KR20010096156A - manufacturing method of a color filter panel for a liquid crystal display - Google Patents
manufacturing method of a color filter panel for a liquid crystal display Download PDFInfo
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- KR20010096156A KR20010096156A KR1020000020110A KR20000020110A KR20010096156A KR 20010096156 A KR20010096156 A KR 20010096156A KR 1020000020110 A KR1020000020110 A KR 1020000020110A KR 20000020110 A KR20000020110 A KR 20000020110A KR 20010096156 A KR20010096156 A KR 20010096156A
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133519—Overcoatings
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134318—Electrodes characterised by their geometrical arrangement having a patterned common electrode
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Abstract
Description
본 발명은 액정 표시 장치용 색 필터 기판의 제조 방법에 관한 것이다.The present invention relates to a method for producing a color filter substrate for a liquid crystal display device.
액정 표시 장치는 일반적으로 공통 전극과 색 필터(color filter) 등이 형성되어 있는 상부 기판과 박막 트랜지스터와 화소 전극 등이 형성되어 있는 하부 기판 사이에 액정 물질을 주입해 놓고 화소 전극과 공통 전극에 서로 다른 전위를 인가함으로써 전계를 형성하여 액정 분자들의 배열을 변경시키고 이를 통해 빛의 투과율을 조절함으로써 화상을 표현하는 장치이다.In general, a liquid crystal display device injects a liquid crystal material between an upper substrate on which a common electrode, a color filter, and the like are formed, and a lower substrate on which a thin film transistor and a pixel electrode are formed. By applying a different potential to form an electric field to change the arrangement of the liquid crystal molecules and thereby to control the light transmittance through which the image is expressed.
그런데, 액정 표시 장치는 시야각이 좁은 단점이 있다. 이러한 단점을 극복하고자 시야각을 넓히기 위한 다양한 방법이 제시되고 있는데, 액정 분자를 상하 기판에 대하여 수직으로 배향하고 화소 전극과 공통 전극에 개구 패턴을 형성하는 PVA(patterned vertical alignment) 방식이 그 한 예이다.However, the liquid crystal display has a disadvantage in that the viewing angle is narrow. To overcome this drawback, various methods for widening the viewing angle have been proposed. For example, a patterned vertical alignment (PVA) method in which liquid crystal molecules are vertically aligned with respect to the upper and lower substrates and an opening pattern is formed in the pixel electrode and the common electrode is one example. .
그러나, PVA 방식의 경우 상부 기판의 색 필터 위에 형성되어 있는 공통 전극에 개구 패턴을 형성할 경우, 공통 전극에 주로 사용되는 ITO(indium tin oxide) 식각시 ITO 식각액에 의해 하부의 색 필터가 손상을 입게 된다. 색 필터의 손상을 방지하기 위하여 색 필터 상부에 유기물질로 이루어진 오버코트막(overcoat layer)을 형성한 다음 ITO를 증착하고 식각하는 방법이 사용되었는데, 오버코트막이 ITO 식각액에 노출될 경우 부풀어 오르게 되어 ITO가 깨지거나, 오버코트막과 ITO 사이가 벌어지고 그 사이로 식각액이 스며들어 언더컷이 일어난다.However, in the case of the PVA method, when the opening pattern is formed on the common electrode formed on the color filter of the upper substrate, the lower color filter is damaged by the ITO etchant during indium tin oxide (ITO) etching, which is mainly used for the common electrode. Will wear. In order to prevent damage to the color filter, an overcoat layer made of an organic material was formed on the color filter, and then ITO was deposited and etched. When the overcoat film is exposed to the ITO etchant, it is swelled. It breaks, or there is a gap between the overcoat and the ITO, and the etch liquid penetrates between them, causing undercuts.
본 발명의 과제는 액정 표시 장치의 시야각을 넓히는 것이다.An object of the present invention is to widen the viewing angle of a liquid crystal display device.
본 발명의 다른 과제는 액정 표시 장치의 색 필터의 손상을 방지하는 것이다.Another object of the present invention is to prevent damage to the color filter of the liquid crystal display device.
