KR20000069912A - An Agent and a Method for Preventing Epoxy-Bleed-Out - Google Patents
An Agent and a Method for Preventing Epoxy-Bleed-Out Download PDFInfo
- Publication number
- KR20000069912A KR20000069912A KR1019997006125A KR19997006125A KR20000069912A KR 20000069912 A KR20000069912 A KR 20000069912A KR 1019997006125 A KR1019997006125 A KR 1019997006125A KR 19997006125 A KR19997006125 A KR 19997006125A KR 20000069912 A KR20000069912 A KR 20000069912A
- Authority
- KR
- South Korea
- Prior art keywords
- carboxylic acids
- epoxy
- thiols
- acid
- derivatives
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 41
- 239000004593 Epoxy Substances 0.000 claims abstract description 70
- 238000007789 sealing Methods 0.000 claims abstract description 42
- 150000001735 carboxylic acids Chemical class 0.000 claims abstract description 27
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 26
- 125000003396 thiol group Chemical class [H]S* 0.000 claims abstract description 25
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 24
- 230000002265 prevention Effects 0.000 claims abstract description 24
- 239000004065 semiconductor Substances 0.000 claims abstract description 15
- -1 nitrogen-containing heterocyclic compound Chemical class 0.000 claims abstract description 14
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 12
- 150000001298 alcohols Chemical class 0.000 claims abstract description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 12
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 12
- 239000011593 sulfur Substances 0.000 claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 claims abstract description 6
- 239000007788 liquid Substances 0.000 claims description 19
- 238000002845 discoloration Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 8
- 239000003112 inhibitor Substances 0.000 claims description 7
- 238000007598 dipping method Methods 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 230000003449 preventive effect Effects 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 46
- 238000004649 discoloration prevention Methods 0.000 abstract description 39
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract description 10
- 230000002411 adverse Effects 0.000 abstract description 4
- 238000005516 engineering process Methods 0.000 abstract 1
- 238000007747 plating Methods 0.000 description 31
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 30
- 238000007654 immersion Methods 0.000 description 30
- 238000011156 evaluation Methods 0.000 description 21
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 21
- 239000002253 acid Substances 0.000 description 15
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 15
- 239000012964 benzotriazole Substances 0.000 description 13
- 238000000465 moulding Methods 0.000 description 13
- 150000003573 thiols Chemical class 0.000 description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 11
- 239000010949 copper Substances 0.000 description 11
- 230000007797 corrosion Effects 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Natural products OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 10
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 229910052763 palladium Inorganic materials 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 6
- 229920000647 polyepoxide Polymers 0.000 description 6
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 6
- 238000012552 review Methods 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 239000002075 main ingredient Substances 0.000 description 4
- 239000006174 pH buffer Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- 239000005639 Lauric acid Substances 0.000 description 3
- 235000021355 Stearic acid Nutrition 0.000 description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 3
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 3
- 229960004488 linolenic acid Drugs 0.000 description 3
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 3
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000008117 stearic acid Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- ZJCZFAAXZODMQT-UHFFFAOYSA-N 2-methylpentadecane-2-thiol Chemical compound CCCCCCCCCCCCCC(C)(C)S ZJCZFAAXZODMQT-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 241001206158 Blepsias cirrhosus Species 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- UENWRTRMUIOCKN-UHFFFAOYSA-N benzyl thiol Chemical compound SCC1=CC=CC=C1 UENWRTRMUIOCKN-UHFFFAOYSA-N 0.000 description 2
- VTXVGVNLYGSIAR-UHFFFAOYSA-N decane-1-thiol Chemical compound CCCCCCCCCCS VTXVGVNLYGSIAR-UHFFFAOYSA-N 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- 229920006334 epoxy coating Polymers 0.000 description 2
- KEMQGTRYUADPNZ-UHFFFAOYSA-N heptadecanoic acid Chemical compound CCCCCCCCCCCCCCCCC(O)=O KEMQGTRYUADPNZ-UHFFFAOYSA-N 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- SZHOJFHSIKHZHA-UHFFFAOYSA-N tridecanoic acid Chemical compound CCCCCCCCCCCCC(O)=O SZHOJFHSIKHZHA-UHFFFAOYSA-N 0.000 description 2
- ZDPHROOEEOARMN-UHFFFAOYSA-N undecanoic acid Chemical compound CCCCCCCCCCC(O)=O ZDPHROOEEOARMN-UHFFFAOYSA-N 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- ORTVZLZNOYNASJ-UPHRSURJSA-N (z)-but-2-ene-1,4-diol Chemical compound OC\C=C/CO ORTVZLZNOYNASJ-UPHRSURJSA-N 0.000 description 1
- ZRKMQKLGEQPLNS-UHFFFAOYSA-N 1-Pentanethiol Chemical compound CCCCCS ZRKMQKLGEQPLNS-UHFFFAOYSA-N 0.000 description 1
- GYSCBCSGKXNZRH-UHFFFAOYSA-N 1-benzothiophene-2-carboxamide Chemical compound C1=CC=C2SC(C(=O)N)=CC2=C1 GYSCBCSGKXNZRH-UHFFFAOYSA-N 0.000 description 1
