KR20010088088A - Filtering sysytem in plasma polymerizing apparatus - Google Patents

Abstract

PURPOSE: A filtering apparatus of a plasma polymerization equipment is provided which can replace or clean the filters during the operation of the apparatus without breaking the vacuum state or stopping continuous polymerization so as to clean filtration filters. CONSTITUTION: In a plasma polymerization equipment consisting of a polymerization chamber (2) and a vacuum pump (25), the filtering apparatus of a plasma polymerization equipment comprises on-off valves (21a,21b) which are installed on the exhaust path between the polymerization chamber (2) and the vacuum pump (25), and controls filtration filters (23a,23b) and the vacuum state of the filtration filters (23a,23b); vent valves (22a,22b) making an atmospheric pressure for the filtration filters (23a,23b); and a subsidiary vacuum pump (24) making vacuum for the filtration filters (23a,23b), wherein each of the filtration filters (23a,23b), vent valves (22a,22b) and on-off valves (21a,21b) are arranged in a row.

Description

Filtration device of plasma polymerization processing unit {FILTERING SYSYTEM IN PLASMA POLYMERIZING APPARATUS}

The present invention relates to a filtration device of a plasma polymerization treatment device.

When a thin film is coated on the surface of a sample such as a metal plate using plasma, a coating layer having excellent hardness, wear resistance, and the like is formed. Products with a coating layer are used for magnetic disks, optical disks, ultra hard tools, and the like. In addition, when the coating film formed on the surface of the steel sheet is subjected to plasma treatment, the coated steel sheet is hardened and excellent in durability, corrosion resistance and the like is obtained. In particular, the surface modification effect of improving the hydrophilicity or hydrophobicity can be obtained by polymerizing the surface of the sample, and the surface-modified material has been applied to various ranges.

In order to modify the surface of the sample by synthesizing the polymer, conventionally, ion implantation or ion beam irradiation using high energy (tens of keV to several MeV) is used, or relatively low energy (0 to several keV) is used. Polymers on the surface of the sample using ion beam sputtering deposition, multi ion beam deposition, or ion assisted deposition The deposition method was used.

However, since this method requires a relatively high energy and low vacuum state, the synthesis of the polymer is not easy and the cost required is high.

Therefore, a surface treatment method using a plasma capable of forming a polymer polymer on a sample substrate in a low energy and low vacuum state has been developed. In the above method, a vacuum is applied to the chamber, a reactive gas of monomers of the material to be synthesized is injected into the chamber, and then discharged at a direct current or high frequency using a power supply device. Plasma is generated, and predetermined ions are transferred to the sample substrate or the electrode to synthesize the predetermined polymer thereon. At this time, various chemical bonds are made according to the type and mixing ratio of the reaction gas, DC current, voltage, high frequency power or deposition time, and the polymer polymer having the required physical properties such as surface strength, adhesion and adsorption, hydrophilicity and hydrophobicity is sampled. By depositing on the surface, the sample surface can be modified without affecting the inherent properties of the sample substrate.

1 shows an example of a plasma polymerization apparatus. The sample 4 is transferred from the unwinder chamber 1 to the polymerization chamber 2, whereby plasma polymerization is carried out and again to the winder chamber 3. The inside of the polymerization chamber 2 uses a vacuum pump 7 to create a pressure of about 10 ⁻³ torr and injects an organic monomer gas. When a high voltage direct current is applied, the monomer gas is ionized and charged in a plasma state. The positively charged ions move to the cathode 5 and the negatively charged ions move to the electrode 4 having a relative polarity by the potential difference across the electrodes, and chemically bond with each other to form a polymer film.

All of the polymer formed in this process is not attached to the workpiece, that is, the sample, but the unattached polymer is exhausted through the exhaust port. The evacuated polymer flows into the vacuum pump, which contaminates the pump oil, causing problems with the pump. In order to prevent this, conventionally, as shown in FIG. 1, a filtration device 6 is provided between the polymerization chamber 2 and the vacuum pump 7.

The internal structure of the filtration apparatus 6 is shown in FIG. It can be seen that the polymer 11 is filtered by the filtration filter 12 supported by the filter support 10. However, in such a filtration device, if the polymerization process is continuously performed for a long time, the polymer is deposited on the filtration filter, the air permeability decreases, the pressure in the polymerization chamber is increased, and the polymer is released from normal process conditions, resulting in a failure in the polymerization process.

If the vacuum is broken after a certain period of time, and the filtration filter is cleaned and then polymerized again, it may be considered.

It is therefore an object of the present invention to provide a new filtration device which can be exchanged or cleaned during operation without breaking the vacuum or interrupting the continuous polymerization process to clean the filter.

1 is a schematic view showing an example of a plasma polymerization processing apparatus.

2 is a cross-sectional view showing the internal structure of a conventional filtration device.

3 is a schematic view showing one embodiment of the filtration device of the present invention.

