KR20020037997A - Power supplying method in an apparatus for continuous plasma polymerization - Google Patents

Abstract

PURPOSE: A method for applying a power of a plasma polymerization continuous processing apparatus is provided, which improves a quality of a polymer film polymerized on a surface of a base film. CONSTITUTION: A power supply voltage(40) is applied to an idle roller(51) and a facing electrode(22). The idle roller is located beside an unwinder roll(11) of a transport chamber(36) and contacts with a transported base film and endows a tensile force to prevent the base film from being drooped. An axis of both ends of the idle roller is supported by an axis supporting part. The base film is polymerized in a polymerization chamber(20) while being transported from an unwinder chamber(36) to a winder chamber(38), and a pressure in the chamber is controlled by a vacuum pump. And an electrode(22) facing the base film generates a voltage difference in the base film. A reaction gas is injected through an injection hole and a plasma discharge is occurred by an electricity applied to the electrode. During the plasma discharge, a molecular bonding of the reaction gas is disconnected, and a polymer is formed on a surface of the base film located between the electrodes.

Description

POWER SUPPLYING METHOD IN AN APPARATUS FOR CONTINUOUS PLASMA POLYMERIZATION}

The present invention relates to a method for applying power to a plasma polymerization continuous processing apparatus.

When the surface of a substrate such as a metal plate is subjected to a thin film coating using plasma, a coating layer having excellent hardness, wear resistance, and the like is formed on the surface. Products with a coating layer are used for magnetic disks, optical disks, ultra hard tools, and the like. In addition, when the coating film formed on the surface of the steel sheet is subjected to plasma treatment, the coated steel sheet is hardened and excellent in durability, corrosion resistance and the like is obtained. In particular, the surface modification effect to improve the hydrophilicity or hydrophobicity can be obtained by the polymer polymerization treatment on the surface of the substrate, the surface-modified material has been applied to various ranges.

When the continuous operation of the plasma polymerization treatment can be performed, the productivity is improved. For insulating materials such as resin films, woven fabrics, and nonwoven fabrics for band-type substrates, the sequencing of the plasma polymerization process is relatively easy, and various apparatuses have already been proposed.

FIG. 1 shows an apparatus designed to continuously perform a plasma polymerization treatment on a strip-shaped substrate. This apparatus allows plasma discharge to occur under a specific pressure atmosphere, thereby enabling the discharge voltage to be applied only to the electrode portion.

The plasma polymerization processing apparatus includes a feed chamber 10 in which a pair of unwinding rolls 11, a winding roll 12, a pair of tension rolls 13, 14, and a supporter 15 are disposed, and a substrate. An insulating shielding plate provided between the deposition chamber 20 in which deposition is carried out, the electrode 21 on the roll provided in the deposition chamber, the counter electrode 22 disposed opposite to the electrode on the roll, and the transfer chamber and the deposition chamber. 30, two differential pressure ports 31 and 32 formed on the shield plate to maintain the pressure difference between the transfer chamber and the deposition chamber, and a vacuum pump controlling the pressure atmospheres of the transfer chamber and the deposition chamber ( 17 and 18, a gas inlet 23 for injecting raw material gas into the deposition chamber, and exhaust ports 16 and 24 connected to the transfer chamber and the deposition chamber.

The band-shaped metal substrate 1 to be polymerized is transferred from the unwinding roll 11 in the transfer chamber 10 and introduced into the deposition chamber 20 through one of the differential pressure ports 31, and into the electrode 21 on the roll. After moving to pass near the counter electrode 22 is passed to the winding roll 12 in the transfer chamber 10 through the other pressure-receiving port (32). The apparatus is characterized in that the pressure atmosphere of the deposition chamber is a glow discharge atmosphere in the process of performing a plasma polymerization treatment by a high frequency discharge on the band metal substrate transferred from the transfer chamber to the deposition chamber and returning the band metal substrate to the transfer chamber. The pressure atmosphere of the transfer chamber is characterized by a non-glow discharge atmosphere lower than that of the deposition chamber.

In the plasma polymerization apparatus, a roll-shaped electrode and an electrode bent as a counter electrode are disposed in a deposition chamber in which a plasma reaction occurs due to a high frequency discharge, and one surface of the substrate to be deposited is in contact with the roll electrode. In this case, since the substrate between the roll electrode and the counter electrode where the plasma is active is deposited only on the side opposite to the counter electrode side of the both sides, the plasma processing operation must be performed once more to deposit the other side. There was a feeling.

