KR20010019019A - An apparatus for forming polymer continuously on the surface of metal by dc plasma polymerization - Google Patents

An apparatus for forming polymer continuously on the surface of metal by dc plasma polymerization Download PDF

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KR20010019019A
KR20010019019A KR1019990035218A KR19990035218A KR20010019019A KR 20010019019 A KR20010019019 A KR 20010019019A KR 1019990035218 A KR1019990035218 A KR 1019990035218A KR 19990035218 A KR19990035218 A KR 19990035218A KR 20010019019 A KR20010019019 A KR 20010019019A
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sample
chamber
heater
unwinding
deposition chamber
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KR1019990035218A
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Korean (ko)
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조천수
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구자홍
엘지전자 주식회사
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Publication of KR20010019019A publication Critical patent/KR20010019019A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/62Plasma-deposition of organic layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/338Changing chemical properties of treated surfaces
    • H01J2237/3382Polymerising

Abstract

PURPOSE: A continuous plasma polymerization device is provided to improve cohesion of a polymerization film and a sample by using an additional heater for increasing a temperature of surface of a sample which is exhausted into a sample discharge area outside a deposition chamber. CONSTITUTION: A continuous plasma polymerization device comprises an unwinding chamber (13) including an unwinding roll (15) unwinding a sample (2) of which surface is treated so as to transfer the sample (2) to other chamber, a deposition chamber (1) plasma polymerizing both surfaces of the sample (2) with DC discharging plasma by installing separate electrodes which are oppositely directed to upper and lower sides of the sample (2) introduced from the unwinding roll (15) of the unwinding chamber (13), a heater (20) installed in a sample discharge area outside the deposition chamber (1), a winding chamber (14) including a winding roll (16) winding a sample (2) of which surface is treated at the deposition chamber (1) and passes through the heater (20), a pumping means for maintaining the deposition chamber (1) in vacuum, and a gas inlet introducing a reactive gas and non reactive gas.

Description

플라즈마중합 연속처리장치{AN APPARATUS FOR FORMING POLYMER CONTINUOUSLY ON THE SURFACE OF METAL BY DC PLASMA POLYMERIZATION}Plasma polymerization continuous processing equipment {AN APPARATUS FOR FORMING POLYMER CONTINUOUSLY ON THE SURFACE OF METAL BY DC PLASMA POLYMERIZATION}

본 발명은 플라즈마중합 연속처리장치에 관한 것이다.The present invention relates to a plasma polymerization continuous processing apparatus.

플라즈마를 이용하여 금속판 등의 시료 표면을 박막코팅 처리하면 경도, 내마모성 등이 뛰어난 피복층이 형성된다. 피복층이 형성된 제품은 자기디스크, 광디스크, 초경질공구 등으로 사용된다. 또한 강철판 표면에 형성된 도장막에 플라즈마처리를 하면 경질화되고, 내구성, 내식성 등이 뛰어난 도장 강판이 얻어진다. 특히, 시료 표면에 고분자중합처리를 하여 친수성 또는 소수성을 향상시키는 표면개질 효과를 얻을 수 있으며, 이렇게 표면개질된 물질은 다양한 범위에 응용되고 있다.When a thin film is coated on the surface of a sample such as a metal plate using plasma, a coating layer having excellent hardness, wear resistance, and the like is formed. Products with a coating layer are used for magnetic disks, optical disks, ultra hard tools, and the like. In addition, when the coating film formed on the surface of the steel sheet is subjected to plasma treatment, the coated steel sheet is hardened and excellent in durability, corrosion resistance and the like is obtained. In particular, the surface modification effect of improving the hydrophilicity or hydrophobicity can be obtained by polymerizing the surface of the sample, and the surface-modified material has been applied to various ranges.

플라즈마중합장치의 대표적인 예로는 WO99/28530에 개시된 장치가 있다.(도 1 참조) 상기 장치의 구성은 크게 진공 챔버(1), 챔버 내에 설치된 전극(4), 진공 챔버의 압력을 조절하기 위한 진공 펌프(5, 6), 진공도를 측정하기 위한 계기(7, 8), 전극에 전위차를 발생시키기 위한 전력공급장치(3), 표면처리 하고자 하는 시료 주위에 반응성 가스 및 질소와 같은 비반응성 가스를 주입하는 반응 가스 조절장치(9, 10) 등으로 이루어져 있다.A typical example of the plasma polymerization apparatus is the apparatus disclosed in WO 99/28530. (See FIG. 1) The configuration of the apparatus is largely a vacuum chamber 1, an electrode 4 installed in the chamber, and a vacuum for adjusting the pressure of the vacuum chamber. Pumps 5, 6, gauges 7 and 8 for measuring the degree of vacuum, power supplies 3 for generating potential differences in the electrodes, and non-reactive gases such as nitrogen and reactive gases around the sample to be surface treated. It consists of the reaction gas regulators 9, 10 etc. which are injected.