도 1은 본 발명에 따른 액정 표시 장치를 도시한 것이고,1 illustrates a liquid crystal display device according to the present invention,
도 2 내지 도 5는 본 발명의 제1 실시예에 따라 액정 표시 장치용 색 필터 기판을 제조하는 방법을 나타낸 것이며,2 to 5 illustrate a method of manufacturing a color filter substrate for a liquid crystal display according to a first embodiment of the present invention.
도 6 내지 도 8은 본 발명의 제2 실시예에 따라 액정 표시 장치용 색 필터 기판을 제조하는 방법을 나타낸 것이다.6 to 8 illustrate a method of manufacturing a color filter substrate for a liquid crystal display according to a second embodiment of the present invention.
이러한 과제를 해결하기 위해 본 발명에서는 색 필터를 보호하기 위한 오버코트막 상부에 개구 패턴을 가지는 공통 전극을 형성하는데 있어 어닐링을 한다.In order to solve this problem, the present invention performs annealing in forming a common electrode having an opening pattern on the overcoat film for protecting the color filter.
본 발명에 따른 액정 표시 장치용 색 필터 기판을 제조하는 방법은 절연 기판 위에 블랙 매트릭스를 형성하고, 색 필터를 형성한다. 다음, 유기막으로 이루어진 오버코트막을 형성하고, 개구 패턴을 가지는 공통 전극을 형성한다. 이때,공통 전극을 형성하는 단계는 어닐링하는 단계를 포함한다.The method for manufacturing a color filter substrate for a liquid crystal display device according to the present invention forms a black matrix on an insulating substrate and forms a color filter. Next, an overcoat film made of an organic film is formed, and a common electrode having an opening pattern is formed. At this time, forming the common electrode includes annealing.
여기서, 어닐링은 200 내지 300℃에서, 30분 내지 180분 동안 이루어질 수 있다.Here, the annealing may be performed at 200 to 300 ° C. for 30 minutes to 180 minutes.
또한, 공통 전극은 ITO로 이루어질 수 있다.In addition, the common electrode may be made of ITO.
본 발명에 따른 다른 색 필터 기판을 제조하는 방법은 절연 기판 위에 블랙 매트릭스를 형성하고, 색 필터를 형성한 다음, 유기막으로 이루어진 오버코트막을 형성한다. 이어, 무기물로 이루어진 버퍼층을 형성하고 개구 패턴을 가지는 공통 전극을 형성한다.Another method of manufacturing a color filter substrate according to the present invention forms a black matrix on an insulating substrate, forms a color filter, and then forms an overcoat film made of an organic film. Next, a buffer layer made of an inorganic material is formed and a common electrode having an opening pattern is formed.
여기서, 버퍼층은 SiO2또는 SiNx중의 어느 하나로 이루어질 수 있으며, 버퍼층의 두께는 100 내지 1,000 Å일 수 있다.Here, the buffer layer may be made of any one of SiO 2 or SiN x , the thickness of the buffer layer may be 100 to 1,000 Å.
이와 같이 본 발명에 따른 색 필터 기판의 제조 방법에서는 색 필터 상부에 오버코트막을 형성하고 공통 전극을 형성한 다음, 어닐링을 하여 오버코트막의 부풀어짐을 방지할 수 있으며, 오버코트막과 공통 전극의 계면에 있는 수분을 제거할 수 있다. 따라서, 오버코트막과 공통 전극의 접촉 특성을 좋게 할 수 있고, 공통 전극의 패터닝도 원활하게 이루어진다. 한편, 오버코트막 상부에 버퍼층을 형성한 다음, 공통 전극을 형성하여 오버코트막이 공통 전극의 식각에 의해 영향을 받지 않도록 함으로써 공통 전극을 패터닝할 수도 있다.As described above, in the method of manufacturing a color filter substrate according to the present invention, an overcoat film is formed on the color filter, a common electrode is formed, and then annealing is prevented to swell the overcoat film, and moisture at the interface between the overcoat film and the common electrode is prevented. Can be removed. Therefore, the contact characteristic of an overcoat film and a common electrode can be improved, and patterning of a common electrode is also performed smoothly. Meanwhile, the common electrode may be patterned by forming a buffer layer on the overcoat layer and then forming a common electrode so that the overcoat layer is not affected by etching of the common electrode.
