KR20010019014A - Dc plasma polymerization system - Google Patents

Dc plasma polymerization system Download PDF

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Publication number
KR20010019014A
KR20010019014A KR1019990035213A KR19990035213A KR20010019014A KR 20010019014 A KR20010019014 A KR 20010019014A KR 1019990035213 A KR1019990035213 A KR 1019990035213A KR 19990035213 A KR19990035213 A KR 19990035213A KR 20010019014 A KR20010019014 A KR 20010019014A
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South Korea
Prior art keywords
electrode
counter electrodes
deposition chamber
plasma polymerization
sample
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KR1019990035213A
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Korean (ko)
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안승표
이현욱
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구자홍
엘지전자 주식회사
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Priority to KR1019990035213A priority Critical patent/KR20010019014A/en
Publication of KR20010019014A publication Critical patent/KR20010019014A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/338—Changing chemical properties of treated surfaces
    • H01J2237/3382—Polymerising

Abstract

PURPOSE: A plasma polymerization device is provided to form uniformed power density on a sample of which surface is treated by providing a plasma polymerization device in which a plurality of counter electrodes are installed in a deposition chamber, and an electrode is structured so that an electric potential difference between the plurality of counter electrodes and a sample electrode is independently maintained. CONSTITUTION: A plasma polymerization device comprises an electrode which is structured so that a plurality of counter electrodes (4) independently maintain electric potential differences differently from a sample electrode (1) by installing the plurality of counter electrodes (4) in a deposition chamber (20) and differing a distance between the plurality of counter electrodes (4) and the sample electrode (1). A plasma polymerization device comprises an electrode which is structured so that a plurality of counter electrodes (4) independently maintain electric potential differences differently from a sample electrode (1) by installing the plurality of counter electrodes (4) in a deposition chamber (20) and connecting resistors to the plurality of counter electrodes (4). A plasma polymerization device comprises an electrode which is structured so that counter electrodes (4) which are inclined against a sample electrode (1) are installed in a deposition chamber (20).

Description

플라즈마중합처리장치{DC PLASMA POLYMERIZATION SYSTEM}Plasma Polymerization System {DC PLASMA POLYMERIZATION SYSTEM}

본 발명은 플라즈마중합처리장치에 관한 것이다.The present invention relates to a plasma polymerization apparatus.

플라즈마를 이용하여 금속판 등의 시료 표면을 박막코팅 처리하면 경도, 내마모성 등이 뛰어난 피복층이 형성된다. 피복층이 형성된 제품은 자기디스크, 광디스크, 초경질공구 등으로 사용된다. 또한 강철판 표면에 형성된 도장막에 플라즈마처리를 하면 경질화되고, 내구성, 내식성 등이 뛰어난 도장 강판이 얻어진다. 특히, 시료 표면에 고분자중합처리를 하여 친수성 또는 소수성을 향상시키는 표면개질 효과를 얻을 수 있으며, 이렇게 표면개질된 물질은 다양한 범위에 응용되고 있다.When a thin film is coated on the surface of a sample such as a metal plate using plasma, a coating layer having excellent hardness, wear resistance, and the like is formed. Products with a coating layer are used for magnetic disks, optical disks, ultra hard tools, and the like. In addition, when the coating film formed on the surface of the steel sheet is subjected to plasma treatment, the coated steel sheet is hardened and excellent in durability, corrosion resistance and the like is obtained. In particular, the surface modification effect of improving the hydrophilicity or hydrophobicity can be obtained by polymerizing the surface of the sample, and the surface-modified material has been applied to various ranges.