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 1
- TWJNQYPJQDRXPH-UHFFFAOYSA-N 2-cyanobenzohydrazide Chemical compound NNC(=O)C1=CC=CC=C1C#N TWJNQYPJQDRXPH-UHFFFAOYSA-N 0.000 description 1
- SLAMLWHELXOEJZ-UHFFFAOYSA-N 2-nitrobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1[N+]([O-])=O SLAMLWHELXOEJZ-UHFFFAOYSA-N 0.000 description 1
- RVBUGGBMJDPOST-UHFFFAOYSA-N 2-thiobarbituric acid Chemical compound O=C1CC(=O)NC(=S)N1 RVBUGGBMJDPOST-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- DPUOLQHDNGRHBS-UHFFFAOYSA-N Brassidinsaeure Natural products CCCCCCCCC=CCCCCCCCCCCCC(O)=O DPUOLQHDNGRHBS-UHFFFAOYSA-N 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- 101150065749 Churc1 gene Proteins 0.000 description 1
- URXZXNYJPAJJOQ-UHFFFAOYSA-N Erucic acid Natural products CCCCCCC=CCCCCCCCCCCCC(O)=O URXZXNYJPAJJOQ-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- OYHQOLUKZRVURQ-HZJYTTRNSA-N Linoleic acid Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(O)=O OYHQOLUKZRVURQ-HZJYTTRNSA-N 0.000 description 1
- 235000021360 Myristic acid Nutrition 0.000 description 1
- TUNFSRHWOTWDNC-UHFFFAOYSA-N Myristic acid Natural products CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 239000005643 Pelargonic acid Substances 0.000 description 1
- 102100038239 Protein Churchill Human genes 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- RYZVSJQWUZPQNI-UHFFFAOYSA-N copper gold Chemical compound [Cu].[Au].[Au] RYZVSJQWUZPQNI-UHFFFAOYSA-N 0.000 description 1
- DPUOLQHDNGRHBS-KTKRTIGZSA-N erucic acid Chemical compound CCCCCCCC\C=C/CCCCCCCCCCCC(O)=O DPUOLQHDNGRHBS-KTKRTIGZSA-N 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- QUCZBHXJAUTYHE-UHFFFAOYSA-N gold Chemical group [Au].[Au] QUCZBHXJAUTYHE-UHFFFAOYSA-N 0.000 description 1
- BBKFSSMUWOMYPI-UHFFFAOYSA-N gold palladium Chemical group [Pd].[Au] BBKFSSMUWOMYPI-UHFFFAOYSA-N 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 235000020778 linoleic acid Nutrition 0.000 description 1
- OYHQOLUKZRVURQ-IXWMQOLASA-N linoleic acid Natural products CCCCC\C=C/C\C=C\CCCCCCCC(O)=O OYHQOLUKZRVURQ-IXWMQOLASA-N 0.000 description 1
- BSEUQTUSBWEPLY-UHFFFAOYSA-N methoxy-propyl-sulfanylsilane Chemical compound CCC[SiH](S)OC BSEUQTUSBWEPLY-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
- Die Bonding (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
다이 본딩(die bonding)강도나, 어셈블리 특성에 악영향을 주지 않고, 변색 방지효과나 봉공(封孔)처리효과를 손상하지 아니하는 에폭시 브리드 아우트(Epoxy-Bleed-Out) 방지방법을 확립하는 기술에 관한 것으로, 직쇄(直鎖) 부분의 탄소 원자가 3개 이상인 카르복실산 또는 티올, 벤젠 환(環)을 가지는 카르복실산 또는 티올It is a technology to establish an epoxy-bleed-out prevention method that does not adversely affect die bonding strength or assembly characteristics, and does not impair discoloration prevention or sealing effect. Carboxylic acids or thiols having three or more carbon atoms in the straight-chain moiety, carboxylic acids or thiols having a benzene ring
(Thiol), 메르캅토기(mercapto基) 또는 수산기를 가지는 카르복실산, 다가(多價)불포화 알콜, 분자 중에 유황을 함유하는 함질소 복소 환상 화합물(含窒素複素環狀化合物), 또는 이들의 유도체로부터 선택된 1종 이상의 유기 화합물을 함유하는 것을 특징으로 하는 반도체 제조 공정의 다이 본딩 공정에 있어서의 에폭시 브리드 아우트 방지제.(Thiol), a carboxylic acid having a mercapto group or a hydroxyl group, a polyunsaturated alcohol, a nitrogen-containing heterocyclic compound containing sulfur in the molecule, or these Epoxy bleed out agent in the die bonding process of the semiconductor manufacturing process characterized by containing 1 or more types of organic compounds chosen from derivatives.
Description
리드프레임이나 프린트 배선판 등의 반도체 장치와 IC 칩을 에폭시 수지에 의해서 접착 고정하는 다이 본딩 공정에 있어서는, 접착면(보통, 금, 은, 동, 파라듐 등의 도금이 실행되고 있다)의 표면 거칠기가 지나치게 거칠거나, 표면이 변색 방지제, 봉공 처리제(封孔處理劑)등의 유기물로 오염되어 있으면, 에폭시 수지 도포시(塗布時)에, 수지 또는 첨가제의 삼출(渗出: 에폭시 브리드 아우트)이 발생한다. 이 에폭시 브리드 아우트는, 다이 본딩 강도를 저하시키거나, 그 후의 와이어 본딩(Wire-Bonding) 공정에서의 불량원인으로 되어 있다.In the die bonding step of adhesively fixing a semiconductor device such as a lead frame or a printed wiring board and an IC chip with an epoxy resin, the surface roughness of the adhesive surface (usually plating of gold, silver, copper, palladium, etc. is performed). Is too rough, or the surface is contaminated with organic materials such as discoloration inhibitors, sealing agents, and the like, the exudation of resins or additives during epoxy coating Occurs. This epoxy bleed out reduces the die bonding strength or is a cause of failure in a subsequent wire bonding process.
종래, 이러한 에폭시 브리드 아우트를 방지하기 위해서, 접착면의 표면 거칠기를 작게 하여, 모세관 현상을 억제하거나, 표면을 세정(洗淨)하여 오염물을 제거하고 있었다. 그러나, 접착면의 표면 거칠기는, 다이 본딩 강도나, 어셈블리 머신의 화상인식능력(畵像認識能力)에 영향을 주기 때문에, 일률적으로 작게 할 수는 없었다. 또한, 표면을 세정하는 것은, 변색방지 처리나 봉공 처리효과까지 손상시키기 때문에 문제가 있었다.Conventionally, in order to prevent such epoxy bleed out, the surface roughness of an adhesive surface was made small, the capillary phenomenon was suppressed, or the surface was wash | cleaned and the contaminant was removed. However, since the surface roughness of the adhesive surface affects the die bonding strength and the image recognition ability of the assembly machine, the surface roughness cannot be uniformly reduced. In addition, cleaning the surface has a problem because it impairs discoloration preventing treatment and sealing effect.
본 발명은, 다이 본딩 강도나, 어셈블리 특성에 악영향을 주지 않고, 변색 방지처리나 봉공 처리효과를 손상하지 아니하는 에폭시 브리드 아우트 방지방법을 확립하는 것이다.SUMMARY OF THE INVENTION The present invention establishes an epoxy bleed out prevention method that does not adversely affect die bonding strength or assembly characteristics and does not impair discoloration prevention or sealing effect.
