KR200261713Y1 - An exposer - Google Patents

Abstract

The present invention relates to an exposure apparatus for photolithography of an array substrate for a liquid crystal display device, and more particularly, to a yaw guide supporting a means for fixing and moving a substrate.

One side of the yaw guide and the other side not parallel to the yaw guide are fixed at the same time so as not to be affected by the impact of the substrate moving means for fixing the substrate and moving up / down / left / right.

In this way, alignment errors of the respective constituent layers of the array substrate or the semiconductor circuit board for the liquid crystal display device do not occur, so that poor display characteristics and electrical defects can be prevented.

Description

Exposure apparatus {An exposer}

The present invention relates to an exposure apparatus, and relates to a yaw guide for supporting a constant path of movement of a moving means for moving a fixed substrate for exposure to up / down / left / right.

BACKGROUND ART In general, semiconductor devices applied to computers and various electronic products, liquid crystal display devices (LCDs), plasma display devices (PDPs), circuit boards (PCBs) on which electronic components are mounted, filters, and thin films are emerging as image display devices. Photolithography is used to form fine patterns in the production of components and the like using technology.

In such photolithography, an exposure apparatus is essentially used to transfer a pattern of a reticle or a mask to a photosensitive film formed on a substrate.

In order to form a semiconductor device, a liquid crystal display device, or the like, an exposure process is performed using a reticle having these patterns formed in an exposure apparatus in order to form a predetermined pattern, for example, a circuit pattern, on a raw material such as a wafer or a substrate for a liquid crystal display device. Will be repeated

1 is a cross-sectional view schematically showing a conventional exposure apparatus.

As shown in the drawing, the exposure apparatus 20 generally includes a light source 30 and a substrate moving means 32 for moving the substrate up, down, left, and right while fixing the substrate (not shown) at the bottom of the light source. A yaw guide 34 for supporting the moving path of the substrate moving means 32 to be constant, and a stator 36 positioned close to the yaw guide 34 to substantially move the substrate moving means 32. do.

In addition, the exposure apparatus 20 is composed of a base plate 38 to which the substrate moving means 32, the yaw guide 34, and the stator 36 are fixed, and the base plate 38 has a main body 40. Located at the top of the).

In the above-described configuration, the substrate moving means 32 is moved by the stator 36, and the stator 36 is supported by the yaw guide 34.

2 is a plan view of the surface plate formed of the substrate moving unit, the stator, and the yoga guide from above.

The moving means 32 includes a plate state 42 including a circular or square chuck (not shown) that sucks a substrate (not shown) in a vacuum, and a moving device that substantially moves the plate stage 42 up and down. It consists of 44.

The substrate moving means 32 rises from the surface plate 38 to a predetermined height and moves up and down within the surface plate 38, and at the same time, the plate stage 42 moves in the movement device 44. It will move from side to side.

At this time, the stator 36 moves the substrate moving means, and the yoga guide fixed to the surface plate 38 together with the stator 40 causes the substrate moving means 34 to move along the correct path.

The substrate movement means 32 is moved by a stator 36 formed on one side of the surface plate and the other side parallel to the platen, a force by an electromagnet exerted by a coil wound around the stator 36, and the substrate. This is due to the large pressure of air supplied from the air pad of the vehicle 32.

In this case, the substrate moving means floats while maintaining a constant gap with the moving means, which will be described below with reference to FIGS. 3 and 4.

3 is a view schematically showing a substrate moving means including a plate stage configured on a surface plate, and FIG. 4 is a cross-sectional view of FIG.

As shown in the figure, a magnet 50 and an air pad 52 are formed below the substrate moving means 32, and a magnetic force to pull the substrate moving means 32 in the direction of the surface plate 38. And the force of the air pads 52 to lift the substrate moving means 32 from the surface plate are in balance with each other, and the substrate moving means 32 floats from the surface plate 38 in a constant gap (5 μm). Is maintained.

In this state, as described above, the force for moving the substrate moving means 32 upward and downward is due to a stator (not shown) configured on one side and the other side of the surface plate.