일본공개특허공보 평6-136506호에 나타난 종래의 플라즈마중합처리장치는 한 벌의 풀림롤(11)과 감김롤(12)과 한 쌍의 텐션롤(13, 14)과 지지구(15)가 배치된 이송챔버(10)와, 기재에 대하여 증착이 이루어지는 증착챔버(20)와, 상기 증착챔버 내에 설치된 롤형태의 전극(21) 및 롤형태의 전극에 대향 배치된 대향전극(22)과, 상기 이송챔버 및 증착챔버 사이에 마련되어 있는 절연성의 차폐판(30)과, 상기 차폐판에 형성되어 있고 이송챔버와 증착챔버의 압력차를 유지하도록 하는 두 개의 차압구(31, 32)와, 상기 이송챔버 및 증착챔버의 압력분위기를 제어하는 진공펌프(17, 18)와, 상기 증착챔버에 원료가스를 주입하는 가스주입구(23)와, 상기 이송챔버 및 증착챔버에 접속된 배기구(16, 24)로 구성되어 있다.In the conventional plasma polymerization apparatus shown in Japanese Patent Laid-Open No. 6-136506, a pair of unwinding rolls 11, a winding roll 12, a pair of tension rolls 13, 14, and a supporter 15 A transfer chamber 10 disposed, a deposition chamber 20 in which deposition is performed on the substrate, a roll-shaped electrode 21 provided in the deposition chamber, and an opposite electrode 22 disposed opposite to the roll-shaped electrode; An insulating shield plate 30 provided between the transfer chamber and the deposition chamber, two differential pressure ports 31 and 32 formed on the shield plate to maintain a pressure difference between the transfer chamber and the deposition chamber; Vacuum pumps 17 and 18 for controlling the pressure atmosphere of the transfer chamber and the deposition chamber, a gas inlet 23 for injecting raw material gas into the deposition chamber, and exhaust ports 16 and 24 connected to the transfer chamber and the deposition chamber. It consists of).

상기 장치에 있어서 중합처리되는 띠형 금속재(1)는 이송챔버 내의 풀림롤로부터 이송되어 한쪽의 차압부를 지나 증착챔버에 도입되며, 상기 롤형태의 전극으로 이동하여 상기 대향전극 부근을 통과한 후 다른쪽 차압부를 지나 이송챔버 내의 감김롤로 이송된다. 상기 장치는 이송챔버로부터 증착챔버에 이송되는 띠형 금속재에 고주파방전에 의한 플라즈마 중합처리를 하고 다시 이송챔버로 상기 띠형 금속재를 돌려보내는 과정에서 상기 증착챔버의 압력분위기는 글로우(glow) 방전분위기로 하고, 이송챔버의 압력분위기는 증착챔버 보다 낮은 비글로우방전분위기로 하는 것을 특징으로 하고 있다.In the apparatus, the band-shaped metal material 1 which is polymerized is transferred from the unwinding roll in the transfer chamber and introduced into the deposition chamber through one of the differential pressure portions, and moves to the roll-shaped electrode to pass near the counter electrode and then to the other side. It is conveyed by the winding roll in a conveyance chamber past a differential pressure part. The apparatus is characterized in that the pressure atmosphere of the deposition chamber is a glow discharge atmosphere in the process of performing a plasma polymerization treatment by a high frequency discharge on the band metal material transferred from the transfer chamber to the deposition chamber and returning the band metal material to the transfer chamber. The pressure atmosphere of the transfer chamber is characterized by a non-glow discharge atmosphere lower than that of the deposition chamber.

