Accordingly, if the molecular arrangement direction of the liquid crystal is arbitrarily adjusted, the molecular arrangement of the liquid crystal is changed, and light is refracted in the molecular arrangement direction of the liquid crystal due to optical anisotropy to express image information.

Currently, the active matrix liquid crystal display (AM-LCD) in which the above-described thin film transistor and pixel electrodes connected to the thin film transistor are arranged in a matrix manner is attracting the most attention due to its excellent resolution and ability to implement video.

1 is an exploded perspective view schematically illustrating a general liquid crystal display.

Referring to FIG. 1, a general liquid crystal display device 11 includes an upper substrate 5 having a transparent common electrode 18 formed on a color filter including a black matrix 6 and a sub color filter 7, and a pixel region. (P) and a pixel electrode 17 formed on the pixel region, a thin film transistor as the switching element T, and a lower substrate on which the data line 15 and the gate line 13 are formed, and the upper substrate 5 and The liquid crystal 14 is filled between the lower substrates 22.

The lower substrate 22 is also referred to as an array substrate, and the thin film transistor T, which is the switching element, is positioned in a matrix form, and a gate line 13 and a data line 15 passing through the plurality of thin film transistors are formed. In addition, an area defined by the intersection of the gate line 13 and the data line 15 becomes the pixel area P. FIG.

Here, the gate line 13 transmits a pulse positive voltage driving the gate electrode of the thin film transistor T, and the data line 15 transmits a signal voltage driving the source electrode of the thin film transistor T. Means. At this time, if a voltage for driving the liquid crystal is applied to any source electrode by the signal of the gate electrode, and a voltage smaller than the liquid crystal driving voltage is applied to the rest, only the pixel to which the liquid crystal driving voltage is applied will operate. .

As such, the gate lines and the data lines are arranged in a matrix form on the entire display area to independently drive the plurality of pixel electrodes. The gate lines and the data lines are used to drive the thin film transistor which is a switching element.

However, defects may appear in the above components formed on the array substrate due to various causes during the manufacturing process. These defects can be divided into dot defects, line defects, or marking stains depending on their shape. Point defects are caused by defects such as thin film transistor elements or pixel electrodes. This is caused by the destruction of the thin film transistor and the like due to short circuit and static electricity.

These defects are becoming more important problems as the display area of the image device becomes larger, and in particular, if any one of the line defects occurs, the product is not worth as a product. Repair is essential.

For example, assuming that one of the data line or the gate line is open, all thin film transistors connected to the open line will be impossible to operate, and such defects in the array substrate may cause fatal defects in the liquid crystal display device. Will be.

In addition, in fabricating the array substrate as described above, an open defect of the data line is generated due to the characteristics of the material for the data line, the influence of the foreign matter, and the influence of the ITO etchant, resulting in a decrease in the manufacturing yield of the liquid crystal display device. There is a problem.

Meanwhile, in order to reduce the open failure of the data line, the pixel structure is changed or a redundancy line made of ITO is conventionally formed. There is still a problem that exists.

2 is a plan view illustrating an array substrate on which a conventional data open repair pattern is formed.

Referring to FIG. 2, this illustrates a pattern for repairing an open failure of the data line 15 as described above. The dummy gate pattern 20 is disposed below the data line 15. By solving the above problem, the open data line 15 is repaired using the dummy gate pattern 20 even if the data line 15 is opened. Here, the dummy gate pattern 20 refers to the data open repair pattern.

In more detail, the array substrate includes a plurality of gate lines 13 and data lines 15 arranged to cross each other, and a unit pixel area P is disposed on the gate lines 13 and the data lines 15. Defined in a matrix form. In addition, a dummy gate pattern 20 is disposed under the data line 15.

The dummy gate pattern 20 is formed together with the gate line 13 to be electrically insulated from the data line 15 by a gate insulating film (not shown).

In addition, the dummy gate pattern 20 may be disposed to be spaced apart from the gate line 13, and may be formed to have the same width as that of the data line 15.

On the other hand, a thin film transistor T, which is a switching element, is disposed at the intersection of the gate line 13 and the data line 15, and a portion of the thin film transistor T is disposed in each unit pixel region P, for example, a drain. The pixel electrode 17 made of ITO material which contacts the electrode 35 is disposed. In this case, the thin film transistor T includes an active layer 37 formed between the gate electrode 31, the source / drain electrodes 33 and 35, and the source / drain electrodes 33 and 35.

In this structure, even if the data line 15 is opened due to a property of the material itself or a defect in the process, the short circuit may electrically short the data line and the dummy gate pattern 20 using a laser repair process. Open failure of the data line can be prevented.

However, the conventional data open repair pattern, that is, the dummy gate pattern 20 has a flat structure at both ends thereof.

