KR20000067415A - 표면 개질된 폴리스티렌 구형 수지의 제조방법 - Google Patents
표면 개질된 폴리스티렌 구형 수지의 제조방법 Download PDFInfo
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- KR20000067415A KR20000067415A KR1019990015208A KR19990015208A KR20000067415A KR 20000067415 A KR20000067415 A KR 20000067415A KR 1019990015208 A KR1019990015208 A KR 1019990015208A KR 19990015208 A KR19990015208 A KR 19990015208A KR 20000067415 A KR20000067415 A KR 20000067415A
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- resin
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- 238000000034 method Methods 0.000 claims abstract description 36
- 239000000178 monomer Substances 0.000 claims abstract description 35
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- 125000000524 functional group Chemical group 0.000 claims abstract description 23
- 125000001867 hydroperoxy group Chemical group [*]OO[H] 0.000 claims abstract description 20
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- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 19
- 239000003054 catalyst Substances 0.000 claims description 15
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 claims description 10
- 238000006116 polymerization reaction Methods 0.000 claims description 9
- -1 transition metal salts Chemical class 0.000 claims description 9
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims description 6
- 238000003302 UV-light treatment Methods 0.000 claims description 6
- 238000010559 graft polymerization reaction Methods 0.000 claims description 5
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 claims description 4
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 238000012719 thermal polymerization Methods 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims description 2
- 238000007717 redox polymerization reaction Methods 0.000 claims description 2
- 229910052723 transition metal Inorganic materials 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- 150000007513 acids Chemical class 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 238000006467 substitution reaction Methods 0.000 abstract description 10
- 239000002952 polymeric resin Substances 0.000 abstract description 8
- 229920003002 synthetic resin Polymers 0.000 abstract description 8
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 30
- 238000007334 copolymerization reaction Methods 0.000 description 28
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 19
- 239000002904 solvent Substances 0.000 description 15
- 238000004132 cross linking Methods 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- 239000012153 distilled water Substances 0.000 description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 10
- 238000007664 blowing Methods 0.000 description 9
- 230000000977 initiatory effect Effects 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 239000012299 nitrogen atmosphere Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 6
- 239000004926 polymethyl methacrylate Substances 0.000 description 6
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229920001519 homopolymer Polymers 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 4
- 239000012280 lithium aluminium hydride Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
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- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 3
- 229920000193 polymethacrylate Polymers 0.000 description 3
- 239000012966 redox initiator Substances 0.000 description 3
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- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- 229910021577 Iron(II) chloride Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
