KR20010063316A - 정전기 발생장치를 채용한 스핀코팅장치 - Google Patents
정전기 발생장치를 채용한 스핀코팅장치 Download PDFInfo
- Publication number
- KR20010063316A KR20010063316A KR1019990060351A KR19990060351A KR20010063316A KR 20010063316 A KR20010063316 A KR 20010063316A KR 1019990060351 A KR1019990060351 A KR 1019990060351A KR 19990060351 A KR19990060351 A KR 19990060351A KR 20010063316 A KR20010063316 A KR 20010063316A
- Authority
- KR
- South Korea
- Prior art keywords
- dust
- substrate
- spin coating
- main body
- cover
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
- Coating Apparatus (AREA)
Abstract
Description
Claims (2)
- 커버부;상기 커버부와 분리가능하게 결합되어 코팅가능한 내부 공간을 제공하며, 내부커버와 정류판이 순차적으로 설치되는 본체부;상기 정류판 하부에 설치되어 포토 레지스터가 적하된 기판을 장착하는 척;상기 척과 회전축으로 결합되어 상기 기판을 소망하는 속도로 회전가능하게 동력을 공급하는 회전 모우터;상기 본체부의 소정부에 설치되어 본체부 내부에 유입된 이물질을 제거하는 정전기 발생장치;를 포함하는 것을 특징으로 하는 정전기 발생장치를 채용한 스핀코팅장치.
- 제 1 항에 있어서,상기 정전기 발생장치는 전압인가장치와, 상기 전압인가장치로부터 발생된전압이 인가되는 방전 전극과, 상기 방전 전극과 대향되게 설치되어 정전기력으로 흡입 통로로 유입된 분진을 포집하는 집진 전극과, 상기 집진 전극에 포집된 분진을 탈진시키도록 상기 전극상에 설치되는 탈진 장치와, 상기 탈진 장치로부터 탈진된 분진을 저장하는 분진 저장 장치를 포함하는 것을 특징으로 하는 정전기 발생장치를 채용한 스핀코팅장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990060351A KR100603269B1 (ko) | 1999-12-22 | 1999-12-22 | 정전기 발생장치를 채용한 스핀코팅장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990060351A KR100603269B1 (ko) | 1999-12-22 | 1999-12-22 | 정전기 발생장치를 채용한 스핀코팅장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010063316A true KR20010063316A (ko) | 2001-07-09 |
KR100603269B1 KR100603269B1 (ko) | 2006-07-20 |
Family
ID=19628084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019990060351A KR100603269B1 (ko) | 1999-12-22 | 1999-12-22 | 정전기 발생장치를 채용한 스핀코팅장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100603269B1 (ko) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR980005735A (ko) * | 1996-06-25 | 1998-03-30 | 김광호 | 반도체 소자의 파티클 제거 장치 |
JP3831043B2 (ja) * | 1997-01-24 | 2006-10-11 | 東京エレクトロン株式会社 | 回転処理装置 |
JP3410342B2 (ja) * | 1997-01-31 | 2003-05-26 | 東京エレクトロン株式会社 | 塗布装置 |
JP3309207B2 (ja) * | 1997-03-07 | 2002-07-29 | 東京エレクトロン株式会社 | 処理装置 |
-
1999
- 1999-12-22 KR KR1019990060351A patent/KR100603269B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR100603269B1 (ko) | 2006-07-20 |
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