In addition, the polymer film formed on the surface of the substrate by the discharge occurring between the electrodes is different when the electrode facing the substrate is the anode and the cathode, and a more suitable discharge method is required to make the quality of the polymer film uniform and improved.

An object of the present invention is to provide a novel discharge method that can improve the quality of a polymerized film polymerized on the surface of a substrate in a plasma polymerization continuous processing apparatus.

1 is a schematic cross-sectional view showing a conventional plasma polymerization continuous processing apparatus.

2 is a schematic cross-sectional view showing a plasma polymerization continuous processing apparatus of the present invention.

3 is a plan view specifically illustrating the idler roller in FIG. 2.

4 is a cross-sectional view showing in detail the shaft support for supporting the idle roller of FIG.

5 is a cross-sectional view showing in detail the unwinding roll or the winding roll of FIG.

*** Explanation of symbols for main parts of drawing ***

11: Unwinding Roll 12: Winding Roll

36: loosening chamber 38: winding chamber

51: idler roller 52: shaft

53: Bearing 54: Block

55: insulating member 56: support

57: Connector

The present invention includes a transfer chamber having a unwinding roll for releasing the substrate and a winding roll for winding the substrate, and a polymerization chamber in which the substrate is transferred from the transfer chamber to polymerize the surface thereof, and using the surface-treated substrate as an electrode. In the plasma polymerization apparatus, the transfer chamber is provided with an idle roller for applying tension to the substrate, the polymerization chamber is provided with an opposing electrode facing the substrate, and the substrate is applied to one of the electrodes by applying power to the idle roller. Provided is a method for applying power to a plasma polymerization continuous processing apparatus, characterized in that it is used.

In addition, the present invention provides an appropriate insulation method between the substrate and the chamber required when the power is applied. The transfer chamber may be composed of a unwinding chamber including a unwinding roll for releasing the substrate and a winding chamber including a winding roll for winding the substrate.

With reference to the drawings, the present invention will be described through specific embodiments.

2 schematically shows a plasma polymerization apparatus according to the present invention. Looking at the figure, it can be seen that the power supply 40 is applied to the idle roller 51 and the counter electrode 22. The idle roller 51 is positioned next to the unrolling roll 11 of the transfer chamber 36 and in contact with the substrate 1 to be conveyed to maintain a constant feeding path of the substrate and to provide tension to prevent the substrate from sagging. 3 is a plan view showing a state in which the sample 1 is in contact with the idle roller 51. The shafts 52 at both ends of the idle roller are supported by the shaft support 50. In the present apparatus of FIG. 2, the substrate 1 is polymerized in the polymerization chamber 20 while being transferred from the unwinding chamber 36 to the winding chamber 38, and the vacuum pump 24 controls the pressure in the chamber. The electrode 22 opposite to generates a potential difference in the substrate. In the drawing, the counter electrode is provided only on the lower side of the substrate, but the counter electrode may be provided on the upper and lower surfaces of the substrate. In this case, there is an advantage in that both sides of the substrate can be polymerized at once. When the pressure of the polymerization chamber 20 is maintained at a constant vacuum, the reaction gas is injected through the injection port 23 and the plasma discharge is generated by the electricity applied to the electrode 22. The molecular bonds of the reaction gases are broken during the plasma discharge, and the polymers are formed on the surface of the substrate 1 positioned between the electrodes 22 by combining the broken chains with activated cations or anions.

In the case of the above device, by applying power to the idle roller 51, the substrate 1 itself which is continuously polymerized while being transferred from the unwinding chamber 36 to the winding chamber 38 can be used as one of the electrodes. When the substrate is used as an electrode, in particular as an anode, the surface of the substrate can be polymerized more effectively, and the aging characteristic of the degree to which the properties of the polymerized film changes over time is improved.

When power is applied to the substrate, the substrate acts as an electrode together with the counter electrode in the polymerization chamber, and plasma discharge occurs between the counter electrode and the substrate, thereby polymerizing the surface of the substrate.