상기 장치에 의한 플라즈마중합처리의 일례를 설명하면 다음과 같다.An example of the plasma polymerization treatment by the above apparatus will be described.

챔버(1)에 시료(2)를 설치하고 로터리 펌프(5)를 기동하여 챔버 내부의 압력이 약 10-3Torr 정도의 진공으로 유지되는 것을 열전측정기(thermocouple gauge)(7)로 확인한 후, 확산펌프(6)를 기동시켜 챔버 내부의 압력이 10-6Torr 정도로 유지되는 것을 이온게이지(8)로 확인한다. 시료는 전원(3)에 의하여 애노드(또는 능동 전극)로 바이어스되어 위치하며, 반대쪽 전극(4)은 접지 되어 있다. 챔버의 압력이 일정 진공으로 유지되면 반응성 가스와 비반응성 가스를 원하는 위치 주위에 차례로 주입한다. 상기 가스의 혼합비는 열전측정기의 압력으로 조절한다. 진공 챔버 내의 압력이 일정 압력이 되면 직류 또는 고주파로 방전시킨다. 그러면 직류 또는 고주파에 의하여 발생된 플라즈마 내에서 상기 가스들의 분자 결합이 끊어지게 되고, 끊어진 체인과 활성화된 양이온이나 음이온들이 결합하여 전극 사이에 놓아둔 시료 표면에 중합물을 형성하게 된다.After installing the sample (2) in the chamber (1) and starting the rotary pump (5) to confirm that the pressure inside the chamber is maintained in a vacuum of about 10 -3 Torr by a thermocouple gauge (7), The diffusion pump 6 is started to confirm with the ion gauge 8 that the pressure inside the chamber is maintained at about 10 -6 Torr. The sample is positioned biased to the anode (or active electrode) by the power supply 3, and the opposite electrode 4 is grounded. When the pressure in the chamber is maintained at a constant vacuum, reactive and non-reactive gases are injected in turn around the desired location. The mixing ratio of the gas is controlled by the pressure of the thermoelectric meter. When the pressure in the vacuum chamber reaches a constant pressure, it is discharged by direct current or high frequency. Then, the molecular bonds of the gases are broken in the plasma generated by direct current or high frequency, and the broken chains and activated cations or anions combine to form a polymer on the sample surface placed between the electrodes.

그러나 상기 장치의 경우 연속처리가 불가능하여 생산성이 떨어진다. 반면에 도 2에 나타난 장치를 보면, 연속적으로 플라즈마중합 처리가 가능한 장치의 일부분을 나타낸 단면도로서 특히 대면적의 시료를 박막 코팅시키는데 유리하다. 뿐만 아니라 시료전극의 양쪽 면에 대향전극이 배치되어 있어 동시에 중합이 가능하므로 생산성에 큰 효과를 가져오게 된다. 상기 장치는 챔버(1)에 시료(2)를 주입구(11) 방향에서 배출구(12) 방향으로 이송시키면서 진공펌프(5)를 기동시켜 챔버 내부의 압력을 조절한다. 또한 시료에 전위차를 발생시키는 전극(4)이 있다. 챔버의 압력이 일정 진공으로 유지되면서 반응가스는 반응성 가스주입구(9)로 주입되고 플라즈마를 발생시킨다. 플라즈마 방전시 반응가스들의 분자결합이 끊어지게 되고, 끊어진 체인과 활성화된 양이온이나 음이온들이 결합하여 전극 사이에 위치한 시료 표면에 중합물을 형성한다.However, in the case of the device, the continuous processing is not possible, so productivity is lowered. On the other hand, the apparatus shown in Fig. 2 is a cross-sectional view showing a part of the apparatus capable of continuously performing plasma polymerization, and is particularly advantageous for thin film coating a large-area sample. In addition, since the opposite electrodes are arranged on both sides of the sample electrode, polymerization can be performed at the same time, which brings a great effect on productivity. The apparatus regulates the pressure inside the chamber by starting the vacuum pump 5 while transferring the sample 2 to the chamber 1 from the inlet 11 to the outlet 12. There is also an electrode 4 for generating a potential difference in the sample. While the pressure in the chamber is maintained at a constant vacuum, the reaction gas is injected into the reactive gas inlet 9 and generates a plasma. During plasma discharge, the molecular bonds of the reaction gases are broken, and the broken chain and the activated cations or anions combine to form a polymer on the sample surface located between the electrodes.

