KR20030035837A - Process for forming a colored pattern - Google Patents

Abstract

PURPOSE: To provide a method to form a color pattern (5) with stable sensitivity and resolution. CONSTITUTION: The method is carried out by irradiating a layer (1) made of a color photosensitive resin composition containing (A) a pigment, (B) a binder resin, (C) an additional polymerizable compound having an ethylenic unsaturated bond and (D) a photopolymerization initiator with rays (4) through a photomask (3), then dissolving the region (11) not irradiated with rays in the layer (1) in a developer at the dissolving rate of ≧10 nm/sec and ≤60 nm/sec. The method is suitable for the formation of a black matrix.

Description

Process for forming a colored pattern

The present invention relates to a method of forming a colored pattern, in particular a method of forming a colored pattern constituting a color filter, in particular a black matrix.

The color filter 6 is, for example, an optical element inserted into a liquid crystal display device to colorize the display image of the device, or inserted into a solid-state image pickup device to obtain a color image. 2) It is known to consist of the coloring pattern 5 formed adjacent to each other on the same plane above. Here, the colored pattern includes, for example, the color pixels of the three primary colors of the red pixel 5R, the green pixel 5G, and the blue pixel 5B, and the black matrix 5BM formed at the boundary of each color pixel. Here, the color pixels of each color are transparent layers colored in each color, and the black matrix is a layer that does not substantially transmit visible light in black.

In the manufacturing method of the said color filter 6, the colored photosensitive resin composition layer 1 which consists of solid content of a colored photosensitive resin composition is formed on the board | substrate 2 (FIG. 2A), and the photomask (the mask 1) After irradiating the light ray 4 through 3) (FIG. 2B), the method of dissolving the non-irradiation area | region 11 in the developing solution to form the coloring pattern 5 is known (FIG. 2C). By repeating the above operation while changing the color of the pigment contained in the coloring photosensitive resin composition, the color filter 6 can be formed by sequentially forming the coloring pattern of each color (FIGS. 3 and 4).

However, in such a conventional method, the sensitivity of the colored photosensitive resin composition layer 1 may fall, and the amount of light irradiation required for exposure may increase, or the resolution of the obtained colored pattern may fall. For this reason, in order to form a stable colored pattern, a sufficient amount of light must be irradiated, and when forming a fine colored pattern, there exists a problem that its retention rate tends to fall. Such a decrease in sensitivity and a decrease in resolution were particularly remarkable in the case of forming a black matrix 5BM that does not transmit light among the colored patterns 5.

As a result of earnestly examining in order to develop the method which can form a coloring pattern with stable sensitivity and resolution here, this inventor found that when the dissolution rate to the developing solution of a light non-irradiation area | region becomes a specific range, the sensitivity and the resolution in exposure The present invention was found to be able to stabilize and improve the stability.

1A and 1B are schematic diagrams partially showing an example of a color filter.

2A to 2C are schematic diagrams illustrating a step of forming a colored pattern on a substrate using a colored photosensitive resin composition.

3A to 3C are schematic diagrams illustrating a step of forming a colored pattern on a substrate using a colored photosensitive resin composition.

4A to 4C are schematic diagrams illustrating a step of forming a colored pattern on a substrate using a colored photosensitive resin composition.

Short description of the sign

1: coloring photosensitive resin composition layer

2: substrate

3: photomask

4: rays

5: coloring pattern

6: color filter

11: light non-irradiation area

12: light irradiation area

31: glass plate

32: light shielding layer

33: floodlight

5R: red pixel

5G: green pixel

5B: blue pixel

5BM: Black Matrix

That is, the present invention is directed to a layer (1) made of a colored photosensitive resin composition containing a pigment (A), a binder resin (B), a compound having an ethylenically unsaturated bond (C), and a photopolymerization initiator (D). After irradiating the light ray 4 through the mask 3, the light non-irradiated area | region 11 of the said layer 1 is melt | dissolved in a developing solution at the dissolution rate of 10 nm / sec or more and 60 nm / sec or less. It is to provide a method of forming the colored pattern 5.

The pigment (A) contained in the coloring photosensitive resin composition used by the formation method of this invention may be an inorganic pigment, or an organic pigment may be sufficient as it. Examples of the inorganic pigments include metal compounds such as metal oxides and metal complex salts, and specifically, metal oxides or composite metal oxides such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc, and antimony. Can be mentioned. In addition, examples of the organic pigments include compounds classified as dyes by Color Index (Published by The Society of Dyers and Colourists).

In order to form a black matrix, the coloring photosensitive resin composition containing a black pigment and colored black is used. In forming each pixel, such as a red pixel, a green pixel, and a blue pixel, the coloring photosensitive resin composition containing the pigment of the color corresponding to each pixel of interest, and colored by each color is used.

As a black pigment, the graphite as described in carbon black, Unexamined-Japanese-Patent No. 5-311109, Unexamined-Japanese-Patent No. 6-11613, etc., for example, Unexamined-Japanese-Patent No. 4- Inorganic black pigments described in 322219, Japanese Patent Application Laid-Open No. 3-274503, and the like, Azo black pigments described in Japanese Laid-Open Patent Publication No. 2-216102, CI Pigment Black 1, C.I. Organic black pigments, such as pigment black 7, etc. can be used. The colored photosensitive resin composition colored black may contain a red pigment, a green pigment, a blue pigment, a yellow pigment, a cyan pigment, a magenta pigment and the like as a pigment.

The colored photosensitive resin composition colored by each color contains the pigment of each color. As the pigment of each color, one kind of pigment may be contained, or two or more kinds of pigments may be contained. Related pigments include, for example, C.I. Pigment Yellow 1, C.I. Pigment Yellow 3, C.I. Pigment Yellow 12, C.I. Pigment Yellow 13, C.I. Pigment Yellow 14, C.I. Pigment Yellow 15, C.I. Pigment Yellow 16, C.I. Pigment Yellow 17, C.I. Pigment Yellow 20, C.I. Pigment Yellow 24, C.I. Pigment Yellow 31, C.I. Pigment Yellow 55, C.I. Pigment Yellow 60, C.I. Pigment Yellow 61, C.I. Pigment Yellow 65, C.I. Pigment Yellow 71, C.I. Pigment Yellow 73, C.I. Pigment Yellow 74, C.I. Pigment Yellow 81, C.I. Pigment Yellow 83, C.I. Pigment Yellow 93, C.I. Pigment Yellow 95, C.I. Pigment Yellow 97, C.I. Pigment Yellow 98, C.I. Pigment Yellow 100, C.I. Pigment Yellow 101, C.I. Pigment Yellow 104, C.I. Pigment Yellow 106, C.I. Pigment Yellow 108, C.I. Pigment Yellow 109, C.I. Pigment Yellow 110, C.I. Pigment Yellow 113, C.I. Pigment Yellow 114, C.I. Pigment Yellow 116, C.I. Pigment Yellow 117, C.I. Pigment Yellow 119, C.I. Pigment Yellow 120, C.I. Pigment Yellow 126, C.I. Pigment Yellow 127, C.I. Pigment Yellow 128, C.I. Pigment Yellow 129, C.I. Pigment Yellow 138, C.I. Pigment Yellow 139, C.I. Pigment Yellow 150, C.I. Pigment Yellow 151, C.I. Pigment Yellow 152, C.I. Pigment Yellow 153, C.I. Pigment Yellow 154, C.I. Pigment Yellow 155, C.I. Pigment Yellow 156, C.I. Pigment Yellow 166, C.I. Pigment Yellow 168, C.I. Pigment Yellow 175,

C.I. Pigment Orange 1, C.I. Pigment Orange 5, C.I. Pigment Orange 13, C.I. Pigment Orange 14, C.I. Pigment Orange 16, C.I. Pigment Orange 17, C.I. Pigment Orange 24, C.I. Pigment Orange 34, C.I. Pigment Orange 36, C.I. Pigment Orange 38, C.I. Pigment Orange 40, C.I. Pigment Orange 43, C.I. Pigment Orange 46, C.I. Pigment Orange 49, C.I. Pigment Orange 51, C.I. Pigment Orange 61, C.I. Pigment Orange 63, C.I. Pigment Orange 64, C.I. Pigment Orange 71, C.I. Pigment orange 73,

