KR200246792Y1 - Apparatus for the burn and wet disposal process of waste gas - Google Patents

Abstract

The present invention relates to a waste gas dry and dry treatment apparatus, comprising: a waste gas dry treatment unit (100) for heating and oxidizing waste gas to a predetermined temperature; Injection pipe 210 into which high-temperature waste gas flows from the waste gas dry processing unit 100, time water spraying means 220 for generating powder by spraying water into hot waste gas flowing into the inlet pipe 210, and water spray Powder production and steam blocking portion provided on the upper side of the means 220 and nitrogen injection means 230 to block the flow of steam into the waste gas dry processing unit 100 by injecting nitrogen into the inlet pipe 210. 200; A separation unit 300 separating the powder paste, unreacted waste gas, and floating powder generated from the powder generation and steam blocking unit 200 and discharging the powder paste to the discharge pipe 510; By receiving the unreacted waste gas and the suspended powder separated by the separating unit 300 and spraying the water water, the unreacted waste gas is dissolved in the water, and the suspended powder is a wet gas treatment unit 400 to collect the dust by the powder dust filter as By preventing corrosion of the heating chamber, etc., it has the effect of reducing the maintenance cost of equipment such as replacement parts.

Description

Waste gas wet and dry processing device {APPARATUS FOR THE BURN AND WET DISPOSAL PROCESS OF WASTE GAS}

The present invention relates to a waste gas wet and dry treatment apparatus, and more particularly, to prevent moisture from flowing into the waste gas dry treatment unit to prevent corrosion of the heating chamber and the like, thereby reducing the replacement cost of parts and increasing the operation rate of the equipment. In addition, the present invention relates to a waste gas wet-and-dry treatment apparatus for stably treating waste gas used in the manufacture of semiconductor devices by smoothly removing powder.

For the production of semiconductor devices requires a variety of manufacturing equipment and manufacturing processes, and, in the process for fabricating a semiconductor device (Chemical Vapor Deposition) CVD, plasma etching, epitaxial deposition, etc. the sputtering process is the process characteristics chlorine (Cl ₂ ), Boron trichloride (BCl ₃ ), ammonia (NH ₃ ), hydrofluoric acid (HF) and other various toxic, corrosive, flammable gases are generally used.

Therefore, when toxic gases used in the manufacturing process of semiconductor devices are released into the atmosphere without any purification process, since they pollute the air and seriously affect the human body and the ecosystem, in the conventional semiconductor device manufacturing line, a waste gas treatment apparatus is disposed at a certain place. The waste gas treatment apparatus is used to purify the toxic gases generated in the semiconductor device manufacturing process to a predetermined level or more and discharge them to the atmosphere.

The waste gas treatment apparatus for purifying toxic gases used in the manufacturing process of a semiconductor device will be described with reference to the accompanying drawings. 1 is a block diagram of a conventional wet and dry waste gas treatment device. As shown, the conventional wet and dry waste gas treatment device is largely composed of a waste gas dry treatment unit 10, a powder removal unit 20, a separation unit 30 and the waste gas wet treatment unit 40.

The waste gas dry processing unit 10 is largely composed of a manifold 11, a heating chamber 12, and a heater 13. The manifold 11 communicates with a waste gas outlet of a manufacturing device of a semiconductor device, not shown, and supplies and mixes waste gas, air for oxidizing waste gas, and inert gas for preventing sudden explosion of waste gas and air, and a heating chamber ( 12) is confidentially communicated with.

The heating chamber 12 is composed of two tubes, that is, the inner and outer tubes 12a and 12b, and the heater 13 is provided outside the heating chamber 12.

The heater 13 is formed in a cylindrical shape with a built-in heating wire, and heats the heating chamber 12 above a predetermined temperature so that the waste gas in the heating chamber 12 can be oxidized.

The powder removing unit 20 is composed of a housing 21, a scraper 22, a motor 23, and a city water spray nozzle 24.

The housing 21 has a cylindrical shape, and a scraper 22 is assembled at the upper end thereof.

The scraper 22 is rotated by the driving force of the motor 23 installed on the outside of the housing 21, for this purpose, the vertical axis of rotation formed on the lower end of the scraper 22 and the axis of rotation of the motor 23 are a pair of bevel gears ( 23a).

The time water injection nozzle 24 is provided inside the scraper 22, and sprays the time water supplied through the through-hole formed in the vertical rotation shaft of the time water supply pipe and the scraper 22 from the external water supply part to the hot waste gas.