그러나 상기 연속 장치에 있어서는 다음과 같은 문제점이 있다. 상기 챔버 내에서 주입구로부터 배출구로 시료가 이송되면서 플라즈마 중합물이 형성될 때 일반적으로 시료 표면에 중합되는 막의 균일도가 떨어진다. 막의 불균일성은 여러가지가 원인이 될 수 있는데, 시료에 대한 각 대향전극간의 전압차이에 의한 것일 수도 있고, 중합처리시 반응가스의 탄화에 의한 것일 수도 있으며, 기타의 원인 및 상기 원인 모두가 포함될 수도 있다. 중합되는 막이 균일하지 못한 경우 시료 표면에 형성된 중합물의 밀착성이 좋지 못하여 원하는 성능에 미치지 못하게 되고, 중합막의 내구성이 떨어져 제품성에도 치명적인 결과를 가져오게 된다.However, the above-described continuous device has the following problems. As the plasma polymer is formed while the sample is transferred from the inlet to the outlet in the chamber, the uniformity of the film polymerized on the surface of the sample generally decreases. The nonuniformity of the film may be caused by various factors, such as due to the voltage difference between the counter electrodes of the sample, carbonization of the reaction gas during the polymerization process, and other causes and all of the above causes. . When the polymerized film is not uniform, the adhesion of the polymer formed on the surface of the sample is not good enough to reach the desired performance, and the durability of the polymerized film is poor, resulting in a fatal result in product quality.

본 발명은 상기의 문제점을 해결하기 위한 것으로서, 연속적으로 플라즈마중합처리하는 경우에 시료에 중합되는 막의 밀착성을 증가시키는 수단을 구비함으로써 내구성이 뛰어난 중합막을 형성하는 플라즈마중합 연속처리 장치를 제공함에 그 목적이 있다.SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and provides a plasma polymerization continuous processing apparatus for forming a polymer film having excellent durability by providing a means for increasing the adhesion of a film polymerized to a sample when the plasma polymerization treatment is performed continuously. There is this.

도 1은 종래기술에 의한 플라즈마중합처리장치를 나타내는 모식도이다.1 is a schematic diagram showing a plasma polymerization processing apparatus according to the prior art.

도 2는 플라즈마중합 연속처리장치의 일부분을 나타낸 단면도이다.2 is a cross-sectional view showing a part of a plasma polymerization continuous processing apparatus.

도 3은 본 발명에 의한 일실시예로서, 히터가 구비된 플라즈마중합 연속처리장치의 단면 모식도이다.3 is a schematic cross-sectional view of a plasma polymerization continuous processing apparatus equipped with a heater according to an embodiment of the present invention.

도 4는 본 발명에 의한 플라즈마중합 연속처리장치에서 히터의 구조를 구체적으로 나타낸 사시도이다.Figure 4 is a perspective view showing in detail the structure of the heater in the plasma polymerization continuous processing apparatus according to the present invention.