C.I. Pigment Violet 1, C.I. Pigment Violet 19, C.I. Pigment Violet 23, C.I. Pigment Violet 29, C.I. Pigment violet 32, C.I. Pigment Violet 36, C.I. Pigment violet 38,

C.I. Pigment Red 1, C.I. Pigment Red 2, C.I. Pigment Red 3, C.I. Pigment Red 4, C.I. Pigment Red 5, C.I. Pigment Red 6, C.I. Pigment Red 7, C.I. Pigment Red 8, C.I. Pigment Red 9, C.I. Pigment Red 10, C.I. Pigment Red 11, C.I. Pigment Red 12, C.I. Pigment Red 14, C.I. Pigment Red 15, C.I. Pigment Red 16, C.I. Pigment Red 17, C.I. Pigment Red 18, C.I. Pigment Red 19, C.I. Pigment Red 21, C.I. Pigment Red 22, C.I. Pigment Red 23, C.I. Pigment Red 30, C.I. Pigment Red 31, C.I. Pigment Red 32, C.I. Pigment Red 37, C.I. Pigment Red 38, C.I. Pigment Red 40, C.I. Pigment Red 41, C.I. Pigment Red 42, C.I. Pigment Red 48: 1, C.I. Pigment Red 48: 2, C.I. Pigment Red 48: 3, C.I. Pigment Red 48: 4, C.I. Pigment Red 49: 1, C.I. Pigment Red 49: 2, C.I. Pigment Red 50: 1, C.I. Pigment Red 52: 1, C.I. Pigment Red 53: 1, C.I. Pigment Red 57, C.I. Pigment Red 57: 1, C.I. Pigment Red 58: 2, C.I. Pigment Red 58: 4, C.I. Pigment Red 60: 1, C.I. Pigment Red 63: 1, C.I. Pigment Red 63: 2, C.I. Pigment Red 64: 1, C.I. Pigment Red 81: 1, C.I. Pigment Red 83, C.I. Pigment Red 88, C.I. Pigment Red 90: 1, C.I. Pigment Red 97, C.I. Pigment Red 101, C.I. Pigment Red 102, C.I. Pigment Red 104, C.I. Pigment Red 105, C.I. Pigment Red 106, C.I. Pigment Red 108, C.I. Pigment Red 112, C.I. Pigment Red 113, C.I. Pigment Red 114, C.I. Pigment Red 122, C.I. Pigment Red 123, C.I. Pigment Red 144, C.I. Pigment Red 146, C.I. Pigment Red 149, C.I. Pigment Red 150, C.I. Pigment Red 151, C.I. Pigment Red 166, C.I. Pigment Red 168, C.I. Pigment Red 170, C.I. Pigment Red 171, C.I. Pigment Red 172, C.I. Pigment Red 174, C.I. Pigment Red 175, C.I. Pigment Red 176, C.I. Pigment Red 177, C.I. Pigment Red 178, C.I. Pigment Red 179, C.I. Pigment Red 180, C.I. Pigment Red 185, C.I. Pigment Red 187, C.I. Pigment Red 188, C.I. Pigment Red 190, C.I. Pigment Red 193, C.I. Pigment Red 194, C.I. Pigment Red 202, C.I. Pigment Red 206, C.I. Pigment Red 207, C.I. Pigment Red 208, C.I. Pigment Red 209, C.I. Pigment Red 215, C.I. Pigment Red 216, C.I. Pigment Red 220, C.I. Pigment Red 224, C.I. Pigment Red 226, C.I. Pigment Red 242, C.I. Pigment Red 243, C.I. Pigment Red 245, C.I. Pigment Red 254, C.I. Pigment Red 255, C.I. Pigment Red 264, C.I. Pigment Red 265,

C.I. Pigment Blue 15, C.I. Pigment Blue 15: 3, C.I. Pigment Blue 15: 4, C.I. Pigment Blue 15: 6, C.I. Pigment blue 60,

C.I. Pigment Green 7, C.I. Pigment Green 36, C.I. Pigment Brown 23, C.I. Pigment brown 25, etc. are mentioned.

Among the above pigments, preferred pigments are C.I. Pigment Yellow 117, C.I. Pigment Yellow 128, C.I. Pigment Yellow 129, C.I. Pigment Yellow 150, C.I. Pigment Yellow 155, C.I. Pigment Yellow 185, C.I. Pigment Red 209, C.I. Pigment Red 242, C.I. Pigment Red 254, C.I. Pigment Black 1, C.I. Pigment black 7 and the like, and particularly preferably C.I. Pigment Yellow 150, C.I. Pigment Red 254, C.I. Pigment Black 1, C.I. Pigment Black 7.

The particle diameter of the pigment is preferably 0.005 to 0.2 µm, more preferably 0.01 to 0.1 µm. Pigments of related particle diameters can be produced, for example, by known methods such as kneading, sulfuric acid, alkali reduction dissolution.

The pigment can modify its surface with a polymer or the like. As a polymer, the polymer as described in Unexamined-Japanese-Patent No. 8-259876 etc., the polymer for various pigment dispersions commercially available, etc. are mentioned, for example. Specifically, an acrylic resin, vinyl chloride-vinyl acetate resin, maleic acid resin, ethyl cellulose resin, nitrocellulose resin, etc. are mentioned. As a form of the processed pigment processed with resin, the powder, paste form, and pellet form in which resin and pigment are disperse | distributed uniformly are preferable.

The content of the pigment in the colored photosensitive resin composition is usually 20% or more and 60% or less, preferably 30% or more and 60% or less in terms of mass fraction with respect to the solid content after the volatile components in the composition are volatilized.

Since the photosensitive composition of this invention can be made to contain a pigment in the state disperse | distributed uniformly by containing a pigment dispersant, and can obtain a uniformly colored coloring pattern, it is preferable to contain a pigment dispersant. Examples of such pigment dispersants include dispersants such as polyester polymer dispersants, acrylic polymer dispersants, polyurethane polymer dispersants, surfactants such as cationic surfactants, anionic surfactants, and nonionic surfactants. Each can be used individually or in combination of 2 or more types.

A binding resin (B) is a component which gives the colored photosensitive resin composition layer the property which the light non-irradiation area | region dissolves in a developing solution, and functions as a dispersion medium which disperse | distributes a pigment in a colored photosensitive resin composition layer or the formed coloring pattern.

As such a binder resin, for example, a polycondensation product of a compound of formula (1) with a polybasic acid (Japanese Patent Laid-Open No. Hei 4-355450, Japanese Patent Laid-Open No. Hei 9-40745, and Japanese Laid-Open Patent Publication) Japanese Patent Application Laid-Open No. 09-325494, Japanese Patent Application Laid-Open No. 2000-281738, or an acrylic copolymer.

In Formula 1 above,

R ¹ and R ² are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a halogen atom,

R ⁴ is a hydrogen atom or a methylene group,

X is a divalent residue represented by any one of Formulas 1a to 1g,

R ³ is an alkylene group having 1 to 10 carbon atoms which may have a substituent group,

m is an integer from 0 to 5,

n is an integer from 1 to 10.

As a C1-C10 alkylene group which may have a substituted group represented by R <^3> , a C1-C4 alkylene group is preferable.

The polycondensation product of the compound of formula (1) with polybasic acid is, for example, a product obtained by condensation of the compound of formula (1) with polybasic acid, or a product obtained by condensation polymerization of the compound of formula (1) with polybasic anhydride. Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, methyl terminal methylenetetrahydrophthalic acid, chloric acid, methyltetrahydrophthalic acid, trimellitic acid, pyromellitic acid and benzo Phenone tetracarboxylic acid, biphenyl tetracarboxylic acid, such as 4,4'- diphthalic acid, biphenyl ether tetracarboxylic acid, etc. are mentioned. Examples of the polybasic acid anhydride include anhydrides of the above polybasic acids. These polybasic acids or their anhydrides can be used individually or in mixture of 2 or more types, respectively.