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- 102000004196 processed proteins & peptides Human genes 0.000 description 2
- 108090000765 processed proteins & peptides Proteins 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
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- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- LZKGFGLOQNSMBS-UHFFFAOYSA-N 4,5,6-trichlorotriazine Chemical compound ClC1=NN=NC(Cl)=C1Cl LZKGFGLOQNSMBS-UHFFFAOYSA-N 0.000 description 1
- JRLTTZUODKEYDH-UHFFFAOYSA-N 8-methylquinoline Chemical group C1=CN=C2C(C)=CC=CC2=C1 JRLTTZUODKEYDH-UHFFFAOYSA-N 0.000 description 1
- UIERETOOQGIECD-UHFFFAOYSA-N Angelic acid Natural products CC=C(C)C(O)=O UIERETOOQGIECD-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005842 biochemical reaction Methods 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-M hydroperoxide group Chemical group [O-]O MHAJPDPJQMAIIY-UHFFFAOYSA-M 0.000 description 1
- 150000002433 hydrophilic molecules Chemical class 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
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- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- UIERETOOQGIECD-ONEGZZNKSA-N tiglic acid Chemical compound C\C=C(/C)C(O)=O UIERETOOQGIECD-ONEGZZNKSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000004584 weight gain Effects 0.000 description 1
- 235000019786 weight gain Nutrition 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
- C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2325/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
- C08J2325/02—Homopolymers or copolymers of hydrocarbons
- C08J2325/04—Homopolymers or copolymers of styrene
- C08J2325/06—Polystyrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/06—Polystyrene
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Graft Or Block Polymers (AREA)
Abstract
Description
처리시간 (분) | 5 | 10 | 20 | 30 | 60 |
히드로퍼옥시기의도입량(μmol/g) | 5.0 | 7.7 | 12.9 | 17.7 | 18.6 |
처리시간 (분) | 5 | 10 | 20 | 30 | 60 |
히드로퍼옥시기의도입량(μmol/g) | 3.8 | 5.8 | 10.1 | 14.5 | 16.8 |
실시예 | 그라프트 단량체 | 개시 방법 | 기능기 치환율(mmol/g) |
3 | 메틸메타크릴레이트 | 산화환원촉매 | 3.56 a |
4 | 메틸메타크릴레이트 | 열 | 3.20 b |
5 | 메틸메타크릴레이트 | 자외선 | 3.42 a |
6 | 메틸메타크릴레이트 | 산화환원촉매 | 3.45 b |
7 | 메틸메타크릴레이트 | 열 | 3.18 b |
8 | 메틸메타크릴레이트와 디비닐벤젠 공중합 | 산화환원촉매 | 2.46 a |
9 | 메틸메타크릴산 | 열 | 3.00 b |
10 | 폴리에틸렌글리콜(분자량200) 메타크릴레이트 | 산화환원촉매 | 1.25 c |
11 | 폴리에틸렌글리콜(분자량200) 메타크릴레이트 | 열 | 1.04 c |
12 | 폴리에틸렌글리콜(분자량400) 메타크릴레이트 | 열 | 0.85 c |
13 | 폴리에틸렌글리콜(분자량750) 알릴레이트 | 산화환원촉매 | 0.65 c |
14 | 폴리에틸렌글리콜(분자량750) 알릴레이트 | 열 | 0.60 c |
15 | 폴리에틸렌글리콜(분자량1500) 알릴레이트 | 열 | 0.32 c |
16 | 비닐포름아미드 | 열 | 0.50 a |
17 | 알릴아민 | 열 | 0.45 a |
18 | 비닐아세테이트 | 열 | 0.48 a |
19 | 히드록시에틸메타크릴레이트 | 산화환원촉매 | 1.20 a |
20 | 폴리에틸렌글리콜(분자량750) 알릴레이트와메틸메타크릴레이트 공중합 | 열 | 1.12 c |
(주)a. 무게 증가, b. 산소의 원소분석 결과,c. 트리클로로트리아진을 결합시킨 후 원소분석 |
Claims (12)
- 폴리스티렌 구형수지를 오존 또는 UV광으로 처리하여 구형 수지의 표면에 히드로퍼옥시기를 도입하는 단계; 및상기 히드로퍼옥시기가 도입된 구형수지 표면에 단량체를 그라프트 중합시켜 기능기를 표면에 도입하는 단계를 포함하는 포함하는 폴리스티렌 구형수지의 제조방법.
- 제 1 항에 있어서,오존처리시 60분 동안 50L/hr의 유속으로 처리하는 것을 특징으로 하는 폴리스티렌 구형수지의 제조방법.
- 제 1 항에 있어서,UV광 처리시 290nm에서 60분 동안 수행하는 것을 특징으로 하는 폴리스티렌 구형수지의 제조방법.
- 제 1 항에 있어서,단량체로는 하나 이상의 비닐기를 포함하는 화합물을 사용하는 것을 특징으로 하는 폴리스티렌 구형수지의 제조방법.
- 제 1 항 또는 제 4 항에 있어서,단량체로는 메틸메타크릴레이트, 디비닐벤젠, 메틸메타크릴산, 폴리에틸렌글리콜 메타크릴레이트, 폴리에틸렌글리콜 알릴레이트, 비닐포름아미드, 알릴아민, 비닐아세테이트 및 히드록시에틸메타크릴레이트 1종 이상의 화합물을 선택하여 사용하는 것을 특징으로 하는 폴리스티렌 구형수지의 제조방법.
- 제 1 항 또는 제 4 항에 있어서,단량체 농도가 0.1∼100%(v/v 또는 w/v) 되도록 수행하는 것을 특징으로 하는 폴리스티렌 구형 수지의 제조방법.
- 제 1 항에 있어서,그라프트 중합은 촉매를 이용한 산화환원중합으로 수행되는 것을 특징으로 하는 폴리스티렌 구형 수지의 제조방법.