그러면, 첨부한 도면을 참조하여 본 발명의 실시예에 따른 액정 표시 장치용 색 필터 기판 및 그 제조 방법에 대해 상세히 설명한다.Next, a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention and a manufacturing method thereof will be described in detail with reference to the accompanying drawings.
도 1은 본 발명의 실시예에 따른 액정 표시 장치의 상부 및 하부 기판을 배치한 상태를 나타내는 도면으로서, 두 기판(1, 5)이 일정한 거리를 두고 마주 보고 있으며, 두 기판(1, 5)의 안쪽면에는 각각 전계 생성 전극인 화소 전극(2) 및 공통 전극(7)이 형성되어 있다. 여기서, 화소 전극(2) 및 공통 전극(7)에는 개구부가 형성되어 있으며, 상부 기판(5)의 공통 전극(7) 하부에는 색 필터(6)가 형성되어 있다. 색 필터(6)는 적, 녹, 청의 세가지 색으로 이루어지는데 적, 녹, 청의 세가지 색이 하나의 화소와 마주 대하도록 한다. 전극(2, 7) 위에는 각각 수직 배향막(3, 8)이 형성되어 있고, 두 배향막(3, 8) 사이에는 음의 유전율 이방성을 가지는 액정층(10)이 위치하고 있다. 각각의 기판(1, 5) 바깥면에는 액정층(10)으로 들어가는 빛 및 액정층(9)을 통과해 나오는 빛을 편광시키는 편광판(4, 9)이 부착되어 있는데, 하부 기판(1)에 부착된 편광판(4)의 편광축은 상부 기판(5)에 부착된 편광판(9)의 편광축에 대하여 90˚의 각을 이루고 있다.FIG. 1 is a view illustrating a state where upper and lower substrates are disposed in a liquid crystal display according to an exemplary embodiment of the present invention. The pixel electrode 2 and the common electrode 7 which are electric field generating electrodes are respectively formed in the inner surface of. Here, an opening is formed in the pixel electrode 2 and the common electrode 7, and a color filter 6 is formed under the common electrode 7 of the upper substrate 5. The color filter 6 is composed of three colors of red, green, and blue so that three colors of red, green, and blue face one pixel. Vertical alignment films 3 and 8 are formed on the electrodes 2 and 7, respectively, and the liquid crystal layer 10 having negative dielectric anisotropy is positioned between the two alignment films 3 and 8. On the outer surface of each of the substrates 1 and 5, polarizers 4 and 9 are attached to the lower substrate 1 to polarize the light entering the liquid crystal layer 10 and the light passing through the liquid crystal layer 9. The polarization axis of the attached polarizing plate 4 forms an angle of 90 degrees with respect to the polarization axis of the polarizing plate 9 attached to the upper substrate 5.
도 2 내지 도 5는 본 발명의 제1 실시예에 따른 액정 표시 장치용 색 필터 기판을 제조하는 방법을 도시한 것이다.2 to 5 illustrate a method of manufacturing a color filter substrate for a liquid crystal display according to a first embodiment of the present invention.
먼저, 도 2에 도시한 바와 같이 절연 기판(11) 위에 금속막 또는 불투명 감광성 물질로 이루어진 블랙 매트릭스(20)를 형성하고, 그 상부에 이웃하는 블랙 매트릭스(20)와 일부 중첩되며 서로 분리되도록 적, 녹, 청의 색 필터(30)를 각각 형성한다.First, as shown in FIG. 2, a black matrix 20 made of a metal film or an opaque photosensitive material is formed on the insulating substrate 11, and partially overlaps with the neighboring black matrix 20 on top of the insulating substrate 11 so as to be separated from each other. , Green and blue color filters 30 are formed, respectively.