The amount of polybasic acid or polybasic acid anhydride used in the condensation polymerization is preferably 5% or more and 95% or less, further 10% or more and 90% or less in terms of the molar ratio (molar ratio) to the total amount of the compound of Formula 1 and the polybasic or polybasic anhydride. Do. The acid value of the polycondensation product is preferably about 70 to 170, and further preferably about 80 to 140. Here, the acid value is a value measured by the amount (mg) of potassium hydroxide required to neutralize 1 g of the polycondensate, and is usually a value that can be obtained by titration using an aqueous potassium hydroxide solution.

As an acryl-type copolymer which can be used as a binder resin, the copolymer of a carboxyl group-containing monomer and another monomer copolymerizable with this is mentioned, for example.

As a carboxyl group-containing monomer, unsaturated carboxylic acid which has one or more carboxyl groups in molecule | numerators, such as unsaturated monocarboxylic acid and unsaturated polycarboxylic acid, such as unsaturated dicarboxylic acid and unsaturated tricarboxylic acid, is mentioned, for example. Here, as unsaturated monocarboxylic acid, acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example. Examples of the unsaturated dicarboxylic acid include maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid, and the like. The unsaturated polyvalent carboxylic acid may be an acid anhydride thereof, specifically maleic anhydride, itaconic anhydride, citraconic anhydride, or the like. In addition, the unsaturated polyvalent carboxylic acid may be a mono (2-methacryloyloxyalkyl) ester thereof, specifically, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2- Methacryloyloxymethyl), mono phthalic acid (2-acryloyloxyethyl), mono phthalic acid (2-methacryloyloxyethyl), and the like. The unsaturated polyvalent carboxylic acid may be a mono (meth) acrylate of both terminal dicarboxy polymers thereof, specifically, ω-carboxypolycaprolactone monoacrylate, ω-carboxypolycaprolactone monomethacrylate and the like. These carboxyl group-containing polymers can be used individually or in mixture of 2 or more types, respectively.

Other polymers copolymerizable with such carboxyl group-containing polymers include, for example, styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorstyrene, o-methoxystyrene, m- Methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p Aromatic vinyl compounds such as vinylbenzyl glycidyl ether and indene;

Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxy Ethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxy Hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate , 4-hydroxybutyl methacrylate, aryl acrylate, aryl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2 -Methoxyethyl acrylate, 2-methoxyethyl methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxy diethylene glycol acrylate, methoxy diethylene glycol methacrylate, Methoxy triethylene glycol acrylate, methoxy triethylene glycol methacrylate, methoxy propylene glycol acrylate, methoxy propylene glycol methacrylate, methoxy dipropylene glycol acrylate, methoxy dipropylene glycol methacrylate, iso Borylacrylate, isobornyl methacrylate, dicycle Pentadienyl acrylate, dicyclopentadienyl methacrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, glycerol monometha Unsaturated carboxylic esters such as acrylates,

2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxylic acid aminoalkyl such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate, 3-dimethylaminopropyl methacrylate Esters,

Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate, carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl lactate and vinyl benzoate;

Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, aryl glycidyl ether, vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile, vinylidene cyanide,

Unsaturated amides such as acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethyl acrylamide, N-2-hydroxyethyl methacrylamide,

Unsaturated imides such as maleimide, N-phenyl maleimide, N-cyclohexyl maleimide, aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene,

At the terminal of the polymer molecular chain of polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, polysiloxane, a monoacryloyl group or a monomethacryloyl group The macromonomer which has, etc. are mentioned. These monomers can be used individually or in mixture of 2 or more types, respectively.

Content of the carboxyl group-containing monomeric unit in such a copolymer is about 10 to 50% normally by mass fraction, Preferably it is about 15 to 40%.

Examples of such acrylic polymers include (meth) acrylic acid / methyl (meth) acrylate copolymers, (meth) acrylic acid / benzyl (meth) acrylate copolymers, and (meth) acrylic acid / 2-hydroxyethyl (meth) acrylates. Rate / benzyl (meth) acrylate copolymer, (meth) acrylic acid / methyl (meth) acrylate / polystyrene macro monomer-copolymer, (meth) acrylic acid / methyl (meth) acrylate / polyethyl methacrylate macro monomer- Copolymer, (meth) acrylic acid / benzyl (meth) acrylate / polystyrene macro monomer-copolymer, (meth) acrylic acid / benzyl (meth) acrylate / polymethyl methacrylate macro monomer-copolymer, (meth) acrylic acid / Benzyl (meth) acrylate / polymethyl methacrylate macromonomer-copolymer, (meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate / Polystyrene macro monomer-copolymer, (meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate / polymethyl methacrylate macro monomer-copolymer, methacrylic acid / styrene / benzyl (meth ) Acrylate / N-phenylmaleimide copolymer, (meth) acrylic acid / mono (2-acryloyloxyethyl) succinate / styrene / benzyl (meth) acrylate / N-phenylmaleimide copolymer, (meth) Acrylic acid / mono (2-acryloyloxyethyl) succinate / styrene / aryl (meth) acrylate / N-phenylmaleimide copolymer, (meth) acrylic acid / benzyl (meth) acrylate / N-phenylmaleimide / Styrene / glycerol mono (meth) acrylate copolymer etc. are mentioned. In addition, (meth) acrylate represents an acrylate or a methacrylate.

Especially, benzyl methacrylate / methacrylic acid copolymer, benzyl methacrylate / methacrylic acid / styrene copolymer, methyl methacrylate / methacrylic acid copolymer, methyl methacrylate / methacrylic acid / styrene copolymer Etc. are preferable.

The acrylic polymer preferably has a weight average molecular weight in the range of 3,000 to 400,000 in terms of polystyrene when measured by GPC (detector UV), and more preferably in the range of 5,000 to 100,000. Moreover, 30-250 are preferable and, as for an acid value, it is the range of 60-180 more preferably. Here, the acid value is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g, and is usually a value that can be obtained by titration using an aqueous potassium hydroxide solution.

Among these binding resins, polycondensates of the compound of formula (1) with polybasic acid are preferred, and polycondensates of polybasic acid with compounds wherein X is a divalent residue of formula (1a) in formula (1) are preferred.

Such a binder resin can be used in the range of usually 5% or more and 90% or less, preferably 10% or more and 60% or less in terms of mass fraction with respect to the solid content of the colored photosensitive resin composition.

The compound (C) having an ethylenically unsaturated bond and capable of addition polymerization is selected from, for example, a compound having at least one, preferably two or more ethylenically unsaturated bonds at the terminal, and may be a monomer, a dimer or a trimer. And prepolymers such as oligomers, or mixtures thereof or copolymers thereof.

Examples of the monomer include esters of unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, and maleic acid with aliphatic polyhydric alcohol compounds, amides of unsaturated carboxylic acids with aliphatic polyamine compounds, and the like. Can be.

As ester of unsaturated carboxylic acid and aliphatic polyhydric alcohol compound, for example, ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, tetramethylene glycol diacrylate, propylene glycol diacrylate, neo Pentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate, Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol Tetraacrylate Acrylate esters such as hydrate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer,

Tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentylglycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1,3 Butanediol dimethacrylate, hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythrate Lithol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy-2-hydroxypropoxy) phenyl] dimethylmethane, bis [p- (methacryloxye Methacrylic acid esters such as methoxy) phenyl] dimethylmethane,

Ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate, sorbitol tetradiitaconate, etc. Itaconic acid ester,

Ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, crotonic acid ester of sorbitol tetradicrotonate, etc.,

Isocrotonic acid esters such as ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, sorbitol tetraisocrotonate, ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, sorbitol tetramal Maleic acid ester, such as a rate, etc. are mentioned.