Since power is applied to the substrate, power is also applied to all metal materials directly or indirectly connected to the substrate. The outer wall of the chamber is made of metal. If the insulation between the chamber and the substrate is not made, there is a risk of electric shock when the device is controlled or the accessories are replaced during the polymerization process. In addition, when an unexpected discharge occurs in a region other than the polymerization chamber, properties of the film polymerized on the surface of the substrate may deteriorate.

Therefore, it is essential to insulate the substrate from the chamber when power is applied to the substrate as in the present invention. The insulation method will be described below with reference to the present invention.

First of all, insulation of the shaft support for supporting the idle roller is required. 4 shows a cross section of the shaft support. The shaft support portion includes a bearing 53 for inserting and rotating the shafts 52 at both ends of the idle roller, a block 54 at which the bearing is installed, and a power supply for the high voltage supply part at one side of the block. The connector 57 is connected to the support, a support for supporting the block from below, and a support 56 for transferring the load applied to the idle roller to the bottom of the chamber, and an insulating member inserted between the block and the support to electrically insulate the connector 57. It consists of 55, the shaft support portion serves to transfer the load of the substrate applied to the idle roller to the transfer chamber bottom. The block 54, the bearing 53, and the shaft 52 are made of metal, and power is applied to the idle roller by connecting power to the connector 57 of the block 54. As a result, the substrate is in contact with the idle roller. Is used as the electrode (anode).

Since the substrate is used as an electrode, it is necessary to insulate not only the axial support portion but also the unwinding roll and the winding roll from each chamber. Fig. 5 shows a cross section of the roll-shaped substrate in the unwinding chamber or the winding chamber and shows how to insulate the axis in the center of the roll. The base material 60 is wound in the bobbin 61 in the form of a roll, and the bobbin 61 is engaged with a bearing 62 in which a shaft 63 is fitted at the center thereof. Although the bobbin and the bearing are engaged in three parts at an angle of 120 [deg.] On the circumference, other forms, for example four parts, may be possible. The upper part of the part where the bobbin and the bearing are engaged is made of an insulating member 64, so that power is applied to the base 60 so that the shaft 63 is insulated even if a current flows. Therefore, all parts connected to the shaft, for example, the driving unit for rotating the shaft, the chamber, the shaft support and the like is insulated.

As described above, even when power is applied to the substrate indirectly by applying power to the idle roller, the axial support portion supporting the idle roller and the bobbin on which the substrate is rolled are insulated to prevent electricity from passing through the chamber outer wall or other parts of the apparatus. You can do that. Therefore, even if the substrate acts as one of the electrodes, since the electricity does not pass through the chamber, the polymerization can be safely performed.

According to the present invention, by using the substrate as one of the electrodes, particularly as the anode, it is possible to obtain the effect of uniforming the film polymerized to the substrate and improving aging characteristics when discharge occurs between the substrate and the counter electrode in the polymerization chamber. In addition, the use of the substrate as an electrode can effectively prevent problems such as electric shock that may occur in advance through an appropriate insulation method.

Claims (4)

A transfer chamber having a release roll for releasing the substrate and a take-up roll for winding the substrate, and a polymerization chamber in which the substrate is transferred from the transfer chamber to polymerize the surface thereof, and using a surface-treated substrate as an electrode. In the apparatus, the transfer chamber includes an idle roller for tensioning the substrate, the polymerization chamber includes a counter electrode facing the substrate, and the substrate is used as one of the electrodes by applying power to the idle roller. A method for applying power to a plasma polymerization continuous processing apparatus. According to claim 1, wherein both ends of the idler roller is supported by the shaft support portion, the shaft support portion is a bearing for inserting the end of the idle roller is rotatable, the block in which the bearing is installed, the block of A connector installed at one side to connect the power supply of the high voltage supply unit, a support for supporting the block from below, and a load applied to the idle roller to be transmitted to the bottom of the chamber, and inserted and electrically insulated between the block and the support; And a power supply to the idle roller by connecting power to the connector. The method of claim 1, wherein the unwinding roll or the winding roll of the transfer chamber is composed of a substrate wound in the form of a roll in a bobbin, a bearing engaged with an insulating member at the center of the bobbin, and an axis of the bearing center. Power supply method of a plasma polymerization continuous processing apparatus. The method of claim 1, wherein the transfer chamber is composed of an unwinding chamber including a unwinding roll for releasing the substrate and a winding chamber including a winding roll for winding the substrate.