*** 도면의 주요 부분에 대한 부호의 설명 ****** Explanation of symbols for the main parts of the drawing ***

1:증착챔버 2:시료1: Deposition chamber 2: Sample

3:전원공급장치 4:대향전극3: power supply 4: counter electrode

5:로터리펌프 6:확산펌프5: rotary pump 6: diffusion pump

7:열전측정기 8:이온게이지7: Thermometer 8: Ion gauge

9:가스조절장치 10:가스조절장치9: gas regulator 10: gas regulator

11:주입구 12:배출구11: Inlet 12: Outlet

13:풀림챔버 14:감김챔버13: Unwind chamber 14: Winding chamber

15:풀림롤 16:감김롤15: Unwinding Roll 16: Winding Roll

17:텐션롤 18:텐션롤17: tension roll 18: tension roll

20:히터 21:열선20: heater 21: heating wire

22:SUS파이프 23:SUS단자22: SUS pipe 23: SUS terminal

24:절연용애자 25:전원공급장치24: insulation insulator 25: power supply

본 발명은 플라즈마중합 연속처리장치에 관한 것으로서, 상기의 문제점을 해결하기 위한 수단으로, 표면처리되는 시료를 풀어주어 다른 챔버로 이송시키는 풀림롤을 포함하는 풀림챔버와, 상기 풀림챔버의 풀림롤로부터 도입되는 시료의 상하에 대향되는 별도의 전극을 설치하여 직류방전 플라즈마에 의해 상기 시료 양 표면 상을 플라즈마중합처리하는 증착챔버와, 상기 증착챔버 외부의 시료 배출 영역에 설치된 히터와, 상기 증착챔버에서 표면처리되고 히터를 통과한 시료를 감아주는 감김롤을 포함하고 있는 감김챔버와, 상기 증착챔버를 진공으로 유지하기 위한 펌핑수단 및 반응성 가스 및 비반응성 가스를 도입하는 가스유입구를 포함하여 구성되는 플라즈마중합 연속처리장치를 제공한다.The present invention relates to a plasma polymerization continuous processing apparatus, and as a means for solving the above problems, from the unwinding chamber including a unwinding roll for releasing the surface-treated sample and transfer to another chamber, and from the unwinding roll of the unwinding chamber In the deposition chamber for providing a separate electrode opposed to the upper and lower sides of the sample to be introduced, the plasma polymerization process on both surfaces of the sample by a direct-current discharge plasma, a heater installed in the sample discharge region outside the deposition chamber, and in the deposition chamber A plasma comprising a winding chamber including a winding roll for winding the sample which has been surface treated and passed through the heater, pumping means for maintaining the deposition chamber in vacuum, and a gas inlet for introducing a reactive gas and a non-reactive gas. Provided is a polymerization continuous apparatus.

상기 히터는 시료의 양면에 일정 간격을 두고 다수 개 설치되어 있는 코일형 열선과, 전원공급장치로부터 전원을 열선으로 인가되도록 하는 SUS단자와, 상기 열선에 전원을 공급하는 전원공급장치와, 상기 열선을 둘러싸는 SUS파이프와 및 상기 파이프의 양단에 위치한 절연용 애자로 구성되어 있다.The heater is a coil-type hot wire installed in a plurality of spaced on both sides of the sample, a SUS terminal for applying power to the heating wire from the power supply device, a power supply for supplying power to the heating wire, and the heating wire It is composed of a SUS pipe surrounding the and insulator for insulation located at both ends of the pipe.

또한 히터에 의해 시료 표면의 온도는 80 ~ 150℃의 범위로 증가시켜 유지된다.In addition, the temperature of the sample surface is increased and maintained in the range of 80-150 degreeC by a heater.

중합물이 형성된 시료 표면이 불균일한 상태에서 온도를 증가시킬 경우 시료 표면에 형성된 중합막의 분지활동이 활발해지게 된다. 이렇게 활발해진 분자활동은 중합된 막의 분자 배열을 변화시키고 균일한 배열이 되게 한다. 균일해진 분자배열은 결과적으로 플라즈마 중합처리된 시료 표면의 밀착성을 향상시키게 된다.When the temperature is increased while the sample surface on which the polymer is formed is uneven, the branching activity of the polymer film formed on the sample surface becomes active. This active molecular activity changes the molecular arrangement of the polymerized membrane and results in a uniform arrangement. The homogeneous molecular arrangement results in improved adhesion of the plasma polymerized sample surface.

본 발명은 상기의 원리를 기본 착상으로 하여 온도 증가 수단으로 코일형 열선을 다수 개 구비하는 히터를 플라즈마중합 연속처리장치에 추가로 구비시킴으로써 종래 기술의 문제점을 해결한다.The present invention solves the problems of the prior art by additionally providing a plasma polymerization continuous processing apparatus with a heater having a plurality of coil type hot wires as a temperature increasing means based on the above principle.

도 3에 본 발명에 의한 일실시예가 나타나 있다. 도 3을 보면 풀림롤(15)에서 주입구(17)를 통해 증착챔버로 이송되어온 시료(2)가 대향전극(4)에 의해 플라즈마 중합처리된 후 배출구를 거쳐 감김롤(16)로 이송되는 과정에서 상기 증착챔버와 감김롤 사이에 히터(20)가 구비되어 있는 것을 알 수 있다. 도 3에 나타난 실시예에서는 코일형 열선(21)이 시료의 양면에 각각 두 개씩 구비된 히터를 보여주고 있다. 도 3의 경우 증착챔버와 감김챔버 사이에 히터가 위치하고 있으나 다른 영역에 히터를 위치시킬 수 있다. 예컨데 감김챔버 내에 히터를 설치하고 감김롤에 시료가 감기기 전에 히터로 시료 표면 온도를 증가시켜 중합막의 밀착성을 향상시킬 수도 있다. 도 3에 도시된 본 발명의 히터는 롤형 히터를 예시한 것으로, 상기 롤형 히터로써 텐션롤(18)을 대치할 수도 있다. 또한, 본 발명의 히터로서는 도시되지는 않았으나 롤형 이외에 판형, 선형 히터 등으로 실시 가능하다.3 shows an embodiment according to the present invention. Referring to FIG. 3, the sample 2 transferred from the unwinding roll 15 to the deposition chamber through the injection hole 17 is plasma-polymerized by the counter electrode 4, and then transferred to the winding roll 16 through the discharge port. It can be seen that the heater 20 is provided between the deposition chamber and the winding roll. In the embodiment shown in Figure 3 shows a heater provided with two coil-type heating wire 21 on each side of the sample. In FIG. 3, the heater is located between the deposition chamber and the winding chamber, but the heater may be positioned in another region. For example, a heater may be installed in the winding chamber and the sample surface temperature may be increased by the heater before the sample is wound on the winding roll to improve the adhesion of the polymer film. The heater of the present invention shown in FIG. 3 exemplifies a roll heater, and may replace the tension roll 18 with the roll heater. In addition, although not shown as a heater of this invention, it can implement with a plate type | mold, a linear heater, etc. other than a roll type.