Examples of the amide of the unsaturated carboxylic acid and the aliphatic polyamine compound include methylenebis-acrylamide, methylenebis-methacrylamide, 1,6-hexamethylenebis-acrylamide, 1,6-hexamethylenebis-methacrylamide, Diethylene triamine tris acrylamide, xylene bis acrylamide, xylene bis methacrylamide, etc. are mentioned.

As another example of a monomer, the vinylurethane compound etc. which are obtained by adding the vinyl monomer of Formula 2 to the polyisocyanate compound which has two or more isocyanate groups in 1 molecule, for example are mentioned.

In Formula 2 above,

R ²¹ and R ²² are each independently a hydrogen atom or a methyl group.

Such a vinylurethane compound is a compound containing two or more polymerizable vinyl groups in 1 molecule (Japanese Patent Publication No. 48-41708). Urethane acrylates as described in JP-A-51-37193, JP-A-48-64183, JP-A-49-43191, JP-A-JP Polyfunctional acrylates and methacrylates, such as polyester acrylates as described in (S) 52-30490, are also mentioned. What was introduced as a photocurable monomer and oligomer in the 20th edition of Japan Adhesion Association No. 20, 7th, pages 300-308 (1984) can also be used.

The amount of the compound having an ethylenically unsaturated bond and capable of addition polymerization is usually 0.5% or more and 50% or less, preferably 5% or more and 20% or less in terms of mass fraction with respect to the solid content of the composition.

It does not specifically limit as a photoinitiator (D) as long as it is a compound which has an ethylenically unsaturated bond and can start superposition | polymerization of a compound which can be addition polymerization, An acetophenone type photoinitiator, a benzoin type photoinitiator, a benzophenone type photoinitiator, T An oxanthone type photoinitiator, a triazine type photoinitiator, an oxadiazole type photoinitiator, etc. can be used.

As an acetophenone type photoinitiator, for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-2-methyl-1- [4 -(2-hydroxyethoxy) phenyl] propan-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl- (4-methylthiophenyl) -2-morpholino-1-propane-1- On, 2-methyl-2-morpholino-1- (4-methylthiophenyl) propan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1- Oligomers of on, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propan-1-one, and the like.

As a benzoin type photoinitiator, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, etc. are mentioned, for example.

As a benzophenone type photoinitiator, a benzophenone, o-benzoyl methylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'-tetra ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, etc. are mentioned.

As a thioxanthone type photoinitiator, 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-4- Propoxy city oxanthone etc. are mentioned.

As a triazine photoinitiator, for example, 2, 4-bis (trichloromethyl) -6-p-methoxy styryl-s-triazine, 2, 4-bis (trichloromethyl) -6- (1 -p-dimethylaminophenyl-1,3-butadienyl) -s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, 2- (naphtho -1-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (4-methoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-tri Azine, 2- (4-ethoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (4-butoxy-naphtho-1-yl) -4 , 6-bis-trichloromethyl-s-triazine, 2- [4- (2-methoxyethyl) -naphtho-1-yl] -4,6-bis-trichloromethyl-s-triazine, 2- [4- (2-ethoxyethyl) -naphtho-1-yl] -4,6-bis-trichloromethyl-s-triazine, 2- [4- (2-butoxyethyl) -naph To-1-yl] -4,6-bis-trichloromethyl-s-triazine, 2- (2-methoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s- Triazine, 2- (6-methoxy-5-methyl- Proto-2-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (6-methoxy-naphtho-2-yl) -4,6-bis-trichloromethyl-s- Triazine, 2- (5-methoxy-naphtho-2-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (4,7-dimethoxy-naphtho-1-yl ) -4,6-bis-trichloromethyl-s-triazine, 2- (6-ethoxy-naphtho-2-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (4,5-dimethoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine, 4- [pN, N-di (ethoxycarbonylmethyl) aminophenyl]- 2,6-di (trichloromethyl) -s-triazine, 4- [o-methyl-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl)- s-triazine, 4- [pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-methyl-pN, N-di ( Chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- (pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (pN-ethoxycarbonyl Tylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- [pN, N-di (phenyl) aminophenyl] -2,6-di (trichloromethyl) -s-tri Azine, 4- (pN-chloroethylcarbonylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- [pN- (p-methoxyphenyl) carbonylaminophenyl] -2 , 6-di (trichloromethyl) -s-triazine, 4- [mN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-bromo-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-chloro-pN, N -Di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-fluoro-pN, N-di (ethoxycarbonylmethyl) amino Phenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-bromo-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloro) Rhomethyl) -s-triazine, 4- [o-chloro-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichlorome Yl) -s-triazine, 4- [o-fluoro-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-bromo-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-chloro-pN, N-di (chloroethyl ) Aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-fluoro-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloro Methyl) -s-triazine, 4- [m-bromo-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m- Chloro-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-fluoro-pN, N-di (chloroethyl) aminophenyl ] -2,6-di (trichloromethyl) -s-triazine, 4- (m-bromo-pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s- Triazine, 4- (m-chloro-pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (m-flu R-pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-bromo-pN-ethoxycarbonylmethylaminophenyl) -2, 6-di (trichloromethyl) -s-triazine, 4- (o-chloro-pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-Flumo-pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (m-bromo-pN-chloroethylaminophenyl) -2 , 6-di (trichloromethyl) -s-triazine, 4- (m-chloro-pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (m -Fluoro-pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-bromo-pN-chloroethylaminophenyl) -2,6-di ( Trichloromethyl) -s-triazine, 4- (o-chloro-pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-fluoro-pN -Chloroethylaminophenyl) -2,6-di (trichloromethyl) -s- And the like Liao Jin.

Examples of the oxadiazole-based photopolymerization initiator include 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (p-cyanostyryl) -1,3, 4-oxadiazole, 2-trichloromethyl-5- (p-methoxystyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (p-butoxystyryl)- 1,3,4-oxadiazole, 2-trichloromethyl-5- (p-hydroxystyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (p-chlorosty Ryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (p-methoxyphenyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (p- Butoxyphenyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (2-naphthyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (β -(2-benzofuryl) vinyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (β- (6-methoxy-2-benzofuryl) vinyl) -1,3,4 -Oxadiazole, 2-trichloromethyl-5- (2-benzofuryl) -1,3,4-oxadiazole, etc. are mentioned.

Further, for example, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenyl-1, as a photopolymerization initiator, 2'-biimidazole, 10-butyl- 2-chloroacridone, 2-ethyl anthraquinone, benzyl, 9, 10- phenanthrene quinone, camphor quinone, methyl phenylglyoxylate, a titanocene compound, etc. are mentioned. have.

In the said photoinitiator, the triazine type photoinitiator which the trichloromethyl group introduce | transduced, and the oxadiazole type photoinitiator which the trichloromethyl group introduce | transduced are used preferably.

As a triazine type photoinitiator into which the trichloromethyl group is introduce | transduced, it is 2, 4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1, 3, 5- triazine, 2, 4-, for example. Bis (trichloromethyl) -6- (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5- Triazine, 2,4-bis (trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl]- 1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine, 2 , 4-bis (trichloromethyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine and the like.

Examples of the oxadiazole-based photopolymerization initiator into which the trichloromethyl group is introduced include 2-trichloromethyl-5-styryl-1,3,4-oxadiazole and 2-trichloromethyl-5- (p-sia Nostiryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (p-methoxystyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- ( p-butoxystyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (β- (2-benzofuryl) vinyl) -1,3,4-oxadiazole, etc. are mentioned. Can be.

These photoinitiators can be used individually or in combination of 2 types or more, respectively.

