KR102925444B1 - 적외선 흡수 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서 및 카메라 모듈 - Google Patents

적외선 흡수 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서 및 카메라 모듈

Info

Publication number
KR102925444B1
KR102925444B1 KR1020247020934A KR20247020934A KR102925444B1 KR 102925444 B1 KR102925444 B1 KR 102925444B1 KR 1020247020934 A KR1020247020934 A KR 1020247020934A KR 20247020934 A KR20247020934 A KR 20247020934A KR 102925444 B1 KR102925444 B1 KR 102925444B1
Authority
KR
South Korea
Prior art keywords
group
formula
independently represent
hydrogen atom
alkyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020247020934A
Other languages
English (en)
Korean (ko)
Other versions
KR20240110644A (ko
Inventor
카즈나리 야기
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20240110644A publication Critical patent/KR20240110644A/ko
Application granted granted Critical
Publication of KR102925444B1 publication Critical patent/KR102925444B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
    • C09B23/06—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups three >CH- groups, e.g. carbocyanines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/182—Colour image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020247020934A 2022-01-31 2023-01-24 적외선 흡수 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서 및 카메라 모듈 Active KR102925444B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2022-013217 2022-01-31
JP2022013217 2022-01-31
PCT/JP2023/001987 WO2023145699A1 (ja) 2022-01-31 2023-01-24 赤外線吸収組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、赤外線センサおよびカメラモジュール

Publications (2)

Publication Number Publication Date
KR20240110644A KR20240110644A (ko) 2024-07-15
KR102925444B1 true KR102925444B1 (ko) 2026-02-11

Family

ID=87471948

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247020934A Active KR102925444B1 (ko) 2022-01-31 2023-01-24 적외선 흡수 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서 및 카메라 모듈

Country Status (4)

Country Link
JP (1) JPWO2023145699A1 (https=)
KR (1) KR102925444B1 (https=)
TW (1) TW202336119A (https=)
WO (1) WO2023145699A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120647570B (zh) * 2025-06-23 2026-03-17 德州学院 一种TiOPc掺杂剂、TiOPc@SQ异质结及其应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200301272A1 (en) * 2018-02-01 2020-09-24 Fujifilm Corporation Curable composition, near infrared absorber, film, near infrared cut filter, solid-state imaging element, image display device, and infrared sensor

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5527620B2 (ja) * 2009-03-12 2014-06-18 新日鉄住金化学株式会社 色素増感太陽電池、光電変換素子及びそれに使用される色素
WO2018100834A1 (ja) 2016-11-29 2018-06-07 コニカミノルタ株式会社 組成物、光学フィルム、近赤外線カットフィルター、イメージセンサー
JP6797298B2 (ja) * 2017-06-08 2020-12-09 富士フイルム株式会社 樹脂混練物の樹脂成形体及び樹脂混練物の樹脂成形体の製造方法
JP6322837B1 (ja) * 2017-06-13 2018-05-16 東洋インキＳｃホールディングス株式会社 スクアリリウム色素及びその用途
JP7015935B2 (ja) * 2018-09-14 2022-02-03 富士フイルム株式会社 近赤外線吸収性感光性組成物、硬化膜、光学フィルタ、パターン形成方法、積層体、固体撮像素子、画像表示装置及び赤外線センサ
TWI822853B (zh) * 2018-09-14 2023-11-21 日商富士軟片股份有限公司 近紅外線吸收性組成物、分散液之製造方法、膜、濾光器、圖案形成方法、積層體、固體攝像元件、圖像顯示裝置及紅外線感測器
JP7146947B2 (ja) * 2018-12-07 2022-10-04 富士フイルム株式会社 樹脂組成物、光学フィルター、画像表示装置、固体撮像素子、及び色素混合物
JP2020172614A (ja) * 2019-04-12 2020-10-22 三菱ケミカル株式会社 色素組成物、膜、光学フィルタ、固体撮像素子、画像表示装置及び赤外線センサ

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200301272A1 (en) * 2018-02-01 2020-09-24 Fujifilm Corporation Curable composition, near infrared absorber, film, near infrared cut filter, solid-state imaging element, image display device, and infrared sensor

Also Published As

Publication number Publication date
JPWO2023145699A1 (https=) 2023-08-03
KR20240110644A (ko) 2024-07-15
TW202336119A (zh) 2023-09-16
WO2023145699A1 (ja) 2023-08-03

Similar Documents

Publication Publication Date Title
KR102536495B1 (ko) 근적외선 흡수성 감광성 조성물, 경화막, 광학 필터, 패턴 형성 방법, 적층체, 고체 촬상 소자, 화상 표시 장치 및 적외선 센서
KR102928564B1 (ko) 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서, 카메라 모듈, 화합물 및 적외선 흡수제
KR20230121861A (ko) 착색 조성물, 막, 광학 필터, 고체 촬상 소자, 화상표시 장치 및 화합물
KR102926812B1 (ko) 착색 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치 및 화합물
KR102790553B1 (ko) 착색 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치 및 화합물
KR102925444B1 (ko) 적외선 흡수 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서 및 카메라 모듈
KR102915578B1 (ko) 적외선 흡수 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서 및 카메라 모듈
JP7651661B2 (ja) 赤外線吸収組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
KR102833599B1 (ko) 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서, 카메라 모듈 및 화합물
KR102795450B1 (ko) 착색 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 및, 화합물
JP7727663B2 (ja) 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
KR102903359B1 (ko) 수지 조성물, 막의 제조 방법, 광학 필터의 제조 방법, 고체 촬상 소자의 제조 방법 및 화상 표시 장치의 제조 방법
KR20230130694A (ko) 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시장치, 적외선 센서, 카메라 모듈, 화합물 및 적외선 흡수제
KR20240091054A (ko) 수지 조성물, 막, 광학 필터, 고체 촬상 소자 및 화상 표시 장치
TW202231641A (zh) 組成物、膜、濾光器、固體攝像元件、圖像顯示裝置及紅外線感測器
KR20230160358A (ko) 착색 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치 및 화합물
KR102930618B1 (ko) 착색 조성물, 막, 광학 필터, 고체 촬상 소자 및 화상 표시 장치
JP7741819B2 (ja) 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
KR102910844B1 (ko) 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서, 카메라 모듈 및 화합물
KR102740860B1 (ko) 마젠타색 감광성 수지 조성물, 막, 컬러 필터, 고체 촬상 소자 및 화상 표시 장치
KR102926818B1 (ko) 착색 조성물, 막, 컬러 필터, 고체 촬상 소자 및 화상 표시 장치
KR102800737B1 (ko) 착색 조성물, 막, 컬러 필터, 광 센서 및 표시 장치
KR20240144253A (ko) 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서, 카메라 모듈 및 화합물
WO2024176883A1 (ja) 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、赤外線センサ、カメラモジュールおよび化合物
WO2024142976A1 (ja) 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、赤外線センサ、カメラモジュールおよび化合物

Legal Events

Date Code Title Description
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13 Pre-grant limitation requested

Free format text: ST27 STATUS EVENT CODE: A-2-3-E10-E13-LIM-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

D22 Grant of ip right intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D22-EXM-PE0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

Q13 Ip right document published

Free format text: ST27 STATUS EVENT CODE: A-4-4-Q10-Q13-NAP-PG1601 (AS PROVIDED BY THE NATIONAL OFFICE)