다음, 도 3에 도시한 바와 같이 색 필터(30) 및 블랙 매트릭스(20)를 덮는 오버코트막(40)을 1.3 ㎛ 정도의 두께로 형성한다.Next, as shown in FIG. 3, the overcoat film 40 covering the color filter 30 and the black matrix 20 is formed to a thickness of about 1.3 μm.
다음, 도 4에 도시한 바와 같이 오버코트막(40) 상부에 SiO2또는 SiNx와 같은 무기막을 100 내지 1,000 Å 정도의 두께로 증착하여 버퍼층(buffer layer)(50)을 형성한다.Next, as shown in FIG. 4, an inorganic film, such as SiO 2 or SiN x , is deposited on the overcoat layer 40 to a thickness of about 100 to 1,000 μm to form a buffer layer 50.
다음, 도 5에 도시한 바와 같이 버퍼층(50) 상부에 ITO(indium tin oxide)와 같은 투명 도전 물질을 증착하고 패터닝하여 개구 패턴을 가지는 공통 전극(60)을 형성한다.Next, as shown in FIG. 5, a transparent conductive material such as indium tin oxide (ITO) is deposited and patterned on the buffer layer 50 to form a common electrode 60 having an opening pattern.
이와 같이 본 발명의 제1 실시예에서는 색 필터(30) 상부에 오버코트막(40)을 형성하고 그 위에 버퍼층(50)을 형성하여 공통 전극(60)을 식각할 때, 오버코트막(40)이 공통 전극(60)의 식각액에 노출되지 않는다.As described above, in the first embodiment of the present invention, when the overcoat layer 40 is formed on the color filter 30 and the buffer layer 50 is formed thereon to etch the common electrode 60, the overcoat layer 40 is formed. It is not exposed to the etchant of the common electrode 60.
한편, ITO막은 주로 압축하려는 컴프레시브 스트레스(compressive stress)를 가지는데, 오버코트막이 부풀게 되면 쉽게 떨어져 나오게 된다. 이러한, ITO막의 스트레스를 작게 하고, 버퍼층(50)을 형성하지 않으면서도 오버코트막(40)의 부풀어짐을 방지할 수 있는 본 발명의 제2 실시예에 대하여 도 6 내지 도 8을 참조하여 설명한다.On the other hand, the ITO film mainly has a compressive stress (compressive stress) to be compressed, and the overcoat film swells easily. The second embodiment of the present invention which can reduce the stress of the ITO film and prevent the swelling of the overcoat film 40 without forming the buffer layer 50 will be described with reference to FIGS. 6 to 8.
먼저, 도 6에 도시한 바와 같이 절연 기판(110) 위에 불투명 물질로 블랙 매트릭스(120)를 형성하고 그 위에 적, 녹, 청의 색 필터(130)를 각각 형성한다.First, as shown in FIG. 6, the black matrix 120 is formed of an opaque material on the insulating substrate 110, and the red, green, and blue color filters 130 are formed thereon, respectively.
다음, 도 7에 도시한 바와 같이 색 필터(130) 및 블랙 매트릭스(120)를 덮는 오버코트막(140)을 형성하고, 그 위에 ITO와 같은 투명 도전 물질을 증착하여 공통 전극(150)을 형성한다. ITO막은 상온 내지 250℃에서 증착하는데 증착 온도가 낮아질수록 ITO막의 스트레스가 작아진다.Next, as shown in FIG. 7, an overcoat layer 140 covering the color filter 130 and the black matrix 120 is formed, and a transparent conductive material such as ITO is deposited thereon to form a common electrode 150. . The ITO film is deposited at room temperature to 250 ° C., but the lower the deposition temperature, the smaller the stress of the ITO film.
