KR20020028824A - 광 조사식 가열처리장치 및 방법 - Google Patents

광 조사식 가열처리장치 및 방법 Download PDF

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Publication number
KR20020028824A
KR20020028824A KR1020010062332A KR20010062332A KR20020028824A KR 20020028824 A KR20020028824 A KR 20020028824A KR 1020010062332 A KR1020010062332 A KR 1020010062332A KR 20010062332 A KR20010062332 A KR 20010062332A KR 20020028824 A KR20020028824 A KR 20020028824A
Authority
KR
South Korea
Prior art keywords
wafer
guard ring
lamps
light
irradiated
Prior art date
Application number
KR1020010062332A
Other languages
English (en)
Korean (ko)
Inventor
신지 스즈키
요시키 미무라
Original Assignee
다나카 아키히로
우시오덴키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000309024A external-priority patent/JP2002118071A/ja
Application filed by 다나카 아키히로, 우시오덴키 가부시키가이샤 filed Critical 다나카 아키히로
Publication of KR20020028824A publication Critical patent/KR20020028824A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

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  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Recrystallisation Techniques (AREA)
KR1020010062332A 2000-10-10 2001-10-10 광 조사식 가열처리장치 및 방법 KR20020028824A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000309024A JP2002118071A (ja) 2000-10-10 2000-10-10 光照射式加熱処理装置及び方法
JPJP-P-2000-00309024 2000-10-10

Publications (1)

Publication Number Publication Date
KR20020028824A true KR20020028824A (ko) 2002-04-17

Family

ID=29561124

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010062332A KR20020028824A (ko) 2000-10-10 2001-10-10 광 조사식 가열처리장치 및 방법

Country Status (2)

Country Link
KR (1) KR20020028824A (zh)
TW (1) TW540121B (zh)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100802697B1 (ko) * 2005-05-02 2008-02-12 다이닛뽕스크린 세이조오 가부시키가이샤 광방출형 열처리장치
KR100814998B1 (ko) * 2002-11-05 2008-03-18 에스. 오. 이. 떼끄 씰리꽁 오 냉쉴라또흐 떼끄놀로지 에지를 가지는 다중층 웨이퍼의 급속 열적 어닐링 방법
KR101036404B1 (ko) * 2005-11-30 2011-05-23 우시오덴키 가부시키가이샤 광 조사식 가열 장치
KR101104017B1 (ko) * 2003-10-27 2012-01-06 어플라이드 머티어리얼스, 인코포레이티드 조절된 온도 균일성
US8536492B2 (en) 2003-10-27 2013-09-17 Applied Materials, Inc. Processing multilayer semiconductors with multiple heat sources

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100814998B1 (ko) * 2002-11-05 2008-03-18 에스. 오. 이. 떼끄 씰리꽁 오 냉쉴라또흐 떼끄놀로지 에지를 가지는 다중층 웨이퍼의 급속 열적 어닐링 방법
KR101104017B1 (ko) * 2003-10-27 2012-01-06 어플라이드 머티어리얼스, 인코포레이티드 조절된 온도 균일성
US8536492B2 (en) 2003-10-27 2013-09-17 Applied Materials, Inc. Processing multilayer semiconductors with multiple heat sources
KR100802697B1 (ko) * 2005-05-02 2008-02-12 다이닛뽕스크린 세이조오 가부시키가이샤 광방출형 열처리장치
KR101036404B1 (ko) * 2005-11-30 2011-05-23 우시오덴키 가부시키가이샤 광 조사식 가열 장치

Also Published As

Publication number Publication date
TW540121B (en) 2003-07-01

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