Separation unit 30 is composed of a transfer pipe 31, a separation pipe 32 and the transfer time spray nozzle 33. The transfer pipe 31 is connected to the powder removing unit 20 so as to be inclined at a predetermined angle in the gravity direction from the horizontal plane, and connected to communicate with one side of the separation pipe 32 in which the opening is formed in the gravity direction, and the inlet side The feed water jet nozzle 33 is provided.

Separation pipe 32 is connected to the waste gas wet treatment unit 40 on the upper side, the discharge pipe 51 is connected to the discharge unit (not shown) for discharging only the purified liquid by purifying the powder paste on the lower side.

Meanwhile, in order to prevent the powder paste flowing along the transfer pipe 31 from blocking the transfer pipe 31, the transfer time water spray nozzle 33 sprays water in the flow direction of the powder paste to smoothly separate the powder paste. Flow to (32).

The waste gas wet treatment unit 40 includes a conduit 41, a port 42, a water supply pipe 43, and a melting water supply nozzle 44.

A plurality of conduits 41 are assembled so as to communicate with each other, the unreacted waste gas and the floating powder is supplied through the separation pipe 32, the port passing through the inside and outside of the conduit 41 to the outer surface of the conduit 41 (42) is formed.

The pot 42 is coupled to the water supply pipe 43 for supplying water, and an end portion of the water supply pipe 43 is provided with a dissolving water spray nozzle 44 for injecting water into the unreacted waste gas. In addition, the inner surface of the conduit 41 is provided with a powder collecting filter (not shown) for collecting the floating powder.

The operation of the conventional wet-and-dry waste gas treatment device having such a structure is performed as follows.

The waste gas, air, and inert gas supplied from the manifold 11 are mixed in the heating chamber 12, and the mixed gas in the heating chamber 12 reaches a predetermined temperature by the heater 13 so that the oxidation condition of the waste gas is reduced. It is formed, the high temperature waste gas supplied from the water spray nozzle 24 is supplied with a large amount of solid powder due to a sudden temperature change.

The resulting powder is attached to the inner tube 12a of the heating chamber 12, the rotating scraper 22 scrapes the powder attached to the inner tube 12a to separate the powder from the inner tube 12a, and the scraper ( The powder separated from the inner tube 12a by 22) becomes a solid and liquid powder paste by the time sprayed from the water spray nozzle 24.

The powder paste is introduced into the separation pipe 32 along the transfer pipe 31 along with the unreacted waste gas and the floating powder. The heavy powder paste is moved to the discharge portion through the discharge pipe 51 and purified and separated and discharged to the outside. The unreacted waste gas and the suspended powder are raised along the conduit 41 of the wet treatment part 40 while the unreacted waste gas is dissolved by the time water sprayed from the dissolving water spray nozzle 44, and the suspended powder is a powder dust filter. Is collected by.

Such a conventional wet and dry waste gas treatment device is easily corroded due to the strong corrosiveness of the scraper, motor, etc., and the scraper cannot rotate when a large amount of powder is generated in the inner tube, so the motor easily breaks down due to the overload. In addition to increasing the replacement cost of the related parts, such as causing a problem that does not remove the powder attached to the inner tube smoothly.

In addition, the steam generated due to the high temperature inside the waste gas wet treatment unit has a problem of entering the heating chamber of the waste gas dry treatment unit to corrode the inside of the heating chamber.

The present invention is to solve the above-mentioned problems, the object of the present invention is to remove unnecessary parts and to prevent the inflow of moisture into the waste gas dry treatment unit to prevent corrosion of the heating chamber, etc. It is to provide a waste gas wet-and-dry treatment apparatus that reduces the maintenance cost, increases the operation rate of equipment, and smoothly removes powder to stably process waste gases used to manufacture semiconductor devices.

The present invention for realizing the above object, the waste gas, the waste gas dry treatment unit for receiving and mixing the air and inert gas for oxidizing the waste gas, and heating and oxidizing to a predetermined temperature; It is provided on the inlet pipe into which the high temperature waste gas flows from the waste gas dry treatment unit, and the water injection means for spraying the hot water into the hot waste gas flowing into the inlet pipe to generate powder, and on the upper side of the time water injection means. A powder production and vapor blocking unit comprising nitrogen injection means for injecting nitrogen (N ₂ ) to block inflow of steam into the waste gas dry treatment unit; A separation unit for separating the powder paste, unreacted waste gas, and suspended powder generated from the powder generation and vapor blocking unit to discharge the powder paste into the discharge pipe; The unreacted waste gas and the suspended powder separated by the separator are supplied to spray the water to dissolve the unreacted waste gas into the water, and the suspended powder is characterized in that it comprises a waste gas wet treatment unit for collecting by the powder dust filter.