본 발명은, 리드프레임이나 프린트 배선판 등의 반도체 장치와 IC 칩을 에폭시 수지에 의해서 접착 고정하는 다이 본딩(Die-bonding) 공정에 있어서의 에폭시 브리드 아우트(Epoxy-Bleed-Out) 방지제 및 방지방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy-bleed-out inhibitor and a prevention method in a die-bonding step of adhesively fixing a semiconductor device such as a lead frame or a printed wiring board and an IC chip with an epoxy resin. It is about.
본 발명자는, 예의(銳意) 연구를 행한 결과, 특정한 유기 화합물을 함유하는 용액에 기재(基材)를 침지(浸漬)하여, 도금 면의 표면에 유기피막(有機皮膜)을 흡착시키는 것에 의하여 에폭시 브리드 아우트를 효과적으로 방지할 수 있는 것을 알아 내었다.MEANS TO SOLVE THE PROBLEM As a result of earnest research, this inventor immersed a base material in the solution containing a specific organic compound, and adsorb | sucks an organic film to the surface of a plating surface, We found that we could effectively prevent the bleed out.
본 발명은, 상기에서 알아낸 것에 근거하여,The present invention is based on what was found above.
1. 직쇄(直鎖)부분의 탄소 원자가 3개 이상인 카르복실산(carboxylic acid) 또는1.carboxylic acids having three or more carbon atoms in the straight-chain moiety, or
티올(Thiol), 벤젠 환(環)을 가지는 카르복실산 또는 티올, 메르캅토(mercapto)Thiol, carboxylic acid or thiol with benzene ring, mercapto
기(基) 또는 수산기(水酸基)를 가지는 카르복실산, 다가(多價) 불포화 알콜, 분Carboxylic acids, polyunsaturated alcohols, powders having groups or hydroxyl groups
자 중에 유황을 함유하는 함질소 복소 환상 화합물(含窒素複素環狀化合物), 또는Nitrogen-containing heterocyclic compound containing sulfur in its own, or
이것들의 유도체로부터 선택된 l종 이상의 유기 화합물을 함유하는 것을 특징으It is characterized by containing one or more organic compounds selected from these derivatives.
로 하는 반도체 제조 공정의 다이 본딩 공정에 있어서의 에폭시 브리드 아우트Epoxy bleed out in die bonding process of semiconductor manufacturing process to assume
방지제Inhibitor
2. 직쇄 부분의 탄소 원자가 3개 이상인 카르복실산 또는 티올, 벤젠 환을 가지는2. Having a carboxylic acid or thiol or benzene ring having 3 or more carbon atoms in the straight chain portion
카르복실산 또는 티올, 메르캅토기 또는 수산기를 가지는 카르복실산, 다가 불포Carboxylic acids or carboxylic acids with thiols, mercapto groups or hydroxyl groups, polyvalent unsaturated
화 알콜, 분자 중에 유황을 함유하는 함질소 복소 환상 화합물, 또는 이것들의Alcohols, nitrogen-containing heterocyclic compounds containing sulfur in the molecule, or these
유도체로부터 선택된 1종 이상의 유기 화합물을 함유하는, 반도체 제조공정의 다Of semiconductor manufacturing processes containing at least one organic compound selected from derivatives
이본딩 공정에 있어서의 에폭시 브리드 아우트 방지제에 배선기재(配線基材)를 침Wiring base material is immersed in the epoxy bleed out agent in the bonding process
지하든지 또는 이 에폭시 브리드 아우트 방지제를 배선기재에 살포(撒布)하든지Either underground or spraying this epoxy bleed out agent onto the wiring substrate
하는 것을 특징으로 하는 에폭시 브리드 아우트 방지 방법Epoxy bleed out prevention method characterized in that
3. 직쇄 부분의 탄소 원자가 3개 이상인 카르복실산 또는 티올, 벤젠 환을 가지는3. Having a carboxylic acid or thiol or benzene ring having 3 or more carbon atoms in the straight chain portion
카르복실산 또는 티올, 메르캅토기 또는 수산기를 가지는 카르복실산, 다가 불포Carboxylic acids or carboxylic acids with thiols, mercapto groups or hydroxyl groups, polyvalent unsaturated
화 알콜, 분자 중에 유황을 함유하는 함질소 복소 환상 화합물, 또는 이것들의Alcohols, nitrogen-containing heterocyclic compounds containing sulfur in the molecule, or these
유도체로부터 선택된 1종 이상의 유기 화합물을 함유하는, 반도체 제조 공정의A semiconductor manufacturing process containing at least one organic compound selected from derivatives
다이본딩 공정에 있어서의 에폭시 브리드 아우트 방지제에 배선 기재를 침지 하The wiring base material is immersed in the epoxy bleed out prevention agent in a die bonding process.
든지 또는 이 에폭시 브리드 아우트 방지제를 배선기재에 살포하든지 하여서Or by spraying this epoxy bleed
에폭시 브리드 아우트 방지처리를 실행한 것을 특징으로 하는 배선기재 및Wiring base material characterized in that the epoxy bleed out prevention treatment
반도체 패키지Semiconductor package
4. 직쇄 부분의 탄소 원자가 3개 이상인 카르복실산 또는 티올, 벤젠 환을 가지는4. Having a carboxylic acid or thiol or benzene ring having 3 or more carbon atoms in the straight chain portion
카르복실산 또는 티올, 메르캅토기 또는 수산기를 가지는 카르복실산, 다가 불포Carboxylic acids or carboxylic acids with thiols, mercapto groups or hydroxyl groups, polyvalent unsaturated
화 알콜, 분자 중에 유황을 함유하는 함질소 복소 환상 화합물, 또는 이것들의Alcohols, nitrogen-containing heterocyclic compounds containing sulfur in the molecule, or these
유도체로부터 선택된 1종 이상의 유기 화합물이 표면에 흡착하고 있는 것을 특징At least one organic compound selected from derivatives is adsorbed on the surface
으로 하는 배선기재 및 반도체 패키지Wiring board and semiconductor package
5. 직쇄 부분의 탄소원자가 3개 이상인 카르복실산 또는 티올, 벤젠 환을 가지는5. Having a carboxylic acid or thiol or benzene ring having 3 or more carbon atoms in the straight-chain part
카르복실산 또는 티올, 메를캅토기 또는 수산기를 가지는 카르복실산, 다가 불Carboxylic acids or carboxylic acids having thiols, mercapto groups or hydroxyl groups, polyvalent
포화 알콜, 분자 중에 유황을 함유하는 함질소 복소 환상 화합물, 또는 이것들의Saturated alcohols, nitrogen-containing heterocyclic compounds containing sulfur in the molecule, or these
유도체로부터 선택된 1종 이상의 유기 화합물로 이루어지는 에폭시 브리드 아우Epoxy brid outs consisting of at least one organic compound selected from derivatives
트 방지제를 함유하는 것을 특징으로 하는 변색 방지액 또는 봉공 처리액을 제공It provides the discoloration prevention liquid or sealing processing liquid containing the rust inhibitor.
