KR20020038707A - 펨토 초 펄스 레이저를 이용하여 실리카에 기초한 유리광학 디바이스의 직접 기입방법 - Google Patents

펨토 초 펄스 레이저를 이용하여 실리카에 기초한 유리광학 디바이스의 직접 기입방법 Download PDF

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Publication number
KR20020038707A
KR20020038707A KR1020027001193A KR20027001193A KR20020038707A KR 20020038707 A KR20020038707 A KR 20020038707A KR 1020027001193 A KR1020027001193 A KR 1020027001193A KR 20027001193 A KR20027001193 A KR 20027001193A KR 20020038707 A KR20020038707 A KR 20020038707A
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KR
South Korea
Prior art keywords
focus
substrate
scan
laser
path
Prior art date
Application number
KR1020027001193A
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English (en)
Korean (ko)
Inventor
니콜라스 에프. 보렐리
찰렌 엠. 스미스
Original Assignee
알프레드 엘. 미첼슨
코닝 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 알프레드 엘. 미첼슨, 코닝 인코포레이티드 filed Critical 알프레드 엘. 미첼슨
Publication of KR20020038707A publication Critical patent/KR20020038707A/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
    • G11C13/041—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam using photochromic storage elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Integrated Circuits (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Lasers (AREA)
KR1020027001193A 1999-07-29 2000-07-28 펨토 초 펄스 레이저를 이용하여 실리카에 기초한 유리광학 디바이스의 직접 기입방법 KR20020038707A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14627499P 1999-07-29 1999-07-29
US60/146,274 1999-07-29
PCT/US2000/020446 WO2001009899A1 (fr) 1999-07-29 2000-07-28 Ecriture directe de dispositifs optiques en verre a base de silice faisant appel des lasers a impulsion femtoseconde

Publications (1)

Publication Number Publication Date
KR20020038707A true KR20020038707A (ko) 2002-05-23

Family

ID=22516612

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027001193A KR20020038707A (ko) 1999-07-29 2000-07-28 펨토 초 펄스 레이저를 이용하여 실리카에 기초한 유리광학 디바이스의 직접 기입방법

Country Status (8)

Country Link
EP (1) EP1204977A4 (fr)
JP (1) JP2003506731A (fr)
KR (1) KR20020038707A (fr)
CN (1) CN1365500A (fr)
AU (1) AU6382700A (fr)
BR (1) BR0012797A (fr)
CA (1) CA2380541A1 (fr)
WO (1) WO2001009899A1 (fr)

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US10756003B2 (en) 2016-06-29 2020-08-25 Corning Incorporated Inorganic wafer having through-holes attached to semiconductor wafer
US11062986B2 (en) 2017-05-25 2021-07-13 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US11114309B2 (en) 2016-06-01 2021-09-07 Corning Incorporated Articles and methods of forming vias in substrates
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
US11774233B2 (en) 2016-06-29 2023-10-03 Corning Incorporated Method and system for measuring geometric parameters of through holes