In this case, when the data line 15 is opened and repaired, the dummy gate pattern 20 and the data line 15 are laser-welded on the rear surface of the liquid crystal cell. The dummy gate pattern 20 ) Both ends are flat and the data line 15 is obscured by the dummy gate pattern 20, so it is difficult to find an accurate laser repair point during the laser welding.

3A to 3B are views illustrating a welding state between a data line in which an open occurs and a dummy gate pattern.

FIG. 3A illustrates that the welding point 24 between the data line 15 and the dummy gate pattern 20 is correctly formed, which is a central portion of both ends of the dummy gate pattern 20 and the data line 15. The welding point 24 is formed to include about half. As such, when the welding point 24 is formed, the data line 15 and the dummy gate pattern 20 are most stably connected.

FIG. 3B illustrates that the welding point 24 between the data line 15 and the dummy gate pattern 20 is poorly formed, which is a side of the dummy gate pattern 20 and the data line 15. ) Is formed when the welding point 24 is formed or the welding point 24 is formed to be biased toward one of the dummy gate pattern 20 or the data line 15.

In this case, when the welding point 24 is formed, cracks are likely to occur near the welding point 24, so that the connection between the dummy gate pattern 20 and the data line 15 is broken again. It could be.

As a result, when the conventional data open repair pattern is applied, there is an unstable disadvantage in terms of repair yield.

An object of the present invention is to provide a liquid crystal display device having a data line open repair pattern that makes it easier to find a repair point, that is, a laser welding point, and to perform more stable welding by sharply forming both ends of the data open repair pattern. There is this.

1 is an exploded perspective view schematically illustrating a general liquid crystal display device.

2 is a plan view illustrating an array substrate on which a conventional data open repair pattern is formed.

3A to 3B are views illustrating a welding state between a data line in which an open occurs and a dummy gate pattern.

Figure 4 is a plan view showing an array substrate on which a data open repair pattern is formed according to the present invention.

5A to 5B are cross-sectional views and perspective views illustrating a repair method using a data open repair pattern according to the present invention.

6 is a diagram illustrating a welding state between a data line in which an open occurs and a dummy gate pattern.

<Explanation of symbols for the main parts of the drawings>

13: gate line 15: data line

20, 20 ': dummy gate pattern 24, 24': welding point

32: gate insulating film

In order to achieve the above object, a liquid crystal display device having a data open repair pattern according to the present invention includes a plurality of gate lines arranged on a substrate and a plurality of pixel regions intersecting the gate lines under a gate insulating layer. A liquid crystal display comprising a plurality of data lines, a thin film transistor positioned at an intersection of the gate line and the data line, and a pixel electrode disposed in the pixel region,

A dummy gate pattern is formed below the data line, and is insulated from the data line by the gate insulating layer, and both ends of the dummy gate pattern are sharp.

In addition, the dummy gate pattern is formed at the same time as the gate line, characterized in that the material is the same.

The dummy gate pattern may be spaced apart from the gate line and disposed along an extension direction of the data line.

In addition, the data open repair pattern forming method according to the present invention in order to achieve the above object, the step of forming a plurality of gate lines and a dummy gate pattern having a pointed end shape on the substrate, the gate line and the dummy gate Forming a gate insulating film on the entire surface of the patterned substrate, and forming a data line on the gate insulating film to overlap the dummy gate pattern, wherein the dummy gate pattern is spaced apart from the gate line, It is disposed in the lower portion of the data line in the extending direction.

According to the present invention, both ends of the data open repair pattern are pointed to make it easier to find the repair point, that is, the laser welding point, and to perform more stable welding, thereby maximizing the repair success rate and producing the liquid crystal display device. Yield can be improved.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

4 is a plan view illustrating an array substrate on which a data open repair pattern is formed according to the present invention.

Referring to FIG. 4, in the array substrate on which the data open repair pattern is formed, a plurality of gate lines 13 and data lines 15 are arranged to cross each other, and a unit pixel area P is formed in the gate line ( 13 and the data line 15 are arranged in a matrix form, and a dummy gate pattern 20 ′ is disposed under the data line 15.

Here, the dummy gate pattern 20 ′ is formed at the time of forming the gate line 13 and is electrically insulated from the data line 15 by a gate insulating layer (not shown).

In addition, the dummy gate pattern 20 ′ is made of the same material as the gate line 13, and both ends thereof have a pointed shape.

In addition, the dummy gate pattern 20 ′ is disposed to be spaced apart from the gate line 13 so that the dummy gate pattern 20 ′ is not overlapped with each other even if formed on the same plane, and is disposed along an extension direction of the data line 15. It is formed to have the same or wider width as the line 15.