하는 것이다.It is.
발명의 실시의 형태Embodiment of invention
본 발명의 에폭시 브리드 아우트 방지제는, 특히 리드 프레임이나 프린트 배선판 등의 반도체 장치에 적용 가능한 것이나, 반드시 이것에 한정되는 것은 아니며 다이 본딩 공정에 있어서 에폭시 브리드 아우트가 발생할 가능성이 있는 제품의 어느 것에 대하여도 적용할 수 있다.Especially the epoxy bleed out prevention agent of this invention is applicable to semiconductor devices, such as a lead frame and a printed wiring board, but it is not necessarily limited to this, It is not necessarily limited to any of the products with which epoxy bleed out may arise in a die bonding process. Applicable
본 발명의 에폭시 브리드 아우트 방지제에 포함되어, 에폭시 브리드 아우트 방지기능을 가지는 유기 화합물로서는, 다음의 유기 화합물을 예시할 수 있다.The following organic compound can be illustrated as an organic compound contained in the epoxy bleed out prevention agent of this invention, and having an epoxy bleed out prevention function.
A : 직쇄 부분의 탄소 원자가 3개 이상인 카르복실산 또는 티올,A: carboxylic acid or thiol having 3 or more carbon atoms in the straight chain portion,
예를들면, 카프론산(Caproic acid: C5H11COOH), 부티르산(Butyric acid:For example, caproic acid (C 5 H 11 COOH), butyric acid (Butyric acid:
C3H7COOH), 에난트산(Enanthic acid: C6H13COOH), 페랄곤산(Pelargonic acid:C 3 H 7 COOH), enanthic acid (C 6 H 13 COOH), perargonic acid (Pelargonic acid:
C8H17COOH), 카푸린산 (Capric acid: C9H19COOH), 운데실산(Undecylic acid:C 8 H 17 COOH), capuric acid (Capric acid: C 9 H 19 COOH), undecylic acid:
C10H21COOH), 라우린산(Lauric acid: C11H23COOH), 트리데실산(Tridecylic acid:C 10 H 21 COOH), Lauric acid (C 11 H 23 COOH), Tridecyl acid (Tridecylic acid:
C12H25COOH), 미리스틴산(Myristic acid: C13H27COOH), 펜타데실산(PentadecylicC 12 H 25 COOH), Myristic acid (C 13 H 27 COOH), Pentadecyl acid (Pentadecylic
acid: C14H29COOH), 파르미칠산(Palmitic acid: C15H31COOH), 헵타데실산acid: C 14 H 29 COOH), parmitic acid (Palmitic acid: C 15 H 31 COOH), heptadecyl acid
(Heptadecylic acid: C16H33COOH), 스테아린산(Stearic acid: C17H35COOH), 노나(Heptadecylic acid: C 16 H 33 COOH), Stearic acid (Stearic acid: C 17 H 35 COOH), Nona
데칸산(Nonadecanoic acid: C18H37COOH), 베헨산(Behenic acid: C21H43COOH),Decanoic acid (C 18 H 37 COOH), behenic acid (C 21 H 43 COOH),
오레인산(Oleic acid: C17H33COOH), 에루카산(Erucic acid: C21H41COOH),Oleic acid (C 17 H 33 COOH), erucic acid (C 21 H 41 COOH),
리놀산(Linoleic acid: C17H31COOH), 리노렌산(Linolenic acid: C17H29COOH) 등의Linoleic acid (C 17 H 31 COOH), linolenic acid (C 17 H 29 COOH)
카르복실산,Carboxylic Acid,
펜탄티올(Pentanethiol: C5H11SH), 옥탄티올(Octanethiol: C8H17SH), 데칸티올Pentanethiol (C 5 H 11 SH), Octanethiol (C 8 H 17 SH), Deccanthiol
(Decanethiol: C10H21SH), 헥사데실메르캅탄(Hexadecylmercaptane: C16H33SH),(Decanethiol: C 10 H 21 SH), Hexadecylmercaptane (C 16 H 33 SH),
메르캅토프로필메톡시시란(Mercapto-propyl methoxy silane: HS(CH2)3Si(OCH3)3)Mercapto-propyl methoxy silane: HS (CH 2 ) 3 Si (OCH 3 ) 3 )
등의 티올 류.Thiols and the like.
B : 벤젠 환을 가지는 카르복실산 또는 티올,B: carboxylic acid or thiol having a benzene ring,
예를들면, 니트로벤졸산(Nitrobenzoic acid: O2NC6H4COOH), 벤질메르캅탄For example, nitrobenzoic acid (O 2 NC 6 H 4 COOH), benzyl mercaptan
(Benzylmercaptane: C6H5CH2SH) 등.(Benzylmercaptane: C 6 H 5 CH 2 SH) and the like.
C : 메르캅토기 또는 수산기를 가지는 카르복실산,C: carboxylic acid having a mercapto group or a hydroxyl group,
예컨데, 메르캅토아세트산(Mercaptoacetic acid: HSCH2COOH), 무친산 (MucicFor example, mercaptoacetic acid (HSCH 2 COOH), mucinic acid (Mucic
acid: HOOC(CHOH)4COOH)등.acid: HOOC (CHOH) 4 COOH).