The coloring photosensitive resin composition may contain a photoinitiator. Examples of the photopolymerization start adjuvant include triethanolamine, methyldiethanolamine, triisopropanolamine, 4-dimethylaminomethyl benzoate, 4-dimethylaminoethyl benzoate, 4-dimethylaminoisoamyl benzoate, and 4-dimethylamino 2 -Ethylhexyl benzoate, 2-dimethylaminoethyl benzoate, N, N-dimethyl paratoluidine, 4,4'-bis (dimethylamino) benzophenone (commonly known as kehlorton), 4,4'-bis (diethyl Amino) benzophenone, 9, 10- dimethoxy anthracene, 2-ethyl-9, 10- dimethoxy anthracene, 9, 10- diethoxy anthracene, 2-ethyl-9, 10- diethoxy anthracene, etc. are mentioned. These photoinitiators can be used individually or in combination of 2 types or more, respectively.

When using such a photoinitiator, the usage-amount is normally 0.01 mol or more and 10 mol or less with respect to 1 mol of photoinitiators. The total amount of the photopolymerization initiator and the photopolymerization initiation aid is usually 1% or more and 50% or less, preferably 3% or more and 15% or less in terms of mass fraction with respect to the solid content of the colored photosensitive resin composition.

The colored photosensitive resin composition may contain additives such as a thermal polymerization inhibitor, a filler, a polymer compound other than the binder resin, a surfactant, an adhesion promoter, an antioxidant, an ultraviolet absorber, and an anti-agglomerating agent.

A thermal polymerization inhibitor is contained in order to prevent the compound (C) which has one or more ethylenically unsaturated bonds and can add-polymerize, for example during storage of a coloring photosensitive resin composition. Such thermal polymerization inhibitors include, for example, halidequinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogarol, t-butylcatechol, benzoquinone, 4,4'-thiobis ( 3-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine 1st cerium salt, etc. are mentioned. When it contains a heat polymerization inhibitor, the content is about 0.01% or more and 5% or less normally in a mass fraction with respect to the whole quantity of a coloring photosensitive resin composition.

As a filler, glass, alumina, etc. are mentioned, for example.

Examples of the high molecular compound other than the binder resin include polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, and the like.

The surfactant may be any one of a nonionic surfactant, a cationic surfactant, and an anionic surfactant.

Examples of the adhesion promoter include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N -(2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltri Methoxysilane, etc. are mentioned.

As antioxidant, 2, 2- thiobis (4-methyl-6-t-butylphenol), 2, 6- di-t- butylphenol, etc. are mentioned, for example.

As a ultraviolet absorber, 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole, alkoxy benzophenone, etc. are mentioned, for example. As an aggregation inhibitor, sodium polyacrylate etc. are mentioned, for example.

The colored photosensitive resin composition may contain an organic carboxylic acid, an organic amino compound, or the like.

As the organic carboxylic acid, for example, aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, capronic acid, diethyl acetic acid, enanthic acid, caprylic acid,

Fisheries, maronic acid, succinic acid, glutaric acid, adipic acid, pimeric acid, sublinic acid, azelaic acid, sebacic acid, brassylic acid, methylmaronic acid, ethylmaronic acid, dimethylmaronic acid, methylsuccinic acid, tetramethyl Aliphatic dicarboxylic acids such as succinic acid and citraconic acid,

Aliphatic tricarboxylic acids such as tricarbaric acid, aconitoic acid and camhoronic acid, aromatic monocarboxylic acids such as benzoic acid, toluic acid, xmic acid, hemeric acid, mesitylene acid,

Aromatic polycarboxylic acids such as phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, trimesic acid, melanoic acid, pyromellitic acid, phenylacetic acid, hydroatroic acid, hydrocinnamic acid, mandelic acid, phenylsuccinic acid, atroic acid, Low molecular weight organic carboxylic acids having a molecular weight of 1,000 or less, such as cinnamic acid, methyl cinnamate, benzyl cinnamate, cinnamylidene acetic acid, kumaric acid, and umbellularic acid.

As the organic amino compound, a low molecular weight organic amino compound having a molecular weight of 1,000 or less is usually used. For example, n-propylamine, isopropylamine, n-butylamine, isobutylamine, t-butylamine, n-pentylamine, n -Hexylamine, n-heptylamine, n-octylamine, n-nonylamine, n-disylamine, n-undecylamine, n-dodecylamine, cyclohexylamine, o-methylcyclohexylamine, m-methyl Mono (cyclo) alkylamines such as cyclohexylamine, p-methylcyclohexylamine, o-ethylcyclohexylamine, m-ethylcyclohexylamine, p-ethylcyclohexylamine,

Methyl ethylamine, diethylamine, methyl n-propylamine, ethyl n-propylamine, di-n-propylamine, diisopropylamine, di-n-butylamine, diisobutylamine, di-t Di (cyclo) alkylamines such as -butylamine, di-n-pentylamine, di-n-hexylamine, methyl cyclohexylamine, ethyl cyclohexylamine, dicyclohexylamine,

Dimethyl ethylamine, methyl diethylamine, triethylamine, dimethyl n-propylamine, diethyl n-propylamine, methyl di-n-propylamine, ethyl di-n-propylamine, tri- n-propylamine, triisopropylamine, tri-n-butylamine, triisobutylamine, tri-t-butylamine, tri-n-pentylamine, tri-n-hexylamine, dimethylcyclohexylamine, di Tri (cyclo) alkylamines such as ethylcyclohexylamine, methyl dicyclohexylamine, ethyl dicyclohexylamine, tricyclohexylamine,

2-aminoethanol, 3-amino-1-propanol, 1-amino-2-propanol, 4-amino-1-butanol, 5-amino-1-pentanol, 6-amino-1-hexanol, 4-amino Mono (cyclo) alkanolamines such as -1-cyclohexanol,

Diethanolamine, di-n-propanolamine, diisopropanolamine, di-n-butanolamine, diisobutanolamine, di-n-heptanolamine, di-n-hexanolamine, di (4-cyclohexanol Di (cyclo) alkanolamines such as amines,

Triethanolamine, tri-n-propanolamine, triisopropanolamine, tri-n-butanolamine, triisobutanolamine, tri-n-pentanolamine, tri-n-hexanolamine, tri (4-cyclohexanol) Tri (cyclo) alkanolamines such as amines,

3-amino-1,2-propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol, 4-amino-1,3-butanediol, 4-amino-1,2- Cyclohexanediol, 4-amino-1,3-cyclohexanediol, 3-dimethylamino-1,2-propanediol, 3-diethylamino-1,2-propanediol, 2-dimethylamino-1,3- Amino (cyclo) alkanediols such as propanediol and 2-diethylamino-1,3-propanediol,

1-aminocyclopentanmethanol, 4-aminocyclopentanmethanol, 1-aminocyclohexanemethanol, 4-aminocyclohexanemethanol, 4-dimethylaminocyclopentanmethanol, 4-diethylaminocyclopentanmethanol, 4-dimethylaminocyclo Amino group-containing cycloalkanethanols such as hexanemethanol and 4-diethylaminocyclohexanemethanol,

β-alanine, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid, 3-aminoisobutyric acid, 2-aminovaleric acid, 5-aminovaleric acid, 6-aminocaproic acid, 1 And aminocarboxylic acids such as aminocyclopropanecarboxylic acid, 1-aminocyclohexanecarboxylic acid, and 4-aminocyclohexanecarboxylic acid.

Moreover, the compound etc. which the amino group couple | bonded with the phenyl group directly, the amino group couple | bonded with the phenyl group via a carbon chain, etc. are mentioned, for example. Examples of the compound in which the amino group is directly bonded to the phenyl group include aniline, o-methylaniline, m-methylaniline, p-methylaniline, p-ethylaniline, pn-propylaniline, p-isopropylaniline, pn-butylaniline aromatic amines such as pt-butylaniline, 1-naphthylamine, 2-naphthylamine, N, N-dimethylaniline, N, N-diethylaniline, p-methyl-N, N-dimethylaniline,

aminobenzyl alcohols such as o-aminobenzyl alcohol, m-aminobenzyl alcohol, p-aminobenzyl alcohol, p-dimethylaminobenzyl alcohol and p-diethylaminobenzyl alcohol,

aminophenols such as o-aminophenol, m-aminophenol, p-aminophenol, p-dimethylaminophenol and p-diethylaminophenol,

and aminobenzoic acids (derivatives) such as m-aminobenzoic acid, p-aminobenzoic acid, p-dimethylaminobenzoic acid and p-diethylaminobenzoic acid.