도 4에는 본 발명에 의한 히터를 구비한 플라즈마중합 연속처리장치에서 상기 히터의 구조를 구체적으로 나타낸 사시도이다. 도 4의 경우 편의상 코일형 열선(21)이 한 개인 경우에 대해 도시하고 있으나 중합처리에 따라 상기 열선의 수는 증가될 수 있다. 도 4에서 나타난 바와 같이 히터는 코일형 열선(21)과 상기 열선 안의 SUS단자(23)와 상기 열선을 둘러싸는 SUS파이프(22)와 상기 파이프의 양단에 설치된 절연용 애자(24) 및 전원 공급장치(25)로 구성되어 있다.Figure 4 is a perspective view showing in detail the structure of the heater in the plasma polymerization continuous processing apparatus having a heater according to the present invention. In FIG. 4, for convenience, one coil-type heating wire 21 is illustrated, but the number of the heating wires may be increased according to a polymerization process. As shown in FIG. 4, the heater is provided with a coil-type heating wire 21, an SUS terminal 23 in the heating wire, an SUS pipe 22 surrounding the heating wire, and an insulator 24 provided at both ends of the pipe and a power supply. The apparatus 25 is comprised.

본 발명에 의하면 종래 연속적으로 플라즈마중합처리하는 장치에 증착챔버 외부의 시료 배출 영역에 배출되는 시료 표면의 온도를 증가시키기 위하여 히터를 추가로 구비함으로써, 시료 표면의 온도를 증가시켜 분자활동을 활발하게 하고 따라서 분자배열이 균일한 중합막이 형성되도록 할 수 있으며, 결과적으로 중합막과 시료의 밀착성을 향상시킨 플라즈마중합 연속처리 장치를 제공하게 된다.According to the present invention, by further comprising a heater in order to increase the temperature of the sample surface discharged to the sample discharge region outside the deposition chamber in the conventional continuous plasma polymerization apparatus, by increasing the temperature of the sample surface active molecular activity Accordingly, a polymer film having a uniform molecular arrangement can be formed, and as a result, a plasma polymerization continuous processing apparatus can be provided in which adhesion between the polymer film and the sample is improved.

Claims (1)

표면처리되는 시료를 풀어주어 다른 챔버로 이송시키는 풀림롤을 포함하는 풀림챔버와,An unwinding chamber including a unwinding roll for releasing the surface treated sample and transferring it to another chamber; 상기 풀림챔버의 풀림롤로부터 도입되는 시료의 상하에 대향되는 별도의 전극을 설치하여 직류방전 플라즈마에 의해 상기 시료 양 표면 상을 플라즈마중합처리하는 증착챔버와,A deposition chamber in which a separate electrode opposed to the upper and lower sides of the sample introduced from the unwinding roll of the unwinding chamber is plasma-polymerized on both surfaces of the sample by a direct-current discharge plasma; 상기 증착챔버 외부의 시료 배출 영역에 설치된 히터와,A heater installed in a sample discharge area outside the deposition chamber; 상기 증착챔버에서 표면처리되고 히터를 통과한 시료를 감아주는 감김롤을 포함하고 있는 감김챔버와,A winding chamber including a winding roll for winding a sample which is surface treated in the deposition chamber and passed through a heater; 상기 증착챔버를 진공으로 유지하기 위한 펌핑수단 및Pumping means for maintaining the deposition chamber in vacuum; 반응성 가스 및 비반응성 가스를 도입하는 가스유입구를 포함하여 구성되는 플라즈마중합 연속처리장치.A plasma polymerization continuous processing apparatus comprising a gas inlet for introducing a reactive gas and a non-reactive gas.
KR1019990035218A 1999-08-24 1999-08-24 An apparatus for forming polymer continuously on the surface of metal by dc plasma polymerization KR20010019019A (en)

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