KR20040026038A - Evaporation source - Google Patents

Abstract

PURPOSE: A deposition source of organic matter deposition equipment is provided which stabilizes flux and solves residue problems of organic matter by additionally installing a structure body for guiding flow of organic matter sublimated inside crucible for receiving organic matter. CONSTITUTION: The deposition source of organic matter deposition equipment comprises a crucible(3) on an outer part of which a heating means(5) is installed so that the heating means heats the crucible, and in which organic matter(1) that is a thin film material is contained; and a flux guide means(10) installed inside the crucible so as to second diffuse the concentrated organic matter to the upper side of the crucible by concentrating the first diffused organic matter to the inner wall side of the crucible again after first diffusing the concentrated organic matter into a certain space by concentrating vapor phase organic matter sublimated as the crucible is being heated to the inner wall side of the crucible, wherein the flux guide means comprises upper and lower plates(13,15) installed in upper and lower parts of support(11) with being spaced apart from each other in a certain distance by means of the support, and a gas phase organic matter passing part (S) for passing the gas phase organic matter is installed at a position adjacent to the crucible inner wall at the edge part side of the upper and lower plates, and wherein the gas phase organic matter passing part comprises an edge part of the upper and lower plates and gaps (S1,S2) formed between inner walls of the crucible by decreasing size of the upper and lower plates than size of an inner part of the crucible.

Description

Evaporation source of organic material deposition apparatus {EVAPORATION SOURCE}

The present invention relates to a deposition source of an organic vapor deposition apparatus, and more particularly, to further configure a structure for guiding the flow of the sublimed organic matter inside the crucible containing the organic material to solve the problem of stabilization of flux and residue of organic matter It relates to a deposition source of an organic vapor deposition apparatus.

Currently, vacuum deposition is used as an organic thin film formation method.

The vacuum deposition method is to form a thin film by installing a deposition source on the lower part of the vacuum chamber and a substrate for film formation on the upper part of the vacuum chamber. Looking at the schematic configuration of the organic thin film forming apparatus using the vacuum deposition method, there is a vacuum exhaust machine connected to the vacuum chamber. By using this to maintain a constant vacuum in the interior of the vacuum chamber, it is configured to evaporate the organic material of the organic thin film material from at least one organic thin film material deposition source disposed under the vacuum chamber.

The deposition source includes a crucible in which an organic material, which is a thin film material, is accommodated, and a heater wound around the crucible and electrically heated. Therefore, as the heater is heated, the crucible is also heated together, and when the temperature reaches a predetermined temperature, the organic matter begins to evaporate.

The substrate to be formed on which the thin film is to be formed is located at a predetermined distance from the upper portion of the deposition source in the vacuum chamber.

Therefore, the organic material evaporated from the crucible is transferred to the substrate to be processed and solidified on the substrate through a continuous process such as adsorption, vapor deposition, and re-evaporation to form a thin film.

Important factors to be considered in the design of the deposition source in order to make the thickness of the film formed through the deposition process uniform, and the process stability and manufacturing cost, and the like are heat transfer speed, temperature uniformity, and flux uniformity.

Heat transfer and temperature uniformity are closely influenced by the material of the crucible and flux uniformity is greatly influenced by the structure of the crucible. Crucible structure for stabilizing flux. Conventionally, the middle part of the upper part uses a narrow neck structure with a small diameter, and the sublimed molecules are concentrated in the vicinity of the narrow neck and diffused again to diffuse. Two alternatives have been applied, with the effect of flux stabilization comparable to a thin neck structure by placing a cap with a sized hole in the upper center.

However, the above-mentioned thin neck structure is advantageous in terms of the stabilization of the flux, but there is a problem in that a large amount of residual material remains after the deposition process, which is unreasonable for washing the crucible and filling the material.

The reason why the remaining material remains as described above is that the sublimation occurs from the edge of the crucible, so that the height of the remaining organic material is changed as time passes. The deposition rate of the organic material is not constant in time and space, which causes a change in luminescence properties.

On the other hand, the structure used by capping the cylindrical crucible is a structure that is not easy to heat the cap, there is a disadvantage that the clogging of the cap hole occurs, there is still a problem of organic matter remaining in the thin neck structure There is a problem.

Therefore, the present invention has been made to solve the above-described problems, the object of the present invention is to guide the flow of flux in the crucible and to install a structure that can solve the problem of the remaining organic matter to stabilize the flux and organic matter It is to provide a deposition source of the organic material deposition apparatus to solve the problem that the remaining material of the remaining inside the crucible.