These organic carboxylic acids and organic amino compounds are used individually or in mixture of 2 or more types, respectively. When using such an organic carboxylic acid and an organic amino compound, its content in a coloring photosensitive resin composition is normally 0.001% or more and 15% or less by mass ratio with respect to a coloring photosensitive resin composition, Preferably it is 0.01% or more and 10% or less.

The said colored photosensitive resin composition is apply | coated on the board | substrate 2 in the state normally diluted with the solvent (FIG. 2A). Examples of the solvent include esters, ethers, ketones and aromatic hydrocarbons.

As esters, for example, ethyl acetate, n-butyl acetate, isobutyl acetate, amine formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, alkyl esters and methyl lactate , Ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl ethoxyacetate, butyl acetate, ethoxyacetate, ethyl ethoxyacetate, methyl 3-oxypropionate, 3-oxy 3-oxypropionic acid alkyl esters such as ethyl propionate,

Methyl 3-methoxy propionate, 3-methoxy ethylpropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, 2-methoxy Methyl propionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate , 2-methoxy-2-methylpropionate, 2-ethoxy-2-methylpropionate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutyrate, 2-oxo Ethyl butane, and the like.

As ethers, for example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl vertical sorbate acetate, ethyl vertical sorbate acetate, diethylene glycol monomethyl ether, diethylene glycol Monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate and the like.

As ketones, methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc. are mentioned, for example. As aromatic hydrocarbons, toluene, xylene, etc. are mentioned, for example.

Among the above solvents, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cersorbate acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, 3-methoxypropionate methyl, 2-heptane, cyclohexanone, Ethyl carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether acetate and the like are preferably used.

These solvents can be used individually or in mixture of 2 or more types, respectively, and the usage-amount is chosen so that the density | concentration of solid content in a coloring photosensitive resin composition may be 2 to 50% of a range by mass fraction normally.

The solution of the coloring photosensitive resin composition containing such a pigment (A), a binder resin (B), an ethylenically unsaturated bond, and a compound (C) capable of addition polymerization and a photopolymerization initiator (D) is, for example, a rotary coating method (spinning Coating on the substrate 2 by a common coating method such as a coating method, a casting method, a roll coating method, or the like.

As the board | substrate 2, resin board | substrates, such as a polycarbonate board | substrate, a polyester board | substrate, an aromatic polyamide board | substrate, a polyamideimide board | substrate, and a polyimide board | substrate, can be used besides a glass substrate, a silicon substrate, etc., for example. Such a substrate may be subjected to pretreatment such as chemical treatment with a chemical such as a silane coupling agent, plasma treatment, ion plating treatment, sputtering treatment, vapor phase reaction treatment, vacuum deposition treatment, or the like.

After apply | coating a coloring photosensitive resin composition solution on the board | substrate 2 as mentioned above, it dries and volatilizes a solvent, and the coloring photosensitive resin composition layer 1 is formed on a board | substrate (FIG. 2 (a)). The said layer is a layer which consists of solid content of a coloring photosensitive resin composition, The thickness is 0.1-10 micrometers normally, Preferably it is 0.2-5.0 micrometers, Especially preferably, it is 0.2-3.0 micrometers.

Next, the light ray 4 is irradiated to the coloring photosensitive resin composition layer 1 through the photomask 3 (FIG. 2 (b)).

The photomask 3 is provided with the light shielding layer 32 on the surface of the glass plate 31 etc., for example. The light ray 4 is shielded by the light shielding layer. The part in which the light shielding layer was not provided in the glass plate is the light-transmitting part 33, the light ray passes through the light-transmitting part, it is irradiated to the coloring photosensitive resin composition layer 1, and the layer 1 is exposed according to the pattern of the said light-transmitting part. .

As the light ray 4, ultraviolet rays such as g line (wavelength 436 nm) and i line (wavelength 365 nm) are usually used. It is preferable that a light ray becomes parallel light and irradiates to the coloring photosensitive resin composition layer 1, Usually, it irradiates through a mask aligner (not shown) and the like. According to the forming method of the present invention, since a colored pattern is formed at a high resolution, for example, a width of about 20 μm or less, further about 10 μm or less, particularly 5 μm or less can be easily stabilized and formed. Can be.

The amount of irradiation of the light rays may include the color and content of the pigment (A) used, the type and content of the binder resin (B), the type and content of the compound (C) having at least one ethylenically unsaturated bond and capable of addition polymerization, and the photopolymerization initiator (D Although it is suitably selected according to the kind, content, etc. of this), according to the formation method of this invention, since the coloring pattern 5 can be formed with high sensitivity, the irradiation amount of a short time may be compared with the normal formation method of the coloring pattern.

It develops after exposure (FIG. 2C). What is necessary is just to contact the developing solution with the coloring photosensitive resin composition layer 1 after exposure in image development. By making it contact with a developing solution, the light non-irradiated area | region 11 which was not irradiated to the light ray in a colored photosensitive resin composition layer melt | dissolves in a developing solution.

As a developing solution, alkaline aqueous solution can be used, for example. As alkaline aqueous solution, for example, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, ammonia water, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline Aqueous solutions of water-soluble alkali compounds such as, pyrrole, piperidine, and 1,8-diazabicyclo- [5,4,0] -7-undecene are used, and the concentration is usually 0.001 in mass fraction relative to the alkaline aqueous solution. % Or more and 10% or less, preferably 0.01% or more and about 1% or less. Such alkaline aqueous solution may contain the organic solvent, surfactant, etc. of aqueous solutions, such as methanol and ethanol. An organic solvent can be used as a developing solution, For example, it can also use combining the above-mentioned organic solvent suitably as a solvent used for diluting a coloring photosensitive resin composition.

The image development method is not specifically limited, For example, it can develop by methods, such as the dip image development method (dipping development method), the spray image development method, the spray image development method, and the paddle image development method (liquid carrier development method). Developing temperature is the range of 10-40 degreeC normally, and developing time is 10 to 300 second normally.

By image development, the light non-irradiated area | region 11 which was not irradiated to the light ray in the colored photosensitive resin composition layer is melt | dissolved in a developing solution, and is removed. On the other hand, the light irradiation region 12 irradiated with the light rays remains to constitute the coloring pattern 5.

In the formation method of this invention, in the said image development, the unirradiated area | region 11 of the coloring photosensitive resin composition layer was melt | dissolved at 10 nm / sec or more and 60 nm / sec or less, Preferably it is 50 nm / sec or less It is dissolved in the developer. Here, the dissolution rate r is a rate obtained by the formula (1) from the thickness (t) of the colored photosensitive resin composition layer (1) and the time (T) required for dissolving the layer in the developer.

In order to melt | dissolve in a developing solution at such a dissolution rate, when using alkaline aqueous solution as a developing solution, what is necessary is just to select the density | concentration of the alkali compound of the aqueous solution, the temperature of a developing solution, etc. suitably. Specifically, the dissolution rate can be lowered by decreasing the concentration of the alkali compound, and the dissolution rate can be lowered by lowering the developing temperature.

In addition, since a potassium hydroxide aqueous solution containing about 0.05% of potassium hydroxide in a mass fraction is usually used at 23 degreeC as a developing solution, the coloring photosensitive resin composition layer formed on a board | substrate is 23 degreeC in the said potassium hydroxide aqueous solution. The colored photosensitive resin composition which melt | dissolves at the dissolution rate of 10 nm / sec or more and 60 nm / sec or less, Preferably it is 50 nm / sec or less, can also be used. The colored photosensitive resin composition which can be melt | dissolved at such a dissolution rate can be prepared by selecting the usage-amount (content in a coloring photosensitive resin composition) of binder resin (B) suitably, for example, the usage-amount of binder resin (B). It can prepare by making (content in a coloring photosensitive resin composition) 1.5 mass times or more and 5 mass times or less with respect to the compound (C) which can add-polymerize with ethylenically unsaturated bond.