1 is a block diagram of a conventional waste gas wet and dry treatment apparatus,

2 is a block diagram of a waste gas wet and dry treatment apparatus according to the present invention,

3 is a cross-sectional view taken along line AA ′ of FIG. 2.

<Description of Symbols for Main Parts of Drawings>

100: waste gas dry treatment unit 200: powder generation and steam blocking unit

210: inlet pipe 220: water injection means

221 port 222 time water supply pipe

223: water injection nozzle 230: nitrogen injection means

231: nitrogen supply pipe 232: nitrogen injection pipe

233: nitrogen injection nozzle 300: separation

400: waste gas wet treatment unit 510: discharge pipe

Hereinafter, with reference to the accompanying drawings, the most preferred embodiment of the present invention will be described in more detail so that those skilled in the art can easily practice.

2 is a block diagram of a waste gas wet and dry treatment apparatus according to the present invention. As shown, the waste gas dry and wet treatment apparatus according to the present invention is largely composed of the waste gas dry treatment unit 100, the powder generation and steam blocking unit 200, the separation unit 300, the waste gas wet treatment unit 400. do.

The waste gas dry processing unit 100 is in communication with an exhaust gas outlet of a semiconductor device manufacturing facility, and a manifold 110 in which air for oxidizing waste gas and waste gas is supplied and mixed with an inert gas for preventing sudden explosion of waste gas and air. And a heating chamber 120 which is in airtight communication with the manifold 110 and includes a heating chamber 120 formed of inner and outer tubes 121 and 122, and a cylindrical shape in which a heating wire is embedded outside the heating chamber 120. The heater 130 is heated to a predetermined temperature in order to oxidize a mixed gas such as waste gas therein.

The powder generation and steam blocking unit 200 injects city water to the inlet pipe 210 through which the high temperature waste gas flows from the waste gas dry processing unit 100 and the high temperature waste gas introduced into the inlet tube 210. The water-water injection means 220 and the water-time injection means 220 for generating a powder by spraying nitrogen (N ₂ ) to the inside of the inlet pipe 210 and the waste water dry treatment part 100 It is composed of a nitrogen injection means 230 for blocking the introduction of steam into.

On the other hand, the water injection means 220, the ports 221 are formed on both sides of the inlet pipe 210, respectively, the water supply pipe 222 is inserted into the port 221, respectively, at the end of the water supply pipe 222 The time spray nozzle 223 is coupled to the port 221.

In addition, the nitrogen injection means 230 is inserted in the nitrogen supply pipe 231 for supplying nitrogen to one side of the inlet pipe 210, as shown in Figure 3 along the line AA 'of FIG. The hollow nitrogen injection pipe 232 having a band shape coupled to communicate with the end of the nitrogen supply pipe 231 is coupled to the inner surface of the inlet pipe 210, and has a plurality of nitrogen injection nozzles inside the nitrogen injection pipe 232. 233 are combined.

Separation unit 300 is connected to the inlet pipe 210 of the powder production and steam blocking unit 200 is formed to be inclined at a predetermined angle in the direction of gravity from the horizontal plane, and the transport pipe 310 is one side The separation pipe 320 which is connected to each of the upper and lower sides of the waste gas wet processing unit 400 and the powder paste is respectively connected to the discharge pipe 510 connected to the discharge unit (not shown) to discharge only the purified liquid to the outside. And, it is composed of a feed time spray nozzle 330 provided on the inlet side of the separation pipe (320).

The separation unit 300 separates the powder paste, unreacted waste gas and suspended powder generated from the powder generation and steam blocker 200 to supply the powder paste to the discharge pipe 510, and the unreacted waste gas and the suspended powder are waste gas. It is supplied to the wet treatment unit 400.

The waste gas wet treatment unit 400 is connected to an upper side of the separation pipe 320 of the separation unit 300, and a plurality of conduits 410 are assembled to communicate with each other, and an inner surface of the conduit 410 on the outer surface of the conduit 410. It consists of a port 420 formed to penetrate the outside, a water supply pipe 430 coupled to the port 420, and a melting water supply nozzle 440 coupled to an end of the water supply pipe 430.

On the other hand, the inner surface of the conduit 410 is provided with a powder collecting filter (not shown) for collecting the floating powder.

The waste gas wet treatment unit 400 receives unreacted waste gas and suspended powder separated by the separating unit 300 and sprays water to dissolve unreacted waste gas in the ground water, and the suspended powder is collected by a powder dust filter. .