D : 다가 불포화 알콜,D: polyunsaturated alcohol,
예컨데, 푸틴티올(Butynediol: HOCH2CCH2OH), 부텐티올(Butenediol: HOCH2CH=For example, putynediol (HOCH 2 C CH 2 OH), butenethiol (Butenediol: HOCH 2 CH =
CHCH2OH)등.CHCH 2 OH) and the like.
E : 분자 중에 유황을 함유하는 함질소 복소 환상 화합물(含窒素複素環狀化合物),E: nitrogen-containing heterocyclic compound containing sulfur in the molecule,
예컨데, 치오발비산(Thiobarbituric acid)등.For example, Thiobarbituric acid.
상기의 유기 화합물 또는 이것들의 유도체로부터 선택된 1종 이상의 유기 화합물At least one organic compound selected from the above organic compounds or derivatives thereof
을 함유하는 에폭시 브리드 아우트 방지제는 본 발명에 포함된다.Epoxy bleed out preventing agent containing is included in this invention.
본 발명의 에폭시 브리드 아우트 방지제는 상기한 유기 화합물을 0.l mg/L ∼The epoxy bleed out agent of the present invention contains 0.1 mg / L of the aforementioned organic compound.
100 g/L, 바람직하게는 10 mg/L∼10 g/L 함유하는 것이다.100 g / L, Preferably it contains 10 mg / L-10 g / L.
상기 유기 화합물의 농도가 지나치게 낮은 경우에는 에폭시 브리드 아우트 방지Epoxy bleed out prevention when the concentration of the organic compound is too low
효과가 없고, 또한, 농도가 지나치게 높더라도 그 이상의 효과는 기대할 수 있지There is no effect, and even if concentration is too high, more effect can be expected.
않기 때문에 바람직하지 못하다.It is not desirable because it is not.
또, 상기 유기 화합물이 물에 녹기 어려운 경우에는 필요에 따라서 알콜, 케톤Moreover, when the said organic compound is hard to melt | dissolve in water, alcohol, a ketone as needed
(Ketone)등의 유기 용제를 첨가한다.Organic solvents, such as (Ketone), are added.
또한, 필요에 따라서, 붕산계, 인산계, 유기산계의 pH 완충제를 0.1∼100 g/L,If necessary, 0.1-100 g / L of a pH buffer of boric acid, phosphoric acid, and organic acid,
바람직하게는 1∼50 g/L 첨가한다.Preferably 1-50 g / L is added.
더욱이, 필요에 따라서, 음 이온계, 양 이온(cation)계, 비(非) 이온계의 계면활Furthermore, if necessary, the surface activity of an anionic, cationic, and nonionic system
성제 중 어느 것이나 또는 이들의 혼합물을 1 μg/L ∼ 10 g/L, 바람직하게는Any of the agents or mixtures thereof is 1 μg / L to 10 g / L, preferably
10 μg/L ∼ 1 g/L 첨가한다.10 μg / L to 1 g / L are added.
에폭시 브리드 아우트 방지제 용액의 pH는 특히 한정할 필요는 없다.The pH of the epoxy bleed out agent solution need not be particularly limited.
에폭시 브리드 아우트 방지제 용액의 온도는 5∼80℃, 바람직하게는 10∼50℃로The temperature of the epoxy bleed out agent solution is 5 to 80 ° C, preferably 10 to 50 ° C.
한다. 온도가 지나치게 낮으면 에폭시 브리드 아우트 효과가 낮고, 온도가 지나do. If the temperature is too low, the epoxy bleed out effect is low,
치게 높아도 그 이상의 효과는 기대할 수 없기 때문에 바람직하지 못하다.Even if it is too high, it is not preferable because further effects cannot be expected.
또한, 에폭시 브리드 아우트 방지 방법은, 에폭시 브리드 아우트 방지제 용액에In addition, the epoxy bleed out prevention method is a solution of an epoxy bleed out agent.
배선기재를 침지하든지 또는 에폭시 브리드 아우트 방지제 용액을 기재에 살포Either immersing the wiring board or spraying the epoxy bleed out agent solution on the substrate
(샤워, 스프레이 등)하든지 하는 방식으로 접촉시킨 후, 수세, 건조하면 좋다.After contacting by a method such as (shower, spray, etc.), it may be washed with water and dried.
또한, 에폭시 브리드 아우트 방지제의 주성분인 상기 유기 화합물을 변색 방지제나 봉공(封孔)처리제에 첨가함으로써도 동일한 효과를 발휘할 수 있다.Moreover, the same effect can also be exhibited by adding the said organic compound which is a main component of an epoxy bleed | out_out_preventive agent to a discoloration inhibitor and a sealing agent.
상기와 같은 에폭시 브리드 아우트 방지처리를 행하는 것에 의하여, 배선 기재표면의 도금 면에는 상기 유기 화합물이 흡착되어, 1∼수분자(數分子)정도의 두께의 유기 화합물로 이루어지는 피막이 형성된다. 그 때문에, 도금 면과 에폭시 수지와의 접촉각(接觸角)을 증가시켜, 에폭시 수지의 삼출(渗出: 에폭시 브리드 아우트)를 억제하는 것이 가능해진다. 더욱이, 흡착되는 유기 화합물의 피막은 대단히 얇으므로, 와이어 본딩성(性), 몰딩성 등의 어셈블리 특성에는 악영향을 주지 않는다. 또한, 변색방지 효과나 봉공 처리효과를 손상하는 일도 없다.By performing the epoxy bleed out prevention treatment as described above, the organic compound is adsorbed on the plating surface of the wiring substrate surface, and a film made of an organic compound having a thickness of about 1 to several molecules is formed. Therefore, it becomes possible to increase the contact angle of a plating surface and an epoxy resin, and to suppress the exfoliation of an epoxy resin. Moreover, since the coating of the organic compound to be adsorbed is very thin, it does not adversely affect assembly characteristics such as wire bonding properties and molding properties. Moreover, it does not impair the discoloration prevention effect and the sealing effect.
상기한 방법에 의해서 에폭시 브리드 아우트 방지처리를 실시한 배선기재 및 반도체 패키지도 본 발명에 포함된다.The wiring base material and semiconductor package which performed the epoxy bleed-out prevention process by the above-mentioned method are also included in this invention.