다음, 200 내지 300℃ 이상의 온도에서 30분 내지 180분 동안 어닐링(annealing)하여 오버코트막(140)과 공통 전극(150)의 계면에 존재하는 수분을 아웃개싱(outgassing) 시킨다. 그러면 오버코트막(140)이 ITO막의 식각액에 노출되더라도 부풀어짐이 감소되고, 오버코트막(140)과 공통 전극(150)의 접착이 좋아진다. 또한, ITO막이 떨어져 나가는 것을 방지할 수도 있다.Next, annealing (annealing) for 30 to 180 minutes at a temperature of 200 to 300 ℃ or more is outgassing the moisture present at the interface between the overcoat film 140 and the common electrode 150. Then, the swelling is reduced even when the overcoat layer 140 is exposed to the etchant of the ITO layer, and the adhesion between the overcoat layer 140 and the common electrode 150 is improved. It is also possible to prevent the ITO film from falling off.
다음, 도 8에 도시한 바와 같이 공통 전극(150)을 패터닝한다.Next, as shown in FIG. 8, the common electrode 150 is patterned.
한편, 오버코트막(140)은 ITO막의 식각액에 노출되는 시간이 증가할수록 더 많이 부풀어지므로 ITO막의 식각비를 증가시켜 식각되는 시간을 짧게 하면, 오버코트막(140)이 식각액에 노출되는 시간이 적어져 부풀어지는 정도가 감소된다. 따라서, 공통 전극(150)을 패터닝할 때 불량의 발생을 방지할 수 있다.On the other hand, the overcoat layer 140 is inflated more as the time of exposure to the etchant of the ITO film increases, so if the etching time is shortened by increasing the etching rate of the ITO film, the time for overcoat film 140 to be exposed to the etchant becomes less. The degree of swelling is reduced. Therefore, it is possible to prevent the occurrence of defects when patterning the common electrode 150.
이와 같이 본 발명에서는 색 필터 상부에 오버코트막을 형성하고 ITO와 같은 투명 도전 물질을 증착한 다음, 어닐링하여 오버코트막과 ITO막의 접착 특성을 좋게 하며 ITO의 패터닝도 원활하게 이루어지도록 할 수 있다.As described above, in the present invention, an overcoat layer may be formed on the color filter, a transparent conductive material such as ITO is deposited, and then annealed to improve adhesion between the overcoat layer and the ITO layer, and to smoothly pattern the ITO.
본 발명에서는 공통 전극에 개구 패턴을 형성하여 액정 표시 장치의 시야각을 넓게 하면서 색 필터 상부에 오버코트막을 형성하고 ITO와 같은 투명 도전 물질을 증착한 다음 어닐링함으로써, 오버코트막과 ITO의 접착 특성을 좋게 하고 ITO의 패터닝에서 불량을 방지할 수 있으며 색 필터의 손상을 방지할 수 있다. 또한, 오버코트막 상부에 버퍼층을 형성하여 같은 효과를 얻을 수도 있다.In the present invention, by forming an opening pattern on the common electrode to widen the viewing angle of the liquid crystal display, an overcoat film is formed on the color filter, a transparent conductive material such as ITO is deposited, and then annealed to improve adhesion between the overcoat film and ITO. Defects can be prevented in the patterning of the ITO and the damage of the color filter can be prevented. In addition, the same effect can be obtained by forming a buffer layer on the overcoat film.
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| JPH09230314A (en) * | 1996-02-21 | 1997-09-05 | Optrex Corp | Color liquid crystal display element |
| JPH09244064A (en) * | 1996-03-06 | 1997-09-19 | Hitachi Ltd | Liquid crystal display device |
| JP4038846B2 (en) * | 1997-11-12 | 2008-01-30 | 東レ株式会社 | Manufacturing method of color filter for liquid crystal display device |
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| US8004641B2 (en) | 2006-12-21 | 2011-08-23 | Samsung Electronics Co., Ltd. | Color filter substrate and liquid crystal display panel including the same |
| US8259271B2 (en) | 2006-12-21 | 2012-09-04 | Samsung Electronics Co., Ltd. | Color filter substrate and liquid crystal display panel including the same |
| US8553189B2 (en) | 2006-12-21 | 2013-10-08 | Samsung Display Co., Ltd. | Color filter substrate and liquid crystal display panel including the same |
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