Operation of the wet and dry waste gas treatment device of the present invention made of such a structure is made as follows.

Waste gas, air, and inert gas supplied from the manifold 110 are mixed in the heating chamber 120, and the mixed gas in the heating chamber 120 is reached by a heater 130 to reach a certain temperature, and oxidation conditions of the waste gas It is formed is introduced into the inlet pipe (210).

The waste gas introduced into the inlet pipe 210 suddenly changes in temperature by the time water sprayed from the water spray nozzle 223 to generate a solid and liquid powder paste. Together with the powder paste, unreacted waste gas and suspended powder The separation pipe 320 is transferred along the transfer pipe 310.

At this time, the transfer time spray nozzle 330 is to smoothly separate the powder paste by spraying the water in the flow direction of the powder paste in order to prevent the powder paste flowing along the transfer pipe 310 to block the transfer pipe 310 Flow to the tube (320).

The powder paste, unreacted waste gas and suspended powder, which are conveyed to the separation pipe 320, are heavier in weight, and the powder paste is transferred to the discharge unit through the discharge pipe 510 for purification and separated and discharged to the outside. The unreacted waste gas and suspended powder are wetted. As it rises along the conduit 410 of the processing unit 400, the unreacted waste gas is dissolved by the time water injected from the melt water spray nozzle 440, and the suspended powder is collected by the powder dust collecting filter.

On the other hand, the time water spray nozzle 223, the time water spray nozzle 330 for transport and the time water spray nozzle 440 for dissolution to form a steam due to the high temperature of the waste gas, the steam is a waste gas dry processing unit 100 In order to prevent corrosion of components such as the heating chamber 120 when it is introduced into the nitrogen by the injection of nitrogen from the nitrogen injection nozzle 233 of the nitrogen injection means 230 is introduced into the waste gas dry processing unit 100 Block it.

According to the preferred embodiment of the present invention as described above, to prevent the inflow of moisture into the waste gas dry treatment unit to prevent corrosion of the heating chamber, and to stably process the waste gas used to manufacture the semiconductor device.

As described above, the waste gas dry and dry treatment apparatus according to the present invention eliminates unnecessary parts and prevents water from flowing into the waste gas dry treatment unit, thereby preventing corrosion of the heating chamber and the like, thereby reducing maintenance costs of equipment such as replacement cost of components. It has the effect of reducing waste gas, increasing equipment operation rate, and smoothly removing powder to stably process waste gas used to manufacture semiconductor devices.

What has been described above is just one embodiment for implementing the waste gas dry and dry treatment apparatus according to the present invention, the present invention is not limited to the above embodiment, as claimed in the utility model registration claims below Without departing from the gist of the invention, anyone with ordinary knowledge in the field to which the invention belongs will have a technical spirit of the present invention to the extent that various modifications can be made.

Claims (3)

In the apparatus for treating waste gas used in the manufacturing process of a semiconductor device, A waste gas dry treatment unit receiving and mixing waste gas and air and an inert gas for oxidizing the waste gas, and heating and oxidizing the waste gas to a predetermined temperature; An inlet pipe through which the hot waste gas flows from the waste gas dry processing unit, a time water spraying means for spraying the hot water into the hot waste gas flowing into the inlet pipe to generate powder, and an upper side of the time water spraying means; A powder generation and vapor blocking unit comprising nitrogen injection means for injecting nitrogen (N ₂ ) into the pipe to block inflow of steam into the waste gas dry treatment unit; A separation unit for separating the powder paste, unreacted waste gas, and floating powder generated from the powder generation and vapor blocking unit to discharge the powder paste into the discharge pipe; A waste gas wet treatment unit receiving unreacted waste gas and suspended powder separated by the separating unit and spraying water to dissolve unreacted waste gas in the ground water, and collecting the suspended powder by a powder dust filter; Waste gas wet and dry treatment apparatus comprising a. According to claim 1, wherein the time-injection means, Ports formed at both sides of the inlet pipe; A water supply pipe inserted into each of the ports; A water injection nozzle coupled to an end of the water supply pipe and mounted to the port; Waste gas dry and wet treatment apparatus comprising a. The method of claim 1, wherein the nitrogen injection means, A nitrogen supply pipe inserted into one side of the inlet pipe; A hollow nitrogen injection pipe coupled to communicate with an end of the nitrogen supply pipe and having a band shape coupled to an inner surface of the inlet pipe; A plurality of nitrogen injection nozzles coupled to the inside of the nitrogen injection pipe; Waste gas dry and wet treatment apparatus comprising a.