이하, 실시예에 의거하여 설명하지만, 본 발명은 이것들의 실시예에 한정되는 것은 아니다.Hereinafter, although it demonstrates based on an Example, this invention is not limited to these Examples.
(실시예1∼15)(Examples 1 to 15)
동합금(Cu : 97.7% - Sn : 2.0% - Ni: 0.2% - P : 0.03%)제(製) 리드 프레임 기재에 밀착성 향상을 위해 하지(下地)로서 동(銅) 스트라이크 도금을 행한 후, 패드부(pad部)와 인너 리드부(inner lead 部)의 일부에 스팟트(spot) 은도금 또는 리드 프레임 전체면에 동도금, 금도금, 파라듐 도금 중 어느것이나 실행하였다.Copper alloy (Cu: 97.7%-Sn: 2.0%-Ni: 0.2%-P: 0.03%) After the copper strike plating as a base to improve the adhesion to the lead frame base material, the pad Spot silver plating or a part of the inner lead portion of the pad portion and the inner lead portion were all performed by copper plating, gold plating, or palladium plating on the entire surface of the lead frame.
그 후, 표1∼표3에 기재한 에폭시 브리드 아우트 방지처리를 행하였다.Then, the epoxy bleed out prevention process of Table 1-Table 3 was performed.
에폭시 브리드 아우트 평가Epoxy Breed Outlet Reviews
○ : 0μm , △ :1OOμm , × :1OOμm○: 0 μm, △: 1OOμm, ×: 1OOμm
변색 방지효과의 평가Evaluation of discoloration prevention effect
○ : 변색없음, × : 변색있음○: no discoloration, ×: discoloration
봉공 처리효과의 평가Evaluation of sealing effect
○ : 부식없음, × : 부식있음○: no corrosion, ×: corrosion
에폭시 브리드 아우트 평가Epoxy Breed Outlet Reviews
○ : Oμm . △ :lOOμm . ×:1OOμm○: Oμm. △: lOOμm. ×: 1OOμm
변색 방지효과의 평가Evaluation of discoloration prevention effect
○ : 변색없음. × : 변색있음(Circle): No discoloration. ×: discoloration
봉공 처리효과의 평가Evaluation of sealing effect
○ : 부식없음, × : 부식있음○: no corrosion, ×: corrosion
에폭시 브리드 아우트 평가Epoxy Breed Outlet Reviews
○ : Oμm. △ :1OOμm, × :lOOμm○: Oμm. △: 100 μm, × lOOμm
변색 방지효과의 평가Evaluation of discoloration prevention effect
○ : 변색없음, × : 변색있음○: no discoloration, ×: discoloration
봉공 처리효과의 평가Evaluation of sealing effect
○ : 부식없음, × : 부식있음○: no corrosion, ×: corrosion
또, 이 에폭시 브리드 아우트 방지처리를 행하기 전에, 일부의 시료에 대하여서는, 변색 방지처리 또는 봉공 처리를 행하였다.In addition, before the epoxy bleed out prevention treatment, a part of samples was subjected to discoloration prevention treatment or sealing.
변색 방지처리는, 하기의 조건으로 행하였다.Discoloration prevention process was performed on condition of the following.
변색 방지액 : 주성분 벤조트리아졸(Benzotriazole) 0.l g/LDiscoloration preventing solution: 0.l g / L of main ingredient Benzotriazole
pH : 9.0pH: 9.0
욕온(浴溫) : 25℃Bath temperature: 25 ℃
시간 : 10 sTime: 10 s
방법 : 침지Method: dipping
또한, 봉공 처리는, 하기의 조건으로 행하였다.In addition, the sealing process was performed on condition of the following.
봉공 처리액 : 주성분 트리에타놀아민(Triethanolamine) 1.0 g/LSealing solution: 1.0 g / L of triethanolamine as the main ingredient
pH : 9.0pH: 9.0
욕온(浴溫) : 25℃Bath temperature: 25 ℃
시간 : 10 sTime: 10 s
방법 : 침지Method: dipping
이들 기재(基材)에 대하여, 다이 본딩, 와이어 본딩을 행하여, 에폭시 브리드 아우트, 와이어 본딩 특성, 몰딩(moulding)특성의 평가를 행하였다.These base materials were subjected to die bonding and wire bonding to evaluate epoxy bleed outs, wire bonding characteristics, and molding characteristics.
에폭시 브리드 아우트의 평가는, 다음의 방법으로 행하였다.Evaluation of the epoxy bridout was performed by the following method.
시판(市販)의 저응력(低應力) 다이 본딩용 에폭시 수지를 도금 면에 도포후, 200 ℃, 60 min 가열 경화한 후, 에폭시 도포부를 현미경(30배)으로 관찰하여, 에폭시 브리드 아우트 양을 측정하였다.After applying a commercially available low-stress die-bonding epoxy resin to the plated surface, heat-curing at 200 ° C. for 60 min, and then observing the epoxy coating portion under a microscope (30 times) to determine the amount of epoxy bridout. Measured.
와이어 본딩 특성의 평가는, 하기의 방법으로 행하였다.Evaluation of the wire bonding characteristic was performed by the following method.
초음파 병용 열압착 방식(超音波倂用熱壓着方式)(온도: 200℃, 하중: 50 g, 시간: 10 mS) 으로 와이어 본딩을 행한 후, 풀(pull) 테스타로 풀(pull)강도를 측정하였다.After wire bonding using an ultrasonic combination thermocompression method (temperature: 200 ° C, load: 50 g, time: 10 mS), pull strength is obtained using a pull tester. Measured.
몰딩(moulding)특성의 평가는, 하기의 방법으로 행하였다.Evaluation of the molding characteristic was performed by the following method.
시판의 몰딩용 에폭시 수지를 도금 면에 도포후, 175℃, 5 h 가열 경화한 후, 시어(shear)강도를 측정하였다.A commercial molding epoxy resin was applied to the plated surface, and then cured at 175 ° C. for 5 h, and then shear strength was measured.
더욱이, 변색 방지처리 또는 봉공 처리를 행한 시료에 있어서는 변색 방지효과 또는 봉공 처리효과에 관하여 평가를 행하였다.Moreover, in the sample which performed the discoloration prevention process or the sealing process, the discoloration prevention effect or the sealing process effect was evaluated.