플라즈마 방전은 그 방전의 종류에 대응하는 특정한 압력분위기에서 발생하는 경향을 갖고 있다. 예를 들면 플라즈마 중합 반응은 일반적으로 10-3~ 10 torr의 압력분위기일 때 발생하기 쉽고, 이 압력분위기를 벗어날 때 글로우방전이 발생하기 어렵다. 따라서 띠형 도전성 금속재를 중합처리하는 경우라도 이송챔버 영역과 증착챔버 영역을 구분하고, 상기 차압구에 의하여 각각의 영역을 다른 압력분위기로 유지하면서 증착챔버에서는 10-3~ 10 torr의 압력분위기로 하고, 이송챔버에서는 상기 범위 이외의 압력분위기로 하면 증착챔버에서는 글로우방전이 발생하지만 이송챔버에서는 글로우방전이 발생하기 어려우므로 이상방전을 억제할 수 있다고 적고 있다.Plasma discharges tend to occur in specific pressure atmospheres corresponding to the type of discharge. For example, the plasma polymerization reaction is generally easy to occur in a pressure atmosphere of 10 −3 to 10 torr, and glow discharge is less likely to occur when the pressure is outside the pressure atmosphere. Therefore, even in the case of polymerizing the band-shaped conductive metal material, the transfer chamber region and the deposition chamber region are divided, and each pressure region is maintained at a different pressure atmosphere by the pressure differential, and the pressure chamber is 10 -3 to 10 torr in the deposition chamber. In the transfer chamber, if the pressure atmosphere is outside the above range, glow discharge occurs in the deposition chamber, but glow discharge hardly occurs in the transfer chamber. Therefore, abnormal discharge can be suppressed.

상기의 종래의 플라즈마중합처리장치의 대향전극은 롤형태의 전극의 원주면을 따라 일정한 간격을 유지할 수 있도록 절곡형상으로 되어 있다. 즉, 전극간의 전위차가 일정하도록 시료전극(전극으로 사용되는 금속 기재)과 대향전극간의 거리를 일정하게 하였다. 그러나 실제 방전에 의해 플라즈마가 발생하게 되면 대향전극의 각 부분에 따라 탄화 현상이 서로 다르게 일어나며 이로 인하여 대향전극의 부위별로 전력밀도가 달라지는 문제점이 있으며, 금속기재를 연속적으로 이송시키면서 플라즈마중합처리할 때 대향전극의 전력밀도가 부위별로 다르게 되면 중합막이 균일하게 증착되기 어렵다.The counter electrode of the conventional plasma polymerization apparatus is bent so as to maintain a constant interval along the circumferential surface of the roll-shaped electrode. That is, the distance between the sample electrode (metal substrate used as the electrode) and the counter electrode was made constant so that the potential difference between the electrodes was constant. However, when the plasma is generated by the actual discharge, the carbonization phenomenon occurs differently according to each part of the counter electrode, which causes a problem that the power density is changed for each part of the counter electrode. When plasma polymerization is carried out while continuously transferring the metal substrate, If the power density of the counter electrode is different for each part, it is difficult to deposit the polymer film uniformly.

본 발명은 상기와 같이 전극간의 위치가 고정되어 있는 경우 탄화 현상 등 전압 변화를 유발시키는 상황에 적극적으로 대처하기가 어려운 문제점을 해결하고, 나아가 전극의 위치에 따라 전압을 능동적으로 제어함으로써 원하는 성질의 중합막을 형성시킬 수 있는 전극구조의 플라즈마중합처리장치를 제공하는데 그 목적이 있다.The present invention solves the problem that it is difficult to actively cope with a situation that causes a voltage change, such as carbonization phenomenon when the position between the electrodes is fixed as described above, and furthermore by actively controlling the voltage according to the position of the electrode It is an object of the present invention to provide a plasma polymerization treatment apparatus having an electrode structure capable of forming a polymer film.

도 1은 종래의 플라즈마중합처리장치를 나타낸 단면모식도이다.1 is a schematic cross-sectional view showing a conventional plasma polymerization processing apparatus.

도 2는 본 발명에 의한 다른 실시예를 나타내는 모식도로서, 각각의 대향전극의 거리가 다른 경우를 보여준다.Figure 2 is a schematic diagram showing another embodiment according to the present invention, showing a case where the distance of each counter electrode is different.

도 3은 본 발명에 의한 다른 실시예를 나타내는 모식도로서, 각 대향전극에 가변실린더가 부착된 경우를 보여준다.Figure 3 is a schematic diagram showing another embodiment according to the present invention, showing a case where a variable cylinder is attached to each counter electrode.