4 is a cross-sectional view showing in detail the embodiment of FIG.

*** Explanation of symbols for main parts of drawing ***

2: Polymerization chamber 21a: On-off valve

21b: On-off valve 22a: Band valve

22b: Vent valve 23a: Filtration filter

23b: filtration filter 24: vacuum pump

25: vacuum pump

The present invention provides a plasma polymerization processing apparatus including a polymerization chamber and a vacuum pump, wherein the plasma polymerization treatment apparatus is provided on an exhaust path between the polymerization chamber and a vacuum pump, and on / off adjusting a filtration filter and a vacuum state of the filtration filter. And a valve, a vent valve for making the filtration filter at atmospheric pressure, and a negative vacuum pump for making the filtration filter in vacuum, wherein the filtration filter, the vent valve, and the on-off valve are disposed in parallel. Provided is a filtration apparatus for a plasma polymerization treatment apparatus.

The present invention is characterized in that it is possible to replace the filtration filter during the operation of the system in the plasma polymerization process for a long time.

Hereinafter, the features of the present invention will be described in detail with reference to the accompanying drawings.

Figure 3 shows one embodiment of the filtration device of the present invention. On the exhaust path of the polymerization chamber 2, the filtration filters 23a and 23b, the on-off valves 21a and 21b for adjusting the vacuum state of the filtration device, the vent valves 22a and 22b for making the filtration device to atmospheric pressure, It consists of a sub-vacuum pump 24 for making the filtration apparatus into a vacuum, and the filtration apparatus, the vane valve, and the on-off valve are arranged in parallel with the sub-vacuum pump in between.

Referring to the operation of the filtration device is as follows. First, the left on-off valve 21a is opened, and the polymerization process is performed while the right on-off valve 21b is closed. The unattached polymer generated in the polymerization chamber is filtered through the left filtration filter 23a of the filtration apparatus through the exhaust port of the polymerization chamber. When the polymerization treatment is continued and the filtration limit of the left filtration filter 23a is reached, the vacuum pump 24 is operated to vacuum the right filtration filter 23b to a higher vacuum than the polymerization treatment conditions, and then the right on-off The valve 21b is opened and the left on-off valve 21a is closed. In this way, the flow of the unattached polymer is changed from the left side to the right side and the filtration proceeds through the right filtration filter 23b.

On the other hand, after changing the filtration path from the left to the right filtration filter, the left vent valve 22a is opened and the left filtration filter 23a is brought to atmospheric pressure, and the left filtration filter is disassembled and cleaned or replaced. After that, the filter is mounted on the filtration apparatus again, the left vent valve 22a is closed, and the vacuum pump 24 is operated to bring the left filtration filter 23a into a vacuum state. The left filtration filter 23a waits until the right filtration filter 23b reaches the usage limit, and when the usage reaches the usage limit, the left filtration filter 23a is filtered in place of the right filtration filter 23b. By performing repeated filtration with such a parallel filtering device, the plasma polymerization process can be carried out continuously, thereby greatly improving productivity.

Figure 4 is a block diagram showing an embodiment of the filtration device of the present invention in more detail. For convenience, only one part of the parallel structure of the filtration device is shown. The unpolymerized polymer 35 of the polymerization chamber is filtered through the filtration filter 33 when the on-off valve 32 is opened, and the exhaust gas in which the unpolymerized polymer is filtered is introduced into the vacuum pump 38, so that Do not overdo it. Reference numeral 31 denotes a vent valve, 34 a filter support, 36 a separation mechanism, and 37 a negative vacuum pump. Referring to FIG. 3, it will be understood that the filtering device shown in FIG. 4 is formed in parallel with another filtering device symmetrically about the negative vacuum pump 37.

According to the present invention, it is possible to replace the filtration filter during the operation of the system in the plasma polymerization process for a long time, and to perform the plasma polymerization process continuously by performing repeated filtration, thereby greatly improving the productivity.

Claims (4)

A plasma polymerization apparatus comprising a polymerization chamber and a vacuum pump, comprising: an on-off valve disposed on an exhaust path between the polymerization chamber and a vacuum pump, the filtration filter adjusting the vacuum state of the filtration filter; Filtration of the plasma polymerization processing apparatus comprising a vent valve for making the filtration filter at atmospheric pressure and a subvacuum pump for making the filtration filter in vacuum, wherein the filtration filter, the vent valve, and the on-off valve are arranged in parallel. Device. The filtration apparatus of claim 1, wherein the filtration filter, the vent valve, and the on-off valve are disposed in parallel with the subvacuum pump interposed therebetween. The filtration apparatus of claim 1, further comprising a separation mechanism separating the filter support for supporting the filtration filter and the filtration filter. The filter of claim 1, wherein each of the filtration filters, the vane valve, and the on-off valve arranged in parallel are not operated when the other is operated and the other when the operation of one is stopped. Filtration device of the plasma polymerization processing apparatus, characterized in that to initiate one operation.