In order to achieve the above object, the present invention provides a crucible in which a heating means is provided on the outside thereof, heated to a predetermined temperature, and an organic material, which is a thin film material, is accommodated therein; And a flux guide that is installed inside the crucible and diffuses the vaporized organic matter sublimated as the crucible is heated to the inner wall side of the crucible to firstly diffuse into a predetermined space, and then to the inner wall side of the crucible to secondary diffuse to the upper side of the crucible. Means;

The flux guide means is composed of upper and lower plates which are installed at the upper and lower ends of the support at predetermined intervals through the support; The upper and lower plates are provided with a gas phase organic passage portion through which gaseous phase organic matter passes at a position close to the inner wall of the crucible.

The gaseous phase organic matter passing portion comprises a gap portion formed between an edge portion of the upper and lower plates and an inner wall of the crucible.

The gaseous phase organic matter passing portion includes a plurality of through holes provided at predetermined edge portions of the upper plate; And a gap portion between the edge portion of the lower plate and the crucible inner wall.

The lower plate is to protrude the central portion of the bottom surface, it is preferable to make a solid shape.

The upper plate further comprises an auxiliary heating means.

The flux guide means is made of a material having high thermal conductivity.

1 is a side cross-sectional view showing a configuration of a deposition source according to an embodiment of the present invention;

2 is a perspective view three-dimensionally showing the configuration of the flux guide means of FIG.

3 is a cross-sectional view taken along the line A-A 'of FIG.

4 is a side view showing a configuration of a deposition source according to another embodiment of the present invention;

5 is a perspective view three-dimensionally showing the configuration of the flux guide means of FIG.

FIG. 6 is a cross-sectional view taken along line BB ′ of FIG. 4.

<Explanation of symbols for the main parts of the drawings>

1: Organic matter 3: Crucible

5: heating means 10: flux guide means

11: support base 13: upper plate

15: lower plate 17: spacer

S (S1, S2, S3): Steam organic water passage

Hereinafter, a deposition source of an organic compound deposition apparatus according to an embodiment of the present invention will be described in more detail with reference to FIGS. 1 to 3.

As shown in the drawing, there is a crucible 3 in which an organic material 1, which is a thin film material, is accommodated and an upper portion thereof is opened, and the crucible 3 is placed outside the crucible 3 at a predetermined temperature. There is a heating means 5 for heating the organic material 1 stored in the crucible 3 to vaporize the organic material 1 by heating.

Inside the crucible 3 is provided a flux guide means 10 for guiding the flow (FLUX) of the organic matter (hereinafter referred to as "gas organic") vaporized by the heating means (5).

The flux guide means 10 is installed inside the crucible 3, and as the crucible 3 is heated, the sublimated gaseous organic matter is first diffused to stay in a predetermined space, and then the ejection path thereof is reduced again. The spray path is configured to be second-diffused with the inner wall side of the crucible 3, and the specific configuration thereof includes a support 11 installed upright in the crucible 3, and an upper end of the support 11. And an upper plate 13 and a lower plate 15 installed at the lower end.

The upper plate 13 and the lower plate 15 is provided with a gas phase organic water passing portion (S) to pass the gaseous organic matter, the gas phase organic water passing portion (S) is provided at a position close to the inner wall side of the crucible (3). This is preferable.

The gaseous phase organic matter passing portion S is provided with the size of the upper plate 13 and the lower plate 15 smaller than the inner size of the crucible 3, so that the edge portions of the upper and lower plates 13 and 15 and the crucible (3) It consists of the clearance gaps S1 and S2 formed between inner walls.

At this time, the gap S1 is held by the plurality of spacer members 17.

The lower plate 15 has a shape in which the central portion of the bottom surface protrudes, for example, in the shape of a cork, which is added to the weight of the flux guide means 10 as a whole, and the crucible 3 in which the sublimation of the organic material 1 is most active. It is preferable to configure to solve the problem that the organic material (1) filled in the crucible (3) is left to guide to the side of.

At this time, the flux guide means 10 is not fixed to the inner wall of the crucible 3 so that the flux guide means 10 can be lowered by the weight as the organic material 1 is consumed, the end of the spacer member 17 is the crucible 3 It would be desirable to allow simple sliding in contact with the inner wall.

As described above, since the flux guide means 10 is simply contacted with the inside of the crucible 3, the flux guide means 10 can be easily pulled out of the crucible 3 so that the inside of the crucible 3 can be cleaned and the organic material ( Filling 1) can be done more easily.

Subsequently, the upper plate 13 further includes an auxiliary heating means 19 to prevent the temperature of the upper plate 13 from dropping by the structure of the crucible 3 whose upper surface is opened to prevent the gas phase organic matters from accumulating. do.

The flux guide means 10 preferably uses a material having high thermal conductivity, for example, a metal material.

Next, the deposition principle of the deposition source configured as described above will be described.