도 4는 본 발명에 의한 다른 실시예를 나타내는 모식도로서, 각 대향전극에 저항이 부착된 경우를 보여준다.Figure 4 is a schematic diagram showing another embodiment according to the present invention, showing a case where a resistor is attached to each counter electrode.

도 5는 본 발명에 의한 다른 실시예를 나타내는 모식도로서, 각 대향전극에 가변자항이 부착된 경우를 보여준다.5 is a schematic diagram showing another embodiment according to the present invention, and shows a case where a variable magnetic term is attached to each counter electrode.

도 6은 본 발명에 의한 또 다른 실시예를 나타내는 모식도로서, 가변실린더에 의해 대향전극이 경사지는 모습을 보여준다.Figure 6 is a schematic diagram showing another embodiment according to the present invention, showing a state in which the counter electrode is inclined by a variable cylinder.

*** 도면의 주요 부분에 대한 부호의 설명 ****** Explanation of symbols for the main parts of the drawing ***

1:시료 4:대향전극1: Sample 4: Counter electrode

5:전원공급장치 6:가변실린더5: power supply unit 6: variable cylinder

7:저항 8:가변저항7: resistance 8: variable resistance

9:플라즈마영역 10:이송챔버9: plasma area 10: transfer chamber

11:풀림롤 12:감김롤11: Unwinding Roll 12: Winding Roll

13:텐션롤 14:텐션롤13: Tension roll 14: Tension roll

15:지지구 16:배기구15: support 16: exhaust vent

17:진공펌프 18:진공펌프17: vacuum pump 18: vacuum pump

20:증착챔버 21:롤상의 전극20: deposition chamber 21: electrode on the roll

22:대향전극 23:가스주입구22: counter electrode 23: gas inlet

24:배기구 30:차폐판24: exhaust vent 30: shield plate

31:차압구 32:차압구31: Differential pressure port 32: Differential pressure port

본 발명은 상기의 문제점을 해결하기 위하여 증착챔버 내에 다수의 대향전극을 설치하고 상기 다수의 대향전극과 시료전극과의 거리를 다르게 함으로써 상기 다수의 대향전극은 시료전극에 대하여 서로 독립적인 전위차를 유지하는 전극구조를 포함하여 구성되는 플라즈마중합처리장치를 제공한다. 상기 플라즈마중합처리장치는 상기 다수의 대향전극과 시료전극과의 거리가 다수의 대향전극에 슬라이딩실린더를 각각 부착시킴으로써 다르게 되는 전극구조를 포함한다.The present invention provides a plurality of counter electrodes in the deposition chamber in order to solve the above problems, and by varying the distance between the plurality of counter electrodes and the sample electrode, the plurality of counter electrodes maintain the independent potential difference with respect to the sample electrode Provided is a plasma polymerization apparatus including an electrode structure. The plasma polymerization apparatus includes an electrode structure in which the distances between the plurality of counter electrodes and the sample electrodes are different by attaching sliding cylinders to the plurality of counter electrodes, respectively.

또한 본 발명은 증착챔버 내에 다수의 대향전극을 설치하고 상기 다수의 대향전극에 저항을 각각 연결함으로써 상기 다수의 대향전극은 시료전극에 대하여 서로 독립적인 전위차를 유지시키는 전극구조를 포함하여 구성되는 플라즈마중합처리장치를 제공한다. 상기 플라즈마중합처리장치는 상기 저항이 가변저항인 전극구조를 포함한다.The present invention also provides a plasma structure comprising an electrode structure in which a plurality of counter electrodes are provided in a deposition chamber and each of the plurality of counter electrodes connects a resistance to each other to maintain an independent potential difference with respect to a sample electrode. Provided is a polymerization apparatus. The plasma polymerization apparatus includes an electrode structure in which the resistance is a variable resistor.