After image development, the coloring pattern 5 is obtained by drying (FIG. 2C), and when alkaline aqueous solution is used as a developing solution, after washing, after image development, it is dried normally. After drying, it can also heat-process further.

In this way, although a coloring pattern is obtained, according to the formation method of this invention, since the sensitivity in exposure is favorable, an exposure time can be shortened and since the resolution is good, even a fine coloring pattern can be formed easily.

Furthermore, the color of the pigment (A) contained in a coloring photosensitive resin composition is changed, and the coloring photosensitive resin composition layer 1 'is formed again on the board | substrate 2 (FIG. 3A), and the photomask is applied to the layer 1'. After the light ray 4 is irradiated and exposed through (3) (FIG. 3B), it develops and the coloring pattern 5 'of a different color can be formed further. By repeating the above operation while changing the color of the pigment (A) containing the colored photosensitive resin composition (Fig. 4), the pixel 5 " of another color can be further formed, whereby the desired color filter 6 is formed. Can be obtained.

According to the formation method of this invention, a coloring pattern can be formed with high sensitivity and a resolution.

Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited by these Examples.

Example 1

[Production of Colored Photosensitive Resin Composition]

52 mass parts of pigments (A) [40 mass parts of black pigments (C.I. pigment black 7) and 12 mass parts of dispersing agents],

32 mass parts of coupling resins (B) [50 mass parts of compounds of General formula 3, and 17 mass parts of 4,4'- diphthalic anhydrides, acid value 100],

11 parts by mass of a compound (C) (dipentaerythritol hexaacrylate) having an ethylenically unsaturated bond and capable of addition polymerization;

5.0 parts by mass of a photopolymerization initiator (D) [2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine] and

374 mass parts of solvents (propylene glycol monomethyl ether acetate) were mixed, and the coloring photosensitive resin composition (black) was obtained.

[Formation of Colored Photosensitive Resin Composition Layer]

The colored photosensitive resin composition obtained above is apply | coated to the surface of a glass substrate (made by "# 7059" Corning Corporation) 2, by a spin coating method, it heats and heats at 100 degreeC for 3 minutes, and the colored photosensitive resin composition layer 1 is board | substrate (2) formed on. The thickness of the coloring photosensitive resin composition layer after this drying was 1.2 micrometers.

[Formation of Colored Pattern (Evaluation of Resolution)]

The ultraviolet-ray was irradiated to the board | substrate 2 in which the coloring photosensitive resin composition layer 1 was formed above through the photomask 3, and the ultraviolet-ray was irradiated with the ultra-high pressure mercury lamp (the irradiation amount is 400mJ / cm <2>), and it exposed. As the optical mask 3, line widths of 3 占 퐉, 4 占 퐉, 5 占 퐉, 6 占 퐉, 7 占 퐉, 8 占 퐉, 9 占 퐉, 10 占 퐉, 20 占 퐉, 30 占 퐉, 40 占 퐉, 50 占 퐉 and 100 占 퐉 are provided. And an optical mask for forming the colored pattern 5 in the interval).

The colored photosensitive resin composition layer after exposure was developed by immersing for 90 seconds in the developing solution (aqueous solution containing 23% of potassium hydroxide as a mass fraction and containing a nonionic surfactant, 23 degreeC).

After image development, the resultant was washed with water and heated at 230 ° C. for 20 minutes to form a black colored pattern (black matrix) on the substrate 2. When this black matrix was observed with the optical microscope, the coloring pattern with a line width of 3 micrometers was formed with high reproducibility.

[Evaluation of sensitivity]

The following method evaluated the minimum light irradiation amount which the thickness of a light irradiation area does not change in image development as a sensitivity.

The ultraviolet-ray was irradiated with the ultra-high pressure mercury lamp, and exposed through the photomask 3 to the coloring photosensitive resin composition layer 1 formed on the board | substrate as mentioned above. In exposure, the light mask of the range of 4-400 mJ / cm <2> was irradiated using the light mask 3 which consists only of a light transmission part, and whose transmittance changed to step shape.

Subsequently, the above-mentioned colored photosensitive resin composition layer was developed by immersion for 90 seconds in the same developing solution as used above, and the minimum light irradiation amount (100mJ / cm 2) of the developed light irradiation region 12 without changing its thickness. Was the sensitivity. Table 1 describes the sensitivity.

[Evaluation of Dissolution Rate of Colored Photosensitive Resin Composition Layer]

The coloring photosensitive resin composition layer 1 formed on the board | substrate 2 as mentioned above was developed by immersing in developing solution (an aqueous solution which contains 0.05% of potassium hydroxide as a mass fraction and containing a nonionic surfactant, 23 degreeC). . The immersion time used the time until the colored photosensitive resin composition layer disappear | disappears completely at the interval of 1 second from 0 second to 120 second, and computed the dissolution rate from this elution time and the thickness of the colored photosensitive resin composition layer. The results are shown in Table 1.

Example 2

[Preparation of colored photosensitive resin composition and formation of colored photosensitive resin composition layer]

Example 1 except that 32 mass parts of binder resin [50 mass parts of compounds of Formula 3 and 15 mass parts of benzophenone tetracarboxylic dianhydride, acid value 103] were used instead of the binder resin used. In the same manner as the above, a colored photosensitive resin composition (black) was obtained, and the colored photosensitive resin composition layer (thickness 1.2 micrometers) was formed.

[evaluation]

The same procedure as in Example 1 was conducted except that the substrate on which the colored photosensitive resin composition layer obtained above was formed was used instead of the substrate 2 on which the colored photosensitive resin composition layer 1 obtained in Example 1 was formed. The speed was calculated and the sensitivity was evaluated. The results are shown in Table 1.

[Formation of Colored Pattern (Evaluation of Resolution)]

A black colored pattern (black matrix) was formed on the substrate 2 in the same manner as in Example 1, except that the colored photosensitive resin composition obtained above was used instead of the colored photosensitive resin composition obtained in Example 1. . When this black matrix was observed with the optical microscope, the coloring pattern with a line width of 3 micrometers was formed with high reproducibility. The results are shown in Table 1.

Example 3

[Preparation of colored photosensitive resin composition and formation of colored photosensitive resin composition layer]

Instead of the binder resin used in Example 1, the same as in Example 1, except that 32 parts by mass of a binder resin [50 parts by mass of the compound of Formula 3 and 25 parts by mass of tetrahydrophthalic anhydride, acid value thereof] was used. It operated so that the coloring photosensitive resin composition (black) was obtained, and the coloring photosensitive resin composition layer (thickness 1.2 micrometers) was formed.

[evaluation]

The dissolution rate was obtained in the same manner as in Example 1, except that the substrate on which the colored photosensitive resin composition layer obtained above was formed was used instead of the substrate 2 on which the colored photosensitive resin composition layer 1 obtained in Example 1 was formed. Was calculated and the sensitivity was evaluated. The results are shown in Table 1.

[Formation of Colored Pattern (Evaluation of Resolution)]

A black colored pattern (black matrix) was formed on the substrate 2 in the same manner as in Example 1, except that the colored photosensitive resin composition obtained above was used instead of the colored photosensitive resin composition obtained in Example 1. . When this black matrix was observed with the optical microscope, the coloring pattern with a line width of 3 micrometers was formed with high reproducibility. The results are shown in Table 1.