- 제 7 항에 있어서,촉매로는 양성자 이온을 제공할 수 있는 산, 철을 포함한 전이금속염 및 아민류 중에서 1종 이상의 화합물을 선택하여 사용하는 것을 특징으로 하는 폴리스티렌 구형 수지의 제조방법.
- 제 7 항 또는 제 8 항에 있어서,촉매 농도를 0.00001∼10%(w/v 또는 v/v) 되도록 수행되는 것을 특징으로 하는 폴리스티렌 구형 수지의 제조방법.
- 제 1 항에 있어서,그라프트 중합은 열중합으로 수행되는 것을 특징으로 하는 폴리스티렌 구형 수지의 제조방법.
- 제 10 항에 있어서,열중합은 50∼100℃의 범위에서 수행하는 것을 특징으로 하는 폴리스티렌 구형 수지의 제조방법.
- 제 1 항에 있어서,그라프트 중합은 UV광을 이용한 광개시중합으로 수행되는 것을 특징으로 하는 폴리스티렌 구형 수지의 제조방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1019990015208A KR20000067415A (ko) | 1999-04-28 | 1999-04-28 | 표면 개질된 폴리스티렌 구형 수지의 제조방법 |
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KR1019990015208A KR20000067415A (ko) | 1999-04-28 | 1999-04-28 | 표면 개질된 폴리스티렌 구형 수지의 제조방법 |
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KR20000067415A true KR20000067415A (ko) | 2000-11-15 |
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KR1019990015208A Ceased KR20000067415A (ko) | 1999-04-28 | 1999-04-28 | 표면 개질된 폴리스티렌 구형 수지의 제조방법 |
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KR (1) | KR20000067415A (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100654364B1 (ko) * | 2005-07-01 | 2006-12-06 | (주) 스필코리아 | 발포폴리스틸렌 비이드의 표면처리방법 및 표면처리장치 |
KR20220170232A (ko) * | 2021-06-22 | 2022-12-29 | 한국원자력연구원 | 소수성 고분자 기재의 표면을 친수성으로 개질하는 방법 및 이를 이용하여 표면이 친수성으로 개질된 고분자 기재 |
Citations (5)
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JPS59152913A (ja) * | 1983-02-21 | 1984-08-31 | Yoshito Ikada | 高分子材料表面改質法 |
KR890003550A (ko) * | 1987-08-31 | 1989-04-15 | 최근선 | 한글 겹쳐치기(overlay)자동 수정 제어방법 |
JPH07138394A (ja) * | 1993-11-19 | 1995-05-30 | Toyobo Co Ltd | 高分子成型体の表面改質方法 |
JPH08109228A (ja) * | 1993-09-18 | 1996-04-30 | Hitoshi Kanazawa | 高分子材料の表面改質方法 |
JPH10101820A (ja) * | 1996-09-30 | 1998-04-21 | Fuji Electric Co Ltd | ポリスチレン製部材の表面改質方法および該方法が適用されたポリスチレン製部材 |
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1999
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS59152913A (ja) * | 1983-02-21 | 1984-08-31 | Yoshito Ikada | 高分子材料表面改質法 |
KR890003550A (ko) * | 1987-08-31 | 1989-04-15 | 최근선 | 한글 겹쳐치기(overlay)자동 수정 제어방법 |
JPH08109228A (ja) * | 1993-09-18 | 1996-04-30 | Hitoshi Kanazawa | 高分子材料の表面改質方法 |
JPH07138394A (ja) * | 1993-11-19 | 1995-05-30 | Toyobo Co Ltd | 高分子成型体の表面改質方法 |
JPH10101820A (ja) * | 1996-09-30 | 1998-04-21 | Fuji Electric Co Ltd | ポリスチレン製部材の表面改質方法および該方法が適用されたポリスチレン製部材 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100654364B1 (ko) * | 2005-07-01 | 2006-12-06 | (주) 스필코리아 | 발포폴리스틸렌 비이드의 표면처리방법 및 표면처리장치 |
KR20220170232A (ko) * | 2021-06-22 | 2022-12-29 | 한국원자력연구원 | 소수성 고분자 기재의 표면을 친수성으로 개질하는 방법 및 이를 이용하여 표면이 친수성으로 개질된 고분자 기재 |
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