또한 본 발명은 시료전극에 대하여 경사진 대향전극을 증착챔버 내에 설치시킨 전극구조를 포함하여 구성되는 플라즈마중합처리장치를 제공한다. 상기 플라즈마중합처리장치는 상기 대향전극에 슬라이딩실린더를 부착시킨 전극구조를 포함한다.In another aspect, the present invention provides a plasma polymerization apparatus comprising an electrode structure in which a counter electrode inclined with respect to a sample electrode is provided in a deposition chamber. The plasma polymerization apparatus includes an electrode structure in which a sliding cylinder is attached to the counter electrode.

종래의 플라즈마중합처리장치는 대향전극과 시료전극의 거리가 일정하더라도 실제 플라즈마처리시에는 전극의 부위마다 불균일하게 반응성 가스의 탄화현상이 발생하여 대향전극과 시료전극간의 전위차가 균일하지 못하였으나, 본 발명은 다수의 대향전극을 증착챔버 내에 설치하고 상기 다수의 대향전극과 시료전극간의 전위차를 독립적으로 유지시키는 전극구조의 플라즈마중합처리장치를 제공함으로써 표면처리되는 시료에 균일한 전력밀도가 형성되도록 한다. 즉, 플라즈마중합처리시 대향전극의 부위별로 탄화가 다르게 진행되므로 시료전극에 대한 대향전극의 부위별 전위차가 달라지게 되나, 대향전극을 여러 개로 분할시키고 각각의 전극에 대해 전압변동분을 독립적으로 조정하여 전체 대향전극에 대하여 일정하고 균일한 전위차를 유지하도록 하는 것이다.In the conventional plasma polymerization apparatus, even if the distance between the counter electrode and the sample electrode is constant, in actual plasma treatment, carbonization of the reactive gas occurs unevenly at each site of the electrode, so that the potential difference between the counter electrode and the sample electrode is not uniform. The present invention provides a plasma polymerization treatment apparatus having an electrode structure in which a plurality of counter electrodes are provided in a deposition chamber and independently maintaining a potential difference between the plurality of counter electrodes and a sample electrode so that a uniform power density is formed on a surface treated sample. . That is, the carbonization proceeds differently for each part of the counter electrode during the plasma polymerization process, so that the potential difference for each part of the counter electrode with respect to the sample electrode is different, but the counter electrode is divided into several and the voltage fluctuation is adjusted independently for each electrode. It is to maintain a constant and uniform potential difference with respect to the whole counter electrode.

이와 더불어 본 발명은 전극의 부위별 전압제어를 응용하여 전극의 위치에 따라 전압을 변화시킴으로써 중합막의 성질을 용이하게 제어하는 것을 가능하게 한다.In addition, the present invention makes it possible to easily control the properties of the polymerized film by changing the voltage according to the position of the electrode by applying the voltage control for each part of the electrode.

이하, 도면을 참조하며 본 발명에 관하여 실시예를 통하여 구체적으로 설명한다.Hereinafter, exemplary embodiments will be described in detail with reference to the accompanying drawings.

실시예 1Example 1

본 발명에 의한 일실시예로서, 증착챔버(20) 내에 다수의 대향전극(4)이 설치되어 있고 시료전극(1)과 각각의 대향전극간의 거리가 다른 전극구조를 도 2에 나타내었다. 각각의 대향전극은 고정되어 있지만 시료전극과의 거리가 다르므로 각 전극간의 전위차도 다르게 된다.As an embodiment of the present invention, an electrode structure in which a plurality of counter electrodes 4 are provided in the deposition chamber 20 and the distances between the sample electrodes 1 and the counter electrodes are shown in FIG. Each counter electrode is fixed, but since the distance from the sample electrode is different, the potential difference between the electrodes is also different.