First, as the heating means 5 is operated and heated to a predetermined temperature, the crucible 3 is heated together to sublimate the organic matter 1 contained in the crucible 3.

The sublimation is most active in the portion adjacent to the inner wall of the lower plate 15 and the crucible 3, and is first diffused between the upper plate 13 and the lower plate 15 through the gap S2, and then the gap. Dense to the side (S1) to maintain a relatively uniform flux and diffuse into the space above the upper plate (13).

As described above, the deposition rate (EVAPORATION RATE) deposited on the substrate (not shown) according to the uniform flux is stably maintained to form a uniform thin film.

In addition, the bottom portion of the lower plate 17 is protruded, for example, in the shape of a solid, and acts together with the weight of the flux guide means 10, the sublimation of the organic material 1 contained in the crucible 3 is most active. Since it is directed toward the side in the crucible (3) that occurs, the amount of organic matter (1) accumulated in the center of the crucible (3) is reduced to achieve sufficient sublimation without fear of material modification.

On the other hand, according to the above principle, the temperature of the upper plate 13 is relatively lowered according to the structure of the crucible 3 having the upper portion opened while the organic substance is sublimated and diffused, and there is a risk of adsorbing gaseous organic matter. It is eliminated by the auxiliary heating means 19 provided in (13).

Next, FIGS. 4 to 6 are views showing the structure of the deposition source of the organic compound deposition apparatus according to another embodiment of the present invention, the same reference numerals denote the same parts as those of FIGS. Detailed description thereof will be omitted.

4 to 6 is different from the flux guide means 10 in the vapor phase water passage portion S, and the size of the upper plate 13 instead of the gap S1 shown in FIGS. 1 to 3 is enlarged. The size of the crucible 3 is enlarged so as to be in close contact with the inner wall of the crucible 3, and a plurality of through holes S3 are provided at the periphery of the upper plate 13.

In the above description, the configuration of the gas phase organic matter passing portion S is limited to the annular gap portions S1 and S2 or through holes S3 formed at predetermined intervals, but the sublimation of organic matter is most active. It will be possible to form a variety of forms in close proximity to the inner wall of the crucible (3) to occur.

As described above, the present invention installs a flux guide means inside the crucible to induce vapor phase organic matter toward the inner wall of the crucible where sublimation is most active, and then first diffuses it to the inner wall of the crucible so that it is concentrated through a narrow flow path. It is advantageous to configure the post-bonding diffusion to make the film thickness uniform according to the uniform flux maintenance.

In addition, by producing the self-weight of the flux guide means and the bottom surface of the lower plate constituting the flux guide means in a high shape, it has the advantage of reducing the amount of organic residue remaining on the central side of the crucible.

As described above, in the detailed description of the present invention, specific embodiments have been described. However, various modifications may be made without departing from the scope of the present invention. Therefore, the scope of the present invention should not be limited to the described embodiments, but should be defined by the claims below and equivalents thereof.

Claims (8)

A crucible in which a heating means is provided at an outside thereof and heated to a predetermined temperature, and the organic material as a thin film material is accommodated therein; And Flux guide means installed inside the crucible and the sublimed gaseous organic matter as the crucible is heated to the inner wall side of the crucible to primary diffusion to a predetermined space and then to the inner wall side of the crucible to secondary diffusion to the upper side of the crucible Evaporation source of the organic material deposition apparatus comprising a. The method of claim 1, The flux guide means is composed of upper and lower plates which are installed at the upper and lower ends of the support at predetermined intervals through the support; The vapor deposition source of the organic vapor deposition apparatus characterized by the gaseous-phase organics passing part which the gaseous-phase organics pass through in the position which adjoins the crucible inner wall toward the edge part of the upper and lower plates. The method of claim 1, And the gaseous phase organic matter passing portion is a gap formed between an edge portion of the upper and lower plates and an inner wall of the crucible by making the size of the upper and lower plates smaller than the inner size of the crucible. The method of claim 1, The gaseous phase organic matter passing portion includes a plurality of through holes provided at predetermined edge portions of the upper plate; And an edge portion of the lower plate and a gap portion between the inner wall of the crucible and the deposition source of the organic vapor deposition apparatus. The method of claim 1, The lower plate is a deposition source of the organic material deposition apparatus, characterized in that formed in the center of the bottom protruding. The method of claim 5, The bottom surface of the lower plate is a deposition source of the organic material deposition apparatus, characterized in that the solid shape. The method of claim 1, The top plate is a deposition source of the organic material deposition apparatus, characterized in that the supplementary heating means is further configured to compensate for the temperature drop of the top plate. The method of claim 1, The flux guide means is a deposition source of an organic vapor deposition apparatus, characterized in that the material of high thermal conductivity.