변색 방지효과의 평가는, 스팟트(spot) 은(銀)도금품(品)에서는 스팟트 도금 부(部) 및 동(銅) 스트라이크 도금 부에 관하여, 전체면 도금 품에 있어서는 도금 부에 관하여 하기의 방법으로 행하였다.The evaluation of the discoloration prevention effect is based on the spot plating part and the copper strike plating part in the spot silver plated product, and the plating part in the whole surface plating product. It carried out by the following method.
끓는 순수 중에 10 min 침지 후의 도금 표면을 눈으로 관찰하였다.The plating surface after 10 min immersion in boiling pure water was visually observed.
봉공 처리효과의 평가는, 스팟트 도금 품, 전체면 도금 품의 어느 것이나, 도금 면에 대하여 하기의 방법으로 행하였다.Evaluation of the sealing processing effect was performed with respect to the plating surface in any of a spot plating goods and a whole surface plating goods by the following method.
하기의 인공한액(人工汗液)에 40 ℃, 24 h 침지 후의 도금 표면을 눈으로 관찰하였다.The plating surface after immersion of 40 degreeC and 24 h in the following artificial fluids was visually observed.
인공한액조성Artificial Solution
염화 나트륨 : 9.9 g/LSodium Chloride: 9.9 g / L
황화 나트륨 : 0.8 g/LSodium sulfide: 0.8 g / L
요소 : 1.7 g/LElement: 1.7 g / L
젖산 : l.l mL/LLactic acid: l.l mL / L
암모니아 수 : 0.27 mL/LAmmonia Number: 0.27 mL / L
pH : 5pH: 5
이들의 결과를 표1∼3에 함께 나타낸다.These results are shown together in Tables 1-3.
(실시예16∼20)(Examples 16 to 20)
동합금(Cu : 97.7% - Sn: 2.0% - Ni: 0.2% - P: 0.03%)제(製) 리드 프레임 기재에 은도금, 금도금, 동도금, 또는 파라듐 도금 중 어느것이나 실행하였다.Copper alloy (Cu: 97.7%-Sn: 2.0%-Ni: 0.2%-P: 0.03%) The lead frame base material was any of silver plating, gold plating, copper plating, or palladium plating.
이들의 배선기재(配線基材)에 대하여, 변색방지처리 또는 봉공 처리를 행하였다. 이 때에, 표4에 기재한 바와 같이 변색 방지액 또는 봉공 처리액에 본 발명의 에폭시 브리드 아우트 방지제를 첨가하였다.Discoloration prevention processing or sealing was performed with respect to these wiring base materials. At this time, the epoxy bleed out agent of this invention was added to the discoloration prevention liquid or the sealing process liquid as shown in Table 4.
에폭시 브리드 아우트 평가Epoxy Breed Outlet Reviews
○ : Oμm , △ :lOOμm × :1OOμm○: Oμm, △: lOOμm ×: 1OOμm
변색 방지효과의 평가Evaluation of discoloration prevention effect
○ : 변색없음 × : 변색있음○: No discoloration ×: Discoloration
봉공 처리효과의 평가Evaluation of sealing effect
○ : 부식없음 × : 부식있음○: no corrosion ×: corrosion
이들 기재(基材)에 대하여 다이 본딩, 와이어 본딩를 행하여, 실시예1∼15와 같이 에폭시 브리드 아우트, 와이어 본딩 특성, 몰딩 특성, 및 변색 방지효과 또는 봉공 처리효과에 관한 평가를 행하였다.These base materials were subjected to die bonding and wire bonding to evaluate the epoxy bridout, the wire bonding characteristics, the molding characteristics, and the discoloration prevention effect or the sealing treatment effect as in Examples 1 to 15.
이들의 결과를 표4에 함께 나타낸다.These results are shown in Table 4 together.
(비교예1∼5)(Comparative Examples 1 to 5)
동합금(Cu: 97.7% - Sn: 2.0% - Ni: 0.2% - P: 0.03%)제 리드 프레임 기재에 은도금, 금도금, 동도금, 또는 파라듐 도금 중 어느것이나 실행하였다.The lead frame substrate made of copper alloy (Cu: 97.7%-Sn: 2.0%-Ni: 0.2%-P: 0.03%) was subjected to any of silver plating, gold plating, copper plating, or palladium plating.
일부의 시료에 있어서는, 변색 방지 처리 또는 봉공 처리를 행하였다.In some samples, discoloration prevention processing or sealing was performed.
변색방지처리는, 하기의 조건으로 행하였다.Discoloration prevention process was performed on condition of the following.
변색 방지액 : 주성분 벤조트리아졸(Benzotriazole) 0.1 g/LDiscoloration preventing solution: 0.1 g / L of main ingredient Benzotriazole
pH : 9.0pH: 9.0
욕온(浴溫) : 25℃Bath temperature: 25 ℃
시간 : 10 sTime: 10 s
방법 : 침지(浸漬)Method: Immersion
또한, 봉공 처리는, 하기의 조건으로 행하였다.In addition, the sealing process was performed on condition of the following.
봉공 처리액 : 주성분 트리에타놀아민(Triethanolamine) 1.0 g/LSealant Treatment Solution: Triethanolamine (1.0 g / L)
pH : 9.0pH: 9.0
욕온 : 25℃Bath temperature: 25 ℃
시간 : 10 sTime: 10 s
방법 : 침지Method: dipping
이들 기재(基材)에 대하여 다이 본딩, 와이어(wire)본딩을 행하고, 실시예와 같이 에폭시 브리드 아우트, 와이어 본딩 특성, 몰딩 특성, 및 변색 방지효과 또는 봉공 처리효과에 관한 평가를 행하였다.These base materials were subjected to die bonding and wire bonding, and evaluation of the epoxy bridout, the wire bonding characteristics, the molding characteristics, and the discoloration prevention effect or the sealing treatment effect was performed as in the examples.
이들의 결과를 표5에 함께 나타낸다.These results are shown together in Table 5.