실시예2Example 2

본 발명에 의한 다른 실시예로서, 증착챔버(20) 내에 다수의 대향전극(4)이 설치되어 있고 시료전극(1)과 각각의 대향전극간의 거리가 다른 전극구조를 도 3에 나타내었다. 상기 대향전극(4)에는 각각 가변적으로 움직이는 슬라이딩실린더(6a, 6b, 6c, 6d, 6e, 6f, 6g, 6h, 6i, 6j)가 연결되어 있다. 상기 슬라이딩실린더는 각각 독립적으로 제어되어 각각의 대향전극(4)과 시료전극(1)간의 전위차가 달라지게 되면 그 차이를 조정하도록 설계되어 있다.As another embodiment according to the present invention, a plurality of counter electrodes 4 are provided in the deposition chamber 20, and the electrode structures having different distances between the sample electrodes 1 and the counter electrodes are shown in FIG. Sliding cylinders 6a, 6b, 6c, 6d, 6e, 6f, 6g, 6h, 6i and 6j, which are variably movable, are connected to the counter electrode 4, respectively. The sliding cylinders are independently controlled and are designed to adjust the difference when the potential difference between each counter electrode 4 and the sample electrode 1 is changed.

실시예3Example 3

도 4에는 본 발명에 의한 또 다른 실시예를 나타내었다. 도면을 보면 증착챔버(20) 내에 다수의 대향전극(4)이 설치되어 있고 상기 각각의 대향전극(4)에는 저항(7a, 7b, 7c, 7d, 7e, 7f, 7g, 7h, 7i, 7j)이 부착되어 있다. 각각의 전극간 거리가 동일하지만 각 전극에 부착된 저항이 서로 다르기 때문에 각 전극간의 전위차도 다르게 된다.4 shows another embodiment according to the present invention. In the drawing, a plurality of counter electrodes 4 are provided in the deposition chamber 20, and each counter electrode 4 includes resistors 7a, 7b, 7c, 7d, 7e, 7f, 7g, 7h, 7i, and 7j. ) Is attached. Although the distance between each electrode is the same, since the resistance attached to each electrode differs, the potential difference between each electrode also becomes different.

실시예4Example 4

본 발명에 의한 또 다른 실시예로서, 증착챔버(20) 내에 다수의 대향전극(4)이 설치되어 있고 상기 각각의 대향전극(4)에는 가변저항(8a, 8b, 8c, 8d, 8e, 8f, 8g, 8h, 8i, 8j)이 부착되어 있는 전극구조를 도 5에 나타내었다. 상기 대향전극(4)에는 각각 가변저항(8a, 8b, 8c, 8d, 8e, 8f, 8g, 8h, 8i, 8j)이 연결되어 있고, 상기 가변저항은 각각 독립적으로 제어되어 각각의 대향전극(4)과 시료전극(1)간의 전위차가 달라지게 되면 그 차이를 조정하도록 설계되어 있다.As another embodiment according to the present invention, a plurality of counter electrodes 4 are provided in the deposition chamber 20, and each counter electrode 4 has variable resistors 8a, 8b, 8c, 8d, 8e, 8f. , 8g, 8h, 8i, 8j) is shown in FIG. Variable resistors 8a, 8b, 8c, 8d, 8e, 8f, 8g, 8h, 8i, and 8j are connected to the counter electrodes 4, respectively, and the variable resistors are independently controlled to provide respective counter electrodes ( It is designed to adjust the difference when the potential difference between 4) and the sample electrode 1 changes.

실시예5Example 5

도 5에는 본 발명의 또 다른 실시예로서, 시료전극(1)에 대하여 경사진 대향전극(4)을 증착챔버(20) 내에 설치시킨 전극구조를 나타내었다. 상기 대향전극에는 가변적인 슬라이딩실린더(7)를 부착시켰으며, 상기 실린더를 조절하여 전극의 위치에 따라 전압을 변화시킴으로써 중합막의 성질을 용이하게 제어할 수 있게 된다.FIG. 5 shows an electrode structure in which the counter electrode 4 inclined with respect to the sample electrode 1 is provided in the deposition chamber 20 as another embodiment of the present invention. A variable sliding cylinder 7 is attached to the counter electrode, and the properties of the polymerized membrane can be easily controlled by changing the voltage according to the position of the electrode by adjusting the cylinder.