Comparative Example 1

[Preparation of colored photosensitive resin composition and formation of colored photosensitive resin composition layer]

A colored photosensitive resin composition (black) was obtained in the same manner as in Example 1 except that the amount of the binder resin was 21 parts by mass and the amount of dipentaerythritol hexaacrylate was 22 parts by mass to obtain a colored photosensitive resin composition (black). The resin composition layer (thickness 1.2 micrometers) was formed.

[evaluation]

The dissolution rate was obtained in the same manner as in Example 1, except that the substrate on which the colored photosensitive resin composition layer obtained above was formed was used instead of the substrate 2 on which the colored photosensitive resin composition layer 1 obtained in Example 1 was formed. Was calculated and the sensitivity was evaluated. The results are shown in Table 1.

[Formation of Colored Pattern (Evaluation of Resolution)]

A black colored pattern (black matrix) was formed on the substrate 2 in the same manner as in Example 1, except that the colored photosensitive resin composition obtained above was used instead of the colored photosensitive resin composition obtained in Example 1. . When this black matrix was observed with the optical microscope, the coloring pattern with a line width of 30 micrometers or more was formed with high reproducibility, but the coloring pattern with a line width of 20 micrometers or less did not form high reproducibility. The results are shown in Table 1.

Yes (B) / (C) Sensitivity (mJ / ㎠) Resolution (μm) Dissolution Rate (nm / sec) Example 1 32/11 100 3 16 Example 2 32/11 120 3 20 Example 3 32/11 110 3 22 Comparative Example 1 21/22 150 30 120

(B) / (C): Usage ratio (mass ratio) of binding resin and dipentaerythritol hexaacrylate

Example 4

A copolymer of benzyl methacrylate and methacrylic acid instead of the binder resin (B) used in Example 1 (content of the benzyl methacrylate unit is 65% in mole fraction, and content of the methacrylic acid unit is 35% in mole fraction) The weight average molecular weight was used in the same manner as in Example 1 except that 28 parts by mass of 9700) was used, and the amount of dipentaerythritol hexaacrylate was set to 15 parts by mass to obtain a colored photosensitive resin composition (black). And the coloring photosensitive resin composition layer (thickness 1.2 micrometers) were formed.

[evaluation]

The dissolution rate was obtained in the same manner as in Example 1, except that the substrate on which the colored photosensitive resin composition layer obtained above was formed was used instead of the substrate 2 on which the colored photosensitive resin composition layer 1 obtained in Example 1 was formed. Was calculated and the sensitivity was evaluated. The results are shown in Table 1.

[Formation of Colored Pattern (Evaluation of Resolution)]

A black colored pattern (black matrix) was formed on the substrate 2 in the same manner as in Example 1, except that the colored photosensitive resin composition obtained above was used instead of the colored photosensitive resin composition obtained in Example 1. . When this black matrix was observed with the optical microscope, although the line width of 10 micrometers and the coloring pattern exceeding this were formed with high reproducibility, the coloring pattern with a line width of 9 micrometers or less was not formed with high reproducibility. The results are shown in Table 2.

Comparative Example 2

[Preparation of colored photosensitive resin composition and formation of colored photosensitive resin composition layer]

A colored photosensitive resin composition was produced in the same manner as in Example 4 except that the amount of the copolymer of benzyl methacrylate and methacrylic acid was 21 parts by mass and the amount of dipentaerythritol hexaacrylate was set to 22 parts by mass. (Black) was obtained, and the coloring photosensitive resin composition layer (thickness 1.2 micrometers) was formed.

[evaluation]

The dissolution rate was obtained in the same manner as in Example 1, except that the substrate on which the colored photosensitive resin composition layer obtained above was formed was used instead of the substrate 2 on which the colored photosensitive resin composition layer 1 obtained in Example 1 was formed. Was calculated and the sensitivity was evaluated. The results are shown in Table 1.

[Formation of Colored Pattern (Evaluation of Resolution)]

A black colored pattern (black matrix) was formed on the substrate 2 in the same manner as in Example 1, except that the colored photosensitive resin composition obtained above was used instead of the colored photosensitive resin composition obtained in Example 1. . When this black matrix was observed with the optical microscope, the coloring pattern with a line width of 50 micrometers or more was formed with high reproducibility, but the coloring pattern with a line width of 40 micrometers or less was not formed with high reproducibility. The results are shown in Table 2.

Yes (B) / (C) Sensitivity (mJ / ㎠) Resolution (μm) Dissolution Rate (nm / sec) Example 4 28/15 100 10 24 Comparative Example 2 21/22 250 50 100

(B) / (C): Usage ratio (mass ratio) of binding resin and dipentaerythritol hexaacrylate

According to the formation method of this invention, a coloring pattern can be formed with stable sensitivity and high resolution, and it is especially suitable for formation of a black matrix.

Claims (12)

A photomask was interposed through a layer made of a colored photosensitive resin composition containing a pigment (A), a binder resin (B), an ethylenically unsaturated bond, and a compound (C) capable of addition polymerization and a photopolymerization initiator (D). Thereafter, the light non-irradiated region of the layer is dissolved in a developer at a dissolution rate of 10 nm / sec or more and 60 nm / sec or less. The formation method of the coloring pattern of Claim 1 whose pigment (A) is a black pigment. The formation method of the coloring pattern of Claim 1 or 2 whose content of the pigment (A) of a coloring photosensitive resin composition is 20% or more by mass fraction with respect to solid content of a coloring photosensitive resin composition. The method of forming a colored pattern according to any one of claims 1 to 3, wherein the binder resin (B) is a condensation polymer of a compound of the formula (1) with a polybasic acid. Formula 1 In Formula 1 above, R ¹ and R ² are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a halogen atom, R ⁴ is a hydrogen atom or a methylene group, X is a divalent residue represented by any one of Formulas 1a to 1g, R ³ is an alkylene group having 1 to 10 carbon atoms which may have a substituent group, m is an integer from 0 to 5, n is an integer from 1 to 10. Formula 1a Formula 1b Formula 1c Formula 1d Formula 1e Formula 1f Formula 1g The method of forming a colored pattern according to any one of claims 1 to 3, wherein the binder resin (B) is an acrylic polymer. The colored pattern according to any one of claims 1 to 5, wherein the amount of the use of the binder resin (B) is 1.5% by mass or more and 5% by mass or less with respect to the amount of the compound (C) which has an ethylenically unsaturated bond and is capable of addition polymerization. Formation method. The manufacturing method of a color filter which forms a coloring pattern by the method in any one of Claims 1-6. A colored photosensitive resin composition comprising a pigment (A), a binder resin (B), an ethylenically unsaturated bond, and a compound (C) capable of addition polymerization and a photopolymerization initiator (D), wherein the layer composed of solids has a mass fraction of 0.05%. The coloring photosensitive resin composition melt | dissolved in the potassium hydroxide aqueous solution containing the potassium hydroxide at 23 degreeC at the melt rate of 10 nm / sec or more and 60 nm / sec or less. The coloring photosensitive resin composition of Claim 8 whose pigment (A) is a black pigment. The coloring photosensitive resin composition of Claim 8 or 9 whose content of the pigment (A) of a coloring photosensitive resin composition is 20% or more by mass fraction with respect to solid content of a coloring photosensitive resin composition. The colored photosensitive resin composition according to any one of claims 8 to 10, wherein the binder resin (B) is a condensation product of a compound of the general formula (1) with a polybasic acid. Formula 1 In Formula 1 above, R ¹ and R ² are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a halogen atom, R ⁴ is a hydrogen atom or a methylene group, X is a divalent residue represented by any one of Formulas 1a to 1g, R ³ is an alkylene group having 1 to 10 carbon atoms which may have a substituent group, m is an integer from 0 to 5, n is an integer from 1 to 10. Formula 1a Formula 1b Formula 1c Formula 1d Formula 1e Formula 1f Formula 1g The coloring photosensitive resin of any one of Claims 8-12 whose content of binding resin (B) is 1.5 mass times or more and 5 mass times or less with respect to the usage-amount of the compound (C) which has an ethylenically unsaturated bond and can add-polymerize. Composition.