KR19990047265A - 액정 표시 장치용 유리 기판 세정 장치 및 이를 이용한 유리기판 세정 방법 - Google Patents
액정 표시 장치용 유리 기판 세정 장치 및 이를 이용한 유리기판 세정 방법 Download PDFInfo
- Publication number
- KR19990047265A KR19990047265A KR1019970065601A KR19970065601A KR19990047265A KR 19990047265 A KR19990047265 A KR 19990047265A KR 1019970065601 A KR1019970065601 A KR 1019970065601A KR 19970065601 A KR19970065601 A KR 19970065601A KR 19990047265 A KR19990047265 A KR 19990047265A
- Authority
- KR
- South Korea
- Prior art keywords
- glass substrate
- cleaning
- crystal display
- liquid crystal
- display device
- Prior art date
Links
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
Abstract
Description
Claims (4)
- 유리 기판상에 박막 트랜지스터를 형성하기 이전에 유리 기판 표면을 세정하는 장치 액정 표시 장치용 유리 기판 세정 장치에 있어서,상기 유리 기판 표면을 세정 용액에 의하여 세정하는 세정부와,상기 세정된 유리 기판을 헹구어내는 헹굼부와,상기 헹구어진 유리 기판을 건조시키는 건조부와,건조된 유리 기판 표면에 잔존하는 유리물들에 UV선을 조사하여 산화막을 형성시키는 UV 램프를 포함하는 것을 특징으로 하는 액정 표시 장치용 유리 기판 세정 장치.
- 제 1 항에 있어서, 상기 UV 램프는 세정장치당 3 내지 6개가 구비된 것을 특징으로 하는 액정 표시 장치용 유리 기판 세정 장치.
- 제 1 항기재의 액정 표시 장치용 유리 기판 세정 장치를 이용한 액정 표시 장치용 유리 기판을 세정하는 방법으로서,유리 기판을 세정액으로 세정하는 단계;상기 세정된 유리 기판에 존재하는 세정액을 헹구어내는 단계;상기 헹구어진 유리 기판을 건조시키는 단계;상기 건조된 유리 기판에 UV선을 조사하여, 유리 기판 표면에 산화막을 형성하는 단계를 포함하는 것을 특징으로 하는 액정 표시 장치용 유리 기판 세정 방법.
- 제 3 항에 있어서, 상기 UV선은 184.9nm 또는 253.7nm의 파장을 갖는 것을 특징으로 하는 액정 표시 장치용 유리 기판 세정 방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970065601A KR100453365B1 (ko) | 1997-12-03 | 1997-12-03 | 액정표시장치용유리기판세정장치및이를이용한유리기판세정방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970065601A KR100453365B1 (ko) | 1997-12-03 | 1997-12-03 | 액정표시장치용유리기판세정장치및이를이용한유리기판세정방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19990047265A true KR19990047265A (ko) | 1999-07-05 |
KR100453365B1 KR100453365B1 (ko) | 2005-04-06 |
Family
ID=37301812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970065601A KR100453365B1 (ko) | 1997-12-03 | 1997-12-03 | 액정표시장치용유리기판세정장치및이를이용한유리기판세정방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100453365B1 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104455545B (zh) * | 2014-11-28 | 2016-09-14 | 合肥鑫晟光电科技有限公司 | 自切换t型三通接头及卡夹清洗干燥装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0315911Y2 (ko) * | 1988-03-10 | 1991-04-05 |
-
1997
- 1997-12-03 KR KR1019970065601A patent/KR100453365B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100453365B1 (ko) | 2005-04-06 |
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