본 발명에 의하면, 다수의 대향전극을 증착챔버 내에 설치하고 상기 다수의 대향전극과 시료전극간의 전위차를 독립적으로 유지시키는 전극구조의 플라즈마중합처리장치를 제공함으로써 탄화 현상 등 전압 변화를 유발시키는 상황에도 표면처리되는 시료에 균일한 전력밀도를 형성시킬 수 있다. 또한 전극의 위치에 따라 전압을 능동적으로 제어하여 원하는 성질의 중합막을 형성할 수 있게 된다.According to the present invention, there is provided a plasma polymerization processing apparatus having an electrode structure in which a plurality of counter electrodes are provided in a deposition chamber and independently maintaining a potential difference between the plurality of counter electrodes and a sample electrode, thereby causing a voltage change such as a carbonization phenomenon. A uniform power density can be formed in the sample to be surface treated. In addition, the voltage can be actively controlled according to the position of the electrode to form a polymer film having a desired property.

Claims (3)

증착챔버 내에 다수의 대향전극을 설치하고 상기 다수의 대향전극과 시료전극과의 거리를 다르게 함으로써 상기 다수의 대향전극은 시료전극에 대하여 서로 독립적인 전위차를 유지하는 전극구조를 포함하여 구성되는 플라즈마중합처리장치.Placing a plurality of counter electrodes in the deposition chamber and varying the distance between the plurality of counter electrodes and the sample electrode, the plurality of counter electrodes includes an electrode structure that maintains the potential difference independent of each other with respect to the sample electrode Processing unit. 증착챔버 내에 다수의 대향전극을 설치하고 상기 다수의 대향전극에 저항을 각각 연결함으로써 상기 다수의 대향전극은 시료전극에 대하여 서로 독립적인 전위차를 유지시키는 전극구조를 포함하여 구성되는 플라즈마중합처리장치.And a plurality of counter electrodes in the deposition chamber and connecting the resistors to the plurality of counter electrodes, respectively, the plurality of counter electrodes comprising an electrode structure for maintaining an independent potential difference with respect to a sample electrode. 시료전극에 대하여 경사진 대향전극을 증착챔버 내에 설치시킨 전극구조를 포함하여 구성되는 플라즈마중합처리장치.And an electrode structure in which a counter electrode inclined with respect to the sample electrode is provided in the deposition chamber.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100737755B1 (en) * 2006-08-10 2007-07-10 세메스 주식회사 Plasma generator, apparatus including the same and method for treating substrate
KR101121189B1 (en) * 2009-11-16 2012-03-22 글로벌텍 주식회사 Plasma generator
KR101415888B1 (en) * 2012-05-25 2014-07-09 주식회사제4기한국 Plasma Processing Apparatus
CN114717520A (en) * 2022-03-25 2022-07-08 广西浦晶光学有限公司 PC spectacle lens vacuum coating method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100737755B1 (en) * 2006-08-10 2007-07-10 세메스 주식회사 Plasma generator, apparatus including the same and method for treating substrate
US7963248B2 (en) 2006-08-10 2011-06-21 Semes Co. Ltd Plasma generator, substrate treating apparatus including the same and substrate treating method
KR101121189B1 (en) * 2009-11-16 2012-03-22 글로벌텍 주식회사 Plasma generator
KR101415888B1 (en) * 2012-05-25 2014-07-09 주식회사제4기한국 Plasma Processing Apparatus
CN114717520A (en) * 2022-03-25 2022-07-08 广西浦晶光学有限公司 PC spectacle lens vacuum coating method

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