On the other hand, a thin film transistor T, which is a switching element, is disposed at the intersection of the gate line 13 and the data line 15, and a portion of the thin film transistor T is disposed in each unit pixel region P, for example, a drain. The pixel electrode 17 made of ITO material which contacts the electrode 35 is disposed. In this case, the thin film transistor T includes an active layer 37 formed between the gate electrode 31, the source / drain electrodes 33 and 35, and the source / drain electrodes 33 and 35.

In such a structure, even if the data line 15 is opened due to a material defect or a process defect, the data line 15 and the dummy gate pattern 20 'are electrically connected by using a laser repair process. A short, ie, welding with a laser, can prevent open failure of the data line 15. That is, the phenomenon that a signal cannot be transmitted due to the opening of the data line 15 can be solved by the above repair process.

In particular, the data open repair pattern structure according to the present invention, that is, the structure of the dummy gate pattern 20 'has a sharp structure at both ends thereof, so that the repair point, that is, the laser welding point, can be easily found.

In more detail, when the data line 15 is opened and repaired, the dummy gate pattern 20 ′ and the data line 15 are laser-welded on the rear surface of the liquid crystal cell. Since both ends of the gate pattern 20 ′ are sharp, the data line 15 may be hidden by the dummy gate pattern 20, so that an accurate laser repair point may be found during the laser welding.

5A to 5B are cross-sectional views and perspective views illustrating a repair method using a data open repair pattern according to the present invention. 5 is a cross-sectional view and a perspective view of a specific region I of FIG. 4.

5A and 5B, when the data line 15 is opened in the C region, both ends of the dummy gate pattern 20 ′ formed under the data line 15 including the open region are found. Both ends of the dummy gate pattern 20 ′ and the data line 15 formed thereon are welded with a laser. This electrically shorts the portion of the data line 15 where no open occurs and the dummy gate pattern 20 '. At this time, the welding point 24 'of the laser is an area including both sharp ends of the dummy gate pattern 20', and between the dummy gate pattern 20 'and the data line 15. The gate insulating film 32 is interposed.

Accordingly, the data signal loaded on the data line 15 is transferred to the dummy gate pattern 20 'electrically shorted by the data line 15 and the welding point 24' in the open area. Then, the dummy gate pattern 20 ′ is transferred to a portion of the data line 15 in which no opening occurs. Therefore, the opening of the data line 15 is repaired, and the data signal is transferred normally.

As a result, even if the opening of the data line 15 occurs, it is possible to easily repair the opening of the data line 15, thereby enabling the normal transmission of the data signal. As a result, the data line 15 It is possible to prevent a decrease in the manufacturing yield of the liquid crystal display device due to the open failure.

6 is a diagram illustrating a welding state between a data line in which an open occurs and a dummy gate pattern.

Both ends of the dummy gate pattern 20'are not sharply formed as in the conventional case but are sharply formed to laser the dummy gate pattern 20 'and the data line 15 from the rear side of the liquid crystal cell. In the case of welding by the furnace, even if the data line 15 is covered by the dummy gate pattern 20 ', an accurate laser repair point, that is, an accurate welding point 24' may be found.

6, when the sharp portion of the dummy gate pattern 20 ′ is repaired using a laser welding point, the data line 15 and the dummy gate pattern 20 ′ are more stably formed than the conventional case. It can be electrically connected by welding point 24 '.

This is because no crack is generated at the welding point 24 ′ and thus the connection between the dummy gate pattern 20 ′ and the data line 15 is not broken again.

As described above, according to the liquid crystal display device having the data open repair pattern according to the present invention, both ends of the data open repair pattern are sharply formed, thereby making it easier to find a repair point, that is, a laser welding point, and more stable welding. As a result, the repair success rate can be maximized and the production yield of the liquid crystal display device can be improved.

Claims (5)

A plurality of gate lines arranged on a substrate, a plurality of data lines intersecting the gate lines to define a plurality of pixel regions through a gate insulating film, a thin film transistor positioned at an intersection of the gate lines and the data lines; In a liquid crystal display device comprising pixel electrodes disposed in the pixel region, A dummy gate pattern is formed below the data line, and is insulated from the data line by the gate insulating layer, and both ends of the dummy gate pattern have a pointed shape. LCD display device. The method of claim 1, And the dummy gate pattern is formed at the same time as the gate line and has the same material as the data open repair pattern. The method of claim 1, And the dummy gate pattern is spaced apart from the gate line and disposed along an extension direction of the data line. Forming a dummy gate pattern having a plurality of gate lines and pointed ends on the substrate; And forming a gate insulating film on the entire surface of the substrate on which the gate line and the dummy gate pattern are formed, and forming a data line on the gate insulating film so as to overlap the dummy gate pattern. The method of claim 4, wherein And the dummy gate pattern is spaced apart from the gate line and disposed under the data line in an extension direction of the data line.