에폭시 브리드 아우트 평가Epoxy Breed Outlet Reviews
○ : Oμm , △ :1OOμm, × :1OOμm○: Oμm, △: 100 μm, × 1OOμm
변색 방지효과의 평가Evaluation of discoloration prevention effect
○ : 변색없음, × : 변색있음○: no discoloration, ×: discoloration
봉공 처리효과의 평가Evaluation of sealing effect
○ : 부식없음, ×: 부식있음○: no corrosion, ×: corrosion
결과result
본 발명의 에폭시 브리드 아우트 방지제를 사용하여 에폭시 브리드 아우트 방지처리를 행한 배선기재(실시예1∼15)는, 다이 본딩 공정에 있어서 에폭시 브리드 아우트 발생은 보이지 않았다. 또한, 변색 방지액 또는 봉공 처리액에 본 발명의 에폭시 브리드 아우트 방지제를 첨가한 경우(실시예16∼20)도 마찬가지로, 다이 본딩 공정에 있어서 에폭시 브리드 아우트의 발생은 보이지 않았다. 실시예의 어떤 경우에 있어서도 와이어 본딩 특성, 몰딩 특성은 양호했다. 변색 방지효과 또는 봉공 처리효과를 행한 기재는 기대된 바와 같은 변색 방지효과, 봉공 처리효과를 가지고 있었다.In the wiring base material (Examples 1-15) which performed the epoxy bleed out prevention process using the epoxy bleed out prevention agent of this invention, the occurrence of the epoxy bleed out was not seen in the die bonding process. In addition, when the epoxy bleed out prevention agent of this invention was added to the discoloration prevention liquid or the sealing process liquid (Examples 16-20), the generation of the epoxy bleed out was not seen in a die bonding process similarly. In any case of the examples, the wire bonding properties and the molding properties were good. The base material which performed the discoloration prevention effect or the sealing effect had the discoloration prevention effect and the sealing effect as expected.
한편, 에폭시 브리드 아우트 방지처리를 행하지 않은 경우(비교예1∼5)에는, 다이 본딩 공정에 있어서의 에폭시 브리드 아우트의 발생이 관찰되었다.On the other hand, in the case where the epoxy bleed out prevention treatment was not performed (Comparative Examples 1 to 5), the occurrence of the epoxy bleed out in the die bonding step was observed.
발명의 효과Effects of the Invention
본 발명의 에폭시 브리드 아우트 방지제를 사용하여 리드 프레임, 프린트 배선판 등의 반도체 장치 표면에 에폭시 브리드 아우트 방지기능을 가지는 유기 화합물을 흡착시키는 에폭시 브리드 아우트 방지처리를 실시함으로써, 변색 방지효과나 봉공 처리효과를 손상함이 없이 다이 본딩 공정에 있어서의 에폭시 브리드 아우트를 방지하는 것이 가능하다. 또한, 와이어 본딩 특성이나 몰딩성 등의 어셈블리 특성에도 악영향을 주는 일이 없다.The epoxy bleed out prevention treatment which adsorbs the organic compound which has an epoxy bleed out prevention function to the surface of semiconductor devices, such as a lead frame and a printed wiring board, is carried out using the epoxy bleed out prevention agent of this invention, and a discoloration prevention effect and a sealing effect are performed. It is possible to prevent the epoxy bleed out in the die bonding process without damage. Moreover, it does not adversely affect assembly characteristics, such as a wire bonding characteristic and molding property.
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9-366605 | 1997-12-26 | ||
JP36660597A JP3343210B2 (en) | 1997-12-26 | 1997-12-26 | Epoxy bleed-out inhibitor and prevention method |
Publications (2)
Publication Number | Publication Date |
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KR20000069912A true KR20000069912A (en) | 2000-11-25 |
KR100337396B1 KR100337396B1 (en) | 2002-05-22 |
Family
ID=18487198
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019997006125A KR100337396B1 (en) | 1997-12-26 | 1998-12-25 | An Agent and a Method for Preventing Epoxy-Bleed-Out |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP3343210B2 (en) |
KR (1) | KR100337396B1 (en) |
CN (1) | CN1247633A (en) |
TW (1) | TW396465B (en) |
WO (1) | WO1999034434A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10196367B2 (en) | 2014-03-18 | 2019-02-05 | Haesung Ds Co., Ltd | Bleed-out preventing agent, composition for preventing bleed-out including the same, and method of preventing bleed-out |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100953008B1 (en) | 2006-01-17 | 2010-04-14 | 닛코킨조쿠 가부시키가이샤 | Epoxy bleedout-preventing agent |
JP5067948B2 (en) * | 2007-05-21 | 2012-11-07 | Jx日鉱日石金属株式会社 | Resin bleed-out inhibitor and method for preventing resin bleed-out |
JP5437393B2 (en) * | 2009-12-17 | 2014-03-12 | Jx日鉱日石金属株式会社 | Resin bleed-out prevention agent |
WO2020085372A1 (en) * | 2018-10-24 | 2020-04-30 | 住友ベークライト株式会社 | Electrically conductive resin composition and semiconductor device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0669257A (en) * | 1992-08-21 | 1994-03-11 | Hitachi Chem Co Ltd | Adhesive for semiconductor element and semiconductor device |
JP2726251B2 (en) * | 1995-12-14 | 1998-03-11 | 住友ベークライト株式会社 | Die bonding material |
-
1997
- 1997-12-26 JP JP36660597A patent/JP3343210B2/en not_active Expired - Lifetime
-
1998
- 1998-12-23 TW TW087121498A patent/TW396465B/en not_active IP Right Cessation
- 1998-12-25 CN CN98802475A patent/CN1247633A/en active Pending
- 1998-12-25 WO PCT/JP1998/005897 patent/WO1999034434A1/en active IP Right Grant
- 1998-12-25 KR KR1019997006125A patent/KR100337396B1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10196367B2 (en) | 2014-03-18 | 2019-02-05 | Haesung Ds Co., Ltd | Bleed-out preventing agent, composition for preventing bleed-out including the same, and method of preventing bleed-out |
Also Published As
Publication number | Publication date |
---|---|
WO1999034434A1 (en) | 1999-07-08 |
KR100337396B1 (en) | 2002-05-22 |
CN1247633A (en) | 2000-03-15 |
TW396465B (en) | 2000-07-01 |
JP3343210B2 (en) | 2002-11-11 |
JPH11195662A (en) | 1999-07-21 |
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