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US6796148B1 (en) 1999-09-30 2004-09-28 Corning Incorporated Deep UV laser internally induced densification in silica glasses
JP3531738B2 (ja) * 2000-02-22 2004-05-31 日本電気株式会社 屈折率の修正方法、屈折率の修正装置、及び光導波路デバイス
US6884960B2 (en) 2000-08-21 2005-04-26 National Research Council Of Canada Methods for creating optical structures in dielectrics using controlled energy deposition
JP4514999B2 (ja) * 2001-07-27 2010-07-28 株式会社フジクラ 光合分波器及び光合分波器の製造方法
JP4588269B2 (ja) * 2001-08-21 2010-11-24 株式会社フジクラ 光導波路部品の製造方法
DE10155492A1 (de) * 2001-11-13 2003-10-09 Univ Schiller Jena Verfahren zur Herstellung eines optischen Verzweigers, insbesondere eines Mehrfach-Strahlteilers, sowie verfahrensgemäß hergestellter Verzweiger
US6853785B2 (en) 2001-12-14 2005-02-08 3M Innovative Properties Co. Index modulation in glass using a femtosecond laser
JP2003321252A (ja) * 2002-04-25 2003-11-11 Japan Science & Technology Corp ガラス内部への分相領域の形成方法
US6950591B2 (en) 2002-05-16 2005-09-27 Corning Incorporated Laser-written cladding for waveguide formations in glass
DE10231463A1 (de) * 2002-07-05 2004-01-15 Laser- Und Medizin-Technologie Gmbh, Berlin Verfahren zur Mikrostrukturierung von Lichtwellenleitern zur Erzeugung von optischen Funktionselementen
CA2396831A1 (fr) * 2002-08-02 2004-02-02 Femtonics Corporation Dispositifs de microstructuration a guide d'ondes optiques avec pulses optiques de l'ordre de la femtoseconde
US7294454B1 (en) * 2002-09-30 2007-11-13 Translume, Inc. Waveguide fabrication methods and devices
US6941052B2 (en) 2002-12-19 2005-09-06 3M Innovative Properties Company Sensitized optical fiber method and article
DE10304382A1 (de) * 2003-02-03 2004-08-12 Schott Glas Photostrukturierbarer Körper sowie Verfahren zur Bearbeitung eines Glases und/oder einer Glaskeramik
US7736819B2 (en) * 2003-07-18 2010-06-15 Pixer Technology Ltd Method for correcting critical dimension variations in photomasks
US20050023473A1 (en) * 2003-08-01 2005-02-03 Burr Kent Charles System and method for reducing optical crosstalk in multi-anode photomultiplier tube
CN1993807B (zh) * 2004-08-06 2010-05-05 住友电气工业株式会社 形成p型半导体区域的方法及半导体元件
TWI395978B (zh) 2004-12-03 2013-05-11 Ohara Kk 光學元件與製造光學元件的方法
EP1851837B1 (fr) 2004-12-20 2015-03-04 Imra America, Inc. Source laser a impulsions avec compresseur a reseau ajustable
US8097337B2 (en) 2005-08-16 2012-01-17 Ohara Inc. Structure and manufacturing method of the same
CN100424531C (zh) * 2006-08-07 2008-10-08 华中科技大学 一种用于制备聚合物光波导的专用直写装置
CN102005688A (zh) * 2010-09-17 2011-04-06 山东大学 在钕掺杂钒酸镥晶体内制备条形波导激光器件的方法
CN102466900B (zh) * 2010-11-04 2015-02-18 财团法人工业技术研究院 平面显示器的修补方法与系统
ITTO20110327A1 (it) * 2011-04-08 2012-10-09 Osai A S S R L Metodo di taglio laser intramateriale con profondita' di campo estesa
CN102785031B (zh) * 2012-08-15 2015-04-01 武汉隽龙科技有限公司 一种利用超短脉冲激光的透明材料切割方法及切割装置
CN103399377A (zh) * 2013-07-22 2013-11-20 西安电子科技大学 飞秒激光直写蓝宝石环形光波导及其制备方法
CN104345386A (zh) * 2013-08-02 2015-02-11 宜兴新崛起光集成芯片科技有限公司 一种玻璃基光波导芯片激光内雕工艺
GB2527553B (en) * 2014-06-25 2017-08-23 Fianium Ltd Laser processing
CN104216047A (zh) * 2014-09-26 2014-12-17 南京先进激光技术研究院 基于自聚焦成丝的超短脉冲激光制备光波导器件的方法
RU2578747C1 (ru) * 2014-12-24 2016-03-27 Общество С Ограниченной Ответственностью "Оптосистемы" Способ формирования оболочки волноводной структуры в прозрачном объемном материале и оболочка волноводной структуры
CN104767106A (zh) * 2015-04-17 2015-07-08 山东大学 一种铒掺杂钇铝石榴石晶体镶套光波导放大器及其制备方法
CN106125166B (zh) * 2016-07-22 2018-04-10 中国工程物理研究院激光聚变研究中心 原位调控材料微结构制备熔石英微透镜阵列的方法
DE102017002986B4 (de) * 2016-12-13 2019-08-29 AIXLens GmbH Verfahren zur Herstellung einer transmitiven Optik und Intraokularlinse
CN109590602B (zh) * 2017-09-28 2022-02-15 福州高意光学有限公司 一种制作非球面的方法
CN109445017A (zh) * 2019-01-02 2019-03-08 京东方科技集团股份有限公司 导光板及其制作方法、背光模组和显示装置
CN111922512B (zh) * 2020-06-12 2021-12-31 杭州奥创光子技术有限公司 一种工业化贝塞尔脉冲激光系统及其制造方法
EP4258029A4 (fr) 2020-12-01 2024-01-17 Fujitsu Limited Circuit quantique, ordinateur quantique et procédé de production de circuit quantique

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US5325324A (en) * 1989-04-25 1994-06-28 Regents Of The University Of California Three-dimensional optical memory
US5157674A (en) * 1991-06-27 1992-10-20 Intellectual Property Development Associates Of Connecticut, Incorporated Second harmonic generation and self frequency doubling laser materials comprised of bulk germanosilicate and aluminosilicate glasses
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US5253198A (en) * 1991-12-20 1993-10-12 Syracuse University Three-dimensional optical memory
US5634955A (en) * 1995-02-13 1997-06-03 The United States Of America As Represented By The Secretary Of The Air Force Process of making channel waveguides in gel-silica
US5761111A (en) * 1996-03-15 1998-06-02 President And Fellows Of Harvard College Method and apparatus providing 2-D/3-D optical information storage and retrieval in transparent materials
JP3649835B2 (ja) * 1996-03-18 2005-05-18 独立行政法人科学技術振興機構 光導波路の作製方法
JPH10288799A (ja) * 1997-04-14 1998-10-27 Kagaku Gijutsu Shinko Jigyodan 光導波回路及び非線形光学装置
JPH11167036A (ja) * 1997-12-04 1999-06-22 Japan Science & Technology Corp 光導波回路及び非線形光学装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11114309B2 (en) 2016-06-01 2021-09-07 Corning Incorporated Articles and methods of forming vias in substrates
US10756003B2 (en) 2016-06-29 2020-08-25 Corning Incorporated Inorganic wafer having through-holes attached to semiconductor wafer
US11774233B2 (en) 2016-06-29 2023-10-03 Corning Incorporated Method and system for measuring geometric parameters of through holes
US11062986B2 (en) 2017-05-25 2021-07-13 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US11972993B2 (en) 2017-05-25 2024-04-30 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness

Also Published As

Publication number Publication date
JP2003506731A (ja) 2003-02-18
EP1204977A4 (fr) 2003-08-13
CN1365500A (zh) 2002-08-21
WO2001009899A1 (fr) 2001-02-08
BR0012797A (pt) 2003-07-15
EP1204977A1 (fr) 2002-05-15
CA2380541A1 (fr) 2001-02-08
AU6382700A (en) 2001-02-19

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