Since the coil is wound on the stator, the plate moving inside the moving means moving upward and downward of the surface plate causes the force F to act on the coil when the magnetic field B and the current i of the stator are applied. The stage connected by coil moves. At this time, the heavy plate stage (150kg) is floating from the surface plate by the action of the air pad and the stator described above.

In the exposure apparatus operating as described above, a support for substantially supporting the movement of the moving means, that is, moving in a predetermined direction but moving without shaking, has a yaw guide fixed to an upper portion of the surface plate 38. 34).

If there is no supporting force of the yaw guide 34, an error occurs in the alignment state of each layer in the process of forming the component layer on the substrate, causing a substrate failure.

In the related art, exposure failure due to the fixed state of the yaw giude has often occurred during the configuration of the exposure apparatus described above.

In detail, the yaw guide is fixed to the surface plate with about 50 bolts because the impact is transmitted to the yaw guide when the heavy plate stage moves up / down of the surface plate and the chuck of the plate moves left and right. .

A description with reference to FIGS. 5A to 5B is as follows.

5A and 5B are a perspective view and a cross-sectional view showing a shape in which the yaw guide is fixed to the surface plate.

As shown, the yaw guide 34 is fixed to a number of bolts 56, but since it can not be fixed to the left (C) or right (D) of the yaw guide 34, When the substrate moving means (not shown) including the plate stage moves continuously, the yaw guide 34 is twisted left and right.

In such a case, the movement of the substrate moving means 32 is made unstable to fix the substrate (not shown) fixed by the plate stage (42 in FIG. 2) and the upper portion of the substrate (not shown). This causes a misalignment of the mask blocking the light.

As a result, it causes a misalignment of the components of the liquid crystal display or other circuit board.

The present invention has been made for the purpose of solving the problems as described above, and provides a method of fixing the yaw guide to the surface plate more stably, and an exposure apparatus manufactured according to the method.

1 is a cross-sectional view schematically showing an exposure apparatus;

2 is a plan view showing a surface plate and a substrate moving means configured on the surface plate;

3 is a plan view schematically showing a substrate moving unit having a magnet and an air pad disposed thereon;

4 is a cross-sectional view showing a portion in which a magnet and an air pad are configured in FIG. 3;

5a to 5b are a perspective view and a cross-sectional view showing the configuration of the surface plate and yoga guide according to the prior art,

6 is a view schematically showing a surface plate according to the present invention,

7A to 7C are plan views, cross-sectional views, and side views, respectively, of which a surface plate and a yoga guide are constructed according to the first embodiment of the present invention;

8 is an enlarged plan view of a portion G of FIG. 7A;

9A to 9C are plan views, cross-sectional views, and side views of the surface plate and the yaw guide according to the second embodiment of the present invention.

<Brief description of the main parts of the drawing>

100: plate 102: yoga guide

103: bolt of the first fixing part 105: bolt of the second fixing part

An exposure apparatus according to the present invention for solving the above object is a light source;

Substrate moving means for moving the substrate up, down, left and right; A stator configured to move the substrate moving means; A surface plate on which the substrate moving means is located; A yaw guide for supporting the stator and supporting the movement path of the substrate moving means in a constant manner, wherein the yaw guide is formed on an etched portion of the surface plate, and has a first fixing part fixed in a vertical direction, and horizontally And a yoga guide fixed by a second fixing part fixed in the direction.

The substrate moving means is provided with a magnet and an air pad in the lower portion, so as to maintain a constant distance from the surface plate between the moving means.

The second fixing part uses a bolt to simultaneously fix the yoga guide and the surface plate, and in another method, supports the lower side of the yoga guide fixed to the surface plate using a pin.

Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

First Embodiment

A feature of the first embodiment of the present invention is to scrape off one side of the surface plate, and to fix the yaw guide to the shaved portion using a bolt.

6 is a perspective view schematically showing a surface plate processed according to the present invention.

As shown, one side E of the surface plate 100 is etched to a predetermined depth. The etched portion E is a portion where the substrate moving means is not located, and a portion where precision processing is not necessary.

At this time, preferably, the horizontal length (L1) of the horizontal length (L1) and the vertical length (L2) of the shaved portion is equal to the cross-sectional length of the yoga guide.

Through this configuration, with reference to Figures 7a to 7c below will be described a yoga guide fixing method according to a first embodiment of the present invention.

7A and 7B and 7C are a plan view schematically showing a surface plate in a state in which a yaw guide is fixed according to the present invention, and a cross-sectional view and a cross-sectional view thereof.

As shown, the yaw guide 102 is fixed to one side of the surface plate 100 to which the plate stage moves.

The yaw guide 102 is not fixed in only one direction and is fixed in two directions, one side and the other side not parallel thereto.

That is, from the top to the bottom, the first fixing part 104 to which the plurality of bolts 103 hold the yoga guide and the plurality of bolts 105 fixed from the left to the right direction to the spaced area between the bolts are fixed. It consists of the 2nd fixing part 106. As shown in FIG.

In the above configuration, the washer is further configured to control the fixed state of the yaw guide. A description with reference to FIG. 8 is as follows.

FIG. 8 is an enlarged plan view magnifying G of FIG. 7A.

As shown in the drawing, the bolt 103 is fixed to the bottom of the shaved portion, and between the bolt and the bolt fixed to the bottom, the other side of the guide 102 and the shaved portion in a direction perpendicular thereto. To the bolts 103 and 105.

At this time, by inserting the washer (107) at the end of each bolt 105 can prevent the movement of the bolt due to the impact, the washer 107 of the bolts (103, 105) and the surface plate (100) Insert it in between.

Since the structure of the surface plate and the yaw guy as described above is a structure for fixing the yaw guide from the side, the fixing torque of the yaw guide is increased so as not to be twisted.

In addition, when the yaw guide is to be adjusted initially, the adjustment is convenient because it can be adjusted by inserting the washer to the side bolts.

Second Embodiment

Unlike the first embodiment, the second embodiment of the present invention is characterized in that when the yaw guide is fixed to the surface plate, a fixing pin is formed on one side of the surface plate, and the fixing pin supports the yaw guide. It is characterized by being a means.

9A and 9B are a plan view, a sectional view, and a side view of the 9c of the yaw guide and the surface plate according to the second embodiment of the present invention.

As shown, the yaw guide 102 is located on one side of the surface plate, in plan view, the yaw guide 102 is a shape fixed to the surface plate 100 by a bolt 103 fixed in the horizontal direction .

However, in the cross-section, the yoga guide 102 is double fixed by the pin 120 fixed to the surface plate 100 at the bottom of the yaw guide.

That is, the yaw guide 102 is placed on the pin 120 fixed to the surface plate 100 so that the lower surface of the yaw guide 102 is caught, and then the surface plate 100 using the bolt 103. ) And the yaw guide (102).

At this time, as in the first embodiment, a washer (not shown) is inserted between the yaw guide 102 and the surface plate, so that correction is possible when the yoga guide needs to be corrected.

Therefore, when the exposure apparatus configured with the yaw guide provided by the method according to the present invention is used, the movement of the plate state is stable during the process of exposing the substrate, so that a defect due to misalignment of the substrate and the mask does not occur.

Claims (6)

A light source; Substrate moving means for moving the substrate up, down, left and right; A stator configured to move the substrate moving means; A surface plate on which the substrate moving means is located; In the yaw guide that supports the stator and supports the movement path of the substrate moving means is constant, The yaw guide is formed on the etched portion of the surface plate, and the yoke guide fixed by the first fixing portion for fixing in the vertical direction, and the second fixing portion for fixing in the horizontal direction Exposure apparatus comprising a. The method of claim 1, The substrate moving means is an exposure apparatus configured with a magnet and an air pad at the bottom. The method of claim 2, The substrate moving means is an exposure apparatus that moves in a state spaced apart from the surface by a force that attracts the surface plate and the air pad lifts the surface plate. The method of claim 1, And the surface plate is etched in one direction at one side with a predetermined depth. The method according to any one of claims 1 to 4, And the second fixing part fixes the yoga guide and the surface plate at the same time by using a bolt. The method of claim 1, And the second fixing part supports a lower side of the yoga guide